Tunable surfactants in dampening fluids for digital offset ink printing applications

Abstract

A dampening fluid useful in offset ink printing applications contains water and a surfactant whose structure can be altered. The alteration in structure aids in reducing accumulation of the surfactant on the surface of an imaging member. The surfactant can be decomposed, switched between cis-trans states, or polymerizable with ink that is subsequently placed on the surface.

Claims

1. A method for cleaning an imaging member during offset lithographic printing, comprising: coating the imaging member with a dampening fluid that comprises water and a surfactant having an alterable structure; after an ink transfer from the imaging member and before a subsequent latent image forming step on the imaging member, exposing the imaging member to light or heat to alter the structure of the surfactant across the imaging member; and removing the surfactant from the imaging member, wherein the surfactant includes a cis-trans isomer having a dipole moment.

2. The method of claim 1, wherein the cis-trans isomer is an azobenzene compound.

3. The method of claim 1, wherein the cis-trans isomer is an azobenzene compound having the structure of Formula (III): ##STR00023## wherein R.sub.1, R.sub.2, R.sub.3, R.sub.4, R.sub.5, and R.sub.6 are independently selected from hydrogen, hydroxyl, carboxylic acid, amino, thiol, cyano, nitro, halogen, vinyl, alkoxy, trialkylammoniumalkoxy, sulfonic acid, phosphonate ester, aldehyde, amide, urea, carbamate, carbonate, alkyl, polyoxyalkylene, and ester; and wherein R.sub.1 is different from R.sub.4.

4. The method of claim 1, wherein the cis-trans isomer is an azobenzene compound having the structure of Formula (III-a): ##STR00024## wherein R1 is selected from hydroxyl, amino, cyano, nitro, halogen, vinyl, alkoxy, sulfonic acid, aldehyde, and ester.

5. The method of claim 1, wherein the cis-trans isomer is an azobenzene compound having the structure of Formula (III-b): ##STR00025## wherein R.sub.b is alkyl having 2 to 6 carbon atoms; and p is an integer from 1 to 10.

6. The method of claim 1, wherein the cis-trans isomer is an azobenzene compound having the structure of Formula (III-c): ##STR00026##

7. The method of claim 6, wherein Formula (III-c) includes a nonpolar alkyl sidechain and a polar trialkylammoniumalkoxy sidechain.

8. A method for cleaning an imaging member during offset lithographic printing, comprising: coating the imaging member with a dampening fluid that comprises water and a surfactant having an alterable structure; exposing the imaging member to light or heat to alter the structure of the surfactant; and removing the surfactant from the imaging member, wherein the surfactant includes a cis-trans isomer having a dipole moment, the cis-trans isomer including an azobenzene compound having the structure of Formula (III): ##STR00027## wherein R.sub.1, R.sub.2, R.sub.3, R.sub.4, R.sub.5, and R.sub.6 are independently selected from hydrogen, carboxylic acid, amino, thiol, cyano, nitro, halogen, vinyl, alkoxy, trialkylammoniumalkoxy, sulfonic acid, phosphate ester, aldehyde, amide, urea, carbonate, carbonate, alkyl, polyoxyalkylene, and ester; and wherein R.sub.1 is different from R.sub.4.

9. A method for cleaning an imaging member during offset lithographic printing, comprising: coating the imaging member with a dampening fluid that comprises water and a surfactant having an alterable structure; exposing the imaging member to light or heat to alter the structure of the surfactant; and removing the surfactant from the imaging member, wherein the surfactant includes a cis-trans isomer having a dipole moment, the cis-trans isomer including an azobenzene compound having the structure of Formula (III-a): ##STR00028## wherein R1 is selected from hydroxyl, amino, cyano, nitro, halogen, vinyl, alkoxy, sulfonic acid, aldehyde, and ester.

10. A method for cleaning an imaging member during offset lithographic printing, comprising: coating the imaging member with a dampening fluid that comprises water and a surfactant having an alterable structure; exposing the imaging member to light or heat to alter the structure of the surfactant; and removing the surfactant from the imaging member, wherein the surfactant includes a cis-trans isomer having a dipole moment, the cis-trans isomer including an azobenzene compound having the structure of Formula (III-b): ##STR00029## wherein R.sub.b is alkyl having 2 to 6 carbon atoms; and p is an integer from 1 to 10.

11. A method for cleaning an imaging member during offset lithographic printing, comprising: coating the imaging member with a dampening fluid that comprises water and a surfactant having an alterable structure; exposing the imaging member to light or heat to alter the structure of the surfactant; and removing the surfactant from the imaging member, wherein the surfactant includes a cis-trans isomer having a dipole moment, the cis-trans isomer including an azobenzene compound having the structure of Formula (III-c): ##STR00030##

12. The method of claim 11, wherein Formula (III-c) includes a nonpolar alkyl sidechain and a polar trialkylammoniumalkoxy sidechain.

13. The method of claim 1, wherein the exposing the imaging member to light or heat to alter the structure of the surfactant across the imaging member includes exposing entire cross-process lines on the imaging member to light or heat.

14. The method of claim 1, wherein the exposing the imaging member to light or heat to alter the structure of the surfactant across the imaging member includes exposing entire cross-process lines on the imaging member to light or heat at both imaged and non-imaged areas of the imaging member.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

(1) The following is a brief description of the drawings, which are presented for the purposes of illustrating the exemplary embodiments disclosed herein and not for the purposes of limiting the same.

(2) FIG. 1 illustrates a variable lithographic printing apparatus in which the dampening fluids of the present disclosure may be used.

(3) FIG. 2 is a magnified view of the imaging member in the printing apparatus illustrating residual surfactant on the surface.

DETAILED DESCRIPTION

(4) A more complete understanding of the processes and apparatuses disclosed herein can be obtained by reference to the accompanying drawings. These figures are merely schematic representations based on convenience and the ease of demonstrating the existing art and/or the present development, and are, therefore, not intended to indicate relative size and dimensions of the assemblies or components thereof.

(5) Although specific terms are used in the following description for the sake of clarity, these terms are intended to refer only to the particular structure of the embodiments selected for illustration in the drawings, and are not intended to define or limit the scope of the disclosure. In the drawings and the following description below, it is to be understood that like numeric designations refer to components of like function.

(6) The modifier about used in connection with a quantity is inclusive of the stated value and has the meaning dictated by the context (for example, it includes at least the degree of error associated with the measurement of the particular quantity). When used with a specific value, it should also be considered as disclosing that value. For example, the term about 2 also discloses the value 2 and the range from about 2 to about 4 also discloses the range from 2 to 4.

(7) FIG. 1 illustrates a system for variable lithography in which the dampening fluids of the present disclosure may be used. The system 10 comprises an imaging member 12. The imaging member comprises a substrate 22 and a reimageable surface layer 20. The surface layer is the outermost layer of the imaging member, i.e. the layer of the imaging member furthest from the substrate. As shown here, the substrate 22 is in the shape of a cylinder; however, the substrate may also be in a belt form, etc. The surface layer 20 is typically a silicone (e.g. a methylsilicone or fluorosilicone), which may have carbon black added to increase energy absorption of the surface layer.

(8) In the depicted embodiment the imaging member 12 rotates counterclockwise and starts with a clean surface. Disposed at a first location is a dampening fluid subsystem 30, which uniformly wets the surface with dampening fluid 32 to form a layer having a uniform and controlled thickness. Ideally the dampening fluid layer is between about 0.15 micrometers and about 1.0 micrometers in thickness, is uniform, and is without pinholes. As explained further below, the composition of the dampening fluid aids in leveling and layer thickness uniformity. A sensor 34, such as an in-situ non-contact laser gloss sensor or laser contrast sensor, is used to confirm the uniformity of the layer. Such a sensor can be used to automate the dampening fluid subsystem 30.

(9) At optical patterning subsystem 36, the dampening fluid layer is exposed to an energy source (e.g. a laser) that selectively applies energy to portions of the layer to image-wise evaporate the dampening fluid and create a latent negative of the ink image that is desired to be printed on the receiving substrate. Image areas are created where ink is desired, and non-image areas are created where the dampening fluid remains. An optional air knife 44 is also shown here to control airflow over the surface layer 20 for the purpose of maintaining clean dry air supply, a controlled air temperature, and reducing dust contamination prior to inking. Next, an ink is applied to the imaging member using inker subsystem 46. Inker subsystem 46 may consist of a keyless system using an anilox roller to meter an offset ink onto one or more forming rollers. Ink is applied to the image areas to form an ink image.

(10) A rheology control subsystem 50 partially cures or tacks the ink image. This curing source may be, for example, an ultraviolet light emitting diode (UV-LED), which can be focused as desired using optics. Another way of increasing the cohesion and viscosity employs cooling of the ink. This could be done, for example, by blowing cool air over the reimageable surface from a jet after the ink has been applied but before the ink is transferred to the final substrate. Alternatively, a heating element could be used near the inker subsystem 46 to maintain a first temperature and a cooling element could be used to maintain a cooler second temperature near the nip 16.

(11) The ink image is then transferred to the target or receiving substrate 14 at transfer subsystem 70. This is accomplished by passing a recording medium or receiving substrate 14, such as paper, through the nip 16 between the impression roller 18 and the imaging member 12.

(12) Finally, the imaging member should be cleaned of any residual ink or dampening fluid. Most of this residue can be easily removed quickly using an air knife 77 with sufficient air flow. Removal of any remaining ink can be accomplished at cleaning subsystem 72.

(13) The role of the dampening fluid is to provide selectivity in the imaging and transfer of ink to the receiving substrate. When an ink donor roll in the ink source of FIG. 1 contacts the dampening fluid layer, the layer splits so that ink 142 is only applied to areas on the imaging member that are dry, i.e. not covered with dampening fluid, and ink in the areas containing dampening fluid remains on the ink donor roll. However, over time, residual surfactants and other additives from the dampening fluid can accumulate on the surface of the imaging member. This is illustrated in FIG. 2, which is a magnified view of the image areas 132 and non-image areas 134 after the latent image has been applied at optical patterning subsystem 36 (FIG. 1) and prior to inker subsystem 46 (FIG. 1). Residual surfactant in image areas 132 is indicated with reference numeral 136.

(14) It is desirable to be able to chemically alter the surfactants so that the surfactant is either easier to remove from the surface or has less effect on subsequent imagewise impressions made on the surface of the imaging member. Surfactants generally include a non-polar tail (which is often an alkyl chain) and a polar head. Three different types of chemical alterations are contemplated. In the first type of surfactant, the surfactant decomposes upon exposure to light or heat. Put another way, the surfactant breaks down into two or more different molecules.

(15) In certain embodiments, the surfactant is an alkyl aryl ketone sulfonate having the structure of Formula (I):

(16) ##STR00011##
wherein R is alkyl having from 4 to 24 carbon atoms; Ar is aryl having from 6 to 40 carbon atoms; and M is an alkali or alkali earth metal. M may be, for example, hydrogen, sodium, or potassium. The R forms the non-polar tail of the surfactant, with the remainder forming the polar head of the surfactant. Generally, the sulfonate of Formula (I) can be cleaved by exposure to light having a wavelength of 300 nm and above. The cleavage typically results in an aryl sulfonate and a mixture of two branched olefins. As illustrated in Scheme 1 below, the surfactant 4-(3,3-dimethyltridecanoyl)benzenesulfonic acid is cleaved into a mixture of 4-acetylbenzenesulfonic acid, 2-methyldodec-1-ene, and 2-methyldodec-2-ene:

(17) ##STR00012##

(18) In other embodiments, the surfactant is a 4-alkylphenylazosulfonate having the structure of Formula (II):

(19) ##STR00013##
wherein R.sub.a is alkyl having from 4 to 24 carbon atoms; and M is an alkali or alkali earth metal. In particular embodiments, R.sub.a is C.sub.12H.sub.25, C.sub.10H.sub.21, C.sub.8H.sub.17, or C.sub.6H.sub.13. The surfactants of Formula (II) lose their surfactant properties upon ultraviolet (UV) irradiation.

(20) In other specific embodiments, the surfactant contains a polar group which can be decomposed through exposure to light or heat. One exemplary polar group which can be decomposed include azide (N.sub.3.sup.), which can break down to release nitrogen gas (N.sub.2). Another exemplary polar group is carboxylate (COO.sup.), which can break down to release carbon dioxide gas (CO.sub.2). Other polar groups may include peroxides, which can evolve oxygen gas (O.sub.2). Generally, the byproducts of the decomposed surfactant may be either volatile products that readily evaporate from the imaging member, or may be products that are more amenable to pickup by cleaning rollers in the cleaning station. One means of determining whether the byproduct is easier to clean may be by referring to the enthalpy of vaporization, also known as the heat of vaporization, which has units of J/mol or J/kg, and is a measure of the ease with which a given compound will evaporate. Desirably, the enthalpy of vaporization for at least one of the byproducts is lower than the enthalpy of vaporization for the surfactant (i.e. less energy to evaporate).

(21) In the second type of surfactant, the surfactant is a cis-trans isomer having a dipole moment. In particular, it is contemplated that the polarity of the surfactant can be changed by switching between the cis and trans isomers of the surfactant. The general mechanism can be better explained with reference to the isomers as illustrated in Scheme 2 below:

(22) ##STR00014##

(23) As seen here, in the trans isomer, the two polar R.sub.1 groups are on the same side of a line drawn through the azo linkage. As a result, the overall surfactant can be considered a macrodipole, or in other words a dipole is present in the surfactant. However, in the cis isomer, the two polar R.sub.1 groups are on opposite sides of the line drawn through the azo linkage, and a macrodipole is not present in the surfactant. In other words, the overall polarity of the surfactant can be tuned or controlled.

(24) In some particular embodiments, the cis-trans isomer is an azobenzene compound having the structure of Formula (III):

(25) ##STR00015##
wherein R.sub.1, R.sub.2, R.sub.3, R.sub.4, R.sub.5, and R.sub.6 are independently selected from hydrogen, hydroxyl, carboxylic acid, amino, thiol, cyano, nitro, halogen, vinyl, alkoxy, trialkylammoniumalkoxy, sulfonic acid, phosphonate ester, aldehyde, amide, urea, carbamate, carbonate, alkyl, polyoxyalkylene, and ester; and wherein R.sub.1 is different from R.sub.4. The overall compound of Formula (III) has a dipole moment.

(26) The term hydroxyl refers to a radical of the formula OH.

(27) The term carboxylic acid refers to a radical of the formula COOH.

(28) The term amino refers to a radical of the formula NR.sup.1R.sup.2, wherein R.sup.1 and R.sup.2 are independently hydrogen or alkyl, or to a radical of the formula N.sup.+R.sup.1R.sup.2R.sup.3, wherein R.sup.1, R.sup.2, and R.sup.3 are independently hydrogen or alkyl. Please note this second radical is sometimes referred to as an ammonium ion.

(29) The term thiol refers to a radical of the formula SH.

(30) The term cyano refers to a radical of the formula CN.

(31) The term nitro refers to a radical of the formula NO.sub.2.

(32) The term halogen refers to a fluorine, chlorine, bromine, or iodine atom.

(33) The term vinyl refers to a radical of the formula CHCH.sub.2.

(34) The term alkoxy refers to a radical of the formula OC.sub.nH.sub.2n+1.

(35) The term trialkylammoniumalkoxy refers to a radical of the formula OR.sup.1N.sup.+R.sup.2R.sup.3R.sup.4A.sup., wherein R.sup.1, R.sup.2, R.sup.3, and R.sup.4 are independently alkyl, and A is an anion, such as bromine or chlorine.

(36) The term sulfonic acid refers to a radical of the formula SO.sub.3H.

(37) The term phosphonate ester refers to a radical of the formula O(PO)(OR.sup.1)(OR.sup.2), wherein R.sup.1 and R.sup.2 are independently hydrogen, alkyl, or aryl.

(38) The term aldehyde refers to a radical of the formula COR.sup.1, wherein R.sup.1 is hydrogen or alkyl.

(39) The term amide refers to a radical of the formula CONR.sup.1R.sup.2, wherein R.sup.1 and R.sup.2 are independently hydrogen or alkyl.

(40) The term urea refers to a radical of the formula NR.sup.1CONR.sup.2R.sup.3, wherein R.sup.1, R.sup.2, and R.sup.3 are independently hydrogen or alkyl.

(41) The term carbamate refers to a radical of the formula OCONR.sup.1R.sup.2, wherein R.sup.1 and R.sup.2 are independently hydrogen or alkyl.

(42) The term carbonate refers to a radical of the formula OCOOR.sup.1, wherein R.sup.1 is hydrogen or alkyl.

(43) The term alkyl refers to a radical composed entirely of carbon atoms and hydrogen atoms which is fully saturated. The alkyl radical may be linear, branched, or cyclic. The alkyl radical may be monovalent or divalent depending on context, i.e. C.sub.2H.sub.5 and C.sub.2H.sub.4 would both be considered alkyl.

(44) The term polyoxyalkylene refers to a radical of the formula (OR.sup.1).sub.mX, wherein each R.sup.1 is independently alkyl; m is an integer and is at least 2; and X is hydrogen or hydroxyl.

(45) The term ester refers to a radical of the formula COOR.sup.1, wherein R.sup.1 is hydrogen or alkyl.

(46) The term aryl refers to an aromatic radical composed entirely of carbon atoms and hydrogen atoms. When aryl is described in connection with a numerical range of carbon atoms, it should not be construed as including substituted aromatic radicals. For example, the phrase aryl containing from 6 to 10 carbon atoms should be construed as referring to a phenyl group (6 carbon atoms) or a naphthyl group (10 carbon atoms) only, and should not be construed as including a methylphenyl group (7 carbon atoms). The aryl radical may be monovalent or divalent depending on context, i.e. C.sub.6H.sub.5 and C.sub.6H.sub.4 would both be considered phenyl.

(47) In some more specific embodiments, the cis-trans isomer is an azobenzene compound having the structure of Formula (III-a):

(48) ##STR00016##
wherein R.sub.1 is selected from hydroxyl, amino, cyano, nitro, halogen, vinyl, alkoxy, sulfonic acid, aldehyde, and ester.

(49) In another specific embodiment, the cis-trans isomer is an azobenzene compound having the structure of Formula (III-b):

(50) ##STR00017##
wherein R.sub.b is alkyl having 2 to 6 carbon atoms; and p is an integer from 1 to 10. Here, the two sidechains are a nonpolar alkyl sidechain and a polar polyoxyalkylene sidechain.

(51) In yet another specific embodiment, the cis-trans isomer is an azobenzene compound having the structure of Formula (III-c):

(52) ##STR00018##
Here, the two sidechains are a nonpolar alkyl sidechain and a polar trialkylammoniumalkoxy sidechain.

(53) In the third type of surfactant, the surfactant is polymerizable. This allows the surfactant to participate in the polymerization of the ink during curing, and eventually removes the surfactant from the surface of the imaging member. Generally speaking, the surfactant contains a polymerizable group. Exemplary polymerizable groups include a carbon-carbon double bond or a carbon-carbon triple bond, or moieties containing such bonds. For example, an alkylmethacrylate group of the general formula (C.sub.nH.sub.2n)OCOC(CH.sub.3)CH.sub.2 contains a polymerizable carbon-carbon double bond.

(54) The surfactant generally has the structure of Formula (IV):
T-GFormula (IV)
wherein T is a nonpolar group; G is a polar group; and a polymerizable group is present in either T or G. It is contemplated that T represents the nonpolar tail, while G represents the polar head of the surfactant.

(55) A polar group is a radical that has an electric dipole moment. Examples of some polar groups include hydroxyl, amino, cyano, nitro, halogen, alkoxy, sulfonic acid, aldehyde, ester, polyoxyalkylene, and combinations thereof.

(56) A nonpolar group is a radical that does not have an electric dipole moment. Examples of some nonpolar groups include alkyl and aryl.

(57) In some particular embodiments, the polymerizable surfactant may have the structure of Formula (IV-a):

(58) ##STR00019##
wherein R.sub.c is alkyl containing from 4 to 24 carbon atoms; Ar.sub.1 is aryl having from 6 to 40 carbon atoms; Vn is a hydrocarbon chain having a single carbon-carbon double bond; G is independently a polar group; m is an integer indicating the number of polar groups G on Ar.sub.1, and is from 1 to 4. Referring back to Formula (IV), the R.sub.c and Ar.sub.1 groups may be considered to be the nonpolar tail of the surfactant, with the G group(s) providing the polarity. The carbon-carbon double bond of the Vn group allows the surfactant to be polymerized.

(59) The term hydrocarbon chain refers to a radial composed entirely of carbon atoms and hydrogen atoms which is not aromatic. A vinyl group is an example of a hydrocarbon chain.

(60) In more specific embodiments, the R.sub.c group is alkyl having from 12 to 18 carbon atoms. The R.sub.c group is usually a linear alkyl group. In other embodiments, the Vn group has from 2 to 6 carbon atoms. In some embodiments, Ar.sub.1 is phenyl. In additional embodiments, G contains a polyoxyethylene chain.

(61) In particular embodiments, the polymerizable surfactant has the structure of Formula (IV-b):

(62) ##STR00020##
wherein x has an average value of from 1 to about 50; and Y is hydrogen or SO.sub.3.sup.M.sup.+, where M is a cation having a +1 charge. Some exemplary M cations include ammonium (NH.sub.4.sup.+), sodium, and potassium. Such polymerizable surfactants are commercially available under the names NOIGEN RN (polyoxyethylene alkylphenyl ether) and HITENOL (polyoxyethylene alkylphenyl ether ammonium sulfate) from Montello Inc.

(63) In other embodiments, the polymerizable surfactant is 10-undecenoic acid, which has the structure of Formula (IV-c):

(64) ##STR00021##
Here, the COOH group is the polar head, with the decenyl chain acting as the nonpolar tail, and the double bond being the polymerizable group.

(65) In still other embodiments, the polymerizable surfactant has the structure of Formula (IV-d):

(66) ##STR00022##
wherein q is an integer from 1 to 7.

(67) The dampening fluids of the present disclosure comprise water and one of the surfactants described above having an alterable structure. The water may be from about 70 wt % to about 95 wt % of the dampening fluid. The surfactant is present in an amount such that the surface tension of the dampening fluid is from about 20 to about 40 dynes/cm. In other embodiments, the surfactant is from about 0.5 wt % to about 2 wt % of the dampening fluid.

(68) In addition, the dampening fluid may also contain a low molecular weight alcohol that functions as a wetting agent. This ensures uniform distribution of the solution on the imaging member and decreases the amount of water on the imaging member. In particular embodiments, the low molecular weight alcohol contains from 1 to 6 carbon atoms. Specific alcohols include isopropanol and ethanol. The low molecular weight alcohol may be present in the amount of about 5 wt % to about 35 wt % of the dampening fluid.

(69) Other additives may also be present in the dampening fluid. Such additives may include a biocide, a sequestrant, a corrosion inhibitor, and a humectant.

(70) A biocide impedes the growth of or destroys any fungus or microorganisms that may be present in the dampening fluid. Exemplary biocides include sodium benzoate, phenol or derivatives thereof, formalin, imidazole derivatives, sodium dehydroacetate, 4-isothiazolin-3-one derivatives, benzotriazole derivatives, derivatives of amidine and guanidine, quaternary ammonium salts, derivatives of pyridine, quinoline and guanidine, derivatives of diazine and triazole, derivatives of oxazole and oxazine, bromonitropropanol, 1,1-dibromo-1-nitro-2-ethanol, and 3-bromo-3-nitropentane-2,4-diol. The biocide can be used in an amount of from about 0.001 wt % to about 1 wt % of the dampening fluid.

(71) A sequestrant, or chelating agent, is used to chelate dissolved ions that may be present in the dampening fluid to prevent their reaction with other ingredients in for example the ink. Exemplary sequestrants include organic phosphonic acids and phosphonoalkanetricarboxylic acids, such as ethylenediaminetetraacetic acid (EDTA), diethylenetriaminepentaacetic acid, triethylenetetraminehexaacetic acid, hydroxyethylethylenediaminetriacetic acid, nitrilotriacetic acid, 1-hydroxyethane-1,1-diphosphonic acid, aminotri(methylenephosphonic acid), and salts thereof. The sequestrant can be used in an amount of from about 0.001 wt % to about 1 wt % of the dampening fluid.

(72) A corrosion inhibitor protects the associated components of the imaging member from corrosion. Exemplary inhibitors include sodium nitrate, sodium phosphate, benzotriazole, 5-methylbenzotriazole, thiosalicylic acid, and benzimidazole.

(73) A humectant prevents the dampening fluid from drying too rapidly, which can cause some problems with the final printed product. Exemplary humectants include ethylene glycol, glycerin and propylene glycol.

(74) The surfactants of the present disclosure can be more easily removed from the surface of the imaging member. It is contemplated that the state of a surfactant can be switched by exposure to light or heat so that the surfactant alters or transforms into a compound or compounds that is/are easier to remove. There are two main situations in which surfactant needs to be removed. The first situation is in the image areas (where ink is applied). In these areas, the surfactant can be volatilized, cracked, or otherwise converted. For example, the surfactant could be exposed at the imaging station 130 to light or heat over subsequent rotations of the imaging member to accomplish this task. Alternatively, the air knife 77 illustrated in FIG. 1 could be replaced with an additional light or heat source that is upstream of cleaning subsystem 72. This additional light or heat source 77 could be a laser or a thermal imaging print bar that could heat an entire cross-process line on the imaging member. The second situation is in the non-image areas, where dampening fluid may remain after the ink has been split. Again, the additional light or heat source 77 can be used to remove this surfactant.

(75) The present disclosure has been described with reference to exemplary embodiments. Obviously, modifications and alterations will occur to others upon reading and understanding the preceding detailed description. It is intended that the present disclosure be construed as including all such modifications and alterations insofar as they come within the scope of the appended claims or the equivalents thereof.