COATING APPARATUS AND COATING METHOD
20190152866 ยท 2019-05-23
Inventors
Cpc classification
C04B2235/3246
CHEMISTRY; METALLURGY
C04B2235/3225
CHEMISTRY; METALLURGY
C23C24/10
CHEMISTRY; METALLURGY
B05C19/04
PERFORMING OPERATIONS; TRANSPORTING
C04B2235/3418
CHEMISTRY; METALLURGY
B05C19/008
PERFORMING OPERATIONS; TRANSPORTING
B28B17/026
PERFORMING OPERATIONS; TRANSPORTING
B05B7/226
PERFORMING OPERATIONS; TRANSPORTING
C04B2235/5436
CHEMISTRY; METALLURGY
International classification
C04B35/628
CHEMISTRY; METALLURGY
C04B35/48
CHEMISTRY; METALLURGY
B28B17/02
PERFORMING OPERATIONS; TRANSPORTING
B05C19/00
PERFORMING OPERATIONS; TRANSPORTING
B05C19/04
PERFORMING OPERATIONS; TRANSPORTING
Abstract
A coating apparatus is provided that includes: a mixer configured to generate mixed ceramic powder in which a material which contains an organic compound imparting lubricity to raw ceramic powder whose average particle size is smaller than or equal to 10 m and acts as an additive is mixed into the raw ceramic powder; a jetting device configured to jet the mixed ceramic powder toward a surface of a base material; and a heating device configured to heat the mixed ceramic powder jetted from the jetting device, and to evaporate the organic compound of the additive contained in the mixed ceramic powder.
Claims
1. A coating apparatus, comprising: a mixer configured to generate a mixed ceramic powder in which a material containing an organic compound that imparts lubricity to a raw ceramic powder whose average particle size is smaller than or equal to 10 m and acting as an additive is mixed into the raw ceramic powder; a jetting device configured to jet the mixed ceramic powder toward a surface of a base material; and a heating device configured to heat the mixed ceramic powder jetted from the jetting device, and to evaporate the organic compound of the additive contained in the mixed ceramic powder.
2. The coating apparatus according to claim 1, wherein the heating device heats the mixed ceramic powder jetted toward the surface of the base material by the jetting device before the jetted mixed ceramic powder reaches the surface of the base material, and evaporates the organic compound of the additive contained in the mixed ceramic powder.
3. The coating apparatus according to claim 1, wherein an average particle size of the additive is smaller than or equal to 10 nm.
4. The coating apparatus according to claim 3, wherein the raw ceramic powder contains at least yttria-stabilized zirconia.
5. The coating apparatus according to claim 3, wherein the additive contains globular silica and the organic compound provided on a surface of the globular silica.
6. The coating apparatus according to claim 5, wherein: the organic compound is phenylsilane; and the additive is formed by surface-treating the phenylsilane on the globular silica through a coupling reaction.
7. A coating method, comprising: a mixed ceramic powder-generating process of mixing a material containing an organic compound that imparts lubricity and acting as an additive into a raw ceramic powder whose average particle size is smaller than or equal to 10 m to generate a mixed ceramic powder; and a jet evaporating process of jetting the mixed ceramic powder toward a surface of a base material, and heating the jetted mixed ceramic powder to evaporate the organic compound contained in the additive.
8. The coating method according to claim 7, wherein the raw ceramic powder contains at least yttria-stabilized zirconia.
9. The coating method according to claim 7, wherein the additive contains globular silica and the organic compound provided on a surface of the globular silica.
10. The coating method according to claim 9, wherein: the organic compound is phenylsilane; and the additive is formed by surface-treating the phenylsilane on the globular silica through a coupling reaction.
11. A coating method, comprising: mixing a material containing an organic compound that imparts lubricity and acting as an additive into a raw ceramic powder whose average particle size is smaller than or equal to 10 m to generate a mixed ceramic powder; jetting the mixed ceramic powder toward a surface of a base material; heating the jetted mixed ceramic powder before the jetted mixed ceramic powder reaches the base material; evaporating and removing the organic compound contained in the additive of the mixed ceramic powder before the mixed ceramic powder reaches the base material; and causing the mixed ceramic powder from which the organic compound is removed to collide with the base material to form a coating.
12. The coating apparatus according to claim 4, wherein the additive contains globular silica and the organic compound provided on a surface of the globular silica.
13. The coating apparatus according to claim 12, wherein: the organic compound is phenylsilane; and the additive is formed by surface-treating the phenylsilane on the globular silica through a coupling reaction.
14. The coating apparatus according to claim 8, wherein the additive contains globular silica and the organic compound provided on a surface of the globular silica.
15. The coating apparatus according to claim 14, wherein: the organic compound is phenylsilane; and the additive is formed by surface-treating the phenylsilane on the globular silica through a coupling reaction.
Description
BRIEF DESCRIPTION OF THE DRAWINGS
[0032]
[0033]
[0034]
[0035]
[0036]
[0037]
[0038]
DETAILED DESCRIPTION OF EMBODIMENTS
[0039] Next, a coating apparatus in a first embodiment of this invention will be described with reference to the drawings. In the first embodiment, the coating apparatus for forming a coating using a cold spray method will be described by way of example.
[0040]
[0041] As illustrated in
[0042] The powder supply device 10 supplies a mixed ceramic powder P3 in which a raw ceramic powder P1 and an additive P2 are mixed to a jetting device 20. The powder supply device 10 includes a mixer 11 and a carrier gas supply unit 12.
[0043] The mixer 11 mixes the additive P2 with the raw ceramic powder P1, and generates the mixed ceramic powder P3. The mixer 11 has an internal space A that can contain the raw ceramic powder P1 and the additive P2, and can agitate the powder contained in the internal space A. Further, the mixer 11 is connected to the jetting device 20 via a carrier pipe 13 that carries the mixed ceramic powder P3 using a carrier gas G1 (to be described below), and can deliver the mixed ceramic powder P3 to the jetting device 20 along with the carrier gas G1.
[0044] As the raw ceramic powder P1 contained in the mixer 11, for example, a powder whose average particle size is smaller than or equal to 10 m can be used. Furthermore, the raw ceramic powder P1 may be a powder whose average particle size ranges from 10 nm to 10 m. As the raw ceramic powder P1, for example, yttria-stabilized zirconia (ZrO2-8 wt. % Y.sub.2O.sub.3), aluminum oxide (alumina), silica, titanium oxide (titania), or a mixture thereof may be used.
[0045] The additive P2 is formed of a material including an organic compound that imparts lubricity to the raw ceramic powder P1. As the additive P2, for example, an additive having an average particle size that is smaller than or equal to that of the raw ceramic powder P1 can be used. Furthermore, as the additive P2, for example, an additive whose average particle size is smaller than or equal to 10 nm can be used. As the additive P2, for example, an additive in which a globular ceramic powder (for example, globular silica) is coated with an organic compound (for example, phenylsilane) having a phenyl group by a coupling reaction can be used. The aforementioned average particle size is a value when an integration % of particle size distribution measured by a laser diffraction type particle size distribution measurement method is 50% (a median diameter of D50).
[0046] Here, in the case where the raw ceramic powder P1 is yttria-stabilized zirconia and the additive P2 contains globular silica, allowable strain of the formed coating varies depending on a percentage at which the globular silica is included. For this reason, a percentage occupied by the additive P2 in the mixed ceramic powder P3 need only be set to a percentage at which the allowable strain of the coating is not less than interfacial strain between a base material B and a coating formed on the base material B.
[0047]
[0048] In
[0049] As illustrated in
[0050] The jetting device 20 jets the mixed ceramic powder P3 toward a surface of the base material B. To be more specific, the jetting device 20 includes an acceleration nozzle such as a de Laval nozzle. The jetting device 20 is adopted such that the working gas is supplied from a working gas supply source (not shown). The jetting device 20 can accelerate the working gas G2, for example, to a supersonic velocity or the like using the acceleration nozzle. The jetting device 20 joins the mixed ceramic powder P3 with the accelerated working gas G2, and jets the mixed ceramic powder P3 along with the working gas G2.
[0051] The heating device 30 heats the mixed ceramic powder P3 jetted from the jetting device 20, and evaporates only an organic compound (an organic compound coating) of the additive P2 included in the mixed ceramic powder P3. Various types of heating devices 30 can be used as the heating device 30, such as a type in which a powder is heated by an arc or plasma. Here, evaporation of the raw ceramic powder P1 and the globular ceramic powder included in the additive P2 starts at a lower temperature than that of the organic compound coating of the globular ceramic powder. For this reason, a temperature to which the mixed ceramic powder P3 is heated by the heating device 30 is lower than that at which evaporation of the raw ceramic powder P1 and the globular ceramic powder starts, and need only be set to a temperature which is higher than a boiling point of the organic compound coating and at which the organic compound coating can be evaporated. It can be said that the temperature at which the organic compound coating can be evaporated is a temperature at which the organic compound coating can be removed from the mixed ceramic powder P3 by evaporating the organic compound coating.
[0052] A ceramic powder P4 from which the organic compound of the additive P2 is evaporated by passing through the heating device 30 collides with the base material B at a high speed, and thereby forms a ceramic coating C on the base material B.
[0053] The coating apparatus 100 in the first embodiment has the aforementioned constitution. Next, a coating method using the coating apparatus 100 will be described with reference to the drawings.
[0054]
[0055] As illustrated in
[0056] Next, a jet evaporating process (step S02) is performed. In the jet evaporating process, the mixed ceramic powder P3 is jetted toward the surface of the base material B at a high speed, and the jetted mixed ceramic powder P3 is heated to evaporate the organic compound contained in the additive P2. In this case, the carrier gas G1 that carries the mixed ceramic powder P3 is joined to the working gas G2 for jetting the mixed ceramic powder P3 from a nozzle of the jetting device 20.
[0057] The mixed ceramic powder P3 is jetted from the nozzle of the jetting device 20 by the working gas G2 after the carrier gas G1 is joined. The mixed ceramic powder P3 is heated by the heating device 30 simultaneously with or directly after the jetting, and the organic compound contained in the additive P2 is evaporated and removed. Here, vapor of the evaporated organic compound may be discharged from a discharge port (not shown) or the like that is provided separately from a jet orifice of the nozzle.
[0058] Afterward, a ceramic powder P4 from which the organic compound is evaporated and removed collides with the base material B to generate a coating C.
[0059]
[0060] The aforementioned jet evaporating process (step S02) includes four processes (steps S11 to S14) of
[0061] Therefore, according to the coating apparatus and the coating method of the first embodiment described above, in the case where the raw ceramic powder P1 whose average particle size is smaller than or equal to 10 m is used, the lubricity can be imparted to the raw ceramic powder P1 by the additive P2. For this reason, the cohesion of the mixed ceramic powder P3 in which the additive P2 is mixed into the raw ceramic powder P1 can be inhibited. For this reason, cohesion of a powder occurring in the inside or the like of the carrier pipe 13 between the mixer 11 and the jetting device 20 and causing, for example, stoppage of the apparatus can be inhibited.
[0062] Furthermore, only the organic compound of the additive P2 contained in the mixed ceramic powder P3 jetted from the jetting device 20 can be evaporated by the heating device 30. For this reason, the organic compound can be inhibited from being contained in the ceramic coating formed on the surface of the base material B.
[0063] As a result, the quality of the coating can be improved while inhibiting the cohesion of the raw ceramic powder P1.
[0064] Further, by setting the average particle size of the additive P2 to 10 nm or smaller, the additive P2 can be made sufficiently smaller than the raw ceramic powder P1. For this reason, the lubricity imparted by the additive P2 can be further improved.
[0065] Furthermore, in the case where the raw ceramic powder P1 contains at least yttria-stabilized zirconia, the coating C containing the yttria-stabilized zirconia can be densely formed to improve quality.
[0066] Moreover, phenylsilane is surface-treated on globular silica by a coupling reaction, and thereby lubricity can be imparted to the globular silica by the phenylsilane. Furthermore, since the phenylsilane is formed on a surface of the globular silica, a percentage at which phenylsilane is contained in the additive P2 can be made smaller than the case where the entire additive P2 is phenylsilane. As a result, the additive P2 can be easily evaporated by the heating device 30.
EXAMPLES
[0067] Next, examples based on the aforementioned coating method will be described.
Example 1
[0068] 1 wt % additive (Admanano YA010C-SP3, available from Admatechs Co. Ltd.) whose average particle size was 10 nm and in which a phenyl group was treated on a surface of globular silica by silane coupling was mixed into a raw ceramic powder P1 of yttria-stabilized zirconia whose average particle size was 3.0 m, and a mixed ceramic powder P3 was prepared.
[0069] Argon gas acting as a carrier gas carried the mixed ceramic powder P3, and was jetted by a jet heating device (RF-12040 (a high-frequency power supply), RF-56000 (a power supply operation panel), and RF-34041 (an automatic matching device)) that used the argon gas as a working gas. In this case, simultaneously with the jetting, the mixed ceramic powder P3 was heated to range from 400 C. or higher to 1000 C. or lower, and only phenylsilane was evaporated without melting the yttria-stabilized zirconia or the globular silica. A ceramic powder P4 from which the phenylsilane was evaporated collided with a base material B with a thermal barrier coating, and a coating formed mainly of yttria-stabilized zirconia was formed on the thermal barrier coating.
[0070] Afterward, a cross section of the coating formed on the base material B was observed with a scanning electron microscope (JXA-8230, available from JEOL Ltd.), and a percentage of visible impurities contained in the coating was measured.
Example 2
[0071] 1 wt % additive (Admanano YA010C-SP3, available from Admatechs Co. Ltd.) whose average particle size was 10 nm and in which a phenyl group was treated on a surface of globular silica by silane coupling was mixed into a raw ceramic powder P1 of yttria-stabilized zirconia whose average particle size was 1.4 m, and a mixed ceramic powder P3 was prepared.
[0072] Argon gas acting as a carrier gas carried the mixed ceramic powder P3, and was jetted by a jet heating device (RF-12040 (a high-frequency power supply), RF-56000 (a power supply operation panel), and RF-34041 (an automatic matching device)) that used the argon gas as a working gas. In this case, simultaneously with the jetting, the mixed ceramic powder P3 was heated to range from 400 C. or higher to 1000 C. or lower, and phenylsilane was evaporated without melting the yttria-stabilized zirconia or the globular silica. A ceramic powder P4 from which the phenylsilane was evaporated collided with a base material B with a thermal barrier coating, and a coating formed mainly of yttria-stabilized zirconia was formed on the thermal barrier coating.
[0073] Afterward, a cross section of the coating formed on the base material B was observed with a scanning electron microscope (JXA-8230, available from JEOL Ltd.), and a percentage of visible impurities contained in the coating was measured.
Example 3
[0074] 1 wt. % additive (Admanano YA010C-SP3, available from Admatechs Co. Ltd.) whose average particle size was 10 nm and in which a phenyl group was treated on a surface of globular silica by silane coupling was mixed into a raw ceramic powder P1 of mullite whose average particle size was 10.0 m, and a mixed ceramic powder P3 was prepared.
[0075] Argon gas acting as a carrier gas carried the mixed ceramic powder P3, and was jetted by a jet heating device (RF-12040 (a high-frequency power supply), RF-56000 (a power supply operation panel), and RF-34041 (an automatic matching device)) that used the argon gas as a working gas. In this case, simultaneously with the jetting, the mixed ceramic powder P3 was heated to range from 400 C. or higher to 1000 C. or lower, and phenylsilane was evaporated without melting the yttria-stabilized zirconia or the globular silica. A ceramic powder P4 from which the phenylsilane was evaporated collided with a base material B with a thermal barrier coating, and a coating formed mainly of yttria-stabilized zirconia was formed on the thermal barrier coating.
[0076] Afterward, a cross section of the coating formed on the base material B was observed with a scanning electron microscope (JXA-8230, available from JEOL Ltd.), and a percentage of visible impurities contained in the coating was measured.
Example 4
[0077] 1 wt. % additive (Admanano YA010C-SM1, available from Admatechs Co. Ltd.) whose average particle size was 10 nm and in which a methacrylic group was treated on a surface of globular silica by coupling was mixed into a raw ceramic powder P1 of yttria-stabilized zirconia whose average particle size was 3.0 m, and a mixed ceramic powder P3 was prepared.
[0078] Argon gas acting as a carrier gas carried the mixed ceramic powder P3, and was jetted by a jet heating device (RF-12040 (a high-frequency power supply), RF-56000 (a power supply operation panel), and RF-34041 (an automatic matching device)) that used the argon gas as a working gas. In this case, simultaneously with the jetting, the mixed ceramic powder P3 was heated to range from 400 C. or higher to 1000 C. or lower, and an organic compound of the surface was evaporated without melting the yttria-stabilized zirconia or the globular silica. A ceramic powder P4 from which the organic compound of the surface was evaporated collided with a base material B with a thermal barrier coating, and a coating formed mainly of yttria-stabilized zirconia was formed on the thermal barrier coating.
[0079] Afterward, a cross section of the coating formed on the base material B was observed with a scanning electron microscope (JXA-8230, available from JEOL Ltd.), and a percentage of visible impurities contained in the coating was measured.
Example 5
[0080] 1 wt. % additive (Admanano YA010C-SV1, available from Admatechs Co. Ltd.) whose average particle size was 10 nm and in which a vinyl group was treated on a surface of globular silica by coupling was mixed into a raw ceramic powder P1 of yttria-stabilized zirconia whose average particle size was 3.0 m, and a mixed ceramic powder P3 was prepared.
[0081] Argon gas acting as a carrier gas carried the mixed ceramic powder P3, and was jetted by a jet heating device (RF-12040 (a high-frequency power supply), RF-56000 (a power supply operation panel), and RF-34041 (an automatic matching device)) that used the argon gas as a working gas. In this case, simultaneously with the jetting, the mixed ceramic powder P3 was heated to range from 400 C. or higher to 1000 C. or lower, and an organic compound of the surface was evaporated without melting the yttria-stabilized zirconia or the globular silica. A ceramic powder P4 from which the organic compound of the surface was evaporated collided with a base material B with a thermal barrier coating, and a coating formed mainly of yttria-stabilized zirconia was formed on the thermal barrier coating.
[0082] Afterward, a cross section of the coating formed on the base material B was observed with a scanning electron microscope (JXA-8230, available from JEOL Ltd.), and a percentage of visible impurities contained in the coating was measured.
[0083] (Cohesive Property)
[0084] In Examples 1 to 5, when the coating was continuously formed, the mixed ceramic powder P3 did not cohere, a good carried state was maintained, and the coating could be continuously formed.
[0085] (Quality of Coating)
[0086] In Examples 1 to 5, when the cross section of the coating formed on the thermal barrier coating was observed, a dense ceramic coating whose porosity was less than 1% was confirmed.
[0087] That is, in Examples 1 to 5, both the cohesive property and the quality of the coating were good.
Second Embodiment
[0088] Next, a second embodiment of this invention will be described. In the second embodiment, the case where a range of the additive rate of the additive P2 of the first embodiment described above depends on interfacial strain will be given as an example. For this reason, in the description of the second embodiment, the same portions as in the first embodiment are given the same reference signs, and detailed description overlapping with that of the first embodiment will be omitted.
[0089]
[0090] As in the first embodiment, the interfacial strain shown in
i=fs=T(fs)(1)
[0091] Here, f is a linear expansion coefficient (1/K) of the coating C, and s is a linear expansion coefficient (1/K) of the surface layer of the base material B. AT is an amount of change in a temperature (for example, from room temperature to about 700 C.) within a usage environment temperature of the coating C.
[0092] The linear expansion coefficient of the coating C can be expressed by Equation (2) below.
f=aX+s(1X)(2)
[0093] Here, a is a linear expansion coefficient (1/K) of the additive P2, and X is an additive rate (%) of the additive P2.
[0094] As illustrated in
[0095] The coating efficiency (vs 0 wt. %, and indicated by an alternate long and two short dashes line in
[0096] For example, in the case where the allowable strain is set to 0.060% as an allowable range of the quality (durability) of the coating C, the additive rate of the additive P2 becomes 3.80 wt. % or lower. Here, the allowable strain is an upper limit of the interfacial strain. The allowable strain value of 0.060% is a value obtained by a heat cycle durability test, and is an upper limit of the allowable strain which can inhibit the coating C from being peeled off to an allowable extent.
[0097] In the case where the allowable strain is set to 0.023%, the additive rate of the additive P2 becomes 1.31 wt. % or lower. The allowable strain value of 0.023% is also a value obtained by the heat cycle durability test. The allowable strain of 0.023% is an upper limit of the allowable strain for preventing the coating from being peeled off. In other words, the value is an upper limit of the range of the interfacial strain which makes the quality (durability) of the coating C more reliable.
[0098] For example, if the additive rate of the additive P2 (silica whose particle size is 10 nm) to the raw ceramic powder P1 (whose average particle size is 3 m) is set to 3.80 wt. % or lower, the coating efficiency can be improved, and the quality (durability) of the coating C can be set within an allowable range.
[0099] Furthermore, the additive rate of the additive P2 (silica whose particle size is 10 nm) to the raw ceramic powder P1 (whose average particle size is 3 m) is set to 0.75 wt. % or higher and 1.31 wt. % or lower, and thereby the quality (durability) of the coating C can be made more reliable while securing a two-fold or more coating efficiency.
[0100] Next, a third embodiment of this invention will be described. In the third embodiment, the case where the range of the additive rate of the additive P2 of the first embodiment described above depends on a relationship between the interfacial strain and the adhesive force will be given as an example. For this reason, in the description of the third embodiment, the same portions as in the first embodiment are given the same reference signs, and detailed description overlapping with that of the first embodiment will be omitted.
[0101]
[0102] Here, as in the first embodiment, adhesive force shown in
[0103] The interfacial strain shown in
[0104]
[0105] As illustrated in
[0106] For example, in the case where an upper limit of the adhesive force (hereinafter referred to as allowable adhesive force) is 2.5 kPa in order to set the occurrence of a phenomenon such as clogging or pulsation in the apparatus within an allowable range, the additive rate of the additive P2 is 0.1 wt. % or higher.
[0107] Further, in the case where the allowable adhesive force is 2.0 kPa in order to secure a reliable supply more without causing the phenomenon such as clogging or pulsation in the apparatus, the additive rate of the additive P2 is 0.75 wt. % or higher.
[0108] For example, if the additive rate of the additive P2 (silica whose particle size is 10 nm) to the raw ceramic powder P1 (whose average particle size is 3 m) is set to 0.10 wt. % or higher, the cohesion of the mixed ceramic powder P3 is inhibited, and the occurrence of the phenomenon such as clogging or pulsation in the apparatus resulting from low fluidity of the mixed ceramic powder P3 can be set within the allowable range.
[0109] Further, if the additive rate of the additive P2 to the raw ceramic powder P1 is set to 0.75 wt. % or higher (adhesive force of 2 kPa or lower) and 1.31 wt. % or lower (interfacial strain of 0.023% or lower), the supply stability of the mixed ceramic powder P3 can be secured without the occurrence of the phenomenon such as clogging or pulsation in the apparatus resulting from low fluidity of the mixed ceramic powder P3. In addition, since the interfacial strain can be inhibited, conditions of the quality (durability) of the coating C can be satisfied more reliably.
[0110] This invention is not limited to the constitution of each of the aforementioned embodiments, and enables a change in design without departing from the gist or teaching thereof.
[0111] For example, the case where the coating is formed by the cold spray method has been described in each of the aforementioned embodiments, but the present invention is not limited thereto. For example, other cold spray methods such as an aerosol deposition method, a powder jet deposition method, and so on may be applied.
[0112] Further, in each of the aforementioned embodiments, a coating method performed without melting the raw ceramic powder P1 has been described by way of example, but the raw ceramic powder P1 may be slightly melted.
[0113] While preferred embodiments of the invention have been described and illustrated above, it should be understood that these are exemplary of the invention and are not to be considered as limiting. Additions, omissions, substitutions, and other modifications can be made without departing from the spirit or scope of the present invention. Accordingly, the invention is not to be considered as being limited by the foregoing description, and is only limited by the scope of the appended claims.
EXPLANATION OF REFERENCES
[0114] 10 Powder supply device [0115] 11 Mixer [0116] 12 Carrier gas supply unit [0117] 13 Carrier pipe [0118] 14 Pipe [0119] 20 Jetting device [0120] 30 Heating device [0121] P1 Raw ceramic powder [0122] P2 Additive [0123] P3 Mixed ceramic powder [0124] G1 Carrier gas [0125] G2 Working gas [0126] B Base material [0127] C Coating