Overheat protection circuit, and semiconductor integrated circuit device and vehicle therewith
10366977 ยท 2019-07-30
Assignee
Inventors
Cpc classification
International classification
H01L27/02
ELECTRICITY
H01L29/06
ELECTRICITY
H02H7/00
ELECTRICITY
Abstract
An overheat protection circuit has an NPN transistor, a power terminal to which a supply voltage is applied, a transmission path by which the supply voltage is transmitted from the power terminal to the collector of the NPN transistor without passing through a current source, and an output voltage generator that generates an output voltage commensurate with the base-emitter voltage of the NPN transistor.
Claims
1. An overheat protection circuit, comprising: a NPN transistor; a power terminal to which a supply voltage is applied; a transmission path by which the supply voltage is transmitted from the power terminal to a collector of the NPN transistor without passing through a current source; a voltage divider operable to divide a reference voltage in a voltage division ratio to generate a division voltage, the voltage divider including a switch operable to change the voltage division ratio; and a comparator operable to compare an emitter voltage of the NPN transistor with the division voltage to switch an output voltage from a normal state to an overheated state, and vice versa, wherein the switch is operable to be turned on/off in response to the switching of the output voltage between the normal state and the overheated state to change the division voltage.
2. The overheat protection circuit of claim 1, further comprising: the current source that is connected to the emitter of the NPN transistor.
3. The overheat protection circuit of claim 1, wherein the reference voltage is applied to a base of the NPN transistor.
4. A semiconductor integrated circuit device, comprising: a power device; and the overheat protection circuit of claim 1.
5. The semiconductor integrated circuit device of claim 4, wherein the NPN transistor and the power device are formed on a single semiconductor substrate.
6. The semiconductor integrated circuit device of claim 5, wherein the NPN transistor and the power device are arranged next to each other.
7. The semiconductor integrated circuit device of claim 6, wherein a guard ring region that surrounds the power device is formed on the semiconductor substrate.
8. A semiconductor integrated circuit device comprising: a power device; and an overheat protection circuit including: a NPN transistor; a power terminal to which a supply voltage is applied; a transmission path by which the supply voltage is transmitted from the power terminal to a collector of the NPN transistor without passing through a current source; and an output voltage generator operable to generate an output voltage commensurate with a base-emitter voltage of the NPN transistor, wherein the power device is a MOS transistor, the semiconductor integrated circuit device further comprises: a controller operable to generate an ON/OFF control signal for the MOS transistor; and a pre-driver operable to generate a gate voltage for the MOS transistor in response to the ON/OFF control signal, and the overheat protection circuit is arranged between, at one end, the MOS transistor and, at another end, the controller and the pre-driver.
9. The semiconductor integrated circuit device of claim 4, wherein the supply voltage is supplied to the semiconductor integrated circuit device from outside the semiconductor integrated circuit device, and the reference voltage is generated within the semiconductor integrated circuit device.
10. A vehicle comprising: the semiconductor integrated circuit device of claim 4.
11. A semiconductor integrated circuit device, comprising: an overheat protection circuit including: a NPN transistor; a power terminal to which a supply voltage is applied; a transmission path by which the supply voltage is transmitted from the power terminal to a collector of the NPN transistor without passing through a current source; and an output voltage generator operable to generate an output voltage commensurate with a base-emitter voltage of the NPN transistor; a power device; a controller operable to generate an ON/OFF control signal for the power device; and a pre-driver operable to generate a gate voltage for the power device in response to the ON/OFF control signal, wherein the power device and the controller is arranged in a first direction, and the overheat protection circuit is arranged between, at one end, the power device and, at another end, the controller and the pre-driver as viewed in a second direction perpendicular to the first direction.
Description
BRIEF DESCRIPTION OF THE DRAWINGS
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DETAILED DESCRIPTION OF PREFERRED EMBODIMENTS
(12) Overheat Protection Circuit:
(13)
(14) A supply voltage V.sub.DD is applied to the power terminal 1. The supply voltage V.sub.DD is a voltage that is supplied from outside a semiconductor integrated circuit device that includes the overheat protection circuit shown in
(15) A reference voltage V.sub.REF is applied to the reference voltage terminal 2. The reference voltage V.sub.REF is a voltage that has a flat temperature response, and can be, for example, a band gap reference voltage generated by a band gap reference voltage source provided within the semiconductor integrated circuit device that includes the overheat protection circuit shown in
(16) The power terminal 1 is connected to a collector of the NPN transistor Q1, to a power terminal of the operational amplifier 3, and to a power terminal of the buffer 4. Ground terminals of the operational amplifier 3 and of the buffer 4 are held at a ground potential. The operational amplifier 3 and the buffer 4 each operate by using, as its driving voltage, the difference between the supply voltage V.sub.DD and the ground potential.
(17) The reference voltage terminal 2 is connected to a base of the NPN transistor Q1 and to one end of the resistor R1. Another end of the resistor R1 is connected to one end of the resistor R2, another end of the resistor R2 is connected to one end of the resistor R3, and another end of the resistor R3 is held at the ground potential. To a connection node between the resistors R1 and R2, an inverting input terminal of the operational amplifier 3 is connected. With the resistor R3, the MOS transistor Q2 is connected in parallel.
(18) An emitter of the NPN transistor Q1 is connected to one end of the resistor R4, and another end of the resistor R4 is held at the ground potential. Thus, the resistor R4 serves as a current source for the NPN transistor Q1. To a connection node between the NPN transistor Q1 and the resistor R4, a non-inverting input terminal of the operational amplifier 3 is connected.
(19) An output terminal of the operational amplifier 3 is connected to an input terminal of the buffer 4, and an output terminal of the buffer 4 is connected to the output terminal 5 and to a gate of the MOS transistor Q2.
(20) The operation of the overheat protection circuit configured as described above will now be described with reference to
(21) The base-emitter voltage V.sub.BE of the NPN transistor Q1 has a positive temperature response. Thus, the higher the ambient temperature Ta, the higher the collector current of the NPN transistor Q1, and accordingly the higher the voltage that is applied to the non-inverting input terminal of the operational amplifier 3.
(22) A voltage division circuit composed of the resistors R1 to R3 and the MOS transistor Q2 generates a division voltage V.sub.DIV of the reference voltage V.sub.REF. The division voltage V.sub.DIV generated by the voltage division circuit is applied to the inverting input terminal of the operational amplifier 3. When the MOS transistor Q2 is ON, the division voltage V.sub.DIV is generated in a voltage division ratio that depends on the ratio of the resistance value of the resistor R1 to that of the resistor R2. On the other hand, when the MOS transistor Q2 is OFF, the division voltage V.sub.DIV is generated in a voltage division ratio that depends on the ratio of the resistance value of the resistor R1 to the composite resistance value of the resistors R2 and R3. Thus, the division voltage V.sub.DIV has a higher value when the MOS transistor Q2 is OFF than when the MOS transistor Q2 is ON.
(23) In this embodiment, the circuit constants of the NPN transistor Q1 and the resistors R1 to R4 are so set that, when the MOS transistor Q2 is OFF and in addition the ambient temperature Ta around the overheat protection circuit equals T2 (e.g., 175 C.), the voltage applied to the non-inverting input terminal of the operational amplifier 3 and the voltage (division voltage V.sub.DIV) applied to the inverting input terminal of the operational amplifier 3 are equal and, when the MOS transistor Q2 is ON and in addition the ambient temperature Ta around the overheat protection circuit equals T1 (e.g., 150 C.) lower than T2, the voltage applied to the non-inverting input terminal of the operational amplifier 3 and the voltage (division voltage V.sub.DIV) applied to the inverting input terminal of the operational amplifier 3 are equal.
(24) The operational amplifier 3 outputs via its output terminal a high-level voltage when the voltage applied to its non-inverting input terminal is equal to or higher than the voltage applied to its inverting input terminal, and outputs via its output terminal a low-level voltage when the voltage applied to its non-inverting input terminal is lower than the voltage applied to its inverting input terminal.
(25) The buffer 4 receives an output voltage of the operational amplifier 3, and outputs a voltage V.sub.TSD, which holds the logic level of the output voltage of the operational amplifier 3, to the output terminal 5 and the gate of the MOS transistor Q2. The MOS transistor Q2 is OFF when the voltage V.sub.TSD is at low level, and is ON when the voltage V.sub.TSD is at high level.
(26) Accordingly, if the ambient temperature Ta around the overheat protection circuit rises above T2, at the time point that the ambient temperature Ta around the overheat protection circuit reaches T2, the voltage V.sub.TSD turns from low level to high level. After the voltage V.sub.TSD turns to high level, unless the ambient temperature Ta around the overheat protection circuit falls below T1, the voltage V.sub.TSD remains at high level. When the ambient temperature Ta around the overheat protection circuit falls below T1, the voltage V.sub.TSD turns from high level to low level.
(27) As a result, as shown in
(28) In the overheat protection circuit shown in
(29) However, the current capacity of the power source that generates the supply voltage V.sub.DD for the semiconductor integrated circuit device is far higher than the current capacity of resistors R5 and R6 that function as a current source for the NPN transistor Q1 in the common overheat protection circuit shown in
(30) In this way, it is possible to prevent erroneous detection of an overheated state despite in a normal state when a negative current is applied to the output terminal of the monitoring-target power device. Moreover, the overheat protection circuit shown in
(31) Semiconductor Integrated Circuit Device:
(32) To confirm the effect mentioned above, measurement was performed with a semiconductor integrated circuit device shown in
(33) In the semiconductor integrated circuit device shown in
(34)
(35)
(36) As shown in
(37) Semiconductor Chip Circuit Layout:
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(39) In a peripheral part of the semiconductor chip 20, channel-1 to channel-8 output pads 21_1 to 21_8 are formed. The channel-n output pad 21_n (where n is a natural number from 1 to 8) is connected to the channel-n output pin 13_n (where n is a natural number from 1 to 8) shown in
(40) Between the channel-n output pad 21_n (where n is a natural number from 1 to 8) and the channel-n overheat protection circuit 14.sub. n (where n is a natural number from 1 to 8), the channel-n power MOS transistor 12_n (where n is a natural number from 1 to 8) is arranged. The channel-1 to channel-8 power MOS transistors 12_1 to 12_8 are each surrounded by a guard ring region 22.
(41) With respect to the channel-n overheat protection circuit 14_n (where n is a natural number from 1 to 8), the channel-n overcurrent protection circuit 23_n (where n is a natural number from 1 to 8) is arranged on the opposite side from the channel-n power MOS transistor 12_n (where n is a natural number from 1 to 8). Likewise, with respect to the channel-n overheat protection circuit 14_n (where n is a natural number from 1 to 8), the controller 10, which is not shown in
(42) In the circuit layout described above, the temperature-detection NPN transistor Q1 provided in the overheat protection circuit can be arranged near the power MOS transistor that acts as a heat source. It is thus possible to detect more accurately whether or not the power MOS transistor that acts as a heat source is in a normal state or in an overheated state.
(43) However, the closer the overheat protection circuit is arranged to the power MOS transistor that acts as a heat source, the higher the h parameter fife of the parasitic transistor P1 that is formed between the temperature-detection NPN transistor Q1 in the overheat protection circuit and the drain of the power MOS transistor, and thus the more current tends to pass via the parasitic transistor P1.
(44) In this respect, the overheat protection circuit shown in
(45) Moreover, in the circuit layout shown in
(46) Vertical Sectional Structure of a Semiconductor Substrate:
(47)
(48) In the N-type epitaxial growth layer 31, a high-concentration N-type layer is formed as a collector wall 32, and on top of the collector wall 32, a high-density N-type region 33 is formed that serves as the collector of the temperature-detection NPN transistor.
(49) Moreover, in the N-type epitaxial growth layer 31, at a distance from the high-density N-type region 33 in the horizontal direction, a P-type well 34 is formed. In the P-type well 34, there are formed a high-concentration P-type region 35, which serves as the base of the temperature-detection NPN transistor, and a high-density N-type region 36, which serves as the emitter of the temperature-detection NPN transistor.
(50) Also formed in the N-type epitaxial growth layer 31 is a P-type well 37 that serves as a guard ring region. In the P-type well 37, a high-density P-type region 38 is formed, and the high-density P-type region 38 is held at the ground potential.
(51) In a region inside the N-type epitaxial growth layer 31 that is surrounded in a ring shape by the P-type well 37 as seen in a top view, there are formed a high-density N-type region 39, which serves as the drain of the power MOS transistor, and a low-density P-type well 40. In the low-density P-type well 40, there are formed a high-density N-type region 41 and a high-density P-type region 42, which serve as the source of the power MOS transistor.
(52) On top of the N-type epitaxial growth layer 31, between the high-density N-type region 39 and the high-density N-type region 41, a gate oxide film and a gate electrode are formed. Also formed on top of the N-type epitaxial growth layer 31 are an aluminum wiring layer and an insulating layer, which constitute the connection paths shown in
(53) When the voltage V.sub.B shown in
(54) However, as described above, with the overheat protection circuit shown in
(55) Application:
(56) The semiconductor integrated circuit device described above can be suitably used as a low-side switch for driving an inductive load, such as a relay, solenoid, or DC motor, in various ECUs (electronic control units) incorporated in a vehicle X10 as shown in
(57) On the other hand, the overheat protection circuit shown in
(58) Modifications:
(59) Various technical features disclosed herein can be implemented in any manner other than specifically described above, and allow for many modifications within the spirit of the technical ingenuity involved. For example, the logic levels of the output signal from the overheat protection circuit may be inverted. That is, it should be understood that the embodiments disclosed herein are in every aspect illustrative and not restrictive, and that the technical scope of the present invention is defined not by the description of embodiments given above but by the scope of the appended claims and encompasses any modification in the sense and scope equivalent to those of the claims.
(60) Synopsis:
(61) According to one aspect of the present invention, as described above, an overheat protection circuit includes: an NPN transistor; a power terminal to which a supply voltage is applied; a transmission path by which the supply voltage is transmitted from the power terminal to the collector of the NPN transistor without passing through a current source; and an output voltage generator that generates an output voltage commensurate with the base-emitter voltage of the NPN transistor (a first configuration).
(62) In the overheat protection circuit of the first configuration described above, there may be further provided a current source that is connected to the emitter of the NPN transistor (a second configuration).
(63) In the overheat protection circuit of the first or second configuration described above, there may be further provided with a voltage divider that divides a reference voltage, the reference voltage may be applied to the base of the NPN transistor, and the output voltage generator may include a comparator that compares the emitter voltage of the NPN transistor with a division voltage of the reference voltage output from the voltage divider (a third configuration).
(64) According to another aspect of the present invention, as described above, a semiconductor integrated circuit device includes: a power device; and an overheat protection circuit of any one of the first to third configurations described above (a fourth configuration).
(65) In the semiconductor integrated circuit device of the fourth configuration described above, the NPN transistor and the power device may be formed on a single semiconductor substrate (a fifth configuration).
(66) In the semiconductor integrated circuit device of the fifth configuration described above, the NPN transistor and the power device may be arranged next to each other (a sixth configuration).
(67) In the semiconductor integrated circuit device of the sixth configuration described above, a guard ring region that surrounds the power device may be formed on the semiconductor substrate (a seventh configuration).
(68) In the semiconductor integrated circuit device of any one of the fourth to seventh configurations described above, the power device may be a MOS transistor, there may be further provided a controller that generates an ON/OFF control signal for the MOS transistor and a pre-driver that generates a gate voltage for the MOS transistor in response to the ON/OFF control signal, and the overheat protection circuit may be arranged between, at one end, the MOS transistor and, at the other end, the controller and the pre-driver (an eighth configuration).
(69) In the semiconductor integrated circuit device of any one of the fourth to eighth configurations described above, the supply voltage may be supplied to the semiconductor integrated circuit device from outside the semiconductor integrated circuit device, and the reference voltage may be generated within the semiconductor integrated circuit device (a ninth configuration).
(70) According to yet another aspect of the present invention, as described above, a vehicle includes a semiconductor integrated circuit device of any one of the fourth to ninth configurations described above (a tenth configuration).