SINGLE-PIECE REACTION VESSEL MADE OF GLASS, PRODUCTION METHOD, AND ANALYSIS METHOD
20220388897 · 2022-12-08
Inventors
- Robin Krüger (Hannover, DE)
- Malte Schulz-Ruhtenberg (Wunstorf, DE)
- Jan Van Aalst (Garbsen, DE)
- Moritz Woller (Neustadt, DE)
Cpc classification
C03C27/06
CHEMISTRY; METALLURGY
International classification
Abstract
A method of production of glass reaction vessels includes irradiating a laser beam of a wavelength for which a first glass plate is transparent onto the surface of the first glass plate. The first hiss plate is etched. Etching of the first glass plate is terminated when the recesses extend, over only a portion of the thickness of the first glass plate and therefore the recesses have a bottom formed in the first glass plate as a single piece.
Claims
1. A method of production of a plurality of glass reaction vessels formed as recesses in a single-piece first glass plate, comprising the steps of: irradiation of laser pulses at spaced positions of a wavelength for which the glass plate is transparent onto in each case the locations of the glass plate at which in each case a recess is to be produced as a reaction vessel, the focal position of the laser pulses being adjusted such that the focus of the laser pulses does not extend over the entire thickness of the first glass plate, etching the glass plate for a duration of time sufficient to create recesses having a depth along the locations to create the recesses, wherein the etching of the glass plate is terminated when the depth of the recesses is only a portion of the thickness of the first glass plate and therefore the recesses a bottom formed single-piece in the first glass plate, wherein a concave depression is formed in the bottom at each position of a location.
2. The method according to claim 1, wherein the depth of the recesses is at least 30 μm.
3. The method according to claim 1, wherein the recesses an aspect ratio of at least 2 from depth to diameter measured in the plane of the first surface.
4. The method according to claim 1, irradiated with laser pulses at a plurality of equally spaced positions at the locations at which a recess is to be produced.
5. The method according to claim 1, wherein at a share of the positions laser pulses are irradiated less deeply into a first thickness section into the first glass plate by adjusting the focus position of the laser pulses so that the focus of the laser pulses extends only into the first thickness section, and at a share of the positions laser pulses are irradiated deeper into an adjacent second thickness section in the first glass plate by adjusting the focal position of the laser pulses such that the focus of the laser pulses extends only into the second thickness section, wherein during etching a recess extending over the first thickness section is formed and partial recesses spaced by partial walls and extending over the second thickness section are formed.
6. The method according to claim 1, wherein positions are arranged at a distance of at maximum 10 μm, wherein at least three positions are spaced by at least 20 μm from one another.
7. The method according to claim 1, wherein the laser pulses are irradiated onto the glass plate with an intensity such that they modify the glass plate up to the focal position.
8. The method according to claim 1, wherein a laser beam is irradiated along a circumferentially closed path at the locations of the first glass plate where a recess is to be produced.
9. The method according to claim 8, wherein the laser beam, which is irradiated on a circumferentially closed path, is formed by laser beam pulses irradiated side by side.
10. The method according to claim 1, wherein at least one side of the first glass plate is coated with an etching resist prior to the etching.
11. of the method according to claim 10, wherein the etching is performed until a chamfer circling the recess is formed adjacent to the surface coated with etch resist.
12. The method according to claim 1, wherein strip conductors are applied to the glass plate which cover at least a portion of the inner wall of the recesses.
13. Reaction vessels formed as recesses of glass comprising a depth of the recesses of at least 30 μm in a glass plate and an aspect ratio of at least 2 of depth to diameter measured in the plane of a first surface of the glass plate (1), wherein the recesses are enclosed by walls the end faces of which the end faces are arranged in a common plane and form the first surface of the first glass plate from which the recesses are worked off, wherein the recesses do not extend over the entire thickness of the glass plate and the bottoms of the recesses are formed by material of the glass plate and at least three concave depressions are formed in the bottom of at least one recess in each case.
14. Reaction vessels according to claim 13, wherein the bottoms of the reaction vessels are formed by adjacent recesses arranged side by side in a plane parallel to the first surface and parallel to the plane of the second surface opposite thereto.
15. Reaction vessels according to claim 13, comprising least one further recess formed in the bottoms of the recesses that extends to a greater depth into the first glass plate.
16. Reaction vessels according to claim 13, wherein the bottoms have at least one glass tip formed in a single piece from the first glass plate for use as an optical waveguide for near-field illumination of the recess, which tip extends into the recess perpendicularly to the first surface of the first glass plate.
17. (canceled)
18. (canceled)
Description
[0044] The figures show schematically in
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[0051] As shown in
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TABLE-US-00001 List of reference signs: 1 Glass plate 2 Recess 2′ Partial recess 3 Bottom 4 First surface 5 Second surface 7 longitudinal center axis 8 Etch resist 11 Glass tip 12 Position of irradiated laser pulse 13 Position of deeper irradiated laser pulse 14
Further recess 20 Upper, first thickness section 21 Lower, second thickness section Z Cell