METHOD FOR IMPLANTING SINGLE OR MULTIPLY CHARGED IONS INTO A SURFACE OF A TREATED OBJECT AND DEVICE FOR IMPLEMENTATION OF THE METHOD

Abstract

A method for single or multiply charged ion implantation into a surface of a treated object, and a device for implementing the implantation method, the method including: directing towards the surface of the treated object an ion beam produced by an ion source of the electronic cyclotron resonance type; producing at least one primary electron beam and directing the primary electron beam so that it passes through the ion beam; and producing a secondary electron beam by reflecting the primary electron beam onto a target once the primary electron beam has traversed the ion beam, the target being oriented such that the secondary electron beam falls onto the surface of the treated object.

Claims

1-14. (canceled)

15. A method for implanting single or multiply charged ions into a surface of a treated object, the method comprising: directing towards a surface of the treated object an ion beam produced by an ion source of electronic cyclotron resonance type; producing at least one primary electron beam and directing the primary electron beam to pass through the ion beam; and producing a secondary electron beam by reflection of the primary electron beam onto a target once the primary electron beam has traversed the ion beam, wherein the target is oriented such that the secondary electron beam falls onto the surface of the treated object.

16. The method according to claim 15, wherein the treated object is made of a non-electrically conductive or semiconductor material.

17. The method according to claim 15, wherein the treated object is made of a material chosen from the group: natural and synthetic sapphires, mineral glasses, polymers, ceramics.

18. The method according to claim 16, wherein the treated object is made of a material chosen from the group: natural and synthetic sapphires, mineral glasses, polymers, ceramics.

19. The method according to claim 15, wherein the treated object is made of an electrically conductive material.

20. The method according to claim 16, wherein the treated object is made of an electrically conductive material.

21. The method according to claim 19, wherein the treated object is made of a material chosen from the group: crystalline or amorphous metal alloys, ceramics and precious and non-precious metals.

22. The method according to claim 20, wherein the treated object is made of a material chosen from the group: crystalline or amorphous metal alloys, ceramics and precious and non-precious metals.

23. The method according to claim 15, wherein the atoms that are implanted into the surface of the treated object by the single or multiply charged ECR ion source are chosen from the group: nitrogen N, carbon C, oxygen O, argon Ar, helium He, neon Ne.

24. The method according to claim 23, wherein the nitrogen atoms are obtained by ionization of a dinitrogen precursor gas, the carbon atoms are obtained by ionization of a methane precursor gas, and the oxygen atoms are obtained by ionization of a dioxygen precursor gas.

25. The method according to claim 15, wherein the treated object has a surface temperature which is measured remotely and in real time.

26. The method according to claim 15, wherein an electrical potential of the surface of the treated object or an electrical potential of a table that supports the treated object is measured in real time.

27. The method according to claim 26, wherein the surface of the treated object is treated by at least one ion implantation dose that falls within a range between 1*10.sup.16 ions/cm.sup.2 and 15*10.sup.16 ions/cm.sup.2, and wherein the single or multiply charged ion acceleration voltage is between 7.5 kV and 35 kV.

28. A device for implanting single or multiply charged ions into a surface of a treated object, the device comprising: an ECR ion source and an electron gun, wherein the ECR ion source produces an ion beam and the electron gun produces a primary electron beam, wherein the ECR ion source and the electron gun are arranged such that the primary electron beam intercepts the ion beam, wherein the single or multiply charged ion implantation device further comprises a target placed on the path of the primary electron beam once the primary electron beam has passed through the ion beam, wherein the target is oriented such that a secondary electron beam, produced by collision between the electrons of the primary electron beam which have not recombined with the ions of the ion beam and the target, impinges on the surface of the treated object.

29. The device for implanting single or multiply charged ions according to claim 28, wherein the secondary electron beam also impinges on a table on which the treated object is placed.

30. The device for implanting single or multiply charged ions according to claim 29, further comprising a temperature sensor for measuring remotely and in real time surface temperature of the treated object.

31. The device for implanting single or multiply charged ions according to claim 29, further comprising an instrument for measuring an electrical potential of the surface of the treated object and/or of a table that supports the treated object.

32. The device for implanting single or multiply charged ions according to claim 30, further comprising an instrument for measuring an electrical potential of the surface of the treated object and/or of a table that supports the treated object.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

[0037] Other features and advantages of the present invention will appear more clearly in the following detailed description of an example implementation of the method according to the invention, this example being given simply by way of non-limiting illustration in conjunction with the annexed drawing, in which:

[0038] FIG. 1, cited above, is a schematic view of a single or multiply charged ECR ion source according to the prior art.

[0039] FIG. 2 is a schematic view which illustrates an ion beam at the exit of the single or multiply charged ECR ion source illustrated in FIG. 1.

[0040] FIG. 3 is a schematic view of a device for implanting single or multiply charged ions into the surface of a treated object according to the invention.

[0041] FIG. 4 is a schematic view which illustrates an ion beam at the exit of the single or multiply charged ion source device according to the invention illustrated in FIG. 3.

DETAILED DESCRIPTION OF ONE EMBODIMENT OF THE INVENTION

[0042] The present invention proceeds from the general inventive idea which consists in cancelling out all or part of the electrostatic charge of ions produced by a source of single or multiply charged ions of the ECR type before said ions impinge on the surface of the treated object. By reducing the electrostatic charge of said ions, the latter repel each other less, so that the beam that they form diverges less. Likewise, the atoms (whether neutral or ionised) that impinge on the surface of the treated object are repelled less by the ions already implanted in said surface, so that a more homogeneous surface coating is obtained for the treated object. To achieve this result, the present invention teaches directing an electron beam towards the ion beam. On passing through the ion beam, the electrons recombine with said ions and reduce or cancel out the electrostatic charge of the latter. To reinforce this effect, the present invention proposes placing a target on the path of the electrons once the latter have passed through the ion beam, so that the electrons are redirected towards the surface of the treated object and also contribute to the reduction or cancellation of the electrostatic charges of the ions already implanted in the surface of the treated object. It is an object of the present invention to treat the surface of objects by implanting ions and cancelling out charges in order to improve physical properties, especially mechanical properties (increased surface hardness of objects) and optical properties (reduced surface reflection of the objects made of transparent material).

[0043] FIG. 3 is a schematic view of a device for implantation of single or multiply charged ions into the surface of a treated object according to the invention. Designated as a whole by the general reference numeral 14, this ion implantation device includes an ECR ion source 1 of the same type as that illustrated in FIG. 1.

[0044] According to the invention, there is associated with this ECR ion source 1 an electron gun designated as a whole by the general reference numeral 16. As is known, an electron gun is a device for producing an electron beam by extracting electrons from a conductive material to a vacuum in which they are accelerated by an electrical field.

[0045] In the case that concerns us, a cold field emission electron gun is preferably used. To this end, electron gun 16 includes an anode 18, for example made of graphite, in which is arranged an orifice 20, and a metal cathode 22 in the form of a very fine tip 24. A high electrical voltage is applied by means of an electric generator 26 between anode 18 and metal cathode 22. Under the effect of this high voltage, a very intense electrical field is produced by point effect at the end of metal cathode 22. This intense electrical field allows electrons to be extracted by tunnel effect from tip 24 of metal cathode 22 and to be accelerated to create an electron beam 28 which propagates as it passes through orifice 20 arranged in anode 18. For reasons that will appear below, the electrons emitted by electron gun 16 will be called primary electrons.

[0046] According to a variant, the extraction of electrons from tip 24 of metal cathode 22 can be heat assisted.

[0047] According to the invention, the electron beam 28 produced by electron gun 16 is oriented so that it passes through ion beam 12. On passing through ion beam 12, some of the primary electrons recombine with the ions, which causes a reduction, or cancellation of the electrical charge of said ions, so that, very often, it is neutral atoms (or at least atoms with a lower electrostatic charge) which, carried by their kinetic energy, will impinge on the surface of a treated object 30.

[0048] According to a complementary feature of the invention, there is arranged on the path of primary electron beam 28 a target 32, onto which fall the primary electrons that have not recombined with the ions after passing through ion beam 12. Target 32 is oriented such that a secondary electron beam 34, produced by the collision between the electrons of primary electron beam 28 and target 32, impinges on the surface of treated object 30 and a table 36 on which treated object 30 is placed. In this case too, the electrons of secondary electron beam 34 cancel out or reduce the electrostatic charge of the ions implanted into the surface of the treated object.

[0049] According to yet another feature of the invention, the surface temperature of treated object 30 is measured remotely and in real time by means of a temperature sensor 38. A temperature sensor well suited for measuring the surface temperature of a sapphire object is that sold by the French company LumaSense Technologies under the reference IN 5/9 Plus.

[0050] According to yet another feature of the invention, the electrical potential of the surface of treated object 30, or the electrical potential of a table that supports treated object 30, is measured in real time by means of an electric voltage measuring instrument 40.

[0051] The invention also concerns a device for implantation of single or multiply charged ions into a surface of a treated object, this device comprising an ECR ion source 1, and an electron gun 16, ECR ion source 1 producing an ion beam 12 and the electron gun producing a primary electron beam 28, ECR ion source 1 and electron gun 16 being arranged such that primary electron beam 28 intercepts ion beam 12.

[0052] The single or multiply charged ion implantation device also includes a target 32 placed on the path of primary electron beam 28 once the latter has passed through ion beam 12. Target 32 is oriented such that a secondary electron beam 34, produced by the collision between the electrons of primary electron beam 28 and target 32, impinges on the surface of treated object 30 and a table 36 on which treated object 30 is placed.

[0053] The single or multiply charged ion implantation device also includes a temperature sensor 38 for measuring remotely and in real time the surface temperature of treated object 30.

[0054] The implantation device of single or multiply charged ions also includes an instrument 40 for measuring the electrical potential of the surface of treated object 30 and/or of table 36 that supports treated object 30.

[0055] The aspect of ion beam 12 produced at the exit of ECR ion source 1 after interception by primary electron beam 28 is illustrated in FIG. 4 annexed to the present Patent Application. It is noted that this ion beam 12 diverges very little, if at all, on exiting ECR ion source 1, which can be explained by the fact that the electrical charge of a large number of ions (marked +) is cancelled out or reduced by the recombination of electrons (marked ) of primary electron beam 28 with ions of ion beam 12. Since the divergence of primary electron beam 28 is at least greatly reduced, the homogeneity of distribution of multiply charged ions at the surface of treated object 30 is substantially improved.

[0056] It is evident that the present invention is not limited to the embodiments that have just been described and that various simple modifications and variants can be envisaged by those skilled in the art without departing from the scope of the invention as defined by the annexed claims. It will be noted, in particular, that the ion implantation dose used lies within a range comprised between 1*10.sup.16 ions/cm.sup.2 and 15*10.sup.16 ions/cm.sup.2 and that the single or multiply charged ion acceleration voltage is comprised between 7.5 kV and 35 kV. It will also be understood that the present invention applies more particularly, but not exclusively, to the surface treatment of sapphire objects (natural or synthetic sapphire) for the production of watch crystals. As a result of the ion implantation method according to the invention, the amount of incident light reflected by such crystals is considerably reduced, which significantly improves the readability of information displayed by the indicator members (hands, date indication, decorations, etc.) placed under such crystals. The present invention also applies to other types of materials (for example ceramics or crystalline or amorphous metal materials) whose mechanical properties, especially scratch-resistance, are greatly improved when the ion implantation and charge neutralisation method is applied thereto. It will also be noted that the secondary electron beam includes both electrons from the primary electron beam and electrons extracted from the target by the electrodes of the primary electron beam. It will be noted finally that, according to the invention, the ECR ion source is capable of producing single or multiply charged ions, i.e. ions whose degree of ionisation is higher than or equal to 1, wherein the ion beam can include ions that all have the same degree of ionisation or can result from a mixture of ions having different degrees of ionisation.

NOMENCLATURE

[0057] 1. Electronic cyclotron resonance (ECR) ion source [0058] 2. Injection stage [0059] 4. Volume of gas to be ionised [0060] 6. Hyperfrequency wave [0061] 8. Magnetic confinement stage [0062] 10. Plasma [0063] 11. Extraction stage [0064] 11a Anode [0065] 11b. Cathode [0066] 12. Ion beam [0067] 14. Ion implantation device [0068] 16. Electron gun [0069] 18. Anode [0070] 20. Orifice [0071] 22. Metal cathode [0072] 24. Tip [0073] 26. Electric generator [0074] 28. Primary electron beam [0075] 30. Treated object [0076] 32. Target [0077] 34. Secondary electron beam [0078] 36. Table [0079] 38. Temperature sensor [0080] 40. Electric voltage measuring instrument