Nozzle and etching apparatus
10186434 ยท 2019-01-22
Assignee
- Boe Technology Co., Ltd. (Beijing, CN)
- HEFEI BOE OPTOELECTRONICS TECHNOLOGY CO., LTD. (Hefei, Anhui, CN)
Inventors
- Xilong Ding (Beijing, CN)
- Eryuan Huang (Beijing, CN)
- Chengsheng Wang (Beijing, CN)
- Zhaozeng Wu (Beijing, CN)
- Yubao Zi (Beijing, CN)
- Zuhong Liu (Beijing, CN)
Cpc classification
B05B1/20
PERFORMING OPERATIONS; TRANSPORTING
B05B13/0207
PERFORMING OPERATIONS; TRANSPORTING
International classification
B05B1/20
PERFORMING OPERATIONS; TRANSPORTING
B05B13/02
PERFORMING OPERATIONS; TRANSPORTING
H01L21/67
ELECTRICITY
Abstract
A nozzle for use in an etching apparatus and an etching apparatus including the nozzle are provided. The nozzle includes: a hollowed main body having a connector at one end thereof and a main-body outlet at the other end thereof, a main-body connection part being provided at an outer wall of the main body, said one end of the main body being connected with a pipe via the connector and a nozzle sleeve including a nozzle-sleeve connection part and a nozzle-sleeve outlet, the nozzle sleeve being connected to an outer side of said the other end of the main body having the main-body outlet through the nozzle-sleeve connection part and the main-body connection part and the nozzle sleeve is movable relative to the main body in an outflow direction of the main body.
Claims
1. A nozzle for use in an etching apparatus, comprising: a hollowed main body having a connector at one end thereof and a main-body outlet at the other end thereof, a main-body connection part being provided at an outer wall of the main body, and said one end of the main body being connected with a pipe via the connector; and a nozzle sleeve comprising a nozzle-sleeve connection part and a nozzle-sleeve outlet, the nozzle sleeve being connected to an outer side of said the other end of the main body having the main-body outlet through the nozzle-sleeve connection part and the main-body connection part; wherein the nozzle sleeve is movable relative to the main body in an outflow direction of the main body, wherein the nozzle-sleeve outlet is provided with a conduit pipe configured to change an outflow direction of an etchant, and the conduit pipe is configured to extend from a bottom of the nozzle sleeve in a direction away from the nozzle sleeve.
2. The nozzle according to claim 1, wherein an outer wall of the main-body connection part and an inner wall of the nozzle-sleeve connection part are provided with screw-threads matching with each other, and the main body and the nozzle sleeve are connected through the screw-threads.
3. The nozzle according to claim 1, wherein the nozzle-sleeve connection part is provided with a pin that is movable in a direction perpendicular to the outflow direction of the main body; and in the outflow direction of the main body, an outer wall of the main-body connection part is provided with a plurality of location holes for accommodating the pin.
4. The nozzle according to claim 1, wherein the main body is provided therein with a filtering structure configured to filter out foreign matters in an etchant.
5. The nozzle according to claim 4, wherein the filtering structure includes a filter net, a filter hole, a macroporous material, or a combination thereof.
6. The nozzle according to claim 1, wherein the pipe is made of an elastic material.
7. The nozzle according to claim 1, wherein a rotating shaft is provided at the nozzle-sleeve, and the conduit pipe is provided in the rotating shaft.
8. The nozzle according to claim 7, wherein a size of the rotating shaft is larger than a size of the nozzle-sleeve outlet in a direction perpendicular to the outflow direction of the main body, and the rotating shaft drives the conduit pipe to rotate to change the outflow direction of the etchant in the conduit pipe.
9. An etching apparatus, comprising nozzles according to claim 1 and pipes for supplying the etchant, each of the pipes being connected with a plurality of nozzles.
10. The etching apparatus according to claim 9, wherein a level of the nozzle-sleeve outlet at a middle portion of the pipe is lower than a level of the nozzle-sleeve outlet at a marginal portion of the pipe.
11. The etching apparatus according to claim 9, wherein the pipes comprise straight pipes and curved pipes, and the straight pipes are provided at outer sides of the curved pipes.
12. The etching apparatus according to claim 11, wherein the curved pipe has a certain radian towards a to-be-etched object.
13. The etching apparatus according to claim 9, wherein of nozzles at a marginal portion of the pipe is less than a density of nozzles at a middle portion of the pipe.
14. The etching apparatus according to claim 9, wherein a size of the nozzle-sleeve outlet at a marginal portion of the pipe is smaller than a size of the nozzle-sleeve outlet at a middle portion of the pipe.
Description
BRIEF DESCRIPTION OF THE FIGURES
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DETAILED DESCRIPTION OF THE EMBODIMENTS
(10) To make those skilled in the art better understand technical solutions of the present invention, the present invention will be described in detail below in conjunction with the accompanying drawings and specific embodiments.
(11) An embodiment of the present invention provides a nozzle for use in an etching apparatus, and
(12) In practical use, a plurality of nozzles are connected to the pipe 4 into which an etchant is supplied. Because the nozzle sleeve 2 is movable relative to the main body 1, the distances between the nozzle-sleeve outlets 21 corresponding to different positions of a substrate and the substrate may be adjusted, such that the pressure generated when the etchant comes into contact with the substrate can be controlled to reduce, even eliminate, the liquid accumulation effect to render uniform etching effect. For example, an adjustment may be performed such that a distance between the nozzle-sleeve outlet 21 corresponding to a central portion of a to-be-etched substrate and the to-be-etch substrate is smaller than a distance between the nozzle-sleeve outlet 21 corresponding to a marginal portion of the to-be-etched substrate and the to-be-etched substrate.
(13) Next, the specific structure of the nozzle provided by the embodiment of the present invention will be described with reference to
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(16) In some embodiments, as shown in
(17) In some embodiments, as shown in
(18) In some embodiments, as shown in
(19) Embodiments of the present invention further provide an etching apparatus.
(20) Optionally, as shown in
(21) Optionally, as shown in
(22) Optionally, as shown in
(23) According to this design, in addition to that the pressures generated when the etchant comes into contact with the substrate at different positions can be adjusted, the outflow volume of the etchant corresponding to the central portion of the substrate and that corresponding to the marginal portion of the substrate can also be adjusted, thereby further abating, even eliminating, the liquid accumulation effect.
(24) Needless to say, various modifications may be made to specific implementations of the above embodiments. For example, the nozzle-sleeve outlets having different dimensions may be provided, such that the outflow volumes of the etchant corresponding to different positions of the substrate can be controlled. For example, a size of the nozzle-sleeve outlet corresponding to a marginal portion of the substrate may be made smaller than that corresponding to a central portion of the substrate, thereby further abating, even eliminating, the liquid accumulation effect.
(25) It could be understood that the foregoing implementations are merely exemplary embodiments used for describing the principle of the present invention, but the present invention is not limited thereto. Those of ordinary skill in the art may make various variations and improvements without departing from the spirit and essence of the present invention, and these variations and improvements shall also fall into the protection scope of the present invention.