Thin-film depositing apparatus
10081863 ยท 2018-09-25
Assignee
Inventors
Cpc classification
C23C14/04
CHEMISTRY; METALLURGY
C23C16/4583
CHEMISTRY; METALLURGY
C23C16/04
CHEMISTRY; METALLURGY
International classification
C23C14/04
CHEMISTRY; METALLURGY
C23C16/04
CHEMISTRY; METALLURGY
Abstract
A thin-film depositing apparatus including a mask, and a chucking unit for adhering the mask to a surface of a substrate, wherein the chucking unit includes a plurality of magnet units that contact another surface of the substrate by independently rising or falling by using their weight and thus are magnetically combined with the mask.
Claims
1. A thin-film depositing apparatus comprising: a mask formed with a deposition pattern, and a chucking unit for adhering the mask to a first surface of a substrate, the chucking unit comprising a frame and a plurality of magnetic units coupled to the frame, wherein each of the plurality of magnetic units comprises a ball bushing arranged at the frame and a magnetic bar arranged to be vertically movable by weight in the ball bushing, and the magnetic bar is configured to contact a second surface of the substrate opposite the first surface by independently and freely rising or falling by weight to magnetically combine with the mask, wherein the plurality of magnetic units comprise a first group of magnetic units and a second group of magnetic units, and are configured to magnetically pull the mask in a first direction toward the frame, wherein a body of each of the first group of magnetic units coupled to a center portion of the frame protrudes from the frame in a direction only toward the substrate, and a body of each of the second group of magnetic units coupled to sides of the frame protrudes from the frame in both directions toward the substrate and away from the substrate, and wherein, when each of the plurality of magnetic units is in an unextended position, each of the second group of magnetic units has a first protruded distance from a surface of the frame facing the mask and each of the first group of magnetic units has a second protruded distance greater than the first protruded distance from the surface of the frame facing the mask.
2. The thin-film deposition apparatus of claim 1, wherein each of the first group of magnetic units protrudes an equal distance from the surface of the frame facing the mask when each of the plurality of magnetic units are in the unextended position.
3. The thin-film depositing apparatus of claim 1, wherein the chucking unit further comprises a plurality of pressing units coupled to the frame, the plurality of pressing units configured to press the substrate in a second direction opposite to the first direction.
4. The thin-film depositing apparatus of claim 3, wherein each of the pressing units has a housing disposed at the frame, a pressing pin arranged in the housing, and a spring for providing elasticity to the pressing pin in the second direction in which the substrate is pressed.
5. The thin-film depositing apparatus of claim 3, wherein the pressing units are arranged at each corner of the frame.
6. The thin-film depositing apparatus of claim 1, further comprising a frame ascending and descending unit for ascending or descending the frame.
7. The thin-film depositing apparatus of claim 6, wherein the frame ascending and descending unit comprises wires for supporting the frame, and a driving power source for ascending or descending the wires.
Description
BRIEF DESCRIPTION OF THE DRAWINGS
(1) These and/or other aspects will become apparent and more readily appreciated from the following description of the embodiments, taken in conjunction with the accompanying drawings in which:
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DETAILED DESCRIPTION
(8) Reference will now be made in detail to embodiments of the invention, examples of which are illustrated in the accompanying drawings. In this regard, the present embodiments may have different forms and should not be construed as being limited to the descriptions set forth herein. Accordingly, the embodiments are merely described below, by referring to the figures, to explain features of the present invention.
(9) In the accompanying drawings, those components that are the same or are in correspondence are rendered the same reference numeral regardless of the figure number, and redundant explanations are omitted.
(10) Throughout the specification, a singular form may include plural forms, unless there is a particular description contrary thereto. Also, terms such as comprise or comprising are used to specify existence of a recited form, a number, a process, an operation, a component, and/or groups thereof, not excluding the existence of one or more other recited forms, one or more other numbers, one or more other processes, one or more other operations, one or more other components and/or groups thereof.
(11) In the drawings, for convenience of description, the thicknesses or sizes of elements are exaggerated for clarity, but one or more embodiments of the present invention are not limited thereto.
(12) Also, it should also be noted that in some alternative implementations, the steps of all methods described herein may occur out of order. For example, two steps illustrated in succession may in fact be executed substantially concurrently or the two steps may sometimes be executed in the reverse order.
(13) As used herein, the term and/or includes any and all combinations of one or more of the associated listed items.
(14)
(15) As shown in
(16) When the deposition source 400 sprays the deposition gas in the chamber 700, the deposition gas passes through an opening formed in the mask 300 and then is deposited on the substrate 200 so that a thin film having a predetermined pattern is formed on the substrate 200.
(17) Here, as illustrated in
(18) Recently, because sizes of the substrate 200 and the mask 300 increase, a center portion thereof may seriously sag due to its weight during a deposition process. Due to the sag, the substrate 200 and the mask 300 are not firmly adhered to each other and a gap occurs between the substrate 200 and the mask 300, such that a deposition error called a shadow may easily occur. However, the chucking unit 100 of the present embodiment may efficiently prevent the aforementioned problem.
(19) Referring to
(20) Because the magnetic units 110 independently rise and fall by using their own weight, and are distributed and disposed at several portions on the substrate 200, although the substrate 200 and the mask 300 sag, the magnetic bars 111 may rise to correspond to the sagged shape and the magnetic units 110 may combine with the mask 300.
(21) As illustrated in
(22) However, as illustrated in
(23) Referring back to
(24) As illustrated in
(25) A reference numeral 130 denotes a frame ascending and descending unit that makes the frame 131 close to or distant from the substrate 200 by ascending or descending wires 133 to or from a driving power source 134, wherein the wires 133 are combined with link units 132 of the frame 131.
(26) The thin-film depositing apparatus including the chucking unit 100 with the aforementioned structure may be used as below.
(27) First, the substrate 200 and the mask 300 are mounted in the chamber 700, and then the frame 131 descends so that the magnetic bars 111 of the magnetic units 110 are magnetically combined with the mask 300 by having the substrate 200 interposed therebetween. By doing so, the mask 300 is firmly adhered to the substrate 200, and regardless of the flat status as shown in
(28) In this status, when a deposition gas is sprayed from the deposition source 400, the deposition gas is deposited on the substrate 200 via an opening (not shown) through the mask 300, so that a thin film with a desired pattern is formed. Obviously, because the substrate 200 and the mask 300 are firmly adhered to each other by using the chucking unit 100, regardless of the occurrence of sagging, a deposition error called a shadow does not occur.
(29) Accordingly, by using the thin-film depositing apparatus, although the substrate 200 and the mask 300 sag due to their weight, the magnetic units 110 that are disposed at several positions rise by their weight along the sagged shape so as to firmly adhere the substrate 200 and the mask 300, so that a deposition error that may occur due to poor adherence between the substrate 200 and the mask 300 may be efficiently prevented.
(30) The aforementioned arrangement of the magnetic units 110 may vary. For example, as illustrated in
(31) It should be understood that the exemplary embodiments described herein should be considered in a descriptive sense only and not for purposes of limitation. Descriptions of features or aspects within each embodiment should typically be considered as available for other similar features or aspects in other embodiments.
(32) While one or more embodiments of the present invention have been described with reference to the figures, it will be understood by those of ordinary skill in the art that various changes in form and details may be made therein without departing from the spirit and scope of the present invention as defined by the following claims.