Method for manufacturing antireflection function-equipped lens

Abstract

A dielectric multilayer film is formed on one surface of a lens main body, a film including aluminum is formed on the other surface of the lens main body, the film including aluminum is immersed in hot water without immersing the dielectric multilayer film in the hot water, thereby changing the film including aluminum to a fine uneven structure film including an alumina hydrate as a main component, whereby a lens provided with antireflection functions on both surfaces is manufactured.

Claims

1. A method for manufacturing a lens, comprising: forming a dielectric multilayer film on one surface of a lens main body; forming a film including aluminum on the other surface of the lens main body; and immersing the film including aluminum in hot water without immersing the dielectric multilayer film in the hot water to change the film including aluminum to a fine uneven structure film including an alumina hydrate as a main component, wherein the lens main body is set in a lens holder capable of holding the lens main body so that the other surface faces a liquid surface of the hot water, and only the other surface is immersed in the hot water; wherein the lens holder is horizontally held using a hanging tool at four corners of the lens holder so as to form a state in which only the other surface is immersed in the hot water; and wherein the hanging tool is constituted of four strings and is constituted to fix the lens holder by tying the strings at the four corners of the lens holder.

2. The method for manufacturing a lens according to claim 1, wherein an average pitch of the unevenness of the fine uneven structure film is in an order of several tens of nanometers to several hundreds of nanometers.

3. The method for manufacturing a lens according to claim 1, wherein an outermost surface of the dielectric multilayer film is MgF.sub.2.

4. The method for manufacturing a lens according to claim 3, wherein an average pitch of the unevenness of the fine uneven structure film is in an order of several tens of nanometers to several hundreds of nanometers.

5. The method for manufacturing a lens according to claim 1, wherein an immersion duration in the hot water is from one minute to 5 minutes.

6. The method for manufacturing a lens according to claim 5, wherein an average pitch of the unevenness of the fine uneven structure film is in an order of several tens of nanometers to several hundreds of nanometers.

7. The method for manufacturing a lens according to claim 3, wherein an immersion duration in the hot water is from one minute to 5 minutes.

8. The method for manufacturing a lens according to claim 7, wherein an average pitch of the unevenness of the fine uneven structure film is in an order of several tens of nanometers to several hundreds of nanometers.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

(1) FIG. 1 is a schematic sectional view illustrating a lens manufactured using a manufacturing method of an embodiment of the present invention.

(2) FIG. 2 is a perspective view describing the manufacturing method of the embodiment of the present invention.

(3) FIG. 3 is a view illustrating a section of FIG. 2.

(4) FIG. 4 is a view illustrating the wavelength dependency of reflectance of dielectric multilayer films in lenses manufactured by hot water treatments for different treatment durations in manufacturing methods of examples.

(5) FIG. 5 is a view illustrating the wavelength dependency of reflectance of dielectric multilayer films in lenses manufactured by hot water treatments for different treatment durations in manufacturing methods of comparative examples.

DESCRIPTION OF THE PREFERRED EMBODIMENTS

(6) Hereinafter, an embodiment of the present invention will be described with reference to the accompanying drawings.

(7) FIG. 1 is a schematic sectional view of an antireflection function-equipped lens 1 manufactured using a method for manufacturing an antireflection function-equipped lens according to an embodiment of the present invention.

(8) As illustrated in FIG. 1, the antireflection function-equipped lens 1 is constituted of a lens main body 2, an antireflection film consisting of a dielectric multilayer film 3 provided on one surface 2a thereof, and an antireflection film consisting of a fine uneven structure film 4 provided on the other surface 2b.

(9) A method for manufacturing an antireflection function-equipped lens is a method for manufacturing an antireflection function-equipped lens including antireflection films on both surfaces 2a and 2b by preparing the lens main body 2, forming the dielectric multilayer film 3 on the surface 2a of the lens main body 2, forming a film including aluminum on the other surface 2b, and then immersing only the surface 2b on which the film including aluminum is formed in hot water (boiling water), thereby changing the film including aluminum to a fine uneven structure film including an alumina hydrate as a main component.

(10) Examples of the film including aluminum include aluminum films, alumina films, and the like, and any films may be used as long as the films turn into boehmite by means of hot water treatments and thus change to fine uneven structure films including an alumina hydrate as a main component.

(11) The surface 2b is immersed in hot water while holding the lens main body 2 so as to prevent the dielectric multilayer film 3 formed on the surface 2a from being immersed in water. The immersion duration in hot water is preferably set to one minute or longer.

(12) FIG. 2 is a perspective view for describing the holding state of the lens main body during the hot water treatment, and FIG. 3 is a sectional view for describing liquid surfaces and the immersion region of the lens. FIGS. 2 and 3 illustrate an example in which the hot water treatment is carried out on not a single lens but a plurality of lenses at the same time, but the description is also identical to hot water treatments carried out on a single lens. Lenses 12 having a dielectric multilayer film 13 formed on one surface 12a and a film 14a including aluminum formed on the other surface 12b are set in a lens holder 31 capable of holding a plurality of the lenses 12 at the same time so that the surfaces on which the film 14a including aluminum face the liquid surface side (the lower surface) as illustrated in FIGS. 2 and 3. As illustrated in FIG. 2, the lens holder 31 is horizontally held using a hanging tool 30 at the four corners so as to form a state in which only the single surfaces 12b of the lenses 12 are in contact with the liquid surface. When the lenses are held for a certain period of time in hot water (in boiling water) in this state, the films 14a including aluminum change to transparent fine uneven structure films including an alumina hydrate as a main component.

(13) The hanging tool 30 illustrated in FIG. 2 is constituted of four strings and is constituted to fix the lens holder 31 by tying the strings through holes provided at the four corners of the lens holder 31 and horizontally hold the lens holder by adjusting the lengths of the four strings. The constitution of lens holding tools during the hot water treatment which consist of the lens holder 31 and the hanging tool 30 in the present embodiment is not particularly limited as long as lenses can be held so that only single surfaces thereof are immersed in water during the hot water treatment, and, for example, constitutions in which lenses are held by pinching the end portions of lens main bodies may be employed.

(14) The hydrate of alumina is boehmite (denoted as Al.sub.2O.sub.3.H.sub.2O or AlOOH) which is an alumina monohydrate, bayerite (denoted as Al.sub.2O.sub.3.3H.sub.2O or Al(OH).sub.3) which is alumina trihydrate (aluminum hydroxide), or the like.

(15) The cycle (average pitch) of the unevenness of the fine uneven structure film 4 is set to be sufficiently smaller than the wavelengths of light being used (for example, visible light or infrared light). Specifically, the cycle of the fine unevenness is in an order of several tens of nanometers to several hundreds of nanometers. In the fine uneven structure film 4, the pitch refers to the distance between the top points of convex portions that are most adjacent to each other with a concave portion therebetween, and the depth refers to the distance from the top point of a convex portion to a bottom portion of an adjacent concave portion.

(16) The fine uneven structure film has a structure in which the fine uneven structure film becomes more loose as being further away from base materials (the widths of voids corresponding to concave portions become large, and the widths of convex portions become small), and the refractive index becomes small as the fine uneven structure film is further away from base materials.

(17) The average pitch of the unevenness can be obtained by, for example, capturing images of the surfaces of the fine uneven structure using scanning electron microscopes (SEMs), binarizing the images by means of image processing, and carrying out statistical treatments. Similarly, the film thicknesses of the uneven structure film can be obtained by capturing images of the sections of the fine uneven structure film and processing the images.

(18) The dielectric multilayer film 3 formed on the surface 2a is generally constituted by alternately laminating layers of low refractive indexes and layers of high refractive indexes. As the layers of low refractive indexes, MgF.sub.2, SiO.sub.2, and Al.sub.2O.sub.3 can be used, and, as the layers of high refractive indexes, TiO.sub.2, ZrO.sub.2, Ta.sub.2O.sub.5, Nb.sub.2O.sub.5, and the like can be used. Particularly, it is preferable to form a layer consisting of MgF.sub.2 as the outermost surface of the dielectric multilayer film 3.

(19) According to the manufacturing method of the present invention, since the hot water treatment for forming the fine uneven structure film is carried out without immersing the dielectric multilayer film 3 in water, it is possible to maintain favorable antireflection performance of the dielectric multilayer film 3 without changing the spectroscopic characteristics of the dielectric multilayer film 3.

(20) According to studies by the present inventors, layers consisting of MgF.sub.2 have weak water resistance and have spectroscopic characteristics that extremely significantly change when the layers are subjected to the hot water treatments. Particularly, when the hot water treatment duration is set to one minute or longer, the change is significant. Therefore, in a case in which a dielectric multilayer film having a layer consisting of MgF.sub.2 as the outermost surface is provided, the manufacturing method of the present invention exhibit significant effects.

(21) In addition, since the fine uneven structure film is formed after the formation of the dielectric multilayer film, handling properties are favorable, risks of defects being generated in the fine uneven structure film are reduced, and antireflection function-equipped lenses can be manufactured at a high yield.

EXAMPLES

(22) Hereinafter, methods for manufacturing an antireflection function-equipped lens of examples and comparative examples of the present invention will be described.

Examples

(23) A method for manufacturing antireflection function-equipped lenses of the examples was carried out according to the following order.

(24) First, a lens material (BK7) was polished or molded so as to form a lens main body 2, and an antireflection film consisting of a dielectric multilayer film was formed on one surface 2a of the lens main body 2. Here, an 81 nm-thick Al.sub.2O.sub.3 film, a 131 nm-thick ZrO.sub.2 film, and a 98 nm-thick MgF.sub.2 film were formed on the lens surface 2a in this order using a vapor deposition method.

(25) After that, a 80 nm-thick Al.sub.2O.sub.3 film was formed on the other surface 2b of the lens main body 2 using a sputtering method.

(26) Next, a holder in which the lens was set was placed above the liquid surface of a hot-water bath so that only the other surface 2b of the lens main body 2 came into contact with hot water and was fixed near the liquid surface, thereby immersing only the lens surface 2b in hot water. After being immersed in boiling water for certain periods of time (0.5 minutes in Example 1, one minute in Example 2, two minutes in Example 3, three minutes in Example 4, four minutes in Example 5, and five minutes in Example 6), the lens was lifted, cooled, then, immersed in isopropyl alcohol (IPA), and was dried. Due to this treatment, in each of Examples 1 to 6, the Al.sub.2O.sub.3 film formed on the other surface 2b turned into boehmite and changed to a fine uneven structure film.

(27) By means of the above-described steps, antireflection function-equipped lenses having antireflection films respectively formed on both surfaces 2a and 2b of the lens main body 2 were obtained.

(28) For the lenses of Examples 1 to 6 that had been treated for the different hot water treatment durations, the antireflection functions of the dielectric multilayer films were measured. As the measurement of the antireflection functions, the spectroscopic spectra were measured using a reflection spectroscopic determination device (FE3000 manufactured by Otsuka Electronics Co., Ltd.).

(29) FIG. 4 illustrates the results of the measurement and is a graph illustrating the wavelength dependency of reflectance in the respective examples. Regardless of the durations of the hot water treatment, results illustrating the same wavelength dependency of reflectance of the dielectric multilayer films in the lenses of all the examples were obtained. It is considered that, since the dielectric multilayer films were not immersed in hot water, the characteristics did not change.

Comparative Examples

(30) A method for manufacturing antireflection function-equipped lenses of the comparative examples was carried out according to the following order.

(31) First, a lens material (BK7) was polished or molded so as to form a lens main body 2, and an antireflection film consisting of a dielectric multilayer film was formed on one surface 2a of the lens main body 2. Here, an 81 nm-thick Al.sub.2O.sub.3 film, a 131 nm-thick ZrO.sub.2 film, and a 98 nm-thick MgF.sub.2 film were formed on the lens surface 2a in this order using a vapor deposition method.

(32) After that, a 80 nm-thick Al.sub.2O.sub.3 film was formed on the other surface 2b of the lens main body 2 using a sputtering method. Next, the entire lens was immersed in a hot-water bath so that the entire lens came into contact with hot water as disclosed by JP2010-269957A described above. After being immersed in boiling water for certain periods of time (0.5 minutes in Comparative Example 1, one minute in Comparative Example 2, two minutes in Comparative Example 3, three minutes in Comparative Example 4, four minutes in Comparative Example 5, and five minutes in Comparative Example 6), the lens was lifted, cooled, then, immersed in isopropyl alcohol (IPA), and was dried. Due to this treatment, in each of Examples 1 to 6, the Al.sub.2O.sub.3 film formed on the other surface 2b turned into boehmite and changed to a fine uneven structure film.

(33) By means of the above-described steps, antireflection function-equipped lenses having antireflection films respectively formed on both surfaces 2a and 2b of the lens main body 2 were obtained.

(34) Similar to the examples, for the lenses of Comparative Examples 1 to 6 that had been treated for the different hot water treatment durations, the antireflection functions of the dielectric multilayer films were measured.

(35) FIG. 5 illustrates the results of the measurement and is a graph illustrating the wavelength dependency of reflectance in the respective examples. Before and after the hot water treatment process, the wavelength dependency of reflectance of the dielectric multilayer film in the lens significantly changed, and the reflectance significantly increased after the hot water treatment. Particularly, results in which the increase rates of the reflectance were great when the treatment durations were one minute or longer and, as the treatment durations extended, the reflectance after the treatments became great were obtained. This is a result illustrating that, when the hot water treatment is also carried out on the dielectric multilayer film at the same time, the reflection characteristics of the dielectric multilayer film change.