Magnetic sensing devices based on interlayer exchange-coupled magnetic thin films
11500042 · 2022-11-15
Assignee
Inventors
Cpc classification
H01F10/3268
ELECTRICITY
G01R33/007
PHYSICS
G01R33/098
PHYSICS
G01R33/093
PHYSICS
G01R33/072
PHYSICS
H01F10/324
ELECTRICITY
H01F10/30
ELECTRICITY
International classification
Abstract
A magnetic sensing device includes a non-magnetic layer serving as a spacer and two magnetic layers that sandwich the spacer, and two oxide layers that sandwich the trilayer structure including the two magnetic layers and the spacer.
Claims
1. A magnetic field sensing device comprising: a magnetic field sensing element with a Hall measurement configuration for Hall-signal detection and analysis, the magnetic field sensing element fabricated with an interlayer exchange-coupled magnetic multilayer structure comprising: a spacer that couples two magnetic layers that sandwich the spacer, the spacer thickness determining either the ferromagnetic coupling or the antiferromagnetic coupling between the two magnetic layers; two magnetic layers that sandwich the spacer, the two magnetic layers having tunable perpendicular magnetic anisotropies near a spin-reorientation transition; two oxide layers or other non-magnetic layers that sandwich the two magnetic layers and the spacer, the two oxide layers or other non-magnetic layers having interfaces with the two magnetic layers, the interfaces determining the perpendicular magnetic anisotropies of the two magnetic layers; and a capping layer to prevent underlying layers from further oxidization on exposure to the atmosphere.
2. The structure of claim 1 wherein the spacer comprises at least one of the following properties: the strength of the interlayer exchange coupling is selected from the group consisting of: at least 0.0001 milli-joule divided by square-meters ([mJ/m.sup.2) at least 0.0005 mJ/m.sup.2, at least 0.001 mJ/m.sup.2, at least 0.005 mJ/m.sup.2, at least 0.01 mJ/m.sup.2, at least 0.05 mJ/m.sup.2, at least 0.1 mJ/m.sup.2, at least 0.5 mJ/m.sup.2, at least 1 mJ/m.sup.2, at least 5 mJ/m.sup.2; is at least one metal, semiconducting, insulating or organic material selected from the group consisting of: tantalum, tungsten, niobium, molybdenum, vanadium, chromium, rhenium, ruthenium, iridium, copper, rhodium, scandium, titanium, yttrium, zirconium, palladium, hafnium, osmium, platinum, gold, gallium, germanium, arsenic, selenium, indium, tin, antimony, tellurium, thallium, lead, bismuth, silicon, vanadium dioxide, gallium arsenide, magnesium oxide, α-sexithiphene, and alloys or compounds composed of any two or more above materials.
3. The structure of claim 1, wherein the magnetic layers comprise at least one of the following properties: an anomalous Hall angle is selected from the group consisting of: at least 0.1%, at least 0.5%, at least 1%, at least 5%, at least 10%, at least 15%, at least 20%, at least 25%, at least 30%, at least 35%, at least 40%, at least 45%, at least 50%; has the anomalous Hall resistivity selected from the group consisting of: at least 0.1 micro-Ohm centimeters (μΩ cm), at least 0.5μΩ cm, at least 1μΩ cm, at least 5μΩ cm, at least 10μΩ cm, at least 50μΩ cm, at least 100 μΩ cm; has a saturation field selected from the group consisting of: at least 0.1 Oersted unit (Oe), at least 1 Oe, at least 10 Oe, at least 100 Oe, at least 1000 Oe, at least 10000 Oe; are ferromagnetic films or ferrimagnetic films; have perpendicular magnetic anisotropies near the spin-reorientation transition or have in-plane anisotropies; and the ferromagnetic film is the alloy of Cobalt-Iron-Boron with x, y, and 100−x−y as atomic percentage of Cobalt, Iron and Boron atoms (Co.sub.xFeyB100−x−y) wherein 0<x<100 and 0<y<100 (atomic percent); have interfaces with oxide layers, with other non-magnetic layers, or have no interfaces with any other materials.
4. The structure of claim 1, wherein the oxide layers comprise at least one of the following properties: have interfaces with magnetic layers; and are at least one oxide selected from the group consisting of: magnesium oxide, aluminum oxide, tantalum oxide, ruthenium oxide, chromium oxide, tungsten oxide, platinum oxide, silicon oxide, niobium oxide, molybdenum oxide, vanadium oxide, rhenium oxide, iridium oxide, copper oxide, rhodium oxide, scandium oxide, titanium oxide, yttrium oxide, zirconium oxide, palladium oxide, hafnium oxide, osmium oxide, gold oxide, gallium oxide, germanium oxide, arsenic oxide, selenium oxide, indium oxide, tin oxide, antimony oxide, tellurium oxide, thallium oxide, lead oxide, bismuth oxide; are replaced by other non-magnetic layers selected from the group consisting of: tantalum, tungsten, niobium, molybdenum, vanadium, chromium, rhenium, ruthenium, iridium, copper, rhodium, scandium, titanium, yttrium, zirconium, palladium, hafnium, osmium, platinum, gold, gallium, germanium, arsenic, selenium, indium, tin, antimony, tellurium, thallium, lead, bismuth, silicon, and alloys or compounds composed of any two or more above materials.
5. The structure of claim 1, further comprising a capping layer or overlayer to prevent from further oxidization on exposure to the atmosphere.
6. The structure of claim 1, further comprising inserted layers between any two layers to improve magnetic or electronic properties of magnetic multilayers for magnetic sensing devices.
7. The structure of claim 1, wherein the multilayer compositions are annealed to obtain appropriate interlayer exchange coupling and perpendicular magnetic anisotropies for magnetic sensing devices.
8. The structure of claim 1, wherein the multilayer compositions are annealed at an annealing temperature selected from the group consisting of: at least 20 degrees Celsius (° C.) at least 50° C., at least 100° C., at least 150° C., at least 200° C., at least 250° C., at least 300° C., at least 350° C., at least 400° C.
9. The structure of claim 1, wherein the multilayer compositions are annealed under a magnetic field perpendicular to or in the plane of the multilayer composition having a strength selected from the group consisting of: at least 0.01 Tesla (T), at least 0.1 T, at least 1.0 T, at least 10 T, at least 20 T.
10. The structure of claim 2, wherein the spacer has a thickness selected from a range of 0.1 nanometers (nm) to 10 nm, for example, 0.1 nm to 1.0 nm, 0.6 nm to 1.4 nm, 0.5 nm to 5.0 nm, or 5.0 nm to 10.0 nm.
Description
BRIEF DESCRIPTION OF THE DRAWINGS
(1) These and other features, aspects, and advantages of the present invention will become better understood with reference to the following description, appended claims, and accompanying drawings where:
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DETAILED DESCRIPTION
(10) The subject innovation is now described with reference to the drawings, wherein like reference numerals are used to refer to like elements throughout. In the following description, for purposes of explanation, numerous specific details are set forth in order to provide a thorough understanding of the present invention. It may be evident, however, that the present invention may be practiced without these specific details. In other instances, well-known structures and devices are shown in block diagram form in order to facilitate describing the present invention.
(11) The present invention enables design and fabrication of high-performing magnetic sensors with both high sensing capability and stability. The magnetic sensors can be applied in many fields including but not limited to automotive fields, read heads in data storage devices, magnetic imaging, microscopy, Internet of things (IoT), robotics, non-destructive evaluation (NDE), medical diagnostics, electrocardiogram (ECG or EKG), electroencephalogram (EEG), biomedical applications and so forth.
(12) In addition to being applied in industrial productions, the magnetic sensors of the present invention can be applied in scientific studies such as, for example, detection of magnetic textures in magnetic materials, in medical fields such as detection of magnetically labeled biomolecules and detection of signals from human bodies like from heart and human brains. In addition, the magnetic sensors of the present invention can detect magnetic fields within a broad field range and a broad temperature interval, broadening their applications in different fields.
(13) More specifically, the present invention provides a platform to fabricate magnetic sensing devices that include a spacer that couples two magnetic layers, two magnetic layers that sandwich the spacer, two oxide layers that sandwich the trilayer structure including the two magnetic layers and the spacer, and a capping layer to prevent underlying layers from further oxidization on exposure to the atmosphere. The interlayer exchange coupling (IEC) between two magnetic layers and magnetic anisotropies can be tuned to control the performance of magnetic sensing devices. The magnetic sensing devices take advantage of the anomalous Hall effect of interlayer exchange-coupled magnetic thin films. The magnetic sensing devices based on interlayer exchange-coupled magnetic thin films have both high magnetic field detectability and high stability, which are desirable for magnetic sensing applications under wide ranging environmental conditions.
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(18) In various embodiments, the spacer has an interlayer exchange coupling strength at least about 0.0001 milli-joule divided by square-meters ([mJ/m.sup.2), at least about 0.0005 mJ/m2, at least about 0.001 mJ/m2, at least about 0.005 mJ/m2, at least about 0.01 mJ/m2, at least about 0.05 mJ/m2, at least about 0.1 mJ/m2, at least about 0.5 mJ/m2, at least about 1 mJ/m2, at least about 5 mJ/m2. In an embodiment, the spacer is Ta. In certain embodiments, the spacer has a thickness with the range of about 0.1 nanometers (nm) to about 10.0 nm, for example, about 0.1 nm to about 1.0 nm, about 0.6 nm to 1.4 nm, about 0.5 nm to 5.0 nm, or about 5.0 nm to 10.0 nm. In various embodiments, the spacer is a metal, semiconductor, insulator or the organic material. For example, the metal, semiconductor, insulator or the organic material serving as the spacer is selected from the group consisting of: tantalum, tungsten, niobium, molybdenum, vanadium, chromium, rhenium, ruthenium, iridium, copper, rhodium, scandium, titanium, yttrium, zirconium, palladium, hafnium, osmium, platinum, gold, gallium, germanium, arsenic, selenium, indium, tin, antimony, tellurium, thallium, lead, bismuth, silicon, vanadium dioxide, gallium arsenide, magnesium oxide, and α-sexithiphene.
(19) In various embodiments, the magnetic layer has an anomalous Hall angle at least about 0.1%, at least about 0.5%, at least about 1%, at least about 5%, at least about 10%, at least about 15%, at least about 20%, at least about 25%, at least about 30%, at least about 35%, at least about 40%, at least about 45%, at least about 50%. In various embodiments, the magnetic layer has an anomalous Hall resistivity at least about 0.1 micro-Ohm centimeters (μΩ cm), at least about 0.5μΩ cm, at least about 1μΩ cm, at least about 5μΩ cm, at least about 10μΩ cm, at least about 50μΩ cm, at least about 100μΩ cm. In certain embodiments, by tuning the magnetic anisotropies, the magnetic layer has a saturation field selected from the group consisting of: at least about 0.1 Oersted unit (Oe), at least about 1 Oe, at least about 10 Oe, at least about 100 Oe, at least about 1000 Oe, at least about 10000 Oe. In a certain embodiment, the ferromagnetic layer is the alloy of Cobalt-Iron-Boron with x, y, and 100−x−y as atomic percentage of Cobalt, Iron and Boron atoms (Co.sub.xFeyB100−x−y) wherein 0<x<100 and 0<y<100 (atomic percent). In various embodiments, the magnetic layer is either the ferromagnetic layer or ferrimagnetic layer. In various embodiments, the perpendicular magnetic anisotropy is above zero, equals zero, or is below zero.
(20) The oxide layers have interfaces with the two magnetic layers. In various embodiments, the oxide layers are selected from the group consisting of magnesium oxide, aluminum oxide, tantalum oxide, ruthenium oxide, chromium oxide, tungsten oxide, platinum oxide, silicon oxide, niobium oxide, molybdenum oxide, vanadium oxide, rhenium oxide, iridium oxide, copper oxide, rhodium oxide, scandium oxide, titanium oxide, yttrium oxide, zirconium oxide, palladium oxide, hafnium oxide, osmium oxide, gold oxide, gallium oxide, germanium oxide, arsenic oxide, selenium oxide, indium oxide, tin oxide, antimony oxide, tellurium oxide, thallium oxide, lead oxide, bismuth oxide. In certain embodiments, oxide layers are not included in structures of magnetic thin films for magnetic sensing devices. In certain embodiments, the effective perpendicular magnetic anisotropy is improved by interfacing magnetic layers with other non-magnetic layers, such as interfacing Co with the Pt layer in Co/Pt multilayers. In certain embodiments, the perpendicular magnetic anisotropy is present in a single magnetic layer without neighboring with any other materials, such as L1.sub.0 ordered FeCo and FePt thin films.
(21) In a specific embodiment, the capping layer is Ta. In various embodiments, different capping layers are used to prevent underlying layers from further oxidization.
(22) In various embodiments, the multilayers are annealed at different annealing temperature and under different magnetic fields. The annealing temperature is selected from the group consisting of: at least about 20 degrees Celsius (° C.) at least about 50° C., at least about 100° C., at least about 150° C., at least about 200° C., at least about 250° C., at least about 300° C., at least about 350° C., at least about 400° C. In various embodiments, the perpendicular or in-plane magnetic field applied during the annealing is selected from the group consisting of at least about 0.01 Tesla (T), at least about 0.1 T, at least about 1.0 T, at least about 10 T, at least about 20 T. In certain embodiments, no magnetic field is applied during magnetic annealing processes. In certain embodiments, the as-grown multilayers are used to fabricate magnetic sensing devices.
(23) The synthetic ferromagnetic or synthetic antiferromagnetic structures include a non-magnetic spacer and two magnetic layers that sandwich the non-magnetic spacer. In certain embodiments, oxide layers are included in the structure. Neighboring magnetic layers with oxide layers promotes the perpendicular magnetic anisotropy of magnetic layers. To give examples, we deposited multilayers of MgO(1.6)/Co.sub.40Fe.sub.40B.sub.20(t.sub.1)/Ta(t.sub.Ta)/Co.sub.40Fe.sub.40B.sub.2(t.sub.2)/MgO(1.6)/TaO.sub.x(1.0) (layer thicknesses in nanometers) on thermally oxidized silicon wafers using a high-vacuum magnetron sputtering system. The cross-sectional schematic view of the multilayer stack is presented in
(24) To obtain the accurate anomalous Hall sensitivity, we used a coil to generate an AC perpendicular magnetic field ΔH.sub.z,0 sin(2πωt), while applying a constant perpendicular field H.sub.z through the superconducting coil in the Quantum Design® Physical Property Measurement System (PPMS). The frequency 2πω=5 Hz and ΔH.sub.z,0=0.3 Oe. The sensitivity s=ΔR.sub.H,0/ΔH.sub.z,0 at the field H.sub.z was then derived by measuring the corresponding anomalous Hall voltage response that gives the anomalous Hall resistance R.sub.H+ΔR.sub.H,0 sin(2πωt).
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(26) For the interlayer exchange-coupled magnetic thin film with t.sub.Ta=0.8 nm, the perpendicular anisotropy increases when increasing the annealing temperature from 100 to 150° C., as presented in
(27) By way of example, we focus on three magnetic thin films with different perpendicular anisotropies. We denote three samples as “sample1”, “sample2” and “sample3”, respectively.
(28) As an essential parameter to characterize the performance of anomalous Hall sensors, the sensitivity is presented in
(29) Apart from the sensitivity, noise spectra were also measured, as shown in
(30) The magnetic sensing detectability was calculated through S.sub.T.sub.
(31) To quantify the performance of anomalous Hall sensors, we calculated the dynamic reserve that is defined as 20 log.sub.10(2H.sub.DR/S.sub.T.sup.0.5 (at 1 Hz and zero field)), as presented in
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(38) We performed transport and noise measurements of anomalous Hall sensors at different temperatures T, to investigate temperature stability of anomalous Hall sensors.
(39) As a comparison, we also measured magnetotransport and noise properties of the single Co.sub.40Fe.sub.40B.sub.20 layer-based anomalous Hall sensor in the temperature range from 310 to 250 K. The temperature-dependent magnetic field detectability at 1 Hz at a bias field H.sub.B=−14 Oe (at which the field detectability value is lowest) is also presented in
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(46) In addition to the temperature stability, reaching high tolerance to orthogonal magnetic fields is essential as well for anomalous Hall sensors in applications of perpendicular magnetic field sensing. The IEC in magnetic thin films is expected to enhance the stability. To confirm this, we measured anomalous Hall curves of both interlayer exchange-coupled magnetic thin film-based and the single Co.sub.40Fe.sub.40B.sub.20 layer-based anomalous Hall sensors, while applying an in-plane magnetic field H.sub.IP. H.sub.IP was applied either parallel (α=0°) or perpendicular (α=90°) to the current flow direction.
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(48) The interlayer exchange-coupled magnetic thin film-based anomalous hall sensor has an outstanding performance with both high detectability and high stability. To achieve the best performance of anomalous Hall sensors, we have also performed transport and noise measurements of magnetic thin films with different magnetic layer thicknesses and t.sub.Ta. Magnetic layer thicknesses (t.sub.1=0.8, 0.9 and 1.0 nm) have ignorable influences on the performance of anomalous Hall sensors. The t.sub.Ta controls the IEC strength.
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(53) The anomalous Hall angle θ.sub.AHE=ρ.sub.H/ρ.sub.xx was calculated to characterize the efficiency of anomalous Hall sensors. ρ.sub.H is the anomalous Hall resistivity, and ρ.sub.xx is the longitudinal resistivity. For the magnetic thin film of Co.sub.40Fe.sub.40B.sub.20/Ta/Co.sub.40Fe.sub.40B.sub.20, the anomalous Hall angle was determined to be about 0.7%. One expects that, by replacing Co.sub.40Fe.sub.40B.sub.20 with other magnets, such as FePt, with larger anomalous Hall angles, the efficiency of anomalous Hall sensors can be improved. Anomalous Hall sensors with different material compositions remain to be explored.
(54) Among magnetic sensors with miniaturized sizes, besides Hall sensors, the giant magnetoresistance (GMR) sensor and tunneling magnetoresistance (TMR) sensor have also been attracting great interest. Nevertheless, both GMR and TMR sensors are fabricated with much more complex fabrication processes. The GMR sensor performs with a high power consumption. A better magnetic sensing detectability can be achieved in TMR sensors based on magnetic tunnel junctions (MTJs). However, TMR sensor usually suffers from large 1/f noise, which scales inversely with junction areas and limits its performance with small sizes. In a TMR sensor with superparamagnetic free layer, the achieved magnetic field detectability is 40 nT/√Hz at 1 Hz, one third of that of the anomalous Hall sensors in this work, yet the sensing area is 14 times larger. If the same sensing area is used, one may expect that the anomalous Hall sensor performs comparably or even outperforms TMR sensor in the low-frequency region.
(55) In general, we have succeeded in fabricating high-performing anomalous Hall sensors with both high detectability and high stability, exploiting the interlayer exchange-coupled magnetic thin film of Co.sub.40Fe.sub.40B.sub.20/Ta/Co.sub.40Fe.sub.40B.sub.20. We performed transport and noise measurements to characterize the magnetic sensing capability of anomalous Hall sensors. By tuning the IEC and perpendicular magnetic anisotropy, at room temperature, the best magnetic sensing detectability reaches 126 nT/√Hz at 1 Hz and 4.5 nT/√Hz at 1 kHz. The interlayer exchange-coupled magnetic thin film with the best performance has a Ta spacer with the spacer thickness of 0.8 nm, two ferromagnetic Co.sub.40Fe.sub.40B.sub.20 layers that sandwich the Ta spacer, and the other two MgO layers that sandwich the trilayer structure comprising the two ferromagnetic Co.sub.40Fe.sub.40B.sub.20 layers and the Ta spacer. The anomalous Hall sensor with such a structure has a large dynamic range of 197 Oe and a large dynamic reserve of 103.0 dB. The anomalous Hall sensors outperform the conventional semiconductor Hall sensors in both sensitivity and detectability. Temperature-dependent studies were conducted. Benefiting from the IEC in interlayer exchange-coupled magnetic thin films, the anomalous Hall sensor has a low temperature coefficient of sensitivity of 530 ppm/K. The low temperature coefficient of the anomalous Hall sensor suggests it is possible to work within a broad temperature interval. The IEC also improves the tolerance of anomalous Hall sensors to orthogonal magnetic fields. The high stability against both temperature and in-plane magnetic fields allows the anomalous Hall sensor to be applied in magnetic sensing under wide-ranging environmental conditions. The high-performing anomalous Hall sensors with the miniaturized size have great potential in applications of micro sensing such as detection of biomolecules and magnetic imaging. If combining anomalous Hall sensors and GMR or TMR sensors together, one expects to detect three-dimensional magnetic field with high field resolution.
(56) It would be appreciated by those skilled in the art that various changes and modifications can be made to the illustrated embodiments without departing from the spirit of the present invention. All such modifications and changes are intended to be within the scope of the present invention except as limited by the scope of the appended claims.