Sulfonamide corrosion inhibitors

Abstract

The sulfonamide corrosion inhibitors are compounds of formula A or formula B, as follows: ##STR00001##
A method of synthesizing the sulfonamide corrosion inhibitors includes functionalizing a polyamine precursor with a sulfonyl chloride derivative by dehydrochlorination. The polyamine precursor may be bis(3-aminopropyl)amine and the sulfonyl chloride derivative may be methanesulfonyl chloride. The sulfonamide corrosion inhibitors may be applied alone or in any combination as corrosion inhibitors of a metal and are shown to be effective inhibitors of corrosion of iron or iron alloys in acidic conditions.

Claims

1. A method for synthesizing an organic corrosion inhibitor, comprising the steps of: adding a polyamine precursor to a sulfonyl chloride derivative in a solvent, thereby precipitating a by-product and producing the corrosion inhibitor in solution; removing the precipitated by-product from the solution; and evaporating the solvent from the solution to isolate the organic corrosion inhibitor in solid form.

2. The method for synthesizing an organic corrosion inhibitor of claim 1, wherein the step of adding the polyamine precursor comprises separately dissolving the polyamine precursor and the sulfonyl chloride derivative, respectively, in anhydrous tetrahydrofuran (THF) and adding the solution of the polyamine precursor to the solution of the sulfonyl chloride derivative dropwise.

3. The method for synthesizing an organic corrosion inhibitor of claim 2, further comprising the step of cooling the solution of the sulfonyl chloride to 0 C. before the step of adding the polyamine precursor.

4. The method for synthesizing an organic corrosion inhibitor of claim 1, further comprising, before removing the precipitated by-product, allowing the solution to react for at least 2 hours under stirring.

5. The method for synthesizing an organic corrosion inhibitor of claim 1, wherein the polyamine precursor is N-(3-aminopropyl)-1,3-propanediamine and the sulfonyl chloride derivative is methanesulfonyl chloride.

6. The method for synthesizing an organic corrosion inhibitor of claim 1, wherein the solvent is tetrahydrofuran.

7. The method for synthesizing an organic corrosion inhibitor according to claim 1, wherein the solvent comprises a mixture of anhydrous tetrahydrofuran and pyridine, the polyamine precursor is 3,3-diaminodipropylamine, and 1 equivalent of 3-3-diaminodipropylamine is added to 1 equivalent of the sulfonyl chloride derivative, whereby the synthesized corrosion inhibitor comprises a monosubstituted compound having the formula: ##STR00004##

8. The method for synthesizing an organic corrosion inhibitor according to claim 1, wherein the solvent consists of anhydrous tetrahydrofuran, the polyamine precursor is 3,3-diaminodipropylamine, and 1 equivalent of 3-3-diaminodipropylamine is added to 2 equivalents of the sulfonyl chloride derivative, whereby the synthesized corrosion inhibitor comprises a disubstituted compound having the formula: ##STR00005##

9. A method of inhibiting or preventing corrosion of iron or iron alloys using the corrosion inhibitor prepared by the method of claim 1, comprising the steps of: dissolving the corrosion inhibitor in dilute acid solution; and bringing the solution of the corrosion inhibitor into contact with the iron or iron alloy to adsorb a thin film of the corrosion inhibitor on a surface of the iron or iron alloy.

10. The method of inhibiting or preventing corrosion according to claim 9, wherein the corrosion inhibitor comprises a compound having the formula: ##STR00006##

11. The method of inhibiting or preventing corrosion according to claim 9, wherein the corrosion inhibitor comprises a compound having the formula: ##STR00007##

12. A sulfonamide corrosion inhibitor, comprising a compound having the formula: ##STR00008##

Description

BRIEF DESCRIPTION OF THE DRAWINGS

(1) FIG. 1 is a schematic diagram depicting electrochemical corrosion of metal by an acid in the presence of oxygen.

(2) FIG. 2 is a reaction scheme for the synthesis of the sulfonamide corrosion inhibitors, viz., compounds A and B.

(3) FIGS. 3A and 3B are molecular models showing optimized configurations of compounds A and B, respectively.

(4) FIG. 4 is the .sup.1H nucleic magnetic resonance (NMR) spectrum of compound B.

(5) FIG. 5 is the .sup.13C NMR spectrum of compound B.

(6) FIG. 6 is the Fourier-transform infrared (FT-IR) spectrum of compound A.

(7) FIGS. 7A and 7B are molecular electrostatic potential (MEP) maps of compound A and compound B, respectively.

(8) FIG. 8 is a schematic diagram illustrating hypothesized chemisorption behavior of compound B according to and visualized as its MEP map on an iron surface in HCl solution.

(9) FIG. 9 is a plot of polarization curves for iron in 0.5M HCl with various concentrations of exemplary compound A at 25 C.

(10) FIG. 10 shows Nyquist plots for iron in 0.5M HCl solution in the absence and presence of various concentrations of exemplary compound B at 25 C.

(11) FIG. 11A is a schematic diagram of an electrical equivalent circuit model for the interface between iron and a 0.5M solution of HCl in the absence of a corrosion inhibitor.

(12) FIG. 11B is a schematic diagram of an electrical equivalent circuit model for the interface between iron and a 0.5M solution of HCl in the presence of the exemplary compound B.

(13) FIG. 12 is a plot of corrosion inhibition efficiency vs. exposure time for iron in 0.5 M HCl solution in the presence of various concentrations of exemplary compound A.

(14) Similar reference characters denote corresponding features consistently throughout the attached drawings.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

(15) The sulfonamide corrosion inhibitors are compounds of formula A or formula B, as follows:

(16) ##STR00003##

(17) The method of synthesizing the sulfonamide corrosion inhibitors comprises functionalizing a polyamine precursor with a sulfonyl chloride derivative by dehydrochlorination. Specifically, the polyamine precursor may be norspermidine, i.e., N-(3-aminopropyl)-1,3-propanediamine, also known as bis(3-aminopropyl)amine and 3,3-diaminodipropylamine, and the sulfonyl chloride derivative may be methanesulfonyl chloride. The resulting sulfonamide corrosion inhibitors may be mono-substituted N-[3-(3-aminopropyl)amino)propyl]methanesulfonamide (compound A) or di-substituted N,N-(azanediylbis(propane-3,1-diyl)dimethanesulfonamide (compound B).

(18) The sulfonamide corrosion inhibitors may be applied alone or in any combination as corrosion inhibitors of a metal. In particular, the metal may be iron, mild steel, or another iron alloy in acidic conditions, i.e., acidic aqueous solution, such as an aqueous HCl solution.

(19) The following examples will further illustrate the sulfonamide corrosion inhibitors, the method of synthesizing the sulfonamide corrosion inhibitors, and the use of the synthesized sulfonamide compounds as corrosion inhibitors.

Example 1

Synthesis of Compound A and Compound B

(20) Exemplary sulfonamide corrosion inhibitors, starting from N.sup.1-(3-aminopropyl)propane-1,3-diamine (otherwise referred to as 3,3 diaminodipropylamine), were synthesized as shown in FIG. 2.

(21) To prepare compound A, one equivalent of methanesulfonyl chloride (0.50 g, 4.38 mmol) was dissolved in 40 mL of anhydrous tetrahydrofuran (THF) and 2 mL of anhydrous pyridine, to form a solution. The temperature of the solution was cooled down to 0 C. and was kept constant while 1 equivalent of 3,3 diaminodipropylamine dissolved in 10 mL of anhydrous THF was added drop by drop. After addition of the 3,3 diaminodipropylamine was completed, the solution was stirred for 2 hours or until the reaction was sufficiently complete. The reaction completeness was monitored by thin layer chromatography (TLC). The solid salt byproduct, including primarily pyridinium chloride, was removed by simple filtration, but may be removed in any conventional way known to one skilled in the art. The resulting filtrate, containing the desired product, was left overnight, allowing for evaporation of the THF solvent. After THF evaporation, the solid product comprising compound A was washed with n-hexane, then acetone, and then with dichloromethane, to produce a final amount of compound A. The above method produced 0.85 g of compound A, or a 92% yield. To prepare compound B, the same method as above was used, but two equivalents of methanesulfonyl chloride was used and no pyridine was added.

(22) The molecular structures of the compounds A and B resulting from the above exemplary methods were investigated by spectroscopic techniques of .sup.1H-NMR, .sup.13C-NMR, FT-IR, mass spectroscopy (MS), and Ultraviolet-visible spectroscopy (UV-Vis).

(23) FIG. 3 shows optimized structures of compound A (FIG. 3A) and compound B (FIG. 3B) with intra H-bonds, several functional groups with e-rich atoms (such as O, S, and N), in addition to the alkyls groups indicated. FIG. 4 shows the .sup.1H-NMR spectrum of compound B in CDCl.sub.3. A typical .sup.1H-NMR spectrum with high chemical shifts was collected, in which only aliphatic protons were detected from 1-5 ppm (see inset). Chemical shifts are noted directly on the figure. FIG. 5 shows the .sup.13C-NMR spectrum of compound B in CDCl.sub.3. Only aliphatic carbons were detected from 1-50 ppm (see inset). Chemical shifts are noted directly on the figure.

(24) FIG. 6 shows the IR-spectrum of compound A (MP) and starting materials 3,3 diaminodipropylamine and methylsulfonyl chloride, recorded in solid state. The vibrational behavior of each functional group appears with peaks consistent with their expected positions. The main stretching vibration bands of the exemplary compound A spectrum directly correspond to that of the desired compound structural formula. Broad v.sub.NH at 3320 cm.sup.1, no v.sub.(CH) aromatic vibration, v.sub.(CH) aliphatic at 2980 cm.sup.1 and v.sub.(SO) at 1280 cm.sup.1.

(25) Molecular electrostatic potential (MEP) maps of compound A and compound B were prepared, as shown in FIGS. 7A and 7B, respectively, which, as expected, showed increased electron density in locations near the S, N, and O atoms and decreased electron density adjacent the CH.sub.3 and CH.sub.2 groups. FIG. 8 illustrates the predicted chemisorption behavior of compound B on an iron surface in HCl solution. Lone pairs of 0 atoms attach to the iron positive surface. Meanwhile, the NH groups attach to the chloride ions on the iron surface.

Example 2

Evaluation of Corrosion Inhibition by Compounds A and B

(26) The activity of exemplary compounds A and B against corrosion of iron alloy in acidic medium was evaluated individually under the following conditions: (1) 0.5M solutions of NaOH, H.sub.2SO.sub.4 and HCl at 25 C.; (2) 0.1M, 0.3M, 0.5M solutions of HCl at 25 C., evaluated by both polarization measurements and weight loss measurements; (3) 0.5M solutions of HCl at 25 C., 35 C. and 45 C., evaluated using polarization measurements; and (4) 50 ppm, 100 ppm and 150 ppm of compounds A and B in 0.5 M solution HCl at 25 C.

(27) The electrochemical polarization (EP), electro-impedance spectroscopy (EIS) and weight loss evaluation methods were applied to evaluate the corrosion inhibition activities of compounds A and B. Both compounds A and B exhibit excellent corrosion inhibition activities with an apparent mixed cathodic/anionic mechanism.

(28) FIG. 9 shows polarization curves for iron in 0.5M HCl solution and in the presence of various concentrations of compound B at 25 C. The anodic and cathodic reactions are each affected by the addition of compound B. Indeed, the addition of compound B to HCl solution reduces the anodic dissolution of iron and also retards the cathodic hydrogen evolution reaction, implying that this compound acts as a mixed-type inhibitor with high efficiencies at very low concentrations.

(29) FIG. 10 shows Nyquist plots for iron in 0.5M HCl solution with 0 ppm, 50 ppm, 100 ppm and 150 ppm of compound B at 25 C. The addition of B to the acidic solution leads to a change of the impedance diagrams in both shape and size. A depressed semicircle at high frequencies and a second time constant appeared at low frequencies. An increase in size of the semicircle with inhibitor concentration indicates increased inhibitor effect. Compound B significantly inhibits corrosion of iron in 1 M HCl, even at very low concentrations.

(30) FIGS. 11A and 11B show electrical equivalent circuits for modeling the interface iron in 0.5M HCl solution without (FIG. 11A) and with (FIG. 11B) compound B. Without compound B, a single time constant was observed. In the presence of compound B, a two time constant circuit was proposed to describe the mechanism. In these theoretical circuits, Rs represent the solution resistance, Rct is the charge transfer resistance and CPEd represents the capacitance of the high frequency semicircle that can be attributed to the charge transfer process. Ra represents the resistance of the adsorbed corrosion inhibitor and CPEa is the capacitance of the inhibitor film due to the inhibitor's adsorption on the steel surface.

(31) FIG. 10 shows a plot of inhibition efficiency (%) vs. exposure time of iron in 0.5 M HCl with 0 ppm, 50 ppm, 100 ppm and 150 ppm of compound B at 25 C. From this figure it can be seen that compound B remains effective at a maximum concentration (150 ppm) even at an immersion time of 388 hours, with an efficiency that reached 75%. The results suggest that upon immersion in dilute acidic solution, the sulfonamide corrosion inhibitors form a thin protective film over the workpiece of iron or iron alloy by absorption or chemisorption mechanism modeled in FIG. 8 and continue to protect the workpiece by mixed anodic and cathodic mechanisms.

(32) It is to be understood that the present method is not limited to the embodiments described above, but encompasses any and all embodiments within the scope of the following claims.