Method to produce uranium silicides

10457558 ยท 2019-10-29

Assignee

Inventors

Cpc classification

International classification

Abstract

The method described herein may be characterized as reacting uranium dioxide with carbon to produce uranium carbide, and, reacting the uranium carbide with a silane, a silicon halide, a siloxane, or combinations thereof, and excess hydrogen to produce uranium silicide.

Claims

1. A method comprising: forming uranium dioxide; reacting uranium dioxide with carbon to produce uranium carbide; and, reacting uranium carbide with a silicon based reactant comprised of a silane, a silicon halide, a siloxane, and combinations thereof, in the presence of excess hydrogen to form a uranium silicide product, wherein uranium dioxide is formed by a process selected from the group consisting of an ammonium uranyl carbonate process, an ammonium diuranate process, and an integrated dry route process.

2. The method recited in claim 1 wherein the silicon based reactant has from 1 to 6 silicon atoms in a linear, branched, or cyclic configuration.

3. The method recited in claim 1 wherein the uranium silicide is U.sub.3Si.sub.2.

4. The method recited in claim 1 wherein the ratio of uranium to silicon in the uranium silicide product is varied by the ratio of feed compounds used to form one or more of uranium dioxide, uranium carbide, and the silicon based reactant.

5. The method recited in claim 1 wherein the method is carried out in a rotary kiln.

6. The method recited in claim 1 wherein each step is carried out at temperatures below the melting point of reactants contributing to the targeted stoichiometry of uranium silicide.

7. The method recited in claim 1 further comprising homogenizing the uranium silicide product at a temperature above the temperature at which the formation of the uranium silicide is carried out and below the melting temperature of the uranium silicide.

8. The method recited in claim 1 wherein the silicon based reactant has the general formula Si.sub.nX.sub.2n+2, where n is an integer from 1 to 6 and X is selected from the group consisting of hydrogen, halides, and combinations thereof.

9. A method comprising: forming uranium dioxide; reacting uranium dioxide with carbon to produce uranium carbide; and, reacting uranium carbide with a silicon based reactant comprised of a silane, a silicon, halide, a siloxane, and combinations thereof, in the presence of excess hydrogen to form a uranium silicide product; wherein the silicon based reactant has the general formula Si.sub.nX.sub.2n+2, where n is an integer from 1 to 6 and X is selected from the group consisting of hydrogen, halides, and combinations thereof.

10. The method recited in claim 9 wherein uranium dioxide is formed from a uranium fluoride.

11. The method recited in claim 10 wherein the uranium fluoride is selected from uranium hexaflouride (UF.sub.6), uranyl fluoride (UO.sub.2F.sub.2) and uranium tetrafluoride (UF.sub.4).

12. The method recited in claim 9 wherein the silicon based reactant has from 1 to 6 silicon atoms in a linear, branched, or cyclic configuration.

13. The method recited in claim 9 wherein the uranium silicide is U.sub.3Si.sub.2.

14. The method recited in claim 9 wherein the ratio of uranium to silicon in the uranium silicide product is varied by the ratio of feed compounds used to form one or more of uranium dioxide, uranium carbide, and the silicon based reactant.

15. The method recited in claim 9 wherein each step is carried out at temperatures below the melting point of reactants contributing to the targeted stoichiometry of uranium silicide.

16. The method recited in claim 9 further comprising homogenizing the uranium silicide product at a temperature above the temperature at which the formation of the uranium silicide is carried out and below the melting temperature of the uranium silicide.

17. The method recited in claim 9 wherein uranium dioxide is formed by a process selected from the group consisting of an ammonium uranyl carbonate process, an ammonium diuranate process, and an integrated dry route process.

18. A method comprising: forming uranium, dioxide; reacting uranium dioxide with carbon to produce uranium carbide; and, reacting uranium carbide with a silicon based, reactant comprised of a silane, a silicon halide, a siloxane, and combinations thereof, in the presence of excess hydrogen to form a uranium silicide product; wherein residual carbon is removed by reacting the residual carbon with a silicon halide and excess halide.

19. The method recited in claim 18 wherein the halide is selected from the group consisting of fluoride, chloride, bromide, iodide, and combinations thereof.

20. The method recited in claim 18 wherein the silicon based reactant has from 1 to 6 silicon atoms in a linear, branched, or cyclic configuration.

21. The method recited in claim 18 wherein the uranium silicide is U.sub.3Si.sub.2.

22. The method recited in claim 18 wherein the ratio of uranium to silicon in the uranium silicide product is varied by the ratio of feed compounds used to form one or more of uranium dioxide, uranium carbide, and the silicon based reactant.

23. The method recited in claim 18 wherein each step is carried out at temperatures below the melting point of reactants contributing to the targeted stoichiometry of uranium silicide.

24. The method recited in claim 18 further comprising homogenizing the uranium silicide product at a temperature above the temperature at which the formation of the uranium silicide is carried out and below the melting temperature of the uranium silicide.

25. The method recited in claim 18 wherein uranium dioxide is formed by a process selected from the group consisting of an ammonium uranyl carbonate process, an ammonium diuranate process, and an integrated dry route process.

26. The method recited in claim 18 wherein the silicon based reactant has the general formula Si.sub.nX.sub.2n+2, where n is an integer from 1 to 6 and X is selected from the group consisting of hydrogen, halides, and combinations thereof.

27. A method comprising: forming uranium dioxide; reacting uranium dioxide with carbon to produce uranium carbide; and, reacting uranium carbide with a silicon based reactant comprised of a silane, a silicon halide, a siloxane, and combinations thereof, in the presence of excess hydrogen to form a uranium silicide product; wherein the step of forming the uranium silicide is carried out at temperatures between 500 and 800 K.

28. The method recited in claim 27 wherein the silicon based reactant has from 1 to 6 silicon atoms in a linear, branched, or cyclic configuration.

29. The method recited in claim 27 wherein the uranium silicide is U.sub.3Si.sub.2.

30. The method recited in claim 27 wherein the ratio of uranium to silicon in the uranium silicide product is varied by the ratio of feed compounds used to form one or more of uranium dioxide, uranium carbide, and the silicon based reactant.

31. The method recited in claim 27 wherein each step is carried out at temperatures below the melting point of reactants contributing to the targeted stoichiometry of uranium silicide.

32. The method recited in claim 27 further comprising homogenizing the uranium silicide product at a temperature above the temperature at which the formation of the uranium silicide is carried out and below the melting temperature of the uranium silicide.

33. The method recited in claim 27 wherein uranium dioxide is formed by a process selected from the group consisting of an ammonium uranyl carbonate process, an ammonium diuranate process, and an integrated dry route process.

34. A method for producing a uranium silicide nuclear fuel comprising a reaction represented by: (1) UF.sub.6+H.sub.2+2H.sub.2O.fwdarw.UO.sub.2+6HF; (2) one or both of (i) UO.sub.2+3C.fwdarw.UC+2CO and (ii) UO.sub.2+2C.fwdarw.UC+CO.sub.2; and, (3) 3UC+one of 2SiX.sub.4 or Si.sub.2O+2X.sub.2.fwdarw.U.sub.3Si.sub.2+3CX.sub.4, wherein X is, selected from the group consisting of H, Cl, F, Br, and I and combinations thereof.

35. The method recited in claim 34 wherein the process is carried out in a rotary kiln.

36. The method recited in claim 35 wherein the halide is selected from the group consisting of fluoride, chloride, bromide, iodide, and combinations thereof.

37. The method recited in claim 34 wherein step (3) is carried out at temperatures between 500 and 800 K.

38. The method recited in claim 34 wherein, following the third reaction step, residual carbon is removed by reacting the residual carbon with a silicon halide and excess halide.

39. The method recited in claim 34 further comprising, homogenizing the uranium silicide product at a temperature below the melting temperature of the uranium silicide product.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

(1) The characteristics and advantages of the present disclosure may be better understood by reference to the accompanying FIGURE, which provides a graph showing the Gibbs free energy (eV) values of several reactants (H, Cl, F, and Br) over a range of temperatures from 0 to 2000 K.

DESCRIPTION OF THE PREFERRED EMBODIMENTS

(2) As used herein, the singular form of a, an, and the include the plural references unless the context clearly dictates otherwise.

(3) In the present application, including the claims, other than where otherwise indicated, all numbers expressing quantities, values or characteristics are to be understood as being modified in all instances by the term about. Thus, numbers may be read as if preceded by the word about even though the term about may not expressly appear with the number. Accordingly, unless indicated to the contrary, any numerical parameters set forth in the following description may vary depending on the desired properties one seeks to obtain in the compositions and methods according to the present disclosure. At the very least, and not as an attempt to limit the application of the doctrine of equivalents to the scope of the claims, each numerical parameter described in the present description should at least be construed in light of the number of reported significant digits and by applying ordinary rounding techniques.

(4) Any numerical range recited herein is intended to include all sub-ranges subsumed therein. For example, a range of 1 to 10 is intended to include all sub-ranges between (and including) the recited minimum value of 1 and the recited maximum value of 10, that is, having a minimum value equal to or greater than 1 and a maximum value of equal to or less than 10.

(5) The term rotary kiln or alternatively, calciner, means a rotating tubular pyrohydrolysis oven, for example, one provided with heater means, powder feed means at an entry end and injector means near the reaction product exit for injecting, for example, a countercurrent flow of one or more of steam, gaseous H.sub.2O and H.sub.2 as generally described in U.S. Pat. No. 6,136,285, or other commercially available equivalent ovens.

(6) The method described herein may be characterized as reacting uranium dioxide with carbon to produce uranium carbide, and, reacting the uranium carbide with a silicon based reactant comprised of a silane, a silicon halide, a siloxane, and combinations thereof, and excess hydrogen to produce uranium silicide.

(7) The method may in various aspects be characterized as forming uranium dioxide, reacting uranium dioxide with carbon from any suitable carbon source, such as graphite or carbon black, to produce uranium carbide, and, reacting the uranium carbide with a silicon based reactant in a linear, branched, or cyclic configuration. The silicon based reactant may be selected from a silane (e.g., SiH.sub.4, Si.sub.2H.sub.6, Si.sub.3H.sub.8, Si.sub.4H.sub.10, Si.sub.5H.sub.12 or Si.sub.6H.sub.14), a silicon halide (e.g., SiF.sub.4, SiH.sub.3F, Si.sub.2H.sub.5F, Si.sub.3H.sub.6Cl.sub.2, Si.sub.4H.sub.8B.sub.2, Si.sub.5H.sub.8I.sub.4 or Si.sub.6H.sub.10Cl.sub.4, and the like), or a siloxane (e.g., Si.sub.2O) in the presence of excess hydrogen (H.sub.2) to a produce uranium silicide. In various aspects, the silicon based reactant may have the general formula Si.sub.nX.sub.2n+2, where n is from 1 to 6 and X is selected from the group consisting of hydrogen, halides, and combinations thereof. In other aspects, the silicon based reactant may be in a cyclic configuration having fewer than 2n+2 X molecules.

(8) An exemplary representation of the method may be shown as:
UF.sub.6+H.sub.2+2H.sub.2O.fwdarw.UO.sub.2+6HF,
or any suitable known method for producing uranium dioxide. The conversion of uranium dioxide to uranium carbide may proceed as follows:
UO.sub.2+3C.fwdarw.UC+2CO
or
UO.sub.2+2C.fwdarw.UC+CO.sub.2.
The uranium carbide is reacted with a stoichiometric amount of a silicide, in an exemplary reaction that proceeds as follows:
3UC+2SiX.sub.4+2X.sub.2.fwdarw.U.sub.3Si.sub.2+3CX.sub.4,
wherein X is preferably H, such that the reaction may be represented as follows:
3UC+2SiH.sub.4+2H.sub.2.fwdarw.U.sub.3Si.sub.2+3CH.sub.4.
X may also be a halide selected from the group consisting of F, Cl, B, and I, or a mixture of H and halide. If X is a halide, the reaction has been thermodynamically determined to be more difficult due to the high Gibbs free energy in the halide systems, as shown in the attached FIGURE.

(9) Suitable known methods for producing uranium oxides include, for example, ammonium uranyl carbonate (AUC), ammonium diuranate (ADU), and integrated dry route (IDR) processes. Those skilled in the art will appreciate that any source of or method of producing uranium dioxide will suffice.

(10) An exemplary ammonium uranyl carbonate (AUC) process may, in various aspects, be a two-step process that proceeds as follows:
UF.sub.6+5H.sub.2O+10NH.sub.3+3CO.sub.2.fwdarw.(NH.sub.6).sub.4(UO.sub.2(CO.sub.3).sub.3)+6NH.sub.4F
(NH.sub.4).sub.4(UO.sub.2(CO.sub.3).sub.3)+H.sub.2.fwdarw.UO.sub.2+4NH.sub.3+3CO.sub.2+3H.sub.2O.
The chemical composition of the AUC precipitates vary according to the C/U ratio of the precipitation solution. A C/U ratio greater than or equal to 7.5 yields a precipitate composition represented by (NH.sub.4).sub.4(UO.sub.2(CO.sub.3).sub.3). The UO.sub.2 conversion is characterized by the formation of discrete particles of 40-300 m in size, which permits direct pelletizing.

(11) An exemplary ammonium diuranate (ADU) process may in various aspects proceed by reacting UF.sub.6 with water to form a uranyl fluoride solution or uranyl nitrate solution with ammonium hydroxide solution to produce an ADU precipitate. Following calcination of the ADU precipitate in nitrogen and reduction with the steam-hydrogen gas mixture, reaction products are converted to UO.sub.2 powders. The reaction may generally be represented as follows:
UF.sub.6+2H.sub.2O (e.g., an aqueous solution of UF.sub.6).fwdarw.UO.sub.2F.sub.2+4HF, (at about 120 F. (about 48.9 C.))
UO.sub.2F.sub.2+2NH.sub.4OH.fwdarw.UO.sub.2(NH.sub.4).sub.2+2HF (at about 70 F. (about 21 C.))
UO.sub.2(NH.sub.4).sub.2+H.sub.2+2H.sub.2O (e.g., UO.sub.2(NH.sub.4).sub.2 and steam in a hydrogen atmosphere).fwdarw.UO.sub.2+2NH.sub.4OH (at about 1100 F. (about 593.3 C.))

(12) An integrated dry route (IDR) process changes UF.sub.6 into a ceramic grade uranium dioxide (UO.sub.2) powder, typically in a single stage, by mixing steam and hydrogen in a kiln, such as, for example, a rotary kiln, to produce UO.sub.2 and HF gas. In an exemplary process, uranium hexafluoride gas is blown into a kiln, or calciner, and mixed with steam and excess hydrogen at 1100 F. (about 593.3 C.) at atmospheric pressure. The reaction may be represented generally as follows:
UF.sub.6+H.sub.2+H.sub.2O.fwdarw.UO.sub.2+6HF.
Excess hydrogen remaining after the reaction is burned off and HF gas is captured as an HF solution.

(13) The uranium dioxide produced in any of these or other reactions is in a powder form. The UO.sub.2 powder may be combined in a calciner, or rotary kiln, with solid carbon in a hydrogen atmosphere to create a reducing atmosphere. The carbon may be from any suitable carbon source, such as, for example, graphite, carbon black, or other suitable sources of carbon. The uranium dioxide and carbon react to form uranium carbide and either carbon monoxide or carbon dioxide, or combinations of carbon monoxide and carbon dioxide. Excess hydrogen and the carbon monoxide and/or carbon dioxide reaction products may be in gaseous form and are flared off or removed by other suitable means. The uranium carbide reaction product is a solid.

(14) An advantage of uranium carbide is that uranium is highly covalent, with an effective valence of close to zero. Conversion of uranium carbide, for example, to U.sub.3Si.sub.2, involves replacing carbon with silicon. Silicon can be introduced in several ways, such as by reacting uranium carbide powder in a calciner with, for example, an excess of silane gas (SiH.sub.4) in the presence of excess hydrogen gas (H.sub.2). The powder and gases would be rotated in the calciner at a temperature between about 500 to 800 K (about 227 C. to 527 C.), and preferably between 500 and 700 K (about 227 C. and 427 C.) at atmospheric pressure to yield U.sub.3Si.sub.2 and methane gas, which may be represented as
3UC+2SiH.sub.4+2H.sub.2.fwdarw.U.sub.3Si.sub.2+3CH.sub.4.
The excess silane and hydrogen drive the reaction to U.sub.3Si.sub.2. The methane reaction product can be off-gassed, burned off, or removed by any suitable means.

(15) In various aspects, uranium silicide compounds other than U.sub.3Si.sub.2 may be formed by changing the rate of addition of SiH.sub.4 and H.sub.2 gases to change the ratio of reactants. Examples of other uranium silicides include USi.sub.1.78, U.sub.3Si, USi, and U.sub.3Si.sub.5. In practice, a combination of the uranium silicides would be produced. Those skilled in the art will appreciate that reactant ratio manipulation can drive the reaction to produce more of a desired product.

(16) Several reaction schemes were studied thermodynamically using silane and several silicon halides. The silane reaction, 3UC+2SiH.sub.4+2H.sub.2, has a negative Gibbs free energy, as shown by the diamond in the graph of the attached FIGURE. The silicon halide reactions, represented generally by 3UC+2SiX.sub.4+2X.sub.2.fwdarw.U.sub.3Si.sub.2+3CX.sub.4, where X is selected from the group consisting of Br, Cl, F, and I, shown in the graph of the FIGURE by an X (Br), square (CO, and a triangle (F), have positive Gibbs free energies, so are less desirable reaction schemes than the negative free energy for silane. Iodine is not shown, but would be expected to also have a positive free energy, falling above bromine on the graph.

(17) Although the silane reaction, wherein X in the general formula Si.sub.nX.sub.2n+2 is H, is preferred, the silicon halide reactions, wherein X may be a halide or both H and a halide, may be useful in removing traces of residual carbon from the U.sub.3Si.sub.2, and other uranium silicide reaction products. Reactions using silicon halides would also be carried out in a rotary kiln within the same temperature range and at the same pressure as the reaction using silane. A homogenization step using silicon halides may be carried out after the uranium silicide is formed to remove traces of residual carbon. This can be carried out at temperatures up to the target uranium silicide material's melting point.

(18) The method described herein is much more cost effective than the conventional method that uses silicon metal to produce U.sub.3Si.sub.2 and can be carried out in equipment that can operate at temperatures greater than 500 C., but lower than the melting point of the targeted stoichiometry of the target uranium silicide, for example, U.sub.3Si.sub.2, USi.sub.1.78, U.sub.3Si, USi, U.sub.3Si.sub.5, or combinations thereof, thus significantly improving safety by eliminating the need to handle corrosive molten materials.

(19) All patents, patent applications, publications, or other disclosure material mentioned herein, are hereby incorporated by reference in their entirety as if each individual reference was expressly incorporated by reference respectively. All references, and any material, or portion thereof, that are said to be incorporated by reference herein are incorporated herein only to the extent that the incorporated material does not conflict with existing definitions, statements, or other disclosure material set forth in this disclosure. As such, and to the extent necessary, the disclosure as set forth herein supersedes any conflicting material incorporated herein by reference and the disclosure expressly set forth in the present application controls.

(20) The present invention has been described with reference to various exemplary and illustrative embodiments. The embodiments described herein are understood as providing illustrative features of varying detail of various embodiments of the disclosed invention; and therefore, unless otherwise specified, it is to be understood that, to the extent possible, one or more features, elements, components, constituents, ingredients, structures, modules, and/or aspects of the disclosed embodiments may be combined, separated, interchanged, and/or rearranged with or relative to one or more other features, elements, components, constituents, ingredients, structures, modules, and/or aspects of the disclosed embodiments without departing from the scope of the disclosed invention. Accordingly, it will be recognized by persons having ordinary skill in the art that various substitutions, modifications or combinations of any of the exemplary embodiments may be made without departing from the scope of the invention. In addition, persons skilled in the art will recognize, or be able to ascertain using no more than routine experimentation, many equivalents to the various embodiments of the invention described herein upon review of this specification. Thus, the invention is not limited by the description of the various embodiments, but rather by the claims.