METHOD FOR MEASURING THE OPTICAL QUALITY OF A GIVEN REGION OF A GLAZING UNIT, ASSOCIATED MEASURING DEVICE

Abstract

A method for measuring the optical quality of a given region of a glazing of a road or rail vehicle, the region being intended to be positioned in the optical path of an image-acquiring device, the measuring method being implemented by a measuring device including an emitter and a wavefront analyzer, the measuring method including emitting, with the emitter, a beam of light rays in the direction of the given region, analyzing, with the wavefront analyzer, the wavefront of the light rays transmitted by the given region, including generating a wavefront-error map, and determining, on the basis of the wavefront-error map, at least one optical-defect map, of any optical defects present in the region of the glazing.

Claims

1. A method for measuring an optical quality of a given region of a glazing of a road or rail vehicle, said region being intended to be positioned in an optical path of an image-acquiring device, the measuring method being implemented by a measuring device comprising an emitter and a wavefront analyzer, the measuring method comprising: emitting, with the emitter, a beam of light rays in a direction of said given region, analyzing, with the wavefront analyzer, the wavefront of the light rays transmitted by said given region, the analyzing comprising: of generating a wavefront-error map, determining, on the basis of the wavefront-error map, at least one optical-defect map, of any optical defects present in said region of the glazing.

2. The measuring method as claimed in claim 1, wherein the emitter and the wavefront analyzer are placed on either side of the glazing or the measuring device comprises a plane mirror placed on one side of the glazing and the emitter and wavefront analyzer are placed on the other side of the glazing, the analyzing comprising: computing a phase difference between the wavefront of the light rays transmitted by said given region of the glazing and a reference wavefront, with a view to determining a final wavefront error used to generate the wavefront-error map.

3. The measuring method as claimed in claim 2, further comprising: generating a wavefront-slope map, and on the basis of said wavefront-slope map, said computing a phase difference between the wavefront of the light rays transmitted by said given region of the glazing and a reference wavefront, with a view to determining a final wavefront error used to generate the wavefront-error map.

4. The measuring method as claimed in claim 1, wherein the measuring device comprises a plane mirror placed on one side of the glazing and wherein the emitter and the wavefront analyzer are placed on the other side of the glazing, the measuring method comprising returning said light beam.

5. The measuring method as claimed in claim 1, wherein the measuring device comprises a plane mirror placed on one side of the glazing and wherein the emitter and the wavefront analyzer are placed on the other side of the glazing, the analyzing comprising: computing a phase difference between the wavefront of the light rays transmitted by said given region of the glazing and a reference wavefront, with a view to determining an intermediate wavefront error, dividing the intermediate wavefront error by two, with a view to determining a final wavefront error used to generate the wavefront-error map.

6. The measuring method as claimed in claim 1, wherein the analyzing comprises: a sub step of dividing the beam of light rays into four beams, a sub step of generating an interferogram map, and on the basis of the interferogram map, computing a phase difference between the wavefront of the light rays transmitted by said given region of the glazing and a reference wavefront, with a view to determining a final wavefront error used to generate the wavefront-error map.

7. The measuring method as claimed in claim 1, wherein said optical-defect map is chosen from at least one of the maps in the following list: an optical-aberration map, a slope map, an optical-power map, a map of point spread function a map of modulation transfer function, a vertical-distortion map, a horizontal-distortion map.

8. The measuring method as claimed in claim 1, wherein the analyzing comprises: selecting a useful region in the generated wavefront-error map, decomposing said useful region by image processing into a plurality of optical-aberration maps.

9. The measuring method as claimed in claim 8, wherein at least one of the optical-aberration maps of the plurality of optical-aberration maps is chosen from the following list: a focus-error map, a map of astigmatism oriented at 0°, a map of astigmatism oriented at 45°, a map of X-wise coma, a map of Y-wise coma, a spherical-aberration map.

10. The measuring method as claimed in claim 8, wherein the analyzing step comprises: comparing wavefront-error amplitudes of the plurality of optical-aberration maps, and identifying at least one optical aberration having a wavefront-error amplitude higher than the wavefront-error amplitude of the other optical aberrations.

11. The measuring method as claimed in claim 1, further comprising storing said optical-defect map in a data storage device.

12. A device for measuring the optical quality of at least one given region of a glazing able to implement the measuring method as claimed in claim 1, comprising: an emitter configured to emit a beam of light rays in the direction of said given region, and a wavefront analyzer configured to analyze the wavefront of the light rays transmitted by said given region.

13. The measuring device as claimed in claim 12, wherein the wavefront analyzer comprises a system based on four-wave interferometry.

14. The measuring device as claimed in claim 12, wherein the wavefront analyzer comprises a diffractive grid spaced apart from a wavefront sensor.

15. The measuring device as claimed in claim 12, comprising a plane mirror configured to be placed on one side of the glazing and wherein the emitter and the wavefront analyzer are configured to be placed on the other side of the glazing.

16. A non-transitory data storage device, comprising at least one optical-defect map associated with a region of the glazing.

17. The non-transitory data storage device as claimed in claim 16, wherein said optical-defect map is chosen from at least one of the maps in the following list: an optical-aberration map, a slope map an optical-power map a map of point spread function a map of modulation transfer function, a horizontal-distortion map, a vertical-distortion map.

18. The non-transitory data storage device as claimed in claim 17, wherein the non-transitory data storage device is a data matrix or of a barcode that refers to a database.

19. A glazing for a road or rail vehicle comprising the non-transitory data storage device as claimed in claim 16.

20. The glazing as claimed in claim 19, wherein the non-transitory data storage device is on said glazing.

21. The glazing as claimed in claim 19, comprising a sheet of transparent material and an opaque element partially covering the sheet so as to delineate a given region of the sheet.

22. The glazing as claimed in claim 21, wherein the opaque element is formed by a layer of enamel on a sheet of glass of the glazing and/or a layer on a lamination interlayer.

23. The glazing as claimed in claim 19, wherein the glazing is a windshield of a road vehicle.

24. A vehicle comprising the glazing as claimed in claim 19 and, in a passenger compartment, an image-acquiring device positioned to receive light radiation passing through the glazing through a region of the image-acquiring device.

25. The vehicle comprising the glazing as claimed in claim 24, further comprising a lens for compensating for wavefront error, placed between the image-acquiring device and the region of the image-acquiring device.

Description

BRIEF DESCRIPTION OF THE FIGURES

[0114] The figures are given by way of indication and do not in any way limit the invention.

[0115] FIG. 1 is a schematic representation of a road-vehicle windshield comprising a given region delineated by an opaque element.

[0116] FIG. 2 is a schematic representation of an image-acquiring device placed behind the windshield of FIG. 1, so that the given region is in the optical path of the image-acquiring device.

[0117] FIG. 3 is a schematic representation of a measuring device according to one embodiment of the invention, which allows the optical quality of the given region of the windshield of FIG. 1 to be measured.

[0118] FIG. 3′ is a schematic representation of the wavefront analyzer with a system based on four-wave interferometry

[0119] FIG. 4 is a schematic representation in the form of a block diagram illustrating steps of a measuring method according to one embodiment of the invention, allowing the optical quality of the given region to be measured, by means of the measuring device of FIG. 3.

[0120] FIG. 5a is a schematic representation illustrating the wavefront error introduced by the glazing.

[0121] FIG. 5b is a schematic representation of the wavefront-error map generated by the wavefront analyzer of the measuring device of FIG. 3.

[0122] FIG. 6 shows a map illustrating the useful region (seen by the camera) selected in the wavefront-error map shown in FIG. 5b.

[0123] FIG. 7a shows a focus-error map generated by the wavefront analyzer of the measuring device of FIG. 3

[0124] FIG. 7b shows a map of 0° astigmatism, generated by the wavefront analyzer of the measuring device of FIG. 3

[0125] FIG. 7c shows a map of 45° astigmatism, generated by the wavefront analyzer of the measuring device of FIG. 3

[0126] FIG. 7d shows a map of X-wise coma, generated by the wavefront analyzer of the measuring device of FIG. 3

[0127] FIG. 7e shows a map of Y-wise coma, generated by the wavefront analyzer of the measuring device of FIG. 3

[0128] FIG. 7f shows a spherical-aberration map generated by the wavefront analyzer of the measuring device of FIG. 3

[0129] FIG. 8 shows a vertical-distortion map generated by the wavefront analyzer of the measuring device of FIG. 3.

[0130] FIG. 9 shows a horizontal-distortion map generated by the wavefront analyzer of the measuring device of FIG. 3.

[0131] Unless otherwise specified, a given element that appears in various figures has been designated with a single reference.

DETAILED DESCRIPTION

[0132] The figures are given by way of indication and do not in any way limit the invention.

[0133] The invention relates to a method and to a device for measuring the optical quality of a glazing. By “glazing”, what is meant is a plate formed from a transparent material such as glass or indeed plastic. Advantageously, the glazing may be a windshield, a back window or even side windows of a road or rail vehicle.

[0134] In the rest of the description, it will be assumed that the glazing is a road-vehicle windshield.

[0135] FIG. 1 illustrates an example of a road-vehicle windshield.

[0136] With reference to FIG. 1, the windshield 10 comprises a sheet 11 of glass 11 and an opaque element 12. The opaque element 12 in particular allows elements arranged inside the vehicle, for example a portion of an image-acquiring device, to be hidden from outside said vehicle. The opaque element 12 covers at least one of the main faces of the sheet 11 of glass in such a way as to border the entire windshield 10. The opaque element 12 may be placed on the surface of only one of the two main faces of the glass sheet 11 or may comprise several segments, each of the segments being placed on either of the main faces of the glass sheet 11. In the case of multiple glazing comprising a plurality of glass sheets, such as laminated glazing, the opaque element 12 may also be formed from a plurality of segments, each segment being placed on the surface of two or more glass sheets, depending on the number of segments. Moreover, the glass sheet 11 may be inclined for example by an angle of 30°. In addition, the glass sheet 11 may be curved along one or two axes, the radius of curvature for example being between 6 m and 30 m.

[0137] Preferably, the opaque element 12 is a layer of enamel deposited on the surface of the sheet 11. Naturally, the enamel layer may be replaced by any other opaque element that allows certain elements placed inside the road vehicle to be hidden from outside. The opaque element may also be a layer on the lamination interlayer or else an opaque insert attached to the lamination interlayer.

[0138] Moreover, as may be seen in FIG. 1, the opaque element 12 delineates a given region 13 of the glass sheet 11 located on the upper border of the windshield 10. The given region 13 is intended to be placed on the optical path of an image-acquiring device, such as a camera of an advanced driver-assistance system. Preferably, the area of the given region 13 is smaller than 0.5 m.sup.2.

[0139] FIG. 2 shows an image-acquiring device placed behind the windshield 10 shown in FIG. 1.

[0140] As may be seen in FIG. 2, the image-acquiring device 20 is placed behind the windshield 10 so that the given region 13 is placed on the optical path of the image-acquiring device 20, for example using a suitable holder (not illustrated).

[0141] Advantageously, the image-acquiring device 20 is a high-resolution digital camera suitable for operating in the visible, i.e. at wavelengths comprised between 390 nm and 750 nm.

[0142] Advantageously, a measuring device 40 is used to determine the optical quality of that given region 13 of the windshield 10 which is in the field of view of the image-acquiring device 20.

[0143] FIG. 3 is a schematic representation of the measuring device 40 according to one embodiment of the invention.

[0144] With reference to FIG. 3, the measuring device 40 comprises an emitter 41 and a plane mirror 42 that is preferably circular (and preferably at least 100 mm in diameter). The windshield 10 is positioned between the emitter 41 (for example on the external face of the windshield) and the plane mirror 42 (for example on the internal face of the windshield), for example at a distance comprised between 200 mm and 250 mm from the emitter 41 and at a distance comprised between 250 mm and 300 mm from the plane mirror 42.

[0145] The emitter 41 is configured to emit a beam of light rays through the given region 13 of the windshield 10. To do this, the emitter 41 comprises a light source and a collimator that is placed after the light source in order to obtain a beam of, for example parallel, light rays. Advantageously, the light source of the emitter 41 is monochromatic. In addition, the light source of the emitter 41 is suitable for emitting in the visible, i.e. at wavelengths comprised between 400 nm and 700 nm, preferably between 640 nm and 660 nm. Advantageously, the size of the beam allows the entire given region 13 of the windshield 10 to be covered while guaranteeing a sufficient resolution and a flux that allows information to be obtained on the whole of the given region 13 (which is called the camera region). Preferably, the size of the beam covers a region larger than the given region 13. Thus, the circular beam here has, for example, a width larger than or equal to 100 mm, for example 130 mm here.

[0146] In addition, the measuring device 40 also comprises a wavefront analyzer, also called an aberrometer, that allows the shape of the wavefront of the beam emitted by the emitter 41 to be measured and the deformation undergone by the wavefront as it passed through the given region 13 to be determined. It will be recalled that a wavefront is the three-dimensional wave surface defined such that each light ray coming from a given light source is orthogonal to it. The wavefront analyzer measures the shape of this wave surface.

[0147] Advantageously, the wavefront analyzer is composed of a system that is based on four-wave (lateral shift) interferometry. One such system is known by the trade name “Phasics SID4-HR”.

[0148] As shown in FIG. 3′, this system comprises a modified Hartmann mask, in particular a diffractive grid 5 comprising a grid 51 (checkerboard, etc.) contiguous to a diffractive optic 52 through which the, preferably circular, return beam 30 (reference beam, without windshield, then measurement beam with insertion of the windshield between mirror and analyzer) propagates, causing its replication in four beams 31 to 34. The diffractive grid 50 (which replaces the camera lens) is spaced apart from the (wavefront) sensor 6 of the camera preferably by at most 9 mm. The system generates an interferogram, which is captured by the sensor 6 of the camera and which is distorted by the wavefront gradients, which are retrieved via a Fourier analysis. Insofar as the recorded interferogram is predominantly sinusoidal, a small number of pixels is required to retrieve a phase pixel. This results in an resolution that is increased (better sampling of the wavefront, allowing a greater local deformation to be measured without smoothing), at least by a factor of 4, with respect to other wavefront analyzers using the so-called Hartmann or Shack-Hartmann technique and matrix arrays of microlenses. The system according to the invention also allows a better measurement dynamic range to be achieved.

[0149] Furthermore, the plane mirror 42 is placed behind the windshield 10 in order to reflect the beam transmitted by the windshield 10. Advantageously, the, in particular circular, plane mirror 42, which is for example silver-based, is calibrated so as to represent a perfect plane, characteristic of good optical quality, i.e. to have a low deformation and a low surface roughness.

[0150] In one alternative embodiment (not illustrated), the measuring device 40 does not comprise a plane mirror 42. In this case, the emitter 41 is placed on one side of the windshield 10 while the wavefront analyzer is placed on the other side of the windshield 10.

[0151] FIG. 4 is a schematic block diagram illustrating steps of the method 100 for measuring, according to one embodiment of the invention, the optical quality of the given region 13 of the windshield 10 by means of the measuring device 40 described with reference to FIG. 3.

[0152] In an emitting step 101, a beam of, preferably parallel, light rays is emitted by the emitter 41 in the direction of the given region 13 of the windshield 10. The beam then passes through the given region 13 before reaching the plane mirror 42, which reflects the beam toward the glazing 10. The beam then passes through the given region 13 of the glazing 10 a second time before reaching the wavefront analyzer.

[0153] In an analyzing step 102, the beam received by the wavefront analyzer is analyzed by its microprocessor. The wavefront-analyzing step 102 comprises a number of sub-steps.

[0154] Thus, in a computing sub-step 1021 the phase difference between the wavefront of the reflected beam and a reference wavefront is computed, with a view to determining an intermediate wavefront error. Advantageously, the reference wavefront is a plane wavefront. FIG. 5a illustrates the difference in shape between a reference wavefront FR and a measured wavefront FM, which corresponds to the wavefront error EF.

[0155] In a dividing sub-step 1022, the wavefront error is divided by two to obtain the final wavefront error. Specifically, insofar as the beam passes twice through the windshield 10, a first time on emission of the beam by the emitter 41 and a second time on reflection of the beam by the plane mirror 42, the intermediate wavefront error determined in sub-step 1021 corresponds to the wavefront error resulting from the two passages of the beam through the given region 13 of the windshield 10. Thus, sub-step 1022 allows the final wavefront error corresponding to a single passage of the beam through the given region 13 to be determined. Naturally, the dividing sub-step 1022 is not carried out when the measuring device 40 does not comprise a plane mirror 42 and when the emitter 41 and the wavefront analyzer are placed on either side of the windshield 10. Specifically, in this case, the wavefront error computed in the computing sub-step 1021 corresponds to the final wavefront error relating to a single passage of the beam through the given region 13.

[0156] In a generating sub-step 1023, a wavefront-error map is generated on the basis of the final wavefront error. The wavefront-error map maps, for example at points spaced 490 μm apart (width of a phase pixel), the deviation of the wavefront transmitted through the given region 13 with respect to the reference wavefront. FIG. 5b illustrates an example of a wavefront-error map CEC generated at the end of sub-step 1023. This wavefront error map is an image: a matrix array of phase pixels, each of 490 μm; a two-dimensional matrix array corresponding to the projection of the camera region 13 of the glazing 10 onto the wavefront analyzer. This projection is trapezoidal in shape with a lower base of 60 mm width, an upper base of 52 mm width and a height of 17 mm. On this wavefront-error map, the abscissa L.sub.Y represents the number of pixels along the Y-axis, i.e. the horizontal axis, the left ordinate L.sub.X represents the number of pixels along the X-axis, i.e. the vertical axis, and the right ordinate represents the wavefront error EF expressed in microns.

[0157] In a selecting sub-step 1024, a useful region 14 (shown in FIG. 5b) is selected in the generated wavefront-error map CEC. Advantageously, the useful region 14 is a circular region of predetermined size corresponding to the region of the glazing 10 actually seen by the image-acquiring device 20. The circular region has for example a diameter larger than or equal to 4 mm, preferably of at most 20 mm, when the camera is very close to the glazing. A map illustrating the useful region CAO0 generated at the end of the selecting sub-step 1024 is illustrated in FIG. 6.

[0158] In a decomposing sub-step 1025, the useful region 14 is decomposed into polynomials, preferably Zernike polynomials, by image processing. Zernike polynomials are a set of polynomial mathematical functions that are particularly suitable for the description of circular regions and which allow complex surfaces to be decomposed into an infinite sum of elementary surfaces that each correspond to one particular degree and type of optical aberration. This decomposition of the useful zone 14 allows a plurality of optical-aberration maps to be generated.

[0159] In a determining sub-step 1026, a plurality of optical-aberration maps, of optical aberrations that are preferably of a degree higher than or equal to 2, and that are present in the given region 13 of the glazing 100, is determined at the end of the decomposing sub-step 1025.

[0160] FIGS. 7a, 7b, 7c, 7d, 7e and 7f illustrate, in black and white and in color, examples of optical-aberration maps that may be obtained at the end of the decomposing sub-step 1025. In these optical-aberration maps, the abscissa L.sub.Y represents the number of pixels along the Y-axis, i.e. the horizontal axis, the left ordinate L.sub.X represents the number of pixels along the X-axis, i.e. the vertical axis, and the right ordinate represents the wavefront error, expressed in microns, for the optical aberration in question.

[0161] As may be seen in FIG. 7a, it is possible to obtain a first map CAO1, CAO1′ illustrating an aberration of degree 2: a focus error (also called “defocus”). The first map CAO1, CAO1′ is an alternation of rings. In the first map CAO1, CAO1′, the wavefront-error amplitude of the optical aberration is higher at the edge, but the inverse is possible.

[0162] Furthermore, it is also possible to obtain a second map CAO2, CAO2′ (shown in FIG. 7b) and/or a third map CAO3, CAO3′ (shown in FIG. 7c) illustrating an aberration of degree 2: a 0° astigmatism and a 45° astigmatism, respectively. It will be recalled that astigmatism is related to a defect in glass curvature that is oriented in a direction. 0° means a difference in curvature in the x- and y-directions, this implying a different focus in these two directions. 45° astigmatism means a difference in curvature between the directions oriented at +45° and −45°.

[0163] It is also possible to obtain a fourth map CAO4, CAO4′ (shown in FIG. 7d) and/or a fifth map CAO5, CAO5′ (shown in FIG. 7e) illustrating an aberration of degree 3: an X-wise coma (X-wise indicating a lateral off-centeredness oriented in the X-direction) and a Y-wise coma (Y-wise indicating a lateral off-centeredness in the Y-direction).

[0164] Finally, it is possible to obtain a sixth map CAO6, CAO6′ (shown in FIG. 7f) illustrating an aberration of degree 4: a spherical aberration. The sixth map CAO6, CAO6′ is an alternation of rings. In the sixth map CAO6, CAO6′, the wavefront-error amplitude of the optical aberration is higher at the edge, but the inverse is possible.

[0165] In a comparing sub-step 1027, the amplitudes of the plurality of optical aberrations illustrated in the optical-aberration maps are compared with one another. It will be noted that the higher the wavefront-error amplitude of the optical aberration, the more said optical aberration is dominant and must be corrected.

[0166] In an identifying sub-step 1028, at least one optical aberration among the plurality of optical aberrations is identified as having a wavefront-error amplitude higher than the amplitude of the other optical aberrations. In the case of the given region 13 of the glazing 10, it is the focus error illustrated in the maps CAO1, CAO1′ and the 0° astigmatism illustrated in the maps CAO2, CAO2′ that have the highest wavefront-error amplitudes.

[0167] In an establishing step 103, said optical-aberration map established in sub-step 1025 is stored in a data storage device. Advantageously, the storing step 103 may include recording certain items of information relating to the windshield 10, for example its composition, its date of manufacture, etc. Preferably, the data storage device takes the form of a data matrix. The data storage device may also take the form of a bar code, for example a flash code, a “TAGs” or a QR code, that refers to a database. Naturally, the data storage device may take another form, for example a hard disk, a storage server, an electronic memory, etc.

[0168] In a step 104, the data storage device is encrypted. The encrypting step 104 may be performed using any known suitable encryption algorithm. A specific reader will then be able to be used to unlock the data storage device and access at least some of the data that it contains.

[0169] In a step 105, the data storage device is positioned or even printed on the windshield 10. The printing step 105 is for example carried out by etching and/or by inkjet printing.

[0170] By virtue of the optical-aberration maps obtained using the measuring method 100 according to the invention, it is possible to discriminate between the various forms of aberrations present in a given region 13 scanned by the field of view of an image-acquiring device 20 placed behind the glazing 10 of the road vehicle.

[0171] Naturally, the invention is not limited to the various embodiments that have been described, and variant embodiments are possible.

[0172] Thus, alternatively to or preferably cumulatively with the optical-aberration maps, it is possible, by virtue of the measuring method 100 according to the invention, to generate other maps allowing the optical quality of the given region 13 of the glazing 10 to be characterized. For example, it could be a question of a wavefront-slope map that corresponds to the first derivative of the wavefront-error map CEC, of an optical-power map that corresponds to the second derivative of the wavefront-error map CEC, of a map of the point spread function by computing the modulus squared of the Fourier transform of the generalized pupil function or even a map of the modulation transfer function by taking the modulus of the Fourier transform of the point spread function. The wavefront-slope map may alternatively be used to generate the wavefront-error map

[0173] Moreover, again alternately to or preferably cumulatively with the optical-aberration maps, it is possible to obtain a vertical-distortion map or even a horizontal-distortion map. Thus, FIG. 8 illustrates an example of a vertical-distortion map in black and white CDV and in color CDV′, while FIG. 9 illustrates an example of a horizontal-distortion map in black and white CDH and in color CDH′. In these distortion maps, the abscissa represents the number of pixels along the Y-axis, i.e. the horizontal axis, the left ordinate represents the number of pixels along the X-axis, i.e. the vertical axis, and the right ordinate represents the distortion Ds expressed in millidiopters.

[0174] It will be noted that the generalized pupil function P of the exit pupil may be determined from the wavefront-error map CEC using the following equation:

[00001]$\begin{array}{cc}P=e^{-i\frac{2\pi }{\lambda }\mathrm{EF}}& \left[\mathrm{Math}.1\right]\end{array}$

[0175] It will also be noted that the point spread function and the modulation transfer function may easily be deduced from the above equation by applying a discrete Fourier transform to the generalized pupil function P of the exit pupil, according to the following equations:

FEP=∥TFD(P)∥.sup.2   [Math. 2]

FTM=∥TFD(FEP)∥  [Math. 3]