Non-conductive substrate with tracks formed by sand blasting
10335922 ยท 2019-07-02
Assignee
Inventors
- Girish Phatak (Maharashtra, IN)
- Shrikant Kulkarni (Maharashtra, IN)
- Vijaya Giramkar (Maharashtra, IN)
- Shany Joseph (Maharashtra, IN)
Cpc classification
H05K2203/1126
ELECTRICITY
H05K3/027
ELECTRICITY
B24C1/04
PERFORMING OPERATIONS; TRANSPORTING
B24C11/00
PERFORMING OPERATIONS; TRANSPORTING
International classification
B24C1/04
PERFORMING OPERATIONS; TRANSPORTING
B24C11/00
PERFORMING OPERATIONS; TRANSPORTING
H05K3/02
ELECTRICITY
Abstract
A method for forming track(s) on low temperature co-fired ceramic (LTCC) substrate, the method comprising the steps of, forming a layer of coating material on an operative face of the LTCC substrate, disposing a stencil on the layer of coating material thereby covering a selected portion of the layer of coating material while leaving exposed a portion of the layer of coating material corresponding to the track(s) to be formed and forming an assembly of the LTCC substrate, the layer of coating material and the stencil, eroding the exposed portion of the layer of coating material by propelling an abrasive material using a blasting gun towards the assembly on the face on which the layer of coating material is formed and the stencil is disposed and separating the stencil from the abraded assembly, wherein the abrasive material has a composition that is compatible with that of the LTCC substrate.
Claims
1. A method for forming track(s) on a non-conductive substrate, said method comprising the following steps: forming a layer of coating material on an operative face of said non-conductive substrate; disposing a stencil on said layer of coating material thereby covering a selected portion of said layer of coating material while leaving exposed a portion of said layer of coating material corresponding to a pattern to be formed thereby forming an assembly of said non-conductive substrate, said layer of coating material and said stencil; eroding said exposed portion of said layer of coating material by propelling an abrasive material using a blasting gun towards said assembly on said operative face; and separating said stencil from said abraded assembly; wherein said abrasive material is a mixture of alumina and glass, wherein said glass comprises Bi.sub.2O.sub.3, V.sub.2O.sub.5, P.sub.2O.sub.5 and SiO.sub.2 so that the shrinkage and coefficient of thermal expansion of said mixture of alumina and glass is compatible with that of said non-conductive substrate.
2. The method as claimed in claim 1, wherein said non-conductive substrate is low temperature co-fired ceramic (LTCC).
3. The method as claimed in claim 1, wherein said layer of coating material is selected from a group of conductive materials consisting of silver, copper, gold, aluminum, iron and combinations thereof.
4. The method as claimed in claim 1, wherein said layer of coating material is selected from a group of semi-conductive materials consisting of silicon, germanium and combinations thereof.
5. The method as claimed in claim 1, wherein said layer of coating material is selected from a group of non-conductive materials consisting of dielectric oxides including binary, ternary, quaternary combinations in the form of paste, tapes and/or photoresist, quartz, glass and combinations thereof.
6. The method as claimed in claim 1, wherein said stencil is composed of a material that is resistant to said abrasive material including steel, aluminum, copper, brass, non-conducting polymers, glass-reinforced epoxy laminate sheet, and glass epoxy fiberglass sheets.
7. The method as claimed in claim 1, wherein said non-conductive substrate and said abrasive material has at least one of the following properties: the difference in the thermal expansion coefficient between said non-conductive substrate and said abrasive material is equal to or less than 510.sup.6/ C.; and the difference in the shrinkage between said non-conductive substrate and said abrasive material is equal to or less than 0.5%.
8. The method as claimed in claim 1, wherein said abrasive material has a particle size in the range from 10 m to 50 m; and wherein said layer of coating material has a thickness in the range from 10 m to 30 m.
9. A non-conductive substrate with tracks formed thereon, wherein said tracks are formed by a method comprising the following steps: providing the non-conductive substrate; forming a layer of coating material on an operative face of said non-conductive substrate; disposing a stencil on said layer of coating material thereby covering a selected portion of said layer of coating material while leaving exposed a portion of said layer of coating material corresponding to a pattern to be formed thereby forming an assembly of said non-conductive substrate, said layer of coating material and said stencil; eroding said exposed portion of said layer of coating material by propelling an abrasive material using a blasting gun towards said assembly on said operative face; and separating said stencil from said abraded assembly; wherein said abrasive material a mixture of alumina and glass, wherein said glass comprises Bi.sub.2O.sub.3, V.sub.2O.sub.5, P.sub.2O.sub.5 and SiO.sub.2 so that the shrinkage and coefficient of thermal expansion of said mixture of alumina and glass is compatible with that of said non-conductive substrate.
10. A non-conductive substrate with tracks formed on a coated layer on an operative face of said surface, said tracks being formed by selective erosion of said coated material of said layer.
Description
BRIEF DESCRIPTION OF ACCOMPANYING DRAWINGS
(1) The non-conductive substrate with the tracks formed thereon and the method for forming one or more tracks on a non-conductive substrate will now be described with the help of the accompanying drawings in which:
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DETAILED DESCRIPTION
(9) The non-conductive substrate with the tracks formed thereon and the method for forming one or more tracks on a non-conductive substrate of the present disclosure will now be described with reference to the embodiments, which do not limit the scope and ambit of the disclosure. The description provided is purely by way of example and illustration. The embodiment herein, the various features, and advantageous details thereof are explained with reference to the non-limiting embodiments in the following description. Descriptions of well-known components and processing techniques are omitted so as to not unnecessarily obscure the embodiments herein. The examples used herein are intended merely to facilitate an understanding of ways in which the embodiments herein may be practiced and to further enable those of skill in the art to practice the embodiments herein. Accordingly, the examples should not be construed as limiting the scope of the embodiments herein.
(10) The present disclosure provides a method for forming one or more tracks on a non-conductive substrate that obviates one or more drawbacks of the conventional method. Referring to
(11) In accordance with an embodiment of the present disclosure, the method for forming track(s) on a non-conductive substrate comprises the following steps: providing the non-conductive substrate (101); forming a layer of coating material on an operative face of the non-conductive substrate (102); disposing a stencil on the layer of coating material, thereby covering a selected portion of the layer of coating material while leaving exposed a portion of the layer of coating material corresponding to a pattern to be formed thus forming an assembly of the non-conductive substrate, the layer of coating material and the stencil (103); eroding the exposed portion of the layer of coating material by propelling an abrasive material using a blasting gun towards the assembly on the face on which the layer of coating material is formed and the stencil is disposed (104); and separating the stencil from the abraded assembly to obtain desired tracks on the non-conducting substrate (105); wherein the abrasive material has a composition that has physical and chemical properties that are compatible with that of the non-conductive substrate.
(12) In accordance with another embodiment of the present disclosure, a non-conductive substrate with tracks formed thereon is disclosed, wherein the tracks are formed by sand blasting method. In particular, the present disclosure envisages a non-conductive substrate with tracks formed thereon wherein the tracks are formed by sand blasting method, wherein the method comprises the following steps: providing the non-conductive substrate; forming a layer of coating material on an operative face of the non-conductive substrate; disposing a stencil on the layer of coating material, thereby covering a selected portion of the layer of coating material while leaving exposed a portion of the layer of coating material corresponding to a pattern to be formed thus forming an assembly of the non-conductive substrate, the layer of coating material and the stencil; eroding the exposed portion of the layer of coating material by propelling an abrasive material using a blasting gun towards the assembly on the face on which the layer of coating material is formed and the stencil is disposed; and separating the stencil from the abraded assembly to obtain desired tracks on the non-conducting substrate; wherein the abrasive material has a composition that has physical and chemical properties that are compatible with that of the non-conductive substrate.
(13) In accordance with the present disclosure, after the step of forming the layer of coating material on the operative face of the non-conductive substrate, the layer of coating material is formed by applying the paste and is dried to remove the solvent therefrom.
(14) In particular, in accordance with the present disclosure, at least the shrinkage and the coefficient of thermal expansion of the abrasive material that is used to abrade the layer of coating material formed on the non-conductive substrate are compatible with each other. Typically, the chemical composition of the abrasive material used to abrade the layer of coating material is compatible with that of the non-conductive substrate.
(15) In accordance with the present disclosure, the physical and chemical properties of the non-conductive substrate, the layer of coating material formed thereon, and the abrasive material, used to abrade the layer of coating material, are compatible with each other.
(16) It is observed that the composition of the sand or the abrasive material used to abrade the layer of coating material has a very significant impact on the properties of the non-conductive substrates including the shrinkage and the coefficient of thermal expansion.
(17) More specifically, the abrasive material that is propelled on the material to erode it, does remove the material, but at the same time gets embedded in the non-conductive substrate. This changes the physical and chemical properties of the non-conductive substrate substantially, which is not desired.
(18) In particular, for non-conducting substrates like that of LTCC the change in the physical and chemical properties due to embedding of the abrasive particles may generate strain or stress in the LTCC tape that may fracture or break the LTCC tape or can deform shape the LTCC tape during the step of co-firing. This is attributed to changes in the coefficient of the thermal expansion and shrinkage of the LTCC tape due to infusion or embedding to the abrasive particles during the step of abrading the layer of coating material formed on the non-conducting substrate (LTCC in this case).
(19) The inventors of the present invention envisaged that if the physical and chemical properties of the abrasive material or particles and that of the non-conducting substrate (LTCC) are compatible with each other, that is, if the physical and chemical properties of the abrasive material are chosen such that even on embedding of the abrasive material in the LTCC substrate the physical and chemical properties of the LTCC substrate are not changed substantially, the problem of strain or stress generation in the LTCC tape that may fracture or break the LTCC tape or that of deformation in shape of the LTCC tape during the step of co-firing may be averted.
(20) More specifically, if the shrinkage and the coefficient of the thermal expansion of the LTCC tape and that of the abrasive material grains or particles used to abrade the layer of coating material are similar, then the problem of strain or stress generation in the LTCC tape that may fracture or break the LTCC tape or that of deformation in shape of the LTCC tape during the step of co-firing can be averted.
(21) In accordance with an embodiment of the present disclosure, the method for forming one or more tracks on a LTCC substrate comprises the following steps: providing the LTCC green tape substrate; forming a layer of coating material on an operative face of the LTCC green tape substrate; disposing a stencil on the layer of coating material thereby covering a selected portion of the layer of coating material while leaving exposed a portion of the layer of coating material corresponding to one or more tracks to be formed thus forming an assembly of the LTCC green tape substrate, the layer of coating material and the stencil; eroding the exposed portion of the layer of coating material by propelling an abrasive material using a blasting gun towards the assembly on the face on which the layer of coating material is formed and the stencil is disposed; and separating the stencil from the abraded assembly to obtain desired tracks on the LTCC green tape substrate; wherein the abrasive material has a composition that has physical and chemical properties that are compatible with that of the LTCC green tape substrate.
(22) In accordance with the present disclosure, after the step of forming the layer of coating material on the operative face of the LTCC green tape substrate, the layer of coating material is formed by applying a paste of the material chosen from a group consisting of conductive material, semi-conductive material, non-conductive material and any combinations thereof. The paste is then dried to remove the solvent therefrom.
(23) In accordance with the present disclosure, the layer of coating material is formed by screen printing process.
(24) In accordance with the present disclosure, the layer of coating material is selected from a group of metals (or conductive materials) consisting of silver, copper, gold, aluminum, iron and combinations thereof.
(25) In accordance with the present disclosure, the layer of coating material is selected from a group of semi-conductive materials consisting of silicon, germanium binary ternary oxide semiconductors in the form of paste or photoresists.
(26) In accordance with the present disclosure, the layer of coating material is selected from a group of non-conductive materials consisting of glass dielectric oxides including binary, ternary, quaternary combinations in the form of paste, tapes and/or photoresist.
(27) In accordance with the present disclosure, the stencil is composed of a material that is resistant to the abrasive material such as steel, aluminum, copper, brass and FRP sheets.
(28) In accordance with an embodiment of the present disclosure, it is observed that a proper contact between the non-conductive substrate with the layer of coating material applied thereon, and the stencil that is placed on the layer of coating material is essential. It is necessary that during the whole process of sandblasting the stencil remain in contact with and in place on the layer of coating material. In the event of failing to provide proper contact between the two, it is observed that improper track formation takes place.
(29) In order to achieve a proper contact without any gaps in between the layer of coating material and the stencil during the whole process of the sandblasting, the non-conductive substrate or the LTCC tape is pushed towards the stencil by applying fluid pressure at a surface that is opposite to the operative face. The fluid may be a gas such as pressurized air or nitrogen.
(30) Further, the distance between the sandblasting gun that emits the abrasive particles or material is placed at a suitable distance such as to achieve optimum particle speed that would be sufficient to abrade the layer of coating material while keeping non-conductive substrate intact.
(31) Still further, the desired speed of the abrasive particles may be achieved by controlling one of the: distance between the sandblasting gun and the assembly of the stencil and non-conductive substrate with the layer of coating material; and the pressure of the fluid that facilitates in providing required speed to the abrasive particles.
(32) In accordance with the present disclosure, after abrading the layer of coating material with the abrasive material using the sandblasting process the abraded non-conductive substrate with the tracks formed thereon is cleaned with a pressurized fluid such as air or nitrogen so as to remove the loose dust particles settled thereon after the process of sandblasting, before and after removal of the stencil.
(33) In accordance with the present disclosure, the abraded and cleaned non-conductive substrate with the tracks formed thereon are then vacuum sealed in polyethylene bag (106), laminated, and cut into individual packages and are co-fired (107) to obtain the required final LTCC or non-conductive substrate with the tracks thereon.
(34) The process of co-firing of the LTCC is well known in the art. For example, the DuPont Green Tape low temperature co-fired ceramic system Design and Layout Guidelines describes the conventional co-firing process of LTCC and is incorporated herein in its entirety.
(35) In accordance with the present disclosure, the abrasive material is a mixture of alumina and glass, wherein the glass is composed of Bi.sub.2O.sub.3, V.sub.2O.sub.5, P.sub.2O.sub.5 and SiO.sub.2 so that the shrinkage and coefficient of thermal expansion of the mixture of alumina and glass is compatible with that of the non-conductive substrate.
(36) In accordance with the present disclosure, the proportion of alumina-glass and the glass composition of the abrasive material particles is chosen so that the difference in the thermal expansion coefficient of the abrasive material and the non-conductive substrate is less than or equal to 510.sup.6/ C.
(37) In accordance with the present disclosure, the proportion of alumina and glass and the glass composition of the abrasive material particles is chosen so that the difference in the shrinkage of the abrasive material and the non-conductive substrate is less than or equal to 0.5%.
(38) In accordance with the present disclosure, the abrasive material has a particle size in the range from 10 m to 50 m. The particle size depends on the thickness of the tracks to be formed and/or eroded on the non-conductive substrate.
(39) Typically, in accordance with the present disclosure, the layer of coating material has thickness in the range from 10 m to 30 m.
(40) Typically, the thickness of the LTCC tape is in the range from 100 m to 250 m.
(41) Further,
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(46) Though the
Technical Advancements and Economic Significance
(47) The method for forming tracks on a non-conductive substratein accordance with the present disclosure described herein above has several technical advantages including but not limited to the realization of conductive tracks on a non-conducting substrate, the method: facilitates formation of tracks on non-conductive substrate which may be LTCC substrate; provides improved dimensional accuracy of the tracks formed on the substrate; is not affected by ambient environmental conditions; is independent of human operator skills; is not limited by the paste properties applied on it.
(48) Throughout this specification the word comprise, or variations such as comprises or comprising, will be understood to imply the inclusion of a stated element, integer or step, or group of elements, integers or steps, but not the exclusion of any other element, integer or step, or group of elements, integers or steps.
(49) The use of the expression at least or at least one suggests the use of one or more elements or mixture or quantities, as the use may be in the embodiment of the disclosure to achieve one or more of the desired objects or results.
(50) Any discussion of documents, acts, materials, devices, articles or the like that has been included in this specification is solely for the purpose of providing a context for the disclosure. It is not to be taken as an admission that any or all of these matters form part of the prior art base or were common general knowledge in the field relevant to the disclosure, as it existed anywhere before the priority date of this application.
(51) Wherever a range of values is specified, a value up to 10% below and above the lowest and highest numerical value respectively, of the specified range, is included in the scope of the disclosure.
(52) The numerical values mentioned for the various physical parameters, dimensions or quantities are only approximations and it is envisaged that the values higher/lower than the numerical values assigned to the parameters, dimensions or quantities fall within the scope of the disclosure, unless there is a statement in the specification specific to the contrary.