Isotope tagging for workpiece authentication
10269464 ยท 2019-04-23
Assignee
Inventors
Cpc classification
Y10T428/24802
GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
H04W12/00
ELECTRICITY
G01N2458/15
PHYSICS
International classification
G09F3/00
PHYSICS
Abstract
A method of assisting with authenticating a workpiece is provided. In another aspect, ions are generated, accelerated in an accelerator, an isotope is created, and then the isotope is implanted within a workpiece to assist with authenticating of the workpiece. A further aspect includes a workpiece substrate, a visual marker and an isotope internally located within the substrate adjacent the visual marker.
Claims
1. A method of assisting with authenticating a workpiece, the method comprising: (a) generating ions; (b) accelerating the ions in an accelerator with an energy of at least 100 A-MeV and a beam power of at least 1 kW; (c) creating an accelerated isotope from the accelerated ions; and (d) implanting the accelerated isotope in the workpiece to assist with the authenticating of the workpiece.
2. The method of claim 1, wherein the accelerating of the ions occurs by using a facility comprising a superconducting cyclotron accelerator.
3. The method of claim 2, wherein the generating of the ions occurs by using one of: (a) an electron cyclotron resonance source or (b) an electron beam ion source.
4. The method of claim 2, wherein the generating of the ions occurs by using one of: (a) microwaves in a low pressure gas, or (b) thermionic emissions of electrons to ionize a base material in its gaseous state.
5. The method of claim 2, wherein the ions are rare heavy ions.
6. The method of claim 1, further comprising using a gamma ray detector with keV energy resolution to nondestructively identify at least one of: (a) the isotope, or (b) a position of the isotope, to assist in the authenticity of the workpiece after the implanting step.
7. The method of claim 1, further comprising placing a removable mask, having a unique hole pattern, against the workpiece and emitting the accelerated isotope through the hole pattern before the implanting step.
8. The method of claim 1, further comprising using different combinations of rare isotopes to create customizable workpiece identifiers in additional workpieces.
9. The method of claim 1, further comprising applying a visual marker to the workpiece adjacent to a location of the isotope implantation.
10. The method of claim 1, wherein the creating of the accelerated isotope comprises fragmenting the accelerated ions to create a fragmented isotope and then re-accelerating the fragmented isotope.
11. The method of claim 1, wherein the workpiece includes a painting on canvas and the isotope penetrates into and is implanted inside the workpiece between 5 mm and 1 micron deep from an entry surface thereof.
12. The method of claim 1, wherein the workpiece is metallic and the isotope penetrates into and is implanted inside the workpiece between 5 mm and 1 micron deep from an entry surface thereof.
13. A method of assisting with authenticating workpieces, the method comprising: (a) generating ions; (b) accelerating the ions in a superconducting cyclotron accelerator; (c) creating a first combination of rare isotopes and a second combination of rare isotopes; (d) transmitting the first combination of rare isotopes through holes in at least one removable mask toward a first of the workpieces; (e) transmitting the second combination of rare isotopes through the holes in the at least one removable mask toward a second of the workpieces; and (f) causing the first and second combinations of rare isotopes to penetrate into the respective workpieces between 5 mm and 1 micron deep from an entry surface of each of the workpieces adjacent the mask, wherein the first and second combinations of rare isotopes are different, which creates unique authenticating indications.
14. The method of claim 13, wherein each of the rare isotopes has a measurable and precise alpha or gamma decay emission, but not a beta decay emission.
15. The method of claim 13, wherein the generating of the ions occurs by using one of: (a) an electron cyclotron resonance source or (b) an electron beam ion source.
16. The method of claim 13, wherein the generating of the ions occurs by using one of: (a) microwaves in a low pressure gas, or (b) thermionic emissions of electrons to ionize a base material in its gaseous state.
17. The method of claim 13, further comprising using an isotope ratio mass spectrometer to nondestructively identify at least one of: (a) the first or second combinations of rare isotopes, or (b) a position of the first or second combinations of rare isotopes, to assist in the authenticity of the workpieces after the implanting step.
18. The method of claim 13, further comprising applying a visual marker to each of the workpieces adjacent to a location of implantation of the first or second combinations of rare isotopes.
19. A workpiece comprising: (a) a pre-made workpiece substrate; (b) a visual marker; and (c) rare isotopes internally located within the pre-made substrate adjacent the visual marker, the rare isotopes providing a customized identifier based on at least one of: a pattern, quantity, isotope combinations, or half-life; (d) the rare isotopes having: the half-life of at least three months; a precise and measurable alpha or gamma decay emission; a unique isotope signature; and wherein the rare isotopes are a combination of rare isotopes including at least one of: .sup.148.sub.64Gd, .sup.194.sub.76Os, .sup.60.sub.26Fe, .sup.126.sub.50Sn, .sup.228.sub.88Ra, or .sup.210.sub.82Pb.
20. The workpiece of claim 19, wherein: the combination of the rare isotopes is arranged in a unique pattern implanted within the substrate between 5 mm and 1 micron deep from an entry surface thereof.
Description
BRIEF DESCRIPTION OF THE DRAWINGS
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DETAILED DESCRIPTION
(10) The present method, workpiece and system are shown in
(11) A high value workpiece 51 is an original artwork, such as a painting, print, photograph, sculpture, vase, tapestry, document or the like. Alternately, workpiece is an antique, jewelry, watch, vintage automobile component such as an engine block, or other such expensive or one-of-a-kind object that is prone to having forgeries or false reproductions made thereof. In the painting workpiece 51 example used herewith, a substrate 53 is canvas with an aesthetic painted layer 55 on a front surface. If a sculpture, substrate 53 includes the clay or ceramic material. If jewelry or an automobile component, substrate 53 may be a metal structure.
(12) First, a visual marker 57 is placed in a small area on a backside of workpiece 51, such as by printing, painting or any other manner which will last for decades without significant degradation or harm to aesthetic painted layer 55. Marker 57 provides a visual point for the authenticator to begin seeking the isotope tag. One or more metallic masks 59 are temporarily placed against marker 57. Each mask 59 is a lead plate of about 2-10 mm thick with one or more holes 61 therethrough. Workpiece 51 is then placed in a fixture within isotope tagging station 39. A hollow and elongated beam pipe 63 is sealed against mask 59.
(13) A beam of heavy ions is generated from source 23 and accelerated to approximately half the speed of light by cyclotrons 25 and 27. Nuclear reactions occur at the beginning of the fragment separator 29 to create the desired isotope. The desired isotope 71 is selected by the fragment separator and then transported for use in a beam pipe or optionally travel through catcher 31 and are slowed down in helium gas stopper 33. Optionally, isotopes 71 are thereafter re-accelerated in linear accelerator 37 to create a precise workpiece-penetration speed. Isotopes from the fragment separator or optionally reaccelerated isotopes 71 then travel through pipe 63 and those isotopes aligned with holes 61 in mask 59, penetrate into and are implanted between 5 mm and 1 micron deep, and more preferably at or between 1 mm and 10 microns inside workpiece 51 relative to the backside surface thereof adjacent pipe 63.
(14) Multiple masks 59 with different hole quantities or patterns (as shown in
(15) Referring to
(16) While various embodiments have been disclosed, other embodiments may fall within the scope of the present invention. For example, the mask can have alternate external and/or hole shapes, such as elongated slots of straight or curved shapes. Additional or alternate accelerator, separator, catcher, stopper and jet equipment may be used as long as the facility is not commonly available and can produce rare isotopes accelerated with the above-specified energies and beam powers; such alternate equipment may lead to difference rates of isotope production as compared to