Photoresist material, method of fabcricating same, and color filter substrate

Abstract

A photoresist material, a method of fabricating the same, and a color filter substrate are described. The photoresist material has an oligomer segment having a chemical structural formula of: ##STR00001##
wherein a value of n is 1 to 2.

Claims

1. A photoresist material, comprising an oligomer segment having a chemical structural formula of: ##STR00015## wherein a value of n is 1 to 2; wherein, R comprises: at least one of non-conjugated linear alkanes, branched alkanes, alkoxy alkane, halogen-substituted alkane derivatives, conjugate structures linked through alkoxy and ester groups, or compounds containing heterocycles.

2. A method of fabricating a photoresist material, comprising: dissolving and stirring compound 1 in tetrahydrofuran to form a first solution, adding sodium hydride to the first solution to form a second solution, and adding compound 2 to the second solution to stir at 60° C. for 6 hours so as to obtain compound 3 after purifying and isolating; wherein a chemical structure of the compound 1 is: ##STR00016## wherein a chemical structure of the compound 2 is: ##STR00017## and wherein a chemical structure of the compound 3 is: ##STR00018##

3. The method of fabricating the photoresist material according to claim 2, wherein a molar ratio of the compound 1 to the sodium hydride is 4:1; and a molar ratio of the compound 1 to the compound 2 is 4:1.5.

4. The method of fabricating the photoresist material according claim 2, further comprising: dissolving the compound 3 and an oligomer segment in toluene to form a first solution, and adding a catalyst to the first solution to obtain the photoresist material through a purification treatment after a reaction at room temperature for 30 minutes, wherein the oligomer segment having a chemical structural formula of: ##STR00019## wherein a value of n is 1 or 2; wherein, R comprises: at least one of non-conjugated linear alkanes, branched alkanes, alkoxy alkane, halogen-substituted alkane derivatives, conjugate structures linked through alkoxy and ester groups, or compounds containing heterocycles, wherein a chemical structure of the photoresist material is: ##STR00020##

5. The method of fabricating the photoresist material according to claim 4, wherein: a molar ratio of the compound 3 to the oligomer segment is 1:1.

6. The method of fabricating the photoresist material according to claim 4, wherein R in the oligomer segment comprises: at least one of non-conjugated linear alkanes, branched alkanes, alkoxy alkane, halogen-substituted alkane derivatives, conjugate structures linked through alkoxy and ester groups, or compounds containing heterocycles; wherein the heterocyclic compound includes at least one of a five-membered heterocyclic ring compound, a six-membered heterocyclic ring compound, or a benzoheterocyclic compound; wherein the five-membered heterocyclic compound comprises at least one of furan, thiophene, pyrrole, thiazole, and imidazole; and wherein the six-membered heterocyclic compound comprises at least one of pyridine, pyrazine, pyrimidine, and pyridazine.

7. The method of fabricating the photoresist material according to claim 6, wherein carbon chain length in R is 1 to 3.

8. The method of fabricating the photoresist material according to claim 4, wherein the catalyst is pentamethylcyclopentadienyl ruthenium chloride.

9. A color filter substrate, comprising a color resist layer, wherein material of the color resist layer comprises the photoresist material according to claim 1.

Description

DESCRIPTION OF DRAWINGS

(1) Following detailed description of specific embodiments of the present application will make the technical solutions and other beneficial effects of the present application obvious in conjunction with the accompanying drawings.

(2) FIG. 1 is a diagram of steps for fabricating a light-shielding layer in an embodiment;

(3) FIG. 2 is a drawing of steps for fabricating a color resist layer in an embodiment; and

(4) FIG. 3 is a schematic view of a color filter substrate in an embodiment.

DETAILED DESCRIPTION OF PREFERRED EMBODIMENTS

Embodiments

(5) In the present embodiment, a photoresist material of the present disclosure connects an existing color resist material with an oligomer segment through a click chemical reaction to form the photoresist material.

(6) A chemical structural formula of the oligomer segment is:

(7) ##STR00008##

(8) A value of n is 1 to 2.

(9) R in the oligomer segment comprises: at least one of non-conjugated linear alkanes, branched alkanes, alkoxy alkane, halogen-substituted alkane derivatives, conjugate structures linked through alkoxy and ester groups, or compounds containing heterocycles; wherein the heterocyclic compound includes at least one of a five-membered heterocyclic ring compound, a six-membered heterocyclic ring compound, or a benzoheterocyclic compound.

(10) The five-membered heterocyclic compound comprises at least one of furan, thiophene, pyrrole, thiazole, and imidazole.

(11) The six-membered heterocyclic compound comprises at least one of pyridine, pyrazine, pyrimidine, and pyridazine.

(12) In the present embodiment, a phthalocyanine molecule is connected to the oligomer segment to form a photoresist material, and a chemical structure formula of the photoresist material is:

(13) ##STR00009##

(14) Specific steps of fabricating the photoresist material include:

(15) dissolving and stirring compound 1 in tetrahydrofuran to form a first solution, adding sodium hydride to the first solution to form a second solution, and adding compound 2 to the second solution to stir at 60° C. for 6 hours so as to obtain compound 3 after purifying and isolating;
dissolving the compound 3 and the oligomer segment in toluene to form a first solution, and adding pentamethylcyclopentadienyl ruthenium chloride as a catalyst to the first solution to obtain the photoresist material through a purification treatment after a reaction at room temperature for 30 minutes;
wherein a molar ratio of the compound 1 to the sodium hydride is 4:1; and a molar ratio of the compound 1 to the compound 2 is 4:1.5.

(16) A chemical structure of the compound 1 is:

(17) ##STR00010##

(18) A chemical structure of the compound 2 is:

(19) ##STR00011##

(20) A chemical structure of the compound 3 is:

(21) ##STR00012##

(22) A reaction synthesis roadmap is:

(23) ##STR00013##

(24) In other preferred embodiments of the present disclosure, the oligomer segment in the photoresist material may be connected with other materials of different colors, that is, A chemical structural formula of the compound 3 further includes:

(25) ##STR00014##

(26) In order to better explain the present disclosure, a color filter substrate 1 is also provided in this embodiment, which includes a color resist layer 10 distributed on the color filter substrate 1 to achieve color display of the color filter substrate 1.

(27) Material of the color resist layer 10 includes the photoresist material, and a specific fabricating method thereof is as follows:

(28) As shown in FIG. 3, the photoresist material is dissolved in an organic solvent to prepare an ink, and the color resist layer 10 is fabricated by an inkjet printing method, wherein the organic solvent includes at least one of an alkane, a saturated cycloalkane, a bicycloalkane, a polycycloalkane, an ether, a single or a plurality of benzenecycloalkanes.

(29) A mass range of the organic solvent in the ink is 40 wt % to 99.9 wt %. A mass range of the photoresist material in the ink is 0.1 wt % to 60 wt %.

(30) Specific Steps Include:

(31) As shown in FIG. 1, a light-shielding layer 101 is fabricated on a glass substrate, and several light-transmitting holes are formed in the light-shielding layer 101.

(32) As shown in FIG. 2, color resist units 102 are fabricated by inkjet printing technology in the light transmission holes. The color resist units include a red color resist unit, a green color resist unit, and a blue color resist unit. The color resist units in two adjacent light transmitting holes have different colors.

(33) The descriptions of the above embodiments are only used to assist in understanding the technical solutions and core ideas of this application. Those of ordinary skilled in the art should understand that they can still modify the technical solutions described in the foregoing embodiments, or equivalently replace some of the technical features. These modifications or replacements do not make the essence of the corresponding technical solutions outside the scope of the technical solutions of the embodiments of the present application.