DIFFRACTIVE OPTICAL ELEMENT AND PREPARATION METHOD
20190339541 ยท 2019-11-07
Inventors
Cpc classification
G02B27/4205
PHYSICS
International classification
Abstract
A diffractive optical element for a structured light projection module and a method of using the diffractive optical element are described herein. The diffractive optical element is configured to: receive two-dimensional patterned beams and generate multi-order diffractive beams, wherein the two-dimensional patterned beams are emitted from a structured light projection module, the structured light projection module includes a light source comprising a plurality of sub-light sources arranged in a two-dimensional array, and the two-dimensional patterned beams correspond to the two-dimensional array; and project a plurality of two-dimensional patterned beams, wherein each of the plurality of two-dimensional patterned beams creates a corresponding duplicated pattern, and the duplicated patterns form a speckle pattern having uniform speckle density. The two-dimensional patterned beams can overlap with each other, or not overlap with each other.
Claims
1. A diffractive optical element, configured to: receive two-dimensional pattern beams and generate multi-order diffractive beams, wherein the two-dimensional pattern beams are emitted from a structured light projection module, the structured light projection module includes a light source comprising a plurality of sub-light sources arranged in a two-dimensional array, and the two-dimensional pattern beams correspond to the two-dimensional array; and project a plurality of two-dimensional patterned beams, wherein the two-dimensional patterned beams do not overlap with each other, each of the plurality of two-dimensional patterned beams creates a corresponding duplicated pattern, and the duplicated patterns form a speckle pattern having uniform speckle density.
2. The diffractive optical element according to claim 1, wherein a pitch between adjacent two-dimensional patterned beams is approximately equal to an average spacing between sub-beams in the two-dimensional patterned beams.
3. The diffractive optical element according to claim 1, wherein the duplicated patterns satisfy the following formula:
M[(1.sub.1)(s+n)D/d,(1+.sub.2)(s+n)D/d], where M is an average spacing between diffractive speckles generated by a same sub-light source in adjacent duplicated patterns, D is a distance between the diffractive optical element and a projection surface, d is a distance between the light source and the diffractive optical element, s is a size of an area formed by the plurality of sub-light sources, n is an average spacing between adjacent sub light sources, and both .sub.1 and .sub.2 are specified error percentages.
4. The diffractive optical element according to claim 3, wherein the two-dimensional array and the speckle pattern are irregularly arranged, and both .sub.1 and .sub.2 are equal to 20%.
5. A diffractive optical element, configured to: receive two-dimensional pattern beams and generate multi-order diffractive beams, wherein the two-dimensional pattern beams are emitted from a structured light projection module, the structured light projection module includes a light source comprising a plurality of sub-light sources arranged in a two-dimensional array, and the two-dimensional pattern beams correspond to the two-dimensional array; and project a plurality of two-dimensional patterned beams, wherein the two-dimensional patterned beams overlap with each other, each of the plurality of two-dimensional patterned beams creates a corresponding duplicated pattern, and the duplicated patterns form a speckle pattern having uniform speckle density.
6. The diffractive optical element according to claim 5, wherein a spacing between centers of adjacent two-dimensional patterned beams is approximately equal to 1/k of a length of a line connecting the centers of the adjacent two-dimensional patterned beams, plus or minus D/d of an average spacing between the sub-light sources, wherein k is a positive integer greater than 1, D is a distance between the diffractive optical element and a projection surface, and d is a distance between the light source and the diffractive optical element.
7. The diffractive optical element according to claim 5, wherein the duplicated patterns satisfy the following formula:
M[(1.sub.1)(s/kn)D/d,(1+.sub.2)(s/kn)D/d], where M is an average spacing between diffractive speckles generated by a same sub-light source in adjacent duplicated patterns, D is a distance between the diffractive optical element and a projection surface, d is a distance between the light source and the diffractive optical element, s is a size of an area formed by the plurality of sub-light sources, n is an average spacing between adjacent sub-light sources, both .sub.1 and .sub.2 are specified error percentages, and k is a positive integer greater than 1.
8. The diffractive optical element according to claim 7, wherein the two-dimensional array and the speckle pattern are irregularly arranged, and both .sub.1 and .sub.2 are 20%.
9. A method comprising: receiving two-dimensional pattern beams on a diffractive optical element, wherein the two-dimensional pattern beams are emitted from a structured light projection module, the structured light projection module includes a light source comprising a plurality of sub-light sources arranged in a two-dimensional array, and the two-dimensional pattern beams correspond to the two-dimensional array; and projecting a plurality of two-dimensional patterned beams from the diffractive optical element, wherein each of the plurality of two-dimensional patterned beams creates a corresponding duplicated pattern, and the duplicated patterns forms a speckle pattern having uniform speckle density.
10. The method according to claim 9, wherein the two-dimensional patterned beams do not overlap with each other.
11. The method according to claim 10, wherein a pitch between adjacent two-dimensional patterned beams is approximately equal to an average spacing between sub-beams in the two-dimensional patterned beams.
12. The method according to claim 10, wherein the duplicated patterns satisfy the following formula:
M[(1.sub.1)(s+n)D/d,(1+.sub.2)(s+n)D/d], where M is an average spacing between diffractive speckles generated by a same sub-light source in adjacent duplicated patterns, D is a distance between the diffractive optical element and a projection surface, d is a distance between the light source and the diffractive optical element, s is a size of an area formed by the plurality of sub-light sources, n is an average spacing between adjacent sub-light sources, and both .sub.1 and .sub.2 are specified error percentages.
13. The method according to claim 12, wherein the two-dimensional array and the speckle pattern are irregularly arranged, and both .sub.1 and .sub.2 are equal to 20%.
14. The method according to claim 9, wherein the two-dimensional patterned beams overlap with each other.
15. The method according to claim 14, wherein a spacing between centers of adjacent two-dimensional patterned beams is approximately equal to 1/k of a length of a line connecting the centers of the adjacent two-dimensional patterned beams, plus or minus D/d of an average spacing between the sub-light sources, wherein k is a positive integer greater than 1, D is a distance between the diffractive optical element and a projection surface, and d is a distance between the light source and the diffractive optical element.
16. The method according to claim 14, wherein the overlapped duplicated patterns satisfy the following formula:
M[(1.sub.1)(s/kn)D/d,(1+.sub.2)(s/kn)D/d], where M is an average spacing between diffractive speckle generated by a same sub-light source in adjacent duplicated patterns, D is a distance between the diffractive optical element and a projection surface, d is a distance between the light source and the diffractive optical element, s is a size of an area formed by the plurality of sub-light sources, n is an average spacing between adjacent sub-light sources, both .sub.1 and .sub.2 are specified error percentages, and k is a positive integer greater than 1.
17. The method according to claim 16, wherein the two-dimensional array and the speckle pattern are irregularly arranged, and both .sub.1 and .sub.2 are 20%.
18. The diffractive optical element according to claim 1, wherein the duplicated patterns do not overlap with each other.
19. The diffractive optical element according to claim 5, wherein the duplicated patterns overlap with each other by at least a portion.
20. The method according to claim 14, wherein the duplicated patterns overlap with each other by at least a portion.
Description
BRIEF DESCRIPTION OF THE DRAWINGS
[0022]
[0023]
[0024]
[0025]
[0026]
[0027]
[0028]
[0029]
[0030]
[0031]
[0032]
[0033]
[0034]
DETAILED DESCRIPTION OF THE EMBODIMENTS
[0035] Embodiments of the present disclosure are described below in detail. It should be emphasized that the following descriptions are merely exemplary, and are not intended to limit the scope of the present disclosure and applications thereof.
[0036]
[0037] In an embodiment, the structured light projection module is configured to project an infrared speckle pattern, the capture module is a corresponding infrared camera, and the processor is a dedicated SOC chip. When the depth camera is an embedded apparatus integrated into another computing terminal such as a computer, a tablet computer, a mobile phone, or a television, the foregoing functions implemented by the processor can be implemented by a processor or an application in the computing terminal. For example, a depth computing function is stored in a memory in a form of a software module and is called by the processor in the terminal to implement depth computing.
[0038] The structured light projection module comprises a VCSEL array chip, a lens, and a DOE. After the light source beams are converged by the lens, they are modulated by the DOE to a structured light pattern. The structured light pattern, such as a speckle pattern, is emitted into a space.
[0039] A position of each speckle 24 in the area 23 is determined by a diffraction equation:
sin .sub.x=m.sub.x/P.sub.x(1)
sin .sub.y=m.sub.y/P.sub.y(2)
where .sub.x and .sub.y respectively represent diffraction angles in the x direction and y direction, m.sub.x and m.sub.y respectively represent diffraction orders in the x direction and y direction, represents the wavelength of the beam 21, and P.sub.x and P.sub.y respectively represent cycles of the DOE 22 in the x direction and y direction, that is, the size of a basic unit.
[0040] An arrangement mode of the speckle patterns 24 depends on diffraction angles of beams in respective diffraction orders of the DOE, and the diffraction angles depend on the performance of the DOE.
[0041]
[0042]
[0043] Beams emitted from the light source array 31 may form patterned beams which may be consistent with the arrangement of the light source. The patterned beams are converged by the lens 32 and then are incident to the DOE 33. The DOE 33 projects a speckle pattern to a plane at a distance D to a space. The spacing between the sub-light sources 31 is n.sub.x, and the size of the area where the sub-light sources are located is s.sub.x. If the sub-light sources are arranged in a two-dimensional manner, the spacing can be represented by n (n.sub.y, n.sub.y). Likewise, the size of the area where the sub-light sources are located is s (s.sub.x, s.sub.y), the distance between the light source 31 and the DOE 33 is d, and in some embodiments, d is approximately equal to the focal length of the lens 32.
[0044] The lens 32 may a single lens or a lens combination formed by a plurality of lenses, and is configured to collimate beams emitted from the light sources in some embodiments.
[0045] Because the sub-light sources are irrelevant light sources, an interference effect among the sub-light sources can be omitted. After passing through the DOE 33, beams emitted from the sub-light sources 311, 312 and 313 are respectively form the sub-speckle patterns 351, 352 and 353 (which are represented by elliptical dotted lines in the figure), and a final speckle pattern is formed by combining the sub-speckle patterns 351, 352 and 353. In an embodiment shown in FIG. 3, because a diffraction divergence angle of the DOE 33 is large, the sub-speckle patterns may overlap with each other. In some embodiments, the diffraction divergence angle of the DOE 33 can be set to adjust an overlap degree. In an embodiment shown in
[0046] In
T=tD/d(3),
where, t and T respectively represent the translation quantity of the light source and the translation quantity of the diffractive light speckle. Therefore, a speckle pattern formed by one sub-light source can be a speckle pattern formed by translating another sub-light source. The distance between diffractive light speckles in corresponding orders in two sub-speckle patterns and the distance between the two sub-light sources depends on the foregoing formula (3).
[0047] Therefore, the size of the areas (which are 361, 362 and 363, shown by elliptical dotted lines in the figure) jointly formed by light speckles of the same diffraction order corresponding to a plurality of sub-light sources and the spacing between the speckles in the areas may be computed by the following formula:
N.sub.x=n.sub.xD/d(4)
S.sub.x=s.sub.xD/d(5)
where, S.sub.x represents the size of the area formed by light speckles in the same order, and N.sub.x represents the spacing between the speckles in the area. According to the formulas (4) and (5), relationships between the size of the area and the spacing between the speckles in the area and the size of the light source 31 and the spacing between the sub-light sources are consistent with those of a lens pinhole imaging model. Thus, the areas 361, 362 and 363 can be regarded as images formed by the light source 31. That is, final projected diffractive beams are formed by combining patterned beams emitted by a plurality of duplicated light sources. In other words, the speckle pattern finally formed on the plane 34 is formed by combining arranged patterns of a plurality of duplicated light sources. In
[0048] In embodiments shown in
[0049] In addition to the above distortion affecting the density distribution, the spacing of the light sources arrangement and performance of the DOE may also affect the density distribution, such as the spacing between speckles in different diffraction orders. The density of a final speckle pattern is uniformly distributed when certain constraints between the spacing of the light sources and the performance of the DOE are satisfied. Detailed descriptions are provided below.
[0050] In the embodiment shown in
[0051] The following description is still based on selecting a plane away from the DOE at a distance D and regularly arranged two-dimensional light sources. The size of a light source array is s (s.sub.x, s.sub.y), and the spacing between sub-light sources is n (n.sub.y, n.sub.y). Therefore, as shown in
N=nD/d(6)
S=sD/d(7)
[0052] The final speckle pattern formed on the plane at the distance D is formed by arranging a plurality of duplicated patterns at a specific spacing, where the spacing represents a spacing between speckles in different diffraction orders after the DOE performs diffraction. The density distribution of the speckle pattern depends on the speckle distribution and spacing between the duplicated patterns.
[0053] In speckle patterns formed by the projection module shown in
MS=N(8)
[0054] In an embodiment, the adjacent duplicated patterns may just overlap with each other at the edges, that is, the adjacent duplicated patterns are connected. In this case, M=S, and the combined speckle patterns are shown in
[0055] In some embodiments, adjacent duplicated patterns overlap with each other, and in this case, M<S.
[0056]
[0057] Likewise, it can be derived that the density of an effective projection area in the overlapped part is approximately k.sub.x.Math.k.sub.y times than that of the duplicated patterns when M=S/k, where k=(k.sub.x.Math.k.sub.y), and k.sub.x, k.sub.y=2, 3, 4, . . . . It should be understood that in the embodiments shown in
[0058]
M=S/KN(9)
[0059] It should be noted that a division sign herein indicates that an S vector is correspondingly divided by each element in a K vector.
[0060] When K is a non-integer, it can be analyzed from
[0061] It can be known from the above analysis that when a pitch exists between the duplicated patterns, the uniformly distributed density can be achieved provided that the formula (8) is satisfied, and when the duplicated patterns overlap with each other, the uniformly distributed density can be achieved provided that the formula (9) is satisfied.
[0062] By substituting the formula (6) and the formula (7) into the formula (8) and the formula (9), the following can be obtained:
M=(s+n)D/d(10)
M=(s/kn)D/d,k=2,3,4(11)
[0063] The formula (10) and the formula (11) provide a relationship between sizes and the spacing of light sources and the performance of the DOE, which is required for generating speckle patterns with the uniformly distributed density. Therefore, when the light sources and the DOE are designed, the structured light projection module may generate speckle patterns with the uniformly distributed density provided that the formula (10) and the formula (11) are satisfied.
[0064] In the foregoing explanations, an arrangement of light sources and an arrangement of patterns after the DOE performs diffraction are described using regular arrangements as examples. Because randomness (irrelevance) is another requirement of speckle patterns, generally, to meet the requirement, the arrangement of the light sources and the arrangement of DOE-diffracted patterns are both arranged irregularly.
[0065] However, the above analysis on the regular arrangement is also applicable to an irregular arrangement because the irregular arrangement can be regarded as an irregular arrangement converted from the regular arrangement by using an algorithm. If R represents a regular arrangement, I represents an irregular arrangement, and f represents a conversion algorithm, the following is obtained:
1=f.Math.R(12)
[0066] To satisfy the requirement that the structured light projection module can project a speckle pattern with uniformly distributed density and irrelevant distribution of speckles, when designing the arrangement of light sources and DOEs, the design can be performed first by a regular arrangement, and then, the regular arrangement is converted into an irregular arrangement by using the random change algorithm.
[0067] For the irregular arrangement of the light resources and the arrangement of the sub-speckle patterns obtained by diffracting a single beam by the DOE, when the arrangements are both irregular arrangements, pitches of the arrangements generally represent the average pitches, that is, n, N, and M in the foregoing context all represent average pitches. This average pitch can represent the average of all the pitches, and can be represented by using the ratio of the total area to the quantity of light sources or speckles. Due to randomness, when the pitches are represented by the average pitches, the foregoing formulas are not established in the strict sense. Therefore, when designing the light source and the DOE, it is acceptable that the formula (10) and formula (11) are approximately satisfied. That is, it is acceptable that equal signs in the formulas may be replaced with approximately equal signs. An error range can also be set to, for example, 20%. That is, it is acceptable that the formula (10) and the formula (11) satisfy the following formula:
M[0.8(s+n)D/d,1.2(s+n)D/d](13)
M[0.8(s/kn)D/d,1.2(s/kn)D/d],k=2,3(14)
[0068] For a given light array, a problem of nonuniformly distributed density of the projected pattern can be resolved by setting the DOE according to the above conditions.
[0069] The above contents are further detailed with reference to specific preferred implementations, and it cannot be considered that the specific implementations of the present disclosure are limited to these descriptions. A person of ordinary skill in the technical field of the present disclosure may make substitutions or variations on the described implementations without departing from the idea of the present disclosure, and the substitutions or variations shall fall within the protection scope of the present disclosure.