METHOD FOR DETECTING THE POSITION OF A MASK HOLDER ON A MEASURING TABLE

Abstract

The invention relates to a method for detecting the position of a mask holder for photolithographic masks, said method including the following steps: positioning the mask holder with the mask on a measuring table of a measurement apparatus, measuring the mask holder by use of an algorithm, storing the absolute position of the mask holder on the measuring table, and recording and storing at least one reference image.

Claims

1. A method for detecting the position of a mask holder for photolithographic masks, said method comprising: positioning the mask holder with the mask on a measuring table of a measurement apparatus, measuring the mask holder by use of an algorithm, and storing the absolute position of the mask holder on the measuring table, wherein at least one reference image is recorded and stored.

2. The method as claimed in claim 1, wherein holder edges are measured by use of an edge finding algorithm for the purposes of measuring the mask holder.

3. The method as claimed in claim 1, wherein the reference image comprises a portion of a holder edge.

4. The method as claimed in claim 1, wherein the mask holder is loaded again, the mask holder is positioned at the stored absolute position, at least one measurement image is recorded, and the relative position of the new position of the mask holder is determined by comparing at least one portion of a measurement image with at least one portion of the reference image.

5. The method as claimed in claim 4, wherein the comparison is implemented by use of a two-dimensional correlative image analysis.

6. The method as claimed in claim 1, wherein geometric parameters of the mask are measured in different rotational positions for the purposes of determining a systematic error of the position of the mask holder on the measuring table.

7. The method as claimed in claim 6, wherein the mask is measured in four rotational positions, respectively offset by 90, and the centrality of position marks on the mask is determined for each rotational position.

8. The method as claimed in claim 2, wherein the reference image comprises a portion of a holder edge.

9. The method as claimed in claim 2, wherein the mask holder is loaded again, the mask holder is positioned at the stored absolute position, at least one measurement image is recorded, and the relative position of the new position of the mask holder is determined by comparing at least one portion of a measurement image with at least one portion of the reference image.

10. The method as claimed in claim 9, wherein the comparison is implemented by use of a two-dimensional correlative image analysis.

11. The method as claimed in claim 3, wherein the mask holder is loaded again, the mask holder is positioned at the stored absolute position, at least one measurement image is recorded, and the relative position of the new position of the mask holder is determined by comparing at least one portion of a measurement image with at least one portion of the reference image.

12. The method as claimed in claim 11, wherein the comparison is implemented by use of a two-dimensional correlative image analysis.

13. The method as claimed in claim 2, wherein geometric parameters of the mask are measured in different rotational positions for the purposes of determining a systematic error of the position of the mask holder on the measuring table.

14. The method as claimed in claim 3, wherein geometric parameters of the mask are measured in different rotational positions for the purposes of determining a systematic error of the position of the mask holder on the measuring table.

15. The method as claimed in claim 4, wherein geometric parameters of the mask are measured in different rotational positions for the purposes of determining a systematic error of the position of the mask holder on the measuring table.

16. The method as claimed in claim 5, wherein geometric parameters of the mask are measured in different rotational positions for the purposes of determining a systematic error of the position of the mask holder on the measuring table.

17. The method as claimed in claim 9, wherein geometric parameters of the mask are measured in different rotational positions for the purposes of determining a systematic error of the position of the mask holder on the measuring table.

18. The method as claimed in claim 11, wherein geometric parameters of the mask are measured in different rotational positions for the purposes of determining a systematic error of the position of the mask holder on the measuring table.

19. The method as claimed in claim 13, wherein the mask is measured in four rotational positions, respectively offset by 90, and the centrality of position marks on the mask is determined for each rotational position.

20. The method as claimed in claim 14, wherein the mask is measured in four rotational positions, respectively offset by 90, and the centrality of position marks on the mask is determined for each rotational position.

Description

[0039] Exemplary embodiments and variants of the invention are explained in greater detail below with reference to the drawings. In the figures:

[0040] FIG. 1 shows a schematic illustration of a mask holder with a mask arranged therein and

[0041] FIG. 2 shows exemplary profiles of the mask edges in selected regions.

[0042] In an exemplary illustration, FIG. 1 shows a mask holder 1 with a mask 2 arranged therein on three point bearings that are not illustrated in the figure. Typically, the mask holder 1 is used to receive masks 2 to be measured and to bear the latter on the measuring table of the measurement system for the duration of the measurement; it is regularly used to receive different masks in succession. As already mentioned, accurate knowledge about the position of the mask holder 1 on the measuring table is essential for precise and reproducible measurement of structures on the mask 2. However, a systematic error is included in the establishment of the position of the mask holder 1 on the measuring table, said systematic error being due to the structure of the mask holder 1 itself. For the purposes of measuring the mask holder 1 on the measuring table, the measurement points, which are illustrated in the figure but not labeled separately, on the inner side of the mask holder 1 facing the mask 2 are used.

[0043] From the sectional magnification in the figure, it is clear that the measurement points are situated in the region of so-called protrusions 3, i.e., substantially rectangular projections. Since these protrusions 3 have both have an edge in the x-direction and have two edges in the y-direction, measuring of the mask holder 1 by use of a light microscope can be undertaken in both directions on the basis of a protrusion 3, without the mask holder 1 having to be displaced over long paths to this end. Here, variants in which the protrusions 3 can be dispensed with are also conceivable. For identification purposes, the edges are numbered in increasing fashion in FIG. 2 described below.

[0044] FIG. 2 shows, in an exemplary fashion, an edge profile in the regions denoted accordingly in the sectional magnification in FIG. 1, said edge profile having been established by use of a light microscope. The individual, irregular edge profiles, particularly in the y-direction, are clearly identifiable. When the mask holder 1 is now placed onto the measuring table, a certain offset, for example along the x-direction, may occur in relation to a first reference position of the mask holder 1 on the measurement table on account of the finite positioning accuracy of the handling robot used to this end. However, this offset leads to determining the y-edge (i.e., the edge used to determine the y-position of the mask holder 1 and extending in the x-direction) by fitting a straight line to the edge on the basis of a portion of the edge deviating from the reference position. The inhomogeneity of the y-edge, clearly visible in FIG. 2, then has an incorrect determination of the y-position as a consequence. However, if the profile of the edge in the region used for the measurement is also saved for the reference position, it is possible to determine the offset of the portion, and hence of the mask holder 1, in relation to the reference measurement in the x- and y-direction and also possible to determine possible tilts in particular for edges extending in an irregular fashion, such as precisely for the y-edges, on the basis of a comparison of the currently recorded image of the edge portion and the image recorded on the basis of the reference measurement. Hence, the determination of the position of the mask holder on the measuring table overall becomes more reproducible which, as illustrated above, also opens up the possibility of determining the systematic error when establishing the position of the mask holder 1.