Fluid flow device, comprising a valve unit, as well as method of manufacturing the same
10400914 · 2019-09-03
Assignee
Inventors
- Joost Conrad LÖTTERS (Ruurlo, NL)
- Remco John WIEGERINK (Ruurlo, NL)
- Maarten Sytze Groen (Ruurlo, NL)
- Dannis Michel Brouwer (Ruurlo, NL)
- Robert Anton Brookhuis (Ruurlo, NL)
- Esken Meutstege (Ruurlo, NL)
- Jarno GROENESTEIJN (Ruurlo, NL)
Cpc classification
F16K2099/0074
MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
F16K99/0048
MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
International classification
Abstract
The invention relates to a fluid flow device (1), comprising a system chip (11) having a substrate (12), a flow channel (21) defined within said substrate, and a sensor unit (41) connected to said flow channel for determining a property of a fluid in said flow channel. Furthermore, a valve unit (30) is provided within said substrate, for regulating fluid flow through said flow channel. The valve unit comprises a valve chamber (31) defined within said substrate, and a valve member (32) that is movably arranged within the valve chamber. The flow channel has a connection channel part (22) defined within said substrate (12), wherein said connection channel part is connected to said valve unit. Further, control means connected to said valve unit and said sensor unit are provided. The control means are arranged for controlling said valve unit based on signals obtained by said sensor unit.
Claims
1. A fluid flow device, comprising: a system chip having a substrate; a flow channel defined within said substrate; a sensor unit connected to said flow channel for determining a property of a fluid in said flow channel; a valve unit for regulating fluid flow through said flow channel, comprising a valve chamber defined within said substrate, and comprising a valve member that is movably arranged within the valve chamber such that a fluid flow through said flow channel can be regulated, wherein said flow channel has a connection channel part defined within said substrate, wherein said connection channel part is connected to said valve unit, and wherein the valve chamber is defined by a floor, a circumferential side wall, and a ceiling, and the valve chamber comprises an inlet for fluid and an outlet for fluid, wherein at least one of the inlet and the outlet is provided in the side wall of the valve chamber and is connected to the connection channel part and the valve member comprises an internal flow channel defined within said valve member, and having a first outer end that faces the floor and having a second outer end facing the side wall; and control means connected to said valve unit and said sensor unit, and arranged for controlling said valve unit based on signals obtained by said sensor unit.
2. The fluid flow device according to claim 1, wherein at least the connection channel part extends mainly parallel to the plane defined by the substrate.
3. The fluid flow device according to claim 1, wherein the sensor unit comprises a Coriolis flow sensor and/or a thermal flow sensor.
4. The fluid flow device according to claim 1, wherein the valve member is movable in a direction mainly parallel to the side wall of the valve chamber between a closed position and an open position, wherein, in the closed position, the valve member is in contact with the floor of the valve chamber and at least part of the circumferential side wall is positioned at a distance from the valve member.
5. The fluid flow device according to claim 1, wherein both the inlet and the outlet of the valve unit are provided in the side wall of the valve chamber.
6. The fluid flow device according to claim 1, wherein the valve member further comprises a third outer end facing the side wall.
7. The fluid flow device according to claim 1, wherein the valve unit comprises a flexible flow tube element that extends between the second outer end of the internal flow channel and one of the inlet or outlet provided in the side wall of the valve chamber.
8. The fluid flow device according to claim 7, wherein the valve member is suspended in the valve chamber by means of said flexible flow tube element.
9. The fluid flow device according to claim 7, wherein the flexible flow tube element is a silicon nitride flow tube.
10. The fluid flow device according to claim 1, wherein the valve unit comprises at least one further inlet and/or outlet, wherein said at least one further inlet and/or outlet is provided in the side wall of the valve chamber.
11. The fluid flow device according to claim 1, wherein the valve chamber has a width dimension as measured in a direction parallel to the plane defined by the floor, and wherein the valve chamber has a height dimension as measured in a direction parallel to the side wall of the valve chamber, wherein the width dimension is larger than the height dimension.
12. The fluid flow device according to claim 1, wherein the system chip comprises a silicon substrate, and wherein the valve unit comprises a silicon valve member, and wherein the flow channel is a silicon nitride coated channel in the silicon substrate.
13. A method of manufacturing a system chip for a fluid flow device according to claim 1, comprising the steps of: providing a substrate; realizing the valve chamber, the valve member and the flow channel by means of partially removing substrate; Fluidly connecting said flow channel and said valve chamber by means of partially removing substrate.
14. The method according to claim 13, wherein the method comprises partially etching steps.
15. The method according to claim 13, comprising the subsequent steps of: providing a silicon substrate having a device layer, a handle layer, and a buried oxide layer; realizing fluidic inlets and outlets in the handle layer using an etching step, in particular deep reactive ion etching of silicon; creating surface channels and the valve chamber in the device layer using an etching step, in particular isotropic etching of silicon through a silicon nitride slit-pattern mask; creating the valve member by using an etching step, in particular by selectively etching the buried oxide layer using HF etching; creating a closed fluidic system by means of low pressure chemical vapor deposition of silicon nitride.
Description
(1) The invention will next be explained by means of the accompanying figures, which show embodiments of the current invention. The embodiments are not intended to be limiting in nature. In the figures:
(2)
(3)
(4)
(5)
(6)
(7)
(8) As can be seen in
(9) In the substrate, there is further provided a valve unit 30. The valve unit is arranged for regulating fluid flow through said flow channel 21. The valve unit 30 comprises a valve chamber 31 that is defined within said substrate 12. The valve unit 30 further comprises a valve member 32 that is movably arranged within the valve chamber 31. The valve member 32 is suspended in the valve chamber 31 by means of flexure elements 35. These flexure elements 35 may be actuator elements, such that the valve member 32 may be moved. With movement of the valve member 32, a fluid flow through said flow channel 21 can be regulated.
(10) The device 1 further comprises control means 51 connected to said valve unit 30 and to said sensor unit 41. The control means 51 may, for instance, be connected to the actuator elements 35 that are formed by the flexure elements 35. Other ways of actuating the valve member are conceivable as well. The control means 51 are indicated as a separate block, but may be integrated in the system chip 11. The control means 51 are arranged for controlling said valve unit 30 based on signals obtained by said sensor unit 41.
(11) According to the invention, the flow channel 21 has a connection channel part 22 defined within said substrate 12, and that directly connects the flow channel 21 to the valve chamber 31 of the valve unit 30. In the embodiment shown, the connection channel part 22 extends mainly parallel to the plane defined by the substrate 12. By having a direct connection between the flow channel and the valve unit, an on-die-integration of both the valve unit 30 and the sensor unit 41 can be made, which eliminates the need of wager bonding steps or fluidic interconnects, and enables the realization of, for example, a proportional mass flow controller on a single chip.
(12) The system chip 11 of
(13) Now referring to
(14) In
(15) The first flow channel 21 has a connection channel part 22 defined within the substrate 12, and that is connected to the valve chamber 31 of the valve unit 30.
(16) The valve member 32 in
(17) The design allows the valve unit 30 with its inlet and outlet to be provided completely within the substrate 12, which allows on-die-integration of the valve unit 30 and further components of the system chip 11, such that the need of wafer bonding steps or fluidic interconnects is eliminated. Thus, a fully integrated micro-valve 30 on a system chip 11 is obtained.
(18) The design of
(19) Furthermore, as indicated before, the inlet 2 and the outlet 3 in the system chip 11 may be provided as shown, or the other way around, such that fluid flows from left to right, or from right to left, respectively.
(20) Now referring to
(21)
(22) For the designs shown in
(23)
(24) Both valve units 30 described in
(25) The in-plane design (
(26) To obtain a single, symmetric point of actuation, a central plate is added at the center of the inner cavity 38 (not shown). It is preferably connected to the ring of the valve plate 32 by three spokes.
(27) Since flow does not leave the surface channel network, the in-plane design of
(28)
(29) The surface channels 203 and cavities 204, 205 are then created in the device layer 103 using isotropic etching of silicon through a silicon nitride slit-pattern mask. By varying the density of this slit pattern, it is possible to create both deep and shallow structures in a single etch step (
(30) To release the valve structures 232, the BOX layer 102 is selectively etched using first a liquid phase HF etch, followed by a vapor phase HF etch to prevent stiction by capillary forces (
(31) Using LPCD of silicon nitride, the slit patterns are then closed to seal the surface channels 203, form the channel walls and create a closed fluidic system (
(32) When the valve is closing, the outflow channels in the in-plane valve need to bend down. To reduce their bending stiffness, the silicon around them is removed in a final isotropic etch (
(33) It will be apparent to those skilled in the art, that the invention has been described by means of several exemplary embodiments. Further embodiments are conceivable. The desired protection is defined by the attached claims.