Process for producing at least one filament, vapour-depositing apparatus for carrying out such a process and filament-production installation with such a vapour-depositing apparatus

Abstract

A method for producing at least one filament comprises at least one stretching step in which the at least one filament is stretched, wherein the at least one filament is in a vapor-depositing region flown around by water vapor before and/or during a stretching.

wherein at least one vapor parameter of the water vapor located in the vapor-depositing region is controlled so as to counteract a formation of droplets on the at least one filament, wherein the vapor parameter is monitored by at least one sensor element of a vapor-depositing apparatus, wherein a control or regulation unit of the vapor-depositing apparatus or of a filament-production installation comprising the vapor-depositing apparatus adjusts the vapor parameter such that a condensation of the water vapor on the filament is counteracted.

Claims

1-13. (canceled)

14. A method for producing at least one filament, in particular an artificial-lawn filament, a packaging tape or a monofilament, preferentially a cohort of filaments, with at least one stretching step in which the at least one filament, in particular the artificial-lawn filament, the packaging tape or the monofilament, is stretched, wherein the at least one filament, in particular the artificial-lawn filament, the packaging tape or the monofilament, is in a vapor-depositing region flown around by water vapor before and/or during a stretching, wherein at least one vapor parameter of the water vapor located in the vapor-depositing region, in particular in the form of dry vapor, is controlled so as to counteract a formation of droplets on the at least one filament, wherein the vapor parameter is monitored by at least one sensor element of a vapor-depositing apparatus, wherein a control or regulation unit of the vapor-depositing apparatus or of a filament-production installation comprising the vapor-depositing apparatus adjusts the vapor parameter such that a condensation of the water vapor, in particular the dry vapor, on the filament is counteracted

15. The method according to claim 1, wherein for an adjustment of the vapor parameter, the water vapor, in particular the dry vapor, is heated to a temperature of more than 125? C. before entry into the vapor-depositing region.

16. The method according to claim 14 or 15, wherein for an adjustment of the vapor parameter, the water vapor is overheated before entry into the vapor-depositing region, in particular in order to generate dry vapor.

17. The method according to claim 1, wherein in at least one method step, a temperature which the water vapor, in particular the dry vapor, is brought to before entry into the vapor-depositing region is adjusted depending on the vapor parameter of the vapor-depositing region.

18. The method according to claim 1, wherein the water vapor, in particular the dry vapor, is expanded upon entry into the vapor-depositing region.

19. The method according to claim 1, wherein an inlet valve for letting the water vapor, in particular the dry vapor, into the vapor-depositing region is regulated depending on the vapor parameter.

20. The method according to claim 1, wherein a temperature of the water vapor, in particular the dry vapor, in the vapor-depositing region is maintained above a condensation temperature of the water vapor, in particular the dry vapor.

21. The method according to claim 1, wherein the water vapor, in particular the dry vapor, is actively removed, in particular suctioned, out of the vapor-depositing region.

22. The method according to claim 1, wherein in order to achieve a homogeneous distribution of the water vapor, in particular the dry vapor, the water vapor, in particular the dry vapor, is let into the vapor-depositing region in distributed fashion via several vapor inlets.

23. The method according to claim 1, comprising a further stretching step, before and/or during which the at least one filament, in particular the artificial-lawn filament, the packaging tape or the monofilament, is flown around by hot air.

24. The method according to claim 1, comprising at least one fixing step, during which the at least one filament, in particular the artificial-lawn filament, the packaging tape or the monofilament, is flown around by hot air or water vapor, in particular dry vapor.

25. A vapor-depositing apparatus for a filament-production installation, in particular an extrusion spinning installation, for the production of at least one filament, in particular an artificial-lawn filament, a packaging tape or a monofilament, following a method according to claim 1, with at least one control or regulation unit, which is configured to adjust the vapor parameter such that a condensation of the water vapor, in particular the dry vapor, on the filament can be counteracted, and with at least one vapor generator or at least one heating and/or cooling aggregate, the vapor generator being configured to vaporize water for a production of the water vapor, in particular the dry vapor, the heating and/or cooling aggregate being configured to adapt, before entry into the vapor-depositing region, the temperature of the water vapor, in particular the dry vapor, in particular the temperature of the water vapor, in particular the dry vapor, obtained from an external vapor source.

26. A filament-production installation, in particular an extrusion spinning installation, for the production of at least one filament, in particular an artificial-lawn filament, a packaging tape or a monofilament, with a vapor-depositing apparatus according to claim 15 and with at least one raw material processing station for spinning the filament.

Description

DRAWINGS

[0026] Further advantages will become apparent from the following description of the drawings. In the drawings an exemplary embodiment of the invention is illustrated. The drawings, the description and the claims contain a plurality of features in combination. Someone skilled in the art will purposefully also consider the features separately and will find further expedient combinations.

[0027] It is shown in: [0028] a schematic illustration of a filament-production installation according to the invention, [0029] a schematic illustration of a vapor-depositing apparatus according to the invention, [0030] a schematic illustration of a vapor generator of the filament-production installation, and [0031] a schematic flow chart of the method according to the invention.

DESCRIPTION OF THE EXEMPLARY EMBODIMENT

[0032] FIG. 1 shows a filament-production installation 28. The filament-production installation 28 is in particular embodied as an extrusion-spinning installation. The filament-production installation 28 is in particular configured for the production of at least one filament 12. The filament 12 is in particular embodied as an artificial-lawn filament, as a packaging tape or as a monofilament. The filament-production installation 28 comprises at least one raw material processing station 30. The filament-production installation 28 in particular comprises a frontward filament conveyor 32. The filament-production installation 28 in particular comprises a vapor-depositing apparatus 26. The filament-production installation 28 in particular comprises a rearward filament conveyor 38. The filament-production installation 28 preferably comprises a hot-air oven 40. The filament-production installation 28 optionally comprises a fibrillation device 36. Preferably the filament-production installation 28 comprises a further filament conveyor 42. The filament-production installation 28 preferably comprises at least one fixing station 44. Optionally the filament-production installation 28 comprises at least one further fixing station 46. The filament-production installation 28 in particular comprises an additional filament conveyor 48. The filament-production installation 28 preferably comprises a coating device 50. The coating device 50 is in particular realized as a roller preparator. Preferably the filament-production installation 28 comprises at least one cohort sorter 52. Preferably the filament-production installation 28 comprises at least one winding apparatus 54. Preferably the filament-production installation 28 comprises at least one vapor generator 34.

[0033] The filament-production installation 28 in particular comprises a control or regulation unit 62 for implementing a method 10 for the production of the at least one filament 12, which will be explained in detail in FIG. 4. The frontward filament conveyor 32, the rearward filament conveyor 38, the further filament conveyor 42 and/or the additional filament conveyor 48 are in particular configured for a transport of the filament 12 along a transport path from the raw material processing station 30 to the winding apparatus 54. The frontward filament conveyor 32 is arranged along the transport path in particular between the raw material processing station 30 and the vapor-depositing apparatus 26. The vapor-depositing apparatus 26 is preferably arranged along the transport path between the frontward filament conveyor 32 and the rearward filament conveyor 38. The vapor generator 34 is fluidically connected in particular with the vapor-depositing apparatus 26. The vapor generator 34 is, for example, arranged at a level above, sidewise or below the transport path. Optionally the vapor generator 34 and the vapor-depositing apparatus 26 are arranged directly adjoining each other and/or in a shared housing. The rearward filament conveyor 38 is in particular arranged along the transport path between the hot-air oven 40 and the further filament conveyor 42. The fibrillation device 36 is in particular arranged along the transport path between the hot-air oven 40 and the further filament conveyor 42. The further filament conveyor 42 is preferably arranged along the transport path between the hot-air oven 40, in particular the fibrillation device 36, and the fixing station 44. The fixing station 44 is preferably arranged along the transport path between the further filament conveyor 42 and the further fixing station 46, in particular the additional filament conveyor 48. The further fixing station 46 is preferably arranged along the transport path between the fixing station 44 and the additional filament conveyor 48. The additional filament conveyor 48 is preferably arranged along the transport path between the coating device 50 and the fixing station 44, in particular the further fixing station 46. The coating device 50 is preferably arranged along the transport path between the additional filament conveyor 48 and the cohort sorter 52. The cohort sorter 52 is preferably arranged along the transport path between the coating device 50 and the winding apparatus 54.

[0034] FIG. 2 shows the vapor-depositing apparatus 26. The vapor-depositing apparatus 26 in particular comprises at least one vapor-depositing chamber which delimits a vapor-depositing region 16. In particular, the vapor-depositing apparatus 26 comprises a conveying unit for guiding water vapor 18, in particular dry vapor, from a vapor source, in particular the vapor generator 34 or an external vapor source, into the vapor-depositing region 16. Preferably the vapor-depositing apparatus 26, in particular the conveying unit, comprises within the vapor-depositing chamber several vapor inlets 22, 24 for a feeding of the water vapor 18, in particular the dry vapor, into the vapor-depositing region 16. Preferably the vapor-depositing apparatus 26 comprises at least one distributor system 67 within the vapor-depositing chamber. Preferably the vapor-depositing chamber has at least vapor outlets 108, 116, in particular two vapor outlets of the distributor system 67, for letting the water vapor 18, in particular the dry vapor, out of the vapor-depositing region 16. Preferably the vapor-depositing apparatus 26 comprises at least one ventilator 60 for suctioning the water vapor 18, in particular the dry vapor, out of the vapor-depositing region 16. The ventilator 60 is in particular arranged at at least one of the vapor outlets 108, 116. The vapor-depositing chamber in particular comprises a vapor-depositor drain 66 for letting condensed water out of the vapor-depositing chamber. Preferably the vapor-depositing apparatus 26 comprises at least one electric heating element 68 for heating the vapor-depositing chamber, in particular a wall of the vapor-depositing chamber. Preferably the vapor-depositing apparatus 26, in particular the channel unit, comprises at least one valve 56 for a manual separation and connection of the vapor inlets 22, 24 to the vapor source, in particular to the vapor generator 34. Preferably the vapor-depositing apparatus 26, in particular the channel unit, comprises at least one inlet valve 20. The inlet valve 20 is in particular configured for a regulation of a vapor parameter of the water vapor 18, in particular the dry vapor. In particular, the inlet valve 20 is controlled by the control or regulation unit 62. The inlet valve 20 is preferably realized as a pneumatic regulating valve. Preferably the vapor-depositing apparatus 26 comprises at least one pressure sensor 58 for a monitoring of a pressure of the water vapor 18, in particular the dry vapor. The pressure sensor 58 is in particular arranged between the inlet valve 20 and the vapor inlets 22, 24, in particular outside the vapor-depositing chamber. The pressure sensor 58 is in particular connected to the control or regulation unit 62. Preferably the conveying unit comprises a drain 64, in particular with a pressure relief valve, for letting water vapor 18, in particular the dry vapor, out of the conveying unit. Optionally the vapor-depositing apparatus 26 comprises at least one sensor element in the vapor-depositing region 16. The sensor element is embodied, for example, as a temperature feeler, as an infrared sensor, as an infrared camera, or the like, in particular for registering a temperature of the water vapor 18, in particular the dry vapor, of the filament 12 and/or of an inner wall of the vapor-depositing chamber. For example, the sensor element is realized as a further pressure sensor for detecting a pressure of the water vapor 18, in particular the dry vapor, in the vapor-depositing region 16. For example, the sensor element is realized as a humidity sensor for detecting a humidity of the water vapor 18, in particular the dry vapor. In particular, the sensor element is connected to the control or regulation unit 62.

[0035] FIG. 3 shows the vapor generator 34. The vapor generator 34 in particular comprises a water inlet 72 for an inlet of liquid water into the vapor generator 34. Preferably the vapor generator 34 comprises at least one feedwater tank 74 for an interim storage of the water. In particular, the water inlet 72 opens into the feedwater tank 74. Preferably the vapor generator 34 comprises at least one feedwater heating element in the feedwater tank 74 for a pre-heating of the water in the feedwater tank 74. Preferably the vapor generator 34 comprises at least one feedwater temperature sensor 80 for a monitoring of a temperature of the water in the feedwater tank 74. Preferably the vapor generator 34 comprises at last one feedwater temperature adjuster 86, in particular an electric switch for an activation or deactivation of the feedwater heating element, for an adjustment of a feedwater temperature of the water in the feedwater tank 74 by the control or regulation unit 62. Particularly preferably, for producing the water vapor 18, in particular the dry vapor, the water in the feedwater tank 74 is heated to a temperature between 50? C. and 70? C.

[0036] Preferably the vapor generator 34 comprises a vaporizer 76, in particular for a vaporization of the water from the feedwater tank 74. In particular, the feedwater tank 74 is fluidically connected to the vaporizer 76. Preferably the vapor generator 34 comprises at least one vaporizer heating element in the vaporizer 76 for a vaporization of the water. Preferably the vapor generator 34 comprises at least one vaporizer temperature sensor 82 for a monitoring of a temperature of a saturated vapor generated by the vaporizer 76. Preferably the vapor generator 34 comprises at last one vaporizer temperature adjuster 88, in particular an electric switch for an activation or deactivation of the vaporizer heating element, for an adjustment of a saturated-vapor temperature of the saturated vapor by the control or regulation unit 62. Especially preferentially, for a production of the water vapor 18, in particular the dry vapor, the saturated vapor is heated to a temperature between 130? C. and 180? C. Particularly preferably the control or regulation unit 62 defines a setpoint value for the saturated-vapor temperature of the saturated vapor depending on a pressure of the saturated vapor, in particular a set pressure of the water vapor 18, in particular the dry vapor. Preferably the vapor generator 34 comprises a water bypass 100, which is connected to the vaporizer 76, for letting water out of the vaporizer 76. The water bypass 100 preferably comprises a pneumatic regulating valve, which is in particular controlled by the control or regulation unit 62. Preferentially the vapor generator 34 comprises a vapor bypass, in particular with a pressure relief valve, which is connected to the vaporizer 76, for letting vapor out of the vaporizer 76. The vapor generator 34 in particular comprises a compensating reservoir 94. The water bypass 100 preferably opens into the compensating reservoir 94. The vapor bypass 102 preferably opens into the compensating reservoir 94. The compensating reservoir 94 in particular has a generator vapor outlet 96 for letting vapor, in particular vapor not used and/or not usable in the course of the method 10, out of the vapor generator 34. The compensating reservoir 94 in particular comprises a generator water drain 98 for letting water out of the vapor generator 34.

[0037] The vapor generator 34 preferably comprises a superheater 78, in particular for an overheating of the saturated vapor from the vaporizer 76. In particular, the superheater 78 is fluidically connected to the vaporizer 76. Preferably the vapor generator 34 comprises at least one dry-vapor heating element in the superheater 78 for an overheating of the saturated vapor. Preferably the vapor generator 34 comprises at least one dry-vapor temperature sensor 84 for a monitoring of a temperature of the water vapor 18, in particular the dry vapor, generated by the superheater 78. For an adjustment of a temperature of the water vapor 18, in particular the dry vapor, by the control or regulation unit 62, the vapor generator 34 preferably comprises at least one dry-vapor temperature adjuster 90, in particular an electric switch for an activation or deactivation of the dry-vapor heating element. Particularly preferably the water vapor 18, in particular the dry vapor, is heated to a temperature between 180? C. and 300? C. Especially preferentially the control or regulation unit 62 defines a setpoint value for the temperature of the water vapor 18, in particular the dry vapor, depending on a set pressure of the water vapor 18, in particular the dry vapor. A dry-vapor outlet of the superheater 78 is in particular connected to the vapor-depositing apparatus 26. Preferably the vapor generator 34 comprises a dry-vapor bypass 92 that is connected to the superheater 78 for letting the water vapor 18, in particular the dry vapor, out of the superheater 78. The dry-vapor bypass 92 preferably comprises a pneumatic regulating valve, which is in particular controlled by the control or regulation unit 62. The dry-vapor bypass 92 preferably opens into the compensating reservoir 94.

[0038] FIG. 4 shows a flow chart of the method 10. Preferentially the method 10 is configured for producing a cohort of filaments 12. The method 10 in particular comprises a raw material processing step 118, in which the raw material processing station 30 spins the filament 12, in particular a cohort of filaments 12. The method 10 comprises at least one stretching step 14. In the stretching step 14 the at least one filament 12 is stretched, in particular by means of the frontward filament conveyor 32 and the rearward filament conveyor 38. In particular, the frontward filament conveyor 32 and the rearward filament conveyor 38 subject a section of the filament 12 situated in the vapor-depositing region 16 to a tensile strain along the transport path. During stretching, the at least one filament 12 is in the vapor-depositing region 16 flown around with the water vapor 18, in particular the dry vapor. At least one vapor parameter of the water vapor 18, in particular the dry vapor, situated in the vapor-depositing region 16 is controlled so as to counteract a formation of droplets on the at least one filament 12. The method 10 comprises a further stretching step 15. In the further stretching step 15, the at least one filament 12 is in particular stretched once more, in particular by the rearward filament conveyor 38 and the further filament conveyor 42. While the at least one filament 12 is being stretched, it is flown around by hot air, in particular via the hot-air oven 40. In particular, the rearward filament conveyor 38 and the further filament conveyor 42 subject a section of the filament 12 that is situated in the hot-air oven 40 to a tensile strain along the transport path. The method optionally comprises a fibrillation 120 of the filament 12 that is realized as a ribbon. The fibrillation 120 is carried out by the fibrillation device 36. In particular in a formation of the filament 12 as a monofilament, the fibrillation 120 is omitted. The fibrillation 120 is preferably carried out after the further stretching step 15. The method 10 comprises a fixing step 122. During the fixing step 122, the at least one filament 12 is flown around with hot air or with the water vapor 18, in particular the dry vapor, in particular by means of the fixing station 44. Optionally, in particular if hot air is used in the fixing step 122, the method 10 comprises a further fixing step 124, in which the filament 12 is once more flown around with hot air, in particular by means of the further fixing station 46. Preferably the method 10 comprises a coating step 126. In particular, in the coating step 126 the coating device 50 applies a preparation liquid onto the filament 12. The method 10 optionally comprises a sorting step 128. In the sorting step 128, the cohort sorter 52 assigns the individual filaments 12 of the cohort to a bobbin body, in particular to respectively one bobbin body, of the winding apparatus. The method 10 in particular comprises a winding step 130. In the winding step 130, the winding apparatus 54 winds the filament 12 onto a bobbin body, in particular the winding apparatus 54 winds the individual filaments 12 onto respectively one bobbin body.

[0039] The method 10 in particular comprises a vapor generating step 104. In particular, the vapor generator 34 produces the water vapor 18, in particular the dry vapor, in the vapor generating step 104. For an adjustment of the vapor parameter, the water vapor 18, in particular the dry vapor, is heated to a temperature of more than 125? C. before it is let into the vapor-depositing region 16. For an adjustment of the vapor parameter, the water vapor 18, in particular the dry vapor, is overheated before it is let into the vapor-depositing region 16. The method 10 in particular comprises a vapor feed-in step 106. In the vapor feed-in step 106, the water vapor 18, in particular the dry vapor, is let into the vapor-depositing region 16. In particular, the control or regulation unit 62 controls the inlet valve 20 during the vapor feed-in step 106 for the purpose of a controlled feeding of the water vapor 18, in particular the dry vapor, into the vapor-depositing region 16. The water vapor 18, in particular the dry vapor, is expanded upon entry into the vapor-depositing region 16. In order to achieve a homogeneous distribution of the water vapor 18, in particular the dry vapor, the water vapor 18, in particular the dry vapor, is let into the vapor-depositing region 16 in distributed fashion via the several vapor inlets 22, 24 of the distributor system 67. In particular, in the stretching step 14, the water vapor 18, in particular the dry vapor, flows around the section of the filament 12 that is situated in the vapor-depositing region 16. In particular, the water vapor 18, in particular the dry vapor, let into the vapor-depositing region 16 flows continuously from the vapor inlets 22, 24 to the vapor outlets 108, 116. In particular, the method 10 comprises a vapor removal step 110. The water vapor 18, in particular the dry vapor, is actively removed, in particular suctioned, from the vapor-depositing region 16. In the vapor removal step 110, the ventilator 60 suctions the water vapor 18, in particular the dry vapor, out of the vapor-depositing region 16.

[0040] Preferably the control or regulation unit 62 executes a pressure regulation 114. In particular, in the course of the pressure regulation 114, the control or regulation unit 62 controls the ventilator 60 and/or the inlet valve 20 and optionally the vapor generator 34. For a letting-in of the water vapor 18, in particular the dry vapor, into the vapor-depositing region 16, the inlet valve 20 is regulated depending on the vapor parameter. In particular, the control or regulation unit 62 executes the pressure regulation 114 in order to create a constant overpressure relative to the atmosphere in the vapor-depositing region 16, and in particular in order to support a homogeneous distribution of the water vapor 18, in particular the dry vapor. Preferably the control or regulation unit 62 executes a temperature regulation 112. In the course of the temperature regulation 112, the control or regulation unit 62 in particular controls the vapor generator 34 and optionally the inlet valve 20 and optionally the heating element 68. A temperature which the water vapor 18, in particular the dry vapor, is brought to before entry into the vapor-depositing region 16 is adjusted depending on the vapor parameter of the vapor-depositing region 16. In particular, the control or regulation unit 62 executes the temperature regulation 112 in order to prevent a cooling of the water vapor 18, in particular the dry vapor, below a threshold value. A temperature of the water vapor 18, in particular the dry vapor, in the vapor-depositing region 16 is maintained above an, in particular pressure-dependent, condensation temperature of the water vapor 18, in particular the dry vapor.