Method of selectively controlling nucleation for crystalline compound formation by irradiating a precursor with a pulsed energy source
11505877 · 2022-11-22
Assignee
Inventors
Cpc classification
International classification
C30B30/00
CHEMISTRY; METALLURGY
Abstract
A method of selectively controlling materials structure in solution based chemical synthesis and deposition of materials by controlling input energy from pulsed energy source includes determining solution conditions, searching and/or determining energy barrier(s) of a desired materials structure formation, applying precursor solution with selected solution condition onto a substrate, and applying determined input energy from a pulsed energy source with a selected condition to the substrate, thereby nucleating and growing the crystal.
Claims
1. A method of selectively controlling nucleation for crystalline compound formation by induced chemical synthesis and deposition, comprising: selecting a substrate suitable for growth of a crystal structure and a precursor solution containing a precursor reactants of zinc chloride and hexamethylene tetramine (HMTA) having a concentration, applying the selected precursor solution having a selected condition onto the substrate; and changing the precursor concentration to selectively choose size of nucleating material seeds, wherein the concentration is inversely proportional to initial crystal size of the nucleated material seed, wherein the concentration varies between 6.16 to 27.10 mM resulting in diameter of the initial crystal size varies between 1150 nm to 280 nm; irradiating the substrate through the precursor by a pulsed laser with a predetermined input energy, thereby nucleating material seeds on the substrate and controlling nanocrystals' features of orientation, wherein applying the determined input energy from pulsed laser nucleates the crystal.
2. The method of claim 1, wherein the crystalline compound is chemically synthesized in solution.
3. The method of claim 1, wherein the selected condition of precursor solution includes precursor components, precursor concentration and pH value.
4. The method of claim 1, wherein the substrate is one of rigid, flexible, or combination thereof adapted to absorb the predetermined input energy.
5. The method of claim 1, wherein the pulsed laser is defined as laser conditions including pulse energy, laser irradiation area, repetition rate, pulse width, total time of pulsations, and combinations thereof.
6. The method of claim 5, wherein the predetermined input energy of laser is determined by increasing the laser condition in a stepped manner until precipitation occurs.
7. The method of claim 1, wherein the content ratio of the precursor reactants zinc chloride and HMTA is 1:1.
8. The method of claim 1, wherein the substrate is silicon.
Description
BRIEF DESCRIPTION OF DRAWINGS
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DETAILED DESCRIPTION
(13) For the purposes of promoting an understanding of the principles of the present disclosure, reference will now be made to the embodiments illustrated in the drawings, and specific language will be used to describe the same. It will nevertheless be understood that no limitation of the scope of this disclosure is thereby intended.
(14) In the present disclosure, the term “about” can allow for a degree of variability in a value or range, for example, within 10%, within 5%, or within 1% of a stated value or of a stated limit of a range.
(15) In the present disclosure, the term “substantially” can allow for a degree of variability in a value or range, for example, within 90%, within 95%, or within 99% of a stated value or of a stated limit of a range.
(16) A novel approach for nano-scaled crystal synthesis including crystal nucleation as well as crystal growth is presented that does not suffer from the aforementioned shortcomings of the prior art. The present disclosure presented use of a controllable pulsed energy source such as a pulsed laser that controls material deposition in a precise manner. The present disclosure covers the ideas of using pulsed laser as a tool for controlled delivery of specific energy density per unity of area required for achieving needed nucleation conditions and growth conditions respectively. Continuous wave laser may be used with added controls. The present disclosure presented use pulsed laser that controls materials produced by on-site synthesis and deposition based on four prongs. Firstly, pulsed laser provides input energy with high precision, therefore, the driving force of crystal nucleation and growth is controlled in precise quantitative manners. Secondly, since pulsed laser inputs large dose of energy during a short period of irradiation time; accordingly, thermodynamic and kinetic states of deposition alter, which generate novel reaction pathways. Thirdly, pulsed-laser is a precise tool with high resolution that provide spatial and temporal control. Thereby, pulsed-laser provides selective change in the deposition condition in a localized region. Lastly, the controlled method by pulsed laser for nanomaterials deposition is through thermodynamic and kinetic pathways, which can realize both catalytic and catalyst-free processes during nucleation and crystal growth.
(17) To these ends, the present disclosure provides a controlled synthesis method to control materials structure by pulsed laser induced chemical deposition. In the synthesis, pulsed laser conditions are selected to adjust input energy then to control both initial crystal seeds in the nucleation process and crystal growth followed the nucleation process. The method of the present disclosure provides controlling materials structure which include providing a solution in a specific pH value and comprising precursor reactants which could be below saturated condition. The present disclosure also teaches how to select different laser conditions to achieve an input energy for the desired materials structure. The materials structure includes crystal size in three dimensions, density, crystalline structure, crystal orientation, and the shape of the crystal product. The present disclosure also teaches how to control synthesis process in the initial nucleation step and the crystal growth thereafter. In nucleation step, adjusting input energy of pulsed laser to overcome the lowest energy barriers for nucleation leads to heterogenous nucleation with uniform crystal orientation. In crystal growth steps, adjusting input energy of pulsed laser tunes the crystal growth kinetics (growth rate) and leads to different material morphologies. A particular input energy of pulsed laser is determined by a laser condition of a combination of laser fluence, irradiation area, repetition rate, width (duration) of a pulse, and total time (or total number of pulses).
(18) Therefore, as discussed above, pulsed laser is used to selectively overcome the energy barriers for chemical deposition to initiate reaction for a certain morphology in a selected region. The method of control by pulsed laser applies to both the initial crystal formation in nucleation process and in crystal growth followed.
(19) In classical nucleation theory, when a crystal is initially formed it could be regarded as a droplet. The Gibbs free energy ΔG of a droplet (assuming in spherical shape) is described as in following: where ΔG.sub.ν is the bulk energy,
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(22) The Gibbs free energy change with crystal radius is shown in
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Correspondingly, the value of r* at the energy barrier is the critical size of nucleation, after which addition of new molecules to nuclei decreases the free energy, so nucleation is more probable.
(24) Effects of precursor concentration, C, and nuclei morphologies with different surface energy γ, on the Gibbs free energy for nucleation is showing in
(25) By changing the precursor concentration, the critical size for nucleation can be selectively chosen. Specifically, higher concentration will lead to smaller initial crystal size, and lower concentration will lead to larger initial crystal size. Also, as shown in
(26) Furthermore, different crystal planes have different surface energy, as initial crystals have different levels of total surface energy and energy barriers. The energy diagram is shown in
(27) To better illustrate the methodology of the present disclosure, ZnO crystal formation is used as an example. A precursor solution was applied on silicon substrate by immersing substrate in precursor solution, which contains precursor reactants of zinc chloride to hexamethylene tetramine (HMTA) in content ratio of 1:1. Stepped increasing laser input energy by increasing laser power density until the deposition spot could be observed, then the laser input energy is regarded as just overcoming the lowest energy barrier for nucleation. Initial crystals with different materials structure is shown in
(28) Having discussed size of nucleation, orientation of the nucleation is now discussed. Orientation of initial crystals are controlled in nucleation step by laser induced chemical deposition, without the need of pre-deposition of seed layer or specific crystal structure of substrates. Orientation of initial crystals determine the final nanomaterials orientation as the crystals are grown. According to the classical nucleation theory, the energy barriers ΔG.sub.hom of homogenous nucleation is described by
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The energy barriers for heterogeneous nucleation are
ΔG.sub.het=ΔG.sub.homf(θ)
which is smaller than homogeneous nucleation due to the structure factor f(θ). f(θ) is provided as follows:
f(θ)=(2−3 cos θ+cos.sup.3θ)/4
where θ is the constant angle between nuclei and substrate, as shown in
(30) Referring to
(31) With reference back to
(32) Once the initial crystal is formed, the crystal is then selectively grown under these conditions. According to the present disclosure, using a pulsed-laser methodology, crystal morphology is controlled in a more precise manner. Actual reduction to practice results showed that a specific crystal structure occurs only if a certain input energy level was reached by laser. By selectively setting the laser power, the crystal will grow with a desired morphology. Using ZnO crystals as example, when the input power is below about 9.55 kW/cm.sup.2, all crystal surfaces were activated in a very low rate, and the crystal would undergo a homogenous growth and result in a spherical structure. Reference is made to
(33) As shown in the reaction in corresponding panels in
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has different values along different planes. Surface energy of prismatic planes {10
(35) According to the present disclosure, nanomaterials could be deposited in a high rate controlled by pulsed laser. Using ZnO crystals as examples, (0001) planes (top surfaces) have higher growth rate than {0110} planes (cylindrical surfaces), and higher power-density results in higher growth rate. Referring to
(36) According to one embodiment of the present disclosure, a route for pulsed laser synthesis of free-standing ZnO nanorod crystals, as shown in
(37) An exemplary controlled synthesis comprise steps of:
(38) (1) Immersing a substrate in precursor solution containing precursor reactants; (2) Determining the laser input energy by stepped increasing laser power density, when the deposition materials could be detected or observed, set the condition as laser input energy which just overcoming lowest Gibbs free energy barriers for nucleation; (3) Irradiate substrate with laser beam for a total irradiation time with determined laser input energy to deposit initial crystals (seeds); (4) Immersing the substrate in precursor solution with a different condition; (5) Determining the laser input energy by stepped increasing laser power density: when the color of nucleated crystals get darker than original crystals (crystal size is detected larger), set the condition as lower bound for input energy; when the net deposition area is to become larger than original nucleated crystal seeds area (additional nucleation start to occur outside of existing crystals), set the condition as upper bound condition for crystal growth; (6) Irradiate initial crystals on substrate for a total irradiation time based on desired crystal size, with determined laser input energy between lower and upper bound to grow following crystals.
(39) Specific conditions in previous steps described above, for the case of ZnO presented, the precursor reactants are zinc chloride to hexamethylene tetramine (HMTA) (all chemicals from Sigma-Aldrich), concentration is about 15 mmol in step (1), laser power density is determined and applied as 19.1 kW/cm.sup.2 in step (2) and (3). In step (3), the total irradiation time is 30 s. In step (4), the precursor reactants are the same with step (1) and precursor concentration is changed to about 4 mmol. The minimum power density is determined as 9.55 kW/cm.sup.2, maximum power density is 31.84 kW/cm.sup.2. The laser power density applied in step (6) is at about 25.5 kW/cm.sup.2, the total irradiation time is 2 min. After growth, the substrate was rinsed with DI water and dry.
(40) Those having ordinary skill in the art will recognize that numerous modifications can be made to the specific implementations described above. The implementations should not be subjected to the particular limitations described. Other implementations are possible.
(41) For example, the present method can be modified to precisely produce all materials that can be chemically synthesized, which must follow the thermodynamics and kinetics of chemistry where Gibbs Energy Barriers are key to determine the structures and morphology of a synthesized material. The proposed method can also be applied in a precursor solution without a substrate. Various pulsed laser conditions can be used to search feasible conditions for satisfying the Gibbs energy condition without knowing beforehand the values of the respective Gibbs Energy Barriers. When a particular structure and morphology are identified after using a laser condition, the condition is shown to be a feasible condition that can satisfy the respective Gibbs condition. A laser condition is a combination of laser fluence, irradiation area, repetition rate, width (duration) of a pulse, and total time (or the time for total number of pulses) for applying the laser condition. Thus, numerous laser conditions can be selected for achieving an intended synthesis for a structure/morphology. The substrate can also be modified to include many types of substrates including flexible substrates. The precursor condition includes precursor components, precursor concentration and pH value.