Thin film circuit substrate and manufacturing method thereof

Abstract

Disclosed is a thin film circuit substrate and a manufacturing method thereof, which are capable of forming a pattern having a feature size of less than 10 μm by forming a seed layer and a plating layer on a base substrate and then forming, through electrospinning, a photoresist layer having a thickness in a set range. The disclosed thin film circuit substrate comprises: a base substrate; a thin film seed layer formed on the top surface of the base substrate; a metal layer formed on the top surface of the thin film seed layer; and a photoresist layer formed on the top surface of the metal layer, wherein the thickness of the photoresist layer is in a range of 1 μm to 5 μm.

Claims

1. A thin film circuit substrate comprising: a base substrate; a thin film seed layer formed on a top surface of the base substrate; a metal layer formed on a top surface of the thin film seed layer; and a photoresist layer formed by electrospinning a photosensitizer on a top surface of the metal layer, wherein a thickness of the photoresist layer is in a range of 1 μm to 5 μm,and wherein a sum of thickness of the base substitute, a thickness of the thin film seed layer and a thickness of the metal layer is not greater than 5 μm.

2. The thin film circuit substrate of claim 1, wherein the thin film seed layer comprises at least one of nickel (Ni) and copper (Cu).

3. The thin film circuit substrate of claim 1, wherein the metal layer comprises copper (Cu).

4. A method of manufacturing a thin film circuit substrate, the method comprising: preparing a base substrate; forming a thin film seed layer on a top surface of the base substrate; forming a plating layer on a top surface of the thin film seed layer; and forming a photoresist layer on a top surface of the plating layer, wherein the forming of a photoresist layer forms the photoresist layer by electrospinning a photosensitizer on the top surface of the plating layer, and a thickness of the photoresist layer is in a range of 1 μm to 5 μm, and wherein a sum of thickness of the base substrate, a thickness of the thin film seed layer and a thickness of the plating layer is not greater than 5 um.

5. The method of claim 4, wherein the forming of the thin film seed layer forms the thin film seed layer through a sputtering process, and the thin film seed layer comprises at least one of nickel (Ni) and copper (Cu).

6. The method of claim 4, wherein the forming of the plating layer forms the plating layer on the surface of the thin film seed layer through an electroplating process, and the plating layer comprises copper (Cu).

Description

BRIEF DESCRIPTION OF THE DRAWINGS

(1) FIG. 1 is a diagram for explaining a thin film circuit substrate according to an embodiment of the present disclosure.

(2) FIGS. 2 and 3 are diagrams for explaining a method of manufacturing a thin film circuit substrate according to an embodiment of the present disclosure.

DETAILED DESCRIPTION

(3) Hereinafter, the most preferred embodiment of the present disclosure will be described with reference to the accompanying drawings in order to specifically describe so that those skilled in the art to which the present disclosure pertains may easily practice the technical spirit of the present disclosure. First, in adding reference numerals to the components of each drawing, it should be noted that the same components are denoted by the same reference numerals as much as possible even if displayed on different drawings. In addition, in describing the present disclosure, when it is determined that the detailed description of the related known configuration or function may obscure the gist of the present disclosure, the detailed description thereof will be omitted.

(4) Referring to FIG. 1, a thin film circuit substrate according to an embodiment of the present disclosure includes a base substrate 100, a thin film seed layer 200, a thin film plating layer 300, and a photoresist layer 400.

(5) The base substrate 100 is composed of a plate-shaped substrate or film of a flexible material. The base substrate 100 is, for example, a polyimide (PI) film.

(6) The thin film seed layer 200 is disposed on the surface of the base substrate 100. The thin film seed layer 200 is disposed on at least one surface of the top surface and the bottom surface of the base substrate 100.

(7) The thin film seed layer 200 is formed on the surface of the base substrate 100 through a sputtering process. The thin film seed layer 200 includes, for example, at least one of nickel (Ni) and copper (Cu).

(8) The thin film plating layer 300 is disposed on the surface of the thin film seed layer 200. The thin film seed layer 200 is disposed on the top surface of the thin film seed layer 200 formed on the top surface of the base substrate 100. The thin film seed layer 200 may also be disposed on the bottom surface of the thin film seed layer 200 formed on the bottom surface of the base substrate 100.

(9) The thin film plating layer 300 is formed on the surface of the thin film seed layer 200 through an electroplating process. The thin film plating layer 300 is, for example, copper (Cu).

(10) The thickness obtained by summing the thickness of the base substrate 100, the thickness of the thin film seed layer 200, and the thickness of the thin film plating layer 300 is, for example, about 5 μm or less. The thickness of the base substrate 100, the thickness of the thin film seed layer 200, and the thickness of the thin film plating layer 300 may be formed differently based on the intended use.

(11) The photoresist layer 400 is disposed on the surface of the thin film plating layer 300. The photoresist layer 400 is formed on the top surface of the thin film plating layer 300 disposed on the top surface of the base substrate 100. The photoresist layer 400 may also be formed on the bottom surface of the thin film plating layer 300 disposed on the bottom surface of the base substrate 100.

(12) The photoresist layer 400 is formed on the surface of the thin film plating layer 300 through the electrospinning process. The photoresist layer 400 is formed by electrospinning a photosensitizer (that is, a photoresist liquid, a photosensitive polymer solution) on the surface of the thin film plating layer 300.

(13) The photoresist layer 400 is formed to a thickness within a set thickness range. The thickness of the photoresist layer 400 is 1 μm or more, which is the minimum value of the set thickness range, and 5 μm or less, which is the maximum value of the set thickness range, for example.

(14) When the photoresist layer 400 is formed to a thickness of less than 1 μm through the electrospinning process, the thickness and the surface thereof become uneven. When the photoresist layer 400 is formed to a thickness of more than 5 μm, the electrospinning process is needed to repeat several times in the case of performing the electrospinning, thereby rapidly increasing the manufacturing costs.

(15) Accordingly, the photoresist layer 400 is formed to a thickness of a range of 1 μm to 5 μm, which is the set thickness range.

(16) Since the photoresist layer 400 is quickly dried, the thinner volatilization is advantageous and the price competitiveness is advantageous as the photoresist layer 400 is thinner. Accordingly, the photoresist layer 400 is formed to a thickness as thin as possible within the set thickness range.

(17) Referring to FIGS. 2 and 3, a method of manufacturing the thin film circuit substrate according to an embodiment of the present disclosure includes preparing a base substrate (S100), forming a thin film seed layer (S200), forming a thin film plating layer (S300), and forming a photoresist layer (S400).

(18) The preparing of the base substrate (S100) prepares the base substrate 100 having a plate-shaped substrate or film of a flexible material. The base substrate 100 is, for example, a polyimide (PI) film.

(19) The forming of the thin film seed layer (S200) forms the thin film seed layer 200 on the surface of the base substrate 100. The thin film seed layer 200 is formed on at least one surface of the top surface and the bottom surface of the base substrate 100.

(20) The forming of the thin film seed layer (S200) forms the thin film seed layer 200 through a sputtering process. The thin film seed layer 200 is, for example, made of a material including at least one of nickel (Ni) and copper (Cu).

(21) The forming of the thin film plating layer (S300) forms the thin film plating layer 300 on the surface of the thin film seed layer 200. The forming of the thin film plating layer (S300) forms the thin film plating layer 300 on the top surface of the thin film seed layer 200 formed on the top surface of the base substrate 100. The forming of the thin film plating layer (S300) may also form the thin film plating layer 300 on the bottom surface of the thin film seed layer 200 formed on the bottom surface of the base substrate 100.

(22) The forming of the thin film plating layer (S300) forms the thin film plating layer 300 on the surface of the thin film seed layer 200 through an electroplating process. The thin film plating layer 300 is, for example, copper (Cu).

(23) In the method of manufacturing the thin film circuit substrate, the thickness obtained by summing the thickness of the base substrate 100, the thickness of the thin film seed layer 200, and the thickness of the thin film plating layer 300 is, for example, about 5 μm or less. The thickness of the base substrate 100, the thickness of the thin film seed layer 200, and the thickness of the thin film plating layer 300 may be formed differently based on the intended use.

(24) The forming of the photoresist layer (S400) forms the photoresist layer 400 on the surface of the thin film plating layer 300. The forming of the photoresist layer (S400) forms the photoresist layer 400 on the top surface of the thin film plating layer 300 disposed on the top surface of the base substrate 100. The forming of the photoresist layer (S400) may also form the photoresist layer 400 on the bottom surface of the thin film plating layer 300 disposed on the bottom surface of the base substrate 100.

(25) The forming of the photoresist layer (S400) forms the photoresist layer 400 on the surface of the thin film plating layer 300 through the electrospinning process. The forming of the photoresist layer (S400) forms the photoresist layer 400 having a set thickness on the surface of the thin film plating layer 300 by electrospinning a photosensitizer (that is, a photoresist liquid and a photosensitive polymer solution).

(26) In the forming of the photoresist layer (S400), when electrospinning the photoresist layer 400 to the thickness of less than 1 μm, the thickness and the surface thereof are unevenly formed. In the forming of the photoresist layer (S400), the electrospinning is needed to repeat several times in the case of performing the electrospinning to a thickness of more than 5 μm, thereby rapidly increasing the manufacturing costs.

(27) Accordingly, the forming of the photoresist layer (S400) forms the photoresist layer 400 having the thickness of a range of 1 μm to 5 μm.

(28) While the preferred embodiment according to the present disclosure has been described above, modifications may be made in various forms, and it is understood that those skilled in the art will be able to practice various changes and modifications without departing from the claims of the present disclosure.