NON-FLAT FORMED GLASS, METHOD FOR PRODUCING SAME, AND USE THEREOF
20230002270 · 2023-01-05
Assignee
Inventors
- Gerhard Lautenschläger (Jena, DE)
- Andreas Krieg (Jena, DE)
- Andreas Voitsch (Jena, DE)
- Axel Engel (Ingelheim, DE)
- Christian Pitzel (Jena, DE)
- Matthias Schmidt (Jena, DE)
- Thomas Kloss (Jena/Cospeda, DE)
Cpc classification
International classification
Abstract
A formed or non-flat formed glass is provided that exhibits high transmittance to electromagnetic radiation in a range of wavelengths from 200 nm to 1500 nm. The transmittance for the formed or non-flat formed glass having a thickness of 1 mm is 20% or more at a wavelength of 254 nm, 82% or more at a wavelength of 300 nm, 90% or more at a wavelength of 350 nm, 92% or more at a wavelength of 546 nm, 92.5% or more at a wavelength of 1400 nm, 91.5% or more in a wavelength range from 380 nm to 780 nm, and 92.5% or more in a wavelength range from 780 nm to 1500 nm.
Claims
1. A non-flat formed glass comprising a transmittance to electromagnetic radiation for non-flat formed glass having a thickness of 1 mm that is 20% or more at a wavelength of 254 nm, 82 or more at a wavelength of 300 nm, 90% or more at a wavelength of 350 nm, 92% or more at a wavelength of 546 nm, 92.5% or more at a wavelength of 1400 nm, 91.5% or more in a wavelength range from 380 nm to 780 nm, and 92.5% or more in a wavelength range from 780 nm to 1500 nm.
2. The non-flat formed glass of claim 1, wherein the transmittance is 60% or more at the wavelength of 254 nm, 90% or more at the wavelength of 300 nm, 91% or more at the wavelength of 350 nm, 92.5% or more at the wavelength of 546 nm, 93% or more at the wavelength of 1400 nm, 92% or more in the wavelength range from 380 nm to 780 nm, and 93% or more in the wavelength range from 780 nm to 1500 nm.
3. The non-flat formed glass of claim 1, wherein the transmittance is 85% at the wavelength of 254 nm and 91% or more at the wavelength of 300 nm.
4. The non-flat formed glass of claim 1, wherein the transmittance is 88% or more at the wavelength of 254 nm.
5. The non-flat formed glass of claim 1, further comprising a content of oxides of network formers of not more than 98 mol % in total.
6. The non-flat formed glass of claim 5, wherein the oxides of network formers comprise oxides of silicon and/or boron.
7. The non-flat formed glass of claim 1, further comprising a coefficient of linear thermal expansion α between 2.4*10.sup.−6/K and 3.5*10.sup.−6/K.
8. The non-flat formed glass of claim 1, further comprising a content of SiO.sub.2 of at least 68 mol %.
9. The non-flat formed glass of claim 8, wherein the content of SiO.sub.2 is at most 85 mol %.
10. The non-flat formed glass of claim 9, wherein the content of SiO.sub.2 is at least 76 mol %.
11. The non-flat formed glass of claim 1, further comprising a content of B.sub.2O.sub.3 between 10 mol % and 25 mol %.
12. The non-flat formed glass of claim 11, wherein the content of B.sub.2O.sub.3 is at most 22 mol %.
13. The non-flat formed glass of claim 1, further comprising Σ(SiO.sub.2+B.sub.2O.sub.3) of 87 mol % to 98 mol %.
14. The non-flat formed glass of claim 13, wherein the Σ(SiO.sub.2+B.sub.2O.sub.3) is at least 92 mol %.
15. The non-flat formed glass of claim 1, further comprising ΣR.sub.2O that is between 1 mol % and 6 mol %, wherein R.sub.2O is alkali metal oxides.
16. The non-flat formed glass of claim 1, further comprising a ratio of molar amounts of B.sub.2O.sub.3/SiO.sub.2 between 0.12 to 0.35 and/or Σ(Me.sub.xO.sub.y)/(Σ(SiO.sub.2+B.sub.2O.sub.3) is 0.02 to 0.10, wherein Me represents a metal which usually has an oxidation number y in oxides.
17. The non-flat formed glass of claim 1, further comprising a ratio of weight fractions of ions of iron that satisfies: 0.1≤Fe.sup.2+/(Fe.sup.2++Fe.sup.3+)≤0.3.
18. The non-flat formed glass of claim 1, wherein for the weight fractions, in ppm, of Fe, Co, Ni, Cr, Cu, Mn, and V, the following applies: Σ(1*Fe+300*Co+70*Ni+50*Cr+20*Cu+5*Mn+2*V) [ppm by mass] is less than 200 ppm, wherein a total content of considered metals is considered irrespective of an oxidation state thereof.
19. The non-flat formed glass of claim 1, further comprising a property selected from a group consisting of: a transformation temperature between 350° C. and 550° C.; a viscosity η wherein Ig η has a value of 4 at temperatures between 1000° C. and 1320° C.; a refractive index at a light wavelength of 587.6 nm that is less than 1.479; a value of chemical resistance against water according to DIN ISO 719 class HGB 1; a value of chemical resistance against acids according to DIN 12116 class S 1 W; and a value of chemical resistance against alkalis according to DIN ISO 695 class A3 or better.
20. The non-flat formed glass of claim 1, comprising: SiO.sub.2 68 mol % to 85 mol %; B.sub.2O.sub.3 10 mol % to 25 mol %; Al.sub.2O.sub.30.2 mol % to 3.5 mol %; Na.sub.2O 0.5 mol % to 5.0 mol %; K.sub.2O 0 mol % to 1.5 mol %; and Li.sub.2O 0 mol % to 2.5 mol %, wherein the alkali metal oxides Na.sub.2O, K.sub.2O, Li.sub.2O amount to less than 6 mol % in total.
Description
BRIEF DESCRIPTION OF THE DRAWINGS
[0173]
[0174]
[0175]
DETAILED DESCRIPTION
[0176]
[0177] Transmittance curve 1 was obtained for a non-flat formed glass with a composition corresponding to glass 5 from TABLE 1.
[0178] Transmittance curve 2 was obtained for a non-flat formed glass with a composition corresponding to glass 4 from TABLE 1.
[0179] Transmittance curve 3 was obtained for a non-flat formed glass with a composition corresponding to glass 8 from TABLE 1.
[0180] Transmittance curve 4 was obtained for a non-flat formed glass with a composition corresponding to glass 3 from TABLE 1.
[0181] Transmittance curve 5 was obtained for a non-flat formed glass with a composition corresponding to glass 2 from TABLE 1.
[0182]
[0183] Transmittance curve 6 was obtained for a non-flat formed glass with a composition corresponding to glass 8 from TABLE 1.
[0184] Transmittance curve 7 was obtained for a glass of 1 mm thickness with a composition corresponding to glass B from TABLE 2.
[0185] Transmittance curve 8 was obtained for a glass of 1 mm thickness with a composition corresponding to glass F from TABLE 2.
[0186] Transmittance curve 9 was obtained for a glass of 1 mm thickness with a composition corresponding to glass D from TABLE 2.
[0187] Transmittance curve 10 was obtained for a glass of 1 mm thickness with a composition corresponding to glass I from TABLE 2.
[0188] Transmittance curve 11 was obtained for a glass of 1 mm thickness with a composition corresponding to glass E from TABLE 2.
[0189] It can clearly be seen that the non-flat formed glass according to an embodiment of the invention exhibits increased transmittance within the entire illustrated wavelength range, in comparison to the prior art glasses.
[0190]
[0191] The non-flat formed glass 100 exhibits transmittance for electromagnetic radiation, in particular in the wavelength range from 200 nm to 1500 nm, and at a thickness of the non-flat formed glass of 1 mm the non-flat formed glass exhibits a transmittance to electromagnetic radiation which is 20% or more, preferably 60% or more, more preferably 85% or more, and most preferably 88% or more at a wavelength of 254 nm; and/or which preferably is 82% or more, preferably 90% or more, more preferably 91% or more at a wavelength of 300 nm; and/or which preferably is 90% or more, preferably 91% or more at a wavelength of 350 nm; and/or which preferably is 92% or more, preferably 92.5% or more at a wavelength of 546 nm; and/or which preferably is 92.5% or more, preferably 93% or more at a wavelength of 1400 nm; and/or which is 91.5% or more, preferably 92% or more in a wavelength range from 380 nm to 780 nm; and/or which preferably is 92.5% or more, preferably 93% or more in a wavelength range from 780 nm to 1500 nm.
[0192] According to a preferred embodiment, the non-flat formed glass 100 comprises a content of oxides of network formers, in particular of oxides of silicon and/or boron, of not more than 98 mol % in total.
[0193] Preferably, the non-flat formed glass 100 has a coefficient of linear thermal expansion a between 2.4*10.sup.−6/K and 3.5*10.sup.−6/K.
[0194] According to one embodiment, the non-flat formed glass 100 has a content of SiO.sub.2 of at least 68 mol %, preferably between 68 mol % and 85 mol %, more preferably between 72 mol % and 85 mol %, most preferably between 76 mol % and 85 mol %.
[0195] According to a further embodiment, the non-flat formed glass 100 comprises B.sub.2O.sub.3, wherein preferably the content of B.sub.2O.sub.3 in the non-flat formed glass is between 10 mol % and 25 mol %, most preferably between 10 mol % and 22 mol %.
[0196] The non-flat formed glass 100 preferably comprises SiO.sub.2 and B.sub.2O.sub.3, wherein preferably Σ(SiO.sub.2+B.sub.2O.sub.3) is 87 mol % to 98 mol %, preferably 92 mol % to 98 mol %.
[0197] According to another embodiment of the non-flat formed glass 100, R.sub.2O is between 1 mol % and 6 mol %, preferably 1 mol % to 5 mol %, wherein R.sub.2O stands for alkali metal oxides.
[0198] With regard to the ratio of molar amounts of the components of the non-flat formed glass 100, preferably the following applies:
[0199] B.sub.2O.sub.3/SiO.sub.2 0.12 to 0.35; and/or
[0200] Σ(Me.sub.xO.sub.y)/(Σ(SiO.sub.2+B.sub.2O.sub.3) 0.02 to 0.10;
[0201] wherein Me represents a metal which usually has the oxidation number y in oxides, in particular one of an alkali metal and/or alkaline earth metal, and aluminum.
[0202] According to yet another embodiment of the non-flat formed glass 100, the following applies to the ratio of weight fractions of the iron ions contained in the non-flat formed glass:
[0203] 0.1≤Fe.sup.2+/(Fe.sup.2++Fe.sup.3+)≤0.3.
[0204] In accordance with yet another embodiment of the non-flat formed glass 100, the following applies to the metals Fe, Co, Ni, Cr, Cu, Mn, V contained in the non-flat formed glass 100 with regard to the weight fractions thereof, in ppm: Σ(1*Fe+300*Co+70*Ni+50*Cr+20*Cu+5*Mn+2*V) [ppm by mass] is less than 200 ppm, preferably less than 150 ppm, more preferably less than 100 ppm, yet more preferably less than 50 ppm, and most preferably less than 25 ppm; wherein the total content of the considered metals in the non-flat formed glass 100 is considered irrespective of their oxidation state.
[0205] Preferably, the transformation temperature T.sub.g of the non-flat formed glass 100 is between 450° C. and 550° C.
[0206] According to one embodiment of the non-flat formed glass 100, it has a viscosity η and Ig η has a value of 4 at temperatures between 1000° C. and 1320° C.
[0207] According to yet another embodiment of the non-flat formed glass 100, the refractive index n.sub.d of the non-flat formed glass 100 at a light wavelength of 587.6 nm is less than 1.479, preferably less than 1.475.
[0208] The non-flat formed glass 100 is preferably distinguished by values of chemical resistance against water according to DIN ISO 719 class HGB 1; against acids according to DIN 12116 class S 1 W; and against alkalis according to DIN ISO 695 class A3 or better.
[0209] According to another embodiment, the formed glass 100 comprises the following constituents:
[0210] SiO.sub.2 68 mol % to 85 mol %, preferably 72 mol % to 85 mol %, most preferably 76 mol % to 85 mol %,
[0211] B.sub.2O.sub.3 10 mol % to 25 mol %, preferably 10 mol % to 22 mol %,
[0212] Al.sub.2O.sub.30.2 mol % to 3.5 mol %, preferably 0.2 mol % to 2.5 mol %,
[0213] Na.sub.2O 0.5 mol % to 5.0 mol %,
[0214] K.sub.2O 0 mol % to 1.5 mol %, preferably 0 mol % to 1.0 mol %,
[0215] Li.sub.2O 0 mol % to 2.5 mol %, preferably 0 mol % to 1.5 mol %,
[0216] wherein, preferably, the alkali metal oxides Na.sub.2O, K.sub.2O, Li.sub.2O contained in the non-flat formed glass 100, preferably all alkali metal oxides contained in the non-flat formed glass 100, amount to less than 6 mol % and preferably less than 5 mol % in total.
[0217] According to one embodiment, the non-flat formed glass 100 is produced or producible by a melting process with subsequent hot forming, in particular in a drawing process, for example a tube drawing process such as a Danner process or a Vello process.