SYSTEM FOR TREATING LIQUIDS BY APPLYING ULTRA-VIOLET RADIATION
20190092653 ยท 2019-03-28
Assignee
Inventors
Cpc classification
C02F2201/324
CHEMISTRY; METALLURGY
C02F2201/3223
CHEMISTRY; METALLURGY
International classification
Abstract
A liquid treatment system (2) comprising a liquid enclosure (4) having a main axis A, at least one ultra-violet (UV) light source (6) with an extension along said main axis and configured to emit UV light to a liquid in the liquid enclosure (4). The liquid enclosure comprises at least one liquid section (8) with an extension along the main axis and structured to contain the liquid. The system (2) comprises swirl generating members (12) configured to generate a swirling motion of the liquid around a swirling axis S in the at least one liquid section (8) wherein the swirling axis is essentially parallel to the main axis, wherein the swirling motion is such that a controlled varying distance is induced to essentially all liquid elements of the liquid in relation to said light source (6) such that essentially all liquid elements are moved into high UV radiation zones closest said UV transparent wall (10), to achieve uniform UV radiation of the liquid.
Claims
1-19. (canceled)
20. A liquid treatment system comprising a liquid enclosure having a main axis A, at least one ultra-violet (UV) light source with an extension along said main axis and configured to emit UV light to a liquid in the liquid enclosure, said liquid enclosure comprises at least one liquid section with an extension along said main axis and structured to contain said liquid, and wherein said at least one liquid section is provided with a UV light transparent wall at least at a side facing the UV light source, wherein the system comprises at least two liquid sections and that said liquid sections are separated by at least one separation wall and in that the system further comprises swirl generating members configured to generate a swirling motion of the liquid around a swirling axis S in said at least two liquid sections wherein the swirling axis is essentially parallel to said main axis, wherein said swirling motion is such that a controlled varying distance is induced to essentially all liquid elements of said liquid in relation to said light source such that essentially all liquid elements are moved into high UV radiation zones closest said UV transparent wall, to achieve uniform UV radiation of the liquid, wherein the liquid enclosure comprises an inlet opening structured to receive said liquid to flow through said liquid sections and an outlet opening structured to expel said liquid from said liquid sections, wherein said inlet opening is arranged in connection to said at least two liquid sections, wherein the inlet opening is provided with said swirl generating members structured to guide liquid into the liquid sections essentially along a tangential direction of an outer wall of said liquid sections.
21. The liquid treatment system according to claim 20, wherein said light source has an elongated extension along said main axis, and that said at least one liquid section has an elongated extension.
22. The liquid treatment system according to claim 20, wherein the swirling motion is a spiral-like flow of liquid through said liquid section(s).
23. The liquid treatment system according to claim 20, wherein said at least one liquid section is provided with a non-UV-radiation part located upstream a UV-radiation part, and wherein the system comprises at least one ozone injecting member located in connection with said non-UV-radiation part, and structured to inject ozone into the liquid flowing in said non-UV-radiation part.
24. The liquid treatment system according to claim 20, wherein the system comprises 3-5 liquid sections which are symmetrically arranged around said light source in a plane perpendicular to said main axis.
25. The liquid treatment system according to claim 20, wherein each liquid section is an essentially closed enclosure.
26. The liquid treatment system according to claim 20, wherein each liquid section has an essentially circular cross-sectional shape in a plane perpendicular to said main axis A.
27. The liquid treatment system according to claim 20, wherein each of said liquid sections is provided with an inner cross-sectional shape that enables a swirl throughout the length of the section, and that each liquid section is provided with an inner surface that has an even extension such that the liquid swirl may move unrestricted within the liquid section.
28. The liquid treatment system according to claim 20, wherein each liquid section is structured as a liquid channel running along the UV-light source.
29. The liquid treatment system according to claim 20, wherein the swirl generating member is an active element, e.g. a stirring element, a propeller, an impeller, a magnetic stirrer.
30. The liquid treatment system according to claim 20, wherein the swirl generating member is a passive element, e.g. in the shape of wings, baffles, fins, etc.
31. The liquid treatment system according to claim 20, wherein the system comprises a particle supplying member configured to supply cleaning particles into the liquid in said at least one liquid section, for preventing scaling/fouling from adhering to the surface of the UV transparent wall.
32. The liquid treatment system according to claim 31, wherein the system further comprises a by-pass line configured to pass liquid and particles from the outlet opening back to the inlet opening of the liquid enclosure.
33. The liquid treatment system according to claim 32, wherein the system further comprises a control unit capable of controlling the particle supplying member to control the supply of particles to the inlet opening in accordance with a predetermined particle supply procedure, that at least comprises instructions for intermittent supply of particles.
34. The liquid treatment system according to claim 20, wherein said UV light source is a medium pressure UV lamp.
Description
BRIEF DESCRIPTION OF THE DRAWINGS
[0026]
[0027]
[0028]
[0029]
[0030]
DETAILED DESCRIPTION
[0031] The liquid treatment system will now be described in detail with references to the appended figures. Throughout the figures the same, or similar, items have the same reference signs. Moreover, the items and the figures are not necessarily to scale, emphasis instead being placed upon illustrating the principles of the invention.
[0032] With references to
[0033] The system comprises a liquid enclosure 4 having a main axis A, and at least one ultraviolet (UV) light source 6 with an extension along the main axis and configured to emit UV light to a liquid in the liquid enclosure 4.
[0034] The liquid enclosure comprises at least one liquid section 8 with an extension along the main axis and structured to contain the liquid. The at least one liquid section 8 is provided with a UV light transparent wall 10 at least at a side facing the UV light source 6.
[0035] The liquid enclosure is preferably made from a metal or another suitable material having a protective capability.
[0036] The liquid treatment system 2 further comprises swirl generating members 12 configured to generate a swirling motion of the liquid around a swirling axis S in the at least one liquid section 8 and that the swirling axis is essentially parallel to the main axis. The swirling motion is indicated by arrows in the figures. The swirling motion is such that a controlled varying distance is induced to essentially all liquid elements of the liquid in relation to the light source 6 such that essentially all liquid elements are moved into high UV radiation zones closest to the UV transparent wall 10, to achieve uniform UV radiation of the liquid.
[0037] The expression high in high UV radiation zone is meant the UV radiation in comparison to locations at larger distances from the UV light source, where zones are located having gradually lower UV radiation.
[0038] Preferably, the light source 6 has an elongated extension along the main axis A, and that the at least one liquid section also has an elongated extension.
[0039] Two main and principally different variations of the liquid enclosure will be described. One flow-through version where the liquid to be treated flows through the liquid section(s) during treatment, and one batch-treatment version where the liquid is poured into the liquid enclosure and liquid section(s) where it is treated and then poured out from the enclosure when the treatment is concluded. The batch-treatment version is in particular illustrated in
[0040] The flow-through version is illustrated e.g. in
[0041] According to this embodiment the liquid enclosure 4 comprises an inlet opening 14 structured to receive the liquid to flow through the liquid sections 8 and an outlet opening 16 structured to receive the liquid from the liquid sections in order to expel it from the liquid enclosure. In the schematic illustration in
[0042] The swirl generating member 12 is either an active or a passive element. Generally, both active and passive elements are applicable to both versions of the system. However, for flow-through versions passive elements are normally preferred, and for batch-treatment versions active elements are normally applied.
[0043] If it is an active element it may be embodied by e.g. a stirring element, a propeller, an impeller, a magnetic stirrer, etc.
[0044] If instead the swirl generating member is a passive element it may be implemented by specifically shaped wings, baffles, fins, etc.
[0045]
[0046] Liquid will enter the liquid enclosure via the inlet opening 14 which is arranged in connection to the liquid sections 8. The liquid may be pumped by an external pump (not shown). Inside the inlet opening 14 the swirl generating members 12 are provided which are structured to guide liquid into the liquid sections 8 essentially along a tangential direction of a an outer wall of the liquid section. In this embodiment the swirl generating members are openings in the outer walls of the liquid sections which are provided with guiding wall elements. Due to the pressure by which the liquid enters the liquid enclosure the liquid is forced to enter the liquid sections via the openings.
[0047]
[0048] In the embodiment illustrated in
[0049] The batch-treatment version of the liquid enclosure will now be described with references to
[0050] In
[0051] In
[0052]
[0053] In
[0054] In
[0055] In the embodiment illustrated in
[0056] In various embodiments of the liquid treatment system it comprises at least two liquid sections 8 and that the liquid sections are separated by separation walls 29, see
[0057] Preferably the liquid treatment system comprises 3-5 liquid sections 8 which may be symmetrically arranged around the light source 6 seen in a plane perpendicular to the main axis A. This is illustrated by the embodiments shown in
[0058] Each liquid section 8 is preferably an essentially closed enclosure and each liquid section 8 is structured as a liquid channel running along the UV-light source. By providing each liquid section as an essentially separate closed enclosure the induced swirling motion of the liquid can be accurately controlled.
[0059] Each liquid section 8 is provided with an inner cross-sectional shape that enables a swirl within the liquid section throughout the length of the section. The inner surface of the liquid section has an even extension such that the liquid swirl may move unrestricted within the liquid section. Particularly, the inner surface has an even extension in the longitudinal direction along the main axis A, thus no ridges, fins, flanges or other obstructions exist that may induce pressure losses.
[0060] Now with references to
[0061] Thus, the system comprises a particle supplying member 30 configured to supply cleaning particles 31 (schematically indicated as black dots) into the liquid and into the at least one liquid section 8, for preventing scaling/fouling from adhering to the surface of the UV transparent wall 10. Preferably a by-pass line 32 is provided that is configured to transport liquid and particles from the outlet opening 16 back to the inlet opening 14 of the liquid enclosure via the particle supplying member. To filter out particles from the liquid flow at the outlet opening a particle filter, e.g. a net or screen, is preferably applied capable of filter out and direct cleaning particles and a small liquid flow into the by-pass line 32. A similar filter may also be provided in relation to the inlet opening to prevent the particles from escaping the liquid enclosure.
[0062] To control the supply of cleaning particles the system further comprises a control unit 34 capable of controlling the particle supplying member 30 by a control signal indicated by an arrow to control the supply of particles into the inlet opening 14 in accordance with a predetermined particle supply procedure, that at least comprises instructions for intermittent supply of particles, e.g. to supply cleaning particles 4-6 times each 24 h during a treatment period of 1-25 minutes.
[0063] The particle supplying member comprises a particle storage member structured to store particles to be supplied to the inlet opening 14, and that the control unit 34 is capable of controlling the opening and closing of a closing member of the particle supplying member 30 such that particles are supplied to the inlet opening 14.
[0064] With references to
[0065] According to this embodiment each liquid section 8 is provided with a non-UV-radiation part 18 located upstream a UV-radiation part 20. A UV light source is arranged for irradiating liquid in the liquid section(s) in the UV-radiation part 20 as being described in connection with the other embodiments. In the non-UV-radiation part 18 the liquid section(s) has been lengthened in the upstream direction.
[0066] The system comprises at least one ozone injecting member 22 located in connection with the non-UV-radiation part, and structured to inject ozone into the liquid flowing in the non-UV-radiation part, and in particular to inject ozone in a position close to the inlet opening 14. An advantageous effect of the injected ozone will be achieved due to the swirling motion inside the liquid section that improves the mixing of the ozone into the liquid.
[0067] Using both ozone and UV light have long been used for inactivation of pathogenic organisms that can thrive in water and wastewater systems.
[0068] Low-pressure mercury vapour lamps emit UV light with particular intensity peaks at 254 nm and 185 nm. The short-wave radiation is effective at breaking molecular bonds in the DNA of microorganisms. UV radiation also provides the energy necessary to spark the decomposition of ozone, which leads to the formation of two hydroxyl radicals (OH). This oxidant is the key component in the Advanced Oxidation Processes (AOPthe combinations of ozone, UV and/or hydrogen peroxide reactions.
[0069] The ozone/UV combination effectively destroys organic contaminants largely because of the very high oxidation potential of the hydroxyl radical (2.8 eV). For ozone/UV reactions in aqueous solution, ozone is energized and combines with water to create OH, which is stronger and less selective than either chemical oxidant. Ozone effectively reacts with the organic contaminants it can impact, with remaining residual ozone converting into two hydroxyl radicals per ozone molecule.
[0070] One benefit of AOPs such as ozone/UV is that with their increased oxidation levels, even stubborn organics that resist degradation can be partially oxidized to the point where they are more readily biodegradable. The benefits of ozone preoxidation followed by UV primary disinfection for waters with Cryptosporidium are an excellent approach for utilities to meet authorities' water treatment regulations. In the UV radiation part 20 the UV light will neutralize the remaining ozone.
[0071] The key parameters for the success of an ozone/UV system are ozone dosage, UV irradiation level and pH. For proper ozone dosing, a high dissolved ozone rate must be maintained with effective transfer of ozone gas into aqueous solution. One effective design for ozone/UV systems is a pressurized injection secondary mix UV/O3 reactor, a system that creates microbubbles, constant renewal of the gas-to-liquid mixing zone and enhanced gas solubility for better utilization of UV irradiation. As pH increases, ozone will more readily be converted to hydroxyl, which increases the oxidation rate of certain contaminants like pesticides and cyanide. The balance between pH level, UV photolysis and ozone dosage must be considered in system design and control for maximum efficiency.
[0072] Various aspects and types of the UV light source will now be further discussed. There are two UV lamp-types which are most commonly used in UV light treatment systems: medium pressure and low pressure lamps. The pressure relates to the mercury-gas pressure within the lamp. Both types are applicable in all embodiments disclosed herein.
[0073] Low pressure lamps are elongated lampsconventionally about a meter in lengthwith low output per lamp (ranging between 30-600 W). For disinfection purposes, low pressure lamps emit a monochromatic wavelength of 253.7 nm (254 nm) at high intensity. Medium pressure lamps are normally considerably shorter than low pressure ones, with high output per lamp (normally ranging between 1-12 kW, but also up to 50 kW). Medium pressure lamps emit a wide germicidal wavelength between 200-320 nm at various intensities. Medium pressure lamps also emit 254 nm wavelength, but not as intensive as low pressure lamps.
[0074] In one further embodiment the UV light source 6 is a medium pressure UV lamp. This type of UV lamp may be advantageous in that one medium pressure UV lamp may replace a plurality of low pressure UV lamps due to its high output per lamp.
[0075] The present invention is not limited to the above-described preferred embodiments. Various alternatives, modifications and equivalents may be used. Therefore, the above embodiments should not be taken as limiting the scope of the invention, which is defined by the appending claims.