SOLAR SELECTIVE COATING

Abstract

An exemplary solar selective coating can be provided to be deposited on a substrate. The exemplary solar selective coating can comprise an adhesion layer, an absorber stack comprising at least one absorber layer, and an antireflection stack which can comprise at least one antireflection layer, e.g., all provided in a sandwich configuration. The sandwich configuration can provide the adhesion layer deposited onto the substrate, the absorber stack deposited on the adhesion layer, and the antireflection stack deposited on the absorber stack. The adhesion layer can comprise a metallic layer comprising molybdenum and titanium.

Claims

1-22. (canceled)

23. A solar selective coating configured to be deposited on a substrate, the solar selective coating comprising: an adhesion layer; an absorber stack comprising at least one absorber layer; and an antireflection stack comprising at least one antireflection layer, wherein the adhesion layer, the absorber stack and the antireflection stack are provided in a sandwich construction in which the adhesion layer is deposited on the substrate, the absorber stack is deposited on the adhesion layer, and the antireflection stack deposited on the absorber stack, and wherein the adhesion layer comprises a metallic layer comprising a refractory metal and a dope-material, the dope-material comprising a metal or a metalloid, the metallic layer being configured with an amorphous disordered structure.

24. The solar selective coating according to claim 23, wherein the adhesion layer comprises a metallic layer comprising molybdenum and titanium.

25. The solar selective coating according to claim 23, wherein the adhesion layer has an adhesion layer thickness in a range of 30 nm to 500 nm.

26. The solar selective coating according to claim 25, wherein the range is 80 nm to 200 nm.

27. The solar selective coating according to claim 26, wherein the range is 110 nm to 130 nm

28. The solar selective coating according to claim 23, wherein the adhesion layer comprises a metallic layer comprising 85-99% (w/w) Mo and 1-15% (w/w) Ti.

29. The solar selective coating according to claim 28, wherein the adhesion layer comprises a metallic layer comprising 90-97% (w/w) Mo and 3-10% (w/w) Ti.

30. The solar selective coating according to claim 29, wherein the adhesion layer comprises a metallic layer comprising 95-96% (w/w) Mo and 4-5% (w/w) Ti.

31. The solar selective coating according to claim 23, wherein the at least one absorber layer comprises at least one of a ceramic composition or a metallic composition comprising elements selected from the group consisting of: aluminium, nitrogen, titanium, oxygen or combinations thereof.

32. The solar selective coating according to claim 23, wherein the at least one antireflection layer comprises a ceramic composition comprising elements selected from the group consisting of: at least one silicon nitride, at least one silicon oxide, at least one aluminium nitride, at least one aluminium oxide, at least one titanium oxide or combinations thereof.

33. The solar selective coating according to claim 23, wherein the sandwich construction comprises a three-layer sandwich structure, wherein: the adhesion layer has a 110-130 nm thickness, the adhesion layer comprising a metallic layer comprising 85-99% (w/w) Mo and 1-15% (w/w) Ti, the absorber stack configured with a single absorber layer comprising a 110-130 nm titanium aluminium nitride layer, and the antireflection stack configured with a single antireflection layer comprising at least one 50-70 nm silicon nitride layer.

34. The solar selective coating according to claim 23, wherein the sandwich construction comprises a four-layer sandwich structure, wherein: the adhesion layer comprises a 110-130 nm thickness, the adhesion layer comprising a metallic layer comprising 85-99% (w/w) Mo and 1-15% (w/w) Ti, the absorber stack is configured with a single absorber layer comprising a 60-80 nm titanium aluminium nitride layer, and a single semi-absorber layer comprising a 20-40 nm titanium aluminium oxynitride layer, and the antireflection stack is configured with a single antireflection layer comprising at least one 70-90 nm silicon oxide layer.

35. A solar absorber, comprising: a solar selective coating deposited on a substrate, the solar selective coating comprising: an adhesion layer; an absorber stack comprising at least one absorber layer; and an antireflection stack comprising at least one antireflection layer, wherein the adhesion layers, the absorber stack and the antireflection stack are provided in a sandwich construction in which the adhesion layer is deposited on the substrate, the absorber stack is deposited on the adhesion layer, and the antireflection stack deposited on the absorber stack, wherein the adhesion layer comprises a metallic layer comprising a refractory metal and a dope-material, the dope-material comprising a metal or a metalloid, the metallic layer being configured with an amorphous disordered structure, and wherein a surface of the substrate is a pre-polished surface, and the substrate comprises at least one high temperature stable metallic alloy.

36. The solar absorber according to claim 35, wherein the substrate comprises a thermal absorber configuration.

37. The solar absorber according to claim 35, wherein the substrate comprises a pressure formed thermal absorber configuration configured with a thermal absorber panel which comprises at least two joinable sheets joined by high pressure joints, the thermal absorber panel comprising at least one flow channel, at least one inlet, and at least one outlet, and wherein the at least one flow channel is a pressure expanded flow channel.

38. A method for making a solar selective coating configured to be deposited on a substrate by a vacuum deposition process, comprising: providing the substrate which is pre-polished; depositing an adhesion layer onto the pre-polished substrate; depositing an absorber stack onto the adhesion layer one layer at a time; and depositing an antireflection stack onto the absorber stack one layer at a time, wherein the adhesion layer comprises a metallic layer comprising a refractory metal and a dope-material, the dope-material comprising a metal or a metalloid, and wherein the metallic layer is configured with an amorphous disordered structure.

39. The method according to claim 38, wherein the adhesion layer comprises a metallic layer comprising molybdenum and titanium.

40. The method according to claim 38, wherein the adhesion layer is deposited onto the substrate by: providing a base pressure of less than 1E-4 mbar, providing a substrate temperature above 50 C.; providing a process pressure of less than 1E-1 mbar by providing a protective atmosphere to a process chamber of an instrument grade argon gas prior to a deposition of the adhesion layer by a vacuum deposition process; and performing the vacuum deposition process.

41. The method according to claim 38, wherein the absorber stack is deposited onto the adhesion layer by: providing a base pressure of less than 1E-4 mbar, providing a substrate temperature above 50 C., providing a process pressure of less than 1E-1 mbar by providing a protective atmosphere to a process chamber of an instrument grade argon gas prior to the deposition of the adhesion layer by a vacuum deposition process, and performing the vacuum deposition process using at least one reactive gas selected from the group consisting of: instrument grade oxygen, instrument grade nitrogen and using a partial pressure of the at least one reactive gas of 1E-6 to 5E-4 mbar.

42. The method according to claim 38, wherein the anti-reflection stack is deposited onto the absorber stack by: providing a base pressure of less than 1E-4 mbar, providing a substrate temperature above 50 C, providing a process pressure of less than 1E-1 mbar by providing a protective atmosphere to a process chamber of an instrument grade argon gas prior to the deposition of the adhesion layer by a vacuum deposition process, and performing the vacuum deposition process using at least one reactive gas selected from the group consisting of: instrument grade oxygen, instrument grade nitrogen and using a partial pressure of the at least one reactive gas of 1E-6 to 5E-4 mbar.

43. A method for making a solar selective coating configured to be deposited on a substrate for a vacuum deposition process, comprising: ion etching of a surface of the substrate with an ion gun using a process pressure in the range of 1E-5 bar to 5E-2 bar, and argon gas as an ionization gas; providing a temperature of above 100 C. to the substrate; sputtering for a deposition of an adhesion layer comprising a metallic layer that comprises molybdenum and titanium using a process pressure in the range of 1E-3 bar to 1E-2 bar, and argon as a sputtering gas; sputtering for a deposition of a titanium aluminium nitride layer using a process pressure in the range of 1E-3 to bar 1E-2 bar, argon as the sputtering gas, and nitrogen as a reactive gas using a partial pressure of the reactive gas in the range of 1E-6 to 5E-4 mbar; and sputtering for a deposition of at least one silicon nitride layer using a process pressure in the range of 1E-3 bar to 1E-2 bar, argon as the sputtering gas, and nitrogen as the reactive gas using a partial pressure of the reactive gas in the range of 1E-6 to 5E-4 mbar wherein: the solar selective coating further comprising (a) an absorber stack comprising at least one absorber layer, and (b) an antireflection stack comprising at least one antireflection layer, wherein the adhesion layer, the absorber stack and the antireflection stack are provided in a sandwich construction in which the adhesion layer is deposited on the substrate, the adhesion layer has a 110-130 nm thickness, the adhesion layer comprising a metallic layer comprising 85-99% (w/w) Mo and 1-15% (w/w) Ti, the absorber stack configured with a single absorber layer comprising a 110-130 nm titanium aluminium nitride layer, and the antireflection stack configured with a single antireflection layer comprising at least one 50-70 nm silicon nitride layer.

44. A method for making a solar selective coating configured to be deposited on a substrate for a vacuum deposition process, comprising: ion etching of a surface of the substrate with an ion gun using a process pressure in the range of 1E-5 bar to 5E-2 bar, and argon gas as an ionization gas; providing a temperature of above 100 C. to the substrate; sputtering for a deposition of an adhesion layer comprising a metallic layer that comprises molybdenum and titanium using a process pressure in the range of 1E-3 bar to 1E-2 bar, and argon as a sputtering gas; sputtering for a deposition of a titanium aluminium nitride layer using a process pressure in the range of 1E-3 to bar 1E-2 bar, argon as the sputtering gas, and nitrogen as a reactive gas using a partial pressure of the reactive gas in the range of 1E-6 to 5E-4 mbar; and sputtering for a deposition of at least one silicon nitride layer using a process pressure in the range of 1E-3 bar to 1E-2 bar, argon as the sputtering gas, and nitrogen as the reactive gas using a partial pressure of the reactive gas in the range of 1E-6 to 5E-4 mbar wherein: the solar selective coating further comprising (a) an absorber stack comprising at least one absorber layer, and (b) an antireflection stack comprising at least one antireflection layer, wherein the adhesion layer, the absorber stack and the antireflection stack are provided in a sandwich construction in which the adhesion layer is deposited on the substrate, the adhesion layer comprises a 110-130 nm thickness, the adhesion layer comprising a metallic layer comprising 85-99% (w/w) Mo and 1-15% (w/w) Ti, the absorber stack is configured with a single absorber layer comprising a 60-80 nm titanium aluminium nitride layer, and a single semi-absorber layer comprising a 20-40 nm titanium aluminium oxynitride layer, and the antireflection stack is configured with a single antireflection layer comprising at least one 70-90 nm silicon oxide layer.

45. A process for providing a solar absorber by depositing a solar selective coating via a vacuum deposition process onto a thermal absorber configuration, comprising: providing a pre-polished substrate; preparing a surface of the substrate by ion-etching; depositing an adhesion layer onto the substrate surface; depositing an absorber stack onto the adhesion layer one layer at a time; and depositing an antireflection stack onto the absorber stack one layer at a time, wherein the adhesion layer comprises a metallic layer comprising a refractory metal and a dope-material, the dope-material comprising a metal or metalloid, the metallic layer being configured with an amorphous disordered structure.

46. The process according to claim 45, wherein the adhesion layer comprises a metallic layer comprising molybdenum and titanium.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

[0223] Further exemplary embodiments of the present disclosure are detailed in the description of the Figures, where this description shall not limit the scope of the present disclosure. The Figures show:

[0224] FIG. 1 is a cross-sectional side view of an exemplary structure of the solar selective coating;

[0225] FIG. 2A is a cross-sectional side view of an exemplary four-layer stack with solar selective coating deposited on a substrate;

[0226] FIG. 2B is a cross-sectional side view of an exemplary three-layer stack with solar selective coating deposited on the substrate;

[0227] FIG. 3A is a cross-sectional side view of an exemplary substrate surface with surface roughness comprising a micro roughness;

[0228] FIG. 3B is a cross-sectional side view of an exemplary substrate surface with surface roughness comprising a macro roughness;

[0229] FIG. 4 is a graph showing a rate of corrosion of solar absorbers with substrate surfaces prepared by different techniques;

[0230] FIG. 5 is a graph of a calculated reflectance (A) versus wavelength for a four-layer solar selective coating and the Solar insolation AM1.5 spectrum (B) versus wavelength;

[0231] FIGS. 6A-6D are perspective view of different constructions of spherical thermal absorber configurations(s);

[0232] FIG. 7A is a cross-sectional view of a planar thermal absorber configuration of one exemplary embodiment according to the present disclosure;

[0233] FIG. 7B is a cross-sectional view of the planar thermal absorber configuration of another exemplary embodiment according to the present disclosure;

[0234] FIG. 8 is a flow diagram of a method for making a solar selective coating by a vacuum deposition process according to an exemplary embodiment of the present disclosure;

[0235] FIG. 9 is a flow diagram of a method for depositing the adhesion layer onto the substrate according to an exemplary embodiment of the present disclosure; and

[0236] FIG. 10 is a flow diagram of a method for depositing the absorber stack or the antireflection stack onto the substrate according to an exemplary embodiment of the present disclosure.

[0237] Throughout the figures, the same reference numerals and characters, unless otherwise stated, are used to denote like features, elements, components or portions of the illustrated embodiments. Moreover, while the subject disclosure will now be described in detail with reference to the figures, it is done so in connection with the illustrative embodiments. It is intended that changes and modifications can be made to the described embodiments without departing from the true scope and spirit of the subject disclosure as defined by the appended claims.

DETAILED DESCRIPTION OF EXEMPLARY EMBODIMENTS

[0238] FIG. 1 illustrates a cross-sectional side view of an exemplary structure of the solar selective coating 10 according to an exemplary embodiment of the present disclosure. The exemplary solar selective coating 10 comprises an adhesion layer 30, an absorber stack 40, and an antireflection stack 60. The solar selective coating 10 constitutes a sandwich construction 70 configured with the adhesion layer 30 which may be deposited onto a substrate 20, the absorber stack 40 deposited on the adhesion layer 30 and the antireflection stack 60 deposited on the absorber stack 40. The absorber stack 40 comprises at least one absorber layer 42 and may comprise additional absorber layers 42 or semi-absorber layers 44. The antireflection stack 60 comprises at least one antireflection layer 62 and may comprise additional antireflection layers 62. The solar selective coating 10 comprises one surface constituting the boundary to the ambient surroundings and may be a solar selective surface 12. This surface is opposite to the surface of the antireflection stack 60 constituting the boundary to the absorber stack 40. The adhesion layer 30 comprises a metallic layer comprising a refractory metal 36 and dope-material 34. The metallic layer is configured with an amorphous disordered structure 32.

[0239] FIGS. 2A and 2B illustrate side cross-sectional views of solar selective coatings 10 deposited on a substrate 20. For example, FIG. 2A shows an exemplary four-layer stack 114 comprising an adhesion layer 30, an absorber layer 42, a semi-absorber layer 44 and an antireflection layer 62. The solar selective coating 10 constitutes a sandwich construction 70 configured with the adhesion layer 30 deposited on a substrate 20, the absorber layer 42 deposited on the adhesion layer 30, the semi-absorber layer 44 deposited on the absorber layer 42 and the antireflection layer 62 deposited on the semi-absorber layer 44.

[0240] FIG. 2B shows an exemplary three-layer stack 112 comprising an adhesion layer 30, an ab-sorber layer 42, and an antireflection layer 62. The solar selective coating 10 consti-tutes a sandwich construction 70 configured with the adhesion layer 30 deposited on a substrate 20, the absorber layer 42 deposited on the adhesion layer 30, and the antireflection layer 62 deposited on the absorber layer 42.

[0241] The exemplary individual layers of the selective coatings may be described by a layer thickness 80 and refractive index of the individual layers 100 provided in the solar selective coating 10. The interfaces between the layers may be described by boundary conditions by which reflectance and absorbance of incident radiation on the solar selective coating 10 may be calculated through the coating using classical optical theory.

[0242] FIGS. 3A and 3B illustrate side cross-sectional view of a substrate 20 comprising a substrate surface 22 with surface roughness 120. For example, FIG. 3A illustrates an exemplary substrate surface 22 comprising micro rough-ness 122 and macro roughness 124. FIG. 3B illustrates an exemplary polished substrate surface 22 comprising only macro roughness 124 after the polishing surface treatment. The substrate surface 22 may be polished using ion-etching 228.

[0243] A raw and also a pre-polished 230 substrate surface may comprise tips and edges of nano and micro sizes. By polishing the substrate surface 22 the surface structure may be changed to comprise rounded and smoothed tips and edges upon which the solar selective coating 10 may be deposited.

[0244] The graph shown in FIG. 4 illustrates a rate of corrosion of solar absorbers versus substrate surface roughness obtained by different techniques of substrate preparation and for solar absorbers with different solar selective coatings. The surface roughness can be measured as arithmetic average Ra using a Bruker Dektak XT profilometer. The measurements are performed using a setting of the cut-off filter to about 0.8 m.

[0245] The exemplary measurements are performed as accelerated corrosion measurements and are performed by use of an Avesta cell with Biologic potentiostat/galvanostat. The test samples are tested in a mild solution (pH 6.0) of sodium chloride, sodium acetate trihydrate and acetic acid, balanced with water. The test procedure is performed using a first anodic test sequence and second a cathodic test sequence, during which test sequences the potential is varied from 10V to +10V and concurrently measuring the current across the test samples. The measured current represents the ongoing corrosion process. The procedure and apparatus used for the accelerated corrosion measurements are well-known to a person skilled in the art.

[0246] The exemplary test samples are as follows:

[0247] A: Standard tube without a solar selective coating

[0248] B: Electro-polished tube without a solar selective coating

[0249] C: Standard tube deposited with solar selective coating A

[0250] D: Grinded and electro-polished tube deposited with solar selective coating A

[0251] E: Polished and electro-polished tube deposited with solar selective coating A

[0252] F: Electro-polished tube deposited with solar selective coating A

[0253] Solar selective coating A comprises a four-layer sandwich structure deposited using VDP (240). The coating comprises a 120 nm thick adhesion layer comprising a metallic layer comprising 95% Mo (w/w) and 5% Ti (w/w), a 70 nm thick titanium aluminium nitride absorber layer, a 30 nm thick titanium aluminium oxynitride semi-absorber layer, and a 80 nm thick silicon oxide(s) antireflection layer.

[0254] The test samples comprising electro-polished tubes deposited with solar selective coating A shows a significant improvement in regard to decreased corrosion rate.

[0255] Furthermore, the measurements show that test samples without solar selective coating but with different surface preparations show a significant improvement in regard to decreased corrosion rate only by use of smoothing the substrate surface for example by electro-polishing.

[0256] Thus, the exemplary performed measurement shows that smoothing the substrate surface and subsequently depositing a solar selective coating A is found, in a surprising extent, to improve the corrosion properties.

[0257] FIG. 5 illustrates an exemplary graph of a calculated reflectance (A) versus a wavelength for a four-layer solar selective coating and the Solar insolation AM1.5 spectrum (B) versus wavelength. The exemplary four-layer solar selective coating comprises a 120 nm thick adhesion layer comprising a metallic layer comprising 95% Mo (w/w) and 5% Ti (w/w), a 70 nm thick titanium aluminium nitride absorber layer, a 30 nm thick titanium aluminium oxynitride semi-absorber layer, and a 80 nm thick silicon oxide(s) antireflection layer and is the coating also used for the measurement shown in FIG. 4.

[0258] The reflectance of the exemplary four-layer solar selective coating is calculated using a matrix formalism algorithm based on boundary conditions and based on input of the reflective indices of individual layer materials 90 and sequence of the individual layers 100 at a temperature of 350 C. The four-layer solar selective coating is calculated to obtain an optical absorption of 93% of the Solar insolation AM 1.5 spectrum.

[0259] For various exemplary embodiments of the present disclosure, usable solar selective coatings may be chosen from the range of solutions with a calculated optical absorption >80% of the spectrum Solar insolation AM 1.5 and an emittance <30% at a temperature of 350 .sup.c.

[0260] FIGS. 6A-6D illustrate perspective view of different constructions of spherical thermal absorber configuration(s) 420. An exemplary circular tube 422 is illustrated in FIG. 6A with the outer surface being the substrate surface 210 onto which the solar selective coating 10 may be deposited. The inner surface may constitute the flow channel 460. FIG. 6B illustrates an exemplary non-circular tube 424 with the outer surface being the substrate surface 210 onto which the solar selective coating 10 may be deposited. The inner surface may constitute the flow channel 460. FIG. 6C illustrates an exemplary double walled tube 426 which may be described as comprising two tubes: a large diameter tube and a small diameter tube with the small diameter tube placed inside and parallel to the large diameter tube. The outer surface of the double walled tube 426, being the substrate surface 210 onto which the solar selective coating 10 may be deposited. The inner surface of the small diameter tube may constitute one flow channel 460 which preferably is not used for heat conduction. The annular channel between the two tubes may also constitute a flow channel 460. FIG. 6D illustrates an exemplary pillow-plate tube 428, which is a pillow-plate bend into a tube-shape. The pillow-plate comprises two plates joined together to form internal flow channels 460 and thus, like the double walled tube 426 the pillow-plate tube 428 comprises the internal flow channels 460 within the pillow-plate and a flow channel 460 encircled by the pillow-plate which preferably is not used for heat conduction.

[0261] FIGS. 7A and 7B illustrate two exemplary embodiments of a planar thermal absorber configuration(s) 430. FIG. 7A shows an exemplary flat thermal absorber configuration 434, and FIG. 7B shows an exemplary pressure formed thermal absorber configuration 436.

[0262] The flat thermal absorber configuration 434 illustrated in FIG. 7A comprises circular tubes 422 mechanically connected to a sheet 432. The circular tubes 422 are configured with flow channels 460 and the surface of the sheet 432 facing away from the circular tubes 422 comprises the substrate surface 210 for the solar selective coating 10 and thus the surface facing the sun, illustrated by solar insolation 186 onto the surface.

[0263] In FIG. 7B, the exemplary pressure formed thermal absorber configuration 436 comprises two sheets 432 joined by high-pressure joints. The pressure formed thermal absorber configuration 436 constitutes flow channels 460 comprised between the two sheets 432. The surface of the pressure formed thermal absorber configuration 436 facing towards the solar insolation 186 constitutes the substrate surface 210 for the solar selective coating 10.

[0264] The thermal transfer from the flat thermal absorber configuration 434 in FIG. 7A may be lower than the thermal transfer obtainable by the pressure formed thermal absorber configuration 436 in FIG. 7B because of the direct contact of the fluid with the flat sheet 432 comprising the solar selective coating 10. For the flat thermal absorber configuration 434, the flat sheet 432 comprising the solar selective coating 10 can only be connected in the areas connecting the tubes to the sheet 432 and furthermore, the thermal contact to the fluid is thus indirect from the sheet to the fluid through the tube walls.

[0265] FIG. 8 illustrates a flow diagram of a method for making (302) a solar selective coating by a vacuum deposition process 240 according to an exemplary embodiment of the present disclosure. For example, a pre-polished 230 substrate 20 can be provided onto which the adhesion layer 30 is deposited 320. The absorber stack 40 is deposited 320 onto the adhesion layer 30. In case the absorber stack 40 comprises multiple layers the individual layers 100 are deposited one layer at a time. The antireflection stack 60 is deposited 320 onto the absorber stack 40. In case the antireflection stack 60 comprises multiple layers the individual layers 100 are deposited one layer at a time.

[0266] FIG. 9 illustrates a flow diagram of a method 302 for depositing the adhesion layer 30 onto the substrate according to an exemplary embodiment of the present disclosure as part of the method for making a solar selective coating. For example, the adhesion layer 30 can be deposited 320 by a vacuum deposition process 240 and the method 302 comprises several acts. A base pressure 190 and a substrate temperature 200 is provided 340. Prior to deposition of the adhesion layer by the vacuum deposition process 240 a process pressure 188 is provided 340 by adding a protective atmosphere to the process chamber. The deposition is performed 350 by a vacuum deposition process 240.

[0267] FIG. 10 illustrates a flow diagram of a method 302 for depositing the absorber stack 40 or the antireflection stack 60 onto the substrate 20 according to an exemplary embodiment of the present disclosure as part of the method for making a solar selective coating. For example, the exemplary method can comprise similar procedures as the method for performing the adhesion layer deposition. The absorber or antireflection stack is deposited by a vacuum deposition process 240 wherein a base pressure 190 and a substrate temperature 200 is provided 340. Prior to deposition of the adhesion layer by the vacuum deposition process 240 a process pressure 188 is provided 340 by adding a protective atmosphere to the process chamber. The deposition is performed 350 by a vacuum deposition process 240. This act may be performed several times if the stack comprises multiple layers.

EXEMPLARY LIST OF REFERENCE SIGNS

[0268]

TABLE-US-00001 10 solar selective coating 12 solar selective surface 20 substrate 22 substrate surface 30 adhesion layer 32 amorphous disordered structure 34 dope-material 36 refractory metal 40 absorber stack 42 absorber layer 44 semi-absorber layer 60 antireflection stack 62 antireflection layer 70 sandwich construction 80 layer thickness 82 adhesion layer thickness 90 layer material 100 individual layers 112 three-layer stack 114 four-layer stack 120 surface roughness 122 micro roughness 124 macro roughness 186 solar insolation 188 process pressure 190 base pressure 200 substrate temperature 210 substrate surface 220 surface preparation 228 ion-etching 230 pre-polished 240 vacuum deposition process 250 ion gun 260 sputtering 300 method for depositing 302 method for making 310 preparing 320 depositing 330 etching 340 providing 350 performing 400 solar absorber 402 thermal absorber means 420 spherical thermal absorber means 422 circular tube 424 non-circular tube 426 double walled tube 428 pillow-plate tube 430 planar thermal absorber means 432 sheet 434 flat thermal absorber means 436 pressure formed thermal absorber means 440 embossed thermal absorber means 460 flow channel