PHOSPHOR, METHOD FOR PREPARING PHOSPHOR, OPTOELECTRONIC COMPONENT, AND METHOD FOR PRODUCING OPTOELECTRONIC COMPONENT
20190194539 ยท 2019-06-27
Assignee
Inventors
- Veeramani Rajendran (Madurai, IN)
- Mu-Huai FANG (Taoyuan City, TW)
- Ru-Shi Liu (Taipei, TW)
- HO CHANG (New Taipei City, TW)
- Kuang-Mao Lu (New Taipei City, TW)
- Yan-Shen Lin (New Taipei City, TW)
- Chieh-Yu Kang (New Taipei City, TW)
- Gabriel Nicolo A. De Guzman (Laguna, PH)
- Shu-Fen Hu (Taipei, TW)
Cpc classification
C09K11/7776
CHEMISTRY; METALLURGY
C09K11/7708
CHEMISTRY; METALLURGY
International classification
Abstract
The present invention relates to a phosphor, a method for preparing the phosphor, an optoelectronic component, and a method for producing the optoelectronic component. The phosphor has the following general formula: La.sub.3(1x)Ga.sub.1yGe.sub.5(1z)O.sub.16: 3xA.sup.3+, yCr.sup.3+, 5zB.sup.4+, where x, y, and z do not equal to 0 simultaneously; A represents at least one of Gd and Yb; B represents at least one of Sn, Nb, and Ta. For the phosphor, its emission spectrum is within a red visible light region and a near-infrared region when excited by blue visible light, purple visible light or ultraviolet light; and it has a wide reflection spectrum and a high radiant flux. Therefore, it can be used in optoelectronic components such as LEDs to meet requirements of current medical testing, food composition analysis, security cameras, iris/facial recognition, virtual reality, gaming notebook and light detection and ranging applications.
Claims
1. A phosphor comprising the following general formula:
La.sub.3(1x)Ga.sub.1yGe.sub.5(1z)O.sub.16: 3xA.sup.3+, yCr.sup.3+, 5zB.sup.4+, wherein x, y, and z do not equal to 0 simultaneously; A represents at least one of Gd and Yb; and B represents at least one of Sn, Nb, and Ta.
2. The phosphor according to claim 1, wherein03x
0.3,0
y0.2, 0
5z
0.2.
3. The phosphor according to claim 1, further comprising the following general formula:
La.sub.3Ga.sub.1yGe.sub.5O.sub.16: yCr.sup.3+, wherein 0<y0.2.
4. The phosphor according to claim 1, further comprising the following general formula: La.sub.3(1x)Ga.sub.1yGe.sub.5O.sub.16: 3xA.sup.3+, yCr.sup.3+, wherein 03x
0.3, 0
y0.2, and x and y do not equal to 0 simultaneously.
5. The phosphor according to claim 1, further comprising at least one of the following conditions based on the composition of La.sub.3GaGe.sub.5O.sub.16: Cr.sup.3+ replaces part of Ga.sup.3+; A.sup.3+ replaces part of La.sup.3+; B.sup.4+ replaces part of Ge.sup.4+.
6. The phosphor according to claim 1, further emitting light in a range of 600-1500 nm when excited by the excitation light having a wavelength of 400-500 nm.
7. The phosphor according to claim 6, further emitting the light comprising a radiant flux 4-70 mW.
8. The phosphor according to claim 1, being prepared by a method comprising steps of: Weighting the stating precursors selecting from oxide or carbonate containing materials and mixing raw materials for providing elements in the general formula according to the general formula of the phosphor, then sintering at a temperature of 1200-1500 C. to obtain the phosphor
9. The phosphor according to claim 1, being prepared by a method comprising steps of: Preparing and mixing raw materials for providing elements in the general formula according to the general formula of the phosphor, then sintering at a temperature of 1200-1500 C. to obtain the phosphor.
10. An optoelectronic component, comprising: a semiconductor chip for emitting excitation light during operation of the optoelectronic component; and a conversion unit provided with the phosphor according to claim 1 for converting the excitation light into emitted light.
11. The optoelectronic component according to claim 10, wherein the excitation light has a wavelength of 450 nm or 460 nm, and the emitted light has a wavelength of 650-1050 nm.
12. The optoelectronic component according to claim 10, wherein the semiconductor chip is a blue LED chip.
13. A method for producing an optoelectronic component, comprising steps of: producing a conversion unit on which the phosphor according to claim 1 is provided; and mounting the conversion unit on a semiconductor chip, wherein the semiconductor chip is used to generate excitation light during operation of the optoelectronic component.
Description
BRIEF DESCRIPTION OF DRAWING(S)
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DETAILED DESCRIPTION
[0084] In order to describe objectives, technical solutions and advantages of examples of the present application more clearly, the technical solutions in the examples of the present application will be described hereunder clearly and completely with reference to the accompanying drawings in the examples of the present application. The described examples are only a part of examples, rather than all examples of the present application. All other examples obtained by those skilled in the art based on the embodiments of the present application without any creative effort should fall within the scope of the present application.
[0085] The raw materials used in the following examples: La.sub.2O.sub.3, Ga.sub.2O.sub.3 and Cr.sub.2O.sub.3 have a purity of 99.9% respectively, all of which are commercially available from Merck; GeO.sub.2 has a purity of 99.9%, which is commercially available from Aldrich; Gd.sub.2O.sub.3, Yb.sub.2O.sub.3 and SnO.sub.2 have a purity of 99.9% respectively, all of which are commercially available from Sigma Aldrich.
[0086] The tubular and muffle furnace is commercially available from Eurotherm. The
[0087] X-ray diffraction spectrum of the sample powders of the phosphor is measured by an X-ray diffractometer commercially available from BRUKER AXS with a model number of Desktop Bruker D2 PHASER A26-X1-A2B0B2A (Serial No. 205888). The photoluminescence emission spectrum of the sample powders of the phosphor is measured by Gemini 180 and iR320 commercially available from Horiba (Jobin Yvon).
EXAMPLE 1
[0088] The present example provides a set of phosphors having a general formula of La.sub.3Ga.sub.1yGe.sub.5O.sub.16: yCr.sup.3+, where 0<y0.2, the chemical formulas of the set of phosphors are as follows:
[0089] La.sub.3Ga.sub.0.995Ge.sub.5O.sub.16: 0.005Cr.sup.3+
[0090] La.sub.3Ga.sub.0.99Ge.sub.5O.sub.16: 0.0 1Cr.sup.3+
[0091] La.sub.3Ga.sub.0.97Ge.sub.5O.sub.16: 0.03Cr.sup.3+
[0092] La.sub.3Ga.sub.0.95Ge.sub.5O.sub.16: 0.05Cr.sup.3+
[0093] La.sub.3Ga.sub.0.93Ge.sub.5O.sub.16: 0.07Cr.sup.3+
[0094] La.sub.3Ga.sub.0.91Ge.sub.5O.sub.16: 0.09Cr.sup.3+
[0095] La.sub.3Ga.sub.0.89Ge.sub.5O.sub.16: 0.11Cr.sup.3+
[0096] La.sub.3Ga.sub.0.87Ge.sub.5O.sub.16: 0.13Cr.sup.3+
[0097] The preparing method of the set of phosphors is as follows: according to stoichiometric ratios in the molecular formulae of the phosphors, accurately weighing the raw materials La.sub.2O.sub.3, Ga.sub.2O.sub.3, GeO.sub.2 and Cr.sub.2O.sub.3; placing the weighed raw materials in an agate mortar to grind for evenly mixing; then transferring the resulting mixture to an alumina crucible; placing in a muffle furnace and sintering in an air atmosphere at a temperature of about 1250-1300 C. for about 5-6 hours; and after cooling with the furnace, grinding into powders to obtain a target phosphor.
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[0100] Based on the above test and characterization results, considering the ionic radius and valence state, it can be determined that, in the set of phosphors, the incorporation of Cr.sup.3+ replaces the lattice position of Ga.sup.3+ in the matrix.
EXAMPLE 2
[0101] The present example provides a phosphor having a molecular formula of La.sub.2.97Ga.sub.0.99Ge.sub.5O.sub.16: 0.03Gd.sup.3+, 0.01Cr.sup.3+, the preparing method of the phosphor is as follows:
[0102] According to a stoichiometric ratio in the molecular formula of the phosphor, accurately weighing the raw materials La.sub.2O.sub.3, Ga.sub.2O.sub.3, GeO.sub.2, Gd.sub.2O.sub.3 and Cr.sub.2O.sub.3, and placing the weighed raw materials into an agate mortar to grind for evenly mixing; then transferring the mixture to an alumina crucible; placing in a muffle furnace and sintering in an air atmosphere; controlling the temperature at about 1250 C. to sinter for about 6 hours; and after cooling in the furnace, grinding into powders to obtain the phosphor.
[0103] As shown in
[0104] As shown in
[0105] Based on the above test and characterization results, considering the ionic radius and valence state, it can be determined that, in the phosphor, the incorporation of Cr.sup.3+ replaces the lattice position of Ga.sup.3+ in the matrix; similarly, the co-doped Gd.sup.3+ replaces La.sup.3+ on the original site of the matrix lattice.
EXAMPLE 3
[0106] The present example provides a phosphor having a molecular formula of La.sub.2.97Ga.sub.0.99Ge.sub.5O.sub.16: 0.03Yb.sup.3+, 0.01Cr.sup.3+, the preparing method of the phosphor is as follows:
[0107] According to a stoichiometric ratio in the molecular formula of the phosphor, accurately weighing the raw materials La.sub.2O.sub.3, Ga.sub.2O.sub.3, GeO.sub.2, Yb.sub.2O.sub.3 and Cr.sub.2O, and placing the weighed raw materials into an agate mortar to grind for evenly mixing; then transferring the mixture to an alumina crucible; placing in a muffle furnace and sintering in an air atmosphere; controlling the temperature at about 1250 C. to sinter for about 6 hours; and after cooling with the furnace, grinding into powders to obtain the phosphor.
[0108] As shown in
[0109] As shown in
[0110] Based on the above test and characterization results, considering the ionic radius and valence state, it can be determined that Cr.sup.3+ replaces Ga.sup.3+ on the original site in the matrix lattice. Similarly, the co-doped Yb.sup.3+ replaces La.sup.3+ on the original site in the matrix lattice.
EXAMPLE 4
[0111] The present example provides a set of phosphors having a general formula of La.sub.3(1x)Ga.sub.1yGe.sub.5O.sub.16: 3xA.sup.3+, yCr.sup.3+,where 0<3x0.3, y=0.07, and A represents Gd, the chemical formulae of the set of phosphors are as follows, and reference may be made to Example 2 for the corresponding preparing method:
[0112] La.sub.2.985Ga.sub.0.93Ge.sub.5O.sub.16: 0.015Gd.sup.3+, 0.07Cr.sup.3+
[0113] La.sub.2.97Ga.sub.0.93Ge.sub.5O.sub.16: 0.03Gd.sup.3+, 0.07Cr.sup.3+
[0114] La.sub.2.955Ga.sub.0.93Ge.sub.5O.sub.16: 0.045Gd.sup.3+, 0.07Cr.sup.3+
[0115] La.sub.2.94Ga.sub.0.93Ge.sub.5O.sub.16: 0.06Gd.sup.3+, 0.07Cr.sup.3+
[0116] La.sub.2.91Ga.sub.0.93Ge.sub.5O.sub.16: 0.09Gd.sup.3+, 0.07Cr.sup.3+
[0117] La.sub.2.85Ga.sub.0.93Ge.sub.5O.sub.16: 0.15Gd.sup.3+, 0.07Cr.sup.3+
[0118] La.sub.2.79Ga.sub.0.93Ge.sub.5O.sub.16: 0.21Gd.sup.3+, 0.07Cr.sup.3+
[0119]
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[0121] Based on the above test and characterization results, considering the ionic radius and valence state, it can be determined that the incorporation of Cr.sup.3+ replaces Ga.sup.3+ on the original site in the matrix lattice. Similarly, the incorporation of co-doped Gd.sup.3+ replaces La.sup.3+ on the original site in the matrix lattice.
EXAMPLE 5
[0122] The present example provides a phosphor having a molecular formula of La.sub.2.97Ga.sub.0.93Ge.sub.4.95O.sub.16: 0.03Gd.sup.3+, 0.07Cr.sup.3+, 0.05Sn.sup.4+. The preparing method of the phosphor is as follows:
[0123] According to a stoichiometric ratio in the molecular formula of the phosphor, accurately weighing the raw materials La.sub.2O.sub.3, Ga.sub.2O.sub.3, GeO.sub.2, Gd.sub.2O.sub.3, Cr.sub.2O.sub.3 and SnO.sub.2, and placing the weighed raw materials into an agate mortar to grind for evenly mixing; then transferring the resulting mixture to an alumina crucible; placing in a muffle furnace and sintering in an air atmosphere; controlling the temperature at about 1250 C. to sinter for about 5 hours; and after cooling with the furnace, grinding into powders to obtain the phosphor.
[0124] As shown in
[0125] As shown in
[0126] Based on the above test and characterization results, considering the ionic radius and valence state, it can be determined that the incorporation of Cr.sup.3+ replaces Ga.sup.3+ on the original site in the matrix lattice. Similarly, the incorporation of co-doped Gd.sup.3+ and Sn.sup.4+ replaces La.sup.3+ and Ge.sup.4+ on the original sites in the matrix lattice, respectively.
EXAMPLE 6
[0127] This example provides an optoelectronic component. As shown in
[0128] The basic parameters of the above optoelectronic component 1 are shown in Table 1; under these basic parameters, the measurement results of the radiant flux obtained when part of the phosphors in Examples 1-5 is used for the conversion unit 3 are shown in Table 2.
TABLE-US-00001 TABLE 1 LED Phosphor packaging Silicone content in the bracket LED chip specifications encapsulant conversion unit PPA3535 Size: 40 mil * 40 mil 1.4 Silicone 50 wt % Luminescence wavelength: 450-452.5 nm Power: 109.7 mW
TABLE-US-00002 TABLE 2 Radiant flux Phosphor chemical Total Radiant flux ( = formula radiant flux ( = 372-650 nm) 650-1050 nm) La.sub.3Ga.sub.0.99Ge.sub.5O.sub.16: 344.2 mW 326.8 mW 17.6 mW 0.01Cr.sup.3+ La.sub.2.97Ga.sub.0.99Ge.sub.5O.sub.16: 581.5 mW 558.8 mW 25.7 mW 0.03Gd.sup.3+, 0.01Cr.sup.3+ La.sub.2.97Ga.sub.0.99Ge.sub.5O.sub.16: 295.1 mW 286.0 mW 9.1 mW 0.03Yb.sup.3+, 0.01Cr.sup.3+ La.sub.3Ga.sub.0.93Ge.sub.5O.sub.16: 366.2 mW 323.1 mW 43.1 mW 0.07Cr.sup.3+ La.sub.2.97Ga.sub.0.93Ge.sub.5O.sub.16: 307.8 mW 251.5 mW 56.3 mW 0.07Cr.sup.3+, 0.03Gd.sup.3+ La.sub.2.67Ga.sub.0.93Ge.sub.4.95O.sub.16: 284.0 mW 218.8 mW 65.2 mW 0.07Cr.sup.3+, 0.03Gd.sup.3+, 0.05Sn.sup.4+
[0129] As can be seen from Table 2, the phosphor provided in the present application has a radiant flux of 4-70 mW in the wavelength range of 650-1050 nm and thus has a high radiant flux.
Experimental Example 1
[0130] The present experimental example aims to investigate the effects of different doping concentrations of Cr.sup.3+ on the radiant flux. Taking the phosphor having the general formula of La.sub.3Ga.sub.1yGe.sub.5O.sub.16: yCr.sup.3+ (0<y0.1)as an example, the basic parameters of the optoelectronic component used for testing are shown in Table 1; the doping concentration of Cr.sup.3+ and the corresponding radiant flux are shown in Table 3; the photoluminescence emission spectrums of phosphors with different doping concentrations of Cr.sup.3+ are shown in
TABLE-US-00003 TABLE 3 Doping Radiant flux Phosphor chemical formula concentration - Cr.sup.3+ ( = 650-1050 nm) La.sub.3Ga.sub.0.995Ge.sub.5O.sub.16: 0.005Cr.sup.3+ 0.5% 9.1 mW La.sub.3Ga.sub.0.99Ge.sub.5O.sub.16: 0.01Cr.sup.3+ 1% 17.6 mW La.sub.3Ga.sub.0.97Ge.sub.5O.sub.16: 0.03Cr.sup.3+ 3% 31.0 mW La.sub.3Ga.sub.0.95Ge.sub.5O.sub.16: 0.05Cr.sup.3+ 5% 34.1 mW La.sub.3Ga.sub.0.93Ge.sub.5O.sub.16: 0.07Cr.sup.3+ 7% 43.1 mW La.sub.3Ga.sub.0.91Ge.sub.5O.sub.16: 0.09Cr.sup.3+ 9% 38.6 mW La.sub.3Ga.sub.0.89Ge.sub.5O.sub.16: 0.11Cr.sup.3+ 11% 30.3 mW La.sub.3Ga.sub.0.87Ge.sub.5O.sub.16: 0.13Cr.sup.3+ 13% 28.6 mW
[0131] As can be seen from Table 3 and 0.1), when the doping concentration of Cr.sup.3+ is not less than 0.5%, the radiant flux is higher than 9.0 mW; when the doping concentration of Cr.sup.3+ is increased to 3.0%-11%, the radiant flux is higher than 30 mW. Moreover, as the doping concentration of Cr.sup.3+ increases, the radiant flux first increases to the peak value accordingly and then decreases. When the doping concentration of Cr.sup.3+ is about 7% (the corresponding phosphor is La.sub.3Ga.sub.0.93Ge.sub.5O.sub.16: 0.07Cr.sup.3+), the radiant flux reaches the highest of 43.1 mW.
Experimental Example 2
[0132] The present experimental example aims to investigate the effects of different doping concentrations of Gd.sup.3+ on the radiant flux Taking the phosphor having the general formula of La.sub.3(1x)Ga.sub.1yGe.sub.5O.sub.16: 3xGd.sup.3+: yCr.sup.3+ (0<3x0.3, y=0.07) as an example, the basic parameters of the optoelectronic component used for testing are shown in Table 1; the doping concentration of Gd.sup.3+ and the corresponding radiant flux are shown in Table 4; the photoluminescence emission spectrums of the phosphors with different doping concentrations of Gd.sup.3+ are shown in
TABLE-US-00004 TABLE 4 Radiant flux Doping ( = concentration - 650-1050 Phosphor chemical formula Gd.sup.3+ nm) La.sub.2.985Ga.sub.0.93Ge.sub.5O.sub.16: 0.015Gd.sup.3+: 0.07Cr.sup.3+ 0.5% 51.0 mW La.sub.2.97Ga.sub.0.93Ge.sub.5O.sub.16: 0.03Gd.sup.3+: 0.07Cr.sup.3+ 1.0% 56.3 mW La.sub.2.955Ga.sub.0.93Ge.sub.5O.sub.16: 0.045Gd.sup.3+: 0.07Cr.sup.3+ 1.5% 55.6 mW La.sub.2.94Ga.sub.0.93Ge.sub.5O.sub.16: 0.06Gd.sup.3+: 0.07Cr.sup.3+ 2.0% 44.7 mW La.sub.2.91Ga.sub.0.93Ge.sub.5O.sub.16: 0.09Gd.sup.3+: 0.07Cr.sup.3+ 3.0% 42.2 mW La.sub.2.85Ga.sub.0.93Ge.sub.5O.sub.16: 0.15Gd.sup.3+ 0.07Cr.sup.3+ 5.0% 32.7 mW La.sub.2.94Ga.sub.0.93Ge.sub.5O.sub.16: 0.21Gd.sup.3+: 0.07Cr.sup.3+ 7.0% 25.6 mW
[0133] As can be seen from Table 4 and
Experimental Example 3
[0134] This experimental example aims to investigate the effects of different doping concentrations of Sn.sup.4+ on the radiant flux. Taking the phosphor having the general formula of La.sub.3(1x)Ga.sub.1yGe.sub.5(1z)O.sub.16: 3xGd.sup.3+, yCr.sup.3+, 5zSn.sup.4+ (3x=0.03, y=0.01, 0<5z0.2) as an example, the basic parameters of the optoelectronic component used for testing are shown in Table 1; the doping concentration of Sn.sup.4+and the corresponding radiant flux are shown in Table 5; the photoluminescence emission spectrums of phosphors with different doping concentrations of Sn.sup.4+ are shown in
TABLE-US-00005 TABLE 5 Doping concen- Radiant flux tration - ( = Phosphor chemical formula Sn.sup.4+ 650-1050 nm) La.sub.2.97Ga.sub.0.99Ge.sub.4.975O.sub.16: 0.03Gd.sup.3+: 0.01Cr.sup.3+: 0.5% 47.0 mW 0.025Sn.sup.4+ La.sub.2.97Ga.sub.0.99Ge.sub.4.95O.sub.16: 0.03Gd.sup.3+: 0.01Cr.sup.3+: 1.0% 65.2 mW 0.05Sn.sup.4+ La.sub.2.97Ga.sub.0.99Ge.sub.4.925O.sub.16: 0.03Gd.sup.3+: 0.01Cr.sup.3+: 1.5% 50.3 mW 0.075Sn.sup.4+ La.sub.2.97Ga.sub.0.99Ge.sub.4.9O.sub.16: 0.03Gd.sup.3+: 0.01Cr.sup.3+: 2.0% 41.5 mW 0.1Sn.sup.4+ La.sub.2.97Ga.sub.0.99Ge.sub.4.85O.sub.16: 0.03Gd.sup.3+: 0.01Cr.sup.3+: 3.0% 40.9 mW 0.15Sn.sup.4+
[0135] As can be seen from Table 5 and
Comparative Example 1
[0136] The present comparative example provides a phosphor having a chemical formula of La.sub.3Ga.sub.4.95GeO.sub.14: 0.05Cr.sup.3+ (the doping concentration of Cr.sup.3+ is 1%), a comparison between the radiant flux of the phosphor and that of La.sub.3Ga.sub.0.99Ge.sub.5O.sub.16: 0.01Cr.sup.3+ is shown in Table 6;
TABLE-US-00006 TABLE 6 Phosphor Total Radiant flux Radiant flux chemical formula radiant flux ( = 372-650 nm) ( = 650-1050 nm) La.sub.3Ga.sub.4.95GeO.sub.14: 195.6 mW 184.5 mW 10.1 mW 0.05Cr.sup.3+ La.sub.3Ga.sub.0.99Ge.sub.5O.sub.16: 344.2 mW 326.8 mW 17.6 mW 0.01Cr.sup.3+
EXAMPLE 7
[0137] The present example provides a set of phosphors having the general formula of La.sub.3Ga.sub.5(1x)Ge.sub.1yO.sub.14: 5xCr.sup.3+, ySn.sup.4+, where 0<x<0.1, y=0. The chemical formulae of the set of phosphors are as follows:
[0138] La.sub.3Ga.sub.4.95GeO.sub.14: 0.05Cr.sup.3+
[0139] La.sub.3Ga.sub.4.75GeO.sub.14: 0.25Cr.sup.3+
[0140] La.sub.3Ga.sub.4.55GeO.sub.14: 0.45Cr.sup.3+
[0141] The preparing method of the set of phosphor is as follows: according to stoichiometric ratios in the molecular formulae of the set of phosphors, accurately weighing the raw materials La.sub.2O.sub.3, Ga.sub.2O.sub.3, GeO.sub.2 and Cr.sub.2O.sub.3; placing the weighed raw materials in an agate mortar to grind for evenly mixing; then transferring the resulting mixture to an alumina crucible; placing in a tubular furnace and sintering in an air atmosphere; controlling the temperature at about 1300 C. to sinter for about 5 hours; and after cooling in the furnace, grinding into powders to obtain the phosphor.
[0142] As shown in
[0143] As shown in
EXAMPLE 8
[0144] The present example provides a set of phosphors having the general formula of La.sub.3Ga.sub.5(1x)Ge.sub.1yO.sub.14: 5xCr.sup.3+, ySn.sup.4+, where x=0.01, 0<y0.9. The chemical formulae of the set of phosphors are as follows:
[0145] La.sub.3Ga.sub.4.95Ge.sub.0.9O.sub.14: 0.05Cr.sup.3+, 0.1Sn.sup.4+;
[0146] La.sub.3Ga.sub.4.95Ge.sub.0.7O.sub.14: 0.05Cr.sup.3+, 0.3Sn.sup.4+;
[0147] La.sub.3Ga.sub.4.95Ge.sub.0.5O.sub.14: 0.05Cr.sup.3+, 0.5Sn.sup.4+.
[0148] The preparing method of the set of phosphors is as follows: according to stoichiometric ratios in the molecular formulae of the set of phosphors, accurately weighing the raw materials La.sub.2O.sub.3, Ga.sub.2O.sub.3, GeO.sub.2, SnO.sub.2 and Cr.sub.2O.sub.3; and placing the weighed raw materials in an agate mortar to grind for evenly mixing; then transferring the resulting mixture to an alumina crucible; placing in a muffle furnace and sintering in an air atmosphere; controlling the temperature at about 1250 C. to sinter for about 5 hours; and after cooling in the furnace, grinding into powders to obtain the phosphor.
[0149] As shown in
[0150] As shown in
EXAMPLE 9
[0151] The present example provides an optoelectronic component. As shown in
[0152] The basic parameters of the above optoelectronic component are shown in Table 7; under these basic parameters, the measurement results of the radiant flux obtained when part of the phosphors provided in Example 7 is used for the conversion unit 13 are shown in Table 8. The measurement results of the radiant flux obtained when part of the phosphors provided in Example 8 is used for the conversion unit 13 are shown in Table 9.
TABLE-US-00007 TABLE 7 LED Phosphor packaging Silicone content in the bracket LED chip specifications encapsulant conversion unit PPA3535 Size: 40 mil * 40 mil 1.4 Silicone 50 wt % Luminescence wavelength: 450-452.5 nm Power: 109.7 mW
TABLE-US-00008 TABLE 8 Doping concentration - Radiant flux Phosphor chemical formula Cr.sup.3+ ( = 650-1050 nm) La.sub.3Ga.sub.4.95GeO.sub.14: 0.05Cr.sup.3+ 1% 10.5 mW La.sub.3Ga.sub.4.75GeO.sub.14: 0.25Cr.sup.3+ 5% 7.8 mW La.sub.3Ga.sub.4.55GeO.sub.14: 0.45Cr.sup.3+ 9% 4.7 mW
[0153] As shown in Table 8, as the doping concentration of Cr.sup.3+ is gradually increased, the radiant flux is correspondingly decreased, but when the doping concentration of Cr.sup.3+ is 9%, the radiant flux corresponding to the phosphor is still greater than 4 mW.
TABLE-US-00009 TABLE 9 Total Phosphor chemical radiant Radiant flux Radiant flux formula flux ( = 372-650 nm) ( = 650-1050 nm) La.sub.3Ga.sub.4.95Ge.sub.0.9O.sub.14: 150.6 mW 135.8 mW 14.8 mW 0.05Cr.sup.3+, 0.1Sn.sup.4+ La.sub.3Ga.sub.4.95Ge.sub.0.7O.sub.14: 125.3 mW 111.5 mW 13.8 mW 0.05Cr.sup.3+, 0.3Sn.sup.4+ La.sub.3Ga.sub.4.95Ge.sub.0.5O.sub.14: 157.9 mW 143.6 mW 14.3 mW 0.05Cr.sup.3+, 0.5Sn.sup.4+
[0154] Finally, it should be noted that the above examples are only used to illustrate the technical solutions of the present application, rather than limiting the present application; a person skilled in the art may still modify the technical solutions described in the foregoing examples, or make equivalent replacements to some or all of the technical features therein. However, these modifications or replacements do not make the essence of corresponding technical solutions depart from the scope of the technical solutions in the examples of the present application, but should fall into the scope of the claims and specification of the present application.