METHOD FOR REGULATING THERMAL BOUNDARY CONDUCTANCE BETWEEN METAL AND INSULATOR

Abstract

Provided is a method for regulating a thermal boundary conductance between a metal and an insulator, including: arranging a metal on a surface of an insulator, a contact surface between the metal and the insulator being a boundary between the metal and the insulator; and the insulator including a ferroelectric, a piezoelectric, or a pyroelectric; applying an external electric field or stress to the ferroelectric, and adjusting a magnitude of the external electric field or stress, or an included angle between a direction of the external electric field or stress with the boundary to regulate the thermal boundary conductance; or applying a stress to the piezoelectric, and adjusting a magnitude of the stress, or an included angle between a direction of the stress with the boundary to regulate the thermal boundary conductancer; or adjusting a temperature of the pyroelectric to regulate the thermal boundary conductance.

Claims

1. A method for regulating a thermal boundary conductance between a metal and an insulator, comprising: arranging the metal on a surface of the insulator, a contact surface between the metal and the insulator being a boundary between the metal and the insulator, and the insulator comprising one member selected from the group consisting of a ferroelectric, a piezoelectric, and a pyroelectric; under the condition that the insulator is the ferroelectric, applying an external electric field or a stress to the ferroelectric, and adjusting a magnitude of the external electric field or the stress, or an included angle between a direction of the external electric field or the stress with the boundary between the metal and the insulator to regulate the thermal boundary conductance between the metal and the insulator; under the condition that the insulator is the piezoelectric, applying a stress to the piezoelectric, and adjusting a magnitude of the stress, or an included angle between a direction of the stress with the boundary between the metal and the insulator to regulate the thermal boundary conductance between the metal and the insulator; and under the condition that the insulator is the pyroelectric, adjusting a temperature of the pyroelectric to regulate the thermal boundary conductance between the metal and the insulator.

2. The method of claim 1, wherein the ferroelectric comprises one or a combination of two or more selected from the group consisting of PbTiO.sub.3, BiFeO.sub.3, BaTiO.sub.3, LiNbO.sub.3, PbZr.sub.xTi.sub.1-xO.sub.3, and [(PbMg.sub.0.33Nb.sub.0.67O.sub.3).sub.1-x:(PbTiO.sub.3).sub.x], x satisfying x?(0, 1).

3. The method of claim 1, wherein under the condition that the insulator is the ferroelectric, the direction of the external electric field or the stress is adjusted between a direction parallel to the boundary between the metal and the insulator, and a direction perpendicular to the boundary between the metal and the insulator.

4. The method of claim 1, wherein under the condition that the insulator is the ferroelectric and the thermal boundary conductance between the metal and the insulator is regulated by adjusting the magnitude of the stress, an included angle between a spontaneous polarization direction of the ferroelectric with the boundary between the metal and the insulator is not zero.

5. The method of claim 1, wherein under the condition that the insulator is the ferroelectric, the regulating is conducted by a process comprising the following steps: (1) selecting the ferroelectric as the insulator, and plating a metal layer on a surface of the ferroelectric to form a metal/ferroelectric structure; (2) applying an out-of-plane electric field or an in-plane electric field at a boundary between the metal and the ferroelectric in the metal/ferroelectric structure, such that a polarization direction of the ferroelectric is perpendicular to a direction of the boundary between the metal and the ferroelectric, or parallel to the direction of the boundary between the metal and the ferroelectric; and (3) determining a thermal boundary conductance of the metal/ferroelectric structure by time-domain thermoreflectance (TDTR).

6. The method of claim 1, wherein under the condition that the insulator is the piezoelectric, the regulating is conducted by a process comprising the following steps: preparing a metal/piezoelectric/bonding layer/flexible substrate composite structure, applying a stress to the flexible substrate to drive a deformation of a metal/piezoelectric structure, and adjusting a magnitude of the stress to regulate the thermal boundary conductance between the metal and the insulator.

7. The method of claim 6, wherein the metal/piezoelectric/bonding layer/flexible substrate composite structure is a film structure.

8. The method of claim 7, wherein the metal/piezoelectric/bonding layer/flexible substrate composite structure is prepared by a process comprising the following steps: (1) coating a bonding layer onto a surface of a piezoelectric solid/water-soluble layer/substrate composite film to obtain a bonding layer/piezoelectric/water-soluble layer/substrate composite film, inverting one side of the composite film with the bonding layer on a flexible substrate, and heating and curing to obtain a cured composite film; (2) dissolving and removing the water-soluble layer in the cured composite film, such that the piezoelectric is separated from the substrate to obtain a piezoelectric/bonding layer/flexible substrate composite film; and (3) plating a metal on a surface of the piezoelectric of the piezoelectric/bonding layer/flexible substrate composite film to obtain the metal/piezoelectric/bonding layer/flexible substrate composite structure.

9. The method of claim 8, wherein the bonding layer is made of a material comprising epoxy resin; and the heating and curing is conducted at a temperature of 80? C. to 100? C. for 0.5 h to 1.5 h.

10. The method of claim 8, wherein the water-soluble layer is made of a material comprising Sr.sub.3Al.sub.2O.sub.6; and the dissolving and removing is conducted by immersing the water-soluble layer in deionized water for 48 h to 72 h.

11. The method of claim 5, wherein plating the metal is conducted by vacuum evaporation, magnetron sputtering, or chemical vapor deposition.

12. The method of claim 1, wherein the metal comprises one member selected from the group consisting of Al and Au; and the metal has a thickness of 60 nm to 120 nm.

13. The method of claim 1, further comprising: arranging an ordinary insulator on another side of the insulator opposite to the metal to obtain a three-layer structure of metal/insulator/ordinary insulator; and according to a type of the insulator in an intermediate layer of the three-layer structure, regulating the thermal boundary conductance between the metal and the insulator by a process corresponding to the type of the insulator for the three-layer structure.

14. The method of claim 13, wherein the ordinary insulator comprises SrTiO.sub.3.

15. The method of claim 13, wherein the insulator of the intermediate layer has a thickness of 2 nm to 10 nm.

16. A method of for thermal management of a power electronic device, comprising using the method of claim 1.

17. The method of claim 16, wherein under the condition that the insulator is the ferroelectric, the power electronic device comprises a thermal logic device.

18. The method of claim 17, wherein under the condition that the power electronic device is the thermal logic device, the thermal management is conducted by selectively opening or closing a heat transport channel of a boundary between the metal and the ferroelectric by regulating a polarization direction of the ferroelectric.

19. The method of claim 8, wherein plating the metal is conducted by vacuum evaporation, magnetron sputtering, or chemical vapor deposition.

20. The method of claim 2, wherein the metal comprises one member selected from the group consisting of Al and Au; and the metal has a thickness of 60 nm to 120 nm.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

[0036] FIG. 1 shows a sample structure diagram of the metal/piezoelectric/bonding layer/flexible substrate composite structure according to an embodiment of the present disclosure.

[0037] FIG. 2 shows an object picture of the tensile displacement platform according to an embodiment of the present disclosure.

[0038] FIG. 3 shows a metal/ferroelectric sample according to an embodiment of the present disclosure (where the polarization direction of the ferroelectric on the left side is perpendicular to the upper surface, and the polarization direction of the ferroelectric on the right side is parallel to the upper surface).

[0039] FIG. 4 is a schematic diagram showing the thermal resistance change of the boundary between aluminum and bismuth ferrite (Al/BFO) caused by the polarization reversal of the ferroelectric under the effect of stress regulation in Example 1.

[0040] FIG. 5A to FIG. 5C show X-ray diffraction (XRD) patterns of the BFO film in Example 1 under the uniaxial tensile stress along the direction, wherein FIG. 5A shows the diffraction peak position of a (002) plane change under stress; FIG. 5B shows the diffraction peak position of a (011) plane change under stress; and FIG. 5C shows the diffraction peak position of a (101) plane change under stress.

[0041] FIG. 6 is a schematic diagram showing the thermal conductance changes at the boundary between Al and LiNbO.sub.3 and in the LiNbO.sub.3 crystal under different polarization states in Example 2 (where the direction of arrows represents the polarization direction of LiNbO.sub.3).

[0042] The reference numerals in the FIGs: 1. Metal; 2. Piezoelectric; 3. Bonding layer; 4. Flexible substrate; 5. Tensile displacement platform; 6. Cantilever; 7. Screw; 8. Flexible substrate; 9. Sample to be tested; 10. Metal; 11. Ferroelectric single crystal whose polarization direction is perpendicular to the upper surface; 12. Metal; and 13. Ferroelectric single crystal whose polarization direction is parallel to the upper surface.

DETAILED DESCRIPTION OF THE EMBODIMENTS

[0043] The following detailed description of exemplary examples of the present disclosure refers to drawings. The drawings form a part of the description, in which an exemplary embodiment that the present disclosure can be practiced is shown as an example. Features of the present disclosure are identified by reference numerals. The following more detailed description of the examples of the present disclosure is not intended to limit the claimed scope of the present disclosure, but is merely illustrative and not restrictive of the description of the features and characteristics of the present disclosure. These examples are given to suggest the best mode for carrying out the present disclosure, and are sufficient to enable those skilled in the art to practice the present disclosure. However, it should be understood that various modifications and changes can be made without departing from the scope of the present disclosure as defined in the appended claims. The detailed description and drawings should be considered illustrative only and not restrictive. Any such modifications and variations, if existing, will fall within the scope of the present disclosure as described herein. In addition, the background is intended to illustrate the research and development status and significance of the present technology and is not intended to limit the present disclosure or the application field of the present disclosure.

[0044] Unless otherwise defined, all technical and scientific terms used herein have the same meanings as those generally understood by those skilled in the art of the present disclosure. The terms used in the specification of the present disclosure are only intended to describe the specific examples and are not intended to limit the present disclosure.

[0045] The present disclosure will be further described below with reference to specific examples.

Example 1

[0046] This example provided a method for regulating a thermal boundary conductance between a metal and an insulator, specifically a method for regulating a thermal boundary conductance of a metal aluminum/bismuth ferrite (Al/BFO) sample under a polarization evolution. Since the ferroelectric BFO also had piezoelectricity, it was used as a piezoelectric in this example. A stress was applied to the BFO, and the thermal boundary conductance between the metal and the insulator was regulated by adjusting the magnitude of the stress. The method was performed by the following steps: [0047] (1) Preparation: A BiFeO.sub.3/Sr.sub.3Al.sub.2O.sub.6/SrTiO.sub.3 (BFO/SAO/STO) film spin-coated with an epoxy resin (Epoxy) on its surface was inverted on a flexible substrate (PEN), and heated at 100? C. for 1 h to cure the epoxy resin, obtaining a cured sample. The effect of the epoxy resin was to firmly adhere the ferroelectric film to the flexible substrate, which was convenient to achieve the regulation of a polarization direction of the ferroelectric film by mechanically stretching the flexible substrate. Therefore, the ferroelectric film adhered tightly to the flexible substrate after heating and curing. The cured sample was immersed in clean deionized water for 48 h. After the water-soluble layer SAO was completely dissolved, the ferroelectric film BFO was separated from the substrate STO, obtaining a sample with a BFO/Epoxy/PEN structure. A metal Al layer with a thickness of 80 nm was plated on a surface of the BFO by magnetron sputtering, obtaining an Al/BFO/Epoxy/PEN sample shown in FIG. 1, at this time a sample with a metal/piezoelectric/bonding layer/flexible substrate composite structure was constructed. [0048] (2) Experiment: A stress was applied to the film sample by rotating a screw to expand a distance of a cantilever. A change in a polarization state of the ferroelectric sample was obtained by an X-ray diffraction (XRD) system and a piezoelectric force microscope (PFM) system. A change in the thermal boundary conductance between Al and BFO under different stresses was measured by a TDTR system. The adjustment was performed by the following steps: as shown in FIG. 2, two ends of the sample were firmly adhered to the cantilever of a displacement platform with glue, and an original distance between the cantilevers was L.sub.0. A position of the displacement platform could be adjusted, and the distance between the cantilevers could be expanded through the screw. When an elongation of the distance was ?L, an elongation rate of a cantilever distance was ?L/L.sub.0. The elongation rate of the cantilever was defined as a nominal stress applied on the sample, and an actual stress was obtained by a lattice change determined by an XRD instrument. [0049] (3) Conclusion and analysis: the data measured by XRD and TDTR were analyzed. The XRD data are shown in FIG. 5. As can be seen, the diffraction peak positions of a (002) plane, a (011) plane, and a (101) plane change under stress. The film produces a maximum tensile stress of 3.5%. Finally, it is concluded that the change of stress causes the polarization direction of the ferroelectric film to change from being perpendicular to the boundary between Al and BFO to being parallel to the boundary between Al and BFO. The polarization deflection leads to a decrease in accumulated charges at the boundary, thereby causing a decrease in the thermal boundary conductance. The detection results of this example are shown in FIG. 4. This is because the initially-applied transverse stress parallel to the boundary could make the polarization direction from being parallel to the direction of the boundary to being perpendicular to the direction of the boundary. The ferroelectric polarization could increase the charge accumulated at the boundary under the action of stress, and the electron-phonon coupling on the boundary between the metal and the piezoelectric may be enhanced, thereby increasing the thermal boundary conductance. When the nominal stress continued to increase, the polarization direction is changed from a direction perpendicular to the boundary to a direction parallel to the boundary. The deflection of ferroelectric polarization under the action of stress could reduce the charges accumulated at the boundary, and the electron-phonon coupling on the boundary metal and the piezoelectric is weakened, thereby reducing the thermal boundary conductance.

Example 2

[0050] This example provided a method for regulating a thermal boundary conductance between a metal and an insulator, specifically a method for regulating the thermal conductance of a metal aluminum/lithium niobate (Al/LiNbO.sub.3) sample under different polarization conditions. The method was performed by the following steps: [0051] (1) Preparation: An Al metal layer with a thickness of about 80 nm was vapor plated on a surface of a LiNbO.sub.3 crystal by magnetron sputtering, obtaining a metal/ferroelectric (Al/LiNbO.sub.3) structure. A longitudinal electric field was applied such that a polarization direction of the ferroelectric was perpendicular to a boundary between the metal and the ferroelectric, as shown on the left of FIG. 3. In addition, a transverse electric field parallel to the boundary was applied such that the polarization direction was changed from being perpendicular to the boundary to being parallel to the boundary, as shown on the right of FIG. 3. Therefore, a state was obtained, in which two polarization directions were perpendicular to an upper surface direction and parallel to the upper surface direction, respectively. [0052] (2) Experiment: A change of the heat transportation properties of the Al/LiNbO.sub.3 sample under different polarization directions was determined by a TDTR system. [0053] (3) Conclusion and analysis: The data from TDTR was analyzed. It is concluded that when the polarization direction is perpendicular to the upper surface, the thermal boundary conductance is greater than that when the polarization direction is parallel to the upper surface. The change of the polarization direction leads to the reduction of the accumulated charges at the boundary, thus causing a decrease in the thermal boundary conductance. This is because when the polarization direction of the ferroelectric material is perpendicular to the boundary between the metal and the ferroelectric, the existence of the accumulated charges on the boundary could promote the coupling of metal electrons and insulator phonons, thus causing an increase in the thermal boundary conductance. When the polarization direction of the ferroelectric material is parallel to the boundary, the accumulated charges on the boundary disappear, such that the electron-phonon coupling is weakened, and the thermal boundary conductance between the metal and the insulator decreases.

Example 3

[0054] This example provided a method for regulating a thermal boundary conductance between a metal and an insulator, specifically a method for regulating the heat transportation properties of a metal gold/lithium niobate (Au/LiNbO.sub.3) sample under different polarization conditions. In this example, specific operation steps were basically the same as those in Example 2, except that: the metal Al was replaced with Au.

[0055] The final data from TDTR was analyzed. It is concluded that the measured changing trend of heat transportation is similar to the changing trend of thermal boundary conductance between Al and LiNbO.sub.3 in Example 2. When the polarization direction is perpendicular to the upper surface, the thermal boundary conductance is greater than that when the polarization direction is parallel to the upper surface, and the change of the polarization direction leads to the change of the thermal conductance.

Example 4

[0056] This example provided a method for regulating a thermal boundary conductance between a metal and an insulator, specifically a method for regulating the thermal conductance of a metal aluminum/zinc oxide (ZnO) sample under different polarization conditions. In this example, specific operation steps were basically the same as those in Example 2, except that: [0057] the insulator lithium niobate was replaced with zinc oxide; in addition, the polarization intensity of the zinc oxide was regulated by changing the temperature.

[0058] The final data from TDTR was analyzed. It is concluded that the changing trend of the measured thermal conductance is similar to that of the boundary between Al and LiNbO.sub.3 in Example 2, and the change of the polarization intensity leads to the change of the thermal conductance.

Example 5

[0059] This example provided a method for regulating a thermal boundary conductance between a metal and an insulator, specifically a method for regulating the thermal conductance of a metal aluminum/BFO/STO sample under different polarization conditions. In this example, specific operation steps were basically the same as those in Example 1, except that: an ordinary insulator STO was provided on another side of the BFO opposite to the metal aluminum, where the BFO layer has a thickness of 5 nm.

[0060] The final data from TDTR was analyzed. It is concluded that the changing trend of the measured thermal boundary conductance between Al and BFO is similar to that in Example 1. The change of stress leads to the change of thermal conductance, and on this basis, there is a similar changing trend of thermal conductance between the metal aluminum and the ordinary insulator STO, resulting in effective heat conduction.

Comparative Example 1

[0061] This comparative example provided a method for regulating a thermal boundary conductance between a metal and an insulator, specifically a method for regulating the thermal conductance of a metal aluminum/SrTiO.sub.3 sample under different polarization conditions. In this comparative example, specific operation steps were basically the same as those in Example 2, except that: the insulator lithium niobate was replaced with an ordinary insulator SrTiO.sub.3.

[0062] The final data from TDTR was analyzed. It is concluded that the changing trend of the measured thermal conductivity is similar to that of the LiNbO.sub.3 crystal in Example 2, and the thermal boundary conductance could hardly be regulated even by changing the external electric field.

[0063] The present disclosure has been described in detail above with reference to specific exemplary examples. However, it should be understood that various modifications and changes can be made without departing from the scope of the present disclosure as defined in the appended claims. The detailed description and drawings should be considered illustrative only and not restrictive. Any such modifications and variations, if existing, will fall within the scope of the present disclosure as described herein. In addition, the background is intended to illustrate the research and development status and significance of the present technology and is not intended to limit the present disclosure or the application field of the present disclosure.

[0064] More specifically, although exemplary examples of the present disclosure have been described herein, the present disclosure is not limited to these examples, but includes any and all examples that have been modified and omitted examples that can be recognized by those skilled in the art from the foregoing detailed description, such as combinations, adaptations, and/or replacements among the various examples. The limitations in the claims are to be interpreted broadly according to the language used in the claims and not limited to the examples described in the foregoing detailed description or during the prosecution of this application, and these examples should not be considered exclusive. Any steps recited in any method or process claims may be conducted in any order and are not limited to the order presented in the claims. Accordingly, the scope of the present disclosure should be determined only by the appended claims and their legal equivalents, rather than by the description and examples given above.

[0065] All technical and scientific terms used herein have the same meaning as commonly understood by those ordinary skilled in the art to which the present disclosure belongs unless otherwise defined. In case of conflict, the definitions in the specification shall prevail. When a thickness, temperature, time, or other value or parameter is expressed in a range, a preferred range, or a range defined by a series of upper and lower preferred values, it should be understood that all ranges formed by any pair of an upper limit or preferred value of any range with a lower limit or preferred value of any range are specifically disclosed, regardless of whether the ranges are independently disclosed. For example, the range of 1 to 50 should be understood as including any number, combination of numbers, or sub-range selected from 1, 2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29, 30, 31, 32, 33, 34, 35, 36, 37, 38, 39, 40, 41, 42, 43, 44, 45, 46, 47, 48, 49, and 50, as well as all decimal values between the above integers, for example, 1.1, 1.2, 1.3, 1.4, 1.5, 1.6, 1.7, 1.8, and 1.9. With respect to subranges, nested subranges that extend from any endpoint within the range are specifically considered. For example, nested subranges of the exemplary range 1 to 50 may include 1 to 10, 1 to 20, 1 to 30, and 1 to 40 in one direction, or 50 to 40, 50 to 30, 50 to 20, and 50 to 10.