DETECTOR FOR OPTICALLY DETECTING AT LEAST ONE OBJECT
20190157470 ยท 2019-05-23
Assignee
Inventors
- Robert Send (Ludwigshafen, DE)
- Ingmar Bruder (Ludwigshafen, DE)
- Christoph Lungenschmied (Ludwigshafen, DE)
- Wilfried Hermes (Ludwigshafen, DE)
- Sebastian Valouch (Ludwigshafen, DE)
Cpc classification
H01L31/101
ELECTRICITY
Y02E10/541
GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
Y02P70/50
GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
H01L31/1055
ELECTRICITY
International classification
G01S7/481
PHYSICS
Abstract
A detector for determining a position of at least one object, in particular for 3D-sensing concepts, is disclosed. The detector comprises a longitudinal optical sensor (110) for determining a longitudinal position of an object by a light beam traveling from the object to the detector and a transversal optical detector (112) which may be designed as an imaging device or a position sensitive detector. The longitudinal sensor (110) has at least two PN structures or PIN structures (138, 140). Each of the PN structures or PIN structures is located between two electrode layers (144), thereby forming photodiodes (146) having a longitudinal sensor region (148) each. Longitudinal sensor signals from the photodiodes (146) are, given the same total power of illumination, are dependent on a beam cross-section of the light beam in the longitudinal sensor regions (148). As an alternative, instead of the transversal optical detector (112) the photodiodes (146) of the longitudinal optical sensor (110) may be adapted to operate as one-dimensional position sensitive detectors each, for determining a transversal x-coordinate and a transversal y-coordinate, respectively.
Claims
1: A detector for determining a position of at least one object, the detector comprising: a longitudinal optical sensor for determining a longitudinal position of at least one light beam traveling from the at least one object to the detector, the longitudinal optical sensor having a layer setup, wherein the longitudinal optical sensor comprises at least two p-type semiconductor layers, at least two n-type semiconductor layers, and at least three individual electrode layers, wherein the at least two p-type semiconductor layers and the at least two n-type semiconductor layers form at least two individual PN structures, wherein each of the at least two individual PN structures is located between at least two of the at least three electrode layers, thereby forming at least two photodiodes, wherein each of the at least two photodiodes has at least one longitudinal sensor region, wherein the longitudinal optical sensor generates at least two longitudinal sensor signals in a manner dependent on an illumination of the at least one longitudinal sensor region by the at least one light beam, and wherein the at least two longitudinal sensor signals, given the same total power of the illumination, are dependent on a beam cross-section of the at least one light beam in the at least one longitudinal sensor regions; and an evaluation device for determining at least one longitudinal coordinate of the at least one object by evaluating the at least two longitudinal sensor signals.
2: The detector of claim 1, wherein the longitudinal optical sensor comprises an intrinsic semiconductor layer, and wherein the intrinsic semiconductor layer is located between one of the at least two p-type semiconductor layers and one of the at least two n-type semiconductor layers, thereby forming at least one PIN structure.
3: The detector of claim 1, wherein the longitudinal optical sensor comprises at least two intrinsic semiconductor layers, and wherein each of the at least two intrinsic semiconductor layers is located between one of the at least two p-type semiconductor layers and one of the at least two n-type semiconductor layers, thereby forming at least two individual PIN structures.
4: The detector of claim 2, wherein one or more of the intrinsic semiconductor layer, the at least two p-type semiconductor layers and the at least two n-type semiconductor layers comprise at least one selected from the group consisting of amorphous silicon, an alloy comprising amorphous silicon, microcrystalline silicon, germanium, copper indium sulfide, copper indium gallium selenide, copper zinc tin sulfide, copper zinc tin selenide, copper-zinc-tin sulfur-selenium chalcogenide, cadmium telluride, mercury cadmium telluride, indium arsenide, indium gallium arsenide, indium antimonide, an organic-inorganic halide perovskite, and solid solutions and/or doped variants thereof.
5: The detector of claim 4, wherein one or more of the intrinsic semiconductor layer, the at least two p-type semiconductor layers and the at least two n-type semiconductor layers comprise the alloy comprising amorphous silicon, and the alloy comprising amorphous silicon is an amorphous alloy comprising silicon and carbon or an amorphous alloy comprising silicon and germanium.
6: The detector of claim 4, wherein one or more of the intrinsic semiconductor layer, the at least two p-type semiconductor layers and the at least two n-type semiconductor layers comprise the amorphous silicon, and the amorphous silicon is passivated with hydrogen.
7: The detector of claim 1, wherein the longitudinal optical sensor comprises an intrinsic semiconductor layer; and the intrinsic semiconductor layers have a thickness of from 100 nm to 300 nm.
8: The detector of claim 1, wherein the longitudinal optical sensor is at least partially transparent.
9. (canceled)
10: The detector of claim 1, wherein each of the at least two p-type semiconductor layers, the at least two n-type semiconductor layers, and the at least three individual electrode layers in the layer setup is at least partially transparent or translucent.
11. (canceled)
12: The detector of claim 1, wherein two adjacent PN structures of the at least two individual PN structures share one of the at least three electrode layers as a common electrode layer.
13: The detector of claim 1, wherein two adjacent layers of the at least three electrode layers having the same polarity are separated from each other by an insulating layer, and wherein the insulating layer comprises a layer of one of glass, quartz, or a transparent organic polymer.
14. (canceled)
15: The detector of claim 1, wherein each of the at least two photodiodes is addressed individually.
16: The detector of claim 1, wherein the at least two photodiode comprises a first photodiode and a second photodiode; the first photodiode generates at least a first longitudinal sensor signal the second photodiode generates at least a second longitudinal sensor signal, and the evaluation device determines the first longitudinal optical sensor signal and the second longitudinal sensor signal simultaneously.
17: The detector of claim 1, wherein the at least three electrode layers comprise electrically conductive material, wherein the at least three electrode layers are at least partially transparent, and wherein the at least three electrode layers comprise transparent conductive oxide.
18: The detector of claim 1, wherein the longitudinal optical sensor comprises a spacer layer, and wherein the spacer layer separates a first photodiode and a second photodiode.
19: The detector of claim 1, wherein the detector further comprises a transversal optical sensor for determining at least one transversal position of the at least one light beam traveling from the at least one object to the detector, wherein the transversal optical sensor generates at least one transversal sensor signal, and wherein the evaluation device further determines at least one transversal coordinate of the at least one object by evaluating the at least one transversal sensor signal.
20: The detector of claim 1, wherein the layer setup comprises at least one layer acting as a transversal optical sensor, and the longitudinal optical sensor and the transversal optical sensor are arranged in a monolithic device.
21. (canceled)
22: The detector of claim 20, wherein the layer acting as a transversal optical sensor is intransparent and arranged as a last layer in the layer setup to be traversed by the at least one light beam, which is an incident light beam.
23: The detector of claim 20, wherein the layer acting as a transversal optical sensor is at least partially transparent or translucent.
24: The detector of claim 20, wherein the layer acting as transversal optical sensor is arranged as a first layer in the layer setup to be traversed by the at least one light beam, which is an incident light beam.
25-29. (canceled)
30: A method for determining a position of at least one object with the detector of claim 1, the method comprising: generating the at least two longitudinal sensor signals with the longitudinal optical sensor and evaluating the at least two longitudinal sensor signals with the evaluation device and generating at least one item of information on a longitudinal position of the at least one object.
31-34. (canceled)
Description
BRIEF DESCRIPTION OF THE FIGURES
[0306] Further optional details and features of the invention are evident from the description of preferred exemplary embodiments which follows in conjunction with the dependent claims. In this context, the particular features may be implemented alone or with several in combination. The invention is not restricted to the exemplary embodiments. The exemplary embodiments are shown schematically in the figures. Identical reference numerals in the individual figures refer to identical elements or elements with identical function, or elements which correspond to one another with regard to their functions.
[0307] Specifically, in the figures:
[0308]
[0309]
[0310]
[0311]
[0312]
EXEMPLARY EMBODIMENTS
[0313]
[0314] The intrinsic semiconductor layers 118, the p-type semiconductor layer 124 and the n-type semiconductor layers 130 may comprise one or more of amorphous silicon, also abbreviated as a-Si, an alloy comprising amorphous silicon (a-Si), an alloy comprising amorphous silicon (a-Si), microcrystalline silicon (c-Si), germanium (Ge), copper indium sulfide (CIS), copper indium gallium selenide (CIGS), copper zinc tin sulfide (CZTS), copper zinc tin selenide (CZTSe), copper-zinc-tin sulfur-selenium chalcogenide (CZTSSe), cadmium telluride (CdTe), mercury cadmium telluride (HgCdTe), indium arsenide (InAs), indium gallium arsenide (InGaAs), indium antimonide (InSb), an organic-inorganic halide perovskite, and solid solutions and/or doped variants thereof. The alloy comprising amorphous silicon may be an amorphous alloy comprising silicon and carbon or an amorphous alloy comprising silicon and germanium. The amorphous silicon may be passivated by using hydrogen, by which application a number of dangling bonds within the amorphous silicon may be reduced by several orders of magnitude. As a result, hydrogenated amorphous silicon, usually abbreviated to a-Si:H, may exhibit a low amount of defects, thus, allow using it for optical devices. The p-type semiconductor layers 124, the intrinsic semiconductor layers 118 and the n-type semiconductor layers 130 may be based on a-Si:H. The thickness of the intrinsic semiconductor layers 118 may be from 100 nm to 300 nm, in particular from 150 nm to 200 nm.
[0315] The longitudinal optical sensor 110 may be at least partially transparent, in particular transparent or semitransparent. The layer setup 116 may be adapted to be traversed by the incident light beam 142 in an order in which the layers are arranged within the layer setup 116. Each of the layers in the layer setup 116 may be at least partially transparent or translucent. Thus, the intrinsic semiconductor layer 118 may have a thickness as small as possible. In particular, the intrinsic semiconductor layers 118 may be thin film layers, with a thickness from 100 nm to 300 nm, in particular from 150 nm to 200 nm. The thickness of the intrinsic semiconductor layers 118 may be chosen similar to layer thickness as used in high performance tandem cells. Thus, using thin intrinsic semiconductor layers 118 may allow manufacturing at least partially transparent longitudinal optical sensors 110.
[0316] The longitudinal optical sensor 110 comprises at least three individual electrode layers 144. In the embodiment shown in
[0317] Each of the two photodiodes 146 has at least one longitudinal sensor region 148, wherein the longitudinal optical sensor 110 is designed to generate at least two longitudinal sensor signals in a manner dependent on an illumination of the longitudinal sensor region 148 by the light beam 142, wherein the longitudinal sensor signals, given the same total power of the illumination, are dependent on a beam cross-section of the light beam 142 in the longitudinal sensor region 148. Each of the photodiodes 146 may be configured to be addressed individually. Each of the electrode layers 144 may be connectable and separately addressable. Hence, a photocurrent generated by one of the photodiodes 146 may be determined separately from a photocurrent generated by another photodiode 146. A first photodiode 150 may be designed to generate at least a first longitudinal sensor signal, and a second photodiode 152 may be designed to generate at least a second longitudinal sensor signal. The detector 114 comprises at least one evaluation device 154, wherein the evaluation device 154 is configured to determine at least one longitudinal coordinate of the object 156 by evaluating the longitudinal sensor signals. As outlined above, the longitudinal coordinate z may be also derived, in particular by implementing the FiP effect explained in further detail in WO 2012/110924 A1 and/or in WO 2014/097181 A1. For this purpose, the at least one longitudinal sensor signal as provided by the FIP sensor is evaluated by using the evaluation device 154 and determining, therefrom, at least one longitudinal coordinate z of the object 156. The evaluation device 154 may be adapted to determine the first longitudinal optical sensor signal and the second longitudinal sensor signal simultaneously. The photodiodes 146 may be arranged such that the first longitudinal optical sensor signal may be independent from the second longitudinal optical sensor signal. Thus, it may be possible to determine the longitudinal coordinate of the object 156 unambiguously.
[0318] Two adjacent electrode layers 144 having the same polarity may be separated from each other by an insulating layer 158. The insulating layer 158 may be at least partially transparent or at least partially translucent. The insulating layer 158 may comprise a layer of one of glass, quartz, or a transparent organic polymer. The longitudinal optical sensor may comprise at least one spacer layer 160, in particular an optical spacer layer, wherein the spacer layer 160 is designed to separate the first photodiode 150 and a second photodiode 152. The spacer layer 160 may comprise a layer of one of glass, quartz, or a transparent organic polymer. Using an optical spacer layer 160 and/or at least one insulating layer 158 of an appropriate thickness may allow to set a distance between two PIN structures 136.
[0319] The layer setup 116 may further comprise at least one substrate layer 162 comprising a layer of an opaque or transparent substrate, for example glass or a transparent or intransparent organic polymer. In the embodiment shown in
[0320] The detector 114 may further comprise at least one transversal optical sensor 112. The transversal optical sensor 112 may be designed as at least one imaging device and/or at least one PSD. The longitudinal optical sensor 110 and the imaging device and/or the PSD may be arranged on a common optical axis 164. The longitudinal optical sensor 110 and the transversal optical sensor 112 may be arranged in a stack, as separated devices. The transversal optical sensor 112 may be situated in a direction of light propagating from the object 156 to the detector 114 behind the transparent longitudinal optical sensor 110. In this case, the PSD may be a standard quadrant detector or an opaque silicon based PSD. Additionally or alternatively, the imaging device may be based on intransparent inorganic materials, such as known CCD sensors and/or CMOS sensors.
[0321]
[0322] In
[0323]
[0324] The layer setup 116 may further comprise at least one at least partially transparent insulating layer 172, in particular comprising one or more of glass, quartz or a transparent organic polymer, positioned behind the transversal optical sensor 112.
[0325]
[0326] At least one of the electrode layers 144 may be designed as reflective electrode 174. The reflective electrode 174 may be arranged as last layer of the layer setup 116 to be traversed by the incident light beam 142. The layer setup 116 may comprise in a direction of propagation of the light beam in addition to the reflective electrode at least one additional layer, in particular the substrate layer 162, which may not be traversed by the incident light beam. Thus, the substrate layer 162 may be opaque. However, embodiments are feasible, wherein all electrode layers 144 and both substrate layers 162 are at least partially transparent.
[0327] The longitudinal optical sensor 110 may be adapted to operate as FiP-device and at the same time as PSD. The longitudinal optical sensor 110 may be adapted to operate as a FiP-device and at the same time as PSD adapted for one-dimensional position sensing. For example, the longitudinal optical sensor 110 may comprise two cells, wherein each cell may comprise at least one PIN structure 136 and/or PN structure and two electrode layers 144. The two cells may share one of the electrode layers 144 such that the two cells have a common electrode layer. The common electrode layer may be designed as common anode. Each cell may be configured as FiP-device and at the same time as 1D-PSD. Each cell may comprise a semi-transparent thin-film detector such as one or more of an a-Si:H thin-film detector, a c-Si:H, CdTe, a nanoparticle thin-film detector or an organic thin-film detector. The 1D-PSD may comprise at least two electrodes on the surface of the PSD. The two electrodes on the surface of the 1D-PSD may be designed as cathodes. The two cells may be rotated by 90 to each other such that one cell is adapted to determine the transversal coordinate x and the other cell the transversal coordinate y. Electrode contacts of the anode and cathode electrode layers may be arranged on two sides of a cell opposite to each other.
[0328]
[0329]
[0330]
[0331] As outlined above, the detector 114 may comprise, besides the one or more transversal optical sensors 112 and one or more longitudinal optical sensors 110, at least one evaluation device 154, having e.g. optionally at least one modulation device 194, as symbolically depicted in
[0332] Besides the above-mentioned possibility of fully or partially combining two or more components, one or more of one or more optical sensors 110, 112 and one or more of the components of the evaluation device 154 may be interconnected by one or more connectors 170 and/or one or more interfaces, as symbolically depicted in
[0333] In this exemplary embodiment, the object 156, the position of which may be detected, may be designed as an article of sports equipment and/or may form a control element or a control device 198, the position of which may be manipulated by a user 200. As an example, the object 156 may be or may comprise a bat, a racket, a club or any other article of sports equipment and/or fake sports equipment. Other types of objects 156 are possible. Further, the user 200 himself or herself may be considered as the object 156, the position of which shall be detected.
[0334] As outlined above, the detector 114 comprises one or more optical sensors 110, 112. The optical sensors 110,112 may be located inside the housing 196 of the detector 114. Further, at least one transfer device 202 may be comprised, such as one or more optical systems, preferably comprising one or more lenses 204.
[0335] An opening 206 inside the housing 196, which, preferably, is located concentrically with regard to an optical axis 164 of the detector 114, preferably defines a direction of view 208 of the detector 114. A coordinate system 210 may be defined, in which a direction parallel or antiparallel to the optical axis 164 is defined as a longitudinal direction, whereas directions perpendicular to the optical axis 164 may be defined as transversal directions. In the coordinate system 210, symbolically depicted in
[0336] The one or more light beams 142 are propagating from the object 156 and/or from and/or one or more of the beacon devices 180 towards the detector 114. The detector 114 is adapted for determining a position of the at least one object 156. For this purpose, as explained above in the context of
[0337] As outlined above, the determination of a position of the object 156 and/or a part thereof by using the detector 114 may be used for providing a human-machine interface 182, in order to provide at least one item of information to a machine 212. In the embodiment schematically depicted in
[0338] As outlined above,
[0339] Similarly, as outlined above, the human-machine interface 182 may form part of an entertainment device 184. The machine 212, specifically the computer, may also form part of the entertainment device 184. Thus, by means of the user 200 functioning as the object 156 and/or by means of the user 200 handling a control device 198 functioning as the object 156, the user 200 may input at least one item of information, such as at least one control command, into the computer, thereby varying the entertainment function, such as controlling the course of a computer game.
LIST OF REFERENCE NUMBERS
[0340] 110 longitudinal optical sensor [0341] 112 transversal optical sensor [0342] 114 detector [0343] 116 layer setup [0344] 118 intrinsic semiconductor layer [0345] 120 first intrinsic semiconductor layer [0346] 122 second intrinsic semiconductor layer [0347] 124 p-type semiconductor layer [0348] 126 first p-type semiconductor layer [0349] 128 second p-type semiconductor layer [0350] 130 n-type semiconductor layer [0351] 132 first n-type semiconductor layer [0352] 134 second n-type semiconductor layer [0353] 136 PIN structure [0354] 138 first PIN structure [0355] 140 second PIN structure [0356] 142 light beam [0357] 144 electrode layers [0358] 146 photodiodes [0359] 148 longitudinal sensor region [0360] 150 first photodiode [0361] 152 second photodiode [0362] 154 evaluation device [0363] 156 object [0364] 158 insulating layer [0365] 160 spacer layer [0366] 162 substrate layer [0367] 164 optical axis [0368] 166 common electrode layer [0369] 168 current measuring device [0370] 170 connector [0371] 172 insulating layer [0372] 174 reflective electrode [0373] 176 camera [0374] 178 detector system [0375] 180 beacon device [0376] 182 human-machine interface [0377] 184 entertainment device [0378] 186 trading system [0379] 188 scanning system [0380] 190 illumination source [0381] 192 light beam [0382] 194 modulation device [0383] 196 housing [0384] 198 control device [0385] 200 User [0386] 202 transfer device [0387] 204 Lens [0388] 206 opening [0389] 208 direction of view [0390] 210 coordinate system [0391] 212 machine [0392] 214 track controller