Method for operating a multi-beam particle microscope

10388487 ยท 2019-08-20

Assignee

Inventors

Cpc classification

International classification

Abstract

A method includes: generating a multiplicity of particle beams such that the particle beams penetrate a predetermined plane side-by-side and have within a volume region around the predetermined plane in each case one beam focus; scanning a first region of the surface of an object with the particle beams and detecting first intensities of particles produced by the particle beams while setting an operating parameter of the multi-beam particle microscope; and determining first values of an object property based on the first intensities. The first values represent the object property within the first region, and the object property represents a physical property of the object. The method also includes determining a second value of the operating parameter for use for a second region of the surface based on the first values of the object property.

Claims

1. A method of operating a multi-beam particle microscope, the method comprising: generating a multiplicity of particle beams so that the multiplicity of particle beams penetrates a predetermined plane side-by-side, each particle beam of the multiplicity of particle beams having one beam focus within a volume region around the predetermined plane; arranging a surface of an object at least partially within the volume region; scanning a first region of the surface with the multiplicity of particle beams and detecting first intensities of particles produced by the multiplicity of particle beams that are incident on the first region, while an operating parameter of the multi-beam particle microscope is set to a first value, determining first values of an object property based on the first intensities, and determining first beam values based on the first intensities, wherein: the first values represent the object property within the first region, the object property represents a physical property of the object; the first beam values represent at least one property of the multiplicity of particle beams on the surface of the object; the at least one property of the multiplicity of particle beams on the surface of the object comprises a member selected from the group consisting of shapes of the multiplicity of particle beams on the surface of the object and sizes of the multiplicity of particle beams on the surface of the object; and the first values of the object property are determined based on the first beam values.

2. The method of claim 1, wherein the object property represents at least one of the following: a spatially resolved charge distribution; a spatially resolved distribution of the magnetization; and a spatially resolved field distribution of electric and/or magnetic fields which are generated by a charge within the object or a magnetization of the object.

3. The method of claim 1, wherein: each of the multiplicity of particle beams scans in each case a subregion of the first region and to this end is directed successively onto a multiplicity of sites within the respective subregion, the subregions at most partially overlapping; each of the sites is assigned the intensity caused during the directing of the respective particle beam onto the site; and the first values of the object property for each of the subregions of the first region are determined in each case on the basis of the first intensities that are assigned to the sites within the subregion.

4. The method of claim 1, wherein each of the multiplicity of particle beams scans in each case a subregion of the first region and is directed successively onto a multiplicity of sites within the respective subregion, wherein the subregions at most partially overlap, and at least one first beam value is determined for each of the multiplicity of particle beams on the basis of the first intensities caused by the respective particle beam.

5. The method of claim 1, further comprising: providing reference beam values which represent at least one property of the multiplicity of particle beams at a reference surface of a reference object; and determining a deviation between the first beam values and the reference beam values, and wherein the first values of the object property are determined based on the deviation.

6. The method of claim 5, comprising using a physical model to determine the first values of the object property based on the deviation.

7. The method of claim 5, further comprising determining a second value of the operating parameter for use for a second region of the surface based on the first values of the object property.

8. The method of claim 7, further comprising determining prediction values based on values of the object property, wherein the prediction values represent a predicted value of the object property for the second region, the values of the object property include at least the first values of the object property, and the second value of the operating parameter is determined based on the prediction values.

9. The method of claim 8, wherein determining the prediction values comprises extrapolating and/or interpolating the values of the object property.

10. The method of claim 8, wherein the values of the object property further comprise: further values of the object property representing the object property within at least a further region of the surface, wherein the at least one further region in each case at most partially overlaps the first and second regions.

11. The method of claim 7, wherein the second value of the operating parameter is different from the first value of the operating parameter.

12. The method of claim 7, wherein at least one of the following holds: the second region at least partially overlaps the first region; the second region overlaps at least 50% of a total area of the first region; and a geometric centre of the second region has a distance from a geometric centre of the first region that is at most 50% of an extent of the first region.

13. The method of claim 7, wherein at least one of the following holds: the second region at most partially overlaps the first region; the second region overlaps at most 50% a total area of the first region; a geometric centre of the second region has a distance from a geometric centre of the first region that is at least 50% of an extent of the first region.

14. The method of claim 1, wherein the operating parameter is used for controlling at least one component of the multi-beam particle microscope which is configured to change a distance of the beam foci from the predetermined plane and/or a form of the multiplicity of particle beams on the surface and/or a position of the object in a direction parallel to an optical axis of the multi-beam particle microscope.

15. The method of claim 14, wherein the at least one component comprises a field generator to generate electric and/or magnetic fields.

16. The method of claim 1, wherein the multi-beam particle microscope has an optical axis about which the multiplicity of particle beams is deflectable and wherein the predetermined plane is oriented substantially orthogonally to the optical axis.

17. The method of claim 1, further comprising displacing the object in a direction that is substantially orthogonal to an optical axis of the multi-beam particle microscope during the scanning of the surface of the object.

18. The method of claim 1, further comprising producing an image of the surface of the object from the detected intensities.

19. The method of claim 18, wherein, other than the multiplicity of particle beams, no other particle beams reach the surface.

20. The method of claim 5, wherein providing the reference beam values comprises calculating the reference beam values on the basis of data which represent properties of the multiplicity of particle beams.

21. The method of claim 5, wherein providing the reference beam values comprises determining the reference beam values using the multi-beam particle microscope and the reference object with the reference surface.

22. The method of claim 21, wherein determining the reference beam values comprises: arranging the reference surface of the reference object at least partially within the volume region; scanning the reference surface with the multiplicity of particle beams and detecting intensities of particles produced by the multiplicity of particle beams that are incident on the reference surface, during the scanning of the reference surface; and determining the reference beam values based on the intensities detected during the scanning of the reference surface.

23. The method of claim 22, wherein at least one reference beam value for each of the multiplicity of particle beams is determined based on the intensities detected during the scanning of the reference surface.

24. The method of claim 1, wherein the beam values and/or the reference beam values are determined via a gradient method, a Fourier analysis, or an autocorrelation.

25. The method of claim 21, wherein: the reference surface has a root mean square surface roughness of less than 5 m; and the root mean square surface roughness of the reference surface is, averaged over a length of the reference surface that is at least 100 m, a difference between height values of sites on the reference surface and a linear mean of the height values.

26. The method of claim 1, wherein the object property represents a spatially resolved height distribution representing a distance between a site on the surface and the predetermined plane.

27. A method for operating a multi-beam particle microscope, comprising: generating a multiplicity of particle beams so that the multiplicity of particle beams penetrates a predetermined plane side-by-side, each particle beam having one focus within a volume region around the predetermined plane; arranging a surface of an object at least partially within the volume region; scanning a first region of the surface with the multiplicity of particle beams and detecting first intensities of particles produced by the multiplicity of particle beams that are incident on the first region, while an operating parameter of the multi-beam particle microscope is set to a first value; determining, based on the first intensities, a first beam value of a first particle beam of the multiplicity of particle beams, wherein the first beam value of the first particle beam represents a member selected from the group consisting of a shape of the first particle beam on the surface of the object and a size of the first particle beam on the surface of the object; determining, based on the first intensities, a first beam value of a second particle beam of the multiplicity of particle beams, wherein the first particle beam is different from the second particle beam, wherein the first beam value of the second particle beam represents a member selected from the group consisting of a shape of the second particle beam on the surface of the object and a size of the second particle beam on the surface of the object; determining a first value of a physical property of the object within the first region by using both the first beam value of the first particle beam and the first beam value of the second particle beam.

28. The method according to claim 27, wherein the determining of the first value of the physical property of the object within the first region is based on a comparison of the first beam value of the first particle beam and the first beam value of the second particle beam.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

(1) FIG. 1 shows a schematic illustration of a multi-beam particle microscope.

(2) FIG. 2 shows a flowchart of one embodiment of a method for operating the multi-beam particle microscope shown in FIG. 1.

(3) FIG. 3 shows a schematic diagram of a bundle of particle beams that are incident on a surface of an object.

(4) FIGS. 4A to 4C show a spatial division of a detail of the surface into regions, subregions and scanned sites.

(5) FIGS. 5A to 5C show a schematic diagram of forms of a cross section of the particle beams on the surface for different values of an operating parameter of the multi-beam particle microscope.

(6) FIG. 6 shows a schematic diagram of a relationship between beam values of two particle beams of the bundle.

(7) FIG. 7 shows a schematic diagram of values of an object property of a first region of the surface and of prediction values of a second region of the surface.

(8) FIG. 8 shows a flowchart of a part of a further embodiment of a method for operating the multi-beam particle microscope shown in FIG. 1.

(9) FIGS. 9A to 9C show exemplary arrangements of first, second and third regions for extrapolation and interpolation of values of an object property for obtaining prediction values.

DETAILED DESCRIPTION

(10) FIG. 1 is a schematic illustration of a multi-beam particle microscope 1 which uses a multiplicity of particle beams, for example beams of ions or electrons. The multi-beam particle microscope generates a multiplicity of primary particle beams 3 which are incident on an object 7 to be examined so as to produce particles there, for example secondary electrons or ions, back-scattered electrons or ions, transmitted electrons or ions or the like, which emerge from the object 7 and are subsequently detected. The multi-beam particle microscope 1 uses a plurality of primary particle beams 3 which are focused in an objective plane 101 of an objective lens 102 of an objective lens system 100 and are incident on a surface 8 of the object 7 and produce there a plurality of particle beam spots. The object 7 to be examined can include, for example, a semiconductor wafer, a biological sample, an arrangement of miniaturized elements or the like. The surface 8 of the object 7 is arranged in the region of the objective plane 101.

(11) The enlarged detail I1 in FIG. 1 shows a plan view of the objective plane 101 having a regular rectangular field 103 of beam foci 5. In FIG. 1, the number of the primary particle beams 3, the beam foci 5 and correspondingly the particle beam spots 6 on the surface 8 of the object 7 is twenty-five (25). The number 25 is a small number chosen for reasons of the simplified illustration. In practice, the number of particle beams 3 or of beam foci 5 or of particle beam spots 6 can be selected to be substantially greater.

(12) In the illustrated embodiment, the field 103 of beam foci 5 is a substantially regular rectangular field having a constant distance P.sub.1 between neighbouring beam foci 5. Exemplary values of the distance P.sub.1 are 1 m, 10 m and 40 m. However, it is also possible for the field 103 to have different symmetries, such as a hexagonal symmetry.

(13) The enlarged detail I5 in FIG. 1 shows a plan view of the surface 8 of the object 7 having a regular field 501 of particle beam spots 6. The form of the particle beam spots 6, i.e. the shape and size thereof, substantially depends on the form of the primary particle beams 3 on the surface 8 of the object 7. A distance P.sub.5 between neighbouring particle beam spots 6 substantially corresponds to the distance P.sub.1.

(14) Focusing the particle beams 3 to shape the beam foci 7 or the particle beam spots 6 is effected, for example, by the objective lens system 100, in particular by the objective lens 102 or an object holder 10 on which the object 7 is arranged and which is configured to displace the object 7 relative to the beam foci 5 or the objective lens 102.

(15) The primary particle beams 3 that are incident on the object 7 produce particles which emanate from the particle beam spots 6 on the surface 8 of the object 7. The particles produced on the surface 8 of the object 7 are shaped by the objective lens 102 into secondary particle beams 9. The multi-beam particle microscope 1 provides a particle beam path 11 for guiding the multiplicity of secondary particle beams 9 to a detection system 200. The detection system 200 includes a particle optics having a projection lens 205 for directing the secondary particle beams 9 onto a particle multi-detector 209. The secondary particle beams 9 can be, for example, beams of electrons or ions, in particular back-scattered, secondary or transmitted electrons and ions.

(16) The detail I2 in FIG. 1 shows a plan view of a detection plane 211, in which individual detection areas 215 are located on which the secondary particle beams 9 are incident on sites 213. The sites of incidence 213 are located in a field 217 having a regular distance P.sub.2 with respect to one another. Exemplary values of the distance P.sub.2 are 10 m, 100 m and 200 m. The particle multi-detector 209 includes a multiplicity of detection areas 215. The detection system 200 is designed such that each of the sites of incidence 213 is assigned one detection area 215. The detection areas 215 can be provided by way of a multiplicity of individual detectors or by way of a segmented detector.

(17) The objective lens 102 and the projection lens 205 provide an imaging particle optics for imaging the objective plane 101 onto the detection plane 211. In this way, the intensity of the particles which are produced by the primary particle beams 3 and emanate from the particle beam spots 6 can be detected by the detection system 200.

(18) The primary particle beams 3 are generated in a beam generation apparatus 300, which includes at least one particle source 301, at least one collimation lens 303, a multi-aperture arrangement 305 and a field lens 307. The beam generation apparatus 300 can furthermore include a stigmator. The particle source 301 generates a diverging particle beam 309, which is collimated by the collimation lens 303 to form a beam 311 which illuminates the multi-aperture arrangement 305.

(19) The detail I3 in FIG. 1 shows a plan view of the multi-aperture arrangement 305. The multi-aperture arrangement 305 includes a multi-aperture plate 313 having a plurality of openings or apertures 315 formed therein. The centres 317 of the openings 315 are arranged in a field 319 that corresponds to the field 103 which is formed by the beam foci 5 in the objective plane 101.

(20) A distance P.sub.3 of the centres 317 of the apertures 315 from one another can have exemplary values of 5 m, 100 m and 200 m. The diameters D of the apertures 315 are smaller than the distance P.sub.3 between the centres of the apertures. Examples of values of the diameters D are 0.2P.sub.3, 0.4P.sub.3 and 0.8P.sub.3.

(21) Particles of the illuminating beam 311 penetrate the apertures 315 and form the primary particle beams 3. The particles of the illuminating beam 311 that are incident on the plate 313 are absorbed thereby and do not contribute to the formation of the primary particle beams 3.

(22) On account of an electrostatic field that has been applied, the multi-aperture arrangement 305 focuses the particle beams 3 such that beam foci 323 are formed in a plane 325. A diameter of the foci 323 can be for example 10 nm, 100 nm and 1 m.

(23) The field lens 307 and the objective lens 102 provide an imaging particle optics for imaging the plane 325, in which the foci 323 are formed, onto the objective plane 101 such that the field 103 of beam foci 5 is formed there.

(24) A beam switch 400 is arranged in the beam path of the particle optics. The beam switch 400 guides the primary particle beams 3 emanating from the field lens 307 to the objective lens system 100. The beam switch 400 furthermore guides the secondary particle beams 9 emanating from the surface 8 of the object 7 to the detection system 200.

(25) FIG. 2 shows a flowchart of one embodiment of a method for operating the multi-beam particle microscope 1. In a first step S1, a bundle of a multiplicity of particle beams 3 is produced. FIG. 3 shows the bundle of (primary) particle beams 3, which penetrate a predetermined plane 15 side-by-side and do not superpose one another in the process, i.e. a distance between the particle beams 3 in the predetermined plane 15 is greater than a width of an individual particle beam. The predetermined plane 15 in the embodiment shown is a plane that is mathematically exactly flat. However, the predetermined plane 15 can also be a curved area and be generally an area of any desired shape. The predetermined plane 15 intersects an optical axis 16 of the multi-beam particle microscope 1. The optical axis 16 can be, for example, the optical axis of the objective lens 102. The bundle of particle beams 3 is deflectable about the optical axis 16, to which end the multi-beam particle microscope 1 can include one or more deflectors. By deflecting the particle beams 3 from the location shown in FIG. 3, which is characterized in that the propagation direction of the particle beams 3 is oriented parallel to the optical axis 16, it is possible for aberrations to be introduced which increase with the deflection of the particle beams 3 from the optical axis 16. In practice, the angular range in which the particle beams 3 are deflected from the optical axis 16 is hereby limited with respect to the aberrations that are introduced in this way. An area of the surface 8 that can be scanned via the particle beams 3 without displacing the object 7 relative to the optical axis 16 is referred to below as a region.

(26) Each of the particle beams 3 is focused by the objective lens 102 and has a beam focus 5 which is arranged in the objective plane 101. As opposed to the objective plane 101 that is illustrated in FIG. 1 in the form of a plane which is mathematically exactly flat, the objective plane 101 is generally not mathematically exactly flat owing to aberrations of the imaging particle optics from the particle beam generation apparatus 300 to the objective lens 102, but can be a curved area, as is illustrated in FIG. 3. The beam foci 5 of the primary particle beams 3 are arranged in a volume region 19 around the predetermined plane 15. The predetermined plane 15 can include, for example, at least one of the beam foci 5 or overlay the objective plane 101. The predetermined plane 15 can be arranged such that it is arranged substantially orthogonal to the optical axis 16 and has a distance from at least one of the beam foci 5 that is less than 100 m, 50 m, 10 m or 1 m.

(27) According to a step S2, which follows the step S1 illustrated in FIG. 2, the surface 8 of the object 7 is arranged at least partially within the volume region 19. As a result, the surface 8 is arranged near the beam foci 5.

(28) According to a step S3, which follows step S2 illustrated in FIG. 2, a first region B.sub.1 of the surface 8 is scanned with the bundle of particle beams 3. During the scanning, an operating parameter of the multi-beam particle microscope 1 is set to a first value. The operating parameter serves for controlling at least one component of the multi-beam particle microscope 1 which is configured to change a distance of the beam foci 5 from the predetermined plane 15 and/or a form of the particle beams on the surface 8 and/or a position of the object 7 relative to the beam foci 17 or the objective lens 102, for example in a direction parallel to an optical axis 16 of the multi-beam particle microscope 1. The operating parameter can generally serve for controlling at least one component of the multi-beam particle microscope 1 that can influence an aberration. In other words, the operating parameter serves for setting the focusing and/or stigmatization and/or correction of higher-order errors. The at least one component can include a particle-optical lens, for example the particle-optical objective lens 102, a stigmator or another field generator.

(29) FIGS. 4A to 4C show in plan view of the surface 8 a spatial division of a detail of the surface 8 into regions, subregions of a region and scanned sites of a subregion. FIG. 4A shows nine regions B.sub.1 to B.sub.9. As explained above, a region is substantially characterized in that the region is an area of the surface 8 which can be scanned with the bundle of particle beams 3 by deflecting the particle beams 3 relative to the optical axis 16, without displacing the object 7 relative to the optical axis 16. In the diagram shown in FIG. 4A, the regions B.sub.1 to B.sub.9 do not overlap, but are adjacent. Each of the regions B.sub.1 to B.sub.9 has a square shape. The form of the regions is substantially related to the field 103 of the beam foci 5 and the angular range by which the particle beams 3 are able to be deflected relative to the optical axis 16.

(30) The form of the regions can deviate from the square shape and have, for example, a rectangular or a hexagonal form. In addition, the relative location of the regions with respect to one another, shown in FIG. 4A, is merely an example and can have nearly any desired configuration. However, with respect to the throughput of the multi-beam particle microscope, such an arrangement of the regions in which the regions at most partially overlap and, if desired, overlap as little as possible may be preferred.

(31) During scanning of the first region B.sub.1 (and of all further regions), all particle beams 3 of the bundle are directed onto this region B.sub.1. By deflecting the particle beams 3, each of the particle beams 3 is directed onto a multiplicity of sites of the surface 8. The sites onto which a single particle beam 3 can be directed by way of deflection define a subregion of the region that is assigned to the particle beam.

(32) FIG. 4B shows a field of subregions UB.sub.1 to UB.sub.25 of the first region B.sub.1. The number of subregions in each region B.sub.1 to B.sub.9 corresponds to the number of particle beams 3 or particle beam spots 6. The arrangement of the subregions relative to one another substantially corresponds to the arrangement of the beam foci 5 in the field 103. Each of the subregions UB.sub.1 to UB.sub.25 has a square form. The form of the subregions is substantially defined by the angles by which the particle beams 3 can be deflected relative to the optical axis 16 and can therefore have substantially any desired form. What may be preferred with respect to the throughput of the multi-beam particle microscope is that the subregions at most partially overlap or overlap as little as possible.

(33) FIG. 4C shows a multiplicity of sites 20 within the subregion UB.sub.1, onto which that particle beam is directed by way of deflection to which the subregion UB.sub.1 is assigned. The number of sites of incidence and the distances between the sites of incidence substantially determine the accuracy with which the surface 8 of the object 7 can be analysed. Each of the subregions generally has the same number and a similar arrangement of sites 20. Examples of values for the number of sites 20 in each of the subregions are 100100, 10001000 or 10 00010 000.

(34) The particle beams 3 that are incident on the surface 8 during scanning of the first region B.sub.1 produce particles which emanate from the object 7. The particles emanating from the object 7 are shaped by the objective lens 102 to secondary particle beams 9 and guided onto a particle multi-detector 209 so as to be detected there. The number of the detected particles is represented by an intensity. The intensities detected during the scanning of the first region B.sub.1 are referred to as first intensities. Each site 20 of each subregion is here assigned the intensity that corresponds to the number of particles which were produced by the particle beam directed onto the site. The first intensities can be presented graphically, as a result of which the surface 8 can be presented graphically.

(35) In a step S4, which follows step S3 that is illustrated in FIG. 2, at least one first beam value for each of the particle beams 3 of the bundle is determined based on those intensities of the first intensities that are assigned to the sites within the subregion onto which the particle beams were directed. By way of example, determining the at least one first beam value for the particle beam which was directed onto the subregion UB.sub.1 is based on those intensities of the first intensities that are assigned to the sites 20 within the subregion UB.sub.1. Determining the at least one first beam value for a particle beam which was directed onto the subregion UB.sub.2 is based on those intensities of the first intensities that are assigned to the sites within the subregion UB.sub.2, and so on.

(36) Determination of the at least one beam value can be effected for example by way of an analysis of the image signals that are measured during the scanning of the subregions UB.sub.1, UB.sub.2 being carried out. In particular, a spatial frequency analysis can be carried out. By way of comparison with the spatial frequencies measured during a calibration measurement with a known sample, it is possible to deduce from the spatial frequencies contained in the image signals in the subregions UB.sub.1, UB.sub.2 the diameter of the particle beam upon incidence on the surface of the object. If the measured spatial frequencies vary in mutually perpendicular directions, it is possible to deduce that the areas of intersection of the particle beams with the surface of the object form ellipses, which can be caused in turn either by a surface of the object being inclined with respect to the particle beams or by an astigmatism of the particle beams. As already mentioned further above, the spatial frequency analysis can be carried out for example by Fourier analysis or autocorrelation analysis of the image signals in the subregions. Alternatively, it is also possible to apply a gradient method to the image signals in the subregions to determine the at least one beam value.

(37) The at least one first beam value of each of the particle beams represents a form (a cross section) of the particle beam on the surface 8. The form (of the cross section) of a particle beam 3 on the surface 8 substantially corresponds to the form of the particle beam spot 6 on the surface 8 that is produced by the particle beam. As is illustrated in FIG. 3 by way of example, a form 21 of the cross section of the particle beams 3 can have an approximately circular form with a diameter A (the forms 21 of the cross sections of the particle beams 3 are illustrated in a plan view of the surface 8 in a direction that is parallel to the optical axis 16). The cross section of the particle beams 3 can be, for example, a cross section in a plane that is orthogonal to the optical axis 16. A distance between the plane of intersection and the surface 8 can be small. Examples of values are 10 nm, 100 nm, 1 m or 10 m. The plane of intersection in which the cross section is situated can intersect in particular with the surface 8.

(38) The value of the diameter A of the form of the cross section of the particle beams 3 on the surface 8 and a size of the particle beam spots 6 on the surface 8 depend both on the configuration of the particle beam 3 and on a distance between the beam focus 5 and the surface 8. For this reason, the form of the cross section of a particle beam, in particular the diameter A of the form, can serve as a measure of the distance between the beam focus 5 and the surface 8, as a result of which this relationship can be used for focusing. Here, the configuration of the particle beam corresponds for example to an angle enclosed between the optical axis 16 and a particle beam 3. This angle is substantially determined by the objective lens 102.

(39) As explained in FIG. 3, a beam value which represents the form 21 of a cross section of a particle beam 3 on the surface 8 of the object 7 can be a diameter A of a circular form. However, the beam value can also be a different parameter which represents the form of a cross section of a particle beam on the surface. For example, the form can be approximated as an ellipse and the beam value can include a length of a long main axis, a length of a short main axis and/or an orientation of the ellipse relative to a reference direction for the purposes of characterization of the form.

(40) The astigmatism of the individual particle beams 3 which can be quantified by characterizing the form in the shape of an ellipse is caused on the one hand by the particle beam generation apparatus and on the other hand by electric fields generated by the object (for example on the basis of charges within the object 7) or magnetic fields generated by the object (for example on the basis of magnetization of the object). The form of the particle beams 3 is changed by these electric or magnetic fields in the region of the surface 8. The beam values can therefore be used as a measure of the charge distribution or distribution of the magnetization within the object 7.

(41) FIGS. 5A to 5C schematically illustrate the relationship between beam values and the object property. The beam values depend on the object property, i.e. if the object property changes, the beam values change as well. The relationship is explained by way of the example of focusing, i.e. the object property is considered to be the spatially resolved height distribution. However, an analogous relationship also exists if the object property represents the spatially resolved charge or field distribution.

(42) FIG. 5A shows a diagram of the forms 21 of a cross section of the particle beams 3 on the surface 8, wherein the objective lens system 100 is set to be underfocused, i.e. the beam foci 5 are situated behind the surface 8 in the direction of the propagation direction of the particle beams 3. The beam values represent the forms 21. In the diagram of FIGS. 5A to 5C, each subregion or each particle beam is assigned a beam value or a form 21, which is indicated by dashed lines.

(43) On account of aberrations which are immanent to the particle beam optics between the beam generation apparatus 300 and the objective lens 102, the primary particle beams 3 can be astigmatically shaped. Each of the astigmatically shaped particle beams 3 has two line foci which are oriented orthogonally relative to one another and to the propagation direction of the particle beams 3 and in the centre of which along the propagation direction the beam focus 5 is situated.

(44) Since FIG. 5A illustrates a situation in which the objective lens system 100 is underfocused, the forms of the cross sections of the particle beams 3 on the surface 8 have an elliptic shape. The form of a cross section of each individual one of the particle beams 3, represented by the at least one beam value, for example the diameter of a circular form, the long and/or short main axis and/or orientation of an ellipse, depends on the object property, in this example the height, i.e. the distance between the surface 8 of the object and the beam focus 5, such that the beam value can serve as a measure of this distance and thus of the object property.

(45) FIGS. 5B and 5C clarify this relationship. FIG. 5B shows the forms 21 of the cross sections of the particle beams 3, wherein the surface 8 is in focus, i.e. the distance between the beam foci 5 and the surface 8 is small. The forms 21 have a circular form. The smaller the form, the better the focusing, and vice versa.

(46) FIG. 5C shows the forms 21 of the cross sections of the particle beams 3, wherein the objective lens system 100 is overfocused, i.e. the beam foci 5 are situated in front of the surface 8 of the object 7 in the direction of the propagation direction of the particle beams 3. The forms 21 are therefore elliptically shaped again.

(47) Compared to FIGS. 5A to 5C, in particular compared to the form 21 of each of the subregions, for example compared to the forms 21 illustrated in subregion UB.sub.1, it is clear that the form is directly related to the distance between the surface 8 and the corresponding beam focus 5.

(48) Based on the beam values of a plurality of different particle beams 3 of the bundle, for example the forms 21 of the subregions UB.sub.1 and UB.sub.25, which were determined using the same value for the operating parameter, it is possible to determine whether the objective lens system 100 is set to be overfocused or underfocused. This is explained by way of example with reference to FIG. 6.

(49) FIG. 6 shows two exemplary particle beams 3.sub.1 and 3.sub.2 of the bundle, which are incident on the surface 8 of the object 7 and there illuminate particle beam spots 6. The beam foci 5.sub.1 and 5.sub.2 of the particle beams 3.sub.1 and 3.sub.2 are spaced apart from one another in a direction parallel to the optical axis 16. The distance between the beam foci 5.sub.1 and 5.sub.2 along the direction parallel to the optical axis 16 is caused for example by the image field curvature of the particle-optical system between the beam generation apparatus 300 and the objective lens 102 (see curved objective plane 101 in FIG. 3). Each of the two particle beams 3.sub.1 and 3.sub.2 in each case generates one particle beam spot 6 on the surface 8, which is nearly identical to the form 21 of the cross section of the particle beam 3.sub.1 or 3.sub.2 on the surface 8 which illuminates the particle beam spot. The particle beam 3.sub.1 has a form 21, which, for the sake of simplified explanation, is circular and has a diameter A.sub.1. The particle beam 3.sub.2 likewise has a circular form 21, but with a greater diameter A.sub.2. The difference with respect to the diameters A.sub.1 and A.sub.2 is due to the different distances of the beam foci 5.sub.1 and 5.sub.2 from the surface 8. Even though it is possible to determine a distance between the beam focus 5.sub.1 and the surface 8 from the diameter A.sub.1, it may not necessarily be possible to determine whether the particle beam 3.sub.1 is overfocused, as in the present case designated by the position I, or whether the particle beam 3.sub.1 is underfocused, as designated by the position II. The positions I and II have the same distance from the beam focus 5.sub.1 of the particle beam 3.sub.1 in a direction parallel to the optical axis 16. With the proviso that the relative location of the beam foci 5.sub.1 and 5.sub.2 is known, it is also possible to determine using the diameter A.sub.2 of the form 21 of the particle beam 3.sub.2 whether the particle beam 3.sub.1 is overfocused or underfocused. It is possible by way of example to deduce from the ratio of diameters A.sub.1 and A.sub.2 whether the particle beam 3.sub.1 is overfocused or underfocused. If the relative location of the beam foci 5.sub.1 and 5.sub.2 is known, as is illustrated in FIG. 6, it is possible by way of example to deduce that the particle beam 3.sub.1 is overfocused if the diameter A.sub.1 is smaller than the diameter A.sub.2. It is possible to deduce in the same manner that the particle beam 3.sub.1 is underfocused if the diameter A.sub.1 is greater than the diameter A.sub.2 (for example if the surface 8 were situated in the position II). In the description of the principle that was just explained, a diameter of the cross section of the particle beams 3 was used for the beam value. As described above, the beam value can also represent a different parameter of the form of the cross section, for example the long and/or short main axis and orientation of an ellipse.

(50) In a step S5, which follows step S4 illustrated in FIG. 2, at least one first value of the object property (height value) is determined based on the first beam values and reference beam values, wherein each of the at least one first height value represents a distance between a site on the surface 8 that is arranged within the first region B.sub.1 and the predetermined plane 15.

(51) FIG. 7 shows a cross section through the object 7 along a spatial dimension x and the surface 8 thereof. The points 23 are an illustration of first values of the object property, in the present example first height values at sites 24, which are arranged within the first region B.sub.1. The height values (values of the object property) 23 represent a distance h between the sites 24 on the surface 8 within the first region B.sub.1 from the predetermined plane 15. It is possible in particular to determine at least one first height value 23 for each of the subregions of the first region B.sub.1 based on the first beam values and possibly using the reference beam values.

(52) As shown in FIG. 2, it is possible in a step S6, which follows step S5, to determine a second value of the operating parameter, for example on the basis of the first values of the object property (first height values) 23. Subsequently, the multi-beam particle microscope 1 can be operated using the second value of the operating parameter. By way of example, a second region B.sub.2 can be scanned and analysed using the second value for the operating parameter. The second region can substantially correspond to the first region B.sub.1 so that the same region can be scanned using an optimized setting with respect to focusing and/or stigmatization and/or correction of higher-order errors.

(53) A further embodiment of the method, in which the second value of the operating parameter is determined for use for a second region B.sub.2, which at most partially overlaps the first region B.sub.1, is described below with reference to FIG. 8. FIG. 4A and FIG. 7 show the first region B.sub.1 and the second region B.sub.2 in plan view or in cross section, wherein the two regions B.sub.1 and B.sub.2 are adjacent to one another. First values of the object property (first height values) 23 of the first region B.sub.1 have already been determined, for example as in the embodiment explained previously. This corresponds to step S10 shown in FIG. 8.

(54) To this end, operating currents or operating voltages are applied to the corresponding particle-optical components, such as the objective lens 102, stigmators or other particle-optical correction elements not shown in FIG. 1, before the second region is scanned or before the region which has already been scanned is scanned again, such that the particle beam system has the second value of the operating parameter.

(55) In a step S11, which follows step S10, first prediction values (first prediction height values) 25 of the second region B.sub.2 are determined based on the first values of the object property (first height values) 23 of the first region B.sub.1 (see FIG. 7). Each of the first prediction height values 25 represents a predicted distance (h) between a prediction site that is arranged within the second region B.sub.2 on the surface 8 and the predetermined plane 15.

(56) Determining prediction values generally and determining prediction height values specifically can be effected, for example, by extrapolation and/or interpolation of already known values of the object property (height values). For extrapolation and/or interpolation, it is possible with preference to use such values of the object property (height values) that are arranged in the proximity of the sites of which the values (height values) are to be predicted. Extrapolation and/or interpolation can be effected in particular using a physical model for the surface of the object or a physical model for the object as a whole. In this example, the object can be described as a clamped plate, as a result of which the surface of the object cannot be deformed in any desired fashion.

(57) As illustrated in FIGS. 9A and 9B, first values of the object property (first height values) of a plurality of different first regions can be used for determining the first prediction values (prediction height values) 25 of the second region B.sub.2. The plurality of first regions can be arranged variably around the second region, as is illustrated in FIGS. 9A and 9B. By way of example, it is possible to use the first values of the object property (first height values) 23 of the region B.sub.1 and the first values of the object property (first height values) 23 of a further first region B.sub.1 for determining the first prediction values (prediction height values) 23. The first regions, in particular for the first regions B.sub.1 and B.sub.1, have in common that the values of the object property (height values) which have been determined for them were determined in each case using an arbitrarily set value of the operating parameter. In particular at the beginning of the analysis of a larger object, merely a simple estimation of the operating parameter is available with which the plurality of first regions are scanned.

(58) FIG. 9A illustrates the determination of the first prediction values (first prediction height values) 25 using extrapolation, which is illustrated by way of arrows. FIG. 9B illustrates the determination of the first prediction values (first prediction height values) 25 using interpolation, which is likewise illustrated by way of arrows.

(59) In a step S12, which follows step S11 shown in FIG. 8, a second value of the operating parameter is determined for the second region B.sub.2 based on the first prediction values (first prediction height values) 25. It is possible in this way to set for example the focusing and/or stigmatization and/or correction of higher-order errors for scanning the second region B.sub.2 in dependence on the prediction values (prediction height values) 25 of the second region B.sub.2.

(60) In a step S13, which follows step S12, the second region B.sub.2 can subsequently be scanned with the bundle of particle beams 3, and second intensities can be detected. In order to scan the second region B.sub.2 with the bundle of particle beams 3, it may be involved for the object to be displaced relative to the optical axis 16, for example by corresponding actuation of the object holder 10 on which the object 7 is placed (see FIG. 1).

(61) Since second intensities are now also available for the second region B.sub.2, just as previously first intensities were available for the first region B.sub.1, the previously described procedure can be carried out again. This is illustrated by way of example in steps S14 to S16 of FIG. 8, which follow step S13.

(62) In step S14, second values of the object property (second height values) 27 of the second region B.sub.2 are determined based on the second beam values, which can be determined from the second intensities as previously explained, and possibly based on the reference beam values.

(63) In a subsequent step S15, second prediction values (second prediction height values) 29 of a third region B.sub.3 are determined based on the second values of the object property (second height values) 27. In addition, is also possible to use first values of the object property (first height values) 23 of the first region B.sub.1 for determining the second prediction values (second prediction height values) 29. This is illustrated schematically in FIG. 9C by way of arrows. The second prediction values (second prediction height values) 29, which represent a predicted distance between a second prediction site on the surface 8, which is arranged within the third region B.sub.3, and the predetermined plane 15, can be determined based on the first values of the object property (first height values) 23 of the first region B.sub.1 and the second values of the object property (second height values) 27 of the second region B.sub.2, wherein the values of the object property (second height values) 27 of the second region B.sub.2 were determined according to the method illustrated in steps S10 to S14. Analogously to the illustrations in FIGS. 9A and 9B, it is also possible to use values of the object property (height values) of a plurality of first regions and/or values of the object property (height values) of a plurality of second regions for determining the second prediction values (second prediction height values) 29. Determination of the second prediction values (second prediction height values) 29 can also be effected via extrapolation and/or interpolation, in particular using the physical model.

(64) A third value of the operating parameter for use for the third region B.sub.3 can be determined based on the second prediction values (second prediction height values) 29 of the third region B.sub.3, as is illustrated in step S16 of FIG. 8.

(65) In specific embodiments of the described method, it is also possible to apply a small offset potential or a small offset current to particle-optical correction elements, which act independently on at least one particle beam, such as stigmators for correcting an image field astigmatism, or lenses for correcting an image field curvature, which offset potential or offset current is selected such that the evaluation sensitivity during the determination of the at least one beam value is increased by the offset potential or the offset current at least for individual particle beams, but at the same time does not significantly negatively influence the cross section of the particle beam on the surface of the object or in the objective plane 101, such that no unacceptable deteriorations of the resolution of the image information that was obtained by scanning the surface of the object with the particle beams arise.