MICROELECTROMECHANICAL COMPONENT

Abstract

A microelectromechanical component including, vertically at a distance from one another, a substrate device, a first, a second, and a third functional layer, a vertical stop being formed between the second and third functional layer, the vertical stop having a stop area on a surface of the second functional layer facing the third functional layer, wherein the second functional layer is connected to the first functional layer in a connecting area allocated to the stop area.

Claims

1. A microelectromechanical component, comprising: vertically at a distance from one another, a substrate device, a first functional layer, a second functional layer, and a third functional layer, a vertical stop being formed between the second functional layer and third functional layer, the vertical stop having a stop area on a surface of the second functional layer facing the third functional layer; wherein the second functional layer is connected to the first functional layer in a connecting area allocated to the stop area.

2. The microelectromechanical component as recited in claim 1, wherein the stop area and the connecting area are at a distance from one another only vertically.

3. The microelectromechanical component as recited in claim 1, wherein the third functional layer has a nub in an area situated opposite the stop area.

4. The microelectromechanical component as recited in claim 1, wherein the second functional layer has a frame in the connecting area.

5. The microelectromechanical component as recited in claim 1, wherein the first functional layer and the second functional layer are connected to one another via an oxide layer situated between the first functional layer and second functional layer in the connecting area.

6. The microelectromechanical component as recited in claim 1, wherein the second functional layer has a nub in the stop area.

7. The microelectromechanical component as recited in claim 1, wherein at least one of the second functional layer and the third functional layer are movable relative to the substrate device.

8. The microelectromechanical component as recited in claim 1, wherein the microelectromechanical component has one of an acceleration sensor or a rotational rate sensor.

9. The microelectromechanical component as recited in claim 1, wherein one of: (i) a fourth functional layer, or (ii) the fourth functional layer and a fifth functional layer, is situated above the third functional layer.

10. The microelectromechanical component as recited in claim 9, wherein a sacrificial layer is situated at least one of: (i) between the third functional layer and the fourth functional layer, and (ii) between the fourth functional layer and fifth functional layer.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

[0014] FIG. 1 shows a top view of a vertical stop of a microelectromechanical component according to a specific embodiment of the present invention, in a schematic view.

[0015] FIG. 2 shows a cross-section of a vertical stop of a microelectromechanical component according to a specific embodiment of the present invention, in a schematic view.

DETAILED DESCRIPTION OF EXAMPLE EMBODIMENTS

[0016] In the various Figures, identical parts are always provided with the same reference characters, and are therefore named or mentioned only once, as a rule.

[0017] FIGS. 1 and 2 show a top view and a cross-section of a vertical stop 6 of a microelectromechanical component 1 according to a specific embodiment of the present invention, in a schematic view. In the area of the stop, microelectromechanical component 1, for example an inertial sensor, has a first, second, and third functional layer 3, 4, 5. Here, the first, second, and third functional layer 3, 4, 5 are vertically at a distance from one another, and are essentially situated one over the other on a substrate device 2, also called a substrate wafer. The first, second, and/or third functional layer can have a structuring. The first functional layer 3 is fixedly connected to substrate device 2. In particular, a first oxide layer 12 is deposited on substrate device 2. First functional layer 3 is processed on first oxide layer 12. Here, first functional layer 3 is fixedly connected to substrate device 2 via first oxide layer 12. A second oxide 13 is deposited on first functional layer 3. Over this, second and third functional layers 4, 5 are processed, with a vertical spacing from one another. Second and third functional layers 4, 5 have movable structures. The movable structures are coupled to one another and/or to substrate device 2, for example by springs. In particular, third functional layer 5 is movable in the vertical direction. In order to prevent damage to microelectromechanical component 1, a vertical stop 6 is realized between second and third functional layers 4, 5.

[0018] Vertical stop 6 limits the movement of third functional layer 5 upward and downward, and defines a contact point below third functional layer 5. In the limited frame of movement defined by this contact point, no damage to microelectromechanical component 1 takes place. The vertical stop has on the one hand a stop area 7 on the upper side, i.e., on a surface facing third functional layer 5, of second functional layer 4. Stop area 7 has a circumferential sink 14. Preferably, sink 14 encloses a surface whose dimensions correspond to the base surface of nub 9 of third functional layer 5. The surface enclosed by sink 14 forms a nub 10 on the upper side of second functional layer 4. In particular, the topography of the upper side of second functional layer 4 is determined by the structure of oxide layer 13 situated below second functional layer 4. Preferably, second oxide layer 13 is open in the area of vertical stop 6, so that an oxide via results in the shape of a frame. During the deposition of second functional layer 4, the oxide via is filled, and the oxide 13 situated inside frame 11 is enclosed. In this way, the topography of the upper side of second functional layer 4 is determined. In particular, the topography corresponds to the upper side of the frame structure of oxide layer 13. The region of second functional layer 4 enclosed by frame 11 is in this way connected fixedly to first functional layer 3. In this way, on second functional layer 4 there results a fixed stop area 7 for third functional layer 5. The actual function of second functional layer 4 is interrupted only by stop 6, and the mobility of second functional layer 4 is limited only in the narrowly limited area of stop 6.

[0019] Vertical stop 6 has a nub 9 processed on the lower side, i.e., on a surface facing second functional layer 4, of third functional layer 5. Nub 9 is preferably realized having a rectangular base surface. Here, the thickness of nub 9 determines the spacing distance of vertical stop 6. Nub 9 preferably results through processing and structuring of one or more oxide layers on the lower side of third functional layer 5 deposited above it. In this way, the spacing distance can advantageously be set in accordance with the requirements and dimensions of third functional layer 5. In particular, the spacing distance is independent of the geometries and the relative situation of first and second functional layers 4, 5.

[0020] Through the forming of stop 6 between second and third functional layers 4, 5, spacing distances can be realized as a function of the selected thicknesses of the oxide layers situated between second and third functional layers 4, 5. In this way, a vertical stop 6 is advantageously provided for a microelectromechanical component 1 having a plurality of movable functional layers. Vertical stop 6 protects, in particular, the third functional layer against vertical overload accelerations downward. In this way, damage to microelectromechanical component 1 due to overload accelerations is reduced. In this way, a microelectromechanical component 1 having increased robustness is advantageously provided.