Traveling Wave Kinetic Inductance Parametric Amplifier
20240305256 ยท 2024-09-12
Inventors
Cpc classification
H03F7/02
ELECTRICITY
International classification
Abstract
A traveling wave kinetic inductance parametric amplifier is presented. The amplifier includes a microstrip structure defining a parallel plate capacitor element formed by first and second electrically conductive layers spaced by a dielectric spacer layer. The first electrically conductive layer is made of superconducting material composition having desirably high kinetic inductance and being configured as a nanoscale thickness strip.
Claims
1. A traveling wave kinetic inductance parametric amplifier comprising: a microstrip structure defining a parallel plate capacitor element formed by first and second electrically conductive layers spaced by a dielectric spacer layer, the first electrically conductive layer being made of superconducting material composition having desirably high kinetic inductance and being configured as a nanoscale thickness strip.
2. The amplifier according to claim 1, wherein said capacitor element is configured with desirably high capacitance per unit length of said strip, thereby providing impedance of said microstrip structure matching 50 Ohm.
3. The amplifier according to claim 2, wherein said nanoscale thickness strip has kinetic inductance per unit length of the strip of at least 50 ?H/m and said capacitor element is configured with capacitance per unit length of at least 20 nF/m, thereby providing impedance of said microstrip structure matching 50 Ohm.
4. The amplifier according to claim 1, wherein said microstrip is configured and operable as an electrical transmission line having a phase velocity substantially not exceeding 0.005c, c being speed of light in vacuum.
5. The amplifier according to claim 1, wherein said strip of the superconducting material composition is a few centimeters long.
6. The amplifier according to claim 5, wherein said strip of the superconducting material composition has a length substantially not exceeding 10 cm.
7. The amplifier according to claim 1, wherein said nanoscale thickness strip has a pattern of width variation along the strip.
8. The amplifier according to claim 1, wherein said superconducting material composition comprises amorphous tungsten-silicide (WSi).
9. The amplifier according to claim 1, wherein said dielectric spacer layer is made of amorphous silicon.
10. The amplifier according to claim 1, wherein said second electrically conductive layer is made of aluminum.
11. The amplifier according to claim 1, wherein said dielectric spacer layer is thicker than a thickness of said strip of the superconductive material composition.
12. The amplifier according to claim 1, wherein said strip of the superconductive material composition has a width-thickness aspect ratio of an order of 1000.
13. The amplifier according to claim 12, wherein said strip of the superconductive material composition has a thickness of a few nanometers and has an average width of several microns along the strip with said pattern of strip width variation.
14. The amplifier according to claim 1, wherein said microstrip structure is configured and operable with a gain of at least 10 dB, thereby enabling to amplify essentially weak input data signals through non-linear interaction with a pump signal, said non-linear interaction being either one of three-wave mixing mode and four-wave mixing mode.
15. The amplifier according to claim 1, wherein said microstrip structure is configured and operable with a dynamic range of amplification of at least four orders of magnitude.
16. The amplifier according to claim 1, wherein said microstrip structure is configured and operable with an amplification gain bandwidth of 1 GHz.
17. A traveling wave kinetic inductance parametric amplifier comprising: a microstrip structure defining a capacitor element formed by first and second electrically conductive layers spaced by a dielectric spacer layer, the first electrically conductive layer being made of superconducting material composition having desirably high kinetic inductance and is configured as a nanoscale thickness strip having a pattern of strip width variation, said capacitor element being configured with desirably high capacitance per unit length of said strip providing impedance of said microstrip structure matching 50 Ohm.
18. A traveling wave kinetic inductance parametric amplifier comprising: a microstrip structure defining a capacitor element formed by first and second electrically conductive layers spaced by a dielectric spacer layer, the first electrically conductive layer being made of superconducting material composition having desirably high kinetic inductance and said capacitor element being configured with desirably high capacitance per unit length of said strip, thereby providing impedance of said microstrip structure matching 50 Ohm at a length of said strip substantially not exceeding 10 cm.
19. A traveling wave kinetic inductance parametric amplifier comprising: a microstrip structure defining a parallel plate capacitor element formed by first and second electrically conductive layers spaced by a dielectric spacer layer, the first electrically conductive layer being made of superconducting material composition of WSi having desirably high kinetic inductance and being configured as a nanoscale thickness strip, and said dielectric spacer layer being a silicon layer.
Description
BRIEF DESCRIPTION OF THE DRAWINGS
[0033] The patent or application file contains at least one drawing executed in color. Copies of this patent or patent application publication with color drawings will be provided by the Office upon request and payment of the necessary fee.
[0034] In order to better understand the subject matter that is disclosed herein and to exemplify how it may be carried out in practice, embodiments will now be described, by way of non-limiting example only, with reference to the accompanying drawings, in which:
[0035]
[0036]
[0037]
[0038]
[0039]
[0040]
[0041]
[0042]
[0043]
[0044]
DETAILED DESCRIPTION OF EMBODIMENTS
[0045] Referring to
[0046]
[0047] In some non-limiting examples, the layer 12A is a long trace (generally, a few centimeters length, e.g. 10-12 cm) of highly inductive tungsten-silicide (WSi). This strip 12A of the superconductive material composition preferably has a high width-thickness aspect ratio, of an order of 1000, e.g., has a thickness of a few nanometers and has a width (average width) of several microns along the strip.
[0048] For example, in the experiments conducted by the inventors, the strip 12A of 11.6 cm length with a cross section of 2 ?m?5 nm was used, as well as the strips of some other dimensions. Such a strip was created by DC-magnetron sputtering of WSi target (55%/45%) directly onto the high-resistivity Si substrate 14.
[0049] The nanometric layer of e.g. WSi, whose kinetic inductance is sufficiently large (about 50 ?H/m or higher), allows to neglect the magnetic inductance. This layer 12A is patterned by any known suitable technique (e.g. optical lithography) to form a desired shape of the strip, e.g. zig-zag like shape in order to even more decrease the dimensions of the entire structure.
[0050] As also shown in
[0051] It should be understood that all the layers of the microstrip structure 10 may, if needed, be appropriately patterned using any known suitable technique, and defined by selective wet-etch to form large pads at both ends of the trace 12 and periodic perturbations 16.
[0052] It should also be noted that the use of strip width variations, e.g. periodic perturbations, provides for variation of its impedance to thereby create stop-bands in the spectrum of a transmission line, which also serves to restrain shock wave generation. This is particularly useful during wave-mixing, in that it allows the control of phase matching of the wave numbers, k.sub.s, k.sub.p, and k.sub.i, corresponding to the three current tones, the signal, the pump, and the idler.
[0053] The material for dielectric layer spacer 12C is chosen according to the following two properties: its loss tangent tan? (to minimize dielectric loss) and permittivity ?.sub.r which, together with the thickness of this layer is selected in order to provide desirably high capacitance (capacitance per unit length, C.sub.l,), keeping in mind the desirably high kinetic inductance of superconducting layer 12A.
[0054] For example, the dielectric spacer layer may be evaporated amorphous Si, as its tan? is about 5?10.sup.?4, while ?.sub.r is close to well-known values of ?.sub.r.sup.Si (depends weakly on morphology). The amorphous Si film can be made a few nanometers thicker than the superconducting layer 12A (e.g. WSi) to ensure step coverage (i.e. physical contact between film domains above the WSi and next to it), and engineered to match 50?.
[0055] It should be noted that in this lithographic step Si is removed only from the WSi launchers 18 where metal in the next step enhances galvanic contact between wire-bonds and WSi pads.
[0056] The second electrically conductive layer (metal) 12B may be evaporated Al, which serves as the ground layer. This step of the structure fabrication is the last lithography step during which the launch pads 18 are formed.
[0057] It should be understood that using a parallel (top) ground plate 12B covering most of the structure (chip) ensures a common global ground, as opposed to the separated ground electrodes of co-planar wave guides, cut by the trace. Also, such ground plate protects the trace 12A from scratches during the subsequent handling and packaging.
[0058] It is to be noted that the TWPA device of the present invention provides capacitance C, resembling that of a parallel plate capacitor with the thickness of a few nanometers, and can be engineered rather easily to 50?. This is an essential and advantageous difference from known in the art implementations of kinetic inductance TWPAs which are typically coplanar waveguides with micronic gaps to the surrounding ground plates, presenting a challenge to match their impedance Z=(L.sub.lC.sub.l).sup.1/2 (where L.sub.l and C.sub.l are the inductance and capacitance per unit length) to the 50? of conventional high-bandwidth electronics.
[0059] Generally, boosted inductance L.sub.l increases the impedance Z by up to an order of magnitude causing ripples in the transmission spectrum [6]. Various attempts to cope with this issue include adiabatic tapers at the beginning and end of the amplifier, shunting the transmission line by fractal structures [4], and by multiple resonators to lower the impedance Z.
[0060] It should be noted that a significant outcome of increasing the capacitance per unit length C.sub.l is a drop in the phase velocity ?.sub.ph=1/((L.sub.lC.sub.l).sup.1/2) enabling to shorten the amplifier by an order of magnitude, while still obtaining appreciable amplification.
[0061] In the experimental TWPA device fabricated by the inventors, WSi was used as superconducting layer 12A having kinetic inductance per unit length, L.sub.k, of about 50 ?H/m. In order to properly measure this parameter, the inventors fabricated, in a separate experiment, a superconducting coplanar wave-guide resonators with relevant cross section (i.e. which was selected to be used in the microstrip, i.e. 2 ?m?5 nm). For the kinetic inductance per unit length of 50 ?H/m, a capacitance per unit length, C.sub.l, of about 20 nF m is to be used to match the TWPA's impedance to 50?. These high values of C.sub.l and L.sub.l predict a phase velocity, ?.sub.ph, of ?0.004c, where c is the speed of light in vacuum.
[0062] It should be understood that the microstrip structure of the invention provides for obtaining such reduced phase velocity resulting in the effective length of the superconducting strip of a 11.6 cm, which corresponds to 8.7 m of an equivalent coplanar waveguide having much higher phase velocity, i.e. ?.sub.ph=0.3c.
[0063] The maximum achievable parametric gain G is linked to the nonlinearity of the transmission line:
G?exp(??)/4
where ??=(?/2)(I/I.sub.x).sup.2 is the additional phase shift acquired by the signal in response to a current I through the transmission line due to the non-linearity (I. is the nonlinearity parameter).
[0064] The nonlinear phase shift ?? is proportional to the electrical length (total input-output phase shift acquired by small signal):
where z.sub.tot is the total physical length of the line, f.sub.s is the microwave frequency and ?.sub.ph is the phase velocity. In typical coplanar waveguides, due to the higher phase velocity ?.sub.ph, lines of several meters long are required to achieve 10 dB average gain.
[0065] Even through a short trace (e.g. 11.6 cm) used in the microstrip structure of the present invention the transmitted tones can accumulate a significant nonlinear phase sufficient for wave-mixing, and the TWPA can then be much shorter than previous implementations [3].
[0066] Moreover, simulations performed by the inventors have shown that lower phase velocity ?.sub.ph enhances the amplification (while narrowing the operational bandwidth).
[0067] The nonlinear inductance is scaled by a current I. (comparable to the critical current of the trace) by [3]:
wherein L.sub.0 is the geometrical inductance.
[0068] The power dependence of kinetic inductance L.sub.kin leads to a power-dependent wave equation, which will be solved below, in connection with the amplification process within the structure, e.g. three-wave or four-wave mixing. In the description below, the four-wave technique is demonstrated, but this does not limit the principles of the present invention. method used in the present invention.
[0069] Under the undepleted pump assumption, |I.sub.p|>>|I.sub.s|, |I.sub.i|, the analytical solution for pump signal I.sub.p is [3]:
where z is the wave propagation axis (i.e. length of the device); k.sub.p=f.sub.p/?.sub.ph is the pump's wave number; and ?=|I.sub.p(0).sup.2/2|I.sub.*|.sup.2, i.e., in addition to the ordinary linear phase (inner brackets in exponent of Eq. 2), the current also accumulates a nonlinear phase shift, k.sub.pz?.
[0070] The established formalism of nonlinear optics will be applied in the following to simulate the performance of the kinetic inductance TWPA of the current invention. The propagating current is described as a linear combination of pump, signal, and idler tones (I.sub.p, I.sub.s, and I.sub.i):
where other wave-mixing processes [9] than four wave-mixing with 2f.sub.p=f.sub.s+f.sub.i are ignored. The ansatz of Eq (3) is now used to solve the nonlinear wave equation:
[0071] The nonlinearity of phase velocity ?.sub.ph stems from the power-dependent inductance (see Eq (1)), and leads to the coupled equations, which under the undepleted pump assumption (I.sub.p>>I.sub.s, I.sub.i) take the form
[0072] Here ?k=2k.sub.p?k.sub.s?k.sub.i is the mismatch between the wave numbers of the above three current tones, and the kinetic inductance ratio is neglected, since it is close to unity for WSi. The kinetic inductance ratio ? is the kinetic inductance divided by the total inductance:
where L.sub.kin is the kinetic inductance and L.sub.mag is the magnetic inductance. Since the kinetic inductance dominates the total inductance L.sub.tot, the kinetic inductance ratio ? is close to unity. Therefore, in equations 5(a)-5(c) above, the kinetic inductance ratio ? was omitted and does not multiply I.sub.*.sup.2.
[0073] Loss due to the dielectric material, expressed through the self-loss coefficient, is included:
where ?.sub.Rabi is the Rabi frequency of the two-level-systems in the standard two-level-system (TLS) model [7], tan ?.sub.0 is the loss tangent (without saturation effects), and T.sub.1 and T.sub.2 are the decay and dephasing times [7]. Specifically, ?.sub.Rabi=2d.Math.E/?, where E is the electric field, d is the dipole moment (in the simulations reported here, d=1 Db). For both T.sub.1 and T.sub.2 the value 100 ns is used.
[0074] In the TLS model, losses are due to absorption of energy by TLSs. At high pump powers the TLSs become saturated, and the energy absorption subsequently is decreased. The square-root in the denominator of Eq. (6) accounts for absorption of a pump at f.sub.p not only by TLSs at the same frequency, but also those slightly detuned.
[0075] When turning to two-tone measurements (with a strong pump at f.sub.p and a weaker signal at f.sub.s?f.sub.p), the inventors have found that saturation effects are only caused by the pump, and that the absorption of the signal tone is linear. The signal loss is thus a function of the probability that TLSs at f.sub.s are excited by the signal itself rather than by the pump. This probability is approximated by means of the saturation parameter of TLSs at f.sub.s, when the pump is at f.sub.p:
where ?.sub.f=f.sub.p?f.sub.TLS (in this case f.sub.TLS=f.sub.s), and ?.sub.Rabi is the Rabi frequency of the pump.
[0076] The excited population Pee of the TLSs due to the pump is subsequently
[0077] Thus, a pump-dependent decay constant is written both for the signal and for the idler as:
With
[0078]
being the linear decay constant, referring to the linear loss of the signal (idler) only, as if no pump were present.
[0079] The analytic solution for the pump (Eq. 5(a)) is:
as shown in
[0080] In the following, the theoretical simulations will be confirmed by experimental measurement with the TWPA of the present invention. All experiments were performed at temperature 20 mK.
[0081] Referring to
[0082] Prior to amplification measurements, the performance of the device 10 of the present invention was demonstrated with linear and non-linear single-tone characterization. Initially, phase velocity ?.sub.ph was estimated by broadcasting a pulse through the TWPA 10, and in a different measurement, through a parallel control channel. The delay in arrival (not shown) was compared, and a phase velocity, ?.sub.ph, that was thus found, appeared to be consistent with the theoretical expectation. In a separate measurement the critical current I.sub.c of the WSi trace was determined to be about 0.06 mA.
[0083] Reference is now made to
[0084]
[0085]
[0086] In the next, two-tone experiments using TWPA device 10 of the present invention, where wave-mixing between a low-powered signal at frequency f.sub.s and a high-powered pump at f.sub.p amplifies the former and produces an idler tone at f will be described. By initially changing f.sub.p and measuring the average amplification of the signal over a range f.sub.p?1 GHz, f.sub.p=4.95 GHz was chosen for subsequent experiments.
[0087] In this connection, reference is made to
[0088] The idler tone emerging at f.sub.i=2f.sub.p?f.sub.s is measured as f.sub.p and is kept constant at various powers, and the signal power is kept constant for changing f.sub.s.
[0089]
where I.sub.s.sup.pump is the measured output current at f.sub.s with the pump, and I.sub.s.sup.0 is the measured output current at f.sub.s without the pump.
[0090]
[0091] These matrices are chosen instead of the more commonly used signal gain G.sub.s=|I.sup.out|.sup.2/|I.sup.in|.sup.2 as they emphasize the nonlinearity of the TWPA and the wave-mixing in it, respectively. The strong idler (
[0092] Theoretical estimates of the amplification were performed by initial simulation Eq (5a) to find the nonlinear transmission spectrum (insert in
[0093] As mentioned above, simulations performed by the inventors indicate that lower phase velocity ?.sub.ph enhances the amplification (while narrowing the operational bandwidth). Reference is made to
[0094]
[0095]
[0096] One of the essential properties of the amplifier device of the present invention is its large dynamic range. Reference is made to
[0097] Turning back to
where B is the bandwidth (91 Hz in all the measurements conducted by the inventors), and T.sub.eff is the effective noise temperature, related to the noise figure NF:
where T.sub.0 is the physical temperature. {tilde over (G)}.sub.s is the signal gain ratio (e.g., G.sub.s=20 dB.Math.{tilde over (G)}.sub.s=100).
[0098] Attenuators have input noise:
where {tilde over (G)}.sub.s still denotes the gain (0<{acute over (G)}.sub.s<1 for attenuators) analogue to the case of amplifiers.
[0099]
[0100] The signal gain ratio G.sub.s of the TWPA device is determined by comparing the measured output in the case of the highest transmission on
[0101] The SNR of the measurement line with the TWPA device can be read from
[0102] Assuming that the above estimation of the TWPA's noise temperature is conservative, it is evident that there is a possibility of reaching the quantum noise limit with the TWPA device of the present invention by moderate improvement of the dielectric loss tangent and by increasing the nonlinearity of the used superconducting material (e.g. WSi), e.g., by different alloy concentration.
[0103] Although it is known in the art that travelling wave parametric amplifiers which exploit the non-linear kinetic inductance of a superconducting transmission line are promising candidates to deliver a high gain, a quantum limited noise performance over a wide bandwidth (several GHz) and a high dynamic range, their practical realization is hampered by fabrication defects, since typically ?1 m long transmission line is required to achieve substantial parametric gain. The inventors have shown that the TWPA device of the present invention can be fabricated using known technologies and is fully functional, and the inventors have succeeded amplifying signals repeatedly with four wave mixing with a short trace (less than 12 cm).
[0104]
[0105] Also, the inventors have shown that three wave mixing was implemented successfully with the device of the invention, as shown in
[0106] Thus, the present invention provides impedance-matched, microstrip based TWPA device, which derives its nonlinearity from superconducting material composition (e.g. WSi) having highly power-dependent kinetic inductance. The amplifier according to the current invention operable with a wide bandwidth, large dynamic range, and a sub-Kelvin noise temperature, can be advantageously useful with superconducting circuit readout protocols, especially with minor improvements lowering the dielectric loss. It should be understood that the device of the present invention can be used in a variety of applications, not limited to pure amplification. The extraordinarily slow phase velocity ?.sub.ph allows the integration of the TWPA device of the present invention or similar interferometric structures in superconducting quantum circuits, where the propagation bounds due to chip size.