APPARATUS FOR GENERATING, ERASING, AND MOVING SKYRMION
20230006130 · 2023-01-05
Inventors
Cpc classification
H10B61/00
ELECTRICITY
International classification
Abstract
The present disclosure relates to an apparatus for generating, erasing, and moving a skyrmion in a magnetic thin film. The apparatus for generating, erasing, and moving the skyrmion may include: a first electrode to which a first voltage for generating and erasing the skyrmion is applied; a second electrode to which a second voltage for moving the generated skyrmion is applied; a free layer having one end connected to a ground and the other end connected to the second electrode; a pinned layer which is connected to the first electrode; and a barrier layer which is provided between the free layer and the pinned layer and includes a conducting path connecting the free layer and the pinned layer.
Claims
1. An apparatus for generating, erasing, and moving a skyrmion, the apparatus comprising: a first electrode to which a first voltage for generating and erasing the skyrmion is applied; a second electrode to which a second voltage for moving the generated skyrmion is applied; a free layer having one end connected to a ground and the other end connected to the second electrode; a pinned layer which is connected to the first electrode; and a barrier layer which is provided between the free layer and the pinned layer and comprises a conducting path connecting the free layer and the pinned layer.
2. The apparatus of claim 1, wherein the conducting path is formed by applying a voltage capable of destroying insulation to a portion of the barrier layer.
3. The apparatus of claim 1, wherein the free layer is formed by stacking tantalum oxide (TaOx), magnesium oxide (MgO), tantalum (Ta), CoFeB, and tungsten (W).
4. The apparatus of claim 1, further comprising a controller which determines the first voltage applied to the first electrode and the second voltage applied to the second electrode.
5. The apparatus of claim 4, wherein the controller controls the skyrmion to be generated by applying a positive (+) voltage to the first electrode, and controls the skyrmion to be erased by applying a negative (−) voltage to the first electrode.
6. The apparatus of claim 5, wherein the controller determines a magnitude of the positive (+) voltage applied to the first electrode based on the number of skyrmions to be generated, and determines a magnitude of the negative (−) voltage applied to the first electrode based on the number of skyrmions to be erased.
7. The apparatus of claim 5, wherein the controller controls the skyrmion to move to one end of the free layer connected to the ground by applying the positive (+) voltage to the second electrode, and controls the skyrmion to move to the other end of the free layer to which the second electrode is connected, by applying the negative (−) voltage to the second electrode.
8. A skyrmion racetrack memory comprising: a first electrode to which a first voltage for generating and erasing the skyrmion is applied; a second electrode to which a second voltage for moving the generated skyrmion is applied; a free layer having one end connected to a ground and the other end connected to the second electrode; a pinned layer which is connected to the first electrode; and a barrier layer which is provided between the free layer and the pinned layer and comprises a conducting path connecting the free layer and the pinned layer, wherein the free layer is divided into a plurality of areas, and each of the plurality of areas corresponds to one bit, and wherein the area comprising the one end connected to the ground represents the most significant bit, and the area comprising a location where the conducting path is connected represents the least significant bit.
9. The skyrmion racetrack memory of claim 8, wherein the conducting path is formed by applying a voltage capable of destroying insulation to a portion of the barrier layer.
10. The skyrmion racetrack memory of claim 8, wherein the free layer is formed by stacking tantalum oxide (TaOx), magnesium oxide (MgO), tantalum (Ta), CoFeB, and tungsten (W).
11. The skyrmion racetrack memory of claim 8, further comprising a controller which determines the first voltage applied to the first electrode and the second voltage applied to the second electrode.
12. The skyrmion racetrack memory of claim 11, wherein the controller controls the skyrmion to be generated by applying a positive (+) voltage to the first electrode, and controls the skyrmion to be erased by applying a negative (−) voltage to the first electrode.
13. The skyrmion racetrack memory of claim 12, wherein the controller determines a magnitude of the positive (+) voltage applied to the first electrode such that one skyrmion is generated in the area which represents the least significant bit, and determines a magnitude of the negative (−) voltage applied to the first electrode such that only one skyrmion in the area which represents the least significant bit is erased.
14. The skyrmion racetrack memory of claim 12, wherein the controller controls the skyrmion to move to the area which represents a higher-order bit by applying the positive (+) voltage to the second electrode, and controls the skyrmion to move to the area which represents a lower-order bit by applying the negative (−) voltage to the second electrode.
15. The skyrmion racetrack memory of claim 14, wherein the controller determines a magnitude of the positive (+) voltage applied to the second electrode, enough such that the skyrmion is able to move to an area of a one-step higher-order bit.
Description
BRIEF DESCRIPTION OF THE DRAWINGS
[0032]
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[0034]
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[0036]
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[0038]
[0039] With regard to the description of the drawings, the same or similar reference numerals may be used for the same or similar components.
DETAILED DESCRIPTION
[0040] Hereinafter, embodiments of the present disclosure will be described in detail with reference to the accompanying drawings, in which the same or similar components will be given the same reference numerals, and redundant description thereof will be omitted.
[0041] In the following, specific details may be set forth to provide an understanding of the invention. However, it will be apparent to a person skilled in the art that the present invention may be practiced without these details. In addition, those of ordinary skill in the art will recognize that various embodiments of the present invention described below may be implemented in a variety of ways, such as a process, an apparatus, a system, or a method on a computer-readable medium.
[0042] The components shown in the drawings are only illustrating exemplary embodiments of the present invention, and are intended to avoid obscuring the invention. In addition, connections between components in the drawings are not limited to direct connections. Rather, data between these components may be modified, reformatted or otherwise changed by an intermediate component or device. Also, additional or fewer connections can be used. The terms “connected” or “communicatively connected” should be understood to include direct connections, indirect connections through one or more intermediary devices, and wireless connections.
[0043]
[0044] Referring to
[0045] The generated skyrmion may move along with the current flowing through the free layer 12.
[0046]
[0047] Referring to
[0048] The free layer 12 may be a ferromagnetic body formed by stacking tantalum oxide (TaOx), magnesium oxide (MgO), tantalum (Ta), CoFeB, and tungsten (W) on the substrate 13, and may be an area where the skyrmion is generated and moved.
[0049] The pinned layer 10 may be made of platinum (Pt), and the barrier layer 11 may be an insulation layer made of gadolinium oxide (GdOx).
[0050] Although not shown in
[0051] The conducting path 21 may be formed by destroying a portion of the barrier layer 11 through a method of applying a voltage enough to destroy an insulator to the barrier layer 11. However, the method of forming the conducting path 21 is not limited thereto, and the conducting path 21 can be formed by using any method that allows the free layer 12 and the pinned layer 10 to conduct.
[0052]
[0053] Referring to
[0054] The conducting path 21 in
[0055] The images of
[0056] In each of the images, gray areas indicate that a magnetization direction corresponds to a direction coming out of the screen or paper, and black areas indicate that the magnetization direction corresponds to a direction coming into the screen or paper.
[0057] When the voltage Vv is applied through the first electrode 23, it can be seen that black dots are formed and spread out at the location of the conducting path 21 as shown in the image 32. Then, when the voltage Vv is no longer applied through the first electrode 23, the area in which the magnetization direction is not completely changed returns to the original magnetization direction, and only the area in which the magnetization direction is completely changed remains in the form of a dot as shown in the image 36, and as a result, the generation of the skyrmion is completed.
[0058]
[0059] Referring to
[0060] Referring to
[0061]
[0062] Referring to
[0063]
[0064] Referring to
[0065] When a positive (+) voltage is applied to the second electrode 25 in the state where the skyrmion has been generated, a horizontal current flows to the left due to the voltage difference in the free layer 12, and the skyrmion moves to the left by this current (see reference numerals 62, 63, 64, and 65).
[0066] Also, when a negative (−) voltage is applied to the second electrode 25, the horizontal current flows to the right due to the voltage difference in the free layer 12, the skyrmions moves to the right by this current (see reference numerals 66 and 68).
[0067] Also, when a negative (−) voltage is applied to the first electrode 23, the generated skyrmions may be erased (see reference numerals 67 and 69). According to the embodiment, the erasure of the skyrmion may start from the skyrmion closest to the conducting path 21.
[0068] Referring to
[0069]
[0070] Referring to
[0071] The write operation of “10101” to the skyrmion racetrack memory is shown in (a) of
[0072] Referring to (a) of
[0073] Referring to (b) of
[0074] Unlike conventional methods, the apparatus for generating and erasing the skyrmion, proposed in the present disclosure, is not manufactured based on defects. Therefore, the apparatus can freely move the skyrmion, and can easily generate and move the skyrmion because the current density required to move the skyrmion is also much lower than that of the conventional method. Also, the apparatus includes the racetrack memory, thereby being sufficiently used for various purposes.