METHOD FOR MEASURING A SPHERICAL-ASTIGMATIC OPTICAL SURFACE
20190271532 ยท 2019-09-05
Inventors
Cpc classification
G01B9/02039
PHYSICS
International classification
G01M11/00
PHYSICS
Abstract
Method for measuring a spherical-astigmatic optical surface (40), includes: a) generating a spherical-astigmatic wavefront as a test wavefront with a wavefront generating apparatus (10); b) interferometrically measuring wavefront aberrations between the wavefront generating apparatus and the surface which is adjusted to the wavefront generating apparatus such that the test wavefront impinges each point on the surface substantially perpendicularly, plural measurements being taken in which the surface is measured at a number of positions, spherized about the two centers of the radii of the astigmatism and/or rotated by 180 about a surface normal to the surface, such that corresponding interferogram phases are determined; and c) determining the wavefront of the wavefront generation device and a shape of the surface using a mathematical reconstruction method. The spherical-astigmatic surface is then corrected using a suitable processing method, a) to c) being repeated until the wavefront aberrations are smaller than a given value.
Claims
1. A method for measuring a spherical-astigmatic optical surface, comprising: a) generating a spherical-astigmatic wavefront as a test wavefront with a wavefront generation device; b) interferometrically measuring wavefront differences between the wavefront generation device and the spherical-astigmatic surface adapted to the wavefront generation device such that the test wavefront is incident substantially perpendicularly at each point of the spherical-astigmatic surface, wherein said measuring comprises carrying out a plurality of measurements, in which the spherical-astigmatic surface is measured at a number of positions, spherized about two centers of the radii of the astigmatism and/or rotated by 180 about a surface normal of the spherical-astigmatic surface, and determining corresponding interferogram phases; c) determining the wavefront of the wavefront generation device and a surface form of the spherical-astigmatic surface through a mathematical reconstruction method, according to which the surface of the spherical-astigmatic surface is corrected via a given processing method, and d) repeating said generating, said measuring and said determining until the wavefront differences are below a defined threshold.
2. The method as claimed in claim 1, wherein the wavefront of the wavefront generation device is corrected during said determining, and wherein said generating, said measuring and said determining are repeated until the wavefront differences are below the defined threshold.
3. The method as claimed in claim 1, wherein the spherical-astigmatic surface is embodied as a calibration element for the wavefront generation device.
4. A method for measuring a spherical-astigmatic optical free-form surface, comprising: a) generating a spherical-astigmatic wavefront as a test wavefront with a wavefront generation device calibrated according to the measuring method as claimed in claim 1 utilizing a calibration element as the spherical-astigmatic surface; b) interferometrically measuring regions of the spherical-astigmatic surface, embodied as an optical free-form surface, with the test wavefront, wherein the test wavefront is incident substantially perpendicularly on the free-form surface at each of the regions, wherein the regions of the free-form surface and the test wavefront are displaced in relation to one another and/or spherized, and determining corresponding interferogram phases; and c) stitching the free-form surface from the regions, wherein deviations of the test wavefront and the spherical-astigmatic free-from surface differ from respective predetermined values in accordance with a mathematical reconstruction method.
5. The method as claimed in claim 4, wherein the regions are embodied as sub-apertures of the free-form surface, wherein scanning of the sub-apertures is carried out using the spherical astigmatic test wavefront.
6. The method as claimed in claim 5, wherein a relative movement is carried out between the free-form surface and the wavefront generation device in accordance with a predefined trajectory, so as to perform a substantially comprehensive measurement of the free-form surface.
7. The method as claimed in claim 5, wherein partial spherizations are carried out in directions of axes of the astigmatic surface of the sub-apertures, wherein each partial spherization is carried out about a center of a radius valid in the corresponding axis.
8. The method as claimed in claim 5, wherein the interferometric measurements are carried out repeatedly, rotated respectively by 180.
9. The method as claimed in claim 5, wherein the test wavefront is incident on the free-form surface with a maximum deviation less than 10% from normal incidence.
10. The method as claimed in claim 4, wherein the wavefront generation device and the free-form surface are manufactured in an iterative manufacturing process.
11. A test apparatus for testing a surface form of an optical free-form surface, comprising: a wavefront generation device configured to: generate a spherical-astigmatic wavefront, adapted to the optical free-form surface, as a test wavefront, and interferometrically measure a plurality of regions of the optical free-form surface with the test wavefront by projecting the test wavefront substantially perpendicularly on the optical free-form surface at the plurality of regions of the optical free-form surface, wherein the plurality of regions of the optical free-form surface and the test wavefront are displaced in relation to one another and/or spherized; and a processing unit configured to: determine interferogram phases of each of the plurality of regions, and determine a deviation of the optical free-form surface from an intended form based upon the interferogram phases of the plurality of regions using a mathematical reconstruction method.
12. The test apparatus as claimed in claim 11, wherein the wavefront generation device comprises an adaptation element for changing a wavefront into the test wavefront.
13. The test apparatus as claimed in claim 11, configured to generate a computer-generated hologram for each optical free-form surface to be tested, said hologram generating a wavefront which is adapted to a curvature and a mean astigmatism of the free-form surface.
14. The test apparatus as claimed in claim 12, wherein the wavefront generation device comprises a plane or spherical reference surface with an additional optical unit configured to generate an adapted spherical-astigmatic wavefront.
15. A method comprising: forming an optical element with a free-form surface; generating a spherical-astigmatic wavefront as a test wavefront with a wavefront generation device; interferometrically measuring a plurality of regions of the free-form surface with the test wavefront by projecting the test wavefront substantially perpendicularly on the free-form surface at the plurality of regions of the free-form surface, wherein the plurality of regions of the freeform surface and the test wavefront are displaced in relation to one another and/or spherized; determining an interferogram phase for each of the plurality of regions; determining, from the interferogram phases, differences between the free-from surface and an intended form through a mathematical reconstruction method; correcting the free-form surface according to said determining the differences.
16. The method of claim 15, further comprising repeating said generating, said measuring, said determining the interferogram phase, said determining the differences and said correcting until the wavefront differences are below a defined threshold
17. The method of claim 15, wherein said correcting comprises correcting the freeform surface such that an astigmatic component of a deviation of the free-form surface from a best-adapted sphere is at least 80%.
18. The method of claim 17, wherein the deviation of the free-form surface from the best-adapted sphere represents a root-mean-square (rms) value of the deviation.
19. The method of claim 17, wherein the deviation of the free-form surface from the best-adapted sphere represents a peak-to-valley (PV) value of the deviation.
20. The method of claim 19, wherein an astigmatic component of an overall deviation of the free-form surface from the best-adapted sphere is between a PV value of approximately 0.5 mm and approximately 20 mm, wherein a basic radius of the best-adapted sphere is between approximately 300 mm and approximately infinity.
21. The method of claim 15, further comprising arranging the optical element within an extreme ultraviolet lithography projection lens system comprising a plurality of mirrors.
22. The method of claim 15, further comprising calibrating the wavefront generation device using an astigmatic reference surface.
Description
BRIEF DESCRIPTION OF THE DRAWINGS
[0039]
[0040]
[0041]
[0042]
[0043]
[0044]
[0045]
[0046]
[0047]
DETAILED DESCRIPTION
[0048] In principle, the invention represents an extension of the rotary-disk method known for spherical surfaces. A spherical surface is invariant in relation to rotations about the surface normal and an arbitrary spherization about the center of the radius thereof.
[0049] Analogously thereto, a spherical-astigmatic surface is virtually invariant in relation to any combination of spherizations in the direction of the two axes of the astigmatism of the surface, wherein each partial spherization must take place about the center of the radii valid in the corresponding axis.
[0050] The aforementioned conditions of a spherical-astigmatic surface can now be employed to displace or spherize a spherical-astigmatic surface, to be tested by interferometry, macroscopically against an astigmatic reference wavefront in arbitrary directions, as a result of which evaluable interferograms with sufficiently small wavefront gradients may be generated and evaluated mathematically. As a result of the mutually shifted wavefronts, it is possible to separate the error contributions of test object wave and reference wave and therefore obtain an absolute calibration of the whole free-form surface. In this way, it is possible to separate interferometer errors from test object errors, as a result of which it is possible to determine what errors may be assigned to the test object and what error may be assigned to the interferometer. Here, astigmatic deformations down to the millimeter range are conceivable.
[0051] In the case of e.g. a rotationally symmetric asphere, a spherization of a few 10 m generally leads to such large wavefront gradients that the interferogram is no longer evaluable. Here, a so-called damping factor of approximately 1000 emerges in the case of asphericities of up to 1 mm in the case of spherical-astigmatic surfaces. The fundamental principle of the spherizationcapability of astigmatic surfaces against one another is that the shear of astigmatism against itself results in a tilt which may be largely compensated by tilting the elements against one another, as a result of which the aforementioned damping arises.
[0052] The test object wavefront may now be reconstructed by a mathematical separation, carried out via known methods, of the components constant in each interferogram (interferometer error) and the component being displaced with the test object.
[0053] A further increase in the accuracy can be achieved by way of the 180 rotational invariance of astigmatic surfaces. Therefore, the whole displacement procedure may be repeated in a second rotational position of the surfaces, rotated by 180, in order thus to obtain improved averaging or an improved consistency of the measurements.
[0054] Only virtually spherical surfaces can be calibrated in absolute terms in conventional rotary-disk methods. The absolute calibration of rotationally symmetric aspheres only relates to the non-rotationally symmetric component of the surface or of the test optical unit, the rotationally symmetric component being determined by way of a qualification (i.e. a single determination of error contributions of the test optical unit which is not carried out in the test setup (carried out externally)) and not by way of a calibration.
[0055] According to the invention, it is possible to carry out a virtually complete absolute calibration of a whole class of aspherical surfaces, namely of those aspherical surfaces which have a spherical-astigmatic character.
[0056] To this end, there is a need for a spherical-astigmatic wavefront, which is generated e.g. by a CGH in an interferometer or by a spherical-astigmatic reference surface, wherein the latter should be roughly adapted to the free-form surface to be tested (test object). Figure errors of the test object should be so small as a result of the preprocessing process that they are measurable interferometrically against the generated spherical-astigmatic test wavefront.
[0057] A spherical-astigmatic wavefront within the meaning of the invention is a wavefront which is generated by adding the sagittal heights of a spherical wave to those of an astigmatic wave.
[0058] Provision is made of an apparatus for spherizing the test object macroscopically in any direction about its respective (x- and y-) center of the radius, preferably by at least 10%, more preferably by about 50% of the diameter thereof. Furthermore, the test object should be finely adjustable, i.e. in the m range or in the rad range, in all degrees of freedom, in particular in terms of tilt or azimuth.
[0059] The shift-shift calibration described thus can be repeated, as mentioned above, under a 180 rotation of the test object for reference purposes.
[0060] The absolute value of the spherization can be varied, but there should be shearing or shifting by at least approximately 5% of the test object diameter in order to achieve a sufficiently good separation between test object wavefront and reference wavefront.
[0061]
[0062] The scales in the sub-apertures SAp show linearly extending grayscale value gradings, which represent the height profile of a test object. Each sub-aperture SAp has a different local tilt applied thereto. When measuring each individual sub-aperture SAp, it is possible to generate virtually the same astigmatic phase profile by tilting the test object or the interferometer, as indicated in the circle on the right. Since the astigmatism is similar in each sub-aperture SAp, said astigmatism can be kept available in the wavefront generation device. The basic curvature of the surface does not appear in the interferogram because, as depicted in
[0063] Therefore, the test object or the interferometer is post-tilted for the purposes of minimizing the phase gradient in the interferogram of the respective sub-aperture SAp. The deformation component common to all sub-apertures SAp can now be introduced into the test optical unit (compensation unit) as a constant component such that this always equal phase gradient disappears from the interferograms of the individual sub-apertures SAp, as a result of which the measurement dynamics are significantly increased. Naturally, the illustrated six sub-apertures SAp should merely be seen as exemplary, with test objects with up to approximately 1000 sub-apertures being calibrated in practice.
[0064]
[0065] The right-hand illustration of
[0066] In this way, relative measurements may advantageously be carried out and the interferometer wavefront may be separated from the test object wavefront. Ultimately, the interferometer errors therefore remain stationary and the test object errors move along therewith, wherein these errors may thereupon be separated from one another computationally through a mathematical reconstruction method.
[0067]
[0068]
[0069] In the case of an even aberration, such as a fourth order waviness, sixth order waviness, etc., this would not work because said aberration does not co-rotate on account of the invariance thereof in relation to 180 rotations.
[0070]
[0071]
[0072] A plane wave is incident on the adaptation element 20 coming from below, as result of which the adaptation element 20 generates a spherical-astigmatic wavefront. The black curved line indicates a portion of a test object 40 with a sub-aperture SAp.
[0073] The test object 40 is preferably assembled on a holder (not depicted here), on which it may be spherized about the center of the radius thereof in the x- and y-direction and on which it may be rotated by 180. This is possible because the adaptation element 20 substantially generates a wavefront which corresponds to a surface design of the test object 40. What is very expedient is that a purely spherical-astigmatic wavefront is generated by the adaptation element 20. Thus, in principle,
[0074]
[0075] During the actual measurement of the surface of the test object 40 (not depicted in
[0076] In practice, provision is made for the test optical unit, comprising the Fizeau element 10 with the reference surface 11 and an adaptation element 20 in the form of a CGH, to be tilted, wherein provision is made of a movable interferometric sensor (not depicted here) relative to the test object 40. Here, the goal each time is to let the wavefront be incident on the test object 40 as perpendicularly as possible or in a substantially perpendicular manner.
[0077] In this context, substantially perpendicular means that an interferometric measurement of the spherical-astigmatic surface or of the free-form surface must be possible with sufficient accuracy, wherein this may also be achieved in the case of a not exactly perpendicular incidence of the test wavefront on the spherical-astigmatic surface or free-form surface. It was found that the maximum admissible deviation from the normal may be in the single-digit mrad range, in particular, it may be at most 5 mrad, in particular at most 2 mrad, in particular at most 1 mrad. This requirement applies to each individual one of the sub-apertures SAp to be measured.
[0078] Below, a progress of a production process according to the invention for a spherical-astigmatic free-form surface is described in detail, wherein a precondition for the functioning of the production method is that at least 80% of the deviation of the free-form surface from a best-fit sphere is astigmatic.
[0079] In order to determine the best-adapted (best fit) spherical symmetric surface, it is possible, for example, to minimize the quadratic mean deviation (rms value) of the aspherical surface from the spherical symmetric surface to be compared in one predetermined direction. An alternative criterion for determining the best-adapted spherically symmetric surface comprises the peak to valley value (PV value), which represents the distance between a highest point and a lowest point on the free-form surface minus the spherically symmetric surface. The most meaningful criterion is to select the sphere in such a way that the maximum of the (absolute value of the) gradient of the difference between the free-form surface and the sphere to be adapted is minimized.
[0080] Therefore, within the meaning of the invention, a best-adapted or best-fit sphere is a spherically symmetric form, the deviation of which from the overall form of the free-form surface is minimal.
[0081] Preferably, the whole free-form surface is subdivided into individual sub-apertures SAp in such a way that, as a result thereof, a residual gradient within each individual sub-aperture SAp is preferably less than approximately 2 mrad. This residual gradient relates to the relative angles of the surface normals in relation to one another. By way of example, in practice, this may mean that a circle of the sub-aperture SAp has a diameter of approximately 10 mm because it is no longer possible to carry out a sensible measurement in the case of a larger sub-aperture SAp.
[0082] Initially, a design process is carried out for the optical free-form surface, for example for an imaging mirror of an EUVL (extreme ultraviolet lithography) lens. In particular, the best-fit radius and astigmatism for the free-form surface is determined for a calibration process.
[0083] Thereupon, a spherical-astigmatic Fizeau element is designed, wherein there is an adaptation of the two radii of the astigmatism generated by the Fizeau element in mutually orthogonal sectional planes, taking into account a sought-after operating distance of the Fizeau element in relation to the free-form surface. The aforementioned operating distance is an intended distance between the wavefront generation device 10 and the free-form surface during the measurement to be carried out.
[0084] Thereupon, there is a production of the Fizeau element and a fitting countersurface (calibration surface) with a diameter that is preferably at least approximately 5% larger than the diameter of the Fizeau element, with the aid of a test CGH where necessary.
[0085] Subsequently, there is an absolute calibration of the wavefront of the Fizeau element by way of the above-described shift-shift calibration, using a 180 rotation against the aforementioned purely spherical-astigmatic countersurface where necessary, and there is an iterative correction of one or both wavefronts where necessary.
[0086] Thereupon, there is an installation of the Fizeau element produced thus into a moveable interferometric sensor and an adjustment of the sensor. Such a sensor, via which portions of the free-form surface may be measured, is disclosed in e.g. US 2012/0229814 A1 or DE 10229816 A1, the disclosures of which are incorporated in their entirety here.
[0087] Then, a trajectory for the interferometric sensor relative to the free-form surface to be tested is programmed for the purposes of a comprehensive measurement of sub-apertures SAp. There is an insertion and an adjustment of the free-form surface to be tested in the measurement installation with the interferometric sensor. As a result, an automated travel along the programmed trajectory and a recording of interference images is made possible, and also a calculation and storage of surface topography images of the individual sub-apertures SAp. Preferably, the individual sub-apertures SAp overlap at least in such a way that a union of all sub-apertures SAp yields a superset of the whole free-form surface.
[0088] Then, a surface form of the test object in the individual sub-apertures SAp is calculated taking into account the form (radius, astigmatism, residual figure) of the Fizeau element obtained through the above-described absolute calibration.
[0089] Then, there is a transformation of the sub-aperture coordinates into a coordinate system of the free-form surface because individual portions of the surface were measured in a local coordinate system. Finally, there is stitching of the free-form surface from the individual sub-apertures SAp to an overall surface.
[0090] Now, as a result, a sagittal height value or peak to valley or PV value for the free-form surface on the overall surface is known.
[0091] Now, the intended form of the free-form surface, designed at the start, is subtracted from the actual form of the free-form surface, with an evaluation of the deviation of the actual form from the intended form being carried out, the free-form surface subsequently being post-processed in accordance with the determined deviation from the intended form where necessary.
[0092] The entire above-described process now is carried out iteratively until form-giving processing steps and measurement loops yield the form of the free-form surface lying within the demanded specification.
[0093] Overall, the above-described method renders it possible to produce a free-form surface which is producible and testable in a very accurate manner in the mid- to high frequency range, preferably in the pm range for sagittal height profile, PV value or rms value.
[0094] U.S. Pat. No. 7,538,856 B2 and U.S. Pat. No. 7,355,678 B2 have disclosed EUVL projection lenses, the mirrors of which are testable and producible with the method according to the invention. In particular, the method is advantageous for all mirrors shown there because, apart from a basic curvature, all aforementioned mirrors predominantly have an astigmatic embodiment.
[0095] In principle, two different types of Fizeau elements are conceivable:
[0096]
[0097]
[0098] Using the above-described shift-shift method, both types of Fizeau elements can be calibrated in absolute terms with the aid of an adapted purely spherical-astigmatic test surface or with a corresponding calibration CGH.
[0099]
[0100] A plurality of relevant variables should be considered in relation to the approximately 80% to approximately 90% component of the overall deviation of the test object figure from the spherical basic form:
(i) PV or rms of the deviation of the free-form surface from the spherical basic form (=PV(FFF) or rms(FFF))
(ii) PV or rms of the astigmatic component of the free-form surface, for example determinable by way of the fit of Zernike polynomials to the mathematical surface description (=PV(Ast) or rms(Ast))
(iii) PV or rms of the deviation (i) after subtracting the astigmatic component (ii) (=PV(Rest) or rms(Rest)).
[0101] The rms values add or subtract approximately quadratically since the deviations from the spherical basic form (firstly, the astigmatism and, secondly, the remaining residual error in this case) describable by two-dimensional polynomials are linearly independent, i.e. the following applies:
rms(FFF)=SQRT(rms(Ast){circumflex over ()}2+rms(Rest{circumflex over ()}2)
[0102] The following follows therefrom:
rms(Ast)=SQRT(rms(FFF){circumflex over ()}2rms(Rest){circumflex over ()}2)
[0103] Here, the following abbreviations are used:
SQRT . . . Square root
PV . . . Peak to valley value
rms . . . Root mean square value
FFF . . . Free-form surface
Rest . . . Residual error
[0104] The following definition can be specified for e.g. at least 80% as spherical-astigmatic component of the overall deviation from the spherical basic form:
rms(Rest)/rms(FFF)<0.2(=100%80%)
[0105] Expressed differently, this means that the PV or rms value of the deviation of the freeform surface from the spherical form without the astigmatic component, normalized to the PV or rms value of the overall deviation of the free-form surface from the spherical form should be less than approximately 20%.
[0106] All the aforementioned mathematical relationships can also contain the PV value instead of the listed rms value, wherein the relationships only apply approximately, or on average, to the PV value.
[0107] With the aid of the method according to the invention, it is possible to produce and test free-form surfaces whose astigmatic component of an overall deviation of the free-form surface from a best-adapted sphere typically lies between a PV value of approximately 0.5 mm and approximately 20 mm. Here, a basic radius of the best-adapted sphere can be embodied between approximately 300 mm and approximately infinity (). Here, a radius of infinity () corresponds to a plane surface.
[0108] In particular, the method according to the invention can be used to produce and test a free-form surface, the local gradient profile of which in any sub-aperture SAp, which is embodied as a circle with a diameter of at least approximately 10 mm, after subtracting a tilt, a focus of the test wave and a purely astigmatic component constant for the whole mirror is at most approximately 2 mrad PV.
[0109] In particular, the method according to the invention can be used to produce and test a free-form surface, the deviation of which from the intended form in a spatial wavelength band with a spatial wavelength between approximately 0.5 mm and approximately 50 mm is at most approximately 100 pm to approximately 200 pm, preferably at most approximately 50 pm to 100 pm, more preferably at most approximately 20 pm.
[0110] In particular, the method according to the invention can be used to produce and test a free-form surface, the deviation of which from the intended form in the spatial wavelength band with a spatial wavelength between approximately 0.1 mm and approximately 30 mm is at most approximately 100 pm to approximately 200 pm, preferably at most approximately 50 pm to 100 pm, more preferably at most approximately 20 pm.
[0111] Additionally, the method according to the invention renders purely spherical-astigmatic surfaces testable with an accuracy of approximately 20 pm after subtracting the focus and astigmatism.
[0112]
[0113] In a first step S1, a spherical-astigmatic wavefront is generated as a test wavefront with a wavefront generation device 10.
[0114] In a second step S2, an interferometric measurement of wavefront differences between the wavefront generation device and the spherical-astigmatic surface adapted to the wavefront generation device is carried out in such a way that the test wavefront is incident substantially perpendicularly at each point of the spherical-astigmatic surface, wherein a plurality of the measurements are carried out, in which the spherical-astigmatic surface is measured at a number of positions, spherized about the two centers of the radii of the astigmatism and/or rotated by 180 about the surface normal of the spherical-astigmatic surface, wherein corresponding interferogram phases are determined.
[0115] Finally, in a third step S3, the wavefront of the wavefront generation device and the surface form of the spherical-astigmatic surface is determined using a mathematical reconstruction method, according to which the surface of the spherical-astigmatic surface 40 is corrected via a suitable processing method. Steps S1 to S3 are repeated until the wavefront differences lie below a defined threshold.
[0116] In conclusion, the present invention proposes a method for measuring a spherical-astigmatic optical surface, a method for measuring a spherical-astigmatic optical free-form surface and a test apparatus for a form of an optical free-form surface.
[0117] Advantageously, the invention renders possible highly precise manufacturing and testing of the figure of spherical-astigmatic surfaces, in particular free-form surfaces with a high spherical-astigmatic component. Advantageously, the free-form surface is measurable with a high resolution on account of the principle of scanning in portions, wherein a high spatial resolution and, in specific frequency bands, a substantially higher accuracy is achievable than with conventional methods. Advantageously, free-form surfaces with accuracy in the pm range can be produced and measured as described here.
[0118] Preferably, provision is made of forming a dedicated calibration CGH and/or a dedicated spherical-astigmatic calibration surface for each test object. In practice, a plurality of optical components for lenses with free-form surfaces are advantageously exactly testable in this manner.
[0119] The invention exploits the fact that most free-form surfaces have only a basic astigmatism and only weakly developed further deviation profile components in addition to the basic curvature thereof, wherein a test optical unit consisting of generation device is formed for each individual one of these surfaces, wherein a reference curvature and a reference astigmatism of the testing wavefront is adapted to the basic form of the test object.
[0120] The person skilled in the art will herewith be enabled to suitably modify the described features or combine them with one another, without departing from the essence of the invention.