THIN-FILM CATALYST WITH ENHANCED CATALYST-SUPPORT INTERACTIONS

Abstract

An efficient, stable catalyst material having a thin film catalyst supported on a support of metal carbide, nitride, oxide, carbonitride, oxycarbonitride core. The thin film catalyst is covalently bonded to the support.

Claims

1. A catalyst material comprising: a support comprising a material selected from metal carbides, nitrides, oxides and combination thereof; and a thin film covalently bonded to the support, the thin film having a thickness of 0.5 to 5.0 nm, the thin film comprising a catalytic metal selected from the group consisting of platinum-group metals, platinum-group metal oxides, transition metals, transition metal oxides, and combinations thereof.

2. The catalyst of claim 1, wherein the support structure consists of carbides selected from the group consisting of titanium carbide, tantalum carbide, and zirconium carbide.

3. The catalyst of claim 1, wherein the support is free of elemental carbon.

4. The catalyst of claim 3, wherein the support consists of nanoparticles.

5. The catalyst of claim 4, wherein the support has an effective diameter of 10 nm to 500 nm.

6. The catalyst of claim 5, wherein the support has an effective diameter of 40 nm to 60 nm.

7. The catalyst of claim 1, wherein the thin film encapsulates the support.

8. The catalyst of claim 1, comprising a plurality of thin films deposited on the support as patches.

9. The catalyst material of claim 1, included in a proton-exchange membrane fuel cell (PEMFC).

10. The catalyst material of claim 1, including in a unitized reversible or regenerative fuel cell (URFC).

11. A fuel cell comprising: a catalytic material comprising: a support comprising a material selected from metal carbides, nitrides, oxides and combination thereof; and a thin film covalently bonded to the support, the thin film having a thickness of 0.5 to 5.0 nm, the thin film comprising a catalytic metal selected from the group consisting of platinum-group metals, platinum-group metal oxides, transition metals, transition metal oxides, and combinations thereof; wherein the thin film interacts with the support through Strong Metal Support Interactions.

12. The fuel cell of claim 11, wherein the support structure consists of carbides selected from the group consisting of titanium carbide, tantalum carbide, and zirconium carbide.

13. The fuel cell of claim 11, wherein the support is free of elemental carbon.

14. The fuel cell of claim 13, wherein the support consists of nanoparticles.

15. The fuel cell of claim 14, wherein the support has an effective diameter of 10 nm to 500 nm.

16. The fuel cell of claim 11, wherein the thin film encapsulates the support.

17. The fuel cell of claim 11, comprising a plurality of thin films deposited on the support as patches.

18. The fuel cell material of claim 11, included in a proton-exchange membrane fuel cell (PEMFC).

19. The fuel cell material of claim 11, including in a unitized reversible or regenerative fuel cell (URFC).

20. A method of making a catalyst material comprising: providing a plurality of a nanoparticles comprising a support material selected from metal carbides, nitrides, oxides and combination thereof; and depositing on the plurality of nanoparticles a thin film covalently bonded to the support material, the thin film having a thickness of 0.5 to 5.0 nm, the thin film comprising a catalytic metal selected from the group consisting of platinum-group metals, platinum-group metal oxides, transition metals, transition metal oxides, and combinations thereof.

Description

BRIEF DESCRIPTION OF DRAWINGS

[0024] The foregoing and other features of the present disclosure will become more fully apparent from the following description and appended claims, taken in conjunction with the accompanying drawings. Understanding that these drawings depict only several implementations in accordance with the disclosure and are therefore, not to be considered limiting of its scope, the disclosure will be described with additional specificity and detail through use of the accompanying drawings.

[0025] FIG. 1A shows conventional PtNP/C, and FIG. 1B shows TF/MCNO based on one embodiment.

[0026] FIGS. 2A-2F illustrate micrographs of sample deposits. Samples of these atomic layer deposition (ALD) thin film Pt deposited on MCNO powder supports were analyzed by ICP-MS to determine the concentrations of platinum. Measurements were made with a Perkin Elmer/SCIEX ELAN DRCII ICP-MS calibrated with standards prepared from NIST traceable solution procured from Ultra Scientific. Reported data were calculated from the ICP-MS concentration data, the volume of the prepared solution, and the mass of sample taken.

[0027] FIG. 3 shows that PtITiC is the best among the systems investigated followed closely by PtTiO.sub.2C and PtTiN in terms of loss of catalyst active surface area with an accelerated stress test of potential cycling between 1.0 and 1.5V at 500 mV/s.

[0028] FIGS. 4A-F illustrate composite figures. The left column represents the cyclic voltammograms (CVs) used to determine catalyst electrochemically-active surface area (ECA) while the right column shows the cyclic voltammograms used to determine the ORR activity. The CVs and ORR curves prove the presence of Pt ECA and ORR activity.

[0029] FIGS. 5A and 5B illustrate the current density results for the Pt/TiN and Pt/TiC powders, respectively.

[0030] FIG. 6 is a graph of HOR voltammograms for the polycrystalline Pt RDE disk, Pt/TiO.sub.2 (ANL-1), Pt/TiN (ANL-2), and a commercial 46 wt % Pt on a high surface area carbon (Pt/HSC) from Tanaka.

[0031] FIG. 7 is a bar graph of HOR peak current for the Pt RDE disk and for Pt/TiO.sub.2 (ANL-1), Pt/TiN (ANL-2), and Pt/HSC at different loadings. L1=110 ?g-Pt/cm.sup.2, L2=56 ?g-Pt/cm.sup.2, L3=38 ?g-Pt/cm.sup.2, and L4=19 ?g-Pt/cm.sup.2.

[0032] FIG. 8 shows raw voltammograms for high surface area OER catalysts. IrO.sub.2 09-1324 and 09-1328 are experimental unsupported IrO.sub.2 powders. Conditions: 1.0-1.7V, 10 mV/s, 1600 rpm, 0.1M HClO.sub.4.

[0033] FIG. 9 shows graphs of double layer charging current-corrected voltammograms for high surface area OER catalysts. IrO.sub.2 09-1324 and IrO.sub.2 09-1328 are experimental unsupported IrO.sub.2 powders. Conditions: 1.0-1.7V, 10 mV/s, 1600 rpm, 0.1M HClO.sub.4.

[0034] FIG. 10 shows a comparison of OER onset potentials, defined as potential at which the OER current density reaches 0.25 mA/cm.sup.2.sub.geo, for the various powder catalysts. IrO.sub.2 90-1324 and IrO.sub.2 90-1328 are experimental unsupported IrO.sub.2 powders.

[0035] FIG. 11 shows a comparison of ECA loss for the Pt/TiO.sub.2 and Pt/TiN during potential cycling from 1.0 to 1.7V at 50 mV/s (900 rpm, deaerated 0.1M HClO.sub.4). ECA decay for Pt/HSC is included for comparison.

[0036] FIGS. 12A and 12B show a comparison of ECA loss for the Pt/TiO.sub.2 and Pt/TiN catalysts during potential cycling from 0.6 to 1.7V (FIG. 12A) and 0.6 to 1.0V (FIG. 12 B) (50 mV/s, 900 rpm, deaerated 0.1M HClO.sub.4).

[0037] FIGS. 13A-13D show counts per second as a function of binding energy (eV recorded from XPS measurements using a Thermo-Fisher k-alpha spectrometer).

[0038] FIGS. 14A and 14B show the silicon reference sample for TiO.sub.2 (5 nm) nanopowder for comparison purposes to the experimental thin film material. As can be seen in the figures, the powder supports agglomerated.

[0039] FIGS. 15A-15C show counts per second as a function of binding energy (eV) for Ir.

[0040] FIGS. 16A-16C show counts per second as a function of binding energy (eV) of IrPt.

[0041] Reference is made to the accompanying drawings throughout the following detailed description. In the drawings, similar symbols typically identify similar components, unless context dictates otherwise. The illustrative implementations described in the detailed description, drawings, and claims are not meant to be limiting. Other implementations may be utilized, and other changes may be made, without departing from the spirit or scope of the subject matter presented here. It will be readily understood that the aspects of the present disclosure, as generally described herein, and illustrated in the figures, can be arranged, substituted, combined, and designed in a wide variety of different configurations, all of which are explicitly contemplated and made part of this disclosure.

DETAILED DESCRIPTION OF VARIOUS EMBODIMENTS

[0042] Embodiments described herein relate generally to a thin film catalyst with fine-tuned catalyst and support interactions for enhanced activity and durability (see FIG. 1 for schematic). A thin film of catalytic metal, typical a platinum group metal, on a metal carbide, nitride, and/or oxide support.

[0043] This invention relates to addressing both the stability and cost issues associated with the traditional unsupported IrO.sub.2 OER catalyst by forming a conformal and thin coating of IrO.sub.2, or another suitable electrocatalyst, on a high-surface-area, electronically-conductive, stable support using ALD. This invention also relates to forming a conformal and thin coating of a mixture of Pt and IrO.sub.2, or other suitable electrocatalyst, on a high-surface-area, electronically-conductive, stable support using ALD for URFC OER/HER or OER/ORR electrodes.

[0044] One aspect relates to materials and apparatus having a thin film on a support material. Supports are metal carbide, metal nitride, and/or oxides (TF/M.sub.1M.sub.2 C.sub.xN.sub.yO.sub.z) chosen to have strong interactions and favorable interactions with catalytic metal and stability in the catalytic environment. FIG. 1B shows views of the structure of one embodiment of a catalyst 100. A core material 110 comprises MCNO while a thin film 120 is bonded to the exterior surface of the core material 110. Additional conductive MCNO materials 90 may be provided to interact with the thin film coated catalyst material 100.

[0045] Another aspect relates to methods for forming the thin film on the support material. Specifically, in one embodiment, ALD is utilized to form thin, conformal films with strong interactions with the support materials.

Support Material

[0046] The catalyst support is chosen from metal carbide, nitride, oxide, carbonitride, oxycarbonitride and combination thereof. The nature of support material is such that it is stable in an electrochemical environment relevant to the HOR, ORR, and OER. While electrical conductivity in support is desirable, it is not required for TF/MCNO as the catalyst thin film can take on the function of conducting electrons in and out of active sites.

[0047] Titanium, Tantalum, and Zirconium Carbides (TIC, TaC, ZrC) are shown to be electrochemically stable for ORR and OER. Transition metal nitrides (TMN) also show high corrosion resistance in electrochemical systems. In particular Titanium Nitride (TiN) has an enhanced onset corrosion potential of +3V vs. SHE over TiC with an onset potential of +2V vs. SHE. In contrast, the oxidation of carbon as used in conventional PtNP/C systems is thermodynamically possibly at an onset potential of +0.207 vs. SHE. Transition Metal Oxides (TMO.sub.x) are also highly stable in OER and ORR environment but suffer from low electrical conductivity. For this reason, doping with other transition metal oxides is favored to induce electrical conductivity in these materials.

[0048] Overall, using a single metal mixed nitride, carbide, oxide (MCNO) or multi-metal mixed nitride, carbide, oxide (such as M.sub.1x.sub.1M.sub.2x.sub.2 C.sub.yN.sub.zO.sub.w, where M1 and M2 are metals and where one of y, z, and w are greater than 0, preferably more than one of y, z, and w are greater than 0) makes for not only a durable catalyst support but generates a plethora of prospects to fine-tune selectivity and catalytic activity for the reaction under consideration through SMSI. It is postulated that these reactions are not limited to ORR and OER.

Thin Film Catalyst Deposition

[0049] A preferred method to deposit catalyst thin film on the MCNO is to use ALD. ALD is unique in its ability to create ultra-thin films of metals (e.g., Pt, Ir, Ru) or other materials, such as transition metal oxides (e.g., TiO.sub.2, ZrO.sub.2), transition metal nitrides (e.g., TiN, TaN, WN), and chalcogenides (e.g. MoS.sub.2, Al.sub.2S.sub.3, Cu.sub.2S) on powdered substrates to make catalytic objects based on TF/MCNO.

[0050] Physical vapor deposition techniques, including sputtering and electron beam deposition, are not suited to particle coatings as they are line-of-sight dependent. Chemical vapor deposition techniques are not self-limiting and therefore result in much thicker films (hundreds of nanometers).

[0051] Wet chemical techniques have clearly been developed for the deposition of platinum by the catalyst industry, but require significant energy input to remove the liquid phase after deposition. Also, unlike ALD films, which are covalently bonded to the surface, wet impregnation results in physisorption of the metal to the surface. This weak bonding causes the resulting catalyst structure to be in the form of nanoparticles and/or islands. These weakly bonded particles and islands can migrate and sinter, reducing the dispersion and effective surface area of the platinum. ALD Pt films have been shown to be more stable with time and temperature cycling because of the covalent bonding and also more catalytically active than Pt deposited by incipient wetness techniques. ALD utilizes a series of alternating surface reactions to deposit a film one atomic layer at a time. The key is that only one precursor is present in the reactor at a time, and that the precursor cannot react with itself. The result is self-limiting deposition with atomic layer control of a film that is covalently bonded to the surface. ALD is also line-of-sight independent. It will deposit anywhere that the precursors can diffuse in the gas phase.

[0052] In one embodiment, a catalyst material is provided in the form of a catalyst thin film on catalyst support. Catalyst material is chosen from PGM or PGM oxide, transition metal, transition metal oxide, or any combination thereof. For instance, the PGM may be Pt, Ir, Ru, Re, Os, Pt, or Rh, or any combination of these metals or the corresponding oxides. The transition metal may be V, Cr, Mn, Fe, Co, Ni, Cu, Nb, Mo, Ta, or W, or any combination of these metals or their oxides. Catalyst support material is chosen from transition metal carbides, nitrides, oxides and combination thereof. Catalyst support material does not contain carbon in its elemental form. Catalyst support material has dimensions larger than 10 nm in effective diameter but smaller than 500 nm. A preferred size is in the range of 40-60 nm. Thin films of Pt/PGM catalyst can either totally encapsulate the support or can cover the support in patches of thin films. Patches of thin films on catalyst support are preferably >10 nm in diameter and between 0.5 to 5 nm in thickness. Thin film catalyst interacts with the support through SMSI which includes electron transfer to/from support as well as lattice compression/expansion. SMSI enables catalytic activity and selectivity to be fine-tuned for the desired reaction. SMSI can be adjusted through a combination of catalyst support size, chemical composition, and phase. Ozone can be used as the co-reactant for the ALD of the catalyst material when the desired material is a metal oxide, or a noble metal. In certain cases, ozone is more effective compared to oxygen and facilitates faster reactions and lower deposition temperatures.

[0053] In one embodiment, as noted above, the thin film is deposited by ALD. The ALD process may include exposing the substrate to a first metal precursor for a first predetermined time and a first partial pressure of the first metal precursor so that the metal precursor deposits on, coats, or infiltrates at least a portion of the base material and binds with the base material. The metal precursor may be any suitable beta-diketonate, chloride, fluoride, iodide, alkyl amide, cylopentadiene, substituted cylopentadiene, alkoxy, amidinate, guanidinate, carbonyl, or heteroleptic compound of the metals listed in [0042]. For example, the metal precursor may be Palladium (II) hexafluoroacetylacetonate, Copper bis(2,2,6,6-tetramethyl-3,5-heptanedionate), Copper(II) hexafluoroacetylacetonate hydrate, Nickel bis(2,2,6,6-tetramethyl-3,5-heptanedionate), Iron tris(2,2,6,6-tetramethyl-3,5-heptanedionate), Manganese tris(2,2,6,6-tetramethyl-3,5-heptanedionate), Molybdenum dioxide bis(2,2,6,6-tetramethyl-3,5-heptanedionate), Cobalt tris(2,2,6,6-tetramethyl-3,5-heptanedionate), Copper (II) acetylacetonate, Nickel (II) acetylacetonate, MoO2 bis-acetylacetonate, Rhodium (III) acetylacetonate, Iridium(III) acetylacetonate, Niobium pentachloride, Niobium (V) iodide, Vanadium (V) Oxytriisopropoxide, Niobium pentaethoxide, Tantalum (V) ethoxide, Iron (III) ethoxide, Iron(III) tert-butoxide dimer, Bis(cyclopentadienyl) ruthenium, Bis(cyclopentadienyl) nickel, Bis(ethylcyclopentadienyl) nickel, Bis(cyclopentadienyl) cobalt, (Trimethyl) methylcyclopentadienyl platinum (IV), 2,4-(dimethylpentadienyl)(ethylcyclopentadienyl) ruthenium, Bis(ethylcyclopentadienyl) ruthenium (II), Ferrocene, Cyclohexadiene iron tricarbonyl, Bis(ethylcyclopentadienyl) manganese, Tungsten hexafluoride, Tantalum (V) fluoride, Molybdenum hexafluoride, Niobium pentafluoride, Bis(N,N-diisopropylacetamidinato)copper(I), Bis(N,N-di-sec-butylacetamidinato)dicopper(I), AccuDEP Cobalt (Et)/Cobalt amidinate, or AccuDEP Iron/iron amidinate.

[0054] The background pressures used during the ALD, that is to say the pressure when no precursor is being dosed, can be in the range of 1e-10 Torr to 1000 Torr (e.g. 1e-10, 1e-8, 1e-6, 1e-4, 1e-3, 0.01, 0.1, 1, 10, 100, or 1000 Torr, inclusive of all ranges and values between). The first predetermined time can be in the range of 0.1 second to 500 seconds (e.g., 0.1, 0.5, 1, 5, 10, 20, 30, 40, 50, 60, 70, 80, 90, 100, 120, 140, 160, 180, 200, 220, 240, 260, 280, 300, 350, 400, 450 or 500 seconds, inclusive of all ranges and values between). In some embodiments, the first predetermined time is in the range of 0.1 and 10 seconds, for example about 5 seconds. The first partial pressure of the first metal precursor can be in the range of 0.01 Torr to 10 Torr. (e.g., 0.01, 0.05, 0.1, 0.5, 1.0, 5.0, 10 Torr, inclusive of all ranges and values therebetween). The ALD on the powder can be performed using a fixed powder bed, a fluidized bed where the fluidization is performed using gas flow, mechanical vibration, or a combination of the two, a rotating drum, or a moving bed. In addition to the temporal ALD described above, the coating may be performed using spatial ALD. The spatial ALD may be implemented using a moving bed, a rotating platform, or a roll-to-roll system if the powder is attached to a moving web using a binder.

[0055] In some embodiments, the ALD reactor and/or substrate material can be heated to a predetermined temperature during the ALD process. For example, the first predetermined temperature can be in the range of 25-450? C. (e.g., 25, 30, 40, 50, 60, 70, 80, 90, 100, 110, 120, 130, 140, 150, 160, 170, 180, 190, 200, 250, 300, 300, 350, 400, or 450? C., inclusive of all ranges and values therebetween).

[0056] In some embodiments, the second ALD coreactant is oxygen, hydrogen, hydrogen peroxide, ozone, ammonia, hydrazine, alkyl-substituted hydrazine, trimethyl-aluminum, or any mixtures thereof. In other embodiments, the ALD coreactant can be a plasma containing any of the aforementioned chemicals, or mixtures thereof, and also containing one or more noble gases.

[0057] Any number of cycles of exposing the coating to the first metal precursor and the second co-reactant precursor can be performed to reach a desired film thickness and density of bindings sites on the substrate. Between the precursor exposures the ALD reactor may be evacuated or purged with inert gas for a fixed time to remove or sweep away any unreacted precursor of gaseous reaction product. The purge times may be in the range of 0.1 second to 500 seconds (e.g., 0.1, 0.5, 1, 5, 10, 20, 30, 40, 50, 60, 70, 80, 90, 100, 120, 140, 160, 180, 200, 220, 240, 260, 280, 300, 350, 400, 450 or 500 seconds, inclusive of all ranges and values between).

[0058] Catalyst materials according to embodiments described herein decrease, relative to those methods described in the Background, the loading of expensive PGMs. The activity of the catalyst is increased by supporting the catalyst on a support material that modifies the electronic structure. The durability of the catalyst material is increased in comparison to bare catalysts, by the use of a support material that is stable in the catalytic environment. The catalyst has application in electrochemical devices, including, but not limited to, fuel cells, electrolyzers, reversible or regenerative fuel cells (combination of fuel cell and electrolyzer in one device), Li-Air batteries, and flow batteries.

[0059] Embodiments described herein may be used in a wide a range of applications. In one application, the catalyst material is utilized in a polymer electrolyte fuel cell systems, such as for automotive, portable, and stationary power.

EXAMPLES

ALD-Pt Deposited Powders

[0060] The following powder materials were purchased from US Research Nanomaterials, Inc.: [0061] TiO2-Anatase, 40 nm [0062] TiO2-Anatse, 5 nm [0063] TiC, 40 nm [0064] TiN, 20 nm

[0065] A custom made ALD system at Argonne National Laboratory was used to deposit Pt on these materials according to the following protocol:

TABLE-US-00001 Instrument Built-in-house tube-type reactor Precursor Trimethyl(methylcyclopentadienyl)platinum(IV) Counter reactants Ultra-high purity O.sub.2 Duration of pulses 60 s (precursor pulse) - 120 s (purge) - 60 s (counter reactant pulse) - 120 s (purge) Number of cycles 5 super cycles Reactor temperature 250? C. Reactor base pressure 0.35 Torr

[0066] In order to investigate the catalytic activity and durability of these powders, an ex-situ rotating disk electrode (RDE) has been used according to the published guidelines. The following protocol and ink compositions were used to make a thin film electrode suitable for RDE testing: [0067] a. 1 mg-Pt/TiO.sub.2-40 nm, 0.2 mg Ketjen black carbon, 2 ml deionized water (DIW), 0.5 ml isopropyl alcohol (IPA), 5 microliter 5 wt % Nafion? 1100EW [0068] b. 1 mg-Pt/TiC-5 nm, 0.2 mg Ketjen black carbon, 2 ml DIW, 0.5 ml IPA, 5 microliters 5 wt % Nafion? 1100EW [0069] c. 1 mg-Pt/TiC-40 nm, 1 ml DIW [0070] d. 1 mg-Pt/TiN-20 nm, 1 ml DIW

[0071] FIGS. 2A-2F illustrate micrographs of sample deposits. Samples of these ALD-Pt deposited powders were analyzed by ICP-MS to determine the concentrations of platinum. Measurements were made with a Perkin Elmer/SCIEX ELAN DRCII ICP-MS calibrated with standards prepared from NIST traceable solution procured from Ultra Scientific. Reported data were calculated from the ICP-MS concentration data, the volume of the prepared solution, and the mass of sample taken. The results are shown in the following table:

TABLE-US-00002 Sample No. Pt wt % 5 cycles_Pt on 40 nm TiO.sub.2 17.7 5 cycles_Pt on 5 nm TiO.sub.2 21.0 5 cycles_Pt on 40 nm TiC 5.39 5 cycles_Pt on 20 nm TiN 20.2

[0072] It should be noted, in the embodiments of this example, the inks for TiC and TiN catalyst inks do not contain any carbon black, ionomer (Nafion?) or IPA. The inks were sonicated for at least 20 min and then 10 microliter aliquots from each ink were disposed on a clean glassy carbon (GC) surface (5 mm diameter). The drying process was started by spinning the inverted electrodes at 700 rpm to allow more uniform formation of thin film and once a relatively dry film was formed, the electrode was left to air-dry overnight. The Pt loading on RDE GC for inks a, b, c, and d were 3.6, 4.2, 1.8, and 6.8 micrograms/cm.sup.2, respectively.

[0073] These values were too low for obtaining activity data as commonly practiced in the field where loadings in excess of 20 micro-grams/cm.sup.2 are used. Nevertheless, ORR measurements were performed and polarization curves are presented in FIGS. 4A-4F. To assess the durability of these catalysts, start/stop accelerated stress tests recommended by the DOE have been adopted wherein the cathode is exposed to a potential cycling from 1 to 1.5V vs. RHE at 500 mV/s scan rate and ECA of the catalyst is measured as a function of cycle number. The FIGS. 4A-F shows that Pt/TiC is the best among the systems investigated followed closely by PtTiO.sub.2C and PtTiN. The ECA loss after 5000 cycles for PtTiC, PtTiN and PtTiO.sub.2C were 21.4%, 45% and 24%, respectively. Please note that once a true thin film is formed on the substrates/catalyst supports, the ECA loss is expected to mitigate even more as a smaller area of support materials will be exposed to the electrochemical environment. Nevertheless, with this low loading of Pt and with Pt in nanoparticle form, which exposed the support material to electrochemical environment, TiC and TiO.sub.2 lost less than 40% of ECA and thereby tentatively pass DOE guidelines for durability, whereas state-of-the-art Pt/C catalyst shows surface area loss of >60%.

[0074] FIGS. 4A, 4C, and 4E represent the ECA voltammogram, while FIGS. 4B, 4D, and 4F show the ORR voltammogram. The ECA voltammogram proves that the Pt deposit is electrochemically active and thus that the support is electrically conductive, and the ORR voltammogram shows that the Pt deposit is catalytically active for the ORR.

[0075] Pt/TiN and Pt/TiC powders were mixed with varying amounts of ionomer (proton-conducting polymer) and prepared into fuel cell membrane-electrode assemblies and their fuel cell performance tested: [0076] Cathode: TiN or TiC onto 25BC GDL [0077] Membrane: Nafion XL [0078] Anode: 0.2 mg/cm.sup.2 Pt loading, 29BD GDE [0079] Cell: 5 cm.sup.2 active area, 80? C., A/C: 15/15 psia, H.sub.2/Air, [0080] 200/200 sccm, 100/100% RH

[0081] FIGS. 5A and 5B illustrate the current density results for the Pt/TiN and Pt/TiC powders, respectively.

ALD-Pt Deposited Powders from Trimethyl(methylcyclopentadienyl)platinum(IV)

[0082] Platinum was deposited from a trimethyl(methylcyclopentadienyl)platinum(IV) precursor onto commercially-purchased titanium oxide particles of 40 nm diameter and on commercially-purchased titanium nitride of 20 nm diameter using ALD according to the process described above. The final loading of Pt on the supports was 28.6 wt % for TiO.sub.2 and 20.2 wt % for TiN, as determined by ICP-MS. The HOR and OER activities of these materials were screened using the thin-film rotating-disk electrode technique and using 0.1M HClO.sub.4 electrolyte. We therefore screened the HOR activity of these catalysts by saturating the electrolyte with hydrogen in an inert gas at a concentration below the flammability limit of hydrogen (3.618% hydrogen in helium). Various solvents were explored for the catalyst-ionomer inks to make a uniform and adherent deposit on the RDE's GC electrodes. Various loadings (110, 56, 38, and 19 ?g-Pt/cm.sup.2) of catalyst on the glassy carbon were also tested. The effect of RDE rotation on the HOR and OER results was also studied. The results reported here are those obtained using the optimum solvent, loading, and rotation rate found in these studies.

[0083] The HOR voltammograms for a polycrystalline Pt disk, a commercial Pt/high-surface-area-carbon (TKK 46 wt % Pt/C), and for the Pt/TiO.sub.2 and Pt/TiN catalysts are shown in FIG. 6. The relative HOR activity of these materials, reported in FIG. 7, is the peak current achieved in the anodic-going scan from 50 mV to 600 mV after a cathodic-going scan to 50 mV during which hydrogen is evolved. The results of FIGS. 5A and 5B show that the HOR activity of Pt/TiN catalyst is over three times that of Pt/C at a loading of 36-39 ?g-Pt/cm.sup.2.

[0084] The OER activities of unsupported commercial IrO.sub.2, RuO.sub.2, and two experimental unsupported IrO.sub.2 catalysts were benchmarked. The OER activity of the ALD-deposited Pt/TiO.sub.2 and Pt/TiN catalysts were also determined as baselines for mixtures of Pt and IrO.sub.2 on these supports for the reversible fuel cell application, described further below. The OER activities were screened using RDE with a loading of 100 ?g metal/cm.sup.2 on the glassy carbon electrode. Voltammograms were recorded from 1.0 to 1.7V in deaerated 0.1M HClO.sub.4 while rotating the electrode at 1600 rpm. The raw voltammograms, with the current attributable to a combination of double layer charging and OER, are shown in FIG. 8. The voltammograms with the double layer charging current subtracted are shown in FIG. 9. The double layer charging current is an indicator of surface area of the catalysts, with large double charging capacitance indicating higher surface area. The lab-synthesized unsupported IrO.sub.2 shows the highest surface area and the ALD-prepared Pt/TiO.sub.2 and Pt/TiN much lower surface area. The catalysts' relative OER activities were assessed using the potential at which the OER current reaches 0.25 mA/cm.sup.2.sub.geo, shown in FIG. 10. These data show that the lab-prepared IrO.sub.2 is the most active catalyst for OER having the lowest OER onset potential. As expected the Pt-based catalysts, Pt/TiO.sub.2 and Pt/TiN show very low or non-existent activity for the OER within the potential range studied.

[0085] The stability of the ECA of the Pt/TiO.sub.2 and Pt/TiN catalysts over potential ranges relevant to the electrolyzer anode, URFC anode, and fuel cell cathode applications was determined by subjecting the catalysts to potential cycles between 1.0 and 1.7V, 0.6 to 1.7V, and 0.6 to 1.0V, respectively. The ECA was determined using the charge for stripping of underpotentially-deposited hydrogen. The relative losses in ECA for Pt/TiO.sub.2 and Pt/TiN for the three cycling protocols are shown in FIGS. 11 and 12A-12B. The ECA loss for commercial 46 wt % Pt/HSC from Tanaka when subjected to the 1.0 to 1.7V cycling protocol is also shown in FIG. 11, for comparison. When cycled between 1.0V and 1.7V (OER potentials) Pt/TiO.sub.2 shows better ECA stability than either Pt/TiN or Pt/C. This same relative ECA decay rate for the two materials holds for the cycling protocols of 0.6 to 1.7V and 0.6 to 1.0V as well (FIGS. 12A and 12B, respectively). These data show that the relative loss rates for the different cycling protocols increase in the order 0.6-1.0V<1.0-1.7V<0.6-1.7V. While these data show substantial loss rates even when just cycling in the OER potential range (1.0 to 1.7V) and even more substantial loss when transitioning to lower potentials, which would be the case for the URFC anode, previous studies have shown that mixtures of Pt and IrO.sub.2 are more stable that either Pt or IrO.sub.2 alone.

ALD Deposited Powders Using Ozone

[0086] In addition to ALD Pt, ALD Ir and ALD PtIr alloy catalysts can be synthesized using the methods of our invention. The ALD Ir and ALD PtIr alloy catalysts can exhibit superior catalytic performance compared to the ALD Pt. The following details the steps used to prepare the ALD Ir and ALD PtIr alloy catalysts, but it will be obvious to one skilled in the art that these methods may be applied to prepare a wide range of mixed-metal and mixed-metal oxide ALD catalysts.

[0087] Experiments were performed using O.sub.3 and the metal precursors PtMe.sub.3CpMe and/or Ir(acac).sub.3 in an ALD process to deposit the respective metal on a substrate. The substrates for the experiments were TiC, TiN, TiO.sub.2 (5 nm) and TiO.sub.2 (40 nm). Three sample catalysts were prepared as follows: [0088] Pt: PtMe.sub.3CpMe (63? C.)+O.sub.3, 3/10/3/10, 65 cycles (assuming literature density, growth rate from quartz crystal microbalance (QCM) measurements is 0.49 A cycle.sup.?1) [0089] Ir: Ir(acac).sub.3 (187? C.)+O.sub.3, 15/10/3/18, 80 cycles (assuming literature density, growth rate from QCM is 0.46 A cycle.sup.?1) [0090] IrPt: 15/10/3/18+3/10/3/10, 60 cycles

[0091] Below is shown a table of XPS analysis taken from representative reference samples deposited on a silicon plate. All reference samples prepared during nanopowder coatings showed similar amounts of the screened elements.

TABLE-US-00003 Si (at. %) Ir Pt C (native (at. %) (at. %) (at. %) O (at. %) oxide) Pt Surface n.d. 27.44 21.33 20.23 31.00 After n.d. 32.13 1.75 16.64 49.49 sputtering Ir Surface 29.68 n.d. 10.47 45.99 13.86 After 36.04 n.d. n.d. 30.5 33.48 sputtering IrPt Surface 25.17 25.84 14.27 34.71 n.d. After 44.31 50.37 0.0 5.32 n.d. sputtering

[0092] The Pt samples were fabricated using the ALD recipe noted above. FIGS. 13A-13D show counts per second as a function of binding energy (eV recorded from XPS measurements using a Thermo-Fisher k-alpha spectrometer). FIG. 13B shows some oxygen contamination in the film, likely PtO.sub.2 (15.0%:7%=2.1).

[0093] The table below includes XPS data for the Pt sample.

TABLE-US-00004 Si (at. %) Pt C (native (at. %) (at. %) O (at. %) oxide) Pt Surface 27.44 21.33 20.23 31.00 After 32.13 1.75 16.64 49.49 sputtering (78.1% (8.3% are SiO.sub.2, are metallic, 91.7% are PtO) 21.9% .fwdarw. O1s are oxidized) PtO: 15.0% .fwdarw. 7% of Pt are .fwdarw. O1s oxidized SiO: 1.6%

[0094] FIGS. 14A and 14B show the silicon reference sample for TiO.sub.2 (5 nm) nanopowder for comparison purposes to the experimental thin film material. As can be seen in the figures, the powder supports agglomerated. The Pt is of about 7 nm thickness, island growth is not likely due to agglomeration.

[0095] Another sample was created using the recipe noted above to form Ir thin film on a substrate by ALD. FIGS. 15A-15C shows show counts per second as a function of binding energy (eV) for Ir.

TABLE-US-00005 Si (at. %) Ir C (native (at. %) (at. %) O (at. %) oxide) Ir Surface 29.68 10.47 45.99 13.86 After 36.04 0 30.5 33.48 sputtering (69.0% (13.04% are metallic, are SiO.sub.2, 31.0% 86.96% are oxidized) are IrO) .fwdarw. 11.2% of Ir .fwdarw. O1s are oxidized IrO: 26.5% .fwdarw. O1s SiO: 4.0%
Some oxygen contamination in the film, likely IrO.sub.2 (11.2%:26.5%=2.4).

[0096] A third sample was prepared by the recipe noted above to create IrPt material. FIGS. 18A-16C show counts per second as a function of binding energy (eV) of IrPt. The IrPt process shows less oxygen contamination than pure metals. The binding energy of the O.sub.1s signals suggests O is mainly from SiO. Further, the low amount of Si detected via XPS indicate the IrPt thin film completely coats the substrate, forming a closed layer. This is the desired structure of the film since it maximizes the surface area of catalytically-active metal/oxide for a given volume of the support material.

Definitions

[0097] As used herein, the singular forms a, an and the include plural referents unless the context clearly dictates otherwise. Thus, for example, the term a member is intended to mean a single member or a combination of members, a material is intended to mean one or more materials, or a combination thereof.

[0098] As used herein, the terms about and approximately generally mean plus or minus 10% of the stated value. For example, about 0.5 would include 0.45 and 0.55, about 10 would include 9 to 11, about 1000 would include 900 to 1100.

[0099] It should be noted that the term exemplary as used herein to describe various embodiments is intended to indicate that such embodiments are possible examples, representations, and/or illustrations of possible embodiments (and such term is not intended to connote that such embodiments are necessarily extraordinary or superlative examples).

[0100] The terms coupled, connected, and the like as used herein mean the joining of two members directly or indirectly to one another. Such joining may be stationary (e.g., permanent) or moveable (e.g., removable or releasable). Such joining may be achieved with the two members or the two members and any additional intermediate members being integrally formed as a single unitary body with one another or with the two members or the two members and any additional intermediate members being attached to one another.

[0101] It is important to note that the construction and arrangement of the various exemplary embodiments are illustrative only. Although only a few embodiments have been described in detail in this disclosure, those skilled in the art who review this disclosure will readily appreciate that many modifications are possible (e.g., variations in sizes, dimensions, structures, shapes and proportions of the various elements, values of parameters, mounting arrangements, use of materials, orientations, etc.) without materially departing from the novel teachings and advantages of the subject matter described herein. Other substitutions, modifications, changes and omissions may also be made in the design, operating conditions and arrangement of the various exemplary embodiments without departing from the scope of the present invention.

[0102] While this specification contains many specific implementation details, these should not be construed as limitations on the scope of any inventions or of what may be claimed, but rather as descriptions of features specific to particular implementations of particular inventions. Certain features described in this specification in the context of separate implementations can also be implemented in combination in a single implementation. Conversely, various features described in the context of a single implementation can also be implemented in multiple implementations separately or in any suitable subcombination. Moreover, although features may be described above as acting in certain combinations and even initially claimed as such, one or more features from a claimed combination can in some cases be excised from the combination, and the claimed combination may be directed to a subcombination or variation of a subcombination.