OPTICAL COMPENSATION FILMS BASED ON COMBINATIONS OF NEGATIVE BIREFRIGENT AND POSITIVE BIREFRIGENT COMPONENTS

Abstract

An optical compensation film with unique retardation including a compatible blend of a positive birefringent (C+) component, a negative birefringent (C?) component and a compatibilizing component may be prepared as follows: a block copolymer is prepared containing one of the birefringent materials, for example a negative birefringent material, and a less birefringent component. The copolymer is then blended with the second birefringent material, for example a positive birefringent material to form a compatible blend, even though the two birefringent materials are not compatible. The less birefringent component of the copolymer does not have to be compatible with the birefringent component in the copolymer. These films display unique retardation properties and can be used to improve the performance of optical devices such as liquid crystal displays (LCDs), organic light emitting diode (OLED) displays, in-plane switching mode LCDs (IPS-LCD), 3D glasses, optical switches, and waveguides where controlled light management is desirable.

Claims

1. An optical compensation film comprising a positive birefringent component and a negative birefringent component, with a thickness less than 200 um.

2. The optical compensation film of claim 1 is a RD C+ film, wherein Rth.sup.550nm>50 nm, Rth.sup.450nm/Rth.sup.550nm<1.0, and Re.sup.550nm<10 nm.

3. The optical compensation film of claim 1 is a RD A?/B+ film, wherein |Re.sup.550um|>50 nm, Re.sup.450nm/Re.sup.550nm<1.0, and Rth.sup.550um?|Re.sup.550nm|/2.

5. The optical compensation film of claim 4, wherein |Re.sup.550mm|>50 nm, and |Rth.sup.550mm|<10 nm.

6. The optical compensation film of claim 4, wherein |Re.sup.550mm|>50 nm, and |Rth.sup.550nm|<5 nm.

7. The optical compensation film of claim 4, wherein Re.sup.450nm/Re.sup.550nm>1.0.

8. The optical compensation film of claim 4, wherein Re.sup.450mm/Re.sup.550nm in the range of 0.98-1.02.

9. The optical compensation film of claim 4, wherein Re.sup.450nm/Re.sup.550nm<1.0.

10. The optical compensation film of claim 4, wherein Re.sup.450nm/Re.sup.550nm<0.9.

11. The optical compensation film of claim 4, wherein Re.sup.450nm/Re.sup.550nm<0.85.

12. The optical compensation film of claim 4, wherein Re.sup.450nm/Re.sup.550mm=0.82.

13. The optical compensation film of claim 1, wherein both the positive birefringent component and the negative birefringent component are contained in a copolymer.

14. The optical compensation film of claim 1, wherein the positive birefringent component and the negative birefringent component are contained in a compatible blend.

15. The optical compensation film of claim 1, wherein the positive birefringent component is not compatible with the negative birefringent component, and a compatibilizing component is used to promote their homogenous blending.

16. The optical compensation film of claim 1 being comprised in a liquid crystal display (LCD).

17. The optical compensation film of claim 1 being comprised in an organic light emitting diode (OLED) display.

18. An optical compensation film comprising a compatible blend of a positive birefringent component, a negative birefringent component and a compatibilizing component.

19. The optical compensation film according to claim 18, further comprising a compatible blend of a copolymer of a negative birefringent component and a second component and a positive birefringent component.

20. The optical compensation film of claim 19, wherein the positive birefringent component is selected from PTFS, PS, PMMA or copolymers containing these moieties.

21. The optical compensation film of claim 20, wherein the positive birefringent component is PTFS or a copolymer containing PTFS.

22. The optical compensation film of claim 19, wherein the negative birefringent component is selected from PAR, PSU and PI, or copolymers containing these moieties.

23. The optical compensation film of 19, comprising a compatible blend of a copolymer of a negative birefringent component and a second component, a positive birefringent component, and a third compatible polymer component.

24. The optical compensation film of claim 19, wherein the negative birefringent component is PSU.

25. The optical compensation film of claim 22, wherein the negative birefringent component is PI.

26. The optical compensation film of claim 19, wherein the negative birefringent component is the PI 6FDA/PFMB.

27. The optical compensation film of claim 19, wherein the negative birefringent component is the PI 6FDA/BPDA/PFMB.

28. The optical compensation film of claim 19, wherein the positive birefringent component is PTFS, and the negative birefringent component is the PI 6FDA/BPDA/PFMB.

29. The optical compensation film of claim 19, wherein the positive birefringent component is selected from PMMA, PS and PTFS, and the copolymer containing the second component and the negative birefringent component is selected from PAR-PMMA, PAR-PS, PSU-PMMA, PSU-PS, PI-PMMA, and PI-PS.

30. The optical compensation film of claim 19, wherein the positive birefringent component is PTFS, and the copolymer containing the compatibilizing component and the negative birefringent component is PI-PMMA, with a PI structure of 6FDA/BPDA/PFMB.

Description

DETAILED DESCRIPTION

[0018] The combination of the negative and positive birefringent components in the same film (single film) provides the opportunity to prepare unique retardation films. Surprisingly, it has been discovered that a compatible blend of a negative birefringent (C?) material and a positive birefringent (C+) material can be prepared in the following manner: First a block copolymer is prepared containing one of the birefringent materials, for example a negative birefringent material, and a less birefringent component. The copolymer is then blended with the second birefringent material, for example a positive birefringent material to form a compatible blend, even though the two birefringent materials are not compatible. Even more surprising, the less birefringent component of the copolymer does not have to be compatible with the birefringent component in the copolymer. However, it must be compatible with the second birefringent material. The first system to demonstrate the unusual compatibility described above was a blend of a block copolymer of an aromatic polyester (PAR) and polymethylmethacrylate (PMMA) (PAR-PMMA) with polycarbonate (PC). The PAR-PMMA was prepared as part of an attempt to enhance the compatibility of a PMMA/PC system. The PAR-PMMA block copolymer and PC homopolymer blend exhibited homogenous properties and maintained transparency.

[0019] This approach can be used to make blends with positive and negative birefringence polymers where the relationship between nx, ny, and nz can be tailored to yield previously hard to make compensation films. This approach also allows the dispersion curve of the resultant birefringence to be tailored, however, the two birefringent components have to be carefully selected with regards to their dispersion curves. If the two components have the same dispersion curve, they will cancel each other and one cannot get the desired optical performance. In order to obtain a reversed dispersion, the major retardation (birefringent) contributing component should have a dispersion flatter than that of the minor contributing components.

[0020] Components with strong negative birefringence that can be incorporated into block copolymers can be used to make blends that can be converted into thin optical compensation films with unique properties. 6FDA/PFMB is a soluble polyimide (PI) that has been commercialized for negative C applications. This PI (6FDA/PFMB) was used to make PI-PMMA block copolymers that were then blended with PTFS. The blends were then solution cast into clear films that were subsequently stretched. By tuning the PI/PMMA ratio, the PI-PMMA/PTFS ratio and the stretching conditions, RD C+ and RD A?/B+ films were prepared. Due to the dilution effect of PMMA and the partial dispersion cancellation with PTFS, the 6DFA/PFMB based PI-PMMA/PTFS, films prepared from the blends usually needed to be relatively thick in order to reach the target retardation (for example Re=?100 nm or Rth=100 nm). Since a thinner film with the target retardation has the advantage of a lower cost, better flexibility, and easier incorporation into a display stack, the PI structure was varied so as to increase the C? contribution and to reduce the amount of the PMMA component.

[0021] Compared to the 6FDA/PFMB PI, PIs made from biphenyl dianhydride (BPDA) and PFMB (BPDA/PFMB) are much stronger negative birefringent materials. The poor solubility of the BPDA/PFMB PI in common solvents makes it very difficult to prepare the corresponding PI-PMMA block copolymers. However, the birefringent contribution of BPDA and solubility contribution of 6FDA can be combined in a PI copolymer (6FDA/BPDA/PFMB, 0.5/0.5/1.0). This copolymer can then be used to prepare the corresponding PI-PMMA block copolymer. The 6FDA/BPDA/PFMB (0.5/0.5/1.0) based PI-PMMA has very good compatibility with PTFS. RD C+ and RD A?/B+ films have been prepared with this system. Most importantly, by carefully tuning the PMMA composition in the PI-PMMA, the PI-PMMA/PTFS weight ratio and the casting/stretching conditions, Z-films can be obtained with FD and RD.

[0022] An increase in the BPDA content in the PI (6FDA/BPDA/PFMB) results in a greater negative birefringent contribution. However, the reaction conditions for the PI polymerization and the subsequent PI-PMMA polymerization must be carefully determined in order to effectively carry out the preparation. In this manner, the BPDA content can be increased so that the ratio of 6FDA/BPDA/PFMB is 0.3/0.7/1.0. The PI-PMMA block copolymer obtained with this PI copolymer can be blended with PTFS and converted into unique compensation films (RD C+, RD A?/B+, FD and RD Z films).

[0023] It has also been found that materials other than PIs can be used to make the block copolymers which can be converted into compensation films. A block copolymer of poly ether sulfone (PSU), a negative birefringent component, and PMMA, a slightly positive birefringent component, is compatible with PTFS, a positive birefringent material. Even though the PSU block is not compatible with the PMMA block, the block copolymer is compatible with PTFS. Attempts to simply blend the three components resulted in phase separation causing the formation of hazy films. On the other hand, compatible blends of the PSU-PMMA block copolymer with PTFS can used to prepare clear films. Several unique compensation films (RD C+, RD A? and RD B+) were obtained from the PSU-PMMA/PTFS blend using solution casting and stretching.

[0024] Additionally, a block copolymer of PAR and PMMA (PAR-PMMA) was found to form a compatible blend with PTFS. Since the PAR structure used was weakly birefringent a compensation film made from this blend would have to be relatively thick.

[0025] PTFS is a strong C+ material. Thus, the films of this invention containing PTFS can be quite thin. However, the cost of PTFS is higher than that of common polymers such as PMMA and polystyrene (PS). In fact, PS is a very inexpensive C+ material. However, the birefringent contribution is 1/10 that of PTFS. Thus, a much thicker film is needed to reach the target retardation. For an application without a thickness requirement, PS based films can be used. PI-PS can be prepared and blended with PS homo polymer. The blends can be solution cast into clear films with RD C+ properties when the composition is carefully tuned. These films should be able to form RD A?/B+ and Z-films after stretching under suitable conditions.

[0026] In one embodiment of the present invention, there is provided an optical compensation film composition comprising a positive birefringent component and a negative birefringent component, wherein the composition can be converted to unique compensation films, including RD C+, RD A?/B+ and Z-films.

[0027] In one embodiment, the compensation film is a RD C+ film, with Rth>50 nm at a thickness no more than 100 um or less than 200 um. The dispersion is RD with Rth450/Rth550 less than 1.0, or less than 0.9, or less than 0.85, or equal to 0.82.

[0028] In one embodiment, the compensation film is a RD A?/B+ film, with |Re|>50 nm, and Rth?|Re|/2 at a thickness no more than 100 um. The dispersion is RD with Re450/Re550 less than 1.0, or less than 0.9, or less than 0.85, or equal to 0.82.

[0029] In one embodiment, the compensation film is a FD Z film, with |Re|>50 nm, and |Rth|<|Re|/2 at a thickness no more than 100 um. The dispersion Re450/Re550 is in the range of 0.98-1.02, or in the range of 0.99-1.01, or equal to 1.00.

[0030] In one embodiment, the compensation film is a RD Z film, with |Re|>50 nm, and |Rth|<Re|/2 at a thickness no more than 100 um. The dispersion Re450/Re550 is less than 1.0, or less than 0.9, or less than 0.85, or equal to 0.82.

[0031] In one embodiment, the compensation film is a RD Z film, with |Re|>50 nm, and |Rth|<10 nm at a thickness no more than 100 um. The dispersion is RD with Re450/Re550 less than 1.0, or less than 0.9, or less than 0.85, or equal to 0.82.

[0032] In another embodiment, the positive birefringent component and the negative birefringent component are incorporated on two different compatible polymers, which are blended and the blend cast into film.

[0033] In another embodiment, the positive birefringent component and the negative birefringent component are incorporated in a block copolymer.

[0034] In another embodiment, the positive birefringent component and the negative birefringent component are not compatible, and a third component is used to improve the compatibility. A compatible blend is then used to prepare a clear optical film.

[0035] In another embodiment, the positive birefringent component is selected from PTFS, PS, PMMA, or any other compatible polymer with positive birefringence.

[0036] The positive component of the present invention may be a homo polymer or a copolymer. A homo polymer may be prepared by polymerization of a substituted fluorine-containing monomer, styrene or MMA. A copolymer may be prepared by the copolymerization of the substituted fluorine-containing monomers with one or more of ethylenically unsaturated monomers. Examples of ethylenically unsaturated monomers include, but not limited to, ?,?,?-trifluorostyrene, ?,?-difluorostyrene, ?,?-difluorostyrene, ?-fluorostyrene, and ?-fluorostyrene, methyl acrylate, methyl methacrylate, ethyl acrylate, ethyl methacrylate, butyl acrylate, butyl methacrylate, isobutyl acrylate, isobutyl methacrylate, ethylhexyl acrylate, 2-ethylhexyl methacrylate, 2-ethylhexyl acrylate, isoprene, octyl acrylate, octyl methacrylate, iso-octyl acrylate, iso-octyl methacrylate, trimethyolpropyl triacrylate, styrene, ?-methyl styrene, nitrostyrene, bromostyrene, iodostyrene, cyanostyrene, chlorostyrene, 4-t-butylstyrene, 4-methylstyrene, vinyl biphenyl, vinyl triphenyl, vinyl toluene, chloromethyl styrene, acrylic acid, methacrylic acid, itaconic acid, crotonic acid, maleic anhydride, tetrafluoroethylene (and other fluoroethylenes), glycidyl methacrylate, carbodiimide methacrylate, C1-C18 alkyl crotonates, di-n-butyl maleate, di-octylmaleate, allyl methacrylate, di-allyl maleate, di-allylmalonate, methyoxybutenyl methacrylate, isobornyl methacrylate, hydroxybutenyl methacrylate, hydroxyethyl(meth)acrylate, hydroxypropyl(meth)acrylate, acetoacetoxy ethyl methacrylate, acetoacetoxy ethyl acrylate, acrylonitrile, vinyl chloride, vinylidene chloride, vinyl acetate, vinyl ethylene carbonate, epoxy butene, 3,4-dihydroxybutene, hydroxyethyl(meth)acrylate, methacrylamide, acrylamide, butyl acrylamide, ethyl acrylamide, diacetoneacrylamide, butadiene, vinyl ester monomers, vinyl(meth)acrylates, isopropenyl(meth)acrylate, cycloaliphaticepoxy(meth)acrylates, ethylformamide, 4-vinyl-1,3-dioxolan-2-one, 2,2-dimethyl-4 vinyl-1,3-dioxolane, 3,4-di-acetoxy-1-butene, and monovinyl adipate t-butylaminoethyl methacrylate, dimethylaminoethyl methacrylate, diethylaminoethyl methacrylate, N,N-dimethylaminopropyl methacrylamide, 2-t-butylaminoethyl methacrylate, N,N-dimethylaminoethyl acrylate, N-(2-methacryloyloxy-ethyl)ethylene urea, and methacrylamido-ethylethylene urea. Further monomers are described in The Brandon Associates, 2nd edition, 1992 Merrimack, N.H., and in Polymers and Monomers, the 1966-1997 Catalog from Polyscience, Inc., Warrington, Pa., U.S.A.

[0037] In another embodiment, the negative birefringent component is selected from PAR, PSU, PI, or any other compatible negative birefringent polymer.

[0038] In another embodiment, the negative birefringent component is incorporated in a block copolymer. Suitable block copolymers may include PAR-PMMA, PSU-PMMA, PI-PMMA, PAR-PS, PSU-PS and PI-PS.

[0039] The compatibilizing component of the block copolymer in the present invention may be a homo polymer or a copolymer. The homo polymer may be prepared by polymerization of styrene or MMA. The copolymer may be prepared by copolymerization of the substituted fluorine-containing monomers with one or more of ethylenically unsaturated monomers. Examples of ethylenically unsaturated monomers include, but not limited to, ?,?,?-trifluorostyrene, ?,?-difluorostyrene, ?,?-difluorostyrene, ?-fluorostyrene, and ?-fluorostyrene, methyl acrylate, methyl methacrylate, ethyl acrylate, ethyl methacrylate, butyl acrylate, butyl methacrylate, isobutyl acrylate, isobutyl methacrylate, ethylhexyl acrylate, 2-ethylhexyl methacrylate, 2-ethylhexyl acrylate, isoprene, octyl acrylate, octyl methacrylate, iso-octyl acrylate, iso-octyl methacrylate, trimethyolpropyl triacrylate, styrene, ?-methyl styrene, nitrostyrene, bromostyrene, iodostyrene, cyanostyrene, chlorostyrene, 4-t-butylstyrene, 4-methylstyrene, vinyl biphenyl, vinyl triphenyl, vinyl toluene, chloromethyl styrene, acrylic acid, methacrylic acid, itaconic acid, crotonic acid, maleic anhydride, tetrafluoroethylene (and other fluoroethylenes), glycidyl methacrylate, carbodiimide methacrylate, C1-C18 alkyl crotonates, di-n-butyl maleate, di-octylmaleate, allyl methacrylate, di-allyl maleate, di-allylmalonate, methyoxybutenyl methacrylate, isobornyl methacrylate, hydroxybutenyl methacrylate, hydroxyethyl(meth)acrylate, hydroxypropyl(meth)acrylate, acetoacetoxy ethyl methacrylate, acetoacetoxy ethyl acrylate, acrylonitrile, vinyl chloride, vinylidene chloride, vinyl acetate, vinyl ethylene carbonate, epoxy butene, 3,4-dihydroxybutene, hydroxyethyl(meth)acrylate, methacrylamide, acrylamide, butyl acrylamide, ethyl acrylamide, diacetoneacrylamide, butadiene, vinyl ester monomers, vinyl(meth)acrylates, isopropenyl(meth)acrylate, cycloaliphaticepoxy(meth)acrylates, ethylformamide, 4-vinyl-1,3-dioxolan-2-one, 2,2-dimethyl-4 vinyl-1,3-dioxolane, 3,4-di-acetoxy-1-butene, and monovinyl adipate t-butylaminoethyl methacrylate, dimethylaminoethyl methacrylate, diethylaminoethyl methacrylate, N,N-dimethylaminopropyl methacrylamide, 2-t-butylaminoethyl methacrylate, N,N-dimethylaminoethyl acrylate, N-(2-methacryloyloxy-ethyl)ethylene urea, and methacrylamido-ethylethylene urea. Further monomers are described in The Brandon Associates, 2nd edition, 1992 Merrimack, N.H., and in Polymers and Monomers, the 1966-1997 Catalog from Polyscience, Inc., Warrington, Pa., U.S.A.

[0040] In another embodiment, the positive birefringent component is PTFS, the negative birefringent component is modified by a compatibilizing block in the copolymer, selected from PAR-PMMA, PSU-PMMA, and PI-PMMA.

[0041] In another embodiment, the positive birefringent component is PTFS and the negative birefringent component is incorporated in a PI-PMMA copolymer.

[0042] In another embodiment, the positive birefringent component is PTFS, and the negative birefringent component is incorporated in a PI-PMMA copolymer, wherein the PI is 6FDA/PFMB.

[0043] In another embodiment, the positive birefringent component is PTFS, and the negative birefringent component is incorporated in a PI-PMMA copolymer, wherein the PI is 6FDA/BPDA/PFMB.

[0044] In another embodiment, the positive birefringent component is PTFS and the negative birefringent component is incorporated in a PI-PMMA copolymer, wherein the PI is 6FDA/BPDA/PFMB with a 6FDA/BPDA molar ratio of 0.5/0.5.

[0045] In another embodiment, the positive birefringent component is PTFS and the negative birefringent component incorporated in a PI-PMMA copolymer, wherein the PI is 6FDA/BPDA/PFMB with a 6FDA/BPDA molar ratio of 0.3/0.7.

[0046] In another embodiment, the compensation film further contains one or more other additives, such as anti-oxidization reagents, UV-stabilizers, plasticizers, etc.

[0047] In another embodiment, the compensation film is used in a LCD device, such as a device containing a IPS liquid crystal display. The LCD device may be used as a screen for a mobile phone, a tablet, a computer, a sign or a television.

[0048] In another embodiment, the compensation film is used in an OLED display device. The OLED display device may be used as a screen for a mobile phone, a tablet, a computer, a sign or a television.

EXAMPLES

Example 1. Synthesis of PAR-PMMA

[0049] The following is a typical procedure used to prepare PAR: In a dry 1000 mL round bottom flask equipped with magnetic stir bar, was placed BPA (18.89 g), dry chloroform (200 mL), and dry pyridine (28 mL). The BPA went into solution after several minutes of stirring. IPC (12.93 g) and TPC (12.93 g) were dissolved in 200 mL of chloroform and the solution added slowly to the PBA solution. After the addition, the funnel was washed with 50 mL of chloroform and added to the reaction solution. The reaction mixture was stirred for an additional 4 h or overnight and the reaction mixture was precipitated in 1 liter of methanol. The solid product was collected by filtration. The product was stirred in 1 liter of hot water for 30 min and then collected by filtration. It was then stirred in 200 mL of methanol for 30 min, collected by filtration, and dried at 110C overnight under reduced pressure. The Mn of the hydroxyl terminated oligomer was 8284 and the PDI was 1.89 as determined by GPC.

[0050] The macro initiator PAR-iBUTBr was prepared by treating the hydroxyl terminated PAR obtained above with 2-bromoisobutyrate bromide. A typical procedure follows: After 10 g of the hydroxyl terminated PAR was dissolved in 100 ml of dry chloroform contained in a 200 mL round bottom flask immersed in an ice-water bath, the solution was stirred for 0.5 hr. 2-Bromoisobutyrate bromide (1 g) and 0.35 g of diisopropylethylamine were added, and the resulting solution was stirred for over 4 hours while cooling with the ice-water bath. The reaction mixture was added to methanol and the precipitate that formed was soaked several times in methanol and dried in a vacuum oven. The Mn was 8284 and the PDI was 1.89 as determined by GPC.

[0051] An ATRP reaction was carried out in a round bottom flask equipped with a magnetic stir and sealed with a rubber septum. The reaction was carried out by mixing PAR-iButBr and MMA in toluene (20 g) followed by the addition of CuBr and PMDTA. The amounts of reaction components used are shown in Table 1. The reaction mixture was degassed under reduced pressure followed by the addition of Argon 5 times. The reaction flask was then immersed in an oil bath heated at 95 C for 24 h. The reaction mixture was then added to 200 ml methanol containing 0.5 g of ammonium chloride and stirred for 4 h. The product that precipitated was dried at 80 C and redissolved in chloroform. The solution was filtered through celite and added to 300 ml of methanol containing 0.5 g ammonium chloride. The product that precipitated was soaked twice in methanol to remove ammonium chloride. The molecular weight and PDI of the product are shown in Table 1. The PDI is much narrower than would be expected if double bonds were attached to the oligomer chain ends and then free radically polymerized. Thus, the use of the ATRP polymerization technique is much preferred. The amount of catalyst and ligand needed was briefly investigated with a PAR/MA ratio of 1/4 g/g in 20 g of toluene. It was determined that only 32 mg CuBr was needed to carry out this polymerization. A PAR/MA ratio of 1/3 and 1/2 g/g was also investigated (Table 1). After the process was completed, the Br end groups can be removed to form a halogen-free product.

[0052] The amounts of reagents used to prepare the PAR-PMMA copolymers (Polymers 1-6) from different PAR/PMMA ratios are shown in Table 1.

TABLE-US-00001 TABLE 1 Synthesis of PAR-PMMA PAR MMA CuBr PMDTA Product Polymer ID (g) (g) (mg) (mg) (g) Mn Mw PDI Polymer 1 1.0 n/a n/a n/a n/a 8284 15616 1.89 Polymer 2 1.0 4 102 159 3.36 27519 46015 1.68 Polymer 3 1.0 4 58 84 4.32 28042 38084 1.36 Polymer 4 1.0 4 32 52 4.38 30210 42423 1.61 Polymer 5 1.0 4 82 140 4.13 26999 43021 1.59 Polymer 6 1.0 3 36 57 3.68 23050 34107 1.48 Polymer 7 1.0 2 38 56 2.77 19173 27070 1.42

Example 2. Synthesis of PSU-PMMA

[0053] A hydroxyl-terminated poly ether sulphone oligomer was synthesized by treating 4,4-biphenol with DCCPS (0.91 eq.) in sulfolane in the presence of potassium carbonate. The oligomer had an Mn of 5264 as determined by GPC (Table 2). The oligomer was converted to the PSU-iButBr macroinitiator by the method used to make PAR-iButBr. However, PSU-iButBr is not soluble in toluene. The initiator could be dissolved in DMSO, DMSO/toluene and DMSO/anisole, but the amount of initiator that could be dissolved was quite low. Attempts to carry out polymerizations in these solvents and solvent mixtures resulted in quite low conversions.

[0054] The solvents 1,3-dimethoxybenzene and 1,2-dimethoxybenzene (veratrole) provided much better results,

[0055] Further study showed that a veratrole/DMSO mixture provided the best results. The polymerization procedure was similar to that used to prepare PAR-PMMA except the polymerization was carried out in 20 g of 9/1 g/g mixture of veratrole/DMSO. The polymerization details are shown in Table 2.

TABLE-US-00002 TABLE 2 Synthesis of PSU-PMMA PSU MMA CuBr PMDTA Product Polymer ID (g) (g) (mg) (mg) (g) Mn Mw PDI Polymer 8 1.0 n/a n/a n/a n/a 5264 10663 1.48 Polymer 9 1.0 5 68 88 4.74 22978 34129 1.49 Polymer 10 1.0 4 58 79 4.0 18659 27462 1.47 Polymer 11 1.0 3 62 86 3.1 16387 24653 1.50 Polymer 12 1.0 6 68 88 5.2 23328 36010 1.54 Polymer 13 1.0 4 88 107 3.67 18837 29823 1.58

Example 3. Synthesis of PI-PMMA

[0056] An amino-terminated PI oligomer was synthesized by reacting 6FDA with PFMB (1.09 eq.) in m-cresol using thermal imidization conditions. The macroinitiator 6FDA-PFMB-iButBr was prepared by a method similar to that used to prepare PAR-iButBr. In this case, the iButBr is attached to the imide oligomer by an amide bond. The initiator is not soluble in toluene, but is soluble in anisole at room temperature.

[0057] The details of the polymerizations, which were carried out in anisole at 90C are shown in Table 3.

TABLE-US-00003 TABLE 3 Synthesis of PI-PMMA (PI: 6FDA/PFMB, 1:1.09) PI MMA Product Polymer ID (g) (g) (g) Mn Mw PDI Polymer 14 PI n/a n/a 15697 27199 1.72 Polymer 15 PI-iButBr n/a n/a 17172 28183 1.64 Polymer 16 1.0 5 3.43 57113 105347 1.84 Polymer 17 1.0 6 4.82 75915 151829 2.0 Polymer 18 1.0 4 2.1 44376 75266 1.70 Polymer 19 1.0 4 3.35 62016 115044 1.85 Polymer 20 1.0 3 2.11 36294 60675 1.67 Polymer 21 1.0 2 2.00 39596 68557 1.73

[0058] In the above polymerizations, the initial solution was clear, but after 24 h, it became cloudy. It was found that the addition of few drops of DMSO could keep the reaction solution clear. However, the DMSO slowed the polymerization and resulted in a broader PDI. Details of polymerizations containing different amounts of catalyst with or without DMSO are shown in Table 4. Less catalyst and no DMSO resulted in narrower PDIs.

TABLE-US-00004 TABLE 4 Synthesis of PI-PMMA (PI: 6FDA/PFMB, 1:1.09) PI CuBr DMSO Product Polymer ID (g) (mg) (g) (g) Mn Mw PDI Polymer 14 PI n/a n/a 15697 27199 1.72 Polymer 15 PI-Br n/a n/a 17172 28183 1.64 Polymer 22 1.0 57 0 2.99(2.96) 47854 88625 1.85 Polymer 23 1.0 32 0 2.73(2.66) 40589 66445 1.64 Polymer 24 1.0 57 0.3 3.08(2.69) 44107 86272 1.96 Polymer 25 1.0 33 0.3 2.20(2.02) 29993 51027 1.70

[0059] The polymerizations detailed in Table 3, were repeated on a larger scale (4 g of initiator as opposed to 1 g) (Table 5). Again, the addition of DMSO did not improve the results.

TABLE-US-00005 TABLE 5 Synthesis of PI-PMMA (PI: 6FDA/PFMB, 1/1.09) PI MMA DMSO Product Polymer ID (g) (g) (%) (g) Mn Mw PDI Polymer 14 PI n/a n/a n/a 15697 27199 1.72 Polymer 15 PI-Br n/a n/a n/a 17172 28183 1.64 Polymer 26 4.0 12.2 0 11.8 55485 100873 1.82 Polymer 27 4.0 12.1 1.5% 9.84 41073 77025 1.88 Polymer 28 4.0 16 1.5% 12.04 48704 97406 2.00 Polymer 29 4.0 20 0 15.1 61069 115428 1.89 Polymer 30 4.0 20 1.5% 13.92 55293 114813 2.08

[0060] The C? contribution of the PI 6FDA-PFMB to the optical properties of subsequent blends with C+ components was not as high as required to allow the preparation of very thin films. In order to increase this contribution so that thin films with the targeted properties could be prepared, the use of the PI 6FDA-BPDA-PFMB was investigated. An amino-terminated PI oligomer was synthesized by a procedure similar to that used for the PI 6FDA-PFMB oligomer. The ratio of 6FDA/BPDA was 1/1 and a 1.09 equivalent of PFMB was used (6FDA/BPDA/PFMB, 0.5/0.5/1.09). Again, the reaction was carried out in m-cresol under thermal-imidization conditions. The ATRP macroinitiator 6FDA-BPDA-PFMB-iButBr was prepared by a similar method used to make PAR-iButBr.

[0061] The details of the ATRP polymerizations of macro initiator containing the PI (6FDA/BPDA/PFMB, 0.5/0.5/1/09), which were carried out in anisole at 90C, are shown in Table 6. The PDIs are not as narrow as those of PSU-PMMA, but they are in the same range as that of the oligomer. The molecular weights are much higher than those of PSU-PMMA.

TABLE-US-00006 TABLE 6 Synthesis of PI-PMMA (PI: 6FDA/BPDA/PFMB, 0.5/0.5/1.09) PI MMA Product Polymer ID (g) (g) (g) Mn Mw PDI Polymer 31 PI n/a n/a 17076 32565 1.91 Polymer 32 PI-Br n/a n/a 17584 32690 1.86 Polymer 33 2.0 8 7.1 49446 84386 1.71 Polymer 34 4.0 16.4 13.7 46838 88502 1.89 Polymer 35 4.0 20 17.3 54513 102212 1.87

[0062] The polymerizations detailed in Table 6 were repeated on a 50 g to 100 g scale (Table 7). All of the reaction conditions other than reaction scale were the same. The results were very similar to those of the smaller scale reactions in terms of yield and molecular weight.

TABLE-US-00007 TABLE 7 Synthesis of PI-PMMA (PI: 6FDA/BPDA/PFMB, 0.5/0.5/1.09, 50 g scale) PI MMA Product Polymer ID (g) (g) (g) Mn Mw PDI Polymer 36 PI(0.5/0.5/1.09) n/a n/a 16709 31436 1.88 Polymer 37 PI-Br n/a n/a 16830 31464 1.87 Polymer 38 4 16 13.9 48905 86795 1.77 Polymer 39 4 18 15.4 54176 98210 1.81 Polymer 40 14 70 61.4 55307 101554 1.84 Polymer 41 14 63 51.6 49366 84272 1.71

[0063] Based on these favorable results, it was decided to increase the amount of BPDA in the PI BPDA-6FDA-PFMB. First, a BPDA-PFMB oligomer containing no 6FDA was synthesized by the same thermal imidization method in m-cresol. However, an appropriate solvent could not be found that could be used with this oligomer to prepare the ATRP macro initiator. Thus, an oligomer containing some 6FDA, i.e. BPDA-6FDA (80:20)-PFMB (1.09 eq.), was prepared in m-cresol using the thermal imidization method. However, it was difficult to find a solvent that would dissolve it at room temperature. Although it dissolved in anisole at room temperature, its solubility was low. Thus, the amount of BPDA in the oligomer was reduced. The PI BPDA-6FDA (70:30)-PFMB (1.09 eq.) was prepared in m-cresol using the thermal imidization method. The corresponding macro initiator terminated with iButBr was prepared in anisole. This PI was used in ATRP polymerizations with MMA in anisole. The Br on the chain ends could be removed to form a halogen-free product. The details of the polymerizations where there was a systematic change in the PI/MMA ratio are in Table 8.

TABLE-US-00008 TABLE 8 of PI-PMMA (PI: 6FDA/BPDA/PFMB, 0.3/0.7/1.09) Synthesis PI MMA Product Polymer ID (g) (g) (g) Mn Mw PDI Polymer 42 PI(0.3/0.7/1.09) n/a n/a Polymer 43 PI-Br n/a n/a Polymer 44 1 5 5.1 62931 109558 1.74 Polymer 45 1 6 5.3 63202 114112 1.81 Polymer 46 1 6 6.0 73405 135794 1.85 Polymer 47 1 4 3.8 51713 94548 1.83 Polymer 48 1 4.5 4.3 57362 103766 1.81 Polymer 49 1 3.7 3.8 55608 96448 1.73 Polymer 50 1 3.0 3.3 48591 84023 1.73 Polymer 51 1 2.5 2.7 35587 66881 1.88

[0064] The polymerizations were then scaled up to a 50 g scale with good results (Table 9).

TABLE-US-00009 TABLE 9 Synthesis of PI-PMMA (PI: 6FDA/BPDA/PFMB, 0.3/0.7/1.09, 50 g scale) PI MMA Product Polymer ID (g) (g) (g) Mn Mw PDI Polymer 52 PI(0.3/0.7/1.09) n/a n/a Polymer 53 PI-Br n/a n/a Polymer 54 14 45.1 48.4 49666 88793 1.79 Polymer 55 14 56 54.0 52949 96428 1.82 Polymer 56 20 56 62 45117 75296 1.67 Polymer 57 14 70.4 70.1 74455 126459 1.70 Polymer 58 14 57.04 58.2

[0065] Up to this point, the PI macro initiators were prepared with an equivalent of 1.09 PFMB. The initiators contained approximately 11 repeating units. A PI oligomer with more repeating units (?15) was then prepared in m-cresol.

[0066] The PI (6FDA/BPDA/PFMB, 0.3/0.7/1.065) oligomer was then converted to the corresponding PI-iButBr. Two PI-PMMA copolymers based on this PI were prepared (Table 10). The two PI-PMMA copolymers had higher molecular weights than those based on 1.09 eq of PFMB with a comparable PMMA/PI ratio.

TABLE-US-00010 TABLE 10 Synthesis of PI-PMMA (PI: 6FDA/BPDA/PFMB, 0.3/0.7/1.065) PI MMA Product Polymer ID (g) (g) (g) Mn Mw PDI Polymer 59 PI(0.3/0.7/1.065) n/a n/a Polymer 60 PI-Br n/a n/a Polymer 61 5 14.41 16.12 61690 111674 1.81 Polymer 62 5 25.97 24.8 78263 134719 1.72

[0067] In similar procedure, two PIs with even more repeating units (?22) was prepared from a 6FDA/BPDA/PFMB monomer ratio of 0.3/0.7/1.045 (Table 11).

TABLE-US-00011 TABLE 11 Synthesis of PI-PMMA (PI: 6FDA/BPDA/PFMB, 0.3/0.7/1.045) PI MMA Product Polymer ID (g) (g) (g) Mn Mw PDI Polymer 63 PI(0.3/0.7/1.045) n/a n/a Polymer 64 PI-Br n/a n/a Polymer 65 5 14.36 15.4 77800 143082 1.84 Polymer 66 5 25.63 22.72 100881 195669 1.94

Example 4. Synthesis of PI-PMMA Using a One Pot PI/PI-Br Method

[0068] A one pot synthesis of PI-PMMA was devised to reduce the cost of the procedure. Thus, after PFMB was dissolved in the desired solvent (such as anisole), 6FDA was added. After the solution was stirred and heated at reflux for 1 h, BPDA was added. Stirring and heating at reflux continued overnight. The solution remained clear after cooling to room temperature. After 2-bromoisobutyryl bromide and pyridine were added and the reaction mixture was heated at reflux for 1 hour, the reaction mixture was added to methanol to precipitate the product. Using this procedure, one precipitation step could be eliminated.

[0069] ATRP polymerizations of the macro initiators prepared in this manner with MMA were carried out using several different conditions (Table 12). The Br attached to the ends of the polymers obtained could be removed. These polymerizations were scaled up using the one pot method to yield 1 kg of PI/PI-Br. These results suggest that the procedure can be used to prepare much larger quantities of product.

TABLE-US-00012 TABLE 12 Synthesis of PI-PMMA (PI: 6FDA/BPDA/PFMB, 0.3/0.7/1.09, one pot) PI MMA Product ID (g) (g) (g) Mn Mw PDI Polymer 67 PI-Br one pot n/a n/a 0.3/0.7/1.09 Polymer 68 4 11.25 12.52 41092 68180 1.66 Polymer 69 2 5.8 6.2 Polymer 70 2 5.2 6.2 40790 68849 1.69 Polymer 71 10 28 31.5 37019 58130 1.57 Polymer 72 13.3 37.35 41.3 41360 69942 1.69

Example 5. Synthesis of PI-PS

[0070] The macro initiator PI-Br was used to prepare PI-PS, using styrene as the comonomer (Table 13)

TABLE-US-00013 TABLE 13 Synthesis of PI-PS (PI: 6FDA/BPDA/PFMB, 0.5/0.5/1.09) PI St Product Polymer ID (g) (g) (g) Mn Mw PDI Polymer 31 PI(0.5/0.5/1.09) n/a n/a 17076 32565 1.91 Polymer 32 PI-Br n/a n/a 17584 32690 1.86 Polymer 73 2.0 14.0 5.14 45133 98391 2.18

Example 6. Polymer Film Preparation and Characterization

[0071] Some polymer or a polymer blend was dissolved in a suitable solvent, for example, cyclopentanone (CPN) at a desired concentration, such as 12 weight %. The solution was applied to a flat glass substrate using the blade casting method with a desired gap, for example, a gap of 20 mils. The film was allowed to dry in air overnight and subsequently placed in a vacuum oven at 100? C. for 8 hours. After drying, the film was peeled off and further dried as a free-standing film at 100?C for 8 h. The birefringence of the polymer film before and after stretching was determined with a Metricon Model 2010/M Prism Coupler at the wavelength of 633 nm. The retardation of the films was measured by ellipsometry from 400 nm to 800 nm. The b* and haze of the film was measured by a HunterLab apparatus.

Example 7. Films of PAR-PMMA/PTFS Blends

[0072] PAR is not compatible with PTFS. Their blends form hazy solutions and hazy film. However, the PAR-PMMA block copolymer in blends with PTFS form clear solutions and films (Table 14).

TABLE-US-00014 TABLE 14 Films of PAR-PMMA/PTFS Blends PAR-PMMA PAR-PMMA/PTFS Solution Film ID ID weight ratio in THF Film Film 1 Polymer 2 80/20 clear Hazy Film 2 Polymer 3 80/20 clear Clear Film 3 Polymer 4 80/20 clear Slightly Hazy Film 4 Polymer 6 80/20 clear Slightly Hazy Film 5 Polymer 7 80/20 clear Slightly Hazy

Example 8. Films of PSU-PMMA

[0073] The PSU-PMMA block copolymer was initially evaluated by dissolving 25 mg in 1.0 g of THF. The clear solutions that were obtained were coated on 3 by 1 glass plates, Table 5 lists their b*, haze, transparency, Rth at 550 nm and their dispersion. As shown in the Table 15, all of them were clear and colorless.

TABLE-US-00015 TABLE 15 Films of PSU-PMMA PSU-PMMA thickness Haze Rth.sup.450/ Rth.sup.650/ Film ID ID um b* % Rth.sup.550 Rth.sup.550 Rth.sup.550 Film 6 Polymer 9 10 0.32 0.75 ?20.6 1.157 0.938 Film 7 Polymer 10 10 0.26 0.51 ?25.9 1.172 0.923 Film 8 Polymer 11 10 0.26 0.45 ?38.8 1.165 0.926 Film 0 Polymer 12 10 0.24 0.29 ?22.3 1.178 0.921 Film 10 Polymer 13 10 0.30 0.38 ?32.9 1.171 0.924

Example 9. Films of PSU-PMMA/PTFS Blends

[0074] PSU-PMMA and PTFS were blended in a desired solvent (such as CPN and THF) to form a clear solution, which was cast into clear films. The Re and dispersion of the PSU-PMMA/PTFS films are listed in Table 16. The data shows that reversed dispersion C+ films were obtained.

TABLE-US-00016 TABLE 16 Films of PSU-PMMA/PTFS Blends PSU- PMMA/ PSU- PTFS PMMA weight d Re.sup.450/ Re.sup.650/ Rth.sup.450/ Rth.sup.650/ Film ID ID ratio (um) Re.sup.550 Re.sup.550 Re.sup.550 Rth.sup.550 Rth.sup.550 Rth.sup.550 Film 11 Polymer 9 71/29 42 0.5 0.849 1.043 32.0 0.891 1.037 Film 12 Polymer 9 72/28 43 0.9 1.040 0.979 30.3 0.879 1.039 Film 13 Polymer 10 69/31 41 4.2 1.027 0.979 41.5 0.879 1.038 Film 14 Polymer 10 68/32 45 7.3 1.019 0.984 26.9 0.845 1.054 Film 15 Polymer 13 65/35 43 4.7 0.942 1.016 44.5 0.906 1.019 Film 16 Polymer 13 67/33 43 1.2 1.112 0.940 38.0 0.844 1.042 Film 17 Polymer 11 58/42 44 1.2 1.188 0.916 70.9 0.960 0.992

Example 10. Stretched Films of PSU-PMMA/PTFS Blends

[0075] The films of Example 9 were uniaxially stretched without constraint at a desired temperature and ratio (Tables 17-23). The stretching rate was fixed at 1%/s for all samples, if not specially noted. The films were pre-heated for 30 see to 3 min before stretching. Reversed Re was obtained for all the stretched films, with the dispersion Re450/Re550 ranging from about 0.788 to 0.986, including the ideal of 0.82.

TABLE-US-00017 TABLE 17 Uniaxial Unconstrained Stretching of Film 11 Film ST d Re550 Re450/ Re650/ Rth550 Rth450/ Rth650/ ID (C) ratio (?m) nm Re550 Re550 nm Rth550 Rth550 Nz Film 11 42 0.5 0.849 1.043 32 0.891 1.037 Film 18 130 1.25 36 ?59.7 0.867 1.046 44.4 0.865 1.043 ?0.244 Film 19 130 1.5 31 ?80.4 0.868 1.046 45.5 0.897 1.032 ?0.066 Film 20 130 1.75 28 ?92.4 0.898 1.033 54.3 0.936 1.013 ?0.088

TABLE-US-00018 TABLE 18 Uniaxial Unconstrained Stretching of Film 12 Film ST d Re550 Re450/ Re650/ Rth550 Rth450/ Rth650/ ID (C) ratio (?m) nm Re550 Re550 nm Rth550 Rth550 Nz Film 12 43 0.9 1.040 0.979 30.3 0.879 1.039 Film 21 130 1.25 37 ?53.3 0.843 1.056 35.1 0.866 1.045 ?0.159 Film 22 130 1.5 34 ?78.1 0.879 1.041 48.9 0.888 1.036 ?0.126 Film 23 130 1.75 32 ?88.3 0.906 1.03 50.4 0.941 1.013 ?0.071

TABLE-US-00019 TABLE 19 Uniaxial Unconstrained Stretching of Film 13 Film ST d Re550 Re450/ Re650/ Rth550 Rth450/ Rth650/ ID (C.) ratio (?m) nm Re550 Re550 nm Rth550 Rth550 Nz Film 13 41 4.2 1.027 0.979 41.5 0.879 1.038 Film 24 135 1.25 37 ?40.0 0.788 1.077 47.7 0.865 1.044 ?0.693 Film 25 135 1.50 33 ?60.2 0.846 1.054 42.4 0.870 1.045 ?0.204 Film 26 135 1.375 35 ?72.3 0.881 1.041 52.1 0.916 1.023 ?0.221 Film 27 135 1.75 30 ?83.7 0.903 1.032 56.6 0.918 1.023 ?0.176

TABLE-US-00020 TABLE 20 Uniaxial Unconstrained Stretching of Film 14 Film ST d Re550 Re450/ Re650/ Rth550 Rth450/ Rth650/ ID (C.) ratio (?m) nm Re550 Re550 nm Rth550 Rth550 Nz Film 14 45 7.3 1.019 0.984 26.9 0.845 1.054 Film 28 135 1.25 37 ?50.6 0.821 1.064 50 0.869 1.043 ?0.488 Film 29 135 1.5 34 ?74.6 0.881 1.041 55.3 0.912 1.022 ?0.241 Film 30 135 1.75 33 ?102.4 0.917 1.025 64.9 0.969 0.985 ?0.134 Film 31 137 1.5 35 ?85.3 0.915 1.027 58.6 0.940 1.015 ?0.187 Film 32 140 1.5 34 ?77.9 0.926 1.022 59.7 0.947 1.012 ?0.266

TABLE-US-00021 TABLE 21 Uniaxial Unconstrained Stretching of Film 15 Film ST d Re550 Re450/ Re650/ Rth550 Rth450/ Rth650/ ID (C.) ratio (?m) nm Re550 Re550 nm Rth550 Rth550 Nz Film 15 43 4.7 0.942 1.016 44.5 0.906 1.019 Film 33 145 1.25 38 ?63.9 0.880 1.041 55.2 0.974 0.987 ?0.364 Film 34 145 1.5 34 ?99.2 0.934 1.019 77.4 1.053 0.943 ?0.28 Film 35 145 1.75 29 ?107.1 0.952 1.012 56.5 1.024 0.964 ?0.028

TABLE-US-00022 TABLE 22 Uniaxial Unconstrained Stretching of Film 16 Film ST d Re550 Re450/ Re650/ Rth550 Rth450/ Rth650/ ID (C.) ratio (?m) nm Re550 Re550 nm Rth550 Rth550 Nz Film 16 43 1.2 1.112 0.940 38.0 0.844 1.042 Film 36 145 1.25 38 ?50.2 0.861 1.047 43.0 0.893 1.021 ?0.357 Film 37 145 1.5 35 ?84.8 0.903 1.032 58.9 0.888 1.030 ?0.195 Film 38 145 1.75 32 ?92.6 0.936 1.019 60.1 0.997 0.977 ?0.149

TABLE-US-00023 TABLE 23 Uniaxial Unconstrained Stretching of Film 17 Film ST d Re550 Re450/ Re650/ Rth550 Rth450/ Rth650/ ID (C.) ratio (?m) nm Re550 Re550 nm Rth550 Rth550 Nz Film 17 44 1.2 1.188 0.916 70.9 0.96 0.992 Film 39 145 1.25 37 ?96.6 0.912 1.028 102.8 1.027 0.965 ?0.564 Film 40 145 1.5 34 ?158.6 0.965 1.007 111.6 1.062 0.947 ?0.204 Film 41 145 1.75 33 ?187.2 0.986 0.998 112.3 1.077 0.95 ?0.1

Example 11. Films of PI-PMMA

[0076] Samples (25 mg) of the PI-PMMA block copolymers were dissolved in 1.0 g of CPN yielding clear solutions that were cast into clear and colorless films.

Example 12. Films of PI-PMMA/PTFS Blends

[0077] PI-PMMA and PTFS were blended in a desired solvent (such as CPN) to form clear solutions and then cast into clear films. The optical properties of some of the PI-PMMA/PTFS films are listed in Table 24. Reversed dispersion C+ films were obtained, with Rth450/Rth550 dispersions ranging from ?0.77 to 0.97, including the ideal dispersion 0.82.

TABLE-US-00024 TABLE 24 Films of PI-PMMA/PTFS Blends PI-PMMA PI-PMMA/PTFS d Re.sup.450/ Re.sup.650/ Rth.sup.450/ Rth.sup.650/ Film ID ID weight ratio (um) Re.sup.550 Re.sup.550 Re.sup.550 Rth.sup.550 Rth.sup.550 Rth.sup.550 Film 42 Polymer 26 60.8/39.2 41 2.6 1.105 0.986 53.1 0.879 1.033 Film 43 Polymer 26 60/40 38 2.6 0.336 1.305 64.6 0.904 1.021 Film 44 Polymer 29 66/34 44 0.3 1.185 0.910 47.6 0.882 1.036 Film 45 Polymer 33 45.5/54.5 40 0.3 1.329 0.810 102.4 0.891 1.015 Film 46 Polymer 33 46.3/53.7 41 0.4 0.813 1.022 90.4 0.825 1.029 Film 47 Polymer 33 47.0/53.0 41 2.2 0.728 1.099 76.2 0.794 1.051 Film 48 Polymer 33 48.1/51.9 37 0.1 1.829 0.687 75.8 0.779 1.042 Film 49 Polymer 33 50.2/49.8 36 0.1 0.377 1.380 34.9 0.452 1.156 Film 50 Polymer 40 50.8/49.2 37 0.1 0.734 1.020 104.0 0.923 1.001 Film 51 Polymer 40 52.8/47.2 36 2.9 0.952 1.008 79.3 0.876 1.026 Film 52 Polymer 41 48.1/51.9 46 0.4 0.953 0.922 90.3 0.864 1.020 Film 53 Polymer 41 50.2/49.8 49 0.2 1.574 0.744 72.3 0.785 1.035 Film 54 Polymer 44 44.5/55.5 38 0.1 0.716 1.098 129.6 0.908 1.014 Film 55 Polymer 48 51.5/48.5 38 0.2 0.786 1.180 106.6 0.884 1.028 Film 56 Polymer 44 51.5/48.5 38 0.4 0.918 1.020 95.2 0.899 1.028 Film 57 Polymer 45 53.0/47.0 36 0.3 0.999 0.957 84.8 0.901 1.026 Film 58 Polymer 46 53.0/47.0 37 0.3 0.877 1.009 87.9 0.891 1.032 Film 59 Polymer 54 48.0/52.0 45 0.4 1.193 0.902 147.7 0.913 1.022 Film 60 Polymer 54 52.0/48.0 30 0.5 1.207 0.903 70.1 0.818 1.060 Film 61 Polymer 54 56.0/44.0 34 0.5 1.259 0.893 56.3 0.707 1.101 Film 62 Polymer 55 50.0/50.0 37 0.4 1.178 0.907 149.8 0.958 1.004 Film 63 Polymer 54 49.0/51.0 30 0.5 1.156 0.907 100.9 0.875 1.035 Film 64 Polymer 54 50.0/50.0 34 0.4 1.303 0.867 100.0 0.868 1.034 Film 65 Polymer 54 58.0/42.0 44 0.7 0.847 1.025 54.0 0.528 1.162 Film 66 Polymer 54 50.0/50.0 32 0.4 1.200 0.880 118.7 0.933 1.015 Film 67 Polymer 56 50.0/50.0 34 0.7 1.093 0.946 104.4 0.886 1.032 Film 68 Polymer 56 47.0/53.0 40 0.5 1.226 0.878 173.2 0.974 0.992 Film 69 Polymer 54 58.0/42.0 37 0.5 1.259 0.837 170.7 0.762 1.079 Film 70 Polymer 57 66.6/33.4 34 0.4 1.385 0.849 10.1 ?0.770 1.640 Film 71 Polymer 57 63.3/36.7 33 0.4 1.354 0.860 29.1 0.441 1.202 Film 72 Polymer 56 58.0/42.0 41 0.1 0.390 1.158 56.9 0.597 1.116 Film 73 Polymer 56 58.0/42.0 59 0.6 1.226 0.890 121.6 0.832 1.048 Film 74 Polymer 56 58.0/42.0 68 0.7 1.097 0.946 107.8 0.858 1.039 Film 75 Polymer 56 57.0/43.0 68 0.6 1.205 0.859 127.6 0.915 1.022 Film 76 Polymer 56 59.0/41.0 71 0.7 1.222 0.901 125.7 0.874 1.036 Film 77 Polymer 58 61.9/38.1 36 0.5 1.250 0.881 70.9 0.816 1.055 Film 78 Polymer 58 58.8/41.2 42 0.6 1.045 0.973 111.4 0.881 1.036

Example 13 Stretched Films of PI-PMMA/PTFS Blends

[0078] The films of Example 12 were stretched uniaxially without constraint, uniaxial with constraint and biaxially, at desired temperatures and stretch ratios. (Tables 25-61). The stretching rate was fixed at 1%/s for all samples, if not specially noted. The samples were pre-heated for 30 see to 3 min. For uniaxial stretching without constraint, one number is used to specify the stretching direction ratio L/L.0. For uniaxial with constraint, two numbers in the format of (first number)?(second number). The first number is the ratio along the stretching direction, and the second number is 1, indicating constraint in the TD direction. For biaxial stretching, the ratio term has two numbers in the format of (first number)?(second number), the first number is the ratio along one stretching direction, and the second number is the ratio along the other direction.

[0079] The as cast films and stretched films all have low color and low haze (b* and haze) as shown in Table 42 (Film 59 and the stretched films). The haze and b* of other similar films has similar results and are not listed.

[0080] Different types of uncommon compensation films have been obtained from the PI-PMMA/PTFS blend, including RD C+ films, RD A?/B+ films, flat Z-films and RD Z-films.

TABLE-US-00025 TABLE 25 Uniaxial Unconstrained Stretching of Film 42 Film ST d Re550 Re450/ Re650/ Rth550 Rth450/ Rth650/ ID (C.) ratio (?m) nm Re550 Re550 nm Rth550 Rth550 Nz Film 42 41 2.6 1.015 0.986 53.1 0.879 1.033 Film 79 154 1.25 32 ?57.4 0.712 1.114 86.8 0.996 0.957 ?1.011 Film 80 155 1.25 32 ?72.5 0.759 1.092 2.6 0.110 1.843 0.465 Film 81 160 1.25 32 ?69.6 0.841 1.060 76.4 1.001 0.961 ?0.598 Film 82 155 1.5 29 ?74.2 0.748 1.099 60.9 0.965 0.938 ?0.320 Film 83 155 1.5 29 ?72.4 0.743 1.102 63.8 0.974 0.931 ?0.382 Film 84 157 1.5 29 ?77.0 0.763 1.092 70.4 1.039 0.917 ?0.414 Film 85 160 1.5 29 ?92.5 0.833 1.063 65.6 1.033 0.933 ?0.210 Film 86 155 1.75 27 ?92.4 0.803 1.075 48.3 0.952 0.939 ?0.023 Film 87 157 1.75 27 ?89.1 0.805 1.074 54.5 0.935 0.979 ?0.112 Film 88 160 1.75 27 ?99.6 0.833 1.061 59.2 0.992 0.988 ?0.094 Film 89 162 1.75 27 ?108.1 0.862 1.051 72.4 1.064 0.936 ?0.170

TABLE-US-00026 TABLE 26 Uniaxial Unconstrained Stretching of Film 43 Film ST d Re550 Re450/ Re650/ Rth550 Rth450/ Rth650/ ID (C.) ratio (?m) nm Re550 Re550 nm Rth550 Rth550 Nz Film 43 38 2.6 0.336 1.305 64.6 0.904 1.021 Film 90 156 1.25 32 ?85.9 0.899 1.036 75.7 1.056 0.944 ?0.382 Film 91 160 1.25 32 ?86.6 0.903 1.034 80.9 1.082 0.932 ?0.434 Film 92 162 1.25 32 ?80.4 0.906 1.033 78.2 1.084 0.933 ?0.473 Film 93 156 1.5 29 ?104.0 0.878 1.044 86.2 1.111 0.907 ?0.329 Film 94 161 1.5 29 ?117.0 0.901 1.035 84.0 1.139 0.903 ?0.218 Film 95 163 1.5 29 ?109.7 0.910 1.031 99.4 1.113 0.915 ?0.406 Film 96 160 1.5 29 ?119.2 0.884 1.042 94.8 1.141 0.895 ?0.295 Film 97 161 1.75 27 ?123.7 0.905 1.033 84.6 1.131 0.920 ?0.184 Film 98 163 1.75 27 ?123.0 0.915 1.029 93.6 1.147 0.898 ?0.261

TABLE-US-00027 TABLE 27 Uniaxial Unconstrained Stretching of Film 44 Film ST d Re550 Re450/ Re650/ Rth550 Rth450/ Rth650/ ID (C.) ratio (?m) nm Re550 Re550 nm Rth550 Rth550 Nz Film 44 44 0.3 1.185 0.910 47.6 0.882 1.036 Film 99 155 1.25 34 ?45.4 0.678 1.129 39.1 0.837 1.024 ?0.361 Film 100 155 1.5 30 ?59.1 0.714 1.114 46.4 0.882 0.994 ?0.285 Film 101 161 1.5 31 ?67.0 0.779 1.087 63.3 0.908 0.992 ?0.445 Film 102 159 1.5 30 ?65.5 0.763 1.094 57.1 0.885 0.993 ?0.371 Film 103 164 1.5 33 ?66.8 0.804 1.076 49.1 0.942 0.983 ?0.234 Film 104 155 1.5 31 ?67.1 0.723 1.111 33.5 0.771 1.028 ?0.001 Film 105 161 1.5 30 ?72.6 0.795 1.080 55.6 0.925 0.977 ?0.266 Film 106 158 1.75 29 ?75.4 0.782 1.085 47.1 0.931 0.981 ?0.125 Film 107 153 1.75 27 ?83.9 0.731 1.065 51.2 0.991 0.969 ?0.109

TABLE-US-00028 TABLE 28 Uniaxial Unconstrained Stretching of Film 45 Film ST d Re550 Re450/ Re650/ Rth550 Rth450/ Rth650/ ID (C.) ratio (?m) nm Re550 Re550 nm Rth550 Rth550 Nz Film 45 40 0.3 1.329 0.810 102.4 0.891 1.015 Film 108 162 1.25 30 ?210.1 0.936 1.017 155.4 1.114 0.882 ?0.240 Film 109 165 1.25 29 ?213.3 0.944 1.014 198.1 1.120 0.882 ?0.429 Film 110 168 1.25 32 ?207.7 0.959 1.008 133.4 1.068 0.914 ?0.142 Film 111 162 1.5 28 ?243.3 0.930 1.019 191.7 1.191 0.853 ?0.288 Film 112 165 1.5 27 ?246.9 0.937 1.016 176.4 1.167 0.871 ?0.215 Film 113 168 1.5 27 ?251.5 0.942 1.015 212.1 1.199 0.852 ?0.343 Film 114 165 1.5 29 ?261.5 0.952 1.011 187.5 1.180 0.869 ?0.217 Film 115 162 1.75 28 ?283.1 0.938 1.015 171.4 1.215 0.840 ?0.105 Film 116 166 1.75 25 ?266.3 0.944 1.014 185.5 1.170 0.880 ?0.197 Film 117 168 1.75 26 ?272.3 0.947 1.012 173.3 1.118 0.916 ?0.137 Note: Film 114 was stretched at a rate of 0.5%/s.

TABLE-US-00029 TABLE 29 Uniaxial Unconstrained Stretching of Film 46 Film ST d Re550 Re450/ Re650/ Rth550 Rth450/ Rth650/ ID (C.) ratio (?m) nm Re550 Re550 nm Rth550 Rth550 Nz Film 46 41 0.4 0.813 1.022 90.4 0.825 1.029 Film 118 167 1.25 36 ?175.6 0.930 1.019 124.6 1.052 0.907 ?0.210 Film 119 165 1.25 34 ?188.1 0.945 1.013 115.8 1.006 0.931 ?0.116 Film 120 167 1.25 33 ?226.8 0.928 1.016 176.8 1.192 0.849 ?0.316 Film 121 167 1.5 32 ?191.5 0.911 1.026 129.7 1.051 0.925 ?0.177 Film 122 165 1.5 32 ?207.9 0.920 1.022 219.5 1.220 0.824 ?0.556 Film 123 169 1.5 30 ?191.6 0.913 1.025 142.9 1.122 0.872 ?0.246 Film 124 167 1.5 31 ?230.2 0.915 1.025 151.6 1.199 0.832 ?0.159 Film 125 167 1.75 30 ?242.8 0.926 1.020 185.1 1.167 0.876 ?0.262 Film 126 165 1.75 30 ?226.6 0.919 1.023 150.9 1.201 0.833 ?0.138 Film 127 170 1.75 32 ?225.7 0.904 1.028 178.6 1.145 0.878 ?0.291 Note: Films 121 and 125 were stretched at a rate of 0.5%/s.

TABLE-US-00030 TABLE 30 Uniaxial Unconstrained Stretching of Film 47 Film ST d Re550 Re450/ Re650/ Rth550 Rth450/ Rth650/ ID (C.) ratio (?m) nm Re550 Re550 nm Rth550 Rth550 Nz Film 47 41 2.2 0.728 1.099 76.2 0.794 1.051 Film 128 167 1.25 39 ?183.8 0.932 1.018 110.5 0.961 0.946 ?0.101 Film 129 169 1.25 34 ?167.7 0.939 1.015 101.9 0.906 0.991 ?0.107 Film 130 166 1.5 33 ?206.0 0.921 1.022 130.2 1.034 0.925 ?0.132 Film 131 169 1.5 31 ?214.3 0.924 1.021 135.0 1.046 0.924 ?0.130 Film 132 169 1.5 30 ?215.8 0.932 1.019 134.4 1.046 0.926 ?0.123 Film 133 171 1.5 31 ?212.8 0.930 1.019 130.9 1.036 0.932 ?0.115 Film 134 165 1.5 30 ?225.5 0.924 1.022 133.9 1.070 0.893 ?0.094 Film 135 176 1.5 30 ?193.0 0.908 1.027 115.0 0.962 0.954 ?0.096 Film 136 174 1.5 31 ?202.0 0.923 1.022 111.7 1.041 0.917 ?0.053 Film 137 166 1.75 28 ?238.6 0.926 1.021 156.6 1.067 0.929 ?0.156 Film 138 169 1.75 28 ?242.1 0.926 1.021 135.1 1.118 0.880 ?0.058 Note: Films 132, 133 and 134 were stretched at a rate of 0.5%/s.

TABLE-US-00031 TABLE 31 Uniaxial Unconstrained Stretching of Film 48 Film ST d Re550 Re450/ Re650/ Rth550 Rth450/ Rth650/ ID (C.) ratio (?m) nm Re550 Re550 nm Rth550 Rth550 Nz Film 48 37 0.1 1.829 0.687 75.8 0.779 1.042 Film 139 157 1.25 31 ?154.1 0.893 1.035 112.9 0.880 0.952 ?0.232 Film 140 164 1.25 33 ?165.5 0.926 1.021 105.2 0.987 0.932 ?0.136 Film 141 167 1.25 32 ?163.1 0.926 1.021 105.1 0.970 0.937 ?0.144 Film 142 158 1.5 32 ?192.7 0.896 1.033 101.6 1.003 0.895 ?0.027 Film 143 158 1.5 35 ?215.4 0.908 1.027 143.3 1.036 0.911 ?0.165 Film 144 164 1.5 30 ?181.6 0.919 1.023 112.2 0.999 0.936 ?0.118 Film 145 167 1.5 31 ?187.6 0.912 1.026 134.9 1.066 0.893 ?0.219 Film 146 162 1.5 31 ?186.0 0.923 1.021 116.2 0.997 0.932 ?0.125 Film 147 158 1.75 26 ?171.4 0.882 1.038 102.7 0.974 0.905 ?0.100 Film 148 154 1.75 30 ?195.5 0.914 1.025 134.0 1.074 0.897 ?0.185 Note: Films 143, 144, 145, 146 and 148 were stretched at a rate of 0.5%/s.

TABLE-US-00032 TABLE 32 Uniaxial Unconstrained Stretching of Film 49 Film ST d Re550 Re450/ Re650/ Rth550 Rth450/ Rth650/ ID (C.) ratio (?m) nm Re550 Re550 nm Rth550 Rth550 Nz Film 49 36 0.1 0.377 1.380 34.9 0.452 1.156 Film 149 162 1.25 29 ?136.6 0.855 1.049 119.7 0.987 0.918 ?0.377 Film 150 160 1.25 29 ?135.4 0.853 1.050 89.6 0.876 0.957 ?0.162 Film 151 157 1.25 29 ?122.1 0.813 1.065 94.7 0.869 0.946 ?0.276 Film 152 162 1.375 27 ?136.4 0.830 1.057 81.2 0.842 0.944 ?0.095 Film 153 162 1.375 28 ?155.1 0.865 1.044 85.3 0.838 0.946 ?0.050 Film 154 162 1.5 27 ?162.6 0.861 1.045 84.5 0.891 0.915 ?0.020 Note: Films 153 and 154 were stretched at a rate of 0.5%/s.

TABLE-US-00033 TABLE 33 Uniaxial Constrained and Biaxial Stretching of Film 50 Film ST d Re550 Re450/ Re650/ Rth550 Rth450/ Rth650/ ID (C.) ratio (?m) nm Re550 Re550 nm Rth550 Rth550 Nz Film 50 37 0.10 0.734 1.020 104.0 0.923 1.001 Film155 150 1.2 ? 1.0 31 ?48.34 0.955 1.010 71.25 0.918 0.998 0.974 Film156 150 1.4 ? 1.0 28 ?73.27 0.948 1.014 86.01 0.954 0.978 ?0.674 Film157 150 1.6 ? 1.0 24 ?86.01 0.944 1.014 84.76 0.947 0.983 ?0.485 Film158 150 1.3 ? 1.3 23 ?3.796 0.931 1.023 77.82 0.886 1.025 ?20 Film159 155 1.4 ? 1.0 29 ?60.6 0.939 1.015 72.33 0.904 1.004 ?0.694 Film160 155 1.3 ? 1.3 24 ?4.315 0.965 1.004 70.29 0.856 1.039 ?15.79 Film161 155 1.6 ? 1.0 24 ?74.48 0.935 1.018 76.17 0.936 0.984 ?0.523 Film162 160 1.6 ? 1.0 25 ?66.36 0.923 1.021 69.49 0.918 0.998 ?0.547

TABLE-US-00034 TABLE 34 Uniaxial Constrained and Biaxial Stretching of Film 51 Film ST d Re550 Re450/ Re650/ Rth450/ Rth650/ ID ? C. ratio (?m) nm Re550 Re550 Rth550 Rth550 Rth550 Nz Film 51 36 ?2.9 0.952 1.008 79.3 0.876 1.026 Film 163 150 1.2 ? 1.0 34 ?40.37 0.926 1.02 56.39 0.812 1.036 ?0.897 Film 164 150 1.4 ? 1.0 32 ?58.14 0.914 1.024 65.99 0.844 1.024 ?0.635 Film 165 150 1.6 ? 1.0 28 ?73.42 0.909 1.028 70.83 0.856 0.996 ?0.465 Film 166 150 1.3 ? 1.3 25 ?3.189 0.894 1.04 65.4 0.81 1.052 ?20.01

TABLE-US-00035 TABLE 35 Uniaxial Constrained and Biaxial Stretching of Film 52 Film ST d Re550 Re450/ Re650/ Rth450/ Rth650/ ID (? C.) ratio (?m) nm Re550 Re550 Rth550 Rth550 Rth550 Nz Film 52 46 ?0.4 0.953 0.922 90.32 0.864 1.020 Film 167 150 1.2 ? 1.0 31 ?57.5 0.959 1.008 79.8 0.905 0.993 ?0.887 Film 168 150 1.4 ? 1.0 28 ?85.5 0.953 1.011 102.3 0.957 0.958 ?0.696 Film 169 150 1.6 ? 1.0 27 ?108.0 0.949 1.013 113.4 0.991 0.945 ?0.55 Film 170 150 1.3 ? 1.3 25 ?3.6 0.950 1.017 87.54 0.879 1.017 ?23.51

TABLE-US-00036 TABLE 36 Uniaxial Constrained and Biaxial Stretching of Film 53 Film ST d Re550 Re450/ Re650/ Rth450/ Rth650/ ID (? C.) ratio (?m) nm Re550 Re550 Rth550 Rth550 Rth550 Nz Film 53 49 ?0.2 1.574 0.744 72.3 0.785 1.035 Film 171 150 1.2 ? 1.0 36 ?49.9 0.941 1.015 61.4 0.811 1.023 ?0.73 Film 172 150 1.4 ? 1.0 28 ?70.1 0.936 1.018 72.9 0.872 0.997 ?0.54 Film 173 150 1.6 ? 1.0 26 ?83.9 0.930 1.020 78.5 0.904 0.984 ?0.436 Film 174 150 1.3 ? 1.3 24 ?4.6 0.904 1.032 64.3 0.81 1.044 ?13.39

TABLE-US-00037 TABLE 37 Uniaxial Unconstrained Stretching of Film 54 Film ST d Re550 Re450/ Re650/ Rth450/ Rth650/ ID (? C.) ratio (?m) nm Re550 Re550 Rth550 Rth550 Rth550 Nz Film 54 38 0.1 0.716 1.098 129.6 0.908 1.014 Film 175 158 1.25 30 ?268.5 0.976 1.002 169.8 0.996 0.968 ?0.132 Film 176 156 1.375 28 ?276.5 0.964 1.007 163.1 1.011 0.958 ?0.090 Film 177 157 1.5 28 ?297.0 0.969 1.005 189.8 1.052 0.947 ?0.139

TABLE-US-00038 TABLE 38 Uniaxial Unconstrained Stretching of Film 55 Film ST d Re550 Re450/ Re650/ Rth450/ Rth650/ ID (? C.) ratio (?m) nm Re550 Re550 Rth550 Rth550 Rth550 Nz Film 55 38 0.2 0.786 1.18 106.6 0.884 1.028 Film 178 156 1.25 28 ?252.6 0.973 1.003 145.9 0.944 1.004 ?0.078 Film 179 158 1.25 28 ?251.1 0.968 1.005 139.3 0.94 1.006 ?0.055 Film 180 158 1.375 27 ?261.8 0.963 1.006 136.6 0.95 0.999 ?0.022 Film 181 159 1.5 25 ?266.3 0.961 1.007 103.3 0.88 1.043 0.112

TABLE-US-00039 TABLE 39 Uniaxial Unconstrained Stretching of Film 56 Film ST d Re550 Re450/ Re650/ Rth450/ Rth650/ ID (? C.) ratio (?m) nm Re550 Re550 Rth550 Rth550 Rth550 Nz Film 56 38 0.4 0.918 1.02 95.2 0.899 1.028 Film 182 160 1.25 31 ?215.3 0.962 1.007 109.0 0.905 1.024 ?0.006 Film 183 160 1.375 29 ?230.8 0.952 1.011 113.3 0.912 1.020 0.009 Film 184 156 1.375 29 ?219.6 0.942 1.014 119.5 0.914 1.026 ?0.044 Film 185 156 1.5 26 ?229.6 0.942 1.014 107.9 0.890 1.032 0.030

TABLE-US-00040 TABLE 40 Uniaxial Unconstrained Stretching of Film 57 Film ST d Re550 Re450/ Re650/ Rth450/ Rth650/ ID (? C.) ratio (?m) nm Re550 Re550 Rth550 Rth550 Rth550 Nz Film 57 36 0.3 0.999 0.957 84.8 0.901 1.026 Film 186 151 1.25 26 ?185 0.938 1.016 96.6 0.896 1.027 ?0.022 Film 187 152 1.375 26 ?179.1 0.929 1.019 101.5 0.896 1.027 ?0.066 Film 188 154 1.5 24 ?191.8 0.937 1.016 70.7 0.815 1.079 0.131

TABLE-US-00041 TABLE 41 Uniaxial Unconstrained Stretching of Film 58 Film ST d Re550 Re450/ Re650/ Rth450/ Rth650/ ID (? C.) ratio (?m) nm Re550 Re550 Rth550 Rth550 Rth550 Nz Film 58 37 0.3 0.877 1.009 87.9 0.891 1.032 Film 189 153 1.25 31 ?228.9 0.961 1.007 133.1 0.926 1.017 ?0.082 Film 190 152 1.375 28 ?225.1 0.948 1.012 124.8 0.921 1.017 ?0.054 Film 191 155 1.375 28 ?228.7 0.954 1.010 122.4 0.925 1.017 ?0.035

TABLE-US-00042 TABLE 42 Uniaxial Constrained and Unconstrained and Biaxial Stretching of Film 59 Film ST d Re550 Re450/ Re650/ Rth450/ Rth650/ Haze ID (? C.) ratio (?m) nm Re550 Re550 Rth550 Rth550 Rth550 Nz b* % Film 59 45 0.4 1.193 0.902 147.7 0.913 1.022 1.14 0.53 Film 192 150 1.25 43 ?211.3 0.996 0.994 134.0 0.922 1.010 ?0.134 1.08 1.11 Film 193 150 1.5 39 ?332.5 0.996 0.995 179.5 0.947 0.999 ?0.040 0.99 1.25 Film 194 150 1.75 34 ?323.6 0.989 0.997 172.5 0.943 1.003 ?0.033 0.9 0.81 Film 195 150 1.5 ? 1.0 31 ?150.1 0.995 0.994 142.3 0.916 1.019 ?0.450 0.85 0.65 Film 196 150 1.3 ? 1.3 29 ?6.5 0.971 1.012 119.3 0.866 1.037 ?18.0 0.79 0.64 Film 197 160 1.5 38 ?241.9 0.985 0.998 113.6 0.890 1.019 0.030 0.95 1.26 Film 199 160 1.75 32 ?275.5 0.984 0.999 128.0 0..917 1.011 0.036 0.87 1.1 Film 199 160 2 28 ?303.3 0.992 0.995 140.7 0.941 1.012 0.036 0.95 1.68 Film 200 160 2.25 27 ?318.8 0.992 0.996 138.6 0.953 0.996 0.065 1.38 5.7 Film 201 160 1.5 ? 1.0 29 ?114.8 1.001 0.992 104.7 0.898 1.026 0.412 0.82 0.72 Film 202 160 1.3 ? 1.3 31 ?1.8 0.961 1.007 107.1 0.868 1.039 ?60.16 0.86 0.4 Film 203 160 1.5 36 ?237.4 0.990 0.996 113.9 0.906 1.022 0.020 0.97 1.01 Film 204 160 1.5 34 ?245.7 0.990 0.996 121.3 0.913 1.016 0.006 0.91 0.78 Film 205 170 1.5 42 ?255.4 1.000 0.993 124.6 0.967 0.993 0.012 1.14 1.02 Film 206 170 1.75 39 ?305.6 1.004 0.991 147.6 0.996 0.979 0.017 1 0.71 Film 207 170 2 38 ?374.7 1.010 0.988 178.0 1.000 0.979 0.025 1.17 1.05 Film 208 170 2.25 33 ?357.8 0.808 1.046 381.2 1.02 0.801 ?0.566 1.23 1.73 Film 209 170 1.5 ? 1.0 32 ?106.2 1.004 0.991 94.94 0.89 1.029 ?0.394 0.99 0.5 Film 210 170 1.3 ? 1.3 30 ?8.6 1.017 0.983 88.28 0.867 1.038 ?9.728 0.88 0.55 Note: Films 203 were stretched at a rate of 2%/s and 204 at 4%/s.

TABLE-US-00043 TABLE 43 Uniaxial Constrained and Unconstrained and Biaxial Stretching of Film 60 Film ST d Re550 Re450/ Re650/ Rth550 Rth450/ Rth650/ ID (? C.) ratio (?m) nm Re550 Re550 nm Rth550 Rth550 Nz Film 60 30 0.5 1.207 0.903 70.1 0.818 1.060 Film 211 150 1.5 28 ?193.7 0.952 1.011 99.79 0.871 1.031 ?0.015 Film 212 150 1.75 27 ?192.3 0.942 1.015 94.21 0.829 1.047 0.010 Film 213 150 1.5 ? 1.0 25.5 ?102.8 0.971 1.004 86.71 0.828 1.055 ?0.343 Film 214 150 1.3 ? 1.3 23.3 ?7.801 0.977 0.999 78.14 0.785 1.074 ?9.516 Film 215 160 1.5 26.3 ?150.1 0.995 0.994 164.2 0.975 1.002 ?0.594 Film 216 160 1.75 27.5 ?215.7 0.977 1.001 93.94 0.876 1.029 0.064 Film 217 160 1.5 ? 1.0 21.6 ?73.4 0.983 0.999 59.94 0.807 1.058 ?0.317 Film 218 160 1.3 ? 1.3 19.6 ?6.7 0.976 1.004 54.47 0.759 1.077 ?7.596 Film 219 160 1.4 ? 1.4 17 ?8.6 0.974 1.004 50.84 0.752 1.082 ?5.441 Film 220 170 1.5 30 ?152.6 0.977 1.001 104.7 0.898 1.026 ?0.186 Film 221 170 2 25.1 ?203.2 0.980 1.000 66.81 0.854 1.038 0.171 Film 222 170 1.5 ? 1.0 26.5 ?73.5 0.983 0.999 52.29 0.740 1.085 ?0.211 Film 223 170 1.75 ? 1.0 19.2 ?93.7 0.985 0.997 50.26 0.762 1.077 ?0.036 Film 224 170 2.0 ? 1.0 19.4 ?114.8 0.990 0.996 54.55 0.776 1.067 0.025 Film 225 170 1.4 ? 1.4 21.2 ?3.3 0.952 1.014 44.65 0.695 1.107 ?12.99 Film 226 170 1.5 ? 1.5 19.2 ?2.1 0.919 1.021 41.88 0.688 1.109 ?19.48 Film 227 170 1.6 ? 1.6 16.6 ?6.3 0.972 1.004 38.54 0.667 1.11 ?5.606 Film 228 170 1.7 ? 1.7 15.8 ?7.2 0.982 0.999 34.83 0.621 1.132 ?4.368

TABLE-US-00044 TABLE 44 Uniaxial Constrained and Unconstrained and Biaxial Stretching of film 61 Film ST d Re550 Re450/ Re650/ Rth550 Rth450/ Rth650/ ID (? C.) ratio (?m) nm Re550 Re550 nm Rth550 Rth550 Nz Film 61 34 0.5 1.259 0.893 56.3 0.707 1.101 Film 229 150 1.5 29.4 ?130.1 0.938 1.016 53.92 0.703 1.090 0.086 Film 230 150 1.25 30.1 ?114.3 0.958 1.008 52.03 0.635 1.110 0.045 Film 231 150 1.5 ? 1.0 27.6 ?81.7 0.949 1.010 51.04 0.637 1.133 ?0.125 Film 232 150 1.3 ? 1.3 21.2 ?4.8 0.904 1.031 40.79 0.576 1.150 ?7.95 Film 233 160 1.5 25.5 ?145.8 0.953 1.008 57.3 0.743 1.074 0.107 Film 234 160 1.75 28 ?166.8 0.955 1.009 63.84 0.787 1.059 0.117 Film 235 160 1.5 ? 1.0 24.5 ?66.7 0.958 1.007 34.96 0.567 1.154 ?0.024 Film 236 160 1.3 ? 1.3 21.5 ?2.2 1.048 0.972 29.14 0.481 1.187 ?12.71 Film 237 160 1.4 ? 1.4 20.5 ?2.8 1.048 0.973 27.52 0.396 1.214 ?9.472 Film 238 160 1.5 ? 1.5 19.8 ?5.7 0.934 1.020 25.35 0.304 1.253 ?3.958 Film 239 170 1.5 29.2 ?123.3 0.956 1.009 45.54 0.768 1.069 0.131 Film 240 170 2 25 ?153.9 0.966 1.003 59.85 0.817 1.058 0.111 Film 241 170 1.5 ? 1.0 21.9 ?49.6 0.958 1.009 21.51 0.396 1.207 0.067 Film 242 170 2.0 ? 1.0 19.3 ?95.1 0.975 1.002 30.25 0.509 1.160 0.182 Film 243 170 1.5 ? 1.5 18.9 ?3.9 1.014 0.988 16.41 0.116 1.310 ?3.723 Film 244 170 1.6 ? 1.6 17.6 ?2.4 0.991 0.992 16.12 0.020 1.387 ?6.176

TABLE-US-00045 TABLE 45 Uniaxial Constrained and Unconstrained and Biaxial Stretching of film 62 Film ST d Re550 Re450/ Re650/ Rth550 Rth450/ Rth650/ ID (? C.) ratio (?m) nm Re550 Re550 nm Rth550 Rth550 Nz Film 62 37 0.4 1.178 0.907 149.8 0.958 1.004 Film 245 170 1.5 35 ?201.1 1.014 0.987 115.0 0.985 0.992 ?0.072 Film 246 170 1.75 28 ?246.4 1.014 0.987 127.7 0.992 0.987 ?0.018 Film 247 170 2 27 ?303.4 1.016 0.987 149.9 1.012 0.975 0.006 Film 248 170 2.25 25 ?284.6 1.013 0.987 145.2 1.005 0.985 ?0.010 Film 249 170 1.5 ? 1.0 29 ?94.05 1.016 0.987 101.9 0.944 1.010 ?0.583 Film 250 170 1.3 ? 1.3 27 18.98 1.020 0.985 99.49 0.925 1.020 5.742 Film 251 160 1.5 34 ?268.7 1.013 0.988 151.6 1.002 0.983 ?0.064 Film 252 160 1.75 29 ?290.3 1.010 0.989 290.3 1.010 0.989 ?0.500 Film 253 160 2 28 ?329.1 1.010 0.989 172.4 0.991 0.987 ?0.024 Film 254 160 2.25 29 ?363.8 1.009 0.989 184.2 1.014 0.971 ?0.006 Film 255 160 1.5 ? 1.0 31 ?121.4 1.015 0.986 130.6 0.961 1.002 ?0.576 Film 256 160 1.3 ? 1.3 30 ?35.27 1.005 0.99 130.2 0.933 1.014 ?3.192 Film 257 150 1.5 36 ?265.3 0.987 0.998 185.0 0.996 0.982 ?0.197

TABLE-US-00046 TABLE 46 Uniaxial Constrained and Unconstrained and Biaxial Stretching of film 63 Film ST d Re550 Re450/ Re650/ Rth550 Rth450/ Rth650/ ID (? C.) ratio (?m) nm Re550 Re550 nm Rth550 Rth550 Nz Film 63 30 0.5 1.156 0.907 100.9 0.875 1.035 Film 258 150 1.3 ? 1.3 23.9 ?1.8 0.946 1.019 107.7 0.855 1.042 ?58.81 Film 259 150 1.4 ? 1.4 21.2 ?16.39 0.969 1.004 95.89 0.843 1.053 ?5.351 Film 260 160 1.4 ? 1.4 20.1 ?3.7 1.024 0.981 82.85 0.849 1.046 ?21.67 Film 261 180 anneal 33 ?2.9 0.972 1.003 34.89 0.715 1.096 ?11.51 Film 262 160 1.5 26.3 ?202.8 0.990 0.996 118.9 0.920 1.016 ?0.086 Film 263 160 1.5 ? 1.0 26.2 ?141.6 0.994 0.995 107.1 0.890 1.025 ?0.256 Note: film 261 was put into heat chamber to anneal without any stretching.

TABLE-US-00047 TABLE 47 Uniaxial Constrained and Unconstrained and Biaxial Stretching of film 64 Film ST d Re550 Re450/ Re650/ Rth550 Rth450/ Rth650/ ID (? C.) ratio (?m) nm Re550 Re550 nm Rth550 Rth550 Nz Film 64 34 0.4 1.303 0.867 99.99 0.868 1.034 Film 264 150 1.3 ? 1.3 25.3 ?5.0 0.976 1.000 94.8 0.827 1.052 ?18.35 Film 265 150 1.4 ? 1.4 23.9 ?52.26 0.978 1.001 88.69 0.818 1.058 ?1.197 Film 266 160 1.4 ? 1.4 20.7 ?11.94 0.973 1.003 71.7 0.819 1.061 ?5.504 Film 267 180 anneal 31.4 ?1.119 0.952 1.005 27.22 0.634 1.13 ?23.82 Film 268 160 1.5 24.1 ?154.5 0.979 1.001 79.64 0.887 1.028 ?0.015 Film 269 160 1.5 ? 1.0 23.9 ?88.78 0.986 0.998 80.01 0.865 1.036 ?0.401 Note: film 267 was put into heat chamber to anneal without any stretching.

TABLE-US-00048 TABLE 48 Uniaxial Constrained and Unconstrained and Biaxial Stretching of film 65 Film ST d Re550 Re450/ Re650/ Rth550 Rth450/ Rth650/ ID (? C.) ratio (?m) nm Re550 Re550 nm Rth550 Rth550 Nz Film 65 44 0.7 0.847 1.025 54.02 0.528 1.162 Film 270 160 2 26.2 ?142.7 0.902 1.030 41.86 0.582 1.135 0.207 Film 271 170 2 28.2 ?158.5 0.942 1.015 56.8 0.787 1.060 0.142 Film 272 170 2.5 26 ?181.5 0.954 1.010 65.33 0.843 1.096 0.140 Film 273 170 2.0 ? 1.0 21.7 ?71.11 0.936 1.015 10.59 ?0.56 1.536 0.351 Film 274 180 anneal 40.5 1.4 0.893 1.033 ?0.601 24.63 ?7.703 0.080 Film 275 160 1.5 32.5 ?117.2 0.913 1.025 31.17 0.406 1.194 0.234 Film 276 160 1.5 ? 1.0 31.7 ?81.12 0.937 1.015 36.19 0.477 1.189 0.054 Film 277 160 1.75 33.2 ?147.5 0.935 1.017 51.11 0.685 1.096 0.153 Film 278 160 1.25 38 ?74.5 0.933 1.016 20.85 0.333 1.216 0.220 Note: film 274 was put into heat chamber to anneal without any stretching.

TABLE-US-00049 TABLE 49 Biaxial Stretching of film 66 Film ST d Re550 Re450/ Re650/ Rth550 Rth450/ Rth650/ ID (? C.) ratio (?m) nm Re550 Re550 nm Rth550 Rth550 Nz Film 66 32 0.4 1.200 0.880 118.7 0.933 1.015 Film 279 145 1.3 ? 1.3 18.9 ?4.3 0.982 0.998 97.28 0.875 1.038 ?22.28 Film 280 150 1.4 ? 1.4 18.7 ?6.6 1.002 0.994 82.17 0.847 1.055 ?11.95 Film 281 150 1.3 ? 1.3 21.9 ?1.8 1.013 0.984 90.88 0.871 1.041 ?50.45 Film 282 160 1.4 ? 1.4 16.5 ?1.1 1.135 0.941 64.64 0.831 1.051 ?56.99 Film 283 160 1.5 ? 1.5 13.4 ?7.6 1.019 0.984 51.24 0.816 1.057 ?6.238 Film 284 170 1.5 ? 1.5 14.9 ?0.8 1.203 0.922 45.65 0.783 1.075 ?56.19

TABLE-US-00050 TABLE 50 Biaxial Stretching of film 67 Film ST d Re550 Re450/ Re650/ Rth550 Rth450/ Rth650/ ID (? C.) ratio (?m) nm Re550 Re550 nm Rth550 Rth550 Film 67 33.5 0.734 1.093 0.946 104.4 0.886 1.032 Film 285 150 1.2 ? 1.2 25.7 ?5.399 0.984 0.999 69.53 0.808 1.070 Film 286 150 1.3 ? 1.3 21.0 ?1.572 1.094 0.948 78.42 0.811 1.069 Film 287 150 1.2 ? 1.2 23.5 ?2.387 1.016 0.987 74.09 0.818 1.066 Film 288 160 1.3 ? 1.3 19.7 ?2.873 1.051 0.971 55.44 0.775 1.089 Film 289 160 1.4 ? 1.4 17.3 ?3.738 1.040 0.981 50.05 0.746 1.085

TABLE-US-00051 TABLE 51 Biaxial Stretching of film 68 Film ST d Re550 Re450/ Re650/ Rth550 Rth450/ Rth650/ ID (? C.) ratio (?m) nm Re550 Re550 nm Rth550 Rth550 Film 68 40.3 0.5 1.226 0.878 173.2 0.974 0.992 Film 290 150 1.2 ? 1.2 27 ?8.8 0.989 0.996 149.1 0.947 1.005 Film 291 150 1.3 ? 1.3 21.6 ?2.4 0.987 0.994 120.2 0.891 1.026 Film 292 160 1.3 ? 1.3 22.2 ?2.4 1.022 0.985 105.0 0.910 1.020 Film 293 160 1.4 ? 1.4 18.6 ?4.7 1.001 0.994 91.37 0.875 1.035

TABLE-US-00052 TABLE 52 Uniaxial Constrained and Unconstrained Stretching of film 69 Film ST d Re550 Re450/ Re650/ Rth550 Rth450/ Rth650/ ID (? C.) ratio (?m) nm Re550 Re550 nm Rth550 Rth550 Nz Film 69 37 0.5 1.259 0.837 70.7 0.762 1.079 Film 294 150 1.75 30.6 ?198.3 0.966 1.006 81.17 0.859 1.037 0.091 Film 295 150 2 27.4 ?210.0 0.974 1.002 82.27 0.884 1.029 0.108 Film 296 150 1.75 ? 1.0 18.6 ?81.33 0.965 1.006 31.88 0.560 1.122 0.108 Film 297 160 1.75 ? 1.0 20.9 ?79.85 0.985 0.998 30.32 0.563 1.124 0.120 Film 298 160 2.0 ? 1.0 18.8 ?70.98 0.984 0.998 22.42 0.470 1.173 0.184 Film 299 160 1.9 ? 1.0 18.2 ?86.02 0.991 0.995 30.81 0.547 1.145 0.142 Film 300 160 2.25 29.7 ?237.1 0.992 0.996 92.53 0.936 1.011 0.110 Film 301 170 1.75 ? 1.0 21.8 ?76.4 0.990 0.997 21.97 0.424 1.193 0.212 Film 302 170 2.0 ? 1.0 19.1 ?87.8 0.995 0.994 21.82 0.431 1.194 0.252 Film 303 170 2.25 ? 1.0 15.9 ?85.05 0.984 0.998 16.39 0.259 1.268 0.307 Film 304 180 1.75 ? 1.0 20 ?51.84 0.964 1.006 ?0.1 97.55 ?33.21 0.503 Film 305 180 2.00 ? 1.0 17 ?82.46 0.981 0.999 16.68 0.169 1.285 0.298 Film 306 180 2.25 ? 1.0 14.8 ?72.84 0.980 1.000 5.4 ?1.359 1.832 0.426

TABLE-US-00053 TABLE 53 Uniaxial Constrained and Unconstrained and Biaxial Stretching of Film 70 Film ST d Re550 Re450/ Re650/ Rth550 Rth450/ Rth650/ ID (? C.) ratio (?m) nm Re550 Re550 nm Rth550 Rth550 Nz Film 70 34 0.4 1.385 0.849 10.13 ?0.77 1.640 Film 307 140 1.5 28.5 ?62.73 0.755 1.086 8.2 ?0.998 1.729 0.369 Film 308 140 2 25.1 ?81.05 0.745 1.081 18.9 0.087 1.311 0.267 Film 309 140 1.3 ? 1.3 18.8 1.3 0.954 0.997 ?5.1 4.400 ?0.226 ?3.386 Film 310 140 1.4 ? 1.4 17.9 ?2.7 1.409 0.769 58.47 0.542 1.152 ?21.42 Film 311 150 1.5 ? 1.5 15.5 0.9 1.115 0.915 ?14.35 2.153 0.623 ?16.05 Film 312 160 2.25 ? 1 15.9 14.48 0.551 1.145 ?20.28 1.722 0.737 ?0.900 Film 313 160 2.0 ? 1.0 16.4 24.14 0.714 1.100 ?14.16 2.033 0.614 ?0.087

TABLE-US-00054 TABLE 54 Uniaxial Constrained and Unconstrained Stretching of Film 71 Film ST d Re550 Re450/ Re650/ Rth550 Rth450/ Rth650/ ID (? C.) ratio (?m) nm Re550 Re550 nm Rth550 Rth550 Nz Film 71 32.5 0.4 1.354 0.860 29.12 0.441 1.202 Film 314 150 1.5 32.8 ?72.52 0.765 1.074 21.21 0.353 1.222 0.207 Film 315 150 2 30 ?110.2 0.821 1.054 41.17 0.648 1.115 0.126 Film 316 150 2.3 28 ?122.3 0.842 1.047 46.99 0.715 1.084 0.116 Film 317 150 2.6 26.9 ?134.2 0.860 1.046 53.95 0.793 1.045 0.098 Film 318 160 2 30.2 ?84.56 0.797 1.070 31.25 0.588 1.143 0.130 Film 319 160 2.3 30.9 ?105.7 0.822 1.053 39.18 0.677 1.110 0.129 Film 320 160 2.6 29.4 ?115.7 0.845 1.046 44.48 0.727 1.084 0.116 Film 321 160 2.6 30.4 ?110.1 0.842 1.050 44.32 0.719 1.115 0.097 Film 322 160 2.8 26.4 ?114.1 0.858 1.047 44.82 0.761 1.075 0.107 Film 323 160 2.1 ? 1.0 18.1 ?47.5 0.858 1.047 1.427 ?9.641 4.847 0.470 Film 324 160 1.75 ? 1 20.8 ?29.87 0.797 1.071 ?3.901 5.069 ?0.465 0.631

TABLE-US-00055 TABLE 55 Uniaxial Constrained and Unconstrained Stretching of Film 72 Film ST d Re550 Re450/ Re650/ Rth450/ Rth650/ ID (? C.) ratio (?m) nm Re550 Re550 Rth550 Rth550 Rth550 Nz Film 72 41.4 0.13 0.390 1.158 56.94 0.597 1.116 Film 325 150 1.5 30.6 ?159.0 0.957 1.009 58.29 0.721 1.062 0.133 Film 326 160 1.5 33.3 ?171.1 0.985 0.998 67.47 0.881 1.008 0.106 Film 327 160 2 27.8 ?217.3 0.979 1.000 86.58 0.922 0.991 0.101 Film 328 170 1.75 ? 1.0 20.9 ?82.75 0.986 0.998 15.27 ?0.101 1.330 0.315 Film 329 170 2.0 ? 1.0 17.8 ?88.19 0.989 0.995 10.93 ?0.496 1.472 0.376 Film 330 180 1.75 ? 1.0 20 ?63.34 0.983 0.998 ?1.751 10.93 ?2.351 0.528 Film 331 180 2.00 ? 1.0 16.8 ?73.84 0.987 0.998 ?0.813 20.46 ?5.601 0.511 Film 332 180 2.25 ? 1.0 16.4 ?85.36 0.989 0.997 ?0.263 62 ?19.82 0.503

TABLE-US-00056 TABLE 56 Uniaxial Constrained and Unconstrained and Stretching of Film 73 Film ST d Re550 Re450/ Re650/ Rth550 Rth450/ Rth650/ ID (? C.) ratio (?m) nm Re550 Re550 nm Rth550 Rth550 Nz Film 73 59 0.6 1.226 0.89 121.6 0.832 1.048 Film 333 175 1.75 ? 1.0 30.6 ?81.29 0.989 0.996 13.93 ?0.244 1.405 0.329 Film 334 175 2.0 ? 1.0 26.5 ?100.2 0.997 0.994 13.58 ?0.339 1.445 0.364 Film 335 180 2.0 ? 1.0 27 ?84.92 0.983 0.998 3.5 ?4.151 2.847 0.459 Film 336 180 2.25 ? 1.0 27.8 ?90.06 0.983 0.999 3.8 ?3.338 2.568 0.457 Film 337 180 2.50 ? 1.0 20.9 ?97.99 0.983 0.999 3.0 ?4.696 2.978 0.469 Film 338 180 2 51.8 ?227.2 1.002 0.992 98.5 0.992 0.978 0.066 Film 339 180 2.5 49.9 ?260.9 1.005 0.991 108.9 1.002 0.974 0.083 Film 340 185 2.00 ? 1.0 24.9 ?66.69 0.958 1.008 ?6.7 3.616 0.032 0.601 Film 341 185 2.25 ? 1.0 16.4 ?76.23 0.958 1.009 ?10.52 2.867 0.328 0.638 Film 342 185 2.5 ? 1.0 24.2 ?83.71 0.956 1.009 ?10.0 2.945 0.298 0.619 Film 343 185 2.25 ? 1.0 25.2 ?74.11 0.952 1.01 ?7.265 3.569 0.033 0.598 Film 344 185 2.25 ? 1.0 24.7 ?76.81 0.952 1.009 ?3.228 6.837 ?1.071 0.542 Note: Film 343 was stretched at a rate of 3%/s, and 44 at a rate of 7%/s.

TABLE-US-00057 TABLE 57 Uniaxial Constrained Stretching of Film 74 Film ST d Re550 Re450/ Re650/ Rth550 Rth450/ Rth650/ ID (? C.) ratio (?m) nm Re550 Re550 nm Rth550 Rth550 Nz Film 74 68 0.7 1.097 0.946 107.8 0.858 1.039 Film 345 170 2.0 ? 1.0 42.8 ?180.8 1.024 0.984 51.01 0.581 1.126 0.218 Film 346 175 2.0 ? 1.0 36.3 ?148.4 1.013 0.988 21.86 ?0.040 1.345 0.353 Film 347 180 2.0 ? 1.0 36.1 ?132.4 1.007 0.990 4.7 ?4.126 2.798 0.465 Film 348 180 2.25 ? 1.0 35.9 ?128.3 1.001 0.993 ?9.7 3.646 0.043 0.576 Film 349 180 2.25 ? 1.0 31.3 ?140.8 1.005 0.991 ?1.3 17.98 ?5.059 0.510 Film 350 185 2.0 ? 1.0 36.3 ?104.9 0.988 0.997 ?19.06 2.368 0.497 0.682 Film 351 185 2.25 ? 1.0 34.3 ?102.1 0.978 1.001 ?24.27 2.074 0.603 0.738 Film 352 185 2.50 ? 1.0 32.3 ?107.2 0.972 1.003 ?24.17 2.048 0.616 0.726

TABLE-US-00058 TABLE 58 Uniaxial Constrained Stretching of Film 75 Film ST d Re550 Re450/ Re650/ Rth550 Rth450/ Rth650/ ID (? C.) ratio (?m) nm Re550 Re550 nm Rth550 Rth550 Nz Film 75 68 0.6 1.305 0.859 127.6 0.915 1.022 Film 353 175 2.00 ? 1.0 34.3 ?160.6 1.018 0.986 35.24 0.417 1.191 0.281 Film 354 175 2.25 ? 1.0 36.2 ?152.2 1.022 0.984 19.99 ?0.035 1.331 0.369 Film 355 180 2.0 ? 1.0 36.5 ?141.5 1.014 0.987 12.59 ?0.838 1.626 0.411 Film 356 180 2.25 ? 1.0 33.4 ?140.7 1.010 0.989 4.1 ?4.602 2.977 0.471 Film 357 180 2.50 ? 1.0 27.7 ?150.0 1.013 0.988 11.66 ?0.736 1.603 0.422 Film 358 185 2.0 ? 1.0 33.5 ?109.4 0.997 0.994 ?8.3 3.788 0.006 0.576 Film 359 185 2.25 ? 1.0 34.8 ?112.6 0.986 0.998 ?16.33 2.552 0.438 0.645 Film 360 185 2.50 ? 1.0 26.7 ?121.8 0.993 0.995 ?6.71 4.223 ?0.150 0.555

TABLE-US-00059 TABLE 59 Uniaxial Constrained Stretching of Film 76 Film ST d Re550 Re450/ Re650/ Rth550 Rth450/ Rth650/ ID (? C.) ratio (?m) nm Re550 Re550 nm Rth550 Rth550 Nz Film 76 71 0.7 1.222 0.901 125.7 0.874 1.036 Film 361 170 2.0 ? 1.0 47 ?91.45 1.011 0.988 26.2 0.804 1.064 0.213 Film 362 175 2.0 ? 1.0 40.8 ?146.9 1.015 0.987 9.6 ?1.707 1.909 0.434 Film 363 180 2.0 ? 1.0 32.6 ?114.2 1.001 0.992 ?6.9 4.374 ?0.226 0.560 Film 364 180 2.25 ? 1.0 36.5 ?122.5 1.000 0.993 ?15.45 2.653 0.399 0.626 Film 365 180 2.50 ? 1.0 29.5 ?133.5 1.003 0.991 ?9.6 3.491 0.097 0.572 Film 366 185 2.0 ? 1.0 33.3 ?84.33 0.971 1.004 ?28.74 1.878 0.677 0.841 Film 367 185 2.25 ? 1.0 36 ?88.18 0.960 1.008 ?36.3 1.741 0.721 0.912 Film 368 185 2.50 ? 1.0 29.9 ?94.03 0.967 1.006 ?28.45 1.858 0.680 0.803

TABLE-US-00060 TABLE 60 Uniaxial Constrained and Unconstrained and Biaxial Stretching of Film 77 Film ST d Re550 Re450/ Re550 Rth550 Rth450/ Rth650/ ID (? C.) ratio (?m) nm Re550 Re650/ nm Rth550 Rth550 Nz Film 77 35.8 0.5 1.250 0.881 70.88 0.816 1.055 Film 369 145 1.5 35.7 ?176.0 0.971 1.004 79.27 0.866 1.033 0.049 Film 370 145 1.75 31.8 ?197.0 0.971 1.003 85.15 0.884 1.025 0.068 Film 371 145 2 35.3 ?257.3 0.970 1.003 107.4 0.874 1.043 0.083 Film 372 145 2.2 29 ?234.7 0.968 1.005 97.45 0.920 1.009 0.085 Film 373 155 1.5 35.7 ?158.4 0.974 1.003 71.55 0.888 1.024 0.048 Film 374 155 2 31.4 ?219.0 0.987 0.997 93.36 0.933 1.010 0.074 Film 375 155 1.5 ? 1 19.8 ?48.7 0.973 1.003 32.18 0.694 1.108 ?0.161 Film 376 155 1.3 ? 1.3 21.6 ?2.2 1.053 0.970 31.65 0.600 1.153 ?13.94 Film 377 165 1.5 ? 1 23 ?53.2 0.979 1.000 26.53 0.579 1.148 1E?03 Film 378 165 1.75 ? 1 20.3 ?62.2 0.983 0.998 21.73 0.490 1.153 0.151

TABLE-US-00061 TABLE 61 Uniaxial Constrained and Unconstrained and Biaxial Stretching of Film 78 Film ST d Re550 Re450/ Re650/ Rth550 Rth450/ Rth650/ ID (? C.) ratio (?m) nm Re550 Re550 nm Rth550 Rth550 Nz Film 78 41.8 0.6 1.045 0.973 111.4 0.881 1.036 Film 379 145 1.5 35.1 ?202.6 0.990 0.996 97.5 0.922 1.011 0.019 Film 380 145 1.75 33.1 ?248.8 0.986 0.997 115.1 0.932 1.008 0.038 Film 381 145 2 34.2 ?304.1 0.989 0.997 137.3 0.957 0.998 0.049 Film 382 155 1.5 43.4 ?221.4 0.998 0.993 107.7 0.953 1.004 0.014 Film 383 155 2 34.5 ?278.8 1.003 0.992 125.0 0.977 0.993 0.052 Film 384 155 2.5 33.5 ?332.4 1.009 0.989 144.5 0.990 0.982 0.065 Film 385 155 1.5 ? 1 25.7 ?80.58 0.996 0.994 60.57 0.823 1.054 ?0.252 Film 386 155 1.3 ? 1.3 24 ?1.7 0.934 1.013 55.3 0.780 1.076 ?31.92 Film 387 165 1.5 ? 1 26.3 ?71.77 0.998 0.993 47.5 0.789 1.069 ?0.162 Film 388 165 1.75 ? 1 20.5 ?82.2 1.004 0.991 41.42 0.767 1.074 ?0.004

Example 14. Films of PI-PMMA/PTFS/PMMA Blend and the Stretching

[0081] As shown in Examples 12 and 13, when the PMMA/PI ratio was varied in the PI-PMMA block copolymer, the blending ratio with PTFS had to be adjusted to reach the desired properties. For example, PI-PMMA with a 1:2 weight ratio behaves very differently than PI-PMMA with a 1:4 weight ratio. It was also discovered that PMMA homo polymer could be added to form three-component blends with PI-PMMA and PTFS solutions of these blends that could be cast into clear films. The optical properties of films of these three component blends are listed in Table 62. Film 389 was prepared from PI-PMMA (Polymer 56, PI-PMMA 1:2.1 based on yield) with PMMA homo polymer and PTFS at a PI-PMMA/PMMA/PTFS weight ratio of 39.2/24.2/36.6.

TABLE-US-00062 TABLE 62 Uniaxial Constrained and Unconstrained Stretching of Film 389 Film ST d Re550 Re450/ Rth550 Rth450/ ID (? C.) Ratio (um) nm Re550 nm Rth550 Nz550 Film 389 40 64.6 0.86 Film 390 150 1.75 34.2 ?175.5 0.99 80.5 0.93 0.04 Film 391 155 2 36.3 ?212.8 1.00 97.2 0.97 0.04 Film 392 155 2.3 34.1 ?232.0 1.00 102.5 0.98 0.06 Film 393 155 2.5 35.7 ?253.2 1.00 109.1 0.99 0.07 Film 394 155 1.7 ? 1.0 23.4 ?71.8 1.00 46.6 0.83 ?0.15 Film 395 155 2.0 ? 1.0 21.5 ?89.0 1.00 53.8 0.83 ?0.10 Film 396 160 2 33.9 ?183.7 1.00 82.8 0.95 0.05 Film 397 160 2.5 31.1 ?213.8 1.00 99.5 0.99 0.03 Film 398 160 1.7 ? 1.0 24.3 ?65.1 1.00 40.0 0.78 ?0.11 Film 399 160 2 ? 1.0 21.4 ?77.5 1.00 33.3 0.78 0.07 Film 400 160 ~2.1 ? 1.0 27.2 ?38.6 1.01 28.4 0.71 ?0.24 Film 401 160 2.5 34.2 235.2 1.00 101.7 0.99 0.07

Example 15. Films of PI-PS and PI-PS/PS Blends

[0082] PI-PS formed compatible blends with PS that could be solution cast into clear RD C+ films (Table 63). Further stretching could lead to RD A?/B+ films. The birefringent contribution of PS is only 1/10 that of PTFS, but when thickness is not a significant concern, the low cost PS could be used.

TABLE-US-00063 TABLE 63 Films of PI-PS/PS blend PI-PS PI-PS/PS d Re.sup.450/ Re.sup.650/ Rth.sup.450/ Rth.sup.550/ Film ID ID weight ratio um Re.sup.550 Re.sup.550 Re.sup.550 Rth.sup.550 Rth.sup.550 Rth.sup.550 Film 402 Polymer 73 0/100 40 1.1 1.06 0.97 21.9 1.06 0.97 Film 403 Polymer 73 10/90 40 1.0 1.06 0.97 17.1 1.04 0.98 Film 404 Polymer 73 20/80 40 1.2 1.10 0.94 11.4 1.02 0.95 Film 405 Polymer 73 30/70 40 1.3 1.08 0.96 6.9 0.87 1.05 Film 406 Polymer 73 100/0 40 1.9 1.13 0.95 ?47.0 1.19 0.93

[0083] While particular examples above have been illustrated and described herein, it should be understood that various other changes and modifications may be made without departing from the spirit and scope of the claimed subject matter. Moreover, although various aspects of the claimed subject matter have been described herein, such aspects need not be utilized in combination. Accordingly, it will be appreciated that the above described examples should not be construed to narrow the scope or spirit of the disclosure in any way. Other examples, embodiments, aspects, and advantages will become apparent from the following detailed description taken in conjunction with the accompanying drawings. It is therefore intended that the appended claims cover all such changes and modifications that are within the scope of the claimed subject matter.

OPTICAL COMPENSATION FILMS BASED ON COMBINATIONS OF NEGATIVE BIREFRIGENT AND POSITIVE BIREFRIGENT COMPONENTS

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Inventors

Cpc classification

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C08J2453/00

CHEMISTRY; METALLURGY

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C08J2325/06

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C08L87/005

CHEMISTRY; METALLURGY

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C08J5/18

CHEMISTRY; METALLURGY

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C08L2203/16

CHEMISTRY; METALLURGY

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G02B5/3083

PHYSICS

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C08J2325/18

CHEMISTRY; METALLURGY

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C08J2425/06

CHEMISTRY; METALLURGY

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C08J2425/18

CHEMISTRY; METALLURGY

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C08J2387/00

CHEMISTRY; METALLURGY

International classification

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G02B5/30

PHYSICS

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C08J5/18

CHEMISTRY; METALLURGY

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C08L87/00

CHEMISTRY; METALLURGY

Abstract

Claims

Description