Organic semiconductor mixture and organic optoelectronic device containing the same

Abstract

An organic semiconductor mixture and an organic optoelectronic device containing the same are provided. A n-type organic semiconductor compound in the organic semiconductor mixture has a novel chemical structure so that the mixture has good thermal stability and property difference during batch production is also minimized. The organic semiconductor mixture is applied to organic optoelectronic devices such as organic photovoltaic devices for providing good energy conversion efficiency while in use.

Claims

1. An organic semiconductor mixture comprising a n-type organic semiconductor compound and a p-type organic semiconductor compound; wherein the p-type organic semiconductor compound is a conjugated polymer which includes at least one acceptor unit and at least one donor unit while the n-type organic semiconductor compound is represented by formula I: ##STR00070## wherein SP.sup.1 is selected from the group consisting of a vinyl group, a phenyl ring, an electron donating group, a substituted or unsubstituted monocyclic heteroaryl group containing 5 to 20 ring atoms, and a substituted or unsubstituted polycyclic heteroaryl group containing 5 to 20 ring atoms; Ar.sup.0-Ar.sup.3 are substituted fused polycyclic heteroaryl groups containing 5-35 ring atoms; A.sup.0-A.sup.3 are monocyclic or polycyclic heteroaryl groups containing 5-20 ring atoms and at least one electron-withdrawing group; B.sup.0-B.sup.7 are selected from the group consisting of a vinyl group, a phenyl ring, an electron donating group, a substituted or unsubstituted monocyclic heteroaryl group containing 5 to 20 ring atoms, and a substituted or unsubstituted polycyclic heteroaryl group containing 5 to 20 ring atoms; E.sup.0-E.sup.3 are monocyclic or polycyclic heteroaryl groups containing 5-20 ring atoms and at least one electron-withdrawing group, defined as different from the SP.sup.1 group; a, b, c, and d are 0 or 1 and a+b+c+d?2; and m, n, o, p, q, r, s, and t are selected from the group consisting of 0, 1, and 2.

2. The organic semiconductor mixture as claimed in claim 1, wherein the SP.sup.1 of the n-type organic semiconductor compound is selected from the group consisting of: ##STR00071## ##STR00072## ##STR00073## wherein W.sup.0 and W.sup.1 are selected from the group consisting of oxygen (O), sulfur (S), selenium (Se), and tellurium (Te); z is an integer selected from 0 to 5; Ar.sup.4 is aromatic group or heteroaryl group containing 5 to 20 ring atoms, monocyclic, polycyclic, or fused ring, unsubstituted or substituted with at least one halogen atom; and R.sup.0 is selected from the group consisting of hydrogen atom, halogens, cyano group, C1-C30 linear alkyl, C3-C30 branched alkyl, C1-C30 silyl group, C2-C30 ester group, C1-C30 alkoxy, C1-C30 thioalkyl, C1-C30 haloalkyl, C2-C30 alkene, C2-C30 alkyne, C2-C30 cyano-substituted alkyl, C1-C30 nitro-substituted alkyl, C1-C30 hydroxy-substituted alkyl, and C3-C30 keto-substituted alkyl group.

3. The organic semiconductor mixture as claimed in claim 1, wherein the Ar.sup.0, the Ar.sup.1, the Ar.sup.2, and the Ar.sup.3 of the n-type organic semiconductor compound are selected from the group consisting of: ##STR00074## wherein W.sup.2 and W.sup.3 are selected from the group consisting of oxygen (O), sulfur (S), selenium (Se), and tellurium (Te); U is selected from the group consisting of nitrogen (N), carbon (C) and silicon (Si); and R.sup.1 and R.sup.2 are selected from the group consisting of hydrogen atom, halogens, cyano group, C1-C30 linear alkyl, C3-C30 branched alkyl, C1-C30 silyl group, C2-C30 ester group, C1-C30 alkoxy, C1-C30 thioalkyl, C1-C30 haloalkyl, C2-C30 alkene, C2-C30 alkyne, C2-C30 cyano-substituted alkyl, C1-C30 nitro-substituted alkyl, C1-C30 hydroxy-substituted alkyl, C3-C30 keto-substituted alky, C1-C30 phenyl-ring-substituted alkyl, and C1-C30 heteroaryl-substituted alkyl group.

4. The organic semiconductor mixture as claimed in claim 1, wherein the A.sup.0, the A.sup.1, the A.sup.2, and the A.sup.3 of the n-type organic semiconductor compound are selected from the group consisting of: ##STR00075## ##STR00076## wherein R.sup.3 is selected from the group consisting of hydrogen atom, halogens, cyano group, C1-C30 linear alkyl, C3-C30 branched alkyl, C1-C30 silyl group, C2-C30 ester group, C1-C30 alkoxy, C1-C30 thioalkyl, C1-C30 haloalkyl, C2-C30 alkene, C2-C30 alkyne, C2-C30 cyano-substituted alkyl, C1-C30 nitro-substituted alkyl, C1-C30 hydroxy-substituted alkyl, and C3-C30 keto-substituted alkyl group.

5. The organic semiconductor mixture as claimed in claim 1, wherein the B.sup.0-B.sup.7 of the n-type organic semiconductor compound are selected from the group consisting of: ##STR00077## ##STR00078## ##STR00079## wherein W.sup.4 and W.sup.5 are selected from the group consisting of oxygen (O), sulfur (S), selenium (Se), and tellurium (Te); z is an integer selected from 0 to 5; Ar.sup.5 is aromatic group or heteroaryl group containing 5 to 20 ring atoms, monocyclic, polycyclic, or fused ring, unsubstituted or substituted with at least one halogen atom; and R.sup.4 is selected from the group consisting of hydrogen atom, halogens, cyano group, C1-C30 linear alkyl, C3-C30 branched alkyl, C1-C30 silyl group, C2-C30 ester group, C1-C30 alkoxy, C1-C30 thioalkyl, C1-C30 haloalkyl, C2-C30 alkene, C2-C30 alkyne, C2-C30 cyano-substituted alkyl, C1-C30 nitro-substituted alkyl, C1-C30 hydroxy-substituted alkyl, and C3-C30 keto-substituted alkyl group.

6. The organic semiconductor mixture as claimed in claim 1, wherein the E.sup.0-E.sup.3 of the n-type organic semiconductor compound are selected from the group consisting of: ##STR00080## ##STR00081## ##STR00082## wherein R.sup.5 is selected from the group consisting of hydrogen atom, halogens, cyano group, C1-C30 linear alkyl, C3-C30 branched alkyl, C1-C30 silyl group, C2-C30 ester group, C1-C30 alkoxy, C1-C30 thioalkyl, C1-C30 haloalkyl, C2-C30 alkene, C2-C30 alkyne, C2-C30 cyano-substituted alkyl, C1-C30 nitro-substituted alkyl, C1-C30 hydroxy-substituted alkyl, and C3-C30 keto-substituted alkyl group.

7. The organic semiconductor mixture as claimed in claim 1, wherein the p-type organic semiconductor compound is represented by formula II ##STR00083## wherein A-1 and A-2 are substituted or unsubstituted polycyclic heteroaryl groups containing 5 to 35 ring atoms and also electron withdrawing groups; W.sup.6 is elected from the group consisting of oxygen (O), sulfur (S), and selenium (Se); z is an integer selected from 0 to 5; Ar.sup.6 and Ar.sup.7 are aromatic groups or heteroaryl groups containing 5 to 20 ring atoms, monocyclic, polycyclic, or fused ring, unsubstituted or substituted with at least one halogen atom; R.sup.6 and R.sup.7 are selected from the group consisting of hydrogen atom, halogens, cyano group, C1-C30 linear alkyl, C3-C30 branched alkyl, C1-C30 silyl group, C2-C30 ester group, C1-C30 alkoxy, C1-C30 thioalkyl, C1-C30 haloalkyl, C2-C30 alkene, C2-C30 alkyne, C2-C30 cyano-substituted alkyl, C1-C30 nitro-substituted alkyl, C1-C30 hydroxy-substituted alkyl, and C3-C30 keto-substituted alkyl group; and m+n=1, 0<m?1, 0?n<1.

8. The organic semiconductor mixture as claimed in claim 7, wherein the A-1 group of the p-type organic semiconductor compound is selected from the group consisting of: ##STR00084## ##STR00085## ##STR00086## ##STR00087## wherein W.sup.7, W.sup.8, and W.sup.9 are selected from the group consisting of oxygen (O), sulfur (S), selenium (Se), and tellurium (Te); and R.sup.8, R.sup.9, and R.sup.10 are respectively selected from the group consisting of free hydrogen atom, halogens, cyano group, C1-C30 linear alkyl, C3-C30 branched alkyl, C1-C30 silyl group, C2-C30 ester group, C1-C30 alkoxy, C1-C30 thioalkyl, C1-C30 haloalkyl, C2-C30 alkene, C2-C30 alkyne, C2-C30 cyano-substituted alkyl, C1-C30 nitro-substituted alkyl, C1-C30 hydroxy-substituted alkyl, and C3-C30 keto-substituted alkyl group.

9. The organic semiconductor mixture as claimed in claim 7, wherein the A-2 group of the p-type organic semiconductor compound is selected from the group consisting of: ##STR00088## ##STR00089## ##STR00090## ##STR00091## ##STR00092## wherein W.sup.10, W.sup.11, and W.sup.12 are selected from the group consisting of oxygen (O), sulfur (S), selenium (Se), and tellurium (Te); and R.sup.11, R.sup.12, and R.sup.13 are respectively selected from the group consisting of free hydrogen atom, halogens, cyano group, C1-C30 linear alkyl, C3-C30 branched alkyl, C1-C30 silyl group, C2-C30 ester group, C1-C30 alkoxy, C1-C30 thioalkyl, C1-C30 haloalkyl, C2-C30 alkene, C2-C30 alkyne, C2-C30 cyano-substituted alkyl, C1-C30 nitro-substituted alkyl, C1-C30 hydroxy-substituted alkyl, and C3-C30 keto-substituted alkyl group.

10. The organic semiconductor mixture as claimed in claim 1, wherein the p-type organic semiconductor compound is selected from the group consisting of: ##STR00093## ##STR00094## ##STR00095## wherein R.sup.6-R.sup.2 are respectively selected from the group consisting of free hydrogen atom, halogens, cyano group, C1-C30 linear alkyl, C3-C30 branched alkyl, C1-C30 silyl group, C2-C30 ester group, C1-C30 alkoxy, C1-C30 thioalkyl, C1-C30 haloalkyl, C2-C30 alkene, C2-C30 alkyne, C2-C30 cyano-substituted alkyl, C1-C30 nitro-substituted alkyl, C1-C30 hydroxy-substituted alkyl, and C3-C30 keto-substituted alkyl group; and m+n=1, 0<m?1, and 0?n<1.

11. An organic optoelectronic device comprising: a substrate, an electrode module disposed on the substrate and provided with a first electrode and a second electrode, and an active layer arranged between the first electrode and the second electrode and made from material containing at least one organic compound mixture as claimed in claim 1; wherein at least one of the first electrode and the second electrode is transparent or semi-transparent.

12. The organic optoelectronic device as claimed in claim 11, wherein the first electrode, the active layer and the second electrode are disposed on the substrate in turn from bottom to top.

13. The organic optoelectronic device as claimed in claim 11, wherein the second electrode, the active layer and the first electrode are disposed on the substrate in turn from bottom to top.

14. The organic optoelectronic device as claimed in claim 11, wherein the organic optoelectronic device further includes a first carrier transport layer disposed between the first electrode and the active layer, and a second carrier transport layer arranged between the second electrode and the active layer.

15. The organic optoelectronic device as claimed in claim 11, wherein the organic optoelectronic device further includes a first carrier transport layer disposed between the second electrode and the active layer, and a second carrier transport layer arranged between the first electrode and the active layer.

Description

BRIEF DESCRIPTION OF DRAWINGS

(1) FIG. 1A-1F are schematic drawings showing structure of an embodiment of an organic optoelectronic device according to the present invention;

(2) FIG. 2A-2D are spectra showing test results of different embodiments of an organic optoelectronic device according to the present invention;

(3) FIG. 3A-3B are spectra showing test results of different embodiments of an organic optoelectronic device according to the present invention;

(4) FIG. 4A-4B are spectra showing test results of different embodiments of an organic optoelectronic device according to the present invention; and

(5) FIG. 5A-5C are spectra showing test results of different embodiments of an organic optoelectronic device according to the present invention.

DETAILED DESCRIPTION OF THE INVENTION

(6) In order to learn features and functions of the present invention more clearly, please refer to the following embodiments and related descriptions.

(7) An organic semiconductor mixture according to the present invention includes a n-type organic semiconductor compound and a p-type organic semiconductor compound. The n-type organic semiconductor compound includes a center unit SP.sup.1 connected with at least two non-fullerene monomers to form a structure with a plurality of non-fullerene monomers which provides not only similar light absorption of non-fullerene, better thermal stability as well as mechanical properties but also solves problems such as phase separation or compatibility with other polymers during use of polymer acceptors.

(8) Preparation of the present organic semiconductor mixture can be achieved by a method described in the literature or well known by people skilled in the art. The method is further described in the following embodiments.

(9) In the above organic semiconductor mixture, the n-type organic semiconductor compound is represented by formula I:

(10) ##STR00002##
wherein SP.sup.1 is selected from the group consisting of a vinyl group, a phenyl ring, an electron donating group, a substituted or unsubstituted monocyclic heteroaryl group containing 5 to 20 ring atoms, and a substituted or unsubstituted polycyclic heteroaryl group containing 5 to 20 ring atoms; Ar.sup.0-Ar.sup.3 are substituted fused polycyclic heteroaryl groups containing 5-35 ring atoms; A.sup.0-A.sup.3 are monocyclic or polycyclic heteroaryl groups containing 5-20 ring atoms and at least one electron-withdrawing group; B.sup.0-B.sup.7 are selected from the group consisting of a vinyl group, a phenyl ring, an electron donating group, a substituted or unsubstituted monocyclic heteroaryl group containing 5 to 20 ring atoms, and a substituted or unsubstituted polycyclic heteroaryl group containing 5 to 20 ring atoms; E.sup.0-E.sup.3 are monocyclic or polycyclic heteroaryl groups containing 5-20 ring atoms and at least one electron-withdrawing group, defined as different from the SP.sup.1 group; a, b, c, and d are 0 or 1 and a+b+c+d>2; and m, n, o, p, q, r, s, and t are 0, 1, or 2.

(11) The term electron donating group should be understood as an atom or group that delivers electron to another group in the same compound or in another compound. The term electron withdrawing group should be understood as an atom or group that draws electron from another group in the same compound or in another compound. The above definitions can also refer to International Union of Pure and Applied Chemistry, Compendium of Chemical Technology, Gold Book, Version 3.0.1., page 477, and 480. The electron withdrawing group used in the present invention is selected from the group consisting of halogen group, carbonyl group, cyano group, carboxyl group, nitro group, and ester group well known by people skilled in the art.

(12) The group SP.sup.1 in the n-type semiconductor compound represented by formula I is preferably selected from the following group.

(13) ##STR00003## ##STR00004## ##STR00005## wherein W.sup.0 and W.sup.1 is oxygen (O), sulfur (S), selenium (Se), or tellurium (Te); z is an integer selected from 0 to 5. Ar.sup.4 is aromatic group or heteroaryl group containing 5 to 20 ring atoms, monocyclic or polycyclic, randomly containing a fused ring, unsubstituted or substituted with at least one halogen atom; and R.sup.0 is selected from the group consisting of hydrogen atom, halogens, cyano group, C1-C30 linear alkyl, C3-C30 branched alkyl, C1-C30 silyl group, C2-C30 ester group, C1-C30 alkoxy, C1-C30 thioalkyl, C1-C30 haloalkyl, C2-C30 alkene, C2-C30 alkyne, C2-C30 cyano-substituted alkyl, C1-C30 nitro-substituted alkyl, C1-C30 hydroxy-substituted alkyl, and C3-C30 keto-substituted alkyl group.

(14) The group SP.sup.1 of the compound represented by formula I is preferably selected from the following group:

(15) ##STR00006## ##STR00007##

(16) Each of the groups Ar.sup.0, Ar.sup.1, Ar.sup.2 and Ar.sup.3 of the compound represented by formula I is preferably selected from the following group:

(17) ##STR00008## wherein W.sup.2 and W.sup.3 are selected from O, S, Se, or Te; U is selected from nitrogen (N), carbon (C) or silicon (Si); and R.sup.1 and R.sup.2 are selected from the group consisting of hydrogen atom, halogens, cyano group, C1-C30 linear alkyl, C3-C30 branched alkyl, C1-C30 silyl group, C2-C30 ester group, C1-C30 alkoxy, C1-C30 thioalkyl, C1-C30 haloalkyl, C2-C30 alkene, C2-C30 alkyne, C2-C30 cyano-substituted alkyl, C1-C30 nitro-substituted alkyl, C1-C30 hydroxy-substituted alkyl, C3-C30 keto-substituted alky, C1-C30 phenyl-ring-substituted alkyl, and C1-C30 heteroaryl-substituted alkyl group.

(18) The groups Ar.sup.0, Ar.sup.1, Ar.sup.2 and Ar.sup.3 of the compound represented by formula I are preferably selected from the followings.

(19) ##STR00009##

(20) The groups A.sup.0, A.sup.1, A.sup.2 and A.sup.3 of the compound represented by formula I are preferably selected from the followings.

(21) ##STR00010## ##STR00011## wherein R.sup.3 is selected from the group consisting of hydrogen atom, halogens, cyano group, C1-C30 linear alkyl, C3-C30 branched alkyl, C1-C30 silyl group, C2-C30 ester group, C1-C30 alkoxy, C1-C30 thioalkyl, C1-C30 haloalkyl, C2-C30 alkene, C2-C30 alkyne, C2-C30 cyano-substituted alkyl, C1-C30 nitro-substituted alkyl, C1-C30 hydroxy-substituted alkyl, and C3-C30 keto-substituted alkyl group.

(22) The groups B.sup.0-B.sup.7 of the compound represented by formula I are preferably selected from the followings.

(23) ##STR00012## ##STR00013## ##STR00014## wherein W.sup.4 and W.sup.5 are selected from O, S, Se, or Te; z is an integer selected from 0 to 5; Ar.sup.5 is aromatic group or heteroaryl group containing 5 to 20 ring atoms, monocyclic or polycyclic, randomly containing a fused ring, unsubstituted or substituted with at least one halogen atom; and R.sup.4 is selected from the group consisting of hydrogen atom, halogens, cyano group, C1-C30 linear alkyl, C3-C30 branched alkyl, C1-C30 silyl group, C2-C30 ester group, C1-C30 alkoxy, C1-C30 thioalkyl, C1-C30 haloalkyl, C2-C30 alkene, C2-C30 alkyne, C2-C30 cyano-substituted alkyl, C1-C30 nitro-substituted alkyl, C1-C30 hydroxy-substituted alkyl, and C3-C30 keto-substituted alkyl group.

(24) The groups B.sup.0-B.sup.7 of the compound represented by formula I are preferably selected from the followings.

(25) ##STR00015## ##STR00016##

(26) The groups E.sup.0-E.sup.3 of the compound represented by formula I are preferably selected from the followings.

(27) ##STR00017## ##STR00018## ##STR00019## wherein R.sup.5 is selected from the group consisting of hydrogen atom, halogens, cyano group, C1-C30 linear alkyl, C3-C30 branched alkyl, C1-C30 silyl group, C2-C30 ester group, C1-C30 alkoxy, C1-C30 thioalkyl, C1-C30 haloalkyl, C2-C30 alkene, C2-C30 alkyne, C2-C30 cyano-substituted alkyl, C1-C30 nitro-substituted alkyl, C1-C30 hydroxy-substituted alkyl, and C3-C30 keto-substituted alkyl group.

(28) In the organic semiconductor mixture, the p-type organic semiconductor compound is a conjugated polymer which includes at least one acceptor unit and at least one donor unit. The p-type organic semiconductor compound is represented by formula II:

(29) ##STR00020## wherein A-1 and A-2 are substituted or unsubstituted polycyclic heteroaryl groups containing 5 to 35 ring atoms and also electron withdrawing groups; W.sup.6 is selected from O, S, and Se; z is an integer selected from 0 to 5; Ar.sup.6 and Ar.sup.7 are aromatic groups or heteroaryl groups containing 5 to 20 ring atoms, monocyclic or polycyclic, randomly containing a fused ring, unsubstituted or substituted with at least one halogen atom; and R.sup.6 and R.sup.7 are selected from the group consisting of hydrogen atom, halogens, cyano group, C1-C30 linear alkyl, C3-C30 branched alkyl, C1-C30 silyl group, C2-C30 ester group, C1-C30 alkoxy, C1-C30 thioalkyl, C1-C30 haloalkyl, C2-C30 alkene, C2-C30 alkyne, C2-C30 cyano-substituted alkyl, C1-C30 nitro-substituted alkyl, C1-C30 hydroxy-substituted alkyl, and C3-C30 keto-substituted alkyl group; and m+n=1, 0<m?1, 0?n<1.

(30) The group A-1 of the compound represented by formula II is preferably selected from the followings.

(31) ##STR00021## ##STR00022## ##STR00023## ##STR00024## wherein W.sup.7, W.sup.8, and W.sup.9 are selected from O, S, Se, and Te; and R.sup.8, R.sup.9, and R.sup.10 are respectively selected from the group consisting of hydrogen atom, halogens, cyano group, C1-C30 linear alkyl, C3-C30 branched alkyl, C1-C30 silyl group, C2-C30 ester group, C1-C30 alkoxy, C1-C30 thioalkyl, C1-C30 haloalkyl, C2-C30 alkene, C2-C30 alkyne, C2-C30 cyano-substituted alkyl, C1-C30 nitro-substituted alkyl, C1-C30 hydroxy-substituted alkyl, and C3-C30 keto-substituted alkyl group.

(32) The group A-2 of the compound represented by formula II is preferably selected from the followings.

(33) ##STR00025## ##STR00026## ##STR00027## ##STR00028## ##STR00029## wherein W.sup.10, W.sup.11, and W.sup.12 are selected from O, S, Se, and Te; and R.sup.11, R.sup.12, and R.sup.3 are respectively selected from the group consisting of hydrogen atom, halogens, cyano group, C1-C30 linear alkyl, C3-C30 branched alkyl, C1-C30 silyl group, C2-C30 ester group, C1-C30 alkoxy, C1-C30 thioalkyl, C1-C30 haloalkyl, C2-C30 alkene, C2-C30 alkyne, C2-C30 cyano-substituted alkyl, C1-C30 nitro-substituted alkyl, C1-C30 hydroxy-substituted alkyl, and C3-C30 keto-substituted alkyl group.

(34) The p-type organic semiconductor compound is preferably selected from the following repeating units.

(35) ##STR00030## ##STR00031## ##STR00032## wherein R.sup.6-R.sup.12 are respectively selected from the group consisting of hydrogen atom, halogens, cyano group, C1-C30 linear alkyl, C3-C30 branched alkyl, C1-C30 silyl group, C2-C30 ester group, C1-C30 alkoxy, C1-C30 thioalkyl, C1-C30 haloalkyl, C2-C30 alkene, C2-C30 alkyne, C2-C30 cyano-substituted alkyl, C1-C30 nitro-substituted alkyl, C1-C30 hydroxy-substituted alkyl, and C3-C30 keto-substituted alkyl group; and m+n=1, 0<m?1, and 0?n<1.

(36) In the following embodiments, ingredients and synthesis methods of the organic semiconductor mixture according to the present invention are described.

Synthesis of Intermediate I-1

(37) ##STR00033##

(38) Place a 100 mL two-necked flask into an oven, bake at 100? C. for 30 minutes and degas chloroform 30 minutes for later use. Put 1.00 g (0.678 mmol) I-0, 0.370 g (1.354 mmol, 2 equiv.) IC-Br (2-[5(6)-Bromo-3-oxo-2,3-dihydro-1H-inden-1-ylidene]malononitrile), 0.356 g (1.354 mmol, 2 equiv.) IC-2C1 (2-(5,6-Dichloro-3-oxo-2,3-dihydro-1H-inden-1-ylidene)malononitrile), and degassed 30 mL chloroform into a 100 mL two-necked flask and then introduce argon gas into the two-necked flask. Add 1 mL pyridine into the two-necked flask and immerse the two-necked flask in a 60? C. oil bath to react for an hour. After completion of the reaction, precipitate product in 100 mL MeOH and filter to get solid. Wash the solid with acetone and ethyl acetate and purify with column chromatography with toluene/heptane=? as eluent. Collect product, remove the organic solvents by rotary evaporation, and vacuum dry for 16 hours to get 0.558 g bright bluish black solid product with a yield rate of 41.7%. .sup.1H NMR spectrum (600 MHz, CDCl.sub.3) of the product: ? 9.17 (d, 2H), 8.85 (s, 1H), 8.79-8.80 (m, 1H), 7.95 (s, 1H), 7.85-7.88 (m, 1H), 7.78-7.80 (m, 1H), 4.75-4.77 (m, 4H), 3.21-3.24 (m, 4H), 2.10-2.11 (m, 2H), 1.88 (s, 4H), 1.57 (s, 4H), 0.83-1.26 (m, 126H).

Synthesis of Intermediate I-2

(39) ##STR00034##

(40) Place a 100 mL two-necked flask into an oven, bake at 100? C. for 30 minutes and degas chloroform 30 minutes for later use. Put 0.402 g (0.272 mmol) I-0, 0.148 g (0.543 mmol, 2 equiv.) IC-Br, 0.125 g (0.543 mmol, 2 equiv.) IC-2F, and degassed 12 mL chloroform into a 100 mL two-necked flask and then introduce argon gas into the two-necked flask. Add 0.41 mL pyridine into the two-necked flask and immerse the two-necked flask in a 60? C. oil bath to react for an hour. After completion of the reaction, precipitate product in 100 mL MeOH and filter to get solid. Wash the solid with acetone and ethyl acetate and purify with column chromatography with toluene/heptane=? as eluent. Collect product, remove the organic solvents by rotary evaporation, and vacuum dry for 16 hours to get 0.245 g bright bluish black solid product with a yield rate of 39.1%. .sup.1H NMR spectrum (600 MHz, CDCl.sub.3) of the product: ? 9.13 (s, 2H), 8.80 (s, 1H), 8.51-8.54 (m, 1H), 7.87 (d, 1H), 7.79 (d, 1H), 7.68-7.71 (m, 1H), 4.77-4.78 (m, 4H), 3.19-3.21 (m, 4H), 2.15 (s, 2H), 1.87 (s, 4H), 0.82-1.60 (m, 130H).

Synthesis of Intermediate I-4

(41) ##STR00035##

(42) Place a 100 mL two-necked flask into an oven, bake at 100? C. for 30 minutes and degas chloroform 30 minutes for later use. Put 1.042 g (0.683 mmol) I-3, 0.372 g (1.366 mmol, 2 equiv.) IC-Br, 0.360 g (1.366 mmol, 2 equiv.) IC-2Cl, and 16 mL degassed chloroform into a 100 mL two-necked flask and then introduce argon gas into the two-necked flask. Add 0.52 mL pyridine into the two-necked flask and react at room temperature for 0.5 hour. After completion of the reaction, precipitate product in 50 mL MeOH and filter to get solid. Wash the solid with acetone and ethyl acetate and purify with column chromatography with toluene/heptane=2/1 as eluent. Collect product, remove the organic solvents by rotary evaporation, and vacuum dry for 16 hours to get 0.231 g grey black solid product with a yield rate of 16.7%. .sup.1H NMR spectrum (600 MHz, CDCl.sub.3) of the product: ? 8.79 (s, 1H), 9.74 (s, 1H), 8.48-8.54 (m, 2H), 8.41-8.44 (m, 2H), 7.88 (s, 1H), 7.82-7.85 (m, 1H), 7.70-7.72 (m, 1H), 7.62-7.63 (m, 2H), 7.47-7.55 (m, 2H), 6.94 (s, 8H), 6.81 (s, 16H), 2.52 (t, 32H), 1.52-1.60 (m, 32H), 1.21-1.28 (m, 96H), 0.78-0.82 (m, 48H).

Synthesis of Intermediate I-6

(43) ##STR00036##

(44) Place a 250 mL three-necked flask, a 100 mL two-necked flask and an addition funnel into an oven, bake at 100? C. for 2 hours and then take out and cool down to room temperature under vacuum. Add 10.41 g (32.0 mmol) 1-bromo-3,5-dihexylbenzene into the 250 mL three-necked flask, add 63 mL anhydrous tetrahydrofuran (THF), and stir with a magnetic stirrer. Add 14.4 mL (36.0 mmol) 2.5M n-Butyllithium into the addition funnel and slowly drop to the three-necked flask at ?30? C. after the reaction bottle being cooled down to ?30? C. Maintain reaction temperature between ?30? C. and ?40? C. to react for 40 minutes. Add 2.123 g (4.00 mmol) I-5 into the 100 mL two-necked flask with 53 mL dry THF, and stir with a magnetic stirrer until complete dissolution. After the three-necked flask being cooled down to ?30? C., reagent in the two-necked flask is slowly pumped and added into the three-necked flask completely. Then the three-necked flask is warmed to room temperature to react for one hour, and the temperature of the three-necked flask is increased up to 60? C. to react for 18 hours. After completion of the reaction, alcohols and water are slowly added in order to quench the reaction until there is no more bubble generated. Remove the solvents by rotary evaporation and perform extraction three times with ethyl acetate/H.sub.2O. Collect organic layer, add MgSO.sub.4 for dehydration, and remove the solvent by rotary evaporation. A crude product obtained after the extraction is added with 65 mL THF and stirred with the magnetic stirrer until complete dissolving. Add 6.4 mL tetrabutylammonium fluoride (TBAF) and react for 30 minutes. After completion of the reaction, alcohols and water are slowly added to quench the reaction until there is no more bubble generated. Remove solvent by rotary evaporation and perform extraction three times with ethyl acetate/H.sub.2O. Collect organic layer, add MgSO.sub.4 for dehydration, and remove the solvent by rotary evaporation. Next perform column chromatography with an eluent of dichloromethane/Heptane=?. Collect product, remove the organic solvents by rotary evaporation, and vacuum dry for 16 hours to get 1.83 g yellow sticky liquid (the product) with a yield rate of 35.8%. .sup.1H NMR spectrum (600 MHz, CDCl.sub.3) of the product: ? 7.11 (dd, 2H), 6.87 (s, 4H), 6.80 (s, 8H), 6.75 (s, 2H), 6.66 (dd, 2H), 6.08 (dd, 2H), 3.39 (s, 2H), 2.49 (t, 16H), 1.49-1.51 (m, 16H), 1.23-1.27 (m, 48H), 0.83-0.85 (m, 24H).

Synthesis of Intermediate I-7

(45) ##STR00037##

(46) Add 6.216 g Amberlyst 15 and a magnet into a 250 mL two-necked flask A, heat at 100? C. and vacuum for 18 hours for later use. Place a 250 mL two-necked flask B into an oven, bake at 100? C. for 2 hours and then take out and cool down to room temperature under vacuum. Add 31 mL dry hexane into the two-necked flask A and purge with argon for 30 minutes. Add 1.554 g (1.214 mmol) I-6 into the 250 mL two-necked flask B. Then add 70 mL anhydrous hexane for complete dissolution and purge with argon for 30 minutes. At 0? C. pump solution in the two-necked flask B into the two-necked flask A and react at room temperature for 3 hours. After completion of the reaction, remove Amberlyst 15 from crude product by suction filtration. Collect filtrate and remove the solvents by rotary evaporation to get oily substance. Next use column chromatography for purification with an eluent of dichloromethane/heptane=?. Collect product, remove the organic solvent by rotary evaporation, and vacuum dry for 16 hours to get 1.35 g orange solid product with yield rate of 89.4%. .sup.1H NMR spectrum (600 MHz, CDCl.sub.3) of the product: ? 7.37 (s, 2H), 7.20 (d, 2H), 6.93 (d, 2H), 6.87 (s, 4H), 6.83-8.85 (m, 8H), 2.46 (t, 16H), 1.49-1.50 (m, 16H), 1.25-1.28 (m, 48H), 0.71-0.89 (m, 24H).

Synthesis of Intermediate I-8

(47) ##STR00038##

(48) Place a 250 mL three-necked flask and a 100 mL two-necked flask into bake at 100? C. for 2 hours and then take out and cool down to room temperature under vacuum. Add 1.341 g, (1.08 mmol) I-7 into the 250 mL three-necked flask, then add 40 mL dichloroethane (DCE), stir with a magnetic stirrer, and purge with nitrogen for 30 minutes. Add 4.2 mL (54.0 mmol, 50 equiv.) anhydrous dimethylformamide (DMF) into the 100 mL two-necked flask, slowly add 0.6 mL (6.48 mmol, 6 equiv.) POCl.sub.3 under ice bath, and stir with a magnetic stirrer for 30 min to form Vilsmeier-Haack reagent and color is changed into transparent-light yellow. Next pump the Vilsmeier-Haack reagent into the three-necked flask, heat to 60? C. and reflux to react for 18 hours. After completing reaction, cool down to room temperature and slowly add water to quench the reaction. Extract 3 times with dichloromethane/H.sub.2O, collect organic layer, add magnesium sulfate for dehydration, and remove the solvent by rotary evaporation. Next use column chromatography for purification with an eluent of dichloromethane/heptane=1/1. Collect product, remove the organic solvents by rotary evaporation, and vacuum dry for 16 hours to get 1.32 g bright yellow solid product with yield rate of 94.2%. .sup.1H NMR spectrum (600 MHz, CDCl.sub.3) of the product: ? 9.81 (s, 2H), 7.59 (s, 2H), 7.54 (s, 2H), 6.92 (s, 4H), 6.81 (s, 8H), 2.48 (t, 16H), 1.49-1.52 (m, 16H), 1.25-1.28 (m, 48H), 0.83-0.85 (m, 24H).

Synthesis of Intermediate I-9 and Compound 11

(49) ##STR00039##

(50) Put a 100 mL two-necked flask into an oven, bake at 100? C. for 30 min and degas chloroform 30 minutes for use later. Add 1.295 g (0.996 mmol) I-8, 0.543 g (1.992 mmol, 2 equiv.) IC-Br, 0.523 g (1.992 mmol, 2 equiv.) IC-2Cl, and degassed 40 mL chloroform into a 100 mL two-necked flask and then purge argon gas into the two-necked flask. Add 1.3 mL pyridine into the two-necked flask and immerse in a 60? C. oil bath to react for an hour. After completion of the reaction, precipitate product in 130 mL MeOH and filter to get solid. Wash the solid with acetone and ethyl acetate and purify with column chromatography toluene/heptane=? as eluent. Collect product, remove the organic solvents by rotary evaporation, and vacuum dry for 16 hours to get 0.482 g dark red solid product with a yield rate of 26.9%. .sup.1H NMR spectrum (600 MHz, CDCl.sub.3) of the product I-9: ? 8.88 (s, 2H), 8.82 (s, 1H), 8.53-8.54 (m, 1H), 7.92 (s, 1H), 7.86 (d, 1H), 7.75-7.71 (m, 3H), 7.68-7.69 (m, 2H), 6.94 (s, 4H), 6.82 (s, 8H), 2.51 (t, 16H), 1.50-1.54 (m, 16H), 1.26-1.30 (m, 48H), 0.82-0.84 (m, 24H).

(51) Compound 11 (dark red solid product) can also be obtained: 0.285 g, 16.0%. .sup.1H NMR spectrum (600 MHz, CDCl.sub.3) of the Compound 11: ? 8.88 (s, 2H), 8.77 (s, 2H), 7.92 (s, 2H), 7.70-7.73 (m, 4H), 6.94 (s, 4H), 6.82 (s, 8H), 2.49-2.55 (m, 16H), 1.50-1.55 (m, 16H), 1.22-1.32 (m, 48H), 0.82-0.85 (m, 24H).

Synthesis of Compound 1

(52) ##STR00040##

(53) Add 0.198 g (0.100 mmol, 2.5 equiv.) I-1, 47.90 mg (0.040 mmol) I-10, 1.47 mg (0.0016 mmol, 0.04 equiv.) Pd.sub.2dba.sub.3, and 1.95 mg (0.0064 mmol, 0.16 equiv.) P(Tol).sub.3 into a 50 mL two-necked flask. Add 14.0 mL degassed toluene into the two-necked flask and immerse in a 115? C. oil bath to react for 18 hours. After completion of the reaction, precipitate product in 28 mL MeOH and filter to get solid. Purify with column chromatography with chloroform/heptane=? as eluent. Collect product, remove the organic solvents by rotary evaporation, and vacuum dry for 16 hours to get 0.141 g bright bluish black solid product with a yield rate of 79.4%. .sup.1H NMR spectrum (500 MHz, d.sup.4-1,1,2,2-tetrachloroethane) of the compound 1: ? 9.17-9.22 (m, 6H), 8.78-8.83 (m, 2H), 7.98-8.25 (m, 8H), 7.39-7.45 (m, 2H), 4.82 (s, 8H), 3.29 (s, 8H), 2.96-3.03 (m, 4H), 2.12-2.15 (m, 4H), 0.87-1.98 (m, 298H).

Synthesis of Compound 2

(54) ##STR00041##

(55) Weight and add 0.198 g (0.100 mmol, 2.5 equiv.) I-1, 24.70 mg (0.040 mmol) I-11, 1.47 mg (0.0016 mmol, 0.04 equiv.) Pd.sub.2dba.sub.3, and 1.95 mg (0.0064 mmol, 0.16 equiv.) P(Tol).sub.3 into a 50 mL two-necked flask. Add 14.0 mL degassed toluene into the two-necked flask and immerse in a 115? C. oil bath to react for 18 hours. After completion of the reaction, precipitate product in 28 mL MeOH and filter to get solid. Purify with column chromatography with chloroform/heptane=1/1 as eluent. Collect product, remove the organic solvents by rotary evaporation, and vacuum dry for 16 hours to get 0.127 g bright bluish black solid product with a yield rate of 77.9%. .sup.1H NMR spectrum (500 MHz, d.sup.4-1,1,2,2-tetrachloroethane) of the compound 2: ? 9.12-9.20 (m, 4H), 9.00-9.03 (m, 2H), 8.82 (s, 2H), 7.95-8.01 (m, 6H), 7.47-7.51 (m, 2H), 4.79-4.84 (m, 8H), 4.20-4.23 (m, 2H), 3.26-3.29 (m, 8H), 2.15-2.18 (m, 5H), 1.97 (s, 8H), 0.87-1.46 (m, 274H).

Synthesis of Compound 3

(56) ##STR00042## ##STR00043##

(57) Weight and add 0.198 g (0.100 mmol, 2.5 equiv.) I-1, 37.00 mg (0.033 mmol) 1-12, 1.23 mg (0.0013 mmol, 0.04 equiv.) Pd.sub.2dba.sub.3, and 1.627 mg (0.0053 mmol, 0.16 equiv.) P(Tol).sub.3 into a 50 mL two-necked flask. Add 16.0 mL degassed toluene into the two-necked flask and immerse in a 115? C. oil bath to react for 18 hours. After completion of the reaction, precipitate product in 32 mL MeOH and filter to get solid. Purify with column chromatography with chloroform/heptane=3/2 as eluent. Collect product, remove the organic solvents by rotary evaporation, and vacuum dry for 16 hours to get 0.053 g bright bluish black solid product with a yield rate of 26.7%. .sup.1H NMR spectrum (500 MHz, d.sup.4-1,1,2,2-tetrachloroethane) of the compound 3: ? 9.20-9.23 (m, 6H), 8.78-8.82 (m, 6H), 7.99-8.04 (m, 9H), 7.69-7.78 (m, 6H), 7.27-7.41 (m, 6H), 4.82 (s, 12H), 2.16 (s, 6H), 1.95-1.98 (m, 12H), 0.87-1.47 (m, 402H).

Synthesis of Compound 4

(58) ##STR00044##

(59) Weight and add 0.1944 g (0.10 mmol, 2.5 equiv.) I-2, 16.4 mg (0.04 mmol) 2,5-bis(trimethylstannyl)thiophene, 1.47 mg (0.0016 mmol, 0.04 equiv.) Pd.sub.2dba.sub.3, and 1.95 mg (0.0064 mmol, 0.16 equiv.) P(Tol).sub.3 into a 50 mL three-necked flask. Add 14.0 mL degassed toluene into the two-necked flask and immerse in a 115? C. oil bath to react for 18 hours. After completion of the reaction, precipitate product in 28.0 mL MeOH and filter to get solid. Purify with column chromatography with chloroform/heptane=2/1 as eluent. Collect product, remove the organic solvents by rotary evaporation, and vacuum dry for 16 hours to get 0.062 g bright bluish black solid product with a yield rate of 40.7%.

(60) .sup.1H NMR spectrum (500 MHz, d.sup.4-1,1,2,2-tetrachloroethane) of the compound 4: ? 9.22 (s, 4H), 9.08 (s, 2H), 8.57-8.60 (m, 2H), 7.99-8.08 (m, 4H), 7.71-7.74 (m, 2H), 7.66=7.67 (m, 2H), 4.81-4.85 (m, 8H), 3.30-3.32 (m, 8H), 2.15-2.17 (m, 4H), 1.95-2.00 (m, 8H), 0.88-1.63 (m, 268H).

Synthesis of Compound 5

(61) ##STR00045##

(62) Weight and add 0.182 g (0.09 mmol, 3.0 equiv) I-4, 12.3 mg (0.030 mmol) 2,5-bis(trimethylstannyl)thiophene, 1.10 mg (0.0012 mmol, 0.04 equiv.) Pd.sub.2dbas, and 1.46 mg (0.0048 mmol, 0.16 equiv.) P(Tol).sub.3 into a 50 mL two-necked flask. Add 12.8 mL degassed toluene into the two-necked flask and immerse in a 115? C. oil bath to react for 18 hours. After completion of the reaction, precipitate product in 25.6 mL MeOH and filter to get solid. Purify with column chromatography with chloroform/heptane=4/1 as eluent. Collect product, remove the organic solvents by rotary evaporation, and vacuum dry for 16 hours to get 0.085 g black solid product with a yield rate of 71.2%. .sup.1H NMR spectrum (500 MHz, d.sup.4-1,1,2,2-tetrachloroethane) of the compound 5: ? 9.00 (s, 2H), 8.74 (s, 4H), 8.11 (s, 4H), 7.97-8.00 (m, 6H), 7.91-7.93 (m, 8H), 7.61 (s, 4H), 6.95 (s, 8H), 6.85 (s, 16H), 2.56 (t, 32H), 1.57-1.60 (m, 32H), 1.47 (s, 32H), 1.27-1.31 (m, 64H), 0.83-0.88 (m, 48H).

Synthesis of Compound 6

(63) ##STR00046##

(64) Weight and add 0.180 g (0.10 mmol, 2.5 equiv.) I-9, 16.4 mg (0.040 mmol) 2,5-bis(trimethylstannyl)thiophene, 1.47 mg (0.0016 mmol, 0.04 equiv.) Pd.sub.2dba.sub.3, and 1.95 mg (0.0064 mmol, 0.16 equiv.) P(Tol).sub.3 into a 50 mL two-necked flask. Add 12.6 mL degassed toluene into the two-necked flask and immerse in a 115? C. oil bath to react for 18 hours. After completion of the reaction, precipitate product in 25.2 mL MeOH and filter to get solid. Purify with column chromatography with chloroform/heptane=1/1 as eluent. Collect product, remove the organic solvents by rotary evaporation, and vacuum dry for 16 hours to get 0.090 g dark red solid product with a yield rate of 63.8%. .sup.1H NMR spectrum (500 MHz, d.sup.4-1,1,2,2-tetrachloroethane) of the compound 6: ? 9.01 (s, 2H), 8.87 (s, 4H), 8.77 (s, 2H), 7.98-8.04 (m, 2H), 7.95 (s, 4H), 7.82-7.85 (m, 4H), 7.74 (s, 4H), 7.61 (s, 2H), 6.95 (s, 8H), 6.87 (s, 16H), 2.56 (t, 32H), 1.58-1.65 (m, 32H), 1.46 (s, 32H), 1.23-1.30 (m, 64H), 0.80-0.83 (m, 48H).

Synthesis of Compound 7

(65) ##STR00047##

(66) Weight and add 0.180 g (0.10 mmol, 2.5 equiv.) I-9, 18.6 mg (0.040 mmol) 2,5-bis(trimethylstannyl)thiophene, 1.47 mg (0.0016 mmol, 0.04 equiv.) Pd.sub.2dba.sub.3, and 1.95 mg (0.0064 mmol, 0.16 equiv.) P(Tol).sub.3 into a 50 mL two-necked flask. Add 12.6 mL degassed toluene into the reaction and immerse in a 115? C. oil bath to react for 18 hours. After completion of the reaction, precipitate product in 25.2 mL MeOH and filter to get solid. Purify with column chromatography with chloroform/heptane=1/1 as eluent. Collect product, remove the organic solvents by rotary evaporation, and vacuum dry for 16 hours to get 0.114 g dark red solid product with a yield rate of 79.7%. .sup.1H NMR spectrum (500 MHz, d.sup.4-1,1,2,2-tetrachloroethane) of the compound 7: ? 9.01 (s, 2H), 8.87 (s, 4H), 8.77 (s, 2H), 7.94-8.00 (m, 4H), 7.82-7.85 (m, 4H), 7.73-7.78 (m, 8H), 6.95 (s, 8H), 6.84-6.87 (m, 16H), 2.56 (t, 32H), 1.56-1.62 (m, 32H), 1.31-1.37 (m, 96H), 0.84-0.99 (m, 48H).

Synthesis of Compound 8

(67) ##STR00048##

(68) Put a 100 mL two-necked flask into an oven, bake at 100? C. for 30 min and degas chloroform 30 min for later use. Weight and add 0.300 g (0.203 mmol) I-0, 0.267 g (1.016 mmol, 5 equiv.) IC-2Cl, and degassed 9.0 mL chloroform into a 100 mL two-necked flask and then purge argon gas into the two-necked flask. Add 0.3 mL pyridine into the two-necked flask and immerse in a 60? C. oil bath to react for an hour. After completion of the reaction, precipitate product in 30 mL MeOH and filter to get solid. Wash the solid with acetone and ethyl acetate and purify with column chromatography with toluene/heptane=3/1 as eluent. Collect product, remove the organic solvents by rotary evaporation, and vacuum dry for 16 hours to get 0.392 g bright bluish black solid product with a yield rate of 98.2%. .sup.1H NMR spectrum (600 MHz, CDCl.sub.3) of the compound 8: ? 9.19 (s, 2H), 8.81 (s, 2H), 7.96 (s, 2H), 4.75-4.76 (m, 4H), 3.24 (t, 4H), 2.09-2.11 (m, 2H), 1.88 (s, 4H), 0.81-1.26 (m, 172H).

(69) The n-type organic semiconductor compounds used in the present invention are shown in table 1.

(70) TABLE-US-00001 TABLE 1 n-type organic semiconductor compounds compound1 0 compound 2 compound 3 compound 4 compound 5 compound 6 compound 7 0 compound 8 compound 9 compound 10 compound 11

(71) The p-type organic semiconductor compounds used in the present invention are shown in table 2.

(72) TABLE-US-00002 TABLE 2 p-type organic semiconductor compounds poly- mer 1 poly- mer 2 poly- mer 3

(73) Refer to FIG. 1A, an organic optoelectronic device 10 according to the present invention includes a substrate 100, an electrode module 110, and an active layer 120. The electrode module 110 which consists of a first electrode 112 and a second electrode 114 is disposed over the substrate 100 while the active layer 120 is arranged between the first electrode 112 and the second electrode 114. The first electrode 112 is disposed between the substrate 100 and the active layer 120 while the second electrode 114 is located above the active layer 120.

(74) In this embodiment, the active layer 120 includes the present organic semiconductor mixture. At least one of the two electrodes, the first electrode 112 and the second electrode 114, is transparent or semi-transparent.

(75) In order to process the organic semiconductor mixture of the present invention, firstly at least one small molecule compound and/or polymer with at least one of the following features including charge transfer, semiconductivity, electrical conductivity, photoconductivity, hole blocking, and electron blocking is added and blended for preparation of a first component.

(76) Moreover, the present organic semiconductor mixture can be mixed with at least one of the following organic solvents including aliphatic hydrocarbons, chlorinated hydrocarbon, aromatic hydrocarbons, ketones, ethers, and combinations thereof such as toluene, o-xylene, p-xylene, 1,3,5- or 1,2,4-trimethylbenzene, tetrahydrofuran, and 2-methyltetrahydrofuran for preparing a second component.

(77) The organic semiconductor mixture can be used in a patterned organic semiconductor layer in the device described above. As to modern microcomputer applications, patterning of the thin organic semiconductor layer for production of small structure or patterns with lower cost (more devices per unit area) and power consumption can be achieved by photolithography, electron-beam lithography, or laser patterning.

(78) In order to form thin layers in electronics or optoelectronic devices, the organic semiconductor mixture of the present invention can be deposited by suitable ways. In the device, liquid coating is better than vacuum deposition. The organic semiconductor mixture of the present invention can make a plurality of liquid coating techniques become feasible.

(79) Preferred deposition techniques include but not limited to dip coating, spin coating, ink-jet printing, nozzle-printing, relief printing, screen printing, gravure printing, blade coating, roller printing, reverse roll coating, planographic printing, dry offset printing, flexographic printing, web printing, spray coating, curtain coating, brush coating, slot-dye coating, and pad printing.

(80) An organic optoelectronic device containing the present organic semiconductor mixture, the first component formed by the organic semiconductor mixture, or the second component formed by the organic semiconductor mixture is also provided. The organic optoelectronic device includes a substrate, an electrode module disposed on the substrate and provided with a first electrode and a second electrode, and an active layer arranged between the first electrode and the second electrode and made from material containing at least one present organic semiconductor mixture. At least one of the two electrodes, the first electrode and the second electrode, is transparent or semi-transparent.

(81) In another embodiment, refer to FIG. 1B, an organic optoelectronic device 10 includes a substrate 100, an electrode module 110, and an active layer 120. The electrode module 110 is disposed over the substrate 100 and provided with a first electrode 112 and a second electrode 114 while the active layer 120 is arranged between the first electrode 112 and the second electrode 114. The second electrode 114 is located between the substrate 100 and the active layer 120 while the first electrode 112 is located above the active layer 120.

(82) The substrate 100 is preferred to be a glass substrate or a transparent soft substrate with mechanical strength, hot strength, and transparency. Materials for the transparent soft substrate include polyethylene, ethylene vinyl acetate copolymer, ethylene-vinyl alcohol copolymer, polypropylene, polystyrene, poly (methyl methacrylate), polyvinyl chloride, polyvinyl alcohol, polyvinyl butyral, nylon, polyetheretherketone, polysulfone, polyethersulfone, tetrafluoroethylene perfluoroalkyl vinyl ether copolymer, polyvinyl fluoride, ethylene-tetrafluoroethylene copolymer, tetrafluoroethylene-hexafluoropropylene copolymer, polychlorotrifluoroethylene, polyvinylidene difluoride, polyester, polycarbonate, polyurethane, polyimide, etc.

(83) The first electrode 112 is made from metal oxides and their fluorine-doped derivatives such as transparent indium oxides, tin oxides, fluorine-doped tin oxide (FTO) or complex metal oxides including indium tin oxide (ITO), indium zinc oxide (IZO), etc.

(84) The second electrode 114 can be made from metal oxides, metals (silver, aluminum, gold), conductive polymer, carbon-based conductors, metal compounds, or conductive films formed by combinations of the above materials.

(85) In a preferred embodiment, the active layer 120 of the organic optoelectronic device 10 includes at least one n-type organic semiconductor compound such as the organic semiconductor compounds of the present invention mentioned above and at least one p-type organic semiconductor compound mentioned above.

(86) In a preferred embodiment, the n-type organic semiconductor compound of the organic optoelectronic device 10 is preferred selected from the group consisting compound 1 to compound 11 shown in the above table one.

(87) In a third embodiment shown in FIG. 1C, the respective components of the organic optoelectronic device 10 are arranged at the same order as the above first embodiment but the organic optoelectronic device 10 further includes a first carrier transport layer 130 disposed between the first electrode 112 and the active layer 120, and a second carrier transport layer 140 arranged between the second electrode 114 and the active layer 120.

(88) In a fourth embodiment, please refer to FIG. 1D. The respective components of the organic optoelectronic device 10 of this embodiment are arranged the same as those of the first embodiment. Yet the organic optoelectronic device 10 further includes a first carrier transporting layer 130 arranged between the second electrode 114 and the active layer 120, and a second carrier transporting layer 140 disposed between the first electrode 112 and the active layer 120.

(89) In a fifth embodiment shown in FIG. 1E, the respective components of the organic optoelectronic device 10 of this embodiment are arranged the same as those of the second embodiment but the organic optoelectronic device 10 further includes a first carrier transporting layer 130 arranged between the second electrode 114 and the active layer 120, and a second carrier transporting layer 140 disposed between the first electrode 112 and the active layer 120.

(90) In a sixth embodiment shown in FIG. 1F, arrangement of the respective components of the organic optoelectronic device 10 is the same as that of the second embodiment. The organic optoelectronic device 10 further includes a first carrier transporting layer 130 and a second carrier transporting layer 140. The first carrier transporting layer 130 is arranged between the first electrode 112 and the active layer 120 while the second carrier transporting layer 140 is disposed between the second electrode 114 and the active layer 120.

(91) In the third to sixth embodiments mentioned above, material for the first carrier transporting layer 130 is selected from the followings: conjugated polymer electrolytes such as PEDOT:PSS, polymeric acid such as polyacrylate, conjugated polymers such as Poly[bis(4-phenyl)(2,4,6-triMethylphenyl)aMine] (PTAA), insulating polymer such as Nafion film, Polyethylenimine and Polystyrene sulfonates, polymer doped with metal oxides including MoOx, NiOx, WOx, SnOx, organic small molecule compounds such as N,N-diphenyl-N,N-bis-(1-naphthyl) (1,1-biphenyl)-4,4 diamine (NPB), N,N-diphenyl-N,N-(3-aminomethyl phenyl)-1,1-biphenyl-4,4-diamine (TPD), or combinations thereof.

(92) In the third to sixth embodiments mentioned above, material for the second carrier transporting layer is selected from the followings, conjugated polymer electrolytes such as polyethylenimine, conjugated polymer such as poly[3-(6-trimethylammoniumhexyl) thiophene], poly[9,9-bis(2-ethylhexyl)fluorene]-b-poly[3-(6-trimethylanmmoniumhexyl)thiophene], or poly[(9,9-bis(3-(N,N-dimethylamino)propyl)-2,7-fluorene)-alt-2,7-(9,9-dioctylfluorene)], organic small molecule compound such as Tris(8-hydroxyquinoline)aluminum(III) (Alq.sub.3), 4,7-diphenyl-1,10-phenanthroline, metal oxides such as ZnOx, aluminum-doped zinc oxide (AZO), TiOx and their nanoparticles, salts such as LiF, NaF, CsF, and CsCO.sub.3, and amines such as primary amines, secondary amines, and tertiary amines.

(93) In order to learn performance improvement of the organic optoelectronic device caused by the present organic semiconductor mixture, test properties and performance of the organic optoelectronic device. The followings are test results. spectrum for measurement of thermal stability

(94) Use Hitachi UV-Visible/NIR Spectrophotometer UH5700 to measure absorption spectrum of samples. A sample solution is prepared by using compound 1:D1, compound 2:D1, compound 3:D1, and compound 8:D1=1.2:1 in chloroform containing 0.5% 1-chloronaphthalene with total dissolved solids of 11 mg/mL while compound 4:D1 and compound 9:D1=1.2:1 are prepared in chloroform with total dissolved solids of 11 mg/mL. Compound 5:D2 and compound 10:D2 with a ratio of 1.2:1 are prepared in chloroform with total dissolved solids of 20 mg/mL while compound 6:D3, compound 7:D3, and compound 11:D3 with a ratio of 1.2:1 are prepared in o-xylene with total dissolved solids of 20 mg/mL

(95) After being prepared, the above sample is coated on the substrate made of glass by spin coating to form a thin film with a thickness of about 100 nm. Then bake and dry at 100? C. for 1 minute and measure absorption spectrum of the solid thin film.

(96) Take a heating plate and increase the temperature up to 40? C. Bake the thin film for 5 minutes, take out and cool down the thin film, and measure absorption spectrum. Then increase the temperature to the next temperature (60? C.) and bake for 5 minutes. Then take out and cool down the thin film, and measure absorption spectrum again. Repeat the above steps until the absorption spectrum has a significant change at certain temperature (or the highest temperature 220? C.). Next compare the amount of change in spectra of the thin films of the respective mixtures. preparation and test of organic optoelectronic device

(97) Use glass with sheet resistance and patterned ITO coating as a substrate and treat by ultrasonic vibration in neutral detergent, deionized water, acetone, and isopropanol in turn. The substrate is washed for 15 minutes in each step. The washed substrate is further cleaned by UV-O.sub.3 treatment for 15 minutes. Then coat ZnO on the ITO substrate by spin coating. Bake in the air at 150? C. for 20 minutes. Next prepare an active layer solution (weight ratio of p-type material to n-type material=1:1.2) in a selected solvent (total dissolved solids and the solvent used are shown in the following table). In order to dissolve the polymer completely, the active layer solution is stirred on a heating plate at 100? C. for at least 3 hours. Then place the solution at room temperature and perform coating after cool down. Later the thin film is annealed for 5 minutes at the temperature selected (as shown in the following table). Then place the thin film into an evaporator. Deposit a thin film of molybdenum trioxide (8 nm) used as the carrier transport layer and silver think film (100 nm) used as external electrode under vacuum of 3?10.sup.?6 Torr. Then measure J-V properties of the organic optoelectronic device in the air at morn temperature using a solar simulator (100 mW cm.sup.?2 xenon lamp with AM1.5G filter) under light intensity of 1000 W/m.sup.2 AM1.5G. Standard silicon diode with KG5 filter is used as reference cell for calibration of light intensity and calibrated by third party before use. Use Keithley? 2400 source meter to record the J-V properties. The cell area is 4 mm.sup.2 and the area is defined by a metal mask aligned with the organic optoelectronic device. The structure of the organic optoelectronic device is glass/ITO/ZnO/ATL/MoO.sub.3/Ag and formulation of the active layer and the annealing temperature of the organic optoelectronic device are shown in the table 1.

(98) TABLE-US-00003 TABLE 1 formulation of the active layer and annealing temperature of the organic optoelectronic devices total Annealing p-type dissolved temperature n-type material material solids solvent used (?) compound 1 D1 11 mg/ml chloroform + 0.5% 120 compound 2 1-chloronaphthalene compound 3 compound 8 compound 4 chloroform 100 compound 9 compound 5 D2 20 mg/mL chloroform 80 compound 10 compound 6 D3 20 mg/mL o-xylene 80 compound 7 compound 11 measurement of thermal stability of organic optoelectronic device preparation and test of organic optoelectronic device

(99) Use glass with sheet resistance and patterned ITO coating as a substrate and treat by ultrasonic vibration in neutral detergent, deionized water, acetone, and isopropanol in turn. The substrate is washed for 15 minutes in each step. The washed substrate is further cleaned by UV-ozone cleaner for 15 minutes. Then coat ZnO on the ITO substrate by spin coating. Bake in the air at 15? C. for 20 minutes. Next prepare an active layer solution (weight ratio of p-type material to n-type material=1:1.2) in a selected solvent (total dissolved solids and the solvent used are shown in the following table). In order to dissolve the polymer completely, the active layer solution is stirred on a heating plate at 100? C. for at least 3 hours. Then place the solution at room temperature and perform coating after cool down. Later the thin film is annealed for 5 minutes (as shown in the following list). Bake test specimen (sample) before evaporation (annealing and bake temperature are shown in the following stable). Then place the thin film into an evaporator after completing baking. Deposit a thin film of molybdenum trioxide (8 nm) used as the carrier transport layer and silver think film (100 nm) used as external electrode under vacuum of 3?10.sup.?6 Torr. Then measure J-V properties of the organic optoelectronic device in the air at room temperature using a solar simulator (100 mW cm.sup.?2 xenon lamp with AM1.5G filter) under light intensity of 1000 W/m.sup.2 AM1.5G. Standard silicon diode with KG5 filter is used as reference cell for calibration of light intensity and calibrated by third party before use. Use Keithley? 2400 source meter to record the J-V properties. The cell area is 4 mm.sup.2 and the area is defined by a metal mask aligned with the organic optoelectronic device. The structure of the organic optoelectronic device is glass/ITO/ZnO/ATI/MoO.sub.3/Ag and formulation of the active layer, annealing temperature, and forging temperature of the organic optoelectronic device are shown in the table 2.

(100) TABLE-US-00004 TABLE 2 formulation of the active layer, annealing temperature, and forging temperature of organic optoelectronic device total annealing baking n-type p-type dissolved temperature temperature material material solids solvent used (? C.) (? C.) compound 1 D1 11 mg/mL chloroform + 0.5% 120 180 compound 2 1-chloronaphthalene compound 3 compound 8 compound 4 chloroform 100 140 compound 9 compound 5 D2 20 mg/mL chloroform 80 160 compound 10 compound 6 D3 20 mg/mL o-xylene 80 120 160 compound 7 compound 11

(101) The thin film of the active layer is processed by different baking temperature for discussion of material stability. The baking temperature is ranging from room temperature to 200? C.

(102) The test results show that spectra of the mixture of compound 1/D and the mixture of compound 2/D2 have no changes in patterns along with the increasing temperature (as shown in FIG. 2A and FIG. 2B). This means the thin film of both the mixtures has better thermal stability. Although spectrum of the mixture of compound 3/D1 has some changes at 130? C., the spectrum patterns over 140? C. keep the same, without continuous changes (as shown in FIG. 2C).

(103) Among results of comparative examples, the mixture of compound 8/D1 has a slight change in the spectrum pattern contiguously between 120? C. and 200? C. (as shown in FIG. 2D). This means the thin film of the mixture of the compound 8/D1 continues to have changes during heating process and thus the thermal stability of the thin film of the mixture of the compound 8/D1 is less than thermal stability of the mixture of the compound/D1, the mixture of compound 2/D1, and the mixture of compound 3/D1. During preparation, the annealing temperature is 120? C. for 5 minutes while the baking temperature is 180? C. for 30 minutes.

(104) TABLE-US-00005 TABLE 3 performance test and film surface state of organic optoelectronic device film surfaces annealing baking: condition n-type p-type 120? C. 180? C. V.sub.oc J.sub.sc FF PCE PCE.sub.avg PCE/ Particle/ material material 5 min 30 min (V) (mA/cm.sup.2) (%) (%) (%) PCE.sub.without forging smooth foggy compound 8 D1 V X 0.91 21.08 60.88 11.65 11.32 V V V 0.87 4.76 30.58 1.28 1.03 9.1% V compound 1 V X 0.96 20.87 60.40 12.13 11.80 V V V 0.94 20.28 64.29 12.33 12.10 102.5% V compound 2 V X 0.96 18.08 58.71 10.15 9.97 V V V 0.95 16.76 63.21 10.03 9.86 98.9% V compound 3 V X 0.94 10.87 53.97 5.50 5.41 V V V 0.92 9.97 61.20 5.60 5.48 101.3% V

(105) According to test results, the comparative example of the compound 8/D1 has an initial efficiency up to 11.32% while being treated by only annealing without baking in the beginning. But the efficiency of the organic optoelectronic device with baking is reduced from 11.32% to 1.03%. This shows that the thin film of the mixture used as the active layer of the organic optoelectronic device has phase changes after being heated and the phase changes lead to a reduction in efficiency of the organic optoelectronic device. By contrast, the embodiments of the compound 1/D1, the compound 2/D1, and the compound 3/D1 keep the initial efficiency of the organic optoelectronic device up to 95% after baking at 180? C. for 30 minutes no matter the initial efficiency of the organic optoelectronic device is high or low. Thereby the mixture of the compound 1/D1, the mixture of the compound 2/D1, and the mixture of the compound 3/D1 have better thermal stability compared with the mixture of the compound 8/D1.

(106) Moreover, the thin film of the active layer is processed by different baking temperature for discussion of material stability. The spectrum is measured from room temperature to 160? C. The results show that the comparative example (mixture of compound 9/D1) has obvious change in the spectrum pattern (as shown in FIG. 3A) after being heated at 140? for 5 minutes while the spectrum of the mixture of compound 4/D1 only has a small magnitude of change in the pattern after being heated at 160? for 5 minutes (as shown in FIG. 3B). This means film thermal stability of the mixture of the compound 9/D1 is poor compared with that of the mixture of the compound 4/D1, also refer to table 4 to learn test results.

(107) TABLE-US-00006 TABLE 4 performance test and film surface state of organic optoelectronic device annealing baking film surface state n-type p-type 100? 140? V.sub.oc Jsc FF PCE PCE.sub.avg. PCE/ Particle/ material material 5 min 30 min (V) (mA/cm.sup.2) (%) (%) (%) PCE.sub.without forging smooth foggy compound D1 V X 0.89 20.65 66.27 12.20 12.07 V 9 V V 0.89 8.94 50.11 3.98 3.58 30% V compound V X 0.96 18.43 53.53 9.53 9.33 V 4 V V 0.95 18.62 53.32 9.45 9.13 98% V

(108) Take a look at an appearance of the organic optoelectronic device made from the mixture being baked at 140? C. for 30 min. After baking, a film of the embodiment of the mixture of compound 4/D1 has smooth and intact appearance. Also observe the comparative example, a film surface of the mixture of compound 9/D1 used as the active layer after baking is foggy and the electrode is also foggy after baking. These all indicate that surface of the film being baked is different from that of the film without being baked.

(109) According to the above results, it is learned that the comparative example of compound 9/D1 treated by annealing without baking has an initial efficiency of 12.07% while the efficiency is dropped from 12.07% to 3.58% after baking. The results show that the blend film used as the active layer of the organic optoelectronic device has phase change after being heated and the phase change further causes a reduction in efficiency of the organic optoelectronic device. By contrast, an initial efficiency of the embodiment of compound 4/D1 treated by annealing without baking is 9.33%. After being baked at 140? C. for 30 min, the initial efficiency of the organic optoelectronic device is maintained at 98% of the initial efficiency. The results show that the mixture of compound 4/D has better thermal stability than the mixture of the compound 9/D1.

(110) Among the test results, the mixture of compound 10/D2 used as the comparative example has obvious and continuous change in the spectrum after being heated at 100? C. for 5 min (as shown in FIG. 4A) while the spectrum of the mixture of compound 5D2 don't have obvious change after being heated up to 160? C. for 5 min (as shown in FIG. 4B). This means the thermal stability of the film of the mixture of the comparative example is lower than that of the mixture of compound 5/D2. The results are shown in Table 5.

(111) TABLE-US-00007 TABLE 5 performance test and film surface state of organic optoelectronic device annealing baking film surface state n-type p-type 80? C. 160? C. V.sub.oc J.sub.sc FF PCE PCE.sub.avg. PCE/ Particle/ material material 5 min 30 min (V) (mA/cm.sup.2) (%) (%) (%) PCE.sub.without forging smooth foggy compound10 D2 V X 0.64 23.17 58.03 8.68 8.58 V V V 0.65 18.56 63.85 7.68 7.33 85% V compound 5 V X 0.70 16.38 48.52 5.53 5.49 V V V 0.70 18.02 53.67 6.78 6.68 122% V

(112) According to the above results, the comparative example of the mixture of compound 10/D2 has an initial efficiency of 8.58% while being treated only by annealing without baking in the beginning but the efficiency is dropped from 8.58% to 7.33% after baking. The results show that the blend film used as the active layer of the organic optoelectronic device has phase change after being heated and the phase change further causes a reduction in efficiency of the organic optoelectronic device. By contrast, an initial efficiency of the embodiment of compound 5/D2 treated by annealing without baking is 5.49%. After being forged at 160? C. for 30 min, the initial efficiency of the organic optoelectronic device is increased up to 122% of the initial efficiency. The results show that the mixture of compound 5/D2 not only has higher thermal stability than the mixture of the compound 10/D2, but also more suitable for high-temperature process during manufacturing of the organic optoelectronic device.

(113) The thin film of the active layer is processed by different baking temperature for discussion of material stability. The spectrum is measured from room temperature to 160?. The results show that the comparative example of the mixture of compound 11/D3 has obvious and continuous change in the spectrum (as shown in FIG. 5A) from being heated at 100? C. to 160? C. while the spectra of the embodiments of compound 6/D3 and compound 7/D3 have no changes in the patterns along with the increasing temperature (as shown in FIG. 5B and FIG. 5C). This means both embodiments have better thermal stability. The results shown in table 6 indicate that the blend film of the compound 11/D3 keeps changing during the heating process and the thermal stability of the mixture of compound 11/D3 film is poor than the embodiments of the mixture of compound 6/D3 and the mixture compound 7/D3.

(114) TABLE-US-00008 TABLE 6 performance test and film surface state of organic optoelectronic device annealing: baking: forging: film surface state N-type P-type 80? C. 120? C. 160? C. V.sub.oc J.sub.sc FF PCE PCE.sub.avg. PCE/ particle/ material material 5 min 30 min 30 min (V) (mA/cm.sup.2) (%) (%) (%) PCE.sub.without forging smooth foggy compound11 D3 V X X 0.90 16.11 69.08 9.98 9.86 V V V X 0.89 12.27 60.27 6.60 6.53 66% V V X V 0.88 9.17 50.35 4.08 4.04 41% V compound 6 V X X 0.96 14.00 62.22 8.33 8.23 V V V X 0.94 13.80 65.00 8.48 8.33 101% V V X V 0.95 9..28 50.61 4.48 4.39 53% V compound 7 V X X 0.96 14.31 64.69 8.80 8.68 V V V X 0.95 15.13 65.84 9.48 9.28 107% V V X V 0.94 14.62 67.59 9.28 9.05 104% V

(115) According to the above results, the comparative example of the mixture of compound 11/D3 has an initial efficiency of 9.86% while being treated only by annealing without baking in the beginning but the efficiency is decreased from 9.86% to 6.53% after baking at 120? C. for 30 min. The efficiency of the comparative example of the mixture of compound 11/D3 being baked at 160? C. for 30 min is further dropped to 4.04%. The results show that the blend film used as the active layer of the organic optoelectronic device has phase change after being heated and the phase change further causes a reduction in efficiency of the organic optoelectronic device. The higher the baking temperature, the larger the reduction of the efficiency. By contrast, an initial efficiency of the embodiment of the mixture of compound 6/D3 treated by annealing without baking is 8.23%. After being baked at 120? C. for 30 min, the efficiency of the organic optoelectronic device has no obvious reduction, maintained at 101% of the initial efficiency. Yet after baking at 160? C. for 30 min, the efficiency of the embodiment of the mixture compound 6/D3 is dropped to 53% of the efficiency of the organic optoelectronic device without being baked. Compared with the comparative example of the mixture of compound 11/D3, the embodiment of the mixture of compound 6/D3 still has better thermal stability.

(116) The embodiment of the mixture of compound 7/D3 treated only by annealing without baking has an initial efficiency of 8.68%. No matter being baked at 120? C. for 30 min or being baked at 160? C. for 30 min, the efficiency of the organic optoelectronic device is not reduced and even increased to 107% of the initial efficiency. The results show that the embodiment of the mixture of compound 7/D3 not only has higher thermal stability compared with the comparative example of the mixture of compound 11/D3, but also appears more suitable to be applied to high temperature process during manufacturing of the organic optoelectronic device.

(117) In summary, the organic semiconductor mixture and the organic optoelectronic device containing the same according to the present invention have higher thermal stability and become more suitable for high temperature manufacturing process compared with the comparative examples.

(118) Additional advantages and modifications will readily occur to those skilled in the art. Therefore, the invention in its broader aspects is not limited to the specific details, and representative devices shown and described herein. Accordingly, various modifications may be made without departing from the spirit or scope of the general inventive concept as defined by the appended claims and their equivalent.