POLISHING PAD FOR A RELEASABLE ATTACHMENT TO A BOTTOM SURFACE OF A PLATE-LIKE BACKING PAD OF A POWER TOOL, BACKING PAD AND HAND-HELD POWER TOOL
20190001459 ยท 2019-01-03
Inventors
Cpc classification
B24B23/04
PERFORMING OPERATIONS; TRANSPORTING
B24D13/147
PERFORMING OPERATIONS; TRANSPORTING
B24B23/022
PERFORMING OPERATIONS; TRANSPORTING
International classification
Abstract
The invention refers to a hand-held power tool (1) comprising a plate-like backing pad (9) with a bottom surface (9a) and a polishing pad (11) with a top surface (11a) for releasable attachment of the polishing pad (11) to the bottom surface (9a) of the backing pad (9). The power tool (1) further comprises an electric or pneumatic motor adapted for actuating the backing pad (9), in order to make the backing pad (9) together with the polishing pad (11) attached thereto perform a purely rotating, a random orbital or a roto-orbital working movement. In order to provide for an easy and fast positioning of the polishing pad (11) in respect to the backing pad (9) it is suggested that the bottom surface (9a) of the plate-like backing pad (9) comprises at least one protrusion (13a; 13b; 13c; 13d) protruding from the bottom surface (9a) of the backing pad (9) and the top surface (11a) of the polishing pad (11) comprises at least one corresponding recess (12a; 12b; 12c; 12d), wherein the at least one protrusion (13a; 13b; 13c; 13d) is received by the at least one recess (12a; 12b; 12c; 12d) when the polishing pad (11) is attached to the backing pad (9).
Claims
1. Polishing pad (11) comprising a top surface (11a) adapted for releasable attachment of the polishing pad (11) to a bottom surface (9a) of a plate-like backing pad (9) of a hand-held power tool (1) and a bottom surface (11b) adapted for polishing a surface of a workpiece, the backing pad (9) being actuated by an electric or pneumatic motor of the hand-held power tool (1) in order to make the backing pad (9) together with the polishing pad (11) attached thereto perform a purely rotating, a random orbital or a roto-orbital working movement, characterized in that the top surface (11a) of the polishing pad (11) comprises at least one recess (12a; 12b; 12c; 12d) adapted for receiving at least one corresponding protrusion (13a; 13b; 13c; 13d) located at and protruding from the bottom surface (9a) of the plate-like backing pad (9) when the polishing pad (11) is attached to the backing pad (9).
2. Polishing pad (11) according to claim 1, wherein the at least one recess comprises an annular groove (12a) extending in the top surface (11a) of the polishing pad (11) in an equidistant manner in respect to a rotational axis (14) of the polishing pad (11).
3. Polishing pad (11) according to claim 1, wherein the at least one recess comprises an annular recess (12d) located along an outer circumference of the top surface (11a) of the polishing pad (11) in an equidistant manner in respect to a rotational axis (14) of the polishing pad (11).
4. Polishing pad (11) according to claim 1, wherein the at least one recess comprises a plurality of separate recesses (12a; 12b; 12c; 12d) located in the top surface (11a) of the polishing pad (11) in an equidistant manner to a rotational axis (14) of the polishing pad (11).
5. Polishing pad (11) according to claim 1, wherein the at least one recess comprises a plurality of separate recesses (12a; 12b; 12c; 12d) located in the top surface (11a) of the polishing pad (11) with different distances to a rotational axis (14) of the polishing pad (11).
6. Polishing pad (11) according to claim 4, wherein the separate recesses (12a; 12b; 12c; 12d) are located in the top surface (11a) of the polishing pad (11) with different circumferential distances in respect to one another.
7. Plate-like backing pad (9) of a hand-held power tool (1), the backing pad (9) comprising a bottom surface (9a) adapted for releasably attaching a top surface (11a) of a polishing pad (11), the backing pad (9) being actuated by an electric or pneumatic motor of the hand-held power tool (1) in order to make the backing pad (9) together with the polishing pad (11) attached thereto perform a purely rotating, a random orbital or a roto-orbital working movement, characterized in that the bottom surface (9a) of the plate-like backing pad (9) comprises at least one protrusion (13a; 13b; 13c; 13d) protruding from the bottom surface (9a) of the backing pad (9) and adapted for entering into a corresponding recess (12a; 12b; 12c; 12d) located in the top surface (8a) of the polishing pad (11) when the polishing pad (11) is attached to the backing pad (9).
8. Backing pad (9) according to claim 7, wherein the at least one protrusion comprises an annular collar (13a; 13d) protruding from the bottom surface (9a) of the backing pad (9) and extending in an equidistant manner in respect to a rotational axis (10) of the backing pad (9).
9. Backing pad (9) according to claim 8, wherein the annular collar (13a; 13d) extends along the outer circumference of the backing pad (9).
10. Backing pad (9) according to claim 8, wherein the annular collar (13a; 13d) extends in an equidistant manner in respect to the outer circumference of the backing pad (9).
11. Backing pad (9) according to claim 7, wherein the at least one protrusion comprises a plurality of separate protrusions (13a; 13b; 13c; 13d) each protruding from the bottom surface (9a) of the backing pad (9) and located there in an equidistant manner to a rotational axis (10) of the backing pad (9).
12. Backing pad (9) according to claim 7, wherein the at least one protrusion (14) comprises a plurality of separate protrusions (13a; 13b; 13c; 13d) each protruding from the bottom surface (9a) of the backing pad (9) and located there with different distances to a rotational axis (10) of the backing pad (9).
13. Backing pad (9) according to claim 11, wherein the separate protrusions (13a; 13b; 13c; 13d) are located on the bottom surface (7a) of the backing pad (7) with different circumferential distances in respect to one another.
14. Hand-held power tool (1) comprising a plate-like backing pad (9) with a bottom surface (9a) and a polishing pad (11) with a top surface (11a), the bottom surface (9a) and the top surface (11a) adapted for releasable attachment of the polishing pad (11) to the backing pad (9), and further comprising an electric or pneumatic motor adapted for actuating the backing pad (9), in order to make the backing pad (9) together with the polishing pad (11) attached thereto perform a purely rotating, a random orbital or a roto-orbital working movement, characterized in that the bottom surface (9a) of the plate-like backing pad (9) comprises at least one protrusion (13a; 13b; 13c; 13d) protruding from the bottom surface (9a) of the backing pad (9) and the top surface (11a) of the polishing pad (11) comprises at least one corresponding recess (12a; 12b; 12c; 12d), wherein the at least one protrusion (13a; 13b; 13c; 13d) is received by the at least one recess (12a; 12b; 12c; 12d) when the polishing pad (11) is attached to the plate-like backing pad (9).
15. Power tool (1) according to claim 14, wherein the plate-like backing pad (9) is designed according to one of the claims 7 to 13.
16. Power tool (1) according to claim 14 or 15, wherein the polishing pad (11) is designed according to one of the claims 2 to 6.
Description
[0017] Further characteristics and advantages of the present invention will be described hereinafter in more detail making reference to the accompanying figures. The figures show:
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[0032] With reference now to the drawings,
[0033] The power tool 1 shown in
[0034] The power tool 1 has a plate-like backing pad 9 rotatable about a rotational axis 10 and having a connection element (not shown) extending along the backing pad's rotational axis 10. The connection element is adapted for connecting the backing pad 9 to a backing pad holder (not shown) of the power tool 1. A bottom surface 9a of the backing pad 9 is provided with means for releasably attaching a polishing pad 11 according to the present invention. The attachment means can comprise a first layer of a hook-and-loop fastener (or Velcro), wherein the top surface 11a of the polishing pad 11 is provided with the second layer of the hook-and-loop fastener. The two layers of the hook-and-loop fastener interact with one another in order to releasably but safely fix the polishing pad 11 to the bottom surface 9a of the backing pad 9.
[0035] The plate-like backing pad 9 is made of a semi-rigid material, preferably a plastic material possibly with a metal insert 17 (see
[0036] The polishing pad 11 is in particular used for polishing a workpiece in the form of a vehicle or car body or the hull or any other part of a boat or ship. The workpiece is preferably made of wood, metal, plastic or a composite material (e.g. glass fiber reinforced, GFR, or carbon fiber reinforced, CFR, material) and may be provided with or without some kind of base coat, primer, paint and/or varnish. Some kind of polishing paste or polishing liquid may be applied to the working surface in order to enhance the polishing effect of the polishing pad 11 during its intended use. For example, the polishing pad can be made of a sponge- or foam-like material, in particular a plastics material like polyurethane with an open-cell structure. Furthermore, the polishing pad can comprise a support structure consisting of a plate-like element made of a plastics material, like polyurethane with a closed-cell structure, with microfibers attached to the bottom surface of the support structure. The microfibers are made of polyester and/or polyamide. Finally, the polishing pad can comprise a support structure consisting of a sponge-like element made of a plastics material, like polyurethane with an open-cell structure, with natural or synthetic wool attached to the bottom surface of the support structure. In the following embodiments the polishing pad 11 is made of sponge-like material but of course, the invention could be perfectly well also realized for other types of polishing pads 11.
[0037] The polishing pad 11 comprises a bottom working surface 11b with which the surface of the workpiece can be polished. The polishing pad 11 is preferably made of foamed plastics material having an open-cell structure (e.g. Polyamide (PA), Polyester, Polyurethane, etc.). The polishing pads 11 are available in different rigidities for different intended uses of the pad 11 (e.g. a more intense cutting polishing action of a workpiece or a softer finishing polishing action). The different rigidities of the foamed material are a result either of different materials used, different thicknesses of the pad 11, different cell structures (closed-cell or open-cell structure) and different sizes of the cells. The bottom working surface 11b is preferably made of the foamed plastic material of the pad 11. Alternatively, polishing pad 11 may comprise wool or microfiber material on its bottom surface 11b. Further, the polishing pad 11 preferably has the form of a truncated cone resulting in the top surface 11a having a smaller diameter than the bottom working surface 11b and in a slanting circumferential side wall 11c between the top surface 11a and the bottom surface 11b. Of course, the polishing pad 11 may also have the form of a cylinder with top and bottom surfaces 11a, 11 b of the same diameter and an upright circumferential side wall 11c, running perpendicular in respect to the top and bottom surfaces 11a, 11b. The bottom working surface 11b of the polishing pad 11 may comprise any type of three-dimensional structure, if desired, for example a waffle structure having depressions and hills located displaced in respect to one another (not shown).
[0038] The present invention suggests a polishing pad 11 and a plate-like backing pad 9, which are both adapted for providing for a fast and efficient attachment of the polishing pad 11 to the backing pad 9 in a predefined position in the plane of extension of the bottom surface 9a of the backing pad 9 and possibly also in a predefined rotational position in respect to a rotational axis 10 of the backing pad 9. In particular, by means of the present invention the polishing pad 11 can be easily centered in respect to the backing pad 9. If the polishing pad 11 is properly attached to the backing pad 9 a rotational axis 14 of the polishing pad 11 runs congruent in respect to the rotational axis 10 of the backing pad 9.
[0039] According to a first embodiment of the invention shown in
[0040] The top surface 11a of the polishing pad 11 and the bottom surface 9a of the backing pad 9 are at least partly provided with attachment means, preferably a hook-and-loop fastener (Velcro) for attaching the polishing pad 11 to the backing pad 9 in the aligned position. In this embodiment, preferably only center part 15 of the top surface 11a of the polishing pad 11 within the annular groove 12a is provided with the attachment means. Hence, the outer annular part 16 of the top surface 11a of the polishing pad 11 extending outside of the annular groove 12a has no attachment means. In that case the entire bottom surface 9a of the backing pad 9 inside the annular collar 13a would be provided with corresponding attachment means.
[0041] The co-operation of the at least one recess 12a on the top surface 11a of the polishing pad 11 with the at least one corresponding protrusion 13a on the bottom surface 9a of the backing pad 9 allows an exact and fast positioning and attachment of the polishing pad 11 in respect to the backing pad 9. The positioning can be effected in a translational direction (e.g. providing for an easy centering of the polishing pad 11 in respect to the bottom surface 9a of the backing pad 9) as well as in a desired rotational (angular) direction (e.g. providing for an easy alignment of dust suction holes in the backing pad 9 with respective openings in the polishing pad 11).
[0042] The described embodiment allows exact positioning of the polishing pad 11 in respect to the backing pad 9 in a predefined translational position within the plane of extension of the bottom surface 9a of the backing pad 9. This may be sufficient in many cases. However, it is noted that with the annular groove 12a and the annular collar 13a only, the polishing pad 11 can be attached to the bottom surface 9a of the backing pad 9 in any angular position (0 . . . 360) in respect to the rotational axes 10, 14. In this embodiment no alignment of the polishing pad 11 in respect to the backing pad 9 in a desired rotational (angular) position is possible. In order to achieve this object one or more further protrusions and corresponding recesses may be realized on the bottom surface 9a of the backing pad 9 or in the top surface 11a of the polishing pad 11, respectively, both not extending circumferentially (e.g. at least partly in a radial direction in respect to the rotational axes 10, 14). An example for such an embodiment is shown in
[0043] Another embodiment, which allows a fast and precise centering of the polishing pad 11 in respect to the backing pad 9 as well as a fast and precise angular positioning of the polishing pad 11 in respect to the backing pad 9 in a desired rotational position about the axes 10, 14, is shown in
[0044] A further embodiment of the present invention is shown in
[0045] The top surface 11a of the polishing pad 11 and the bottom surface 9a of the backing pad 9 are at least partly provided with attachment means, preferably a hook-and-loop fastener (Velcro) for attaching the polishing pad 11 to the backing pad 9 in the aligned position. In this embodiment, preferably only center part 15 of the top surface 11a of the polishing pad 11 within the annular recess 12d is provided with the attachment means. Hence, the outer annular part 16 (forming the bottom surface of the recess 12d) of the polishing pad 11 has no attachment means. Similarly, preferably only the center part 19 of the bottom surface 9a of the backing pad 9 within the annular protrusion 13d is provided with the attachment means. Hence, an outer annular part 20 of the backing pad 9 outside of the annular collar 13d has no attachment means.
[0046] In this embodiment the protrusion 13d comprises an annular collar extending along the entire circumference of the bottom surface 9a of the backing pad 9 in an equidistant manner in respect to the rotational axis 10 of the backing pad 9 and in respect to the outer circumferential edge of the backing pad 9. Of course, it would also be possible that there is a plurality of protrusions 13d each of which extending along a certain section of the outer circumference of the bottom surface 9a of the backing pad 9. It would also be possible that there is a plurality of recesses 12d each of which extending along a certain section of the circumference of the outer edge portion of the top surface 11a of the polishing pad 11.
[0047] Furthermore, it is also possible in the embodiment of
[0048] Yet another embodiment is shown in
[0049] The top surface 11a of the polishing pad 11 and the bottom surface 9a of the backing pad 9 are at least partly provided with attachment means, preferably a hook-and-loop fastener (Velcro) for attaching the polishing pad 11 to the backing pad 9 in the aligned position. In this embodiment, preferably only center part 15 of the top surface 11a of the polishing pad 11 within the annular recess 12d is provided with the attachment means. Hence, the outer annular part 16 (forming the bottom surface of the recess 12d) of the polishing pad 11 has no attachment means. In that case the entire bottom surface 9a of the backing pad 9 inside the annular collar 13a would be provided with corresponding attachment means.
[0050] In this embodiment the protrusion 13a comprises an annular collar extending along the entire outer circumference of the bottom surface 9a of the backing pad 9 in an equidistant manner in respect to the rotational axis 10 of the backing pad 9. Of course, it would also be possible that there is a plurality of protrusions 13a each of which extending along a certain section of the outer circumference of the bottom surface 9a of the backing pad 9. It would also be possible that there is a plurality of recesses 12d each of which extending along a certain section of the circumference of the outer edge portion of the top surface 11a of the polishing pad 11.
[0051] Furthermore, it is also possible in the embodiment of
[0052] Yet another embodiment is shown in
[0053] The top surface 11a of the polishing pad 11 and the bottom surface 9a of the backing pad 9 are at least partly provided with attachment means, preferably a hook-and-loop fastener (Velcro) for attaching the polishing pad 11 to the backing pad 9 in the aligned position. In this embodiment, to provide the entire bottom surface 9a (comprising partial surfaces 19 and 20) of the backing pad 9 and the entire top surface 11a (comprising partial surfaces 15 and 16) of the polishing pad 11 with corresponding attachment means.
[0054] In this embodiment the protrusion 13d comprises an annular collar extending along the entire circumference of the bottom surface 9a of the backing pad 9 in an equidistant manner in respect to the rotational axis 10 and to the outer circumferential edge of the backing pad 9. Of course, it would also be possible that there is a plurality of protrusions 13d each of which extending along a certain section of the circumference of the bottom surface 9a of the backing pad 9. It would also be possible that there is a plurality of grooves 12a each of which extending in the top surface 11a along a certain section of the circumference of the polishing pad 11.
[0055] Furthermore, it is also possible in the embodiment of
[0056] Finally,
[0057] It is an aspect of the present invention to provide for a plug-and-socket-type of releasable connection between the top surface 11a of a polishing pad 11 and the bottom surface 9a of a backing pad 9. To this end at least one protrusion 13a; 13b; 13c; 13d and at least one corresponding recess 12a; 12b; 12c; 12d for receiving the protrusions 13a; 13b; 13c; 13d are provided on the bottom surface 9a of the backing pad 9 and in the top surface 11a of the polishing pad 11, respectively. Preferably but not necessarily the number of protrusions 13a; 13b; 13c; 13d and recesses 12a; 12b; 12c; 12d is the same. This allows a fast attachment of a polishing pad 11 to a backing pad 9 in a desired translational position thereby permitting an easy centering of the polishing pad 11 in respect to the backing pad 9. Furthermore, by positioning and designing the at least one protrusion 13a; 13b; 13c; 13d and the at least one corresponding recess 12a; 12b; 12c; 12d accordingly, the polishing pad 11 can even be positioned in a desired rotational (or angular) position (about the rotational axes 10, 14) in respect to the backing pad 9 thereby permitting alignment of suction holes provided in the backing pad 9 with corresponding openings in the polishing pad 11.