Laminate and method for producing laminate

Abstract

A laminate including a glass plate and a coating layer, wherein the coating layer includes one or more components selected from the group consisting of silicon nitride, titanium oxide, alumina, niobium oxide, zirconia, indium tin oxide, silicon oxide, magnesium fluoride, and calcium fluoride, wherein a ratio (dc/dg) of a thickness dc of the coating layer to a thickness dg of the glass plate is in a range of 0.05×10.sup.−3 to 1.2×10.sup.−3, and wherein a radius of curvature r1 of the laminate with negating of self-weight deflection is 10 m to 150 m.

Claims

1. A laminate comprising a glass plate and a coating layer, wherein the coating layer includes one or more components selected from the group consisting of silicon nitride, titanium oxide, alumina, niobium oxide, zirconia, indium tin oxide, silicon oxide, magnesium fluoride, and calcium fluoride, a ratio (dc/dg) of a thickness dc of the coating layer to a thickness dg of the glass plate is in a range of 0.4×10.sup.−3 to 1.2×10.sup.−3, and a radius of curvature rl of the laminate with negating of self-weight deflection is 10 m to 150 m.

2. The laminate according to claim 1, wherein the thickness dg is in a range of 0.3 mm to 3.0 mm, and the thickness dc is in a range of 0.05 μm to 1.2 μm.

3. The laminate according to claim 1, wherein a composition of glass used for the glass plate includes, as expressed in mass percentage: SiO.sub.2 at 40% to 70%, B.sub.2O.sub.3 at 0% to 15%, MgO at 0% to 10%, CaO at 0% to 10%, SrO at 0% to 13%, BaO at 0% to 40%, Na.sub.2O at 0% to 30%, K.sub.2O at 0% to 13%, and Al.sub.2O.sub.3 at 0.5% to 15%.

4. The laminate according to claim 1, wherein a shape of the laminate is a quadrangular shape or a disk shape.

5. The laminate according to claim 1, wherein the laminate is used as a support glass substrate.

6. A method for producing the laminate according to claim 1, comprising: coating a protruding side of a glass plate having a curvature, of which a radius of curvature r0 with negating of self-weight deflection is 200 m to 500 m, with a thin film including one or more components selected from the group consisting of silicon nitride, titanium oxide, alumina, niobium oxide, zirconia, indium tin oxide, silicon oxide, magnesium fluoride, and calcium fluoride.

7. The method for producing the laminate according to claim 6, wherein the coating method is a sputtering method.

8. The laminate according to claim 1, wherein the ratio dc/dg is in a range of 0.4×10.sup.−3 to 0.5×10.sup.−3.

9. The laminate according to claim 2, wherein the ratio dc/dg is in a range of 0.4×10.sup.−3 to 0.5×10.sup.−3.

10. The laminate according to claim 8, wherein the thickness of the coating layer is 0.4 μm to 0.6 μm and the thickness of the glass plate is 0.7 mm to 1.2 mm.

11. The laminate according to claim 1, wherein the coating layer consists of silicon nitride.

12. The laminate according to claim 2, wherein the coating layer consists of silicon nitride.

13. The laminate according to claim 10, wherein the coating layer consists of silicon nitride.

14. The method for producing the laminate according to claim 6, wherein a thickness of the glass plate is in a range of 0.3 mm to 3.0 mm, and a thickness of the coating layer is in a range of 0.05 μm to 1.2 μm.

15. The method for producing the laminate according to claim 14, wherein the thickness of the coating layer is 0.4 μm to 0.6 μm and the thickness of the glass plate is 0.7 mm to 1.2 mm.

16. The method for producing the laminate according to claim 14, wherein the coating layer consists of silicon nitride.

17. The method for producing the laminate according to claim 15, wherein the coating layer consists of silicon nitride.

18. The method for producing the laminate according to claim 6, wherein the radius of curvature r0 with negating of self-weight deflection is 300 m to 400 m.

19. The laminate according to claim 11, wherein the radius of curvature rl of the laminate with negating of self-weight deflection is 54 m to 150 m.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

(1) Other objects and further features of an embodiment will become apparent from the following detailed description when read in conjunction with the accompanying drawings, in which:

(2) FIG. 1 is an example of conventional WLP production steps (up to support substrate release); and

(3) FIG. 2 is an example of WLP production steps (up to support substrate release) using a laminate according to the present invention as a support glass substrate.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

(4) Hereinafter, an embodiment of the present invention will be explained with reference to the drawings.

(5) A laminate and a method for producing the laminate according to the present invention will be explained. A numerical range between any given number “to” another number is to be understood as inclusive, i.e., the numerical range includes these numbers before and after the term “to” as an upper limit value and a lower limit value, respectively, unless otherwise specified.

(6) [Glass composition]

(7) A composition of a glass plate used for a laminate according to the present invention is not particularly limited, and a known composition with a high visible light transmittance can be used. More specifically, a composition having a minimum transmittance (T %) of 60% or more at a wavelength of 400 nm to 1000 nm can be used.

(8) Compositions of the glass plate preferably include, as expressed in oxide-based mass percentage:

(9) SiO.sub.2 at 40% to 70%,

(10) B.sub.2O.sub.3 at 0% to 15%,

(11) MgO at 0% to 10%,

(12) CaO at 0% to 10%,

(13) SrO at 0% to 13%,

(14) BaO at 0% to 40%,

(15) Na.sub.2O at 0% to 30%,

(16) K.sub.2O at 0% to 13%, and

(17) Al.sub.2O.sub.3 at 0.5% to 15%.

(18) More preferably, the compositions of the glass plate include, as expressed in oxide-based mass percentage:

(19) SiO.sub.2 at 49% to 70%,

(20) B.sub.2O.sub.3 at 4% to 13%,

(21) MgO at 0% to 0.5%,

(22) CaO at 0% to 8%,

(23) SrO at 0% to 8%,

(24) 1.5 BaO at 0% to 13%,

(25) Na.sub.2O at 4% to 15%,

(26) K.sub.2O at 0.1% to 13%, and

(27) Al.sub.2O.sub.3 at 4% to 13%.

(28) When the composition is within this range, the visible light transmittance is excellent. In addition, in glass compositions of which the coefficients of thermal expansion are high, warpage is greatly affected by thermal treatment, and accordingly, the effect of the present invention is particularly significant.

(29) [Glass Plate]

(30) A glass plate is used for a laminate according to the present invention. For example, the glass plate is produced by forming the above glass compositions into a plate having a predetermined shape (for example, a quadrangular shape or a disk shape).

(31) A method for forming a glass plate is not limited, and for example, known methods such as a float method, a fusion method, and a roll-out method can be used. In the present invention, in order to greatly curve the laminate, it is preferable that a glass plate has a certain curvature before the glass plate is coated.

(32) As a curvature of a glass plate before coating, a radius of curvature r0 is preferably 200 m to 500 m, and more preferably 300 m to 400 m, with negating of self-weight deflection. (These values are of real glass plate curvature, i.e., curvature inherent to only the glass plate, corrected to negate effects of deflection in relation to weight of the glass plate.) When the curvature of the glass plate before coating falls within this range, the curvature of a laminate caused by coating explained below increases.

(33) For example, a glass plate that falls within such a condition can be easily obtained by cutting out a portion having a curvature in the above range from a base plate produced by floating method.

(34) A plate thickness (dg) of a glass plate is preferably 0.3 mm to 3.0 mm, more preferably 0.5 mm to 2.0 mm, and still more 1.5 preferably 0.7 mm to 1.2 mm. When the plate thickness (dg) of the glass plate falls within this range, the strength as the laminate appreciably increases, and the weight also falls within an acceptable range. Also, a chemically strengthened glass plate may be used.

(35) [Coating Layer]

(36) In the present invention, a coating layer is formed by coating the glass plate with a thin film. The coating layer includes one or more components selected from the group consisting of silicon nitride, titanium oxide, alumina, niobium oxide, zirconia, indium tin oxide, silicon oxide, magnesium fluoride, and calcium fluoride. Silicon nitride and titanium oxide are superior in visible light transmission property and superior in the effect of curving a laminate, and are therefore preferable.

(37) As a coating method, a known method such as a sputtering method, an ion assist deposition method, and an aerosol deposition method can be used. Among them, the sputtering method is preferable because it is excellent in the effect of curving a laminate. Then, a convex surface side of the glass plate having the curvature specified above is coated, thereby increasing the curvature of the glass plate.

(38) The thickness of the coating layer (dc) is preferably 0.05 μm to 1.2 μm, more preferably 0.1 μm to 1.0 μm, and still more preferably 0.4 μm to 0.6 μm. When the thickness of the coating layer (dc) falls within this range, both of a large curvature of the laminate and a high visible light transmission property can be achieved.

(39) [Laminate]

(40) The laminate according to the present invention includes the glass plate and the coating layer. A radius of curvature r1 with negating of self-weight deflection is in a range of 10 m to 150 m, and is preferably in a range of 30 m to 100 m. When the radius of curvature r1 falls within this range, a WLP with a high degree of accuracy in dimension can be produced.

(41) A ratio (dc/dg) of a thickness (dc) of the coating layer to a thickness (dg) of the glass plate is 0.05×10.sup.−3 to 1.2×10.sup.−3, and preferably in a range of 0.4×10.sup.−3 to 0.5×10.sup.−3. When the ratio (dc/dg) falls within this range, both of a large curvature of the laminate and a high visible light transmission property can be achieved.

(42) The thickness of the laminate is preferably 0.3 mm to 3.5 mm, more preferably 0.5 mm to 2.5 mm, and still more particularly 0.7 mm to 1.3 mm. When the thickness of the laminate falls within this range, both of a high strength of the laminate and a high visible light transmission property can be achieved.

(43) The shape of the laminate is a quadrangular shape or a disk shape.

(44) The laminate can be preferably used as a support glass substrate.

(45) [Method for Producing Laminate]

(46) The laminate according to the present invention can be produced by coating the glass plate. A specific example of a preferable production method has a condition including a step of, as illustrated in FIG. 2, coating a protruding side of the glass plate 11 having a curvature, of which a radius of curvature r0 with negating of self-weight deflection is 200 m to 500 m, with a thin film (coating layer) 12 including one or more components selected from the group consisting of silicon nitride, titanium oxide, alumina, niobium oxide, zirconia, indium tin oxide, silicon oxide, magnesium fluoride, and calcium fluoride. By producing the laminate under this condition, the laminate 10 of which the radius of curvature r1 of the laminate 10 with negating of self-weight deflection is 10 m to 150 m or less can be obtained in a preferable manner.

EXAMPLES

(47) Hereinafter, the present invention will be described in detail by way of Examples and Comparative Examples. However, as long as advantages of the present invention can be achieved, embodiments can be changed as appropriate.

(48) <Evaluation Sample Shape>

(49) Glass plates in a disk shape having a diameter of 150 mm (6 inch) and a plate thickness of 1.0 mm coated under conditions 1.5 as described in Table 1 were used.

(50) <Measurement Conditions and Evaluation Conditions>

(51) [Measurement of Thickness of Glass Plate (Dg) and Thickness of Coating Layer (Dc)]

(52) Using a laser displacement meter (Dyvoce manufactured by Kohzu Precision Co., Ltd.) under a room temperature condition, the thickness dg of the glass plate before coating and the thickness dc of the laminate after the coating were measured. As a result, the thickness dg and the thickness dc were obtained.

(53) [Radiuses of Curvatures (r0, r1) of Glass Plate and Laminate]

(54) Using the laser displacement meter (Dyvoce manufactured by Kohzu Precision Co., Ltd.), the shapes of the samples were calculated through shape simulation on the basis of the curvatures inherent to the samples derived through self-weight deflection correction in “both sides difference calculation mode”. Then, the radiuses of curvatures were derived from the shapes obtained through the simulation.

(55) A radius of curvature of a glass plate, before coating, with negating of self-weight deflection is denoted as r0. A radius of curvature of a glass plate of a laminate, after coating, with negating of self-weight deflection is denoted as r1.

(56) [Evaluation of Curvature]

(57) In general, the thicker a coating layer is, the larger a curvature caused by the coating becomes. For this reason, the curvature was evaluated based on a value R expressed by Expression 1. Among ranges A to D of the value R, ranges A, B, and C were evaluated as “acceptable”.
R=r1 (m)×dc (μm)  Expression 1
<Ranges of R>

(58) A: R≤30,

(59) B: 30<R≤50,

(60) C: 50<R<70,

(61) D: 70≤R

(62) [Visible Light Transmission Property]

(63) Using a spectrophotometer (V-700 manufactured by JASCO Corporation) under a room temperature condition, a minimum value (T %) of a transmittance of each sample at a wavelength of 400 to 1000 nm was measured. Among ranges A to C of the minimum value (T %), ranges A and B were evaluated as “acceptable”.

(64) <Ranges of I>

(65) A: 80%≤T,

(66) B: 60%≤T<80%,

(67) C: T<60%

Example 1

(68) A base plate (a length and width of 1000 mm and a thickness of 1.4 mm) of glass having a composition 1 (including, as expressed in mass percentage, SiO.sub.2 at 56.9%, Al.sub.2O.sub.3 at 8.1%, CaO at 2.3%, SrO at 12.3%, and BaO at 20.4%) was obtained by floating method. A circular shape having a radius of 75 mm (a diameter of 150 mm) from a central portion of the base plate was cut out from the base plate, so that a disk shaped glass plate was obtained. After, the disk shaped glass plate was chamfered, the disk shaped glass plate was polished by a double-sided lapping and polishing machine (16B-N/F manufactured by HAMAI CO., LTD.), whereby the plate thickness (dg) was adjusted to 1.0 mm. The radius of curvature r0 (caused by float method) of the glass plate was 370 m with negating of self-weight deflection.

(69) Thereafter, using a silicon target with a sputtering system (SIV-345XYSSS manufactured by ULVAC, Inc.), a silicon nitride film was formed on a convexly curved surface of the glass plate by reactive sputtering so that a compressive stress of the film becomes 1 GPa. The thickness (dc) of the coating layer was 0.5 μm. The evaluation results are shown in Table 1.

Example 2 to Example 7 and Comparative Examples 1 to 4

(70) Operations were performed in a manner similar to the operation of Example 1 except for changing the conditions to those as described in Table 1. The evaluation results are shown in Table 1.

(71) TABLE-US-00001 TABLE 1 Glass Coating Coating dc dg dc/dg r0 r1 Evaluation Composition Layer Method (μm) (mm) (×10−3) (m) (m) T (%) R = r1 × dc Example 1 Composition 1 Silicon Sputtering 0.5 1 0.5 370 55   84(A) 27.5(A) Nitride Example 2 Composition 2 Silicon Sputtering 0.5 1 0.5 370 54   84(A)   27(A) Nitride Example 3 Composition 1 Titanium Sputtering 0.4 1 0.4 370 60   75(B)   24(A) Oxide Example 4 Composition 1 Silicon Sputtering 1 1 1 370 37   60(B)   37(B) Nitride Example 5 Composition 1 Silicon Sputtering 0.1 1 0.1 370 113   87(A) 11.3(A) Nitride Example 6 Composition 1 Silicon Ion 0.5 1 0.5 370 100   83(A)   50(B) Nitride Deposition Example 7 Composition 1 Silicon Aerosol 0.7 1 0.7 370 98   80(A) 68.6(C) Nitride Deposition Comparative Composition 1 Chromium Sputtering 0.5 1 0.5 370 70 ≤50(D)   35(B) Example 1 Comparative Composition 1 Tantalum Sputtering 0.8 1 0.8 370 640   84(A)  512(D) Example 2 Oxide Comparative Composition 1 Silicon Sputtering 1.5 1 1.5 370 11   55(D) 16.5(A) Example 3 Nitride Comparative Composition 1 Silicon Sputtering 0.5 1 0.5 1000 194   84(A)   97(D) Example 4 Nitride
(Mass Percentage)
*Composition 1:
SiO.sub.2: 56.9%,
Al.sub.2O.sub.3: 8.1%,
CaO: 2.3%,
SrO: 12.3%, and
BaO: 20.4%.
*Composition 2:
SiO.sub.2: 68.9%,
Al.sub.2O.sub.3: 5.9%,
MgO: 4.1%,
CaO: 7.3%,
Na.sub.2O: 14.6%, and
K.sub.2O: 0.2%.

(72) Although the preferred embodiment and examples of the present invention have been described in detail above, the present invention is not limited to the embodiment and examples described above, and various modifications and substitutions can be applied to the embodiment and examples described above without departing from the scope of the present invention.