METHOD FOR REMOVAL OF MICROSCOPIC CONTAMINANT PARTICULATES FROM SUPERCONDUCTING RADIO FREQUENCY CAVITIES AND CAVITY STRINGS
20240246123 ยท 2024-07-25
Inventors
Cpc classification
B08B9/0433
PERFORMING OPERATIONS; TRANSPORTING
B08B9/00
PERFORMING OPERATIONS; TRANSPORTING
B08B7/0021
PERFORMING OPERATIONS; TRANSPORTING
B08B3/02
PERFORMING OPERATIONS; TRANSPORTING
International classification
B08B7/00
PERFORMING OPERATIONS; TRANSPORTING
B08B3/02
PERFORMING OPERATIONS; TRANSPORTING
Abstract
A method for removing microscopic contaminant particulates by high pressure liquid nitrogen jet cleaning from the inner surface of a superconducting radio frequency cavity or a string of multiple cavities and transporting the removed particulates out of the inner space enclosed by the cleaned surfaces. The cleaning method of the invention suppresses field emission, resulting in an increase of the usable accelerating gradient of the cavities and a reduction of the activated radioactivity in accelerator components around cavities.
Claims
1. A method for removing microscopic contaminant particles from the inner surface of an SRF accelerator cavity or string of cavities having a central axis, said method comprising: a rotating lance; a liquid nitrogen supply tank; a cleaning head on said lance, said cleaning head including one or more nozzles; a hollow bore within said lance and said cleaning head; a mechanism for advancing and retracting the position of the lance within the accelerator cavity; pumping the liquid nitrogen to high pressure; conveying the high pressure liquid nitrogen into the hollow bore, the lance, and the cleaning head; and streaming a high pressure liquid nitrogen jet out of the one or more nozzles and against the inner surface of the SRF accelerator cavity or string of cavities to dislodge microscopic contaminant particles from said inner surface, said liquid nitrogen converting to gaseous nitrogen after said streaming and collision with said inner surface of the SRF accelerator cavity or string of cavities.
2. The method of claim 1, comprising directing the liquid nitrogen jet at substantially 90? with respect to said central axis of said cavity or string of cavities.
3. The method of claim 1, comprising: an exhaust port on said SRF accelerator cavity; said gaseous nitrogen and said exhaust port creating a gaseous nitrogen flow from said cleaning head to said exhaust port; and conveying the gaseous nitrogen flow to convey the dislodged microscopic contaminant particles to and out of the exhaust port.
4. The method of claim 1, comprising providing a lance centering block on said lance to align the cleaning head with the central axis of the accelerator cavity and confine the cleaning head from contacting the inner cavity surface.
5. The method of claim 4, comprising overlaying said lance centering block to prevent scratching of the inner surface of the cavity or string of cavities.
6. The method of claim 1 comprising said high pressure liquid nitrogen is at 500-6000 psi.
Description
BRIEF DESCRIPTION OF THE SEVERAL VIEWS OF THE DRAWING(S)
[0012] Reference is made herein to the accompanying drawings, which are not necessarily drawn to scale, and wherein:
[0013]
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DETAILED DESCRIPTION
[0019] With reference to
[0020] As shown in
[0021] With reference to
[0022] The nitrogen gas 36 confined in the cavity space develops into a turbulent gaseous nitrogen flow 40, dragging the removed particulate toward the end of the cavity 14. Particulates entrained in nitrogen gas are then discharged into the ambient air (
[0023] Referring to
[0024] The end result of the process is a cleaned cavity inner surface 26, isolated from the ambient atmosphere. No liquid medium is left behind in the cavity or the cavity string. After cleaning, the remaining nitrogen gas 36 is evacuated by an external vacuum pumping system (not shown). Depending on the length of the cavity or cavity string, the lance may be fitted with a number of centering blocks 48, enabling automatic alignment of the cleaning head 12 with the cavity central axis 50 (see
[0025] This invention provides a solution that did not exist for final cleaning of a cavity string during production of a new cryomodule. In present day cryomodule production processes, despite each individual cavity being cleaned by high pressure water rinsing, no method is available to remove microscopic particulates generated by the final cavity string assembly process, often resulting in significant loss in usable cavity gradient.
[0026] This invention also provides a solution for in-situ re-cleaning of contaminated cavities in operational cryomodules. Such contamination occurs as a result of particulate input, resulted from either particulate transport by accelerator beams during its regular operation or particulates sweeping from external dirty beamline components during beamline vacuum accidents. Existing in-situ processes, such as helium process or plasma cleaning are ineffective for removal of microscopic particulates, despite limited benefit in removal frozen gases or thin layer of condensed hydrocarbon. Existing in-situ horizontal high pressure water rising has several drawbacks, such as leaving behind water vapor and trapped water in dead space locations. At startup and cooldown of the SRF system, the trapped water will be frozen onto the cavity surface causing operation problems such as strong multipacting in the cavity cells or the RF input power couplers. Additionally, the effect of carbon dioxide dissolving renders deionized water acidic, which may fatally attack sensitive components such as copper plating in the RF input power couplers.
[0027] A high pressure liquid nitrogen jet cleaning method according to the invention provides several novel particulate removal mechanisms simultaneously, including 1) direct energy transfer generating sound waves, 2) cold shrinkage differential, and 3) rapid evaporation of liquid nitrogen. Other advantages include the unlimited penetration depth of long cavity strings and no liquid medium is left behind in the cavity string after completion of the cleaning process. As a result of these advantages, this invention distinguishes itself from the existing method of SRF cavity cleaning using vertical or horizontal high pressure water.
[0028] The current invention also distinguishes itself from prior art in cleaning methods involving liquid nitrogen. As an example, prior art methods of submicron particle removal use liquid nitrogen at ordinary pressure, which entails a different and much less effective cleaning mechanism. As a result, that method has limited power for particulate dislodgment, rendering it incapable of removing strongly bonded particulates such as those fused to the cavity surface due to their exposure to strong radio frequency electromagnetic fields during cryomodule operation. The current invention provides a superior cleaning method that is inaccessible by current high pressure water rinsing technology, allowing extended field emission-free performance of individual cavities for their qualification testing as well as their final cleaning during the production of a new cryomodule.
[0029] For applications of recovering contaminated cavities in previously operated cryomodules, the method of the current invention is significantly advantageous as compared to the existing recovery method of horizontal high pressure water rinse. The lance penetration in this invention is mechanically unlimited, hence permitting in-situ cleaning of a long cavity strings in a cryomodule without taking the contaminated cryomodule apart, saving tremendous time and cost.
[0030] The method of the current invention can be used with any SRF cavity accelerator or with any manufacturing process that requires internal cleaning of microscopic contaminant particulates and transport of removed particulates out of the cleaned space, such as for the production of optical components or for production in the semiconductor industry which requires cleaning of particulates down to a few nanometers in size.
[0031] The description of the present invention has been presented for purposes of illustration and description, but is not intended to be exhaustive or limited to the invention in the form disclosed. Many modifications and variations will be apparent to those of ordinary skill in the art without departing from the scope and spirit of the invention. The embodiment was chosen and described in order to best explain the principles of the invention and the practical application, and to enable others of ordinary skill in the art to understand the invention for various embodiments with various modifications as are suited to the particular use contemplated.