POTENTIAL OF HYDROGEN (pH) STABILIZED CLEANING FORMULATIONS

Abstract

A microemulsion cleaning solution, including: water; a solvent; an oxidizing agent, wherein the oxidizing agent comprises a peroxide; a pH stabilizing system, wherein the pH stabilizing system comprises a first buffering agent and a second buffering agent; a surfactant; an optional colorant; and an optional fragrance.

Claims

1. A microemulsion cleaning solution, comprising: water; a solvent; an oxidizing agent, wherein the oxidizing agent comprises a peroxide; a pH stabilizing system, wherein the pH stabilizing system comprises a first buffering agent and a second buffering agent; a surfactant; an optional colorant; and an optional fragrance.

2. The cleaning solution according to claim 1, wherein the solvent comprises glycol ether.

3. The cleaning solution according to claim 1, wherein the peroxide is selected from the group consisting of an inorganic peroxide and an organic peroxide.

4. The cleaning solution according to claim 1, wherein the peroxide comprises hydrogen peroxide.

5. The cleaning solution according to claim 1, wherein the first buffering agent comprises a weak acid and the second buffering agent comprises a conjugate base.

6. The cleaning solution according to claim 1, wherein the first buffering agent is a weak polyprotic acid.

7. The cleaning solution according to claim 1, wherein the first buffering agent is a weak triprotic acid.

8. The cleaning solution according to claim 1, wherein the first buffering agent is a compound represented by the structure of formula (I): ##STR00006##

9. The cleaning solution according to claim 1, wherein the first buffering agent is selected from the group consisting of acetic acid, benzoic acid, carbonic acid, citric acid, formic acid, glutamic acid, hydrosulfuric acid, methanic acid, nitrous acid, oxalic acid, phosphoric acid, sulfurous acid, and tartaric acid.

10. The cleaning solution according to claim 1, wherein the second buffering agent is a conjugate base of a weak polyprotic acid.

11. The cleaning solution according to claim 1, wherein the second buffering agent is a conjugate base of a weak triprotic acid.

12. The cleaning solution according to claim 1, wherein the second buffering agent is a compound represented by the structure of formula (II): ##STR00007## wherein X is a counter cation.

13. The cleaning solution according to claim 1, wherein the second buffering agent is at least one compound represented by the structures of formulae (II) and ##STR00008## wherein X is independently selected from the group consisting of Li.sup.+, Na.sup.+, K.sup.+, Rb.sup.+, and Cs.sup.+.

14. The cleaning solution according to claim 1, wherein the pH stabilizing system enables the cleaning solution to exhibit a pH of greater than or equal to approximately 2.0 for a non-diluted formulation and a pH of approximately 2.5 when diluted between 10:1 and 30:1 with EPA defined hard water.

15. The cleaning solution according to claim 1, wherein the pH stabilizing system enables the cleaning solution to exhibit a pH of greater than or equal to approximately 2.0 for a non-diluted formulation and a pH of approximately 2.5 when diluted to 25.6:1 with EPA defined hard water.

16. The cleaning solution according to claim 1, wherein the surfactant comprises a non-ionic surfactant, an anionic surfactant, a cationic surfactant, a zwitterionic surfactant, and combinations thereof.

17. The cleaning solution according to claim 1, wherein the optional colorant is D-limonene, and/or orange oil.

18. The cleaning solution according to claim 1, wherein the optional fragrance is D-limonene, and/or orange oil.

19. A cleaning solution, consisting of: from approximately 75% to approximately 98% by weight water; from approximately 0.5% to approximately 10% by weight a solvent, wherein the solvent is di(propylene glycol) methyl ether; from approximately 0.5% to approximately 8.0% an oxidizing agent, wherein the oxidizing agent is hydrogen peroxide; from approximately 0.0001% to approximately 7.0% a pH stabilizing system, wherein the stabilizing system comprises phosphoric acid and a conjugate base thereof; from approximately 0.5% to approximately 15.00% a surfactant; from approximately 0.5% to approximately 5.00% a colorant/fragrance; and wherein any remainder comprises one or more adjunct agents.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

[0036] Certain embodiments of the present invention are illustrated by the accompanying figures. It will be understood that the figures are not necessarily to scale and that details not necessary for an understanding of the invention or that render other details difficult to perceive may be omitted.

[0037] It will be further understood that the invention is not necessarily limited to the particular embodiments illustrated herein.

[0038] The invention will now be described with reference to the drawings wherein:

[0039] FIG. 1 of the drawings is a .sup.1H-NMR spectrogram of a first pH buffering agent (phosphoric acid);

[0040] FIG. 2 of the drawings is a .sup.1H-NMR spectrogram of a second pH buffering agent (dihydrogen phosphate); and

[0041] FIG. 3 of the drawings is a .sup.1H-NMR spectrogram of a second pH buffering agent (monohydrogen phosphate).

DETAILED DESCRIPTION OF THE INVENTION

[0042] While this invention is susceptible of embodiment in many different forms, there is shown in the structural formulas and described herein in detail several specific embodiments with the understanding that the present disclosure is to be considered as an exemplification of the principles of the invention and is not intended to limit the invention to the embodiments illustrated. It will be understood that the structural formulas disclosed herein are intended to comprise all stereochemical configurations regardless of graphical representations.

[0043] In accordance with the present invention, peroxide-based cleaning, bleaching, degreasing, sanitizing, and/or disinfecting solutions are disclosed herein that are pH stabilized using a two-component buffer system. Preferably, the pH stabilizing system enables the cleaning solution to exhibit a pH of greater than or equal to approximately (i.e., +/?10 percent) 2.0 for a non-diluted formulation and a pH of approximately (i.e., +/?10 percent) 2.5 when diluted between 10:1 and 30:1 with EPA defined hard water, and more preferably the pH stabilizing system enables the cleaning solution to exhibit a pH of greater than or equal to approximately (i.e., +/?10 percent) 2.0 for a non-diluted formulation and a pH of approximately (i.e., +/?10 percent) 2.5 when diluted to 25.6:1 with EPA defined hard water. It will be understood, that unless specified otherwise, the term approximately, as used herein, will be defined as the value, number, and/or integer+/?10 percent.

[0044] In one embodiment of the present invention, the microemulsion cleaning solution comprises: water; a solvent, an oxidizing agent, a pH stabilizing system having a first buffering agent and a second buffering agent, a surfactant, an optional colorant, and an optional fragrance. In accordance with the present invention the cleaning solution preferably comprises a thermodynamically stable emulsion, microemulsion, nanoemulsion, and/or a Winsor type IV emulsion.

[0045] For purposes of the present disclosure, the solvent of the solution may comprise one or more of any one of a number of common, commercially available solvents, including polar solvents and/or non-polar solvents. Specific examples of preferred solvents include, for example, glycol ether, d-limonene, orange oil, hexane, acetone, methyl ethyl ketone, toluene, benzene, ethers, 3-methylsulfolane, glutaronitrile, dimethyl sulfoxide, dimethyl formamide, acetonitrile, polyethers including tetraglyme, alcohols including ethoxyethanol, nitriles including 3-hydroxypropionitrile, 2-methylglutaronitrile, ketones including 2-acetylbutyrolactone, cyclopentanone, cyclic esters including beta-propiolactone, gamma-butyrolactone, gamma-valerolactone, propylene carbonate, ethylene carbonate and homogenous mixtures of the same. While specific solvents have been disclosed, for illustrative purposes only, as being suitable solvents, numerous other solvents that would be known to those having ordinary skill in the art having the present disclosure before them are likewise contemplated for use. Indeed, it will be understood that non-liquid or polymer type media are suitable for use in accordance with the present invention. Preferably, the solvent is present in a concentration ranging from approximately (i.e., +/?10 percent) 60 percent by weight to approximately (i.e., +/?10 percent) 98 percent by weight, and more preferably from approximately (i.e., +/?10 percent) 75 percent by weight to approximately (i.e., +/?10 percent) 98 percent by weight.

[0046] In one embodiment of the present invention, the oxidizing agent comprises a peroxide, such an inorganic peroxide (e.g., hydrogen peroxide, 35% aqueous hydrogen peroxide commercially available from Sigma-Aldrich) and/or an organic peroxide. Preferably, the oxidizing agent is present in a concentration ranging from approximately (i.e., +/?10 percent) 0.5 percent by weight to approximately (i.e., +/?10 percent) 25.0 percent by weight, and more preferably from approximately (i.e., +/?10 percent) 0.5 percent by weight to approximately (i.e., +/?10 percent) 8.0 percent by weight.

[0047] For purposes of the present disclosure, the pH stabilizing system comprises a first buffering agent and a second buffering agent. In a preferred implementation of the present invention, the first buffering agent comprises a weak acid and the second buffering agent comprises a conjugate base. Preferably, first buffering agent is a weak polyprotic acid, and more preferably the first buffering agent is a weak triprotic acid.

[0048] In one embodiment of the present invention, the first buffering agent is a compound represented by the structure of formula (I):

##STR00003##

[0049] In certain alternative embodiments, the first buffering agent is preferably selected from the group consisting of acetic acid, benzoic acid, carbonic acid, citric acid, formic acid, glutamic acid, hydrosulfuric acid, methanic acid, nitrous acid, oxalic acid, phosphoric acid, sulfurous acid, and/or tartaric acid.

[0050] In a preferred embodiment of the present invention, the second buffering agent is a conjugate base of a weak polyprotic acid, preferably a weak triprotic acid.

[0051] In one embodiment of the present invention, the second buffering agent comprises one or more compounds represented by the structure of formula (II):

##STR00004##

wherein X is a counter cation (e.g., Li.sup.+, Na.sup.+, K.sup.+, Rb.sup.+, and Cs.sup.+).

[0052] In another embodiment of the present invention, the second buffering agent comprises one or more compounds represented by the structure of formula (III):

##STR00005##

wherein X is a counter cation (e.g., Li.sup.+, Na.sup.+, K.sup.+, Rb.sup.+, and Cs.sup.+).

[0053] Preferably, the pH stabilizing system is present in a concentration ranging from approximately (i.e., +/?10 percent) 0.0001 percent by weight to approximately (i.e., +/?10 percent) 7.00 percent by weight, and more preferably from approximately (i.e., +/?10 percent) 0.001 percent by weight to approximately (i.e., +/?10 percent) 2.00 percent by weight.

[0054] For purposes of the present disclosure, the cleaning solution comprises one or more surfactants, such as, but not limited to, a non-ionic surfactant, an anionic surfactant, a cationic surfactant, a zwitterionic surfactant, and combinations thereof.

[0055] Non-limiting examples of preferred anionic surfactants include taurates; isethionates; alkyl and alkyl ether sulfates; succinamates; alkyl sulfonates, alkylaryl sulfonates; olefin sulfonates; alkoxy alkane sulfonates; sodium and potassium salts of fatty acids derived from natural plant or animal sources or synthetically prepared; sodium, potassium, ammonium, and alkylated ammonium salts of alkylated and acylated amino acids and peptides; alkylated sulfoacetates; alkylated sulfosuccinates; acylglyceride sulfonates, alkoxyether sulfonates; phosphoric acid esters; phospholipids; and combinations thereof. Specific anionic surfactants contemplated for use include, but are by no means limited to, ammonium cocoyl isethionate, sodium cocoyl isethionate, sodium lauroyl isethionate, sodium stearoyl isethionate, sodium lauroyl sarcosinate, sodium cocoyl sarcosinate, sodium lauryl sarcosinate, disodium laureth sulfosuccinate, sodium lauryl sulfoacetate, sodium cocoyl glutamate, TEA-cocoyl glutamate, TEA cocoyl alaninate, sodium cocoyl taurate, potassium cetyl phosphate.

[0056] Non-limiting examples of preferred cationic surfactants include alkylated quaternary ammonium salts R.sub.4NX; alkylated amino-amides (RCONH(CH.sub.2).sub.n)NR.sub.3X; alkylimidazolines; alkoxylated amines; and combinations thereof. Specific examples of anionic surfactants contemplated for use include, but are by no means limited to, cetyl ammonium chloride, cetyl ammonium bromide, lauryl ammonium chloride, lauryl ammonium bromide, stearyl ammonium chloride, stearyl ammonium bromide, cetyl dimethyl ammonium chloride, cetyl dimethyl ammonium bromide, lauryl dimethyl ammonium chloride, lauryl dimethyl ammonium bromide, stearyl dimethyl ammonium chloride, stearyl dimethyl ammonium bromide, cetyl trimethyl ammonium chloride, cetyl trimethyl ammonium bromide, lauryl trimethyl ammonium chloride, lauryl trimethyl ammonium bromide, stearyl trimethyl ammonium chloride, stearyl trimethyl ammonium bromide, lauryl dimethyl ammonium chloride, stearyl dimethyl cetyl ditallow dimethyl ammonium chloride, dicetyl ammonium chloride, dilauryl ammonium chloride, dilauryl ammonium bromide, distearyl ammonium chloride, distearyl ammonium bromide, dicetyl methyl ammonium chloride, dicetyl methyl ammonium bromide, dilauryl methyl ammonium chloride, distearyl methyl ammonium chloride, distearyl methyl ammonium bromide, ditallow dimethyl ammonium chloride, ditallow dimethyl ammonium sulfate, di(hydrogenated tallow) dimethyl ammonium chloride, di(hydrogenated tallow) dimethyl ammonium acetate, ditallow dipropyl ammonium phosphate, ditallow dimethyl ammonium nitrate, di(coconutalkyl)dimethyl ammonium chloride, di(coconutalkyl)dimethyl ammonium bromide, tallow ammonium chloride, coconut ammonium chloride, stearamidopropyl PG-imonium chloride phosphate, stearamidopropyl ethyldimonium ethosulfate, stearimidopropyldimethyl (myristyl acetate) ammonium chloride, stearamidopropyl dimethyl cetearyl ammonium tosylate, stearamidopropyl dimethyl ammonium chloride, stearamidopropyl dimethyl ammonium lactate, ditallowyl oxyethyl dimethyl ammonium chloride, behenamidopropyl PG dimonium chloride, dilauryl dimethyl ammonium chloride, distearly dimethyl ammonium chloride, dimyristyl dimethyl ammonium chloride, dipalmityl dimethyl ammonium chloride, distearyl dimethyl ammonium chloride, stearamidoproyl PG-dimonium chloride phosphate, stearamidopropyl ethyldiammonium ethosulfate, stearamidopropyl dimethyl (myristyl acetate) ammonium chloride, stearimidopropyl diemthyl cetaryl ammonium tosylate, stearamido propyl dimethyl ammonium chloride, stearamidopropyl dimethyl ammonium lactate.

[0057] Non-limiting examples of preferred non-ionic surfactants include alcohols, alkanolamides, amine oxides, esters (including glycerides, ethoxylated glycerides, polyglyceryl esters, sorbitan esters, carbohydrate esters, ethoxylated carboxylic acids, phosphoric acid triesters), ethers (including ethoxylated alcohols, alkyl glucosides, ethoxylated polypropylene oxide ethers, alkylated polyethylene oxides, alkylated polypropylene oxides, alkylated PEG/PPO copolymers), silicone copolyols. Specific examples of non-ionic surfactants contemplated for use include, but are by no means limited to, cetearyl alcohol, ceteareth-20, nonoxynol-9, C12-15 pareth-9, POE(4) lauryl ether, cocamide DEA, glycol distearate, glyceryl stearate, PEG-100 stearate, sorbitan stearate, PEG-8 laurate, polyglyceryl-10 trilaurate, lauryl glucoside, octylphenoxy-polyethoxyethanol, PEG-4 laurate, polyglyceryl diisostearate, polysorbate-60, PEG-200 isostearyl palmitate, sorbitan monooleate, polysorbate-80.

[0058] Non-limiting examples of preferred zwitterionic or amphoteric surfactants include betaines; sultaines; hydroxysultaines, amido betaines, amidosulfo betaines; and combinations thereof. Specific examples of amphoteric surfactants contemplated for use include, but are by no means limited to, cocoamidopropyl sultaine, cocoamidopropyl hydroxyl sultaine, cocoamidopropylbetaine, coco dimethyl carboxymethyl betaine, lauryl dimethyl carboxymethyl betaine, lauryl dimethyl alphacarboxyethyl betaine, cetyl dimethyl carboxymethyl betaine, cetyl dimethyl betaine, lauryl (2-bishydroxy) carboxymethyl betaine, stearyl bis-(2-hydroxyethyl) carboxymethyl betaine, oelyl dimethyl gamma-carboxypropyl betaine, lauryl bis-(2-hydroxypropyl)alpha carboxymethyl betaine, coco dimethyl sulfopropyl betaine, stearyl dimethyl sulfopropyl betaine, lauryl dimethyl sulfoethyl betaine, lauryl bis(2-hydroxyethyl) sulfopropyl betaine, oleyl betaine, cocamidopropyl betaine.

[0059] Preferably, surfactant(s) are present in a concentration ranging from approximately (i.e., +/?10 percent) 0.05 percent by weight to approximately (i.e., +/?10 percent) 25 percent by weight, and more preferably from approximately (i.e., +/?10 percent) 0.5 percent by weight to approximately (i.e., +/?10 percent) 15 percent by weight.

[0060] In one preferred embodiment of the present invention, the cleaning solutions/formulations may comprise one or more adjunct agents including, but not limited to, herbal additives, anti-oxidants, buffers, scents, fragrances, colorants, and/or stabilizers.

[0061] Preferably, adjunct agent(s) are present in a concentration ranging from approximately (i.e., +/?10 percent) 0.05 percent by weight to approximately (i.e., +/?10 percent) 25 percent by weight, and more preferably from approximately (i.e., +/?10 percent) 0.5 percent by weight to approximately (i.e., +/?10 percent) 5 percent by weight.

[0062] It will be understood that other weights, weight ratios, and ranges are obtainable from the Examples provided hereinbelow. Provided below are non-limiting examples of cleaning solution formulations in accordance with the present invention.

Example 1

[0063]

TABLE-US-00001 Ingredient Name Phase Amount (% by Wt.) Water A q.s. to 100 Hydrogen peroxide A 4.000 Phosphoric Acid A 0.002 Dihydrogen Phosphate A 0.002 Surfactant A 4.300 Glycol Ether DPM A 4.000

Example 2

[0064]

TABLE-US-00002 Ingredient Name Phase Amount (% by Wt.) Water A q.s. to 100 Hydrogen peroxide A 8.000 Phosphoric Acid A 0.003 Dihydrogen Phosphate A 0.003 Surfactant A 5.000 Orange Oil A 3.500

Example 3

[0065]

TABLE-US-00003 Ingredient Name Phase Amount (% by Wt.) Water A q.s. to 100 Hydrogen peroxide A 8.000 Phosphoric Acid A 0.003 Dihydrogen Phosphate A 0.003 Surfactant A 5.000 Orange Oil A 1.800

TABLE-US-00004 Ingredient Name Phase Amount (% by Wt.) Water A q.s. to 100 Hydrogen peroxide A 8.000 Phosphoric Acid A 0.003 Dihydrogen Phosphate A 0.003 Surfactant A 4.750 Orange Oil A 3.500

Example 4

Example 5

[0066]

TABLE-US-00005 Ingredient Name Phase Amount (% by Wt.) Water A q.s. to 100 Hydrogen peroxide A 4.000-10.000 Phosphoric Acid A 0.001-0.005 Dihydrogen Phosphate A 0.001-0.005 Surfactant A 2.000-10.000 Orange Oil A 1.000-10.000

[0067] Procedure:

[0068] 1. PHASE A in main vessel, add Phase A ingredients one at a time and mix until completely dissolved and uniform. A Silverson L5M-A homogenizer at 5,000 RPM expedites formation of the stable, homogenous dispersion/emulsion.

[0069] It will be further understood that any reference to compounds disclosed herein includes salts and/or solvates of the same.

[0070] The foregoing description merely explains and illustrates the invention and the invention is not limited thereto except insofar as the appended claims are so limited, as those skilled in the art who have the disclosure before them will be able to make modifications without departing from the scope of the invention.

[0071] While certain embodiments have been illustrated and described, it should be understood that changes and modifications can be made therein in accordance with ordinary skill in the art without departing from the technology in its broader aspects as defined in the following claims.

[0072] The embodiments, illustratively described herein may suitably be practiced in the absence of any element or elements, limitation or limitations, not specifically disclosed herein. Thus, for example, the terms comprising, including, containing, etcetera shall be read expansively and without limitation. Additionally, the terms and expressions employed herein have been used as terms of description and not of limitation, and there is no intention in the use of such terms and expressions of excluding any equivalents of the features shown and described or portions thereof, but it is recognized that various modifications are possible within the scope of the claimed technology. Additionally, the phrase consisting essentially of will be understood to include those elements specifically recited and those additional elements that do not materially affect the basic and novel characteristics of the claimed technology. The phrase consisting of excludes any element not specified.

[0073] The present disclosure is not to be limited in terms of the particular embodiments described in this application. Many modifications and variations can be made without departing from its spirit and scope, as will be apparent to those skilled in the art. Functionally equivalent methods and compositions within the scope of the disclosure, in addition to those enumerated herein, will be apparent to those skilled in the art from the foregoing descriptions. Such modifications and variations are intended to fall within the scope of the appended claims. The present disclosure is to be limited only by the terms of the appended claims, along with the full scope of equivalents to which such claims are entitled. It is to be understood that this disclosure is not limited to particular methods, reagents, compounds compositions or biological systems, which can of course vary. It is also to be understood that the terminology used herein is for the purpose of describing particular embodiments only, and is not intended to be limiting.

[0074] In addition, where features or aspects of the disclosure are described in terms of Markush groups, those skilled in the art will recognize that the disclosure is also thereby described in terms of any individual member or subgroup of members of the Markush group.

[0075] As will be understood by one skilled in the art, for any and all purposes, particularly in terms of providing a written description, all ranges disclosed herein also encompass any and all possible subranges and combinations of subranges thereof. Any listed range can be easily recognized as sufficiently describing and enabling the same range being broken down into at least equal halves, thirds, quarters, fifths, tenths, etcetera. As a non-limiting example, each range discussed herein can be readily broken down into a lower third, middle third and upper third, etcetera. As will also be understood by one skilled in the art all language such as up to, at least, greater than, less than, and the like, include the number recited and refer to ranges which can be subsequently broken down into subranges as discussed above. Finally, as will be understood by one skilled in the art, a range includes each individual member.

[0076] All publications, patent applications, issued patents, and other documents referred to in this specification are herein incorporated by reference as if each individual publication, patent application, issued patent, or other document was specifically and individually indicated to be incorporated by reference in its entirety. Definitions that are contained in text incorporated by reference are excluded to the extent that they contradict definitions in this disclosure.

[0077] Other embodiments are set forth in the following claims.