SEMICONDUCTOR DEVICE AND BIDIRECTIONAL ESD PROTECTION DEVICE COMPRISING THE SAME

Abstract

A semiconductor device is provided including a die having an electronic component integrated thereon. The component includes regions in the die, including a first region of a first charge type electrically connected to a first device terminal, a second region of a second charge type forming a first PN junction with the first region, a third region of the first charge type forming a second PN junction with the second region, the third region being spaced apart from the first region by the second region and being electrically connected to the second device terminal, a fourth region of the first charge type forming a third PN junction with the second region, the fourth region being spaced apart from the first region and third region by the second region. The device further includes an electronic unit electrically connected between the first device terminal, the second device terminal and the fourth region.

Claims

1. A semiconductor device comprising a semiconductor die having an electronic component integrated thereon, wherein the electronic component comprises regions in the semiconductor die, the regions comprising: a first region of a first charge type configured to be electrically connected to a first device terminal; a second region of a second charge type arranged adjacent to and forming a first PN junction with the first region; a third region of the first charge type arranged adjacent to and forming a second PN junction with the second region, the third region being spaced apart from the first region by the second region and being configured to be electrically connected to a second device terminal; a fourth region of the first charge type arranged adjacent to and forming a third PN junction with the second region, the fourth region being spaced apart from the first region and third region by the second region; and wherein the semiconductor device further comprises an electronic unit configured to be electrically connected between the first device terminal, the second device terminal and the fourth region, wherein during operation, the electronic unit is configured to provide a first current path or a second current path in dependence of a polarity of a voltage across the first device terminal and the second device terminal.

2. The semiconductor device according to claim 1, wherein the first charge type corresponds to an n-type doping, and wherein the first current path and the second current path extend from the first device terminal and the second device terminal, respectively, towards the fourth region, or wherein the first charge type corresponds to a p-type doping, and wherein the first current path and the second current path extend from the fourth region to the first device terminal and the second device terminal, respectively.

3. The semiconductor device according to claim 1, wherein the electronic unit comprises further regions comprised in the semiconductor die or one or more further semiconductor dies on which the electronic unit is integrated, the further regions comprising: a first further region of the first charge type; a second further region of the second charge type arranged adjacent to and forming a first further PN junction with the first further region, the second further region being configured to be electrically connected to the first device terminal; a third further region of the first charge type; a fourth further region of the second charge type arranged adjacent to and forming a second further PN junction with the third further region, the fourth further region being configured to be electrically connected to the second device terminal; wherein the first further region and the second further region are comprised in the semiconductor die or in a first further semiconductor die, and wherein the third further region and the fourth further region are comprised in the semiconductor die, the first further semiconductor die or a second further semiconductor die; and wherein the first current path extends through the first further region and the second further region, and wherein the second current path extends through the third further region and the fourth further region.

4. The semiconductor device according to claim 1, wherein the first region, the second region and the third region together form a bipolar junction transistor (BJT).

5. The semiconductor device according to claim 1, wherein the second region comprises a first sub-region and a second sub-region, the first sub-region being relatively lowly doped with respect to the second sub-region, wherein the first region and the third region are arranged adjacent to the first sub-region and are spaced apart from the second sub-region by the first sub-region, and wherein the fourth region is arranged adjacent to the second sub-region and is spaced apart from the first sub-region by the second sub-region; and/or wherein the single further region comprises a first further sub-region and a second further sub-region, the first further sub-region being relatively lowly doped with respect to the second further sub-region, wherein the second further region and the fourth further region are arranged adjacent to the first further sub-region and are spaced apart from the second further sub-region by the first further sub-region, and wherein the fifth further region is arranged adjacent to the second further sub-region and is spaced apart from the first further sub-region by the second further sub-region.

6. The semiconductor device according to claim 1, wherein the regions corresponding to the electronic component; and/or wherein the further regions corresponding to the electronic unit are ion-implanted regions.

7. The semiconductor device according to claim 2, wherein the electronic unit comprises further regions comprised in the semiconductor die or one or more further semiconductor dies on which the electronic unit is integrated, the further regions comprising: a first further region of the first charge type; a second further region of the second charge type arranged adjacent to and forming a first further PN junction with the first further region, the second further region being configured to be electrically connected to the first device terminal; a third further region of the first charge type; a fourth further region of the second charge type arranged adjacent to and forming a second further PN junction with the third further region, the fourth further region being configured to be electrically connected to the second device terminal; wherein the first further region and the second further region are comprised in the semiconductor die or in a first further semiconductor die, and wherein the third further region and the fourth further region are comprised in the semiconductor die, the first further semiconductor die or a second further semiconductor die; and wherein the first current path extends through the first further region and the second further region, and wherein the second current path extends through the third further region and the fourth further region.

8. The semiconductor device according to claim 2, wherein the first region, the second region and the third region together form a bipolar junction transistor (BJT).

9. The semiconductor device according to claim 2, wherein the second region comprises a first sub-region and a second sub-region, the first sub-region being relatively lowly doped with respect to the second sub-region, wherein the first region and the third region are arranged adjacent to the first sub-region and are spaced apart from the second sub-region by the first sub-region, and wherein the fourth region is arranged adjacent to the second sub-region and is spaced apart from the first sub-region by the second sub-region; and/or wherein the single further region comprises a first further sub-region and a second further sub-region, the first further sub-region being relatively lowly doped with respect to the second further sub-region, wherein the second further region and the fourth further region are arranged adjacent to the first further sub-region and are spaced apart from the second further sub-region by the first further sub-region, and wherein the fifth further region is arranged adjacent to the second further sub-region and is spaced apart from the first further sub-region by the second further sub-region.

10. The semiconductor device according to claim 2, wherein the semiconductor die and/or, the first further semiconductor die and/or the second further semiconductor die are selected from the group consisting of: silicon, silicon carbide, gallium nitride, and gallium arsenide technology.

11. The semiconductor device according to claim 3, wherein the first further region and the third further region are each electrically connected to the fourth region; wherein the first further region and the second further region together form a first diode, and wherein the third further region and the fourth further region together form a second diode.

12. The semiconductor device according to claim 3, wherein the first through fourth further regions are all comprised in the semiconductor die or on the first further semiconductor die, and wherein the first further region and the third further region are adjacently arranged and form a single further region.

13. The semiconductor device according to claim 12, wherein the single further region is electrically connected to the fourth region; and wherein the first further region, the second further region, the third further region and the fourth further region together form a bipolar junction transistor (BJT).

14. The semiconductor device according to claim 12, wherein the further regions further comprise a fifth further region of the second charge type arranged adjacent to and forming a third further PN junction with the single further region, the fifth further region being electrically connected to the fourth region and comprised in the semiconductor die or the first further semiconductor die; and wherein the first current path and the second current path each additionally extend through the fifth further region.

15. The semiconductor device according to claim 14, wherein the first through fifth regions are all comprised in the semiconductor die, wherein the fourth region is arranged adjacent to and forms an intermediate PN junction with the fifth further region.

16. The semiconductor device according to claim 14, wherein the first through fifth further regions are all comprised in the first further semiconductor die, wherein the semiconductor comprises a first back contact electrically connected to the fourth region, and wherein the first further semiconductor die comprises a second back contact electrically connected to the fifth further region; and wherein the semiconductor device further comprises a conductive substrate, the semiconductor die and the first further semiconductor die being arranged with their respective back contacts facing the conductive substrate, wherein the conductive substrate forms an electrical connection between the back contact of the semiconductor die and the back contact of the first further semiconductor die.

17. The semiconductor device according to claim 15, wherein the fifth further region and the second region are adjacently arranged to together form a contiguous region, or wherein the fourth region and the single further region are adjacently arranged to together form a contiguous region.

18. An electrostatic discharge (ESD), protection device configured to be electrically connected to an electronic circuit and to protect the electronic circuit from ESD events; wherein the ESD protection device comprises one or more semiconductor devices as defined in claim 1; and wherein the ESD protection device is a packaged device.

19. A device comprising an electronic circuit integrated on a semiconductor die, and one or more semiconductor devices as defined in claim 1, wherein the one or more semiconductor devices are integrated on the semiconductor die and are electrically connected to the electronic circuit to protect the electronic circuit from ESD events; and wherein the device is a packaged device.

Description

BRIEF DESCRIPTION OF DRAWINGS

[0036] Next, the present disclosure will be described in more detail with reference to the appended drawings, wherein:

[0037] FIG. 1 is a schematic diagram including an ESD protection device connected to a circuit that is to be protected.

[0038] FIG. 2 is a schematic diagram of an ESD protection device known in the art.

[0039] FIG. 3A is a schematic diagram of a semiconductor device according to some embodiments.

[0040] FIGS. 3B and 3C are simplified cross-sectional views of the semiconductor device shown in FIG. 3A.

[0041] FIG. 4A is a schematic diagram of a semiconductor device according some embodiments.

[0042] FIGS. 4B and 4C are simplified cross-sectional views of the semiconductor device shown in FIG. 4A.

[0043] FIG. 5A is a schematic diagram of a semiconductor device according to some embodiments.

[0044] FIGS. 5B-5D are simplified cross-sectional views of the semiconductor device shown in FIG. 5A.

DETAILED DESCRIPTION

[0045] The present disclosure is described in conjunction with the appended figures. It is emphasized that, in accordance with the standard practice in the industry, various features are not drawn to scale. In fact, the dimensions of the various features may be arbitrarily increased or reduced for clarity of discussion.

[0046] In the appended figures, similar components and/or features may have the same reference label. Further, various components of the same type may be distinguished by following the reference label by a dash and a second label that distinguishes among the similar components. If only the first reference label is used in the specification, the description is applicable to any one of the similar components having the same first reference label irrespective of the second reference label.

[0047] Unless the context clearly requires otherwise, throughout the description and the claims, the words “comprise,” “comprising,” and the like are to be construed in an inclusive sense, as opposed to an exclusive or exhaustive sense; that is to say, in the sense of “including, but not limited to.” As used herein, the terms “connected”, “coupled” or any variant thereof means any connection or coupling, either direct or indirect, between two or more elements; the coupling or connection between the elements can be physical, logical, electromagnetic, or a combination thereof. Additionally, the words “herein”, “above”, “below” and words of similar import, when used in this application, refer to this application as a whole and not to any particular portions of this application. Where the context permits, words in the detailed description using the singular or plural number may also include the plural or singular number respectively. The word “or” in reference to a list of two or more items, covers all of the following interpretations of the word: any of the items in the list, all of the items in the list, and any combination of the items in the list.

[0048] The teachings of the technology provided herein can be applied to other systems, not necessarily the system described below. The elements and acts of the various examples described below can be combined to provide further implementations of the technology. Some alternative implementations of the technology may include not only additional elements to those implementations noted below, but also may include fewer elements.

[0049] These and other changes can be made to the technology in light of the following detailed description. While the description describes certain examples of the technology, and describes the best mode contemplated, no matter how detailed the description appears, the technology can be practiced in many ways. Details of the system may vary considerably in its specific implementation, while still being encompassed by the technology disclosed herein. As noted above, particular terminology used when describing certain features or aspects of the technology should not be taken to imply that the terminology is being redefined herein to be restricted to any specific characteristics, features, or aspects of the technology with which that terminology is associated. In general, the terms used in the following claims should not be construed to limit the technology to the specific examples disclosed in the specification, unless the Detailed Description section explicitly defines such terms. Accordingly, the actual scope of the technology encompasses not only the disclosed examples, but also all equivalent ways of practicing or implementing the technology under the claims.

[0050] To reduce the number of claims, certain aspects of the technology are presented below in certain claim forms, but the applicant contemplates the various aspects of the technology in any number of claim forms.

[0051] In FIG. 3A, a semiconductor device 1 is shown according to an embodiment of the present disclosure. Furthermore, in FIG. 3B, an exemplary cross-sectional view of semiconductor device 1 of FIG. 3A is shown.

[0052] Semiconductor device 1 comprises an electronic component 3 that is integrated on a semiconductor die D1. Electronic component 3 is formed by regions in semiconductor die D1, including a first region 4a, a second region 4b, a third region 4c and a fourth region 4d. First region 4a, third region 4c and fourth region 4d are doped with a same dopant type corresponding to a first charge type, while second region 4b is doped with an opposite dopant type corresponding to a second charge type. For example, first region 4a, third region 4c and fourth region 4d are p-type doped regions, while second region 4b is an n-type doped region. Due to the difference in charge types between adjacent regions, electronic component 3 comprises a first PN junction J1 between first region 4a and second region 4b, a second PN junction J2 between second region 4b and third region 4c, and a third PN junction J3 between second region 4b and fourth region 4d. In the embodiment shown in FIG. 3B, first region 4a, second region 4b and third region 4c together form a lateral BJT.

[0053] First region 4a is electrically connected to a first device terminal 2a, and third region 4c is electrically connected to a second device terminal 2b. First device terminal 2a and second device terminal 2b may correspond to terminals of semiconductor device 1, terminals of ESD protection device 20 shown in FIG. 1, or terminals of an external circuit to be protected.

[0054] Semiconductor device 1 further comprises an electronic unit 5 that is electrically connected between first device terminal 2a, second device terminal 2b and fourth region 4d. In the embodiments shown in FIGS. 3A and 3B, electronic unit 5 comprises a first diode formed by a first further region 6a of the first charge type and a second further region 6b of the second charge type. First further region 6a and fourth region 4d are adjacently arranged, and second further region 6b is electrically connected to first device terminal 2a. Similarly, electronic unit 5 comprises a second diode formed by a third further region 6c of the first charge type and a fourth further region 6d of the second charge type. Third further region 6c and fourth region 4d are adjacently arranged, and fourth further region 6d is electrically connected to first device terminal 2a. Due to the difference in charge types between adjacent regions, a first further PN junction FJ1 is formed between first further region 6a and second further region 6b, and a second further PN junction FJ2 is formed between third further region 6c and fourth further region 6d.

[0055] Here, it is noted that fourth region 4d may be considered electrically connected to each of first further region 6a and third further region 6c due to said further regions 6a, 6c being arranged adjacent to fourth region 4d. That is, within the context of the present disclosure, for regions in the semiconductor die(s), the term ‘electrically connected’ may correspond to an electrical connection via a conductive material or component, and/or to being adjacently arranged or in physical contact.

[0056] Since electronic component 3 and electronic unit 5 are both integrated on semiconductor die D1 in the embodiment shown in FIG. 3B, first device terminal 2a and second device terminal 2b may correspond to terminals of semiconductor device 1 and may be formed in one or more metal layers of a metal layer stack (not shown) arranged on top of said semiconductor die D1. In other words, first region 4a and second further region 6a, as well as third region 4c and fourth further region 6d, may be electrically connected through said metal layer stack, for example through vias, instead of being connected via an individual terminals of semiconductor device 1 to an external terminal, for example a terminal of a circuit to be protected.

[0057] However, it is noted that the present disclosure is not limited to the configuration shown in FIG. 3B. For example, electronic unit 5 may be partially or fully integrated on one or more further semiconductor die, instead of on semiconductor die D1 on which electronic component 3 is integrated. As shown in FIG. 3C, the first diode of electronic unit 5 may for example be integrated on a first further semiconductor die D2 and the second diode on a second further semiconductor die D3. In other embodiments, the first and second diode of electronic unit 5 are integrated on a same further semiconductor die (not shown), or one of the first and second diode is integrated on semiconductor die D1 while the other is integrated on a further semiconductor die.

[0058] In some embodiments, semiconductor die D1 as well as the one or more further semiconductor dies (e.g., first and second further semiconductor die D2, D3) are comprised in a same device package (not shown) having leads via which electronic component 3 and electronic unit 5 can be connected to an external circuit to be protected. In that case, the electrical connections between fourth region 4d and first and third further region 6a, 6c could be formed internally to the package, though they may also be formed externally to the package, for example by externally connecting the leads.

[0059] For example, as shown in FIG. 3C, electrical connections 12 can be used to electrically connect fourth region 4d to first further region 6a and third further region 6c. Electrical connections 12 may for example correspond to bondwires, metal interconnections, or the like.

[0060] In other embodiments, semiconductor die D1, first further semiconductor die D2 and/or second further semiconductor die D3 are comprised in individual device packages. The electrical connections between fourth region 4d and first and third further region 6a, 6c can then be formed externally to said device packages.

[0061] Hereinafter, for convenience, embodiments of the present disclosure will be described with the first charge type corresponding to a p-type doping, and the second charge type corresponding to an n-type doping. However, it is noted that the present disclosure similarly envisages a semiconductor device in which the first charge type corresponds to an n-type doping and in which the second charge type corresponds to a p-type doping.

[0062] Prior to an ESD event, none of the PN junctions between adjacent regions of semiconductor device 1 are forward-biased. Furthermore, second region 4b, fourth region 4d, first further region 6a and third further region 6c are each at a floating potential. As a result, the electrical potential at said regions will be self-adjusting with respect to first device terminal 2a and second device terminal 2b.

[0063] During an ESD event having a positive polarity at first device terminal 2a with respect to second device terminal 2b, a voltage across electronic component 3 increases. During this voltage increase, the floating electrical potential at second region 4b will self-adjust until avalanche breakdown occurs at second PN junction J2 or third PN junction J3. The avalanche breakdown enables a current to flow through said junction, which also allows first PN junction J1 to become forward-biased for an ESD current to flow from first device terminal 2a to second device terminal 2b.

[0064] For example, if breakdown occurs at second PN junction J2 and first PN junction J1 becomes forward-biased due to the self-adjusting electrical potential of second region 4b, then a current can flow from first device terminal 2a to second device terminal 2b through said junctions. In that case, the current flow through second region 4b effectively acts as a base current for the BJT formed by first region 4a, second region 4b and fourth region 4d. This base current enables an additional ‘collector’ current to flow through said BJT, that is, through first region 4a, second region 4b and fourth region 4d. In this embodiment, second further PN junction FJ2 of the second diode can become forward-biased due to the self-adjusting electrical potential at third further region 6c. As such, the ESD event can be further discharged via fourth region 4d and via the second diode. By including fourth region 4d in conjunction with electronic unit 5, a size of the base-collector junction of electronic component is effectively increased as it is now formed of both second PN junction J2 and third PN junction J3.

[0065] In another example, if avalanche breakdown occurs at third PN junction J3 instead, then a current can flow from first device terminal 2a to second device terminal 2b via said junction and via first PN junction J1 and second further PN junction FJ2, once forward-biased, similarly to the above. In that case, similarly, the current flow through second region 4b effectively acts as a base current for the BJT formed by first region 4a, second region 4b and third region 4c, thereby enabling an additional ‘collector’ current to flow through said regions. Since the occurrence of avalanche breakdown depends on the breakdown voltage of the respective junction, either of second PN junction J2 and third PN junction J3 can be designed to break down first, for example by selecting relative dopant concentrations and dimensions.

[0066] On the other hand, if the ESD event occurs with a positive polarity at second device terminal 2b with respect to first device terminal 2a, the floating electrical potential of second region 4b will self-adjust until avalanche breakdown occurs at first PN junction J1 or third PN junction J3. Similarly to the above, avalanche breakdown at first PN junction J1 enables a current flow through said junction and enables second PN junction J2 to become forward-biased to allow a current to flow from second device terminal 2a to first device terminal 2b. The current flow through second region 4b then enables an additional current flow through third PN junction J3, once first further PN junction FJ1 becomes forward-biased. Alternatively, breakdown at third PN junction J3 enables a current flow through said junction, and through second PN junction J2 and first further PN junction FJ1, once forward-biased. In that case, again, the current flow through second region 4b acts as a base current that enables an additional ‘collector’ current flow through first PN junction J1. As a result, fourth region 4d acts as an ‘additional’ collector region irrespective of the polarity of the voltage across semiconductor device 1, due to the current draining to fourth region 4d by electronic unit 5.

[0067] For completeness, it is noted that a direction of the current flow through electronic unit 5 may depend on the dopant type selected for the first and second charge type. For example, in the above, the first charge type is assumed to be p-type. On the other hand, if the first charge type is n-type and the second charge type is p-type instead, then the first and second diode of electronic unit 5 are effectively ‘reversed’. As a result, a current through fourth region 4d will pass through part of electronic unit 5 (the first diode or the second diode) first. However, the operation principle remains substantially the same regardless of the selected dopant type in the embodiments of the present disclosure.

[0068] In each of the above described cases, semiconductor device 1 ‘activates’ based on the voltage across the terminals to which it is connected. For example, semiconductor device 1 activates during an ESD event that causes an excessively high voltage across first device terminal 2a and second device terminal 2b. Once semiconductor device 1 is active, the charge from the ESD event can be safely drained through semiconductor device 1 due to its relatively high current handling capability. As such, semiconductor device 1 can be particularly useful in protecting a circuit from damages due to excessively high currents and/or voltages.

[0069] In FIG. 4A, a semiconductor device 1 according to another embodiment is shown. FIG. 4B shows a simplified cross-sectional view of semiconductor device 1 of FIG. 4A wherein electronic component 3 and electronic unit 5 are both integrated on semiconductor die D1. FIG. 4C shows a cross-sectional view of semiconductor device 1 of FIG. 4A wherein electronic component 3 is integrated on semiconductor die D1 and in which electronic unit 5 is integrated on first further semiconductor die D2. For convenience, only a portion of connections leading to first device terminal 2a and second device terminal 2b are indicated.

[0070] Semiconductor device 1 shown in FIG. 4A differs from that shown in FIG. 3A in that first further region 6a and third further region 6c are adjacently arranged and collectively form a single further region 7. More particularly, in FIG. 4A, first through fourth further regions 6a-6d together form a BJT, the base of which corresponds to single further region 7.

[0071] In the embodiments shown in FIGS. 4A-4C, like the embodiments described above, a first current path is formed via first region 4a, second region 4b and third region 4c, and a second current path is formed via second region 4b, fourth region 4d, either of the first and third region 4a, 4c, and electronic unit 5. However, in FIGS. 4A-4C, a current along the second current path will flow through further region 7 and will effectively form a base current for the BJT formed by first through fourth further regions 6a-6d. As a result, a third current path is formed via which an additional ‘collector’ current can flow, the third current path being directly via electronic unit 5 from first device terminal 2a to second device terminal 2b, or vice versa depending on the polarity of the voltage.

[0072] In FIG. 5A, a semiconductor device 1 according to another embodiment is shown. FIG. 5B shows a simplified cross-sectional view of semiconductor device 1 of FIG. 5A wherein electronic component 3 and electronic unit 5 are both integrated on semiconductor die D1. FIGS. 5C and 5D show a simplified cross-sectional view of semiconductor device 1 of FIG. 5A wherein electronic component 3 is integrated on semiconductor die D1 and wherein electronic unit 5 is integrated on first further semiconductor die D2.

[0073] The embodiment shown in FIG. 5A differs from that shown in FIG. 4A in that electronic unit 5 further comprises a fifth further region 6e arranged adjacent to further region 7 and forming a third further PN junction FJ3 therewith. Fifth further region 6e is electrically connected to or arranged adjacent to fourth region 4d. A structure of electronic component 3 and electronic unit 5 may thus be substantially identical, albeit having opposite charge types for corresponding regions thereof. In other words, each of electronic component 3 and electronic unit 5 comprise an open base BJT comprising an additional region, formed by fourth region 4d and fifth further region 6e, respectively, that functions as a collector irrespective of the polarity of the voltage across semiconductor device 1.

[0074] In FIG. 5B, semiconductor die D1 has both electronic component 3 and electronic unit 5 integrated thereon. The electrical connection between fourth region 4d and fifth further region 6e is formed by an electrical connection 12, which may for example correspond to one or more bondwires, a metal interconnection, or the like. Alternatively, although not shown in the figures, fourth region 4d and fifth further region 6e may be directly adjacently arranged on semiconductor die D1, in which case electrical connection 12 may be omitted. Furthermore, although not shown in the figures, fifth further region 6e may be directly adjacently arranged to both fourth region 4d and second region 4b.

[0075] In FIG. 5C, semiconductor die D1 comprises a back contact 8a electrically connected to fourth region 4d, and further semiconductor die D2 comprises a back contact 8b electrically connected to fifth further region 6e. In this manner, fourth region 4d and fifth further region 6e can be electrically connected to one another via a conductive substrate 9 on which semiconductor die D1 and further semiconductor die D2 are arranged with back contacts 8a, 8b facing conductive substrate 9.

[0076] Here, it is noted that the inclusion of back contacts 8a, 8b is also envisaged in other embodiments of the present disclosure in which electronic component 3 and electronic unit 5 are respectively integrated on different semiconductor dies. For example, in so far as electronic component 3 and electronic unit 5 are realized on different semiconductor dies, said dies may optionally be provided with back contacts to realize an electrical connection between fourth region 4d and fifth further region 6e in FIG. 4A or between fourth region 4d and one or both of first further subregion 6a and third further subregion 6c in FIG. 3A.

[0077] FIG. 5D differs from FIG. 5C in that second region 4b is divided in a first subregion 10a and a second subregion 10b, and single further region 7 is divided in a first further subregion 11a and a second further subregion 11b. Fourth region 4d is electrically connected to a back contact 8a of semiconductor die D1, and fifth further 6e is electrically connected to a back contact 8b of further semiconductor die D2. Furthermore, semiconductor die D1 and/or further semiconductor die D2 may comprise isolation structures 13, such as trenches or an oxide material arranged in said semiconductor die.

[0078] In this embodiment, first subregion 10a and first further subregion 11a may have a lower dopant concentration than second subregion 10b and second further subregion 11b, respectively, thereby reducing the capacitive load of semiconductor device 1 on a circuit to which it is connected, in absence of an ESD event. However, the present disclosure is not limited thereto, and one or both of second region 4b and single further region 7 may instead be a substantially uniformly doped region. In other words, the division into subregions as shown in FIG. 5C is optional, and may be omitted for second region 4b, single further region 7, or both.

[0079] In the embodiment of FIG. 5A, fourth region 4d and fifth further region 6e may be electrically connected via an interconnection element, such as conductive substrate 9 and back contacts 8a, 8b as shown in FIG. 5C. Alternatively, or additionally, if electronic component 3 and electronic unit 5 are both integrated on semiconductor die D1, then fourth region 4d and fifth further region 6e may be arranged adjacent to one another and may as such be electrically connected. In that case, an intermediate PN junction is formed between fourth region 4d and fifth further region 6e.

[0080] In the embodiments described above, it is noted that any of first through fourth regions 4a-4d and any of first through fifth further regions 6e may be ion-implanted regions. Furthermore, they may be arranged in a doped substrate of the corresponding semiconductor die(s), or in an epitaxial layer that is grown on top of said semiconductor substrate.

[0081] For example, in the embodiment shown in FIG. 5C, first and third region 4a, 4c may be arranged and surrounded by an epitaxial area forming second region 4b. Furthermore, the epitaxial area may be formed on a semiconductor substrate that forms fourth region 4d. This can similarly be applied to electronic unit on first further semiconductor die D2 in FIG. 5C.

[0082] For all embodiments described above, the breakdown voltages of the different junctions can be designed differently, to adapt to different intended electrical characteristics. Next, exemplary cases are described for the embodiments shown in FIGS. 5A-5C. In these examples, first PN junction J1 has a first breakdown voltage, second PN junction J2 has a second breakdown voltage, and third PN junction J3 has a third breakdown voltage. Similarly, first further PN junction FJ1 has a first further breakdown voltage, second further PN junction FJ2 has a second further breakdown voltage, and third further PN junction FJ3 has a third further breakdown voltage.

[0083] In a first example, the first and second breakdown voltage are each chosen to be less than a sum of the third breakdown voltage and the third further breakdown voltage, and the first and second further breakdown voltage are each chosen to be less than a sum of the third breakdown voltage and the third further breakdown voltage. In that case, a first BJT formed by first through third regions 4a-4c and a first further BJT formed by first through fourth further regions 6a-6d are in avalanche breakdown mode. The current flow through the first BJT due to the avalanche breakdown in electronic component 3 acts as a base current for a second BJT formed by second region 4b, fourth region 4c and either of first or third region 4a, 4c, depending on the polarity of the voltage across semiconductor device 1. Similarly, the current flow through the first further BJT due to the avalanche breakdown in electronic unit 5 acts as a base current for a second further BJT formed by first and third further region 6a, 6c, fifth further region 6e and either of second or fourth further region 6b, 6d, depending on the polarity of the voltage across semiconductor device 1.

[0084] In a second example, the first and second breakdown voltage are each chosen to be greater than a sum of the third breakdown voltage and the third further breakdown voltage, and the first and second further breakdown voltage are each chosen to be greater than a sum of the third breakdown voltage and the third further breakdown voltage. In that case, the second BJT and second further BJT are in breakdown mode, and the resulting currents each act as a base current for the first BJT and first further BJT, respectively.

[0085] In a preferred embodiment, the first breakdown voltage, second breakdown voltage, first further breakdown voltage and second further breakdown voltage are each identical or similar. More preferably, an even more robust semiconductor device is obtained when the mentioned breakdown voltages are roughly equal to a sum of the third breakdown voltage and third further breakdown voltage, at least partly due to the increased current handling capability of the semiconductor device.

[0086] It will be appreciated that, although only one region is shown for each of first through fourth region 4a-4c and first through fifth further region 6a-6e, the present disclosure is not limited thereto. For example, electronic component 3 may comprise a plurality of said first regions 4a and a plurality of said third regions 4c arranged in an interleaved, finger-like pattern. Similarly, electronic unit 5 may comprise a plurality of said second further regions 6b and a plurality of said fourth further regions 6d arrange din an interleaved, finger-like pattern. In other words, one or both of electronic component 3 and electronic unit 5 may be realized in a multi-finger structure, as will be appreciated by a person skilled in the art.

[0087] In the above embodiments, various dopant concentrations may be selected for different regions in semiconductor device 1. As an example only, first region 4a, third region 4c, second further region 6b and/or fourth further region 6d may have a dopant concentration in a range between 1e17-1e20 per cm3.

[0088] Furthermore, as an example only, fourth region 4d and/or fifth further subregion 6e may have a dopant concentration in a range between 1e16-1e19 per cm3. In addition, as an example only, second region 4b, first further subregion 6a, third further subregion 6c and/or, if applicable, single further region 7, or second subregion 10b and second further subregion 11b, may have a dopant concentration in a range between 1e15-1e17 per cm3. Furthermore, as an example only, first subregion 10a and first further subregion 11a may have a dopant concentration in a range between 1e14-1e16 per cm3.

[0089] One or more regions that are in contact with a terminal, such as with a metal, may comprise a portion that is highly doped (e.g., a dopant concentration between 1e17-1e20 per cm3) to realize a low-Ohmic contact, and the terminal may be electrically connected to and physically contact said portion, as will be appreciated by a person skilled in the art.

[0090] In the description above, for the purposes of explanation, numerous specific details are set forth in order to provide a thorough understanding of implementations of the disclosed technology. It will be apparent, however, to one skilled in the art that embodiments of the disclosed technology may be practiced without some of these specific details, and that various modifications are possible without deviating from the scope of the present disclosure as defined by the appended claims.