Deposition Method, Continuous Deposition System, and Application Thereof
20240240315 ยท 2024-07-18
Inventors
- Bing-Joe Hwang (Taipei, TW)
- Sheng-Chiang Yang (Taipei, TW)
- Chun-Huang Xu (Taipei, TW)
- Wei-Nien Su (Taipei, TW)
- Ping-Chun Tsai (Taipei, TW)
- Kuan-Lin Chu (Taipei, TW)
Cpc classification
Y02E60/10
GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
H01M4/1391
ELECTRICITY
C23C16/45553
CHEMISTRY; METALLURGY
C23C16/409
CHEMISTRY; METALLURGY
C23C16/45527
CHEMISTRY; METALLURGY
International classification
C23C16/455
CHEMISTRY; METALLURGY
Abstract
A deposition method, comprising the steps of exposing a carrier to moisture, so that a hydroxy group can be distributed on the surface of the carrier, and adding a liquid precursor to the hydroxy group to perform an alcohol condensation reaction to form a target atom layer or a target atom compound layer of the deposition carrier; the process provided by the present invention allows one or more liquid precursors to be freely selected for uniform deposition on the carrier. Compared to the current low-yield dry atomic deposition technology, it has no limitation on the volume of the reaction chamber, no complicated and diverse process, and can be designed as a continuous process to achieve wider industrial availability.
Claims
1. A deposition method, comprising the steps of: Step 1: providing a carrier; Step 2: exposing the carrier to moisture for a predetermined time such that a hydroxy group is distributed on the surface of the carrier; Step 3: adding a liquid precursor comprising a precursor and a corresponding solvent, the precursor comprising at least one target atom and a functional group capable of undergoing an alcohol condensation reaction with the hydroxy group; Step 4: bonding the functional group of the precursor to the hydroxy group on the surface of the carrier to perform an alcohol condensation reaction such that the target atom is bonded to the surface of the carrier through the functional group; and Step 5: calcining the resulting product which is dried so that the target atom forms a stable layer of a target atom or a layer of a target atom bonded to the surface of the carrier.
2. The deposition method according to claim 1, wherein Steps 2?4 are repeated as required before performing Step 5.
3. The deposition method according to claim 1, wherein the carrier is stirred or turned to increase the uniformity of the exposed moisture when Step 2 is performed.
4. The deposition method according to claim 1, wherein: the liquid precursor comprises the precursor comprising ethoxy as a functional group.
5. The deposition method according to claim 2, wherein: the liquid precursor comprises the precursor comprising ethoxy as a functional group.
6. The deposition method according to claim 3, wherein: the liquid precursor comprises the precursor comprising ethoxy as a functional group.
7. The deposition method according to claim 1, wherein: the solvent comprises anhydrous ethanol, anhydrous ethyl ether, anhydrous methanol, and/or anhydrous acetone.
8. The deposition method according to claim 2, wherein: the solvent comprises anhydrous ethanol, anhydrous ethyl ether, anhydrous methanol, and/or anhydrous acetone.
9. The deposition method according to claim 3, wherein: the solvent comprises anhydrous ethanol, anhydrous ethyl ether, anhydrous methanol, and/or anhydrous acetone.
10. The deposition method according to claim 1, wherein: the carrier form is in the form of a particle or powder which is able to carry the hydroxyl group thereon; the target atom comprises an aluminum atom, lithium atom, and/or niobium atom; the target atom layer comprises an aluminum layer, a lithium layer, and/or a niobium layer; and the target atom compound layer comprises an aluminum oxide layer, a lithium oxide layer, and/or a niobium oxide layer.
11. The deposition method according to claim 10, wherein: the carrier comprises a electrode material for lithium battery or sodium battery; the liquid precursor is an ethoxide or partially ethoxide compound containing element(s) list below with ethoxide functional group; wherein: the said element comprises Na, Zr, Al, Ta, Mg, K, Li, Sb, Ti, Nb, Ge, B, Si, W, Y, V, Mo, Fe, Ni or In; and the target atom compound layer comprises an aluminum trioxide, a lithium aluminate, or a lithium niobate.
12. A continuous deposition system for carrying out the deposition method according to claim 1, comprising: a first mixing zone, a second mixing zone, and a product drying and calcining zone, those three being materially interconnected, wherein: the first mixing zone is connected to a moisture supply unit and a carrier supply unit, respectively, which are fed into the first mixing zone for a reaction so that the hydroxy group is distributed on the surface of the carrier; and introducing the carrier in which the hydroxy group is distributed into the second mixing zone, the second mixing zone having a liquid precursor supply unit, a residual liquid precursor discharge outlet, and a product discharge outlet; after the carrier in which the hydroxy group is distributed has reacted with the liquid precursor in the second mixing zone, if there is any residual liquid precursor, it is discharged from the residual liquid precursor discharge outlet, and the product is discharged from the product discharge outlet.
13. The continuous deposition system according to claim 12, wherein the product is redirected to the first mixing zone for re-processing or to the product drying and calcining zone for drying and calcining, depending on the process requirements.
14. An electrochemical application, having an electrode material that comprises a target atom layer or a target atom compound layer obtained by the deposition method as claimed in claim 1.
Description
BRIEF DESCRIPTION OF THE DRAWINGS
[0026] The steps and the technical means adopted by the present invention to achieve the above and other objects can be best understood by referring to the following detailed description of the preferred embodiments and the accompanying drawings.
[0027]
[0028]
[0029]
[0030]
[0031]
[0032]
[0033]
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS
[0034] Reference will now be made in detail to the present preferred embodiments of the invention, examples of which are illustrated in the accompanying drawings. Wherever possible, the same reference numbers are used in the drawings and the description to refer to the same or like parts. It is not intended to limit the method by the exemplary embodiments described herein. In the following detailed description, for purposes of explanation, numerous specific details are set forth in order to attain a thorough understanding of the disclosed embodiments. It will be apparent, however, that one or more embodiments may be practiced without these specific details. As used in the description herein and throughout the claims that follow, the meaning of a, an, and the may include reference to the plural unless the context clearly dictates otherwise. Also, as used in the description herein and throughout the claims that follow, the terms comprise or comprising, include or including, have or having, contain or containing and the like are to be understood to be open-ended, i.e., to mean including but not limited to.
[0035] With reference to
First Preferred Embodiment
[0042] The first preferred embodiment of the deposition method of the present invention is to use a nickel-cobalt-manganese metal oxide (NMC/NMC811) as the carrier 10, and finally deposit the aluminum target atom compound layer (aluminum trioxide, Al.sub.2O.sub.3) on its surface and stably bonded to the surface of the carrier 10, comprising the following steps: [0043] Step S1-1) exposing the NMC 10 powder to moisture and controlling the distribution of the OH group 11 on the surface of the NMC 10; [0044] Step S1-2) adding the liquid precursor 20, in which aluminum triethoxide (Al(OC.sub.2H.sub.5).sub.2) is used as the precursor 21 and anhydrous ethanol (EtOH) is used as the solvent 22; the aluminum triethoxide has an aluminum atom as the target atom 211 and triethanolic group as the functional group 212; [0045] Step S1-3) the triethanolic group in the aluminum triethoxide 21 and the OH group 11 on the surface of the NMC 10 undergo an alcohol condensation reaction to form OAl(OC.sub.2H.sub.5).sub.2 which is bonded to the surface of the carrier 10; [0046] Steps S1-4) (optional) repeating the above Steps 1-3 several times as required to achieve the desired number or stack thickness of aluminum atoms (target atoms) 211 and bond them to the surface of the NMC 10; and [0047] Steps S1-5) drying and calcining the above product to obtain an Al.sub.2O.sub.3-NMC with aluminum trioxide (Al.sub.2O.sub.3) as the target atom compound layer 30 stably bonded and loaded on the surface of the carrier 10.
Second Preferred Embodiment
[0048] The second preferred embodiment of the deposition method of the present invention, again, using nickel-cobalt-manganese metal oxide (NMC) as the carrier 10, and finally deposit the aluminum target atom compound layer (lithium aluminate, LiAlO.sub.2) on its surface and stably bonded to the surface of the carrier 10, comprising the following steps: [0049] Step S2-1) exposing the NMC 10 powder to moisture and controlling the distribution of the OH group 11 on the surface of the NMC 10; [0050] Step S2-2) adding the liquid precursor 20, in which aluminum triethoxide and lithium hydroxide (LiOH) are used as the first and second precursors and the same anhydrous ethanol is used as the solvent 22; the aluminum atom in the aluminum triethoxide and the lithium atom in the lithium hydroxide are two target atoms 211, and the triethanolic group in the aluminum triethoxide and the hydroxide group in the lithium hydroxide are used as two functional groups 212; the concentration of the aluminum triethoxide and the lithium hydroxide in the anhydrous ethanol is as described above, preferably >0.01M, more preferably greater than 0.1M, or most preferably greater than 0.5, and the equivalent of aluminum triethoxide to lithium hydroxide is preferably between 1:1?1:10, more preferably 1:1?1:5, or best 1:1?1:3; [0051] Step S2-3) the triethanolic group in the aluminum triethoxide 21 and the hydroxide group in the lithium hydroxide react with the OH group 11 on the surface of the NMC 10 to form OLiAl(OC.sub.2H.sub.5).sub.2 which is bonded to the surface of the carrier 10; [0052] Steps S2-4) (optional) repeating the above Steps 1-3 several times as required to achieve the desired number or stack thickness of lithium-aluminum (target atoms) 211 and bond them to the surface of the NMC 10; and [0053] Steps S2-5) drying and calcining the above product to obtain a LiAlO.sub.2-NMC with lithium aluminate (LiAlO.sub.3) as the target atom compound layer 30 stably bonded and loaded on the surface of the carrier 10.
Third Preferred Embodiment
[0054] The third preferred embodiment of the deposition method of the present invention, again, using nickel-cobalt-manganese metal oxide (NMC) as the carrier 10, and finally deposit the lithium niobium (Nb) target atom compound layer (lithium niobate, LiNbO.sub.3) on its surface and stably bonded to the surface of the carrier 10, comprising the following steps: [0055] Step S3-1) exposing the NMC 10 powder to moisture and controlling the distribution of the OH group 11 on the surface of the NMC 10; [0056] Step S3-2) adding the liquid precursor 20, in which niobium pentaethoxide (Nb(OCH.sub.2CH.sub.3).sub.5) and lithium hydroxide (LiOH) are used as the first and second precursors 21 and the same anhydrous ethanol is used as the solvent 22; the niobium atom in the niobium pentaethoxide and the lithium atom in the lithium hydroxide are two target atoms 211, and the alcohol group in the niobium pentaethoxide and the hydroxide group in the lithium hydroxide are used as two functional groups 212; the concentration of the niobium pentaethoxide and the lithium hydroxide in the anhydrous ethanol is as described above, preferably >0.01M, more preferably greater than 0.1M, or most preferably greater than 0.5, and the equivalent of niobium pentaethoxide to lithium hydroxide is preferably between 1:1?1:10, more preferably 1:1?1:5, or best 1:1?1:3; [0057] Step S3-3) the alcohol group in the niobium pentaethoxide and the hydroxide group in the lithium hydroxide react with the OH group 11 on the surface of the NMC 10 to form OLiAl(OC.sub.2H.sub.5).sub.2 which is bonded to the surface of the carrier 10; [0058] Steps S3-4) (optional) repeating the above Steps 1-3 several times as required to achieve the desired number or stack thickness of lithium-niobium (target atoms) 211 and bond them to the surface of the NMC 10; and [0059] Steps S3-5) drying and calcining the above product to obtain a LiNbO.sub.3-NMC with lithium niobate (LiNbO.sub.3) as the target atom compound layer 30 stably bonded and loaded on the surface of the carrier 10.
<Table of Each Reaction Material Type>
[0060] Please refer to Tables 1?3 below fora summary of the reactants, products and preferred embodiments in the previous reactions of the present invention.
TABLE-US-00001 TABLE 1 Embodiment series 1 Carrier Nickel-cobalt-manganese metal oxide (NMC 811) Liquid Precursors Target atoms Aluminum Aluminum atom precursor Functional triethoxide Triethanolic groups group Solvent Anhydrous ethanol Target atom compound layer Aluminum trioxide Product Al.sub.2O.sub.3-NMC Embodiment No. Embodiment 1-1: Al.sub.2O.sub.3-NMC
TABLE-US-00002 TABLE 2 Embodiment series 2 Carrier Nickel-cobalt-manganese metal oxide (NMC 811) Liquid Precursors Target atoms aluminum Aluminum atom, precursor Functional triethoxide, lithium atom groups lithium Triethanolic hydroxide group, hydroxide group Solvent Anhydrous ethanol Target atom compound layer Lithium aluminate Product LiAlO.sub.2-NMC Embodiment No. Embodiment 2-1: LiAlO.sub.2-NMC calcining with 1Eq-LiOH Embodiment 2-2: LiAlO.sub.2-NMC with 2Eq-LiOH
TABLE-US-00003 TABLE 3 Embodiment series 3 Carrier Nickel-cobalt-manganese metal oxide (NMC 811) Liquid Precursors Target atoms Niobium Niobium atom, precursor Functional pentaethoxide, lithium atom groups lithium Alcohol group, hydroxide hydroxide group Solvent Anhydrous ethanol Target atom compound layer Lithium niobate Product LiNbO.sub.3-NMC Embodiment No. Embodiment 3-1: LiNbO.sub.3-NMC calcining under 500? C. Embodiment 3-2: LiNbO.sub.3-NMC calcining under 700? C.
[0061] In summary, the suitable precursors of the present invention are preferred to be an ethoxide or partially ethoxide compound containing element(s) listed below with ethoxide functional group. The said element comprises Na, Zr, Al, Ta, Mg, K, Li, Sb, Ti, Nb, Ge, B, Si, W, Y, V, Mo, Fe, Ni or In.
<Preferred Embodiment of Continuous Deposition System>
[0062] Referring to
[0063] The first mixing zone 40 is connected to a moisture supply unit 41 and a carrier supply unit 42 which are fed into the first mixing zone 40 for reaction respectively, corresponding to the above method to react the moisture with the carrier 10, so that the OH group 11 is distributed on the surface of the carrier 10; [0064] introducing the carrier 10 in which the OH group 11 is distributed into the second mixing zone 50, which is provided with a liquid precursor supply unit 51, a residual liquid precursor discharge outlet 52, and a product discharge outlet 53. After the carrier 10 in which the OH group 11 is distributed has reacted with the liquid precursor 20 in the second mixing zone 50, if there is any residual liquid precursor 20, it is discharged from the residual liquid precursor discharge outlet 52, and the product is discharged from the product discharge outlet 53, and depending on the process requirements, is redirected to the first mixing zone 40 or to the product drying and calcining zone 60 for drying and calcining.
<Validation Tests>
[0065] Referring to
[0066] Please referring to
[0067] As can be seen in
[0068] Referring to
[0069] As can be seen in
[0070] Referring to
TABLE-US-00004 TABLE 4 Average Coulombic Discharge Residual Efficiency Capacitance Capacitance (%) after of the (%) of the Name of Sample 100 cycles 100.sup.th cycle 100 cycles Pristine NMC 99.37 151.18 75.09 comparative sample Embodiment 1-1 99.45 161.70 81.60 Embodiment 2-1 99.62 175.44 88.05 Embodiment 2-2 99.50 176.18 81.40 Embodiment 3-1 99.39 172.28 84.34 Embodiment 3-2 99.40 165.58 81.79
[0071] From the above test, it can be seen that the product made by the deposition method of the present invention can indeed increase the electrical performance of the battery when as a positive electrode material.
[0072] Besides the solid state battery, the present invention could also apply to any electrochemical applications such as enzyme, or all kinds of electrode material.
[0073] The above specification, examples, and data provide a complete description of the present disclosure and use of exemplary embodiments. Although various embodiments of the present disclosure have been described above with a certain degree of particularity, or with reference to one or more individual embodiments, those with ordinary skill in the art could make numerous alterations or modifications to the disclosed embodiments without departing from the spirit or scope of this disclosure.