USE OF A FLAT GLASS IN ELECTRONIC COMPONENTS

Abstract

A method of producing an electronic component is provided. The method includes providing flat glass having a dielectric constant of less than 4.3 and a dielectric loss factor of 0.004 or less at 5 GHz; configuring the flat glass as one of an interposer, a substrate, or a superstrate; and forming the interposer, the substrate, or the superstrate into the electronic component. The electronic component can be an antenna, a patch antenna, an array of antennas, a phase shifter element, and a liquid crystal-based phase shifter element.

Claims

1. A method of producing an electronic component, comprising: providing flat glass having a dielectric constant of less than 4.3 and a dielectric loss factor of 0.004 or less at 5 GHz; configuring the flat glass as one of an interposer, a substrate, or a superstrate; and forming the interposer, the substrate, or the superstrate into the electronic component, wherein the electronic component is selected from a group consisting of an antenna, a patch antenna, an array of antennas, a phase shifter element, and a liquid crystal-based phase shifter element.

2. The method of claim 1, wherein the step of providing the flat glass comprises providing glass having a content of oxides of network formers of not more than 98 mol % in total.

3. The method of claim 2, wherein the step of providing the flat glass further comprises providing the glass a content of SiO.sub.2 between 76 mol % and 85 mol %.

4. The method of claim 2, wherein the oxides of network formers comprises oxides of silicon and/or boron.

5. The method of claim 1, wherein the step of providing the flat glass comprises providing glass having a B.sub.2O.sub.3 content between 10 mol % and 25 mol % and/or a content of SiO.sub.2 and B.sub.2O.sub.3 where (SiO.sub.2+B.sub.2O.sub.3) is 92 mol % to 98 mol %.

6. The method of claim 1, wherein the step of providing the flat glass comprises providing glass having R.sub.2O between 1 mol % and 5 mol %, wherein R.sub.2O stands for alkali metal oxides.

7. The method of claim 1, wherein the step of providing the flat glass comprises providing glass having a ratio of molar amount of B.sub.2O.sub.3/SiO.sub.2 that is 0.12 to 0.35.

8. The method of claim 1, wherein the step of providing the flat glass comprises providing glass having a ratio of molar amount where (Me.sub.xO.sub.y)/((SiO.sub.2+B.sub.2O.sub.3) is 0.02 to 0.10, wherein Me is selected from a group consisting of an alkali metal, an alkaline earth metal, and aluminum.

9. The method of claim 1, wherein the step of providing the flat glass comprises providing glass having a ratio of weight fractions of ions of iron that satisfies 0.1Fe.sup.2+/(Fe.sup.2++Fe.sup.3+)0.3, wherein a total content of iron ions is less than 200 ppm based on mass.

10. The method of claim 9, wherein the glass comprises (1*Fe+300*Co+70*Ni+50*Cr+20*Cu+5*Mn+2*V) [ppm by mass] that is less than 200 ppm, wherein a total content of metals is considered irrespective of an oxidation state thereof.

11. The method of claim 1, wherein the flat glass has a transformation temperature between 450 C. and 550 C.; and/or has a viscosity , wherein Ig has a value of 4 at temperatures between 1000 C. and 1320 C.

12. The method of claim 1, wherein the flat glass exhibits a value of chemical resistance against water according to DIN ISO 719 class HGB 1; exhibits a value of chemical resistance against acids according to DIN 12116 class S 1 W; and exhibits a value of chemical resistance against alkalis according to DIN ISO 695 class A3 or better.

13. The method of claim 1, wherein the step of providing the flat glass comprises providing glass comprising the following constituents: SiO.sub.2 72 mol % to 85 mol %, B.sub.2O.sub.3 10 mol % to 25 mol %, Al.sub.2O.sub.3 0.2 mol % to 2.5 mol %, Na.sub.2O 0.5 mol % to 5.0 mol %, K.sub.2O 0 mol % to 1.0 mol %, and Li.sub.2O 0 mol % to 1.5 mol %.

14. The method of claim 13, wherein the SiO.sub.2 is from 76 mol % to 85 mol % and the B.sub.2O.sub.3 is from 10 mol % to 22 mol %.

15. The method of claim 13, wherein the Na.sub.2O, K.sub.2O, and Li.sub.2O amount to less than 5 mol % in total.

16. The method of claim 1, wherein the flat glass exhibits a total thickness variance of less than 10 m over a surface area of 100,000 mm.sup.2.

17. The method of claim 1, wherein the flat glass exhibits a total thickness variance of less than 5 m over a surface area of 100,000 mm.sup.2.

18. The method of claim 1 wherein the flat glass has a roughness value of less than 2 nm.

19. The method of claim 1, wherein the step of providing the flat glass further comprises fire-polishing surfaces of the flat glass.

20. The method of claim 1, wherein the flat glass, at a thickness of 1 mm, exhibits a transmittance to electromagnetic radiation selected from: a group consisting of 20% or more at a wavelength of 254 nm, 60% or more at the wavelength of 254 nm, 85% or more at the wavelength of 254 nm, and 88% or more at the wavelength of 254 nm; and/or a group consisting of 82% or more at a wavelength of 300 nm, 90% or more at the wavelength of 300 nm, and 91% or more at the wavelength of 300 nm; and/or a group consisting of 90% or more at a wavelength of 350 nm and 91% or more at the wavelength of 350 nm; and/or a group consisting of 92% or more at a wavelength of 546 nm and 92.5% or more at the wavelength of 546 nm; and/or a group consisting of 92.5% or more at a wavelength of 1400 nm and 93% or more at the wavelength of 1400 nm; and/or a group consisting of 91.5% or more in a wavelength range from 380 nm to 780 nm and 92% or more in the wavelength range from 380 nm to 780 nm; and/or a group consisting of 92.5% or more in a wavelength range from 780 nm to 1500 nm and 93% or more in the wavelength range from 780 nm to 1500 nm.

21. The method of claim 1, wherein the step of providing the flat glass further comprises producing the flat glass by a melting process with a subsequent hot forming process.

22. The method of claim 21, wherein the subsequent hot forming process is selected from a group consisting of a float process, a rolling process, a drawing process, a down-draw process, an overflow fusion down-draw process, an up-draw process, and a Foucault process.

Description

EXAMPLES

[0095] A flat glass according to one embodiment has the following composition, in % by weight:

TABLE-US-00003 SiO.sub.2 80.9 wt % B.sub.2O.sub.3 15.1 wt % Al.sub.2O.sub.3 1.1 wt % Na.sub.2O 2.8 wt %

[0096] Dielectric loss factor tan 6 is 0.0026 at 1 GHz, 0.0028 at 2 GHz, and 0.0033 at 5 GHz. Dielectric constant E is 4.1.

[0097] A flat glass according to a further embodiment has the following composition, in % by weight:

TABLE-US-00004 SiO.sub.2 81.7 wt % B.sub.2O.sub.3 14.7 wt % Al.sub.2O.sub.3 1.1 wt % Na.sub.2O 1.2 wt % K.sub.2O 0.9 wt % Li.sub.2O 0.4 wt %

[0098] Dielectric loss factor tan is 0.0025 at 5 GHz. Dielectric constant E is 4.1.

[0099] A flat glass according to yet another embodiment has the following composition, in % by weight:

TABLE-US-00005 SiO.sub.2 74.9 wt % B.sub.2O.sub.3 21.8 wt % Al.sub.2O.sub.3 1.1 wt % Na.sub.2O 1.1 wt % K.sub.2O 0.8 wt % Li.sub.2O 0.5 wt %

[0100] Dielectric loss factor tan is 0.0017 at 5 GHz. Dielectric constant E is 3.94.