Bonded body and elastic wave element

Abstract

A bonded body includes a supporting body composed of a ceramic, a bonding layer provided over a surface of the supporting body and composed of one or more material selected from the group consisting of mullite, alumina, tantalum pentoxide, titanium oxide and niobium pentoxide, and a piezoelectric single crystal substrate bonded with the bonding layer. The surface of the supporting body has an arithmetic average roughness Ra of 0.5 nm or larger and 5.0 nm or smaller.

Claims

1. A bonded body comprising: a supporting body comprising a ceramic; a bonding layer provided over a surface of said supporting body and comprising one or more materials selected from the group consisting of mullite, alumina, tantalum pentoxide, titanium oxide and niobium pentoxide; a piezoelectric single crystal substrate bonded with said bonding layer; and an intermediate layer between said piezoelectric single crystal substrate and said bonding layer, said intermediate layer comprising one or more materials selected from the group consisting of mullite, alumina, tantalum pent oxide, titanium oxide and niobium pentoxide, wherein said surface of said supporting body has an arithmetic average roughness Ra of 0.5 nm or larger and 5.0 nm or smaller, and wherein a surface of said bonding layer and a surface of said intermediate layer are bonded.

2. The bonded body of claim 1, wherein said supporting body comprises a material selected from the group consisting of mullite, cordierite and sialon.

3. The bonded body of claim 1, wherein said intermediate layer is provided on a surface of said piezoelectric single crystal substrate, and wherein said surface of said piezoelectric single crystal substrate has an arithmetic average roughness Ra of 0.05 m or larger and 0.5 m or smaller.

4. The bonded body of claim 1, wherein said surface of said bonding layer has an arithmetic average roughness Ra of 1 nm or smaller and wherein said surface of said intermediate layer has an arithmetic average roughness Ra of 1 nm or smaller.

5. The bonded body of claim 1, wherein said piezoelectric single crystal substrate comprises lithium niobate, lithium tantalate or lithium niobate-lithium tantalate solid solution.

6. An acoustic wave device comprising: said bonded body of claim 1; and an electrode provided on said piezoelectric single crystal substrate.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

(1) FIG. 1(a) shows the state that a bonding layer 2 is provided on a supporting body 1 made of a ceramic, FIG. 1(b) shows the state that a surface 3a of a bonding layer 3 is subjected to flattening, and FIG. 1(c) shows the state that a flat surface 4 is activated by neutralized beam A.

(2) FIG. 2(a) shows the state that a piezoelectric single crystal substrate 6 and the supporting body 1 are bonded with each other, FIG. 2(b) shows the state that the piezoelectric single crystal substrate 6A is thinned by processing, and FIG. 2(c) shows the state that electrodes 10 are provided on a piezoelectric single crystal substrate 6A.

(3) FIG. 3(a) shows the state that a surface 11a of a piezoelectric single crystal substrate 11 is made a roughened surface, FIG. 3(b) shows the state that an intermediate layer 12 is provided on the roughened surface 11a, FIG. 3(c) shows the state that a surface 13a of an intermediate layer 13 is subjected to flattening process, and FIG. 3(d) shows the state that a flat surface 14 is activated by neutralized beam A.

(4) FIG. 4(a) shows the state that the piezoelectric single crystal substrate 11 and supporting body 1 are bonded with each other, FIG. 4(b) shows the state that a piezoelectric single crystal substrate 11A is thinned by processing, and FIG. 4(c) shows the state that electrodes 10 are provided on a piezoelectric single crystal substrate 11A.

MODES FOR CARRYING OUT THE INVENTION

(5) The present invention will be described in detail below, appropriately referring to the drawings.

(6) FIGS. 1 and 2 relate to an embodiment that a bonding layer is provided on a supporting body and then bonded to a surface of a piezoelectric single crystal substrate by direct bonding.

(7) As shown in FIG. 1(a), a bonding layer 2 is provided on a surface 1a of a supporting body 1 made of a ceramic. 1b represents a surface on the opposite side. At this time, unevenness may be present on the surface 2a of the bonding layer 2.

(8) Then, according to a preferred embodiment, the surface 2a of the bonding layer 2 is subjected to flattening process to form a flat surface 3a. By this flattening process, a thickness of the bonding layer 2 is usually lowered to a thinner bonding layer 3 (refer to FIG. 1(b)). However, the flattening process is not indispensable.

(9) Then, neutralized beam is irradiated onto the flat surface 3a as an arrow A, as shown in FIG. 1(c), to activate the surface of the bonding layer 3A to obtain an activated surface 4.

(10) On the other hand, as shown in FIG. 2(a), neutralized beam is irradiated onto a surface of a piezoelectric single crystal substrate 6 to activate it to provide an activated surface 6a. Then, the activated surface 6a of the piezoelectric single crystal substrate 6 and the activated surface 4 of the bonding layer 3A are bonded by direct bonding to obtain a bonded body 7.

(11) According to a preferred embodiment, the surface 6b of the piezoelectric single crystal substrate of the bonded body 7 is further subjected to polishing, so that the thickness of a piezoelectric single crystal substrate 6A is made smaller as shown in FIG. 2(b), providing a bonded body 8. A numeral 6c represents a polished surface.

(12) According to FIG. 2(c), predetermined electrodes 10 are formed on a polished surface 6c of the piezoelectric single crystal substrate 6A to produce an acoustic wave device 9.

(13) FIGS. 3 and 4 relate to an embodiment in which a surface of a piezoelectric single crystal substrate is made a roughened surface.

(14) As shown in FIG. 3(a), a surface 11a of a piezoelectric single crystal substrate 11 is processed to forma roughened surface 11a. 11b represents a surface on the opposite side. Then, as shown in FIG. 3(b), an intermediate layer 12 is provided on the roughened surface 11a. At this time, the roughened surface is transcripted onto a surface 12a of the intermediate layer 12 and unevenness is formed.

(15) Then, according to a preferred embodiment, the surface 12a of the intermediate layer 12 is subjected to flattening process to form a flat surface 13a as shown in FIG. 3(c). By this flattening process, a thickness of the bonding layer 12 is usually lowered to a thinner bonding layer 13. Then, neutralized beam is irradiated onto the flat surface 13a as an arrow A, as shown in FIG. 3(d), to activate the surface of the bonding layer 13A to obtain an activated surface 14.

(16) On the other hand, as shown in FIG. 1(c), neutralized beam is irradiated onto a flat surface of a bonding layer 3A on the supporting body 1 to activate it to provide an activated surface 4. Then, the activated surface 4 of the bonding layer 3A and the activated surface 14 of the intermediate layer 13A are bonded by direct bonding to obtain a bonded body 17 (FIG. 4(a)).

(17) According to a preferred embodiment, the surface 11b of the piezoelectric single crystal substrate of the bonded body 17 is further subjected to polishing, so that the thickness of the piezoelectric single crystal substrate 11A is made smaller as shown in FIG. 4(b), providing a bonded body 18. 11c represents a polished surface.

(18) Further, in the case of a surface acoustic wave device 19 of FIG. 4(c), predetermined electrodes 10 are formed on a polished surface 11c of the piezoelectric single crystal substrate 11A.

(19) Respective constituents of the present invention will be described further in detail below.

(20) The supporting body is made of a ceramic material. The ceramic material may preferably be a material selected from the group consisting of mullite, cordierite and sialon.

(21) According to the present invention, the bonding layer is provided on a surface of the supporting body. The bonding layer is made of a material selected from the group consisting of mullite, alumina, tantalum pentoxide, titanium oxide and niobium pentoxide, so that it is possible to improve the bonding strength of the bonding layer and piezoelectric single crystal substrate. Although the film-forming method of the bonding layer is not limited, sputtering, chemical vapor deposition (CVD) and vapor deposition are listed.

(22) Specifically, as the material of the piezoelectric single crystal substrate, single crystals of lithium tantalate (LT), lithium niobate (LN), lithium niobate-lithium tantalate solid solution, quartz and lithium borate may be listed. Among them, LT or LN are more preferred. As LT or LN has a high propagation speed of a surface acoustic wave and large electro-mechanical coupling factor, it is preferred for use in a piezoelectric surface wave device for high frequency and wide-band frequency applications. Further, the normal direction of the main surface of the piezoelectric single crystal substrate is not particularly limited. However, in the case that the piezoelectric single crystal substrate is made of LT, for example, it is preferred to use the substrate rotated toward Y-axis or Z-axis by 36 to 47 (for example 42) with respect to X-axis, which is a direction of propagation of a surface acoustic wave, because of a low propagation loss. In the case that the piezoelectric single crystal substrate is made of LN, it is preferred to use the substrate rotated toward Y-axis or Z-axis by 60 to 68 (for example 64) with respect to X-axis, which is a direction of propagation of a surface acoustic wave, because of a lower propagation loss. Further, although the size of the piezoelectric single crystal substrate is not particularly limited, for example, the diameter may be 50 to 150 mm and thickness may be 0.2 to 60 m.

(23) According to the present invention, the arithmetic average roughness Ra of the surface of the supporting body is 0.5 nm or larger and 5.0 nm or smaller. It is thus possible to prevent the separation along the interface of the supporting body and bonding layer considerably. On the viewpoint, the arithmetic average roughness Ra of the surface of the supporting body may preferably be 0.8 nm or larger and 3.0 nm or smaller. Further, the arithmetic average roughness Ra is measured by an AFM (atomic force microscope) in a measured range of 10 m10 m.

(24) According to a preferred embodiment, the surface of the supporting body has a PV value of 10 nm or larger and 50 nm or smaller. The adhesive strength at the interface of the supporting body and bonding layer can be further improved. On the viewpoint, the PV value of the surface of the supporting body may more preferably be 20 nm or larger and more preferably be 30 nm or smaller. Further, PV values is defined as a value measured by an AFM (atomic force microscope) in a measured range of 10 m10 m.

(25) According to a preferred embodiment, the surface of the bonding layer and surface of the piezoelectric single crystal substrate are bonded by direct bonding. In this case, the arithmetic average roughness Ra of the surface of the bonding layer may preferably be 1 nm or smaller and more preferably be 0.3 nm or smaller. Further, the arithmetic average roughness Ra of the surface of the piezoelectric single crystal substrate may preferably be 1 nm or smaller and more preferably be 0.3 nm or smaller. The bonding strength of the piezoelectric single crystal substrate and bonding layer is thereby further improved.

(26) The method of flattening the surfaces of the bonding layer and piezoelectric single crystal substrate include lapping, chemical mechanical polishing (CMP) and the like.

(27) According to a preferred embodiment, an intermediate layer is provided between the piezoelectric single crystal substrate and bonding layer, the intermediate layer is made of a material selected from the group consisting of mullite, alumina, tantalum pentoxide, titanium oxide and niobium pentoxide, and the surface of the bonding layer and the surface of the intermediate layer are directly bonded. In this case, it is preferred to directly bond the surface of the piezoelectric single crystal substrate and intermediate layer.

(28) According to this preferred embodiment, the surface of the piezoelectric single crystal substrate is a surface, in which unevenness is formed periodically and uniformly in a plane, having an arithmetic average roughness Ra of 0.05 m or larger and 0.5 m or smaller. It is thus possible to prevent spurious accompanied with the reflection at the interface of a bulk wave. According to a preferred embodiment, a height Ry from the lowest bottom of a valley to the highest peak of mountain of the surface of the piezoelectric single crystal substrate is 0.5 m or larger and 5.0 m or smaller. Specific roughness depends on a wavelength of an acoustic wave and appropriately selected so that the reflection of the bulk wave can be prevented.

(29) Further, the method of roughening includes grinding, polishing, etching, sand blasting or the like.

(30) Further, the material of the intermediate layer is selected from the group consisting of mullite, alumina, tantalum pentoxide, titanium oxide and niobium pentoxide. Although the film-forming method of the intermediate layer is not limited, sputtering, chemical vapor deposition (CVD) and vapor deposition are listed.

(31) According to a preferred embodiment, the arithmetic average roughness Ra of the surface of the intermediate layer may preferably be 1 nm or smaller and more preferably be 0.3 nm or smaller. The bonding strength of the bonding layer and intermediate layer is thereby further improved. The method of flattening the surface of the intermediate layer includes lapping, chemical mechanical polishing (CMP) and the like.

(32) According to a preferred embodiment, neutralized beam may be used to activate the surface of the piezoelectric single crystal substrate. Particularly, in the case that the surface of the piezoelectric single crystal substrate is a flat surface, the surface may be directly bonded to the bonding layer. However, in the case that the surface of the piezoelectric single crystal substrate is roughened, it is preferred to provide the intermediate layer, to flatten the surface of it and to activate it by neutralized beam. The activated flat surface of the intermediate layer on the piezoelectric single crystal substrate may be directly bonded to the bonding layer on the supporting body.

(33) Further, according to a preferred embodiment, neutralized beam is irradiated onto the flat surface of the bonding layer to activate the flat surface of the bonding layer.

(34) When the activation of the surfaces is performed using the neutralized beam, it is preferred to use a system described in patent document 4 to generate the neutralized beam, which is irradiated. That is, it is used a high speed atomic beam source of saddle field type as the beam source. Then, an inert gas is introduced into the chamber and a high voltage is applied onto electrodes from a direct current electric source. By this, electric field of saddle field type generated between the electrode (positive electrode) and a housing (negative electrode) causes motion of electrons, e, so that atomic and ion beams derived from the inert gas are generated. Among the beams reached at a grid, the ion beam is neutralized at the grid, and the beam of neutral atoms is emitted from the high speed atomic beam source. Atomic species forming the beam may preferably be an inert gas (argon, nitrogen or the like).

(35) A voltage during the activation by the irradiation of the beam may preferably be 0.5 to 2.0 kV and current is preferably 50 to 200 mA.

(36) Then, the activated surfaces are contacted and bonded with each other under vacuum atmosphere. The temperature at this time may be ambient temperature, specifically 40 C. or lower and more preferably 30 C. or lower. Further, the temperature during the bonding may more preferably be 20 C. or higher and 25 C. or lower. The pressure at the bonding is preferably 100 to 20000N.

(37) Applications of the bonded bodies of the present invention are not particularly limited, and they can be appropriately applied to an acoustic wave device and optical device, for example.

(38) As an acoustic wave device, a surface acoustic wave device, Lamb wave-type device, thin film resonator (FBAR) or the like is known. For example, the surface acoustic wave device is produced by providing an input side IDT (Interdigital transducer) electrodes (also referred to as comb electrodes or interdigitated electrodes) for oscillating surface acoustic wave and IDT electrode on the output side for receiving the surface acoustic wave, on the surface of the piezoelectric single crystal substrate. By applying high frequency signal on the IDT electrode on the input side, electric field is generated between the electrodes, so that the surface acoustic wave is oscillated and propagated on the piezoelectric substrate. Then, the propagated surface acoustic wave is drawn as an electrical signal from the IDT electrodes on the output side provided in the direction of the propagation.

(39) A metal film may be provided on a bottom surface of the piezoelectric single crystal substrate. After the Lamb type device is produced as the acoustic wave device, the metal film plays a role of improving the electro-mechanical coupling factor near the bottom surface of the piezoelectric substrate. In this case, the Lamb type device has the structure that interdigitated electrodes are formed on the surfaces of the piezoelectric single crystal surface and the metal film on the piezoelectric substrate is exposed through a cavity provided in the supporting body. Materials of such metal films include aluminum, an aluminum alloy, copper, gold or the like, for example. Further, in the case that the Lamb type wave device is produced, it may be used a composite substrate having the piezoelectric single crystal substrate without the metal film on the bottom surface.

(40) Further, a metal film and an insulating film may be provided on the bottom surface of the piezoelectric single crystal substrate. The metal film plays a role of electrodes in the case that the thin film resonator is produced as the acoustic wave device. In this case, the thin film resonator has the structure that electrodes are formed on the upper and bottom surfaces of the piezoelectric substrate and the insulating film is made a cavity to expose the metal film on the piezoelectric substrate. Materials of such metal films include molybdenum, ruthenium, tungsten, chromium, aluminum or the like, for example. Further, materials of the insulating films include silicon dioxide, phosphorus silicate glass, boron phosphorus silicate glass or the like.

(41) Further, as the optical device, it may be listed an optical switching device, wavelength conversion device and optical modulating device. Further, a periodic domain inversion structure may be formed in the piezoelectric single crystal substrate.

(42) In the case that the present invention is applied to the optical device, the size of the optical device can be reduced. Further, particularly in the case that the periodic domain inversion structure is formed, it is possible to prevent the deterioration of the periodic domain inversion structure by heat treatment. Further, the materials of the bonding layers of the present invention are of high insulation, the generation of domain inversion is prevented during the processing by the neutralized beam before the bonding, and the shape of the domain inversion structure formed in the piezoelectric single crystal substrate is hardly disordered.

EXAMPLES

Example A1

(43) A bonded body was produced, according to the method described referring to FIGS. 1 and 2.

(44) Specifically, a substrate (LT substrate) of lithium tantalate having an orientation flat (OF) part, a diameter of 4 inches and thickness of 250 m was used as the piezoelectric single crystal substrate 6. As the LT substrate, it was used LT substrate of 46 Y-cut X-propagation LT substrate, in which the direction of propagation of the surface acoustic wave (SAW) is X and the Y-cut plate is rotated in a cutting angle. The surface 6a of the piezoelectric single crystal substrate 6 was mirror-polished to an arithmetic average roughness Ra of 0.3 nm.

(45) Further, as the supporting body 1, it was prepared a body 1 having an OF part, a diameter of 4 inches, a thickness of 230 m and made of mullite. The arithmetic average roughness Ra and PV value of the surface 1a of the supporting body 1 of mullite were 0.5 nm and 10 nm, respectively. The arithmetic average roughness was measured by an atomic force microscope (AFM) in a visual field of a square of length of 10 m and a width of 10 m.

(46) Then, the bonding layer 2 made of mullite was formed in 1.0 m by CVD method on the surface 1a of the supporting body 1. Ra after the film-formation was 2.0 nm. Then, the bonding layer 2 was subjected to chemical mechanical polishing (CMP) to a thickness of 0.1 m and Ra of 0.3 nm.

(47) Then, the flat surface 3a of the bonding layer 3 and the surface 6a of the piezoelectric single crystal substrate 6 were cleaned to remove contamination, followed by introduction into a vacuum chamber. The chamber was evacuated to an order of 10.sup.6 Pa and high speed atomic beam (acceleration voltage of 1 kV and Ar flow rate of 27 sccm) was irradiated onto the bonding surfaces of the respective substrates for 120 sec. Then, the beam-irradiated surface (activated surface) 4 of the bonding layer 3A and activated surface 6a of the piezoelectric single crystal substrate 6 were contacted with each other, followed by pressurizing at 10000N for 2 minutes to bond the respective substrates.

(48) Then, the surface 6b of the piezoelectric single crystal substrate 6 was ground and polished until the thickness was changed from the initial thickness of 250 m to 20 m (refer to FIG. 2(b)). The separation of the bonded parts was not observed during the grinding and polishing steps. Further, the bonding strength was evaluated by crack opening method and proved to be 1.4 J/m.sup.2.

(49) Further, as tape peeling test was performed, separation was not observed along the interface between the piezoelectric single crystal substrate and bonding layer and along the interface between the bonding layer and the supporting body. However, the tape peeling test was performed as follows.

(50) A square slit of 22 mm is formed in a wafer. The depth of the slit was adjusted so as to penetrate the piezoelectric single crystal and to reach the inside of the supporting body. A testing tape is adhered onto the piezoelectric single crystal substrate. As the testing tape, it was used a viscous tape defined in JIS Z 1522. It was then pressed by fingers for 5 seconds, and the tape was strongly pulled so that the tape was made perpendicular to the substrate until the tape was peeled off.

Example A2 to A4 and Comparative Examples A1 to A4

(51) In the Example A1, abrasives used for processing the surface of the supporting body was changed, so that Ra and PV value of the surface of the supporting body was changed as shown in table 1. The bonded bodies of the Examples A2 to A4 and Comparative Examples A1 to A4 were thus obtained. However, in the Comparative Example A4, the thickness of the bonding layer was changed to 300 m.

(52) The measurement of the bonding strength and tape peeling test were performed for the thus obtained bonded bodies. The results were shown in Table 1.

(53) TABLE-US-00001 TABLE 1 Ra of PV value of Thick- surface of surface of ness of supporting supporting bonding Bonding body body layer Strength Tape (nm) (nm) (nm) (J/m.sup.2) test Example A1 0.5 10 100 1.4 No separation Example A2 0.8 20 100 1.8 No separation Example A3 3.0 30 100 2.0 No separation Example A4 5.0 50 100 1.4 No separation Com. Ex. A1 0.35 5 100 1.4 Separated Com. Ex. A2 7.0 70 100 0.7 Separated Com. Ex. A3 12.0 140 100 0.2 Separated Com. Ex. A4 12.0 140 300 1.4 Separated

Example B

(54) In the Examples A1 to A4 and Comparative Examples A1 to A3, the material of the bonding layer 2 was made alumina, and the film-formation of the bonding layer 2 was performed by sputtering method. The other procedures were same as those in the Example A1 to produce the respective bonded bodies.

(55) As a result, the separation of the bonded parts was not observed during the grinding and polishing steps of the piezoelectric single crystal substrate. Further, the results of the bonding strength by crack opening method and tape peeling test were comparable with those of the Examples A1 to A4 and Comparative Examples A1 to A3.

Example C

(56) In the Examples A1 to A4 and Comparative Examples A1 to A3, the material of the bonding layer 2 was made tantalum pentoxide, and the film-formation of the bonding layer 2 was performed by sputtering method. The other procedures were same as those in the Example A1 to produce the respective bonded bodies.

(57) As a result, the separation of the bonded parts was not observed during the grinding and polishing steps of the piezoelectric single crystal substrate. Further, the results of the bonding strength by crack opening method and tape peeling test were comparable with those of the Examples A1 to A4 and Comparative Examples A1 to A3.

Example D

(58) In the Examples A1 to A4 and Comparative Examples A1 to A3, the material of the bonding layer 2 was made titanium oxide, and the film-formation of the bonding layer 2 was performed by sputtering method. The other procedures were same as those in the Example A1 to produce the respective bonded bodies.

(59) As a result, the separation of the bonded parts was not observed during the grinding and polishing steps of the piezoelectric single crystal substrate. Further, the results of the bonding strength by crack opening method and tape peeling test were comparable with those of the Examples A1 to A4 and Comparative Examples A1 to A3.

Example E

(60) In the Examples A1 to A4 and Comparative Examples A1 to A3, the material of the bonding layer 2 was made niobium pentoxide, and the film-formation of the bonding layer 2 was performed by sputtering method. The other procedures were same as those in the Example Alto produce the respective bonded bodies.

(61) As a result, the separation of the bonded parts was not observed during the grinding and polishing steps of the piezoelectric single crystal substrate. Further, the results of the bonding strength by crack opening method and tape peeling test were comparable with those of the Examples A1 to A4 and Comparative Examples A1 to A3.

Comparative Example F1

(62) In the Example A1, the material of the bonding layer 2 was made silicon nitride, and the film-formation of the bonding layer 2 was performed by sputtering method. The other procedures were same as those in the Example A1 to produce the bonded body.

(63) As a result, the separation of the bonded parts occurred during the grinding and polishing steps of the piezoelectric single crystal substrate. Further, the bonding strength was evaluated by crack opening method and proved to be 0.6 J/m.sup.2.

Comparative Example F2

(64) In the Example A1, the material of the bonding layer 2 was made aluminum nitride, and the film-formation of the bonding layer 2 was performed by sputtering method. The other procedures were same as those in the Example A1 to produce the bonded body.

(65) As a result, the separation of the bonded parts occurred during the grinding and polishing steps of the piezoelectric single crystal substrate. Further, the bonding strength was evaluated by crack opening method and proved to be 0.5 J/m.sup.2.

Comparative Example F3

(66) In the Example A1, the material of the bonding layer 2 was made silicon oxide, and the film-formation of the bonding layer was performed by sputtering method. The other procedures were same as those in the Example A1 to produce the bonded body.

(67) As a result, the separation of the bonded parts occurred during the grinding and polishing steps of the piezoelectric single crystal substrate. Further, the bonding strength was evaluated by crack opening method and proved to be 0.1 J/m.sup.2.