SURFACE ROUGHENING OF CMC AND COATED CMC
20190359532 ยท 2019-11-28
Inventors
- Niels Van der Laag (Vaterstetten, DE)
- Arturo Flores Renteria (Berlin, DE)
- David J. Mitchell (Oviedo, FL, US)
Cpc classification
B23K26/3584
PERFORMING OPERATIONS; TRANSPORTING
C04B41/91
CHEMISTRY; METALLURGY
C04B41/5042
CHEMISTRY; METALLURGY
C04B41/00
CHEMISTRY; METALLURGY
International classification
C04B41/00
CHEMISTRY; METALLURGY
C04B41/53
CHEMISTRY; METALLURGY
Abstract
By surface roughening of CMC component via a pico-laser treatment a good adhering of a plasma sprayed coating is achieved.
Claims
1. A method of roughening a surface of a CMC substrate of a CMC component, wherein a pico-laser with pulses in the pico-second area is used to roughen or engrave the surface of the CMC substrate.
2. The method according to claim 1, wherein holes, including at least one of round holes, engravings, and grids are produced into the surface of the CMC substrate.
3. A product, produced by a method according to claim 1, which has a ceramic layer on a roughened surface of a substrate, wherein the ceramic layer has a APS applied-like microstructure.
4. The product according to claim 3, wherein the material of the ceramic layer comprises zirconia, 8YSZ, alumina, 48YSZ or a 48YSZ-alumina mixture.
5. The product according to claim 3, wherein the surface of the substrate under the ceramic layer comprises holes, especially including at least one of round holes, elongated engravings, and grids.
6. The product according to claim 5, wherein the depth of the holes 10, engravings or grids are between 50 m to 100 m.
Description
BRIEF DESCRIPTION
[0012] Some of the embodiments will be described in detail, with references to the following Figures, wherein like designations denote like members, wherein:
[0013] The
DETAILED DESCRIPTION
[0014] The substrate 4 is made of a CMC, of an Ox-Ox-CMC, but not limited.
[0015] As described above the surface 5 of the CMC-substrate 4 is roughened or structured by a pico-laser, which leads to no melting of the material of the CMC. Pulses in the pico-second region are used, especially max 900 ps.
[0016] The surface 5 of the CMC-substrate 4 can comprise holes 10 (
[0017] An alternative is to randomly remove locally material from the surface to roughen the surface 5 deeper and additionally (
[0018] Especially a depth of 50 m to 100 m is at least given for the holes 10, engravings 13, 16 or grids 11.
[0019] After that a ceramic layer 7 is applied on which is performed by APS.
[0020] The material of the ceramic layer 7 is zirconia (ZrO.sub.2), stabilized zirconia 8YSZ and/or an alumina sublayer, or alumina or 48YSZ (fully stabilized zirkonia).
[0021] Although the invention has been illustrated and described in greater detail with reference to the preferred exemplary embodiment, the invention is not limited to the examples disclosed, and further variations can be inferred by a person skilled in the art, without departing from the scope of protection of the invention.
[0022] For the sake of clarity, it is to be understood that the use of a or an throughout this application does not exclude a plurality, and comprising does not exclude other steps or elements.