Processing system for recovering heat, and a method for operating same
11592211 · 2023-02-28
Assignee
Inventors
Cpc classification
Y02P20/133
GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
F24S60/00
MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
Y02E60/14
GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
Y02E10/40
GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
F28D2020/0008
MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
F28D20/0056
MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
F28D17/04
MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
International classification
F24S60/00
MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
F28D20/00
MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
F28D17/04
MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
Abstract
The invention relates to a processing system comprising a processing unit (1, 60, 100) that can be operated between an upper (To) and a lower (Tu) temperature. A first heat accumulator (3, 61) and a second heat accumulator (4, 62) are operationally interconnected by means of a line arrangement (L) for a heat-transporting medium, said processing unit (1, 60, 100) being arranged in a first section (I) of said line arrangement (L) between the first (3, 61) and the second heat accumulator (4, 62).
Claims
1. A method for cyclic heating and cooling of a processing unit that is operable between an upper and a lower temperature, wherein a first process step occurs at the upper temperature and a second process step occurs at the lower temperature, wherein the processing unit is adapted as a reactor which is adapted to produce synthesis gas and operatively switched between a first and a second heat accumulator, wherein in a charged state the first and the second heat accumulators give off heat in the upper temperature range and the temperature tends towards the lower temperature during discharge, wherein during charging the first and the second heat accumulators can be charged with heat initially in the lower temperature range and subsequently in the upper temperature range, wherein said processing unit is brought alternately to the upper temperature and the lower temperature by cyclically changing a flow direction of a heat transporting medium flowing through the first and the second heat accumulators—and thus also through the processing unit, wherein a flow direction before the cyclic reversal is maintained until the processing unit has been heated from the lower temperature to a recovery temperature and subsequently cooled back down to the lower temperature, and wherein the flow is synchronised with the processing unit in such manner that a current temperature difference between the heat transporting medium flowing through the processing unit and the processing unit does not exceed a predetermined value.
2. The method according to claim 1, wherein the heat accumulators are operated with a wave-like temperature stratification which forms a wave.
3. The method according to claim 2, wherein the change of the flow direction is clocked in such a way that the wave continuously advances into and retreats out of both heat accumulators to the same distance in a continuous, constant propagation in symmetrical operation.
4. The method according to claim 2, wherein the change of the flow direction is clocked in such a way that the wave advances into one heat accumulator a shorter distance than the other and retreats therefrom in continuous asymmetrical oscillating operation, preferably until the peak temperature thereof.
5. The method according to claim 2, wherein the wave does not reach the sides of the heat accumulators facing away from the processing unit during operation, such that these sides remain cold.
6. The method according to claim 1, wherein the processing unit is designed as a directly illuminated solar reactor.
7. A processing system comprising a processing unit which can be operated between an upper and a lower temperature, wherein a first process step takes place at the upper temperature and a second process step takes place at the lower temperature, wherein a first heat accumulator and a second heat accumulator are operatively interconnected by means of a line arrangement for a heat-transporting medium, wherein the processing unit is adapted as a reactor which is adapted to produce synthesis gas and arranged in a first section of the line arrangement between the first and the second heat accumulator, wherein the line arrangement and each of the first heat accumulator and the second heat accumulator are adapted for a flow of heat transporting medium to the processing unit in both the upper temperature and the lower temperature, wherein a feed for the heat transporting medium is arranged in the upper temperature region in the first section of the line arrangement upstream of the processing unit, a solar receiver is provided for heating the heat-transporting medium, wherein a third section of the line arrangement connects the solar receiver with the feed, and wherein a third heat accumulator is provided, which is connected to the feed by a fourth section of the line arrangement in such manner that heat from the solar receiver can be stored in the third heat accumulator.
8. The processing system according to claim 7, wherein the first heat accumulator and the second heat accumulator are connected by means of a second section of the line arrangement on the respective side facing away from the processing unit.
9. The processing system according to claim 8, wherein a cooling unit for the heat-transporting medium is arranged in the second section of the line arrangement.
10. The processing system according to claim 8, wherein switching elements for operating the first and the second section of the line arrangement are arranged in the second section of the line arrangement.
11. The processing system according to claim 7, wherein the first heat accumulator and the second heat accumulator are in the form of layered heat accumulators.
12. The processing system according to claim 7, wherein the first heat accumulator and the second heat accumulator have a heat storing filling of bulk material and the heat transporting medium is a gas.
13. The processing system according to claim 7, wherein the first heat accumulator and the second heat accumulator each have a cold side during operation.
14. The processing system according to claim 13, wherein a second section of the line arrangement is preferably provided which connects said cold sides to each other.
15. The processing system according to claim 7, wherein the first line section is free of switching elements for the operation of the processing system.
16. The processing system according to claim 7, wherein the processing unit is constructed as a solar reactor which is illuminated by the Sun.
Description
(1) In the following text, the invention will be explained for exemplary purposes with reference to figures. In general, the same items are designated with the same reference numerals in the drawing. In the drawing:
(2)
(3)
(4)
(5)
(6)
(7)
(8)
(9)
(10)
(11) In the embodiment shown, processing unit 2 is in the form of a cerium reactor, which is suitable for the reactions described in ETH Dissertation No. 21864. For this purpose the input side thereof is connected via a line 16a to a CO.sub.2 tank 8 through a valve 11 and to a H2O tank 9 through a valve 12, and the output side thereof is connected via a line 16b through a valve 13 and a pump 14 to a syngas tank 10, in which a gas mixture consisting mainly of CO and H.sub.2 as the final products is collected.
(12) It is further shown that the respective sides 3b, 4b of the first 3 and the second heat accumulator 4 facing away from processing unit 2 are connected to one another via a second section II of the line arrangement L through line arrangement 6 thereof. The two sections I and II of line arrangement L form a circuit for the heat transporting medium flowing therein, which may be argon, for example, which is also suitable for transporting heat at high temperatures.
(13) A pump assembly 15 serves to maintain the flow direction of the heat-transporting medium in both directions of the circuit and to reverse it as necessary. For the sake of simplicity, in the diagram pump assembly 15 is represented with two pumps 15a and 15b, which can be switched into the circuit or decoupled therefrom via valves 15c and 15c. Of course, the person skilled in the art can 15 design the pump assembly according to the requirements of a given situation.
(14) At this point, it should be noted that in a further embodiment—not shown—line section II may also be omitted. For example, the sides 3b, 4b of heat accumulators 3, 4 facing away from processing unit 2 are then open, that is to say they are in contact with the environment, so the heat-transporting medium may be ambient air passing through heat accumulators 3, 4, processing unit 2 and thus through line section I. Here too, the person skilled in the art will choose the closed circuit shown or an open arrangement depending on the specific circumstances (design of processing unit for any industrial process with the respective upper and lower temperatures). Finally, it is possible to provide tanks for the heat transporting medium instead of line section II on the respective sides facing away from processing unit 2 so that a medium other than ambient air may then be used as well.
(15) As mentioned above, the processing unit 2 shown in the embodiment in the figure is designed as a cerium reactor, and in this case is operated cyclically with a lower temperature in the range of 1300° K for example, and an upper temperature in the range of 1800° K for example (here too, it is a simple matter for the person skilled in the art to specify all of the parameters according to the selected process). Accordingly, the reactor must be heated and then cooled again continuously. According to the invention, the heat that is transported away from the reactor at it is cooled is predestined to be stored in one of the heat accumulators 3, 4 and used for the subsequent (re)heating, and recovered in this way. An efficiency of 100% is not possible, with the consequence that during heating in an elevated temperature range up to the upper temperature (in this case 1800° K), heat must be supplied to the reactor from the outside, by the Sun 7, for example, which shines on processing unit 2 (in this case the cerium reactor) or also indirectly by another heat accumulator—not shown here to simplify to the figure—which in turn is charged by solar energy (or by heat acquired by some other means) (on this point, see
(16)
(17) Apart from a starting process, at time t.sub.u the heating begins of the reactor which is at the lower temperature T.sub.u using heat recovered from heat accumulators 3, 4 (
(18) As the reactor is heated from T.sub.u to T.sub.o, the cerium is reduced, O.sub.2 is released and discharged from the reactor continuously through a pipe which is not shown in
(19) Then the cycle can start again. It should be noted that the operating temperature T.sub.B of the heat accumulators 3, 4, i.e. the maximum temperature of the heat stored in them, is between T.sub.K and T.sub.R since a certain temperature difference between the heat exchanging medium and the reactor, that is to say the heat accumulators, is unavoidable.
(20) According to
(21) Particularly efficient recovery can be achieved if in accordance with a preferred embodiment of the invention the first 3 and the second heat accumulator 4 are designed as layered heat accumulators, i.e., heat accumulators which can be operated with a defined temperature distribution, thus yielding particularly high efficiency as well as a simple and inexpensive design according to the invention.
(22)
(23)
(24) Diagram 34 shows the temperature distribution of the heat accumulator 30 initially at ambient temperature T.sub.UG while it is taking up heat, for which a gas at an operating temperature T.sub.B flows through it to the right, in the direction of the arrow.
(25) Four temperature distribution curves 35 to 38 corresponding to the progressive charging times t.sub.i to t.sub.4 are shown. When charging begins, the bulk material 32 located at the inlet to heat accumulator 30 heats up, causing the gas to lose its heat, so that the subsequent quantities of bulk material 32 are heated correspondingly less and the bulk material 32 quantities after those are heated less still due to the constant temperature loss of the gas. At time t.sub.1, a temperature distribution is established which decreases in steps in the flow direction according to curve 35. The continued charging results in the stepped temperature distribution of curve 36 (time t.sub.2), i.e. the step gains height with the increasing temperature of bulk material 32 at the inlet to heat accumulator 30, although the step moves only slightly in the flow direction. Finally, at time t.sub.3 the bulk material on the inlet side has reached the operating temperature T.sub.B of the gas, so that as charging continues, the step advances through the bulk material 32 in the direction of flow, see the curve 37 at time T.sub.4. In other words, a temperature step or ramp is created in the accumulator during charging and builds up at the beginning charging (curves 35 and 36) and then shifts in the flow direction as charging continues (curve 37) until it reaches the far end of heat accumulator 30 and has passed beyond this to some degree, so that the heat accumulator 30 which is fully charged at time t.sub.4 has a temperature distribution corresponding to curve 38 at the level of operating temperature T.sub.B. It should be noted that the gas entering at operating temperature T.sub.B leaves the heat accumulator at the lower ambient temperature T.sub.UG until the step reaches its outlet (here at line 30b).
(26) Diagram 40 in
(27) Diagram 45 in
(28) The inlet-side bulk material thus heats the gas entering at T.sub.UG up to the operating temperature T.sub.B and is thus cooled itself somewhat, although the gas which has now been heated to T.sub.B continues to flow to the right and accordingly heats the region of bulk material 32 located immediately beyond up to T.sub.B, and loses more heat in the process, so that a region of bulk material 32 yet farther beyond the first region is still warmed, but to a lower temperature, and so on, thereby yielding a temperature distribution as reflected by curve 46 at time t.sub.3*. The gas which continues to enter at temperature T.sub.UG cools the inlet-side bulk material 32 down further, but absorbs this heat and transports it in the flow direction—at time t.sub.4*, the temperature distribution corresponds to curve 47 and as gas continues to enter at temperature T.sub.UG the temperature distribution by t.sub.5* corresponds to curve 48. In other words, the temperature distribution no longer has the form of a step, but rather a wave which passes through heat accumulator 30 in the flow direction. It should be noted that in this operating mode the gas enters and exits at the lower temperature T.sub.UG while the wave forms and runs through heat accumulator 30 in the direction of flow for the whole time until the wave reaches the outlet at line 30b, and only then does discharging of heat accumulator 30 begin, which lasts until the wave has passed completely “through” line 30b.
(29) It should be pointed out that waves are formed in a wide variety of shapes, depending for example on how the temperature flowing into the heat accumulator changes. In the following text, the term “wave” will be used simply for all such possible wave forms.
(30) Diagram 50 in
(31) As mentioned earlier, the temperature distribution according to curve 48 at time t.sub.5* exists as the starting position at the moment when the flow direction is reversed, although now the wave propagates in the opposite direction of flow, to the left towards line 30a. There follows a period of time after the reversal of the flow direction I which the temperature distribution corresponds to curve 51 at time t.sub.6*, and after that according to curve 52 at time t.sub.7*. It should be noted that during the discharge of heat accumulator 30 shown in diagram 50 the gas flows in at ambient temperature T.sub.UG and initially also flows out at ambient temperature T.sub.UG, until the preceding temperature edge of the wave has reached line 30a, wherein the rising edge of the wave then increases in accordance with the temperature up to the operating temperature T.sub.B and then drops again in accordance with the following falling edge until heat accumulator 30 is completely discharged.
(32) During appropriate operation, i.e. in operation with only partial charging even when the heat-transporting gas flows through it continuously, heat accumulator 30 has a warm side and a cold side, see diagrams 34 and 40 of
(33)
(34) The operation of processing system 60 now causes cerium reactor 63 according to
(35) Diagrams 70 to 74 show temperature distribution curves 76 to 80 for different operating states of the arrangement of the cerium reactor 63 with the first 61 and the second heat accumulator 62, wherein sections A, B and C each display the area or length in the flow direction of the heat-transporting medium of the first heat accumulator 61, the cerium reactor 63 and second heat accumulator 62.
(36) Diagram 70 shows temperature distribution curve 76 after a first part of a startup process of processing system 60 at time t.sub.0. The first heat accumulator 61 is charged with heat in such manner that a temperature wave W is present with a peak temperature T.sub.B, the wherein the edges of the wave W, fall to ambient temperature T.sub.UG, here for example 300° K. Cerium reactor 63 and the second heat accumulator 62 are still at ambient temperature T.sub.UG. For the second part of the startup, argon at ambient temperature T.sub.UG flows to the right from opening 65a through the first heat accumulator 61, cerium reactor 63 and heat accumulator 62 to opening 65b, see the direction of the arrow in diagram 70, with the result that wave W moves to the right, in the flow direction, as described in the notes on diagram 45,
(37) Diagram 71 shows the temperature distribution curve 77 at time t.sub.10 wherein the temperature wave W has moved so far to the right in the direction of flow that the leading edge thereof has reached cerium reactor 63 and has partly passed through it, that is to say the argon has flowed through cerium reactor 63 with a rising temperature T.sub.F between T.sub.UG and T.sub.B of the edge and has heated it accordingly.
(38) Since the temperature wave W penetrates cerium reactor 63 with a rising edge temperature T.sub.F starting from T.sub.UG, it heats the reactor constantly, so that the temperature difference between T.sub.F and that of reactor 63 always remains small. Of course, the argon loses some heat as a result of this, see the temperature drop of temperature distribution curve 71 in section B, according to which the argon exits cerium reactor 63 at a temperature below T.sub.F. Finally, the second heat accumulator 62 is heated by the incoming argon so that temperature distribution curve 77 has an edge in section C, see the description of
(39) Moreover, the wave W that is propagated through cerium reactor 63 some extent “does not see” this (with this exception of the temperature drop due to the transfer of heat between the argon and reactor 63), but of course is torn apart over the length of reactor 63 (section B), as is shown in temperature distribution curve 77.
(40) In summary, the startup process is completed as soon as the temperature distribution corresponds to temperature distribution curve 77: reactor 63 is at T.sub.u, wherein first heat accumulator 61 is charged with wave W in such manner that reactor 63 is brought to T.sub.B thereby and can then be cooled to T.sub.u again. In other words, reactor 63 at P.sub.u of the diagram 20 in
(41) Diagram 72 shows temperature distribution curve 78 later, at time t.sub.11, wherein wave W has advanced so far into cerium reactor 63 that argon is flowing through it at the upper temperature T.sub.B. The cerium reactor has thus been heated to a temperature T.sub.R (
(42) Diagram 73 shows temperature distribution curve 79 at time t.sub.12 wherein wave W has advanced farther through cerium reactor 63 between time t.sub.11 and time t.sub.12, so that now its trailing, falling edge is passing through it and the crest of wave W has propagated as far as the second heat accumulator 62. As long as the trailing edge of wave W is passing through it, cerium reactor 63 continuously gives off heat to the argon, since despite the ongoing loss of heat by the reactor 63, in accordance with the falling edge the argon is always cooler than the cerium reactor, which loses heat more slowly than the gas.
(43) Again, the difference between the current temperature of the argon and of reactor 63 is small. At time t.sub.12, reactor 63 is at point P.sub.KE of diagram 20,
(44) Then, the flow direction is switched to the left, in the direction of the bottom arrow, i.e. from line 65b to line 65a, whereupon wave W moves to the left and reactor 63 is in turn warmed by the passing of the leading, rising edge and then cooled by the trailing, falling edge thereof.
(45) Diagram 74 shows temperature distribution curve 80 at time t.sub.14, wherein wave W has passed so far through cerium reactor 63 that after heating to T.sub.R (and by external heat to T.sub.o, see diagram 20,
(46) In summary, after a starting process according to diagram 70, processing system 60 has a temperature distribution according to diagram 71, wave W is then sent through reactor 63 in a flow direction (in this case: to the right) so that the temperature distribution according to diagram 73 is present, and from there wave W is then sent back through the cerium reactor 63 in the opposite flow direction (in this case: to the left) until the temperature distribution according to diagram 74 is present, serving as the starting point for a new cycle, i.e. in the one flow direction to the state according to diagram 73 and then back in the other flow direction to the state according to diagram 74, and so on for as long as the process is to run. Starting from the middle of reactor 73, the wave W moves to symmetrically located end positions in heat accumulators 61 and 62. After the starting process, the wave extends along the length L.sub.SYM of cerium reactor 63 into both heat accumulators 61, 62, or sections A and C, see diagram 74 in conjunction with diagram 73. This means that during operation both heat accumulators are always at ambient temperature T.sub.UG, that is to say cold, at the outer sections thereof around openings 65a and 65b, while inside of the processing system a cyclical heat exchange takes place between reactor 63 and heat accumulators 61, 62 due to the wave W which is continuously travelling back and forth as shown in diagrams 73, 74.
(47)
(48) As a result, reactor 63 is heated starting from the state according to the diagram 85 until the state according to diagram 86 and is cooled after the flow is reversed starting from the state according to diagram 86 to that of diagram 87 after which the cycle begins again. Accordingly, the oscillating wave W penetrates less deeply into second heat accumulator 62 than is the case for first heat accumulator 61, so that the end positions of the accumulators are no longer symmetrical, but asymmetrical. The corresponding lengths L.sub.ASYM are plotted in diagram 87 in conjunction with diagram 86. It follows that the second heat accumulator 62 may advantageously be designed to be shorter than is the case in the embodiment according to
(49) The heat losses during the heat exchange described with reference to
(50) In the embodiment of processing system 60 described in
(51) Furthermore, the respective sides of heat accumulators 61 and 62 facing away from reactor 63 (at openings 65a and 65b) always run at ambient temperature T.sub.UG during operation, while the sides thereof facing towards reactor 63 around the line sections 64a and 64b (after the start process) always work at elevated temperatures between T.sub.u and T.sub.B, the peak temperature of the (oscillating) wave W.
(52) Accordingly, during operation the first heat accumulator (61) and the second heat accumulator (62) each have a cold side, and a second section (II) of the line arrangement (L) is provided which connects these cold sides to one another. The cold sides may also be in contact with the environment or with other systems even if second section II is not present, as is the case in one embodiment described with reference to
(53)
(54) Consequently, the person skilled in the art is able to dimension the length of the heat accumulators in the embodiment of
(55) At this point it should also be emphasised that the cold side of the heat accumulators is at ambient temperature T.sub.UG for most applications. Depending on the specific case, however, it may be appropriate for the cold sides, i.e. the sides of the heat accumulators facing away from the processing unit are at a higher temperature during operation, up to 400° C. for example or even higher—for example if the heat transporting fluid still circulates in other systems connected to the processing system or itself is in heat exchange contact with such other systems. In the present case, however, the term “cold side” is always used to distinguish these sides from the warm side of heat accumulators. The person skilled in the art may provide a starting process which is specifically designed for operation with a cold side that is at higher than ambient temperature T.sub.UG,—the operating principle described in
(56) From the preceding description relating to
(57) In this context, one flow direction is preferable maintained before the cyclic reversal, until processing unit 2 has been heated from the lower temperature to a recovery temperature and subsequently cooled again to the lower temperature (see the embodiment of
(58) Also preferably, the heat accumulators are operated with a wave-like temperature stratification which forms a wave W. The reversal of the flow direction is particularly preferably clocked in such manner that the wave advances into and retreats out of both heat accumulators to the same distance in a continuous, constant propagation in symmetrical operation. Alternatively, the change of flow direction may also be clocked in such manner that the wave advances a shorter distance into and retreats from one heat accumulator than the other in continuous asymmetrical oscillating operation, preferably until the peak temperature thereof.
(59) The advantages that are achievable according to the invention with a cold (and hot) side of the heat accumulators are derived particularly effectively if preferably in operation the wave W does not fully reach the sides of the heat accumulators facing away from the processing unit, such that these sides remain below a predetermined temperature, and preferably does not reach them at all, such that these sides remain cold.
(60) Finally, the person skilled in the art can also adjust the flow to the processing unit in such manner that a current temperature difference between the heat transporting medium flowing through the processing unit and the processing unit itself does not exceed a predetermined value.
(61) In all the embodiments shown, the processing unit can be configured as either a directly or indirectly irradiated solar reactor.
(62)
(63) Again, a processing unit in the form of a cerium reactor 63 is shown, processing unit, with which the lines for circulating the heat transporting medium and all the reagents needed are in operating communication. The diagram shows lines 101a and 101b of a first section I of a line arrangement L, and a second section II of the line arrangement L with a pump assembly 103 having pumps 103a and 103b, each of which is equipped with a check valve, and a tank 104 for the heat transporting medium, here again argon. Also visible are the CO.sub.2 tank 8, the H.sub.2O tank 9 and the syngas tank 10 (see also the description associated with
(64) In addition, however, a third heat accumulator 110 and a solar receiver 111 for sunrays 111a must also be considered, wherein both can be switched into the circuit of the heat transporting medium, and receiver 111 and heat accumulator 110 are designed to generate and store heat to at least the upper temperature T.sub.o. The third heat accumulator 110 is preferably designed as a layered heat accumulator according to
(65) It should be pointed out that the dashed line drawn in processing system 100 in the figure represents the boundary between the warm side thereof, which includes the reactor 63, and its cold side, in which all switching elements such as valves and the pump assembly 103 are arranged. The advantageous arrangement according to the invention is made evident again, according to which all switching devices may be disposed easily and inexpensively in the cold area (preferably ambient temperature T.sub.UG), whereas in the warm area, at temperatures between T.sub.R and T.sub.o, which may exceed 1300° K or 2300° K, only pipes for the heat transporting medium and substance which react or are formed in the reactor must be provided, and these may be made simply and inexpensively from ceramic for example.
(66) Line 117b forms a third section III and line 115c a fourth section IV of line arrangement L.
(67) This means that according to the embodiment shown, a feeder 116 for the heat transporting medium in the upper temperature range is arranged upstream of the processing unit in first section I of line arrangement L, more preferably a solar receiver for heating the heat transporting medium is provided, wherein a third section of the line arrangement connects the solar receiver to the feed, and finally, particularly preferably, a third heat accumulator is provided and is connected to the feed via a fourth section of the line arrangement, wherein heat from the solar receiver may be stored in this third heat accumulator.
(68) The embodiment according to
(69)
(70)
(71)
(72) However, this switching state is also present in period t.sub.K to t.sub.KE or between points P.sub.K to P.sub.KE (see
(73)
(74) For this purpose, pump 103c displaces argon from tank 104 through heat accumulator 110, where it absorbs heat, then through lines 115c and 116 into reactor 63, and from here through line 101a into heat accumulator 62, which is thus charged with heat to above T.sub.R, and finally cooled to ambient temperature t.sub.UG, back into tank 104. The lines involved in this circuit are highlighted in bold in the figure.
(75) Alternatively, pump 103d may be switched in, so that heat-transporting medium warmed simultaneously by receiver 111 and the third heat accumulator 110 flows into the reactor through line 116. Likewise, only pump 103d can be activated, not pump 103c, so that the switching state of processing system 100 corresponds to that of
(76) It should be emphasized that in diagram 73 of
(77)
(78) For this purpose, pump 103a displaces argon from tank 104 through heat accumulator 62, then through line 101a into reactor 63, and from there through line 101b into heat accumulator 61, and finally cooled to ambient temperature t.sub.UG, back into tank 104. The lines involved in this circuit are highlighted in bold in the figure.
(79)
(80) The figure does not show the second section II of line assembly L or tanks 8 to 10 for CO.sub.2, H.sub.2O and the syngas tank 10, in which the gas mixture consisting mainly of CO and H.sub.2 is collected as the final products. All these components can be easily designed and positioned by a person skilled in the art according to specific circumstances, since they only need to be configured for the area of the ambient temperature T.sub.UG range (or another relatively low temperature depending on the specific case) and, as indicated earlier, comparatively costly high-temperature-switching devices and high temperature pumps in the hot area of line arrangement L can be dispensed with.
(81) The first, second and third heat accumulators 61, 62 and 110, the reactor 63 and the receiver 111, which is arranged behind a transparent section provided in the cladding 120 for sunrays are shown inside cladding 2. Also visible are the line for cold heat transporting medium 117a leading to receiver 111, lines 117b and 116 leading away from the receiver 111 towards reactor 63, and lines 101a and 101b of the first section I of line arrangement L. Slightly hidden behind heat accumulator 110 is line 119 from reactor 63 to the tank 10 for syngas, which is not shown here (