Composition of fingerprint-resistant layer consisting of a plurality of thin films and preparation method therefor

Abstract

A composition for primer layer coating of a water- and oil-repellent coating layer so as to enhance the durability of the water- and oil-repellent coating layer, comprises a mixture which comprises at least one of a silicon oxide (SiOx) and titanium (Ti) compound, an aluminum (Al) compound and a zirconium (Zr) compound. A preparation method may comprise: preparing a glass or polymer substrate; forming, on the substrate, a portion on which a fingerprint-resistant layer is to be deposited within the substrate by etching; depositing a primer layer consisting of the composition on the surface of the substrate including the portion where the water- and oil-repellent coating layer is deposited; forming the water- and oil-repellent coating layer on the deposited primer layer; and purging the substrate on which the water- and oil-repellent coating layer is formed. The method has excellent wear-resistance, salt water resistance, chemical resistance and cosmetics resistance.

Claims

1. A method of manufacturing a fingerprint-resistant layer having a plurality of thin films, comprising: (i) preparing a glass or polymer substrate; (ii) forming, on the substrate, a portion on which the fingerprint-resistant layer is to be deposited within the substrate by etching; (iii) depositing a primer mixture on the substrate including the portion on which a water-repellent and oil-repellent coating film is to be deposited, to form a primer film, wherein the primer mixture comprises silicon oxide (SiO.sub.x) in an amount of 90 wt %, a titanium (Ti) compound in an amount of 2 wt %, an aluminum (Al) compound in an amount of 6 wt %, and a zirconium (Zr) compound in an amount of 2 wt %; (iv) forming the water-repellent and oil-repellent coating film on the deposited primer film; and (v) purging the substrate on which the water-repellent and oil-repellent coating film is formed.

2. The method according to claim 1, further comprising cleaning the substrate using a wet cleaning agent between (i) the preparing and (ii) the forming of the portion.

3. The method according to claim 1, wherein the etching is performed using at least one of ion etching and radio frequency (RF) plasma etching in (ii) the forming of the portion.

4. The method according to claim 3, wherein oxygen (O.sub.2), argon (Ar), or gas of O.sub.2 and Ar is ionized at a degree of vacuum of 710.sup.2 Torr to 210.sup.7 Torr, and a surface of a material is etched by causing a collision between an ionized gas ion and the surface of the material when ion etching is used in (ii) the forming of the portion.

5. The method according to claim 3, wherein O.sub.2, Ar, or gas of O.sub.2 and Ar is included and used when RF plasma etching is used in (ii) the forming of the portion.

6. The method according to claim 1, wherein the primer mixture comprises at least one selected from the group consisting of SiO.sub.x, TiO.sub.2, Al.sub.2O.sub.3, ZrO.sub.2, Al.sub.2(SiO.sub.4)O, and Al.sub.2Si.sub.2O.sub.5(OH).sub.4 in (iii) the depositing.

7. The method according to claim 6, wherein SiO.sub.x comprises at least one selected from the group consisting of quartz, cristobalite, tridymite, and amorphous silicon oxide.

8. The method according to claim 1, wherein the depositing includes depositing the primer mixture using at least one selected from the group consisting of thermal evaporation, electron beam evaporation, electron beam ion plating, sputtering, a sputtering ion plating system, laser molecular beam epitaxy, pulsed laser deposition, chemical vapor deposition, and ion-assist deposition.

9. The method according to claim 8, wherein the depositing includes depositing the primer mixture using electron beam evaporation, wherein a degree of vacuum is set to 710.sup.2 Torr to 210.sup.7 Torr, and a temperature is set to 20 C. to 180 C. when the primer film is deposited using the electron beam evaporation.

10. The method according to claim 8, wherein the depositing includes depositing the primer mixture using ion-assist deposition, wherein the ion-assist deposition is conducted by combining the electron beam evaporation with the ion beam evaporation.

11. The method according to claim 10, wherein (iii) the depositing includes using O.sub.2, Ar, or gas of O.sub.2 and Ar as an ion beam used for the ion beam evaporation.

12. The method according to claim 10, wherein (iii) the depositing includes setting the number of emitted ion beams to 110.sup.13/cm.sup.2 to 510.sup.17/cm.sup.2 during the ion-assist deposition.

13. The method according to claim 1, wherein (iv) the forming of the water-repellent and oil-repellent coating film includes manufacturing the water-repellent and oil-repellent coating film by depositing a compound containing at least one of F and Si.

14. The method according to claim 1, wherein (iv) the forming of the water-repellent and oil-repellent coating film includes depositing the water-repellent and oil-repellent coating film using at least one selected from the group consisting of thermal evaporation, electron beam evaporation, electron beam ion plating, sputtering, a sputtering ion plating system, laser molecular beam epitaxy, pulsed laser deposition, chemical vapor deposition, and ion-assist deposition.

15. The method according to claim 14, wherein a degree of vacuum is set to 710.sup.2 Torr to 210.sup.7 Torr, and a temperature is set to 20 C. to 180 C. when the water-repellent and oil-repellent coating film is deposited using the thermal evaporation.

16. The method according to claim 1, wherein the primer mixture is sintered before depositing.

Description

BRIEF DESCRIPTION OF DRAWINGS

(1) FIG. 1 is a flowchart illustrating a method of manufacturing a fingerprint-resistant layer having a plurality of thin films according to an embodiment of the present invention.

(2) FIG. 2 is a cross-sectional view of the fingerprint-resistant layer having the plurality of thin films according to an embodiment of the present invention.

(3) FIG. 3 is a diagram illustrating a configuration of an apparatus for electron beam evaporation according to an embodiment of the present invention.

(4) FIG. 4 is a diagram illustrating a configuration of an apparatus for resistance heating-type vacuum evaporation according to an embodiment of the present invention.

REFERENCE SIGNS LIST

(5) 100: Substrate 200: Primer film 300: Water-repellent and oil-repellent coating film 400: Fingerprint-resistant layer 510: Electronic beam deposition source 520: Electronic beam 530: Electronic beam deposition substrate 540: Electronic beam evaporation molecule 550: W-Gun 560: Magnet 610: Resistance heating-type vacuum evaporation source 620: W-Boat 630: Resistance heating-type vacuum evaporation substrate 640: Resistance heating-type vacuum evaporation molecule

DETAILED DESCRIPTION OF CERTAIN EMBODIMENTS

(6) A fingerprint-resistant layer 400 having a plurality of thin films according to some embodiments of the present invention may include a glass or polymer substrate 100, a primer film 200 formed on the substrate 100, and a water-repellent and oil-repellent coating film 300 formed on the primer film 200.

(7) A composite for coating of the primer film 200 of a water-repellent and oil-repellent coating film deposited to enhance durability of the water-repellent and oil-repellent coating film 300 may include at least one of mixtures that contain at least one of silicon oxide (SiO.sub.x), a titanium (Ti) compound, an aluminum (Al) compound, and a zirconium (Zr) compound.

(8) Alternatively, the composite for coating of the primer film 200 of the water-repellent and oil-repellent coating film deposited to enhance durability of the water-repellent and oil-repellent coating film 300 may include one of or a combination of two or more of a Ti compound, an Al compound, and a Zr compound.

(9) More specifically, the mixture preferably contains at least one of titanium dioxide (TiO.sub.2), aluminum oxide (Al.sub.2O.sub.3), zirconium dioxide (ZrO.sub.2), aluminum silicate (Al.sub.2(SiO.sub.4)O), and kaolin (Al.sub.2Si.sub.2O.sub.5(OH).sub.4).

(10) SiO.sub.x may correspond to at least one of quartz, cristobalite, tridymite, and amorphous silicon oxide.

(11) In addition, the water-repellent and oil-repellent coating film 300 is preferably manufactured by depositing a compound containing at least one of fluoride (F) and silicon (Si).

(12) FIG. 1 illustrates a method of manufacturing the fingerprint-resistant layer 400 having the plurality of thin films according to an embodiment of the present invention.

(13) The method may include preparing the glass or polymer substrate 100, forming, on the substrate 100, a portion on which the fingerprint-resistant layer 400 including the plurality of films is to be deposited by etching, depositing the primer film 200 including the composite on the substrate 100 including a portion on which the water-repellent and oil-repellent coating film 300 is to be deposited, forming the water-repellent and oil-repellent coating film 300 on the deposited primer film 200, and purging the substrate 100 on which the water-repellent and oil-repellent coating film 300 is formed.

(14) In addition, the preparation process of the substrate 100 may include cleaning the substrate using a wet cleaning agents.

(15) The etching may be performed using at least one of ion etching and radio frequency (RF) plasma etching.

(16) When ion etching is used in the etching, it is preferable that oxygen (O.sub.2), argon (Ar), or gas of O.sub.2 and Ar be ionized at a degree of vacuum of 710.sup.2 Torr to 210.sup.7 Torr, and a surface of a material be etched by causing a collision between an ionized gas ion and the surface of the material.

(17) Most preferably, the etching is performed at a degree of vacuum of 610.sup.4 Torr. However, the present invention is not limited thereto.

(18) In addition, when RF plasma etching is used in the etching, O.sub.2, Ar, or gas of O.sub.2 and Ar may be included and used.

(19) The deposition process of the primer film 200 may be performed using at least one of thermal evaporation, electron beam evaporation, electron beam ion plating, sputtering, a sputtering ion plating system, laser molecular beam epitaxy, pulsed laser deposition, chemical vapor deposition, and ion-assist deposition.

(20) FIG. 3 illustrates a configuration of an apparatus for electron beam evaporation according to an embodiment of the present invention.

(21) In electron beam evaporation, an electronic beam 520 is emitted from a tungsten gun (W-Gun) 550 by a magnetic force of a magnet 560, and an electronic beam deposition source 510 is deposited as an electronic beam evaporation molecule 540 on an electronic beam deposition substrate 530.

(22) FIG. 4 illustrates a configuration of an apparatus for resistance heating-type vacuum evaporation according to an embodiment of the present invention.

(23) In resistance heating-type vacuum evaporation, a resistance heating-type vacuum evaporation source 610 positioned in a tungsten container (W-Boat) 620 is heated, and the resistance heating-type vacuum evaporation source 610 is deposited as a resistance heating-type vacuum evaporation molecule 640 on a resistance heating-type vacuum evaporation substrate 630.

(24) When the primer film is deposited using electron beam evaporation, a degree of vacuum is preferably set to 710.sup.2 Torr to 210.sup.7 Torr, and a temperature is preferably set to 20 to 180 C.

(25) Most preferably, electron beam evaporation is performed at a degree of vacuum of 1.610.sup.4 Torr and a temperature of 20 to 150 C. However, the present invention is not limited thereto.

(26) It is more preferable that the deposition of the primer film 200 be performed using electron beam evaporation, and ion-assist deposition using ion beam evaporation be performed at the same time.

(27) An ion beam used for ion-assist deposition is preferably O.sub.2, Ar, or gas of O.sub.2 and Ar, and the number of emitted ion beams is preferably set to 110.sup.13/cm.sup.2 to 510.sup.17/cm.sup.2 at the time of ion-assist deposition.

(28) When the water-repellent and oil-repellent coating film 300 is formed, the water-repellent and oil-repellent coating film 300 is preferably manufactured by depositing a compound containing at least one of F and Si.

(29) In addition, the water-repellent and oil-repellent coating film 300 may be deposited using at least one of thermal evaporation, electron beam evaporation, electron beam ion plating, sputtering, a sputtering ion plating system, laser molecular beam epitaxy, pulsed laser deposition, chemical vapor deposition, and ion-assist deposition.

(30) The water-repellent and oil-repellent coating film 300 is most preferably deposited using thermal evaporation. However, the present invention is not limited thereto.

(31) When the water-repellent and oil-repellent coating film 300 is deposited using thermal evaporation, a degree of vacuum is preferably set to 710.sup.2 Torr to 210.sup.7 Torr, and a temperature is preferably set to 20 to 180 C.

(32) Most preferably, the degree of vacuum is set to 1.610.sup.5 Torr, and the temperature is set to 20 to 150 C. However, the present invention is not limited thereto.

(33) Deposition for fingerprint resistance having water repellence and oil repellence according to some embodiments of the present invention is conducted at a lower degree of vacuum than an existing high degree of vacuum, and thus a deposition time can be shortened.

(34) The shortened deposition time has an effect of enhancing productivity to reduce a total tack time, enhancing production efficiency, and reducing a cost per time.

(35) In addition, there is an effect of having excellent abrasion resistance, salt water resistance, chemical resistance, and cosmetics resistance when compared to existing deposition.

(36) The primer film 200 of the water-repellent and oil-repellent coating film deposited to enhance durability of the water-repellent and oil-repellent coating film 300 according to some embodiments of the present invention is deposited by applying electron beam evaporation to the composite or applying ion-assist deposition that combines electron beam evaporation with ion beam evaporation thereto.

(37) FIG. 2 is a cross-sectional view of the fingerprint-resistant layer 400 having the plurality of thin films according to the present embodiment.

(38) The fingerprint-resistant layer 400 having the plurality of thin films may include the glass or polymer substrate 100, the primer film 200 of some embodiments of the present invention formed on the substrate 100, and the water-repellent and oil-repellent coating film 300 formed on the primer film 200.

(39) The fingerprint-resistant layer 400 having the plurality of thin films according to some embodiments of the present invention may be used for an electronic device. Examples of the electronic device include a mobile phone, a tablet PC, etc. The fingerprint-resistant layer 400 may be used for a window in the mobile phone, and used for an outermost layer in the tablet PC.

EXAMPLES

Example 1

(40) SiO.sub.2 of 90 wt %, Al.sub.2O.sub.3 of 6 wt %, ZrO.sub.2 of 2 wt %, and TiO.sub.2 of 2 wt % in powder forms were mixed together, polyvinyl alcohol (PVA), polyethylene glycol (PEG), and oleic acid were mixed at a ratio of 5:2:3 using a binder, and then 1.2 wt % of the whole powders were added to spray and dry the powders. The sprayed and dried powders were pressed at a pressure of 600 kg/cm.sup.2, and then sintered at 1150 C. for six hours.

(41) Tempered glass was positioned in a chamber that can be vacuum-decompressed, a sintered primer was positioned at a place to be subjected to electron beam evaporation, a fingerprint-resistant medical was positioned at a place to be subjected to thermal evaporation, the chamber was vacuum-decompressed up to 1.810.sup.4 Torr using a vacuum pump, and then a substrate was etched using argon gas. After the substrate was etched, the chamber was set to 1.510.sup.4 Torr and 80 C., and the primer was deposited using electron beam evaporation.

(42) Thereafter, deposition for water repellence and oil repellence was conducted using thermal evaporation. After this operation, vacuum was removed, and then deposition was finished. A thickness of a primer film obtained in this way was 150 , and a thickness of a water-repellent and oil-repellent coating film obtained in this way was 230 . A contact angle, adhesive property, abrasion resistance, salt water resistance, and chemical resistance of the deposited tempered glass were verified.

Example 2

(43) SiO.sub.2 of 90 wt %, Al.sub.2O.sub.3 of 8 wt %, and ZrO.sub.2 of 2 wt % in powder forms were mixed together, PVA, PEG, and oleic acid were mixed at a ratio of 5:2:3 using a binder, and then 1.5 wt % of the whole powders were added to spray and dry the powders.

(44) The sprayed and dried powders were pressed at a pressure of 550 kg/cm.sup.2, and then sintered at 1200 C. for eight hours.

(45) Tempered glass was positioned in a chamber that can be vacuum-decompressed, a sintered primer was positioned at a place to be subjected to electron beam evaporation, a fingerprint-resistant medical was positioned at a place to be subjected to thermal evaporation, the chamber was vacuum-decompressed up to 1.810.sup.4 Torr using a vacuum pump, and then a substrate was etched using argon gas. After the substrate was etched, the chamber was set to 1.510.sup.4 Torr and 80 C., and the primer was deposited using electron beam evaporation.

(46) Thereafter, deposition for water repellence and oil repellence was conducted using thermal evaporation. After this operation, vacuum was removed, and then deposition was finished. A thickness of a primer film obtained in this way was 150 , and a thickness of a water-repellent and oil-repellent coating film obtained in this way was 230 . A contact angle, adhesive property, abrasion resistance, salt water resistance, and chemical resistance of the deposited tempered glass were verified.

Example 3

(47) SiO.sub.2 of 90 wt %, Al.sub.2O.sub.3 of 6 wt %, and TiO.sub.2 of 4 wt % in powder forms were mixed together, PVA, PEG, and oleic acid were mixed at a ratio of 5:2:3 using a binder, and then 1.5 wt % of the whole powders were added to spray and dry the powders. The sprayed and dried powders were pressed at a pressure of 550 kg/cm.sup.2, and then sintered at 1100 C. for ten hours.

(48) Tempered glass was positioned in a chamber that can be vacuum-decompressed, a sintered primer was positioned at a place to be subjected to electron beam evaporation, a fingerprint-resistant medical was positioned at a place to be subjected to thermal evaporation, the chamber was vacuum-decompressed up to 1.810.sup.4 Torr using a vacuum pump, and then a substrate was etched using argon gas. After the substrate was etched, the chamber was set to 1.510.sup.4 Torr and 80 C., and the primer was deposited using electron beam evaporation.

(49) Thereafter, deposition for water repellence and oil repellence was conducted using thermal evaporation. After this operation, vacuum was removed, and then deposition was finished. A thickness of a primer film obtained in this way was 150 , and a thickness of a water-repellent and oil-repellent coating film obtained in this way was 230 . A contact angle, adhesive property, abrasion resistance, salt water resistance, and chemical resistance of the deposited tempered glass were verified.

Example 4

(50) Al.sub.2O.sub.3 of 95 wt % and ZrO.sub.2 of 5 wt % in powder forms were mixed together, PVA, PEG, and oleic acid were mixed at a ratio of 5:2:3 using a binder, and then 1.0 wt % of the whole powders were added to spray and dry the powders. The sprayed and dried powders were pressed at a pressure of 600 kg/cm.sup.2, and then sintered at 1650 C. for eight hours.

(51) Tempered glass was positioned in a chamber that can be vacuum-decompressed, a sintered primer was positioned at a place to be subjected to electron beam evaporation, a fingerprint-resistant medical was positioned at a place to be subjected to thermal evaporation, the chamber was vacuum-decompressed up to 1.810.sup.4 Torr using a vacuum pump, and then a substrate was etched using argon gas. After the substrate was etched, the chamber was set to 1.510.sup.4 Torr and 80 C., and the primer was deposited using electron beam evaporation.

(52) Thereafter, deposition for water repellence and oil repellence was conducted using thermal evaporation. After this operation, vacuum was removed, and then deposition was finished. A thickness of a primer film obtained in this way was 150 , and a thickness of a water-repellent and oil-repellent coating film obtained in this way was 230 . A contact angle, adhesive property, abrasion resistance, salt water resistance, and chemical resistance of the deposited tempered glass were verified.

Comparative Example 1

(53) Tempered glass was positioned in a chamber that can be vacuum-decompressed, SiO.sub.2 was positioned at a place to be subjected to electron beam evaporation, a water-repellent and oil-repellent medical was positioned at a place to be subjected to thermal evaporation, the chamber was vacuum-decompressed up to 3.510.sup.5 Torr using a vacuum pump, and then a substrate was etched using argon gas. After the substrate was etched, the chamber was set to 2.510.sup.5 Torr and 80 C., and SiO.sub.2 was deposited using electron beam evaporation.

(54) Thereafter, deposition for water repellence and oil repellence was conducted using thermal evaporation. After this operation, vacuum was removed, and then deposition was finished. A thickness of an SiO.sub.2 coating film obtained in this way was 120 , and a thickness of a water-repellent and oil-repellent coating film obtained in this way was 210 . A contact angle, adhesive property, abrasion resistance, salt water resistance, and chemical resistance of the deposited tempered glass were verified.

(55) TABLE-US-00001 TABLE 1 Initial contact angle Division Contact angle before reliability (Initial contact angle) Abrasion Chemical Items resistance resistance Salt spray Spec 110~125 Example 1 116.5 116.9 117.2 Example 2 117.2 117.5 117.1 Example 3 116.8 116.1 117.5 Example 4 116.4 117.3 116.7 Comparative 117.1 116.8 117.1 example 1

(56) Contact Angle Test Method

(57) A liquid having a volume of 3 L is dropped at 600 L/Min into a middle of a sample using distilled water in a contact angle measuring instrument. After three seconds from dosing, a contact angle is measured.

(58) TABLE-US-00002 TABLE 2 Adhesive property Item Adhesive property Example 1 Example 2 Example 3 Example 4 Comparative example 1 : very excellent, : excellent, : moderate, X: poor

(59) Adhesive Property Test Method

(60) Lines are drawn at an interval of 1 mm on a sample to reach a film, thereby creating a check. A tape is attached thereto to strongly pull the sample in a vertical direction. This operation is repeated three times to determine whether a machined surface is separated when the tape is attached and detached.

(61) TABLE-US-00003 TABLE 3 Pencil hardness Item Pencil hardness Example 1 9H Example 2 9H Example 3 9H Example 4 9H Comparative 9H example 1

(62) Pencil Hardness Test Method

(63) Only a wood part of a pencil is cut such that a lead of 3 mm is exposed in a cylindrical shape. In this state, the lead is vertically put on sandpaper placed on a flat surface and polished while drawing a circle. In this way, a tip of the lead is made flat and an angle is made sharp. The pencil lead comes into contact with a surface of a fragment of the sample at an angle of about 45 degrees and a load of 1 kg and moves by 10 mm at a constant speed. This operation is repeated five times by changing a position of the sample.

(64) TABLE-US-00004 TABLE 4 Abrasion resistance Contact angle after abrasion resistance reliability +500 +500 +500 +1000 +1000 +2000 +2000 +2000 Initial times times times times times times times times contact 1500 2000 2500 3000 4000 5000 7000 9000 11000 Items angle times times times times times times times times times Spec 15 when compared to initial contact angle Example 1 116.5 113.4 111.4 108.2 106.7 107.5 104.3 103.4 102.8 101.3 Example 2 117.2 115.6 114.9 114.1 112.6 109.5 105.3 102.9 101.7 Example 3 116.8 114.7 112.6 110.6 108.5 104.3 103.2 101.5 Example 4 116.4 115.1 112.5 111.6 109.4 106.5 104.3 103.7 102.6 101.2 Comparative 117.1 105.8 104.1 102.5 100.5 107.6 103.9 102 example 1

(65) Abrasion Resistance Test Method

(66) A load of 500 g is applied to a pencil eraser, and then the eraser is put on a surface of a fragment of a sample to reciprocate (40 reciprocations/min).

(67) Within a change amount of 15 when compared to an initial contact angle, whether a coating is peeled off in external appearance is determined.

(68) TABLE-US-00005 TABLE 5 Chemical resistance Contact angle reliability after chemical resistance +50 +50 +50 +100 +100 Initial times times times times times contact 250 300 350 400 500 600 Item angle times times times times times times Spec 10 when compared to initial contact angle Example 1 116.9 115.4 113.1 100.8 108.5 106.5 Example 2 117.5 115.3 113.2 110.9 109.5 107.4 Example 3 116.1 114.8 111.5 107.6 105.9 Example 4 117.3 113.2 112.1 110.8 109.2 107.1 Comparative 116.8 113.2 111.7 109.4 107.9 106.5 example 1

(69) Chemical Resistance Test Method

(70) A load of 500 g is applied to a pencil eraser, and then the eraser is put on a surface of a fragment of a sample. Under the condition that methyl alcohol does not dry, the eraser reciprocates while insertion is continued (40 reciprocations/min).

(71) Within a change amount of 10 when compared to an initial contact angle, whether a coating is peeled off in external appearance is determined.

(72) TABLE-US-00006 TABLE 6 Salt water resistance Initial Contact angle after salt water resistance reliability contact +24 hr +24 hr +24 hr +24 hr +24 hr +48 hr +48 hr Item angle 72 hr 4 days 5 days 6 days 7 days 8 days 10 days 12 days Spec 10 when compared to initial contact angle Example 1 117.2 115.4 114.6 113.8 111.8 109.6 108.5 107.9 107.1 Example 2 117.1 115.7 114.2 112.7 110.5 108.6 107.4 107.0 Example 3 117.5 116.1 113.4 112.7 111.6 109.4 107.3 106.8 Example 4 116.7 115.4 114.9 114.5 112.4 110.8 108.5 107.5 106.4 Comparative 117.1 114.3 111.3 109.4 107.8 106.9 example 1

(73) Salt Water Resistance Test Method

(74) After 5% NaCl is sprayed on a sample at 35 degrees, the sample is rinsed and then dried. Then, the sample is left for four hours at room temperature. Within a change amount of 10 when compared to an initial contact angle, whether a coating is peeled off in external appearance is determined.

(75) Although some embodiments of the present invention have been described with reference to the accompanying drawings, they are merely examples of various embodiments containing the subject matter of the present invention, and are intended to allow those skilled in the art to easily implement various embodiments of the present invention. Thus, it is clear that the present invention is not restricted to the embodiments described above. Therefore, all technical spirits that fall within an equivalent range by change, substitution, replacement, etc. within the subject matter of the present invention will be included in the scope of a right of the present invention. In addition, some components of the drawings are intended to more clearly describe configurations, and thus it is clarified that the components are exaggerated or minimized when compared to actual components.

INDUSTRIAL APPLICABILITY

(76) A fingerprint-resistant layer deposited by some embodiments of the present invention has excellent abrasion resistance, salt water resistance, chemical resistance, cosmetics resistance, etc. when compared to an existing product, and it is possible to use a primer film of a fingerprint resistant film corresponding to a water-repellent and oil-repellent coating film using various compounds in addition to SiO2 which has been deposited to compensate for degradation of durability of an existing fingerprint resistant material. In addition, the primer film of the fingerprint-resistant layer, which is formed by depositing the water-repellent and oil-repellent coating film on the primer film, is deposited at a lower degree of vacuum than an existing degree of vacuum, and thus a deposition time can be reduced. In this way, there is industrial availability in that a cost per time can be reduced, productivity can be enhanced to reduce a total tack time of a process, thereby enhancing production efficiency.