Adaptive inversion for vertical resistivity logs from multiaxial induction measurements

Abstract

A method for logging a formation or sample includes obtaining a plurality of multiaxial conductivity measurements from the formation or sample. A horizontal resistivity measurement, a dip measurement and a dip azimuth measurement are derived from the plurality of multiaxial conductivity measurements. A sharp vertical resistivity measurement is derived from a subset of the plurality of multiaxial conductivity measurements.

Claims

1. A method for logging a formation or sample comprising: deploying a logging tool into the formation or sample; obtaining a plurality of multiaxial conductivity measurements by the logging tool from the formation or sample; in a processor, deriving, from the plurality of multiaxial conductivity measurements, a horizontal resistivity measurement, a dip measurement, and an azimuth measurement; and in a processor, deriving a sharp vertical resistivity measurement from the derived horizontal resistivity measurement, the dip measurement, the azimuth measurement, and a conductivity tensor value.

2. The method of claim 1, wherein the horizontal resistivity measurement, dip measurement, and azimuth measurement are derived through inversion using a zero-dimensional model performed in a processor.

3. The method of claim 1, wherein the plurality of multiaxial conductivity measurements comprise the conductivity tensor value, wherein the conductivity tensor value is selected based at least in part on having a selected sensitivity to vertical resistivity.

4. The method of claim 1, wherein the multiaxial conductivity measurements are obtained by a triaxial logging tool comprising at least one triaxial transmitter and at least one triaxial receiver, and wherein the conductivity tensor value comprises a conductivity measurement between each coil of the at least one triaxial transmitter and each coil of the at least one triaxial receiver.

5. The method of claim 4, wherein the conductivity tensor comprises measurements .sub.xx, .sub.xy, .sub.xz, .sub.yx, .sub.yy, .sub.yz, .sub.zx, .sub.zy, and .sub.zz, wherein represents an apparent conductivity and each subscript thereof represents a dipole axis of the at least one transmitter and a dipole axis of the at least one receiver, respectively.

6. The method of claim 5, wherein deriving the sharp vertical resistivity measurement comprises: in a processor computing the measurement .sub.zz as a function of a ratio (Rv/Rh) indicative of a relationship between vertical resistivity (Rv) and horizontal resistivity (Rh) over a selected set of points, thereby yielding a .sub.zz function varying based on the vertical resistivity (Rv) and fixed at the horizontal resistivity measurement, the dip measurement, and the azimuth measurement; and in a processor computing the measurement .sub.xx+yy as a function of the ratio (Rv/Rh) over the selected set of points, thereby yielding a .sub.xx+yy function also varying based on the vertical resistivity (Rv) and fixed at the horizontal resistivity measurement, the dip measurement, and the azimuth measurement.

7. The method of claim 6, wherein the measurement .sub.zz and the measurement .sub.xx+yy are computed in a processor using a uniform anisotropic formation model.

8. The method of claim 7, wherein deriving the sharp vertical resistivity measurement further comprises: in a processor, in response to a sensitivity of the measurement .sub.zz being greater than a sensitivity of the measurement .sub.xx+yy, computing the sharp vertical resistivity measurement using the .sub.zz function; and in a processor ,in response to the sensitivity of the measurement .sub.zz being less than or equal to the sensitivity of the measurement .sub.xx+yy, computing the sharp vertical resistivity measurement using the .sub.xx+yy function.

9. The method of claim 8, wherein deriving the sharp vertical resistivity measurement further comprises: in a processor computing a derivative of the measurement .sub.zz with respect to the ratio (Rv/Rh) as a derivative of the measurement .sub.zz with respect to the ratio (Rv/Rh) over the set of points; and in a processor computing a derivative of the measurement .sub.xx+yy with respect to the ratio (Rv/Rh) as a derivative of the measurement .sub.xx+yy with respect to the ratio (Rv/Rh) over the set of points.

10. The method of claim 9, wherein deriving the sharp vertical resistivity measurement further comprises comparing a derivative of the measurement .sub.zz with respect to the ratio (Rv/Rh) with a derivative of the measurement .sub.xx+yy with respect to the ratio (Rv/Rh) in a processor.

11. The method of claim 10, wherein deriving the sharp vertical resistivity measurement further comprises: selecting as the sharp vertical resistivity measurement the z-sharpened vertical resistivity ratio times the horizontal resistivity measurement in response to a determination in the processor that the derivative of the measurement .sub.zz with respect to the ratio (Rv/Rh) exceeds the derivative of the measurement .sub.xx+yy with respect to the ratio (Rv/Rh) [d(.sub.zz)/d(Rv/Rh) exceeds d(.sub.xx+yy)/d(Rv/Rh)]; and selecting as the sharp vertical resistivity measurement the xy-sharpened vertical resistivity ratio times the horizontal resistivity measurement in response to a determination that d(.sub.xx+yy)/d(Rv/Rh) exceeds d(.sub.zz)/d(Rv/Rh).

12. A system for logging a formation or sample comprising: a logging tool for obtaining a plurality of multiaxial conductivity measurements from the formation or sample; and one or more processors for deriving a sharp vertical resistivity measurement based on a horizontal resistivity measurement, a dip measurement, an azimuth measurement, and a conductivity tensor value, derived from the plurality of multiaxial conductivity measurements.

13. The system of claim 12 wherein the plurality of multiaxial conductivity measurements comprise the conductivity tensor value, wherein the conductivity tensor value is selected based at least in part on having a selected sensitivity to vertical resistivity.

14. The system of claim 12, wherein the logging tool comprises a triaxial logging tool comprising at least one triaxial transmitter and at least one triaxial receiver for obtaining the plurality of conductivity measurements, and wherein the plurality of conductivity measurements comprises the conductivity tensor value comprising the measurements .sub.xx, .sub.xy, .sub.xz, .sub.yx, .sub.yy, .sub.yz, .sub.zx, .sub.zy, and .sub.zz wherein represents an apparent conductivity and each subscript thereof represents a dipole axis of the at least one transmitter and a dipole axis of the at least one receiver, respectively.

15. The system of claim 14, wherein deriving the sharp vertical resistivity measurement comprises: computing the measurement .sub.zz as a function of a ratio (Rv/Rh) indicative of a relationship between vertical resistivity (Rv) and horizontal resistivity (Rh) over a set of points, thereby yielding a .sub.zz function varying based on the vertical resistivity (Rv) and fixed at the horizontal resistivity measurement, the dip measurement, and the azimuth measurement; computing the measurement .sub.xx+yy as a function of the ratio (Rv/Rh) over the set of points, thereby yielding a .sub.xx+yy function also varying based on the vertical resistivity (Rv) and fixed at the horizontal resistivity measurement, the dip measurement, and the azimuth measurement; computing a derivative of the measurement .sub.zz with respect to the ratio (Rv/Rh) over the set of points; and computing a derivative of the measurement .sub.xx+yy with respect to the ratio (Rv/Rh) over the set of points.

16. The system of claim 15, wherein the measurement .sub.zz and the measurement .sub.xx+yy are computed using a uniform anisotropic formation model.

17. The system of claim 16, wherein deriving the sharp vertical resistivity measurement further comprises comparing d(.sub.zz)/d(Rv/Rh) with d(.sub.xx+yy)/d(Rv/Rh).

18. The system of claim 17, wherein deriving the sharp vertical resistivity measurement further comprises: computing a z-sharpened vertical resistivity ratio using the .sub.zz function; and selecting as the sharp vertical resistivity measurement the z-sharpened vertical resistivity ratio times the horizontal resistivity measurement in response to a determination that d(.sub.zz)/d(Rv/Rh) exceeds d(.sub.xx+yy)/d(Rv/Rh); computing an xy-sharpened vertical resistivity ratio using the .sub.xx+yy function; and selecting as the sharp vertical resistivity measurement the xy-sharpened vertical resistivity ratio times the horizontal resistivity measurement in response to a determination that d(.sub.xx+yy)/d(Rv/Rh) exceeds d(.sub.zz)/d(Rv/Rh).

Description

BRIEF DESCRIPTION OF THE DRAWINGS

(1) FIG. 1 shows an example wellsite measurement system.

(2) FIGS. 2A and 2B show, respectively, an explanation of a multiaxial resistivity tensor and an example triaxial transmitter and receiver arrangement.

(3) FIGS. 3A and 3B show a well logging instrument eccentered in a wellbore in top view and oblique view, respectively.

(4) FIGS. 4A and 4B show a well logging instrument eccentered in a wellbore in top view and oblique view, respectively to demonstrate results of zero-D modeling.

(5) FIG. 5 shows a graph of sensitivity of the ZZ, and average XX and YY conductivity tensors with respect to apparent dip for various transmitter to receiver distances.

(6) FIG. 6 shows a flow chart of an example process for obtaining higher resolution Rv values.

(7) FIGS. 7 through 15 show various modeled examples of output of a process according to the flow chart in FIG. 6.

(8) FIG. 16 shows an example layered formation model used to test the process shown in FIG. 6.

(9) FIGS. 17 through 20 show results of the process described with reference to FIG. 6 performed on the model of FIG. 6 for various formation dip conditions.

(10) FIG. 21 shows an example computing system in accordance with some embodiments for carrying out example methods in the current disclosure.

DETAILED DESCRIPTION

(11) The present disclosure describes systems and methods for logging a formation by using an adaptive inversion method using a selected subset of conductivity tensor measurements and ZD inversion results for Rh, Rv, dip, and azimuth to derive a shaper (higher resolution) Rv log. The sharper Rv log will generally be closer to true formation Rv for thin beds than the measurements from conventional ZD inversion.

(12) FIG. 1 illustrates a wellsite system in which the present example can be used. The wellsite can be onshore or offshore. In this example system, a borehole 11 is formed in subsurface formations by rotary drilling in a manner that is well known. Other examples can also use directional drilling, as will be described hereinafter.

(13) A drill string 12 is suspended within the borehole 11 and has a bottom hole assembly 100 which includes a drill bit 105 at its lower end. The surface system includes platform and derrick assembly 10 positioned over the borehole 11, the assembly 10 including a rotary table 16, kelly 17, hook 18 and rotary swivel 19. The drill string 12 is rotated by the rotary table 16, energized by means not shown, which engages the kelly 17 at the upper end of the drill string. The drill string 12 is suspended from a hook 18, attached to a traveling block (also not shown), through the kelly 17 and a rotary swivel 19 which permits rotation of the drill string relative to the hook. As is well known, a top drive system could alternatively be used.

(14) In the present example, the surface system further includes drilling fluid or mud 26 stored in a pit 27 formed at the well site. A pump 29 delivers the drilling fluid 26 to the interior of the drill string 12 via a port in the swivel 19, causing the drilling fluid to flow downwardly through the drill string 12 as indicated by the directional arrow 8. The drilling fluid exits the drill string 12 via ports in the drill bit 105, and then circulates upwardly through the annulus region between the outside of the drill string and the wall of the borehole, as indicated by the directional arrows 9. In this well known manner, the drilling fluid lubricates the drill bit 105 and carries formation cuttings up to the surface as it is returned to the pit 27 for recirculation.

(15) The bottom hole assembly 100 of the illustrated embodiment a logging-while-drilling (LWD) module 120, a measuring-while-drilling (MWD) module 130, a rotary-steerable directional drilling system and motor, and drill bit 105.

(16) The LWD module 120 may be housed in a special type of drill collar, as is known in the art, and may contain one or a plurality of known types of logging tools. It will also be understood that more than one LWD and/or MWD module can be employed, e.g. as represented at 120A. (References, throughout, to a module at the position of 120 can alternatively mean a module at the position of 120A as well.) The LWD module includes capabilities for measuring, processing, and storing information, as well as for communicating with the surface equipment. In the present embodiment, the LWD module includes a directional resistivity measuring device.

(17) The MWD module 130 is also housed in a special type of drill collar, as is known in the art, and can contain one or more devices for measuring characteristics of the drill string and drill bit. The MWD tool further includes an apparatus (not shown) for generating electrical power to the downhole system. This may typically include a mud turbine generator powered by the flow of the drilling fluid, it being understood that other power and/or battery systems may be employed. In the present embodiment, the MWD module includes one or more of the following types of measuring devices: a weight-on-bit measuring device, a torque measuring device, a vibration measuring device, a shock measuring device, a stick slip measuring device, a direction measuring device, and an inclination measuring device.

(18) Although FIG. 1 shows example components of a wellsite system that includes a drill string and LWD and MWD modules, the various aspects of the present disclosure can apply equally to various other types of wellsite systems. For example, the disclosure could apply to tools and toolstrings conveyed by wireline, drill pipe, wired drill pipe, and/or coiled tubing drill, or other methods of conveyance known in the art.

(19) As discussed above, measurements made by induction tools are generally input into an inversion process. Various aspects of example methods for inverting and otherwise processing the conductivity-related measurements obtained by induction tools are discussed herein. For example, methods and systems are provided herein for improving the vertical resolution of the Rv log using the existing Rh, dip, and azimuth logs and an adaptive inversion algorithm designed to exploit the Rv-sensitive components of the conductivity tensor.

(20) In example embodiments, the RADAR processing or ZD processing or other higher resolution processing can be performed using data measured from various triaxial spacings. While the present example is directed to triaxial induction well logging tools, wherein the transmitter and receivers consist of mutually orthogonal dipole antennas, with one antenna generally parallel to the instrument's longitudinal axis, it is to be clearly understood that other example processes may be derived for instruments having other than triaxial dipole antennas. It is only necessary to have a sufficient number of such antennas such that the apparent conductivity tensors described with reference to FIGS. 2A and 2B can be derived. It should also be understood that the term dip as used herein may mean relative inclination of formation layers with respect to a plane normal to the longitudinal (Z) axis of the well logging tool. In actual well logging conditions, as explained above, the trajectory of the wellbore may not be vertical, so that dip becomes a relative term. Such relative dip may be resolved into actual formation geodetic dip and azimuth by determining the geodetic orientation of the well logging instrument using directional sensors (therein or in adjacent instruments) and well known survey calculation methods.

(21) In a thick, homogeneous, non-permeable formation, conventional uniform formation models generally fit the data and the resulting computed well logs are generally accurate. Over formations having thin beds, the results generally may not be as accurate due to the mismatch between the model and data. In such case, the Rv parameter, to which the measurements have the least sensitivity, also shows the greatest shoulder bed effects. Extensive modeling studies show that if the model is constrained with the existing Rh, dip, and azimuth logs (from RADAR processing or ZD processing) and adaptively use only a subset of the conductivity tensor as inputs which have the most sensitivity to Rv parameter, a sharper Rv may be obtained than from RADAR processing and ZD processing.

(22) In one example, a sensitivity analysis may be be performed. FIG. 5 shows a plot of the change in ZZ and the average XX and YY [0.5*(XX+YY)] components of the conductivity tensor with respect to dip angle and Rv varies from 1.5 to 2 ohm-m in a uniform anisotropic formation with Rh=1 ohm-m, and a dip azimuth of 45 degrees. There are 5 solid curves each representing a ZZ component, and 5 dashed curves representing corresponding 0.5*(XX+YY) components for different transmitter-to-receiver spacings. The spacings range from 15 in. to 72 in. and are shown in the graph in FIG. 5 as the numerical suffix for each curve label.

(23) FIG. 5 shows that the ZZ component is relatively insensitive to Rv at low dip angle and the sensitivity increases as dip increases. The 0.5*(XX+YY) component exhibits an opposite trend in Rv sensitivity. The 0.5*(XX+YY) component shows maximum sensitivity at zero dip, and sensitivity decreases as dip increases. In some examples, the 0.5*(XX+YY) component can be used because it is less dependent on the azimuth angle than simply using XX or YY component alone. However, in other examples, the XX or YY component, or other combinations of the two, can be used.

(24) In example implementations, there may be four independent parameters, Rh, Rv, dip, and azimuth describing the formation as is the case in RADAR processing and ZD inversion processing. If the higher vertical resolution parameters Rh, dip, and azimuth from RADAR processing or ZD processing are used to constrain the inversion model and adaptively use the higher sensitivity component (ZZ or 0.5*(XX+YY)) to solve for Rv, a more stable and higher resolution Rv is likely to result. Model data explained below illustrate this point.

(25) In some examples, such an adaptive inversion algorithm for a sharper Rv is provided. FIG. 6 shows a flow diagram for an example adaptive inversion algorithm for sharper Rv. Input data may include the measured apparent conductivity tensors for a plurality of spacings, and at 61, RADAR processing or ZD inversion may provide estimates of Rh, dip, and azimuth (Rhi, Dipi and Azi) and the borehole corrected apparent conductivity tensor from the example triaxial induction tool, .sub.aij. Here the subscripts i and j take on x, y, and z values to denote the x, y, and z component, respectively.

(26) Using a uniform anisotropic formation model, at 62, a theoretical zz value as a function of Rv/Rh ratio (Ratio=Rv/Rh) may be computed over a set of grid points covering a selected range of possible Rv/Rh values. In the foregoing computation, model parameters Rh, dip, and azimuth are fixed at Rhi, Dipi, and Azi, respectively. Only the Rv, which is expressed as Rv=Rhi*Ratio, varies over the prescribed Ratio grid points.

(27) Similarly, the .sub.xx+yy which is defined as:
.sub.xx+yy=0.5*(.sub.xx+.sub.yy)
may be calculated, at 63, over the same ratio grids. Again, other combinations are possible for xx and yy. At 64, using the borehole corrected .sub.azz measurement and the theoretical zz versus Ratio data obtained at 62, a sharp Rv/Rh ratio can be determined from a zz component, R_sz, as well as the derivative of zz with respective to the Ratio as a sensitivity indicator. Similarly, at 65, the borehole corrected .sub.a(xx+yy) measurement and the theoretical .sub.xx+yy versus Ratio data obtained from 63 can be used to solve for another sharp Rv/Rh ratio from the xx and yy component, R_sxy. From the foregoing, the derivative of .sub.xx+yy with respective to Ratio can be computed as a sensitivity indicator. In the present example, the .sub.a(xx+yy) measurement is defined as
.sub.a(xx+yy)=0.5*(.sub.axx+.sub.ayy).

(28) The results from 64 and 65 then can, at 66, have the sensitivity from the zz component, d(zz)/d(ratio), compared with the sensitivity from the xx+yy component, d(.sub.xx+yy)/d(ratio). If the sensitivity from the zz component is higher, i.e., if d(zz)/d(ratio)>d(.sub.xx+yy)d/(ratio), the SharpRv will be assigned as SharpRv=Rhi*R_sz; otherwise it will be assigned as SharpRv=Rhi*R_sxy.

(29) In the present example, the process elements at 62 through 66 can be repeated for data at every measured depth frame and the results of SharpRv at each depth frame may be accumulated at 67, wherein a smoothing filter may be applied to smooth out occasional high frequency noise spikes (which are a natural occurrence, such as, e.g., borehole rugosity, and do not represent defects in the measurement)

(30) Model data examples of the foregoing are provided herein. As an initial matter, it is important to point out that the adaptive inversion algorithm presented herein still uses the uniform anisotropic formation model. Therefore with uniform anisotropic formation model data, the resultant Rvsharp will be almost identical to the Rvi obtained from RADAR processing or ZD inversion. Minute differences may be due to numerical truncations encountered during the processing.

(31) With the uniform anisotropic formation model, the present example method cannot produce sharper Rv for any arbitrary 3D formations. However, the present example generally will produce similar or better results than those obtained from RADAR processing or ZD processing. Under conditions of small Rh contrast between beds and/or high dip, the present example method may produce better Rv data than those from RADAR processing or ZD processing. Following are illustrations of the performance of the present example method through a series of modeled formation data.

(32) 1D Chirp beds without Rh contrast and high dip (80 deg.). FIG. 7 shows the results from a 1D model of a chirp bed sequence with bed thickness ranging from 1 ft to 9 ft., with a 1 ft. thickness increment. The background formation properties are Rh=1 ohm-m, Rv=1.2 ohm-m, dip=80 deg., and azimuth=30 degrees. The thin bed formation properties are Rh=1 ohm-m, Rv=15 ohm-m, dip=80 deg., and azimuth=30 degrees. A thin bed of increasing thickness is inserted into the background formation every 5 ft.

(33) On the topmost track in FIG. 7, the ZD inversion processing Rh and Rv (RHZD and RVZD) values are plotted as solid lines 701 and 702, respectively. The model parameter Rh and Rv values are dashed lines 704, 706, respectively. For reference purpose, the 2-ft resolution AIT (ZZ coil array induction tool) curves, AT10 through AT90 are shown as thin dashed lines. The SharpRv log from the adaptive inversion algorithm is plotted as curve 708. On the bottom track, the ZD inverted apparent dip and azimuth (DPAP and DPAA) are lines 712 and 714, respectively. The model parameter of dip and azimuth are in dashed lines 718 and 720, (Note: 718 and 720 are missing on the figure) respectively. Although not specifically identified by reference numerals the following 1D and 3D model examples in FIGS. 8 through 15 have the same curve notation (e.g., with reference to dots, dashes, line thicknesses and any ancillary symbols placed on the curve.

(34) The example (a) in FIG. 7 demonstrated that the SharpRv is much closer to the thin bed Rv value than that obtained from RVZD. The improvement is the most prominent in the 1 ft bed where the RVZD shows little response to the change in Rv while the SharpRv clearly shows a sharp peak with peak value close but not quite reaching the modeled Rv in the 1 ft bed. The difference between SharpRv and RVZD gradually decreases as the thickness of the bed increases. Near each bed boundary, the SharpRv curve clearly demonstrate sharper response than RVZD. As expected, over the thick layer such as 100-110 ft area, the SharpRv and RVZD are the overlaying each other with indistinguishable difference.

(35) The example (b) in FIG. 8 shows the results from a 1D model of a chirp bed sequence without Rh contrast and medium dip. The resistivities of the beds in the sequence are the same as that in example (a) except the dip angle changes from 80 to 60 degrees. This example also shows very significant improvement of SharpRv over the RVZD, particularly over the 1 to 2 ft bed area.

(36) The example (c) in FIG. 9 shows the results from a 1D model of a chirp bed sequence without Rh contrast and low dip. The resistivities of the beds in the sequence are the same as that in example (a) except the dip angle changes from 80 to 10 degrees. This low dip angle example also shows very significant improvement of SharpRv over the RVZD, particularly over the 1 to 2 ft bed area. Examples (a) through (c) in FIGS. 7 through 9 demonstrated that without Rh contrast the SharpRv always has significant improvement over RVZD regardless of dip angle.

(37) The example (d) in FIG. 10 shows the results from a 1D model of a chirp bed sequence with low Rh contrast and high dip. The same thickness chirp beds as example (a) are used in this example but the resistivities of the beds are different. The background formation properties are Rh=1 ohm-m, Rv=2 ohm-m, dip=80 deg., and azimuth=30 degree. The thin bed formation properties are Rh=1.2 ohm-m, Rv=18 ohm-m, dip=80 deg., and azimuth=30 degree.

(38) This low Rh contrast high dip angle example also shows very significant improvement of SharpRv over the RVZD similar to the no Rh contrast case (a).

(39) FIG. 11 shows the results from a 1D model of a chirp bed sequence with low Rh contrast and medium dip. The resistivities of the beds in the sequence are the same as that in example (d) except the dip angle changes from 80 to 60 degrees.

(40) This low Rh contrast medium dip angle example also shows very significant improvement of SharpRv over the RVZD. As the dip angle decreases, the sharpness of the SharpRv curve reduces slightly.

(41) FIG. 12 shows the results from a 1D model of a chirp bed sequence with low Rh contrast and low dip. The resistivities of the beds in the sequence are the same as that in example (d) except the dip angle changes from 80 to 10 degrees.

(42) This low Rh contrast low dip angle example also shows very significant improvement of SharpRv over the RVZD. However at low dip angle, the sharpness of the SharpRv curve reduces further. There is extra wiggle on SharpRv appears near the bed boundaries instead of a smooth transition. Most of the improvement are in the 5 ft background layers where SharpRv are much closer to the true Rv than RVZD.

(43) FIG. 13 shows the results from a 1D model of a chirp bed sequence with high Rh contrast and high dip. The same thickness chirp beds as example (a) are used in this example but the resistivities of the beds are different. The background formation properties are Rh=1 ohm-m, Rv=2 ohm-m, dip=80 deg., and azimuth=30 degree. The thin bed formation properties are Rh=2 ohm-m, Rv=30 ohm-m, dip=80 deg., and azimuth=30 degree.

(44) This high Rh contrast high dip angle example also shows very significant improvement of SharpRv over the RVZD similar to the no Rh contrast case (a). This example together with examples (a) and (d) seem to suggest that in high dip formations, the SharpRv log will have significant improvement over RVZD regardless whether there is the significant Rh contrast or not.

(45) FIG. 14 shows the results from a 1D model of a chirp bed sequence with high Rh contrast and medium dip. The resistivities of the beds in the sequence are the same as that in example (g) except the dip angle changes from 80 to 60 degrees.

(46) This high Rh contrast medium dip angle example also shows that SharpRv performs slightly better than RVZD. The improvements are mostly over the background layers.

(47) FIG. 15 shows the results from a 1D model of a chirp bed sequence with high Rh contrast and low dip. The resistivities of the beds in the sequence are the same as that in example (g) except the dip angle changes from 80 to 10 degrees.

(48) This high Rh contrast low dip angle exampleshows that both SharpRv and RVZD are doing poorly. The extra wiggle on SharpRv appears near the bed boundaries become much more pronounced than case (f) for low Rh contrast and low dip. The only improvement perhaps are in the 5 ft background layers where SharpRv are closer to the true Rv than RVZD.

(49) In summary, the 1D model data cases in FIGS. 7 through 15 map out the area where the SharpRv may has strong improvement over RVZD. Generally, SharpRv provides significant improvement in vertical response over zone where Rh contrast is low or relative dip (DPAP) is high. For conditions other than that, the performance of the SharpRv is about the same as RVZD.

(50) In the next few model data examples, the performance of SharpRv in 3D formations will be examined.

(51) FIG. 16 is a model of a 5 ft bed sequence with increasing dip and azimuth successively. A 3D finite-difference code may be used to generate synthetic data for the bed sequence described in FIG. 16. The background formation of this bed sequence is anisotropic, with R.sub.h=1 ohm-m, R.sub.v=3 ohm-m, and dip=zero. Every other 5 ft, a 5-ft-thick bed of the same R.sub.h and R.sub.v values but with different dip and azimuth is inserted into the background formation. The dip magnitudes of the 18 inserted beds vary from 5 to 90 in steps of 5. The azimuths of the inserted beds vary from 10 to 180 in steps of 10 degrees.

(52) These synthetic data may be processed by ZD inversion and then adaptive inversion for SharpRv. The output logs are shown in FIG. 17. The RHZD reproduces the model parameter well for low dip magnitude, thin beds. Small horns in the upward (higher resistivity) direction start appear at the bed boundaries for beds with dip magnitude higher than 40 (beds deeper than 80 ft). These horns may be caused by the 3D effect, which is not accounted for in the inversion model. The 3D effect on the RVZD log is much more severe compared with the RHZD log. It causes the RVZD log to have downward horns at the bed boundaries. The RVZD log usually has a much longer range bed boundary effect or poorer vertical resolution than the RHZD log. Therefore, the downward horns from the two adjacent bed boundaries are merged together such that the RVZD log for the 5-ft zero-dip background zone appears to be at a lower resistivity value. Consequently, the overall shape of the RVZD log also appears to be out of phase with the RHZD log. The ZD performs beautifully in obtaining very good dip and azimuth log in this 3D formations.

(53) The SharpRv log is very similar to the RVZD log in the lower dip angle formations (TVD<80 ft). In high dip formations (TVD>80 ft), the value of the SharpRv at the center of the bed is actually much closer to the model value than is the RVZD curve. Curve coding for identification will be the same in FIGS. 18-20 as it is in FIG. 17.

(54) FIG. 18 shows the results from a 3D model data simulating a high dip field condition. The SharpRv log in this 3D high dip formation example is closer to the model Rv value than RVZD over several layers, such as 5-17 ft and 22-27 ft zones.

(55) FIG. 19 shows the results from a 3D model data simulating a variable dip field condition. The SharpRv log in this 3D formation example is similar to RVZD over lower dip layers and closer to the model Rv over the high dip layer (39-46 ft zone).

(56) FIG. 20 shows the results from a 3D model data simulating a medium dip field condition where the dip of the formation varies between 40 to 60 degrees. The SharpRv log in this 3D formation example is nearly the same as RVZD.

(57) The characters of the model RHZD, RVZD, AIT and SharpRv logs match very well with those from the field logs. Specifically, the model RVZD is very lazy and reading substantially higher than the SharpRv log over the thin bed area. The SharpRv log delineates the bed boundary well and the center bed reading is much closer to the model parameter than that from RVZD.

(58) FIG. 21 shows an example computing system 101 in accordance with some embodiments for carrying out example methods such as those explained above. The computing system 101 can be an individual computer system 101A or an arrangement of distributed computer systems. The computer system 101A includes one or more analysis modules 102 that are configured to perform various tasks according to some embodiments, such as the tasks depicted in FIG. 6. To perform these various tasks, an analysis module 102 executes independently, or in coordination with, one or more processors 104, which may be connected to one or more storage media 106. The processor(s) 104 may also connected to a network interface 108 to allow the computer system 101A to communicate over a data network 110 with one or more additional computer systems and/or computing systems, such as 101B, 101C, and/or 101D (note that computer systems 101B, 101C and/or 101D may or may not share the same architecture as computer system 101A, and may be located in different physical locations, e.g. computer systems 101A and 101B may be on a ship underway on the ocean, in a well logging unit disposed proximate a wellbore drilling, while in communication with one or more computer systems such as 101C and/or 101D that are located in one or more data centers on shore, other ships, and/or located in varying countries on different continents).

(59) A processor can include a microprocessor, microcontroller, processor module or subsystem, programmable integrated circuit, programmable gate array, or another control or computing device.

(60) The storage media 106 can be implemented as one or more non-transitory computer-readable or machine-readable storage media. Note that while in the example embodiment of FIG. 21 storage media 106 is depicted as within computer system 101A, in some embodiments, storage media 106 may be distributed within and/or across multiple internal and/or external enclosures of computing system 101A and/or additional computing systems. Storage media 106 may include one or more different forms of memory including semiconductor memory devices such as dynamic or static random access memories (DRAMs or SRAMs), erasable and programmable read-only memories (EPROMs), electrically erasable and programmable read-only memories (EEPROMs) and flash memories; magnetic disks such as fixed, floppy and removable disks; other magnetic media including tape; optical media such as compact disks (CDs) or digital video disks (DVDs); or other types of storage devices. Note that the instructions discussed above can be provided on one computer-readable or machine-readable storage medium, or alternatively, can be provided on multiple computer-readable or machine-readable storage media distributed in a large system having possibly plural nodes. Such computer-readable or machine-readable storage medium or media is (are) considered to be part of an article (or article of manufacture). An article or article of manufacture can refer to any manufactured single component or multiple components. The storage medium or media can be located either in the machine running the machine-readable instructions, or located at a remote site from which machine-readable instructions can be downloaded over a network for execution.

(61) It should be appreciated that computing system 101 is only one example of a computing system, and that computing system 100 may have more or fewer components than shown, may combine additional components not depicted in the embodiment of FIG. 21, and/or computing system 101 may have a different configuration or arrangement of the components depicted in FIG. 21. The various components shown in FIG. 21 may be implemented in hardware, software, or a combination of both hardware and software, including one or more signal processing and/or application specific integrated circuits.

(62) Further, the acts in the methods described above may be implemented by running one or more functional modules in information processing apparatus such as general purpose processors or application specific chips, such as ASICs, FPGAs, PLDs, or other appropriate devices. These modules, combinations of these modules, and/or their combination with general hardware are all included within the scope of protection of the invention.

(63) While the invention has been described with respect to a limited number of embodiments, those skilled in the art, having benefit of this disclosure, will appreciate that other embodiments can be devised which do not depart from the scope of the invention as disclosed herein. Accordingly, the scope of the invention should be limited only by the attached claims.