Mo—Si—B layers and method for the production thereof

Abstract

The present invention concerns substrates coated with an Mo.sub.1-x-ySi.sub.XB.sub.Y layer, said layer comprising the T2 phase, and a method for the production thereof.

Claims

1. Sputter-coated forming tool with a Mo.sub.1-x-ySi.sub.xB.sub.y layer, having a T2 phase, wherein the value of x ranges from 0.28 to 0.37 and the value of y ranges from 0.08 to 0.14.

2. The sputter-coated forming tool of claim 1, wherein the Mo.sub.1-x-ySi.sub.xB.sub.y layer has a hardness value in the range of 17.5 to 27 GPa.

3. Method for the production of the Mo.sub.1-x-ySi.sub.xB.sub.y layer of claim 1 by magnetron sputtering using a MoSi composite target and an elementary B target, wherein the layer is heated to a temperature of at least 900 C. after deposition, whereby the T2 phase is formed.

4. Forming tool with a Mo.sub.1-x-ySi.sub.xB.sub.y layer having the T2 phase, wherein the Mo.sub.1-x-ySi.sub.xB.sub.y layer was applied onto the surface of a tool by means of a method according to claim 3.

Description

(1) Hereinafter, some experiments and analyses are represented in FIGS. 1 to 10 which should help in better understanding the invention.

(2) FIG. 1 shows the oxidation mechanism Mo.sub.1-x-ySi.sub.xB.sub.y (basis material).

(3) FIG. 2 shows a coating setup for the production of MoSiB layers according to the present invention according to a first example:

(4) The Mo.sub.1-x-ySi.sub.xB.sub.y layers were produced with the following coating parameters: Coating pressure p.sub.TOTAL=1.10.sup.2 mbar in an essentially pure argon atmosphere Coating temperature T.sub.dep=500 C. Sputter output at the MoSi Target P.sub.MoSi=250 WDC sputtering Sputter output at the Si Target P.sub.Si200 WDC pulsed (f=150 kHz, =1256 ns) Sputter output at the B Target P.sub.B=250 WDC pulsed (f=150 kHz, =1256 ns)

(5) The aim was to examine the phase stability, mechanical properties, thermal stability and resistance to oxidation.

(6) FIG. 3 shows the structure and morphology of the deposited Mo.sub.1-x-ySi.sub.xB.sub.y layers.

(7) FIG. 4 shows the analysis of the phase stability of the deposited Mo.sub.1-x-ySi.sub.xB.sub.y layers.

(8) FIG. 5 shows the analysis of the mechanical properties of the deposited Mo.sub.1-x-ySi.sub.xB.sub.y layers.

(9) FIG. 6 shows the analysis of the phase transformation of the deposited Mo.sub.1-x-ySi.sub.xB.sub.y layers, in particular using the example of Mo.sub.0.58Si.sub.0.28B.sub.0.14, during heat treatments in a vacuum atmosphere.

(10) FIG. 7 shows the analysis of the stability of the mechanical properties of the deposited Mo.sub.1-x-ySi.sub.xB.sub.y layers after the heat treatments.

(11) FIG. 8 shows the analysis of the resistance to oxidation of the deposited Mo.sub.1-x-ySi.sub.xB.sub.y layers.

(12) FIG. 9 shows a summary of the analyzed layer properties of the deposited Mo.sub.1-x-ySi.sub.xB.sub.y layers.

(13) FIG. 10 shows the analysis of the resistance to oxidation of the deposited Mo.sub.1-x-ySi.sub.xB.sub.y layers, when they are first pulverized and only afterwards examined as powder.