Method and device for the production of highly charged ions
10297413 ยท 2019-05-21
Assignee
Inventors
- Vladimir Petrovich Ovsyannikov (Dresden, DE)
- Andrei Vladimirovich Nefiodov (Gatchina Leningrad district, RU)
- Oleg Kostantinovich Kultashev (Fryazino Moscow district, RU)
Cpc classification
H01J27/205
ELECTRICITY
International classification
Abstract
The invention relates to a novel ion source, which uses method for the production of highly charged ions in the local ion traps created by an axially symmetric electron beam in the thick magnetic lens. The highly charged ions are produced in the separate local ion traps, which are created as a sequence of the focuses (F.sub.1, F.sub.2, and F.sub.3) of the electron beam (EB) rippled in the magnetic field (B(z)). Since the most acute focus is called the main one, the ion source is classified as main magnetic focus ion source (MaMFIS/T), which can also operate in the trapping regime. The electron current density in the local ion traps can be much greater than that in the case of Brillouin flow. For the ion trap with length of about 1 mm, the average electron current density of up to the order of 100 kA/cm.sup.2 can be achieved. Thus it allows one to produce ions in any charge state for all elements of the Periodic Table. In order to extract the ions, geometry of the electron beam is changed to a relatively smooth electron beam by setting the potential of the focusing electrode (W) of the electron gun negative with respect to the potential of the cathode (C).
Claims
1. A method for a production of highly charged ions in local ion traps by generating an electron beam with a variable radius propagating through a drift tube in a longitudinal magnetic field, wherein both the geometry of electron gun and the distribution of magnetic field of a single thick magnetic lens with the field strength of from 0 to 200 Gauss at cathode for focusing the electron beam are determined, so that the electron beam is focused in any one of a first three magnetic optical focuses or in a sequence of three sharpest optical focuses in the trapping mode and the distribution of magnetic field is determined, so that the electron beam is transformed into the beam without ripples in an extraction mode, if potential of a focusing Wehnelt electrode becomes negative with respect to the potential of a cathode.
2. The method according to claim 1, wherein the extraction mode comprises extracting highly charged ions in the axial direction of the cylindrical drift tube, when a negative voltage is applied to the focusing electrode, so that the electron beam is smoothed.
3. The method according to claim 1, wherein the extraction mode comprises extracting highly charged ions in the axial direction of the conical drift tube, whose angle of the cone expansion defines slope of the extraction potential.
4. A device for a production of highly charged ions, consisting of three parts, an electron gun unit, an ionization chamber with a focusing magnet system, and an unit of electron collector with anode and ion optics, such that the parts are connected therebetween either via two z-axis linear manipulators or are fixed together, without using the z-line manipulators, wherein a first z-axis manipulator is installed between the electron gun unit and the ionization chamber and designed to change the position of the electron gun in the magnetic field and the cathode-anode distance of the electron gun and wherein a second z-axis manipulator is installed between the ionization chamber and an assembly of an anode, an electron collector, and an extractor and designed to change the gap between the anode and the cathode of the electron gun in the case of fixed position of the cathode in magnetic field.
5. The device according to claim 4, wherein the electron gun unit is designed to pump out the entire source in the axial direction and wherein a cathode of the electron gun is insulated from a focusing Wehnelt electrode in order to control the behavior of the electron beam.
6. The device according to claim 5, wherein the ionization chamber is provided with a number of observation ports in a middle plane perpendicular to the z-axis and at least some of these ports are occupied by high-voltage feedthroughs with ceramic insulation.
7. The device according to claim 5, wherein the anode, the electron collector and the extractor are mounted into a separate unit with at least one high-voltage feedthrough, wherein a cylindrical iron shield with longitudinal channels for high-voltage feedthroughs and additional pumping surrounds a water-cooled electron collector.
8. The device according to claim 4, wherein the ionization chamber is provided with a number of observation ports in a middle plane perpendicular to the z-axis and at least some of these ports are occupied by high-voltage feedthroughs with ceramic insulation.
9. The device according to claim 8, wherein the anode, the electron collector and the extractor are mounted into a separate unit with at least one high-voltage feedthrough, wherein a cylindrical iron shield with longitudinal channels for high-voltage feedthroughs and additional pumping surrounds a water-cooled electron collector.
10. The device according to claim 4, wherein the anode, the electron collector and the extractor are mounted into a separate unit with at least one high-voltage feedthrough, wherein a cylindrical iron shield with longitudinal channels for high-voltage feedthroughs and additional pumping surrounds a water-cooled electron collector.
Description
DETAILED DESCRIPTION OF THE DRAWINGS
(1) The method of the invention is explained in more details by examples below. The accompanying pictures are given as follows:
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(13) The method of invention is schematically illustrated in
(14) The invention with the conical anode A is shown in
(15) In the following a device according to the invention will be described as shown in
(16) The ion source I (
(17) The base of design of the complete installation is the ionization chamber with magnetic focusing system.
(18) All other parts of the ion source I are built up regarding the line of this unit. The first z-linear manipulator M1 changes the position of the cathode C in the magnetic field (see
(19) The magnetic focusing system can be constructed either as an electromagnet (including superconducting magnet) or on the basis of radial permanent magnets. The focusing system (
(20) The electron gun is installed in the cylindrical vacuum chamber V (see
(21) The anode A, electron collector, and extractor E are located in cylindrical vacuum chamber V (see
LIST OF REFERENCE SYMBOLS
(22) A anode B(z) magnetic field distribution of thick magnetic lens C cathode D drift tube E extractor electrode EB electron beam F1, F2, F3 optical focus, position of a local ion trap (electron beam crossover) G electron gun I ion source M1, M2 manipulator MF magnetic field O ion output R1, R2 half ring Uc potential of cathode Uf potential of focusing electrode V vacuum chamber W focusing (Wehnelt) electrode z axis along the electron beam C1, C2 half cylinder L thick magnetic lens