METHOD AND DEVICE FOR MANUFACTURING A BASE LAYER HAVING DIFFERENT DEGREES OF HARDNESS AND WORKPIECE HAVING DIFFERENT DEGREES OF HARDNESS
20220355335 · 2022-11-10
Assignee
Inventors
Cpc classification
B41M7/009
PERFORMING OPERATIONS; TRANSPORTING
B05D2490/60
PERFORMING OPERATIONS; TRANSPORTING
B41M7/0081
PERFORMING OPERATIONS; TRANSPORTING
B05D7/532
PERFORMING OPERATIONS; TRANSPORTING
B44C3/025
PERFORMING OPERATIONS; TRANSPORTING
B05D1/32
PERFORMING OPERATIONS; TRANSPORTING
B44C5/04
PERFORMING OPERATIONS; TRANSPORTING
B05D5/06
PERFORMING OPERATIONS; TRANSPORTING
B44F1/02
PERFORMING OPERATIONS; TRANSPORTING
International classification
B05D1/32
PERFORMING OPERATIONS; TRANSPORTING
B05D7/00
PERFORMING OPERATIONS; TRANSPORTING
Abstract
A method and a device for manufacturing a base layer (3) having different degrees of hardness is disclosed. Further a workpiece with a base layer (3) manufactured by such method is disclosed.
Claims
1. Method, in particular for manufacturing areas providing different degrees of hardness in a base layer (3), comprising the following steps: step (S40): applying a masking on at least a partial area of the surface of the base layer (3), wherein the masking is configured to at least partially absorb electromagnetic radiation; step (S50): irradiating the base layer (3) and the applied masking with electromagnetic radiation, in particular with UV radiation and/or IR radiation, to set different degrees of hardness of the base layer (3).
2. Method according to claim 1, wherein the hardness degree gradient in x-direction between the highest degree of hardness and the lowest degree of hardness is set within a length whose extent corresponds to one of the following limits: less than 1 mm, less than 0.1 mm, less than 100 μm, less than 10 μm, less than 1 μm.
3. Method according to claim 1, wherein, when performing step (S40), at least a portion of the base layer (3) or the entire base layer (3) is liquid or at least not already completely cured.
4. Method according to claim 1, wherein the base layer (3) and the masking are complementary to each other such that an edge angle (α) between the base layer (3) and the masking is achieved, which is preferably more than 20 degrees, more preferably more than 50 degrees, in particular more than 70 degrees; and/or wherein, in particular while performing step (S50), the height of the masking at the edge of the masking is at least 50%, preferably at least 70%, more preferably at least 90%, of the height of the masking in the center of the masking.
5. Method according to claim 1, wherein a further step (S20) is performed, in which the base layer (3) is applied on a, in particular plate-like or web-like, carrier element and/or on a further layer, in particular on a coating layer, and/or wherein a, in particular plate-like or web-like, carrier element and/or on a further layer, in particular on a coating layer, is applied on the base layer (3).
6. Method according to claim 1, wherein the masking on the surface of the base layer (3), in particular when performing step (S50), is present in liquid form or has been at least partially, preferably completely, solidified, and/or wherein the material forming the masking is applied in liquid form and/or in gaseous form on the surface of the liquid base layer (3), wherein preferably, when applying the material in gaseous form, a condensation of the material to the masking on the surface of the base layer (3) takes place, and/or wherein the material forming the masking is applied on the base layer (3) in the form of at least one droplet (4), preferably with a volume of less than 1 nL, more preferably of less than 200 pL, in particular of less than 40 pL.
7. Method according to claim 1, wherein before and/or during step (S40) a step (S30) is performed, in which the base layer (3) is irradiated with electromagnetic radiation, in particular UV radiation and/or IR radiation, whereby the degree of hardness and/or the viscosity and/or the surface tension of the base layer (3) is set to a desired value, wherein preferably by irradiation of the liquid base layer (3) with electromagnetic radiation in step (S30) a viscosity gradient or hardness gradient in the base layer (3), such that the side of the base layer (3) facing away from the radiation source of the electromagnetic radiation provides a viscosity or hardness less, preferably by a factor of at least 4, than the side of the base layer (3) facing towards the radiation source, or a changed surface tension is developed.
8. Method according to claim 1, wherein the layer thickness of the liquid base layer (3) at positions, at which the masking, in particular in the form of droplets (4), is applied, is reduced, wherein the reduction is preferably less than 10 μm, more preferably less than 1 μm, wherein the reduction of the layer thickness is in particular carried out by sinking of the masking into the base layer (3) and/or by displacement of the base layer (3) by the masking.
9. Method according to claim 1, wherein the surface tension of the material forming the masking is equal to or more than the surface tension of the base layer (3).
10. Method according to claim 1, wherein a difference in the curing and/or polymerization of the base layer (3) between areas, on which the masking has been applied, and areas, on which the masking has not been applied, is present after step (S50), wherein the difference in the curing preferably corresponds to at least a factor of 2, more preferably to at least a factor of 3.
11. Method according to claim 1, wherein after step (S50) a step (S60) is performed, in which the masking is removed or in which the masking and the base layer (3) are removed at positions, at which the masking was applied, wherein preferably at least 80% of the layer thickness of the base layer (3) is removed and the base layer (3) is more preferably completely removed to form depressions and/or through holes in the base layer (3) at said positions, wherein the removal of the masking or the removal of the masking and the base layer (3) is preferably done physically and/or chemically, and/or wherein after step (S50) a step (S70) is performed, in which a further layer comprising a base coat is applied, and/or wherein after step (S50) a step (S80) is performed, in which the entire layer structure is irradiated with electromagnetic radiation, in particular UV radiation.
12. Method according to claim 1, wherein the masking is configured to absorb electromagnetic radiation, with which the base layer (3) and the applied masking in step (S50) are irradiated, by at least 60%, preferably by at least 80%, more preferably entirely, and/or wherein the masking is configured to absorb electromagnetic radiation, which wavelength falls below a threshold wavelength, and/or wherein the irradiation in step (S50) is carried out with electromagnetic radiation, which wavelength falls below the threshold wavelength, and/or wherein the masking is configured to at least let electromagnetic radiation providing a predetermined minimum wavelength pass, wherein the irradiation in step (S50) with electromagnetic radiation is preferably carried out such that electromagnetic radiation is used which only provides radiation with wavelengths, which are below the minimum wavelength.
13. Method according to claim 1, wherein the masking is configured to absorb electromagnetic radiation, with which the base layer (3) and the applied masking in step (S50) are irradiated, by at least 60%, preferably by at least 80%, more preferably entirely, and/or wherein the masking is configured to absorb electromagnetic radiation, which wavelength exceeds a threshold wavelength, and/or wherein the irradiation in step (S50) is carried out with electromagnetic radiation, which wavelength exceeds the threshold wavelength, and/or wherein the masking is configured to at least let electromagnetic radiation providing a predetermined maximum wavelength pass, wherein the irradiation in step (S50) with electromagnetic radiation is preferably carried out such that electromagnetic radiation is used which only provides radiation with wavelengths, which are above the maximum wavelength.
14. Method according to claim 1, wherein the masking is applied such that it runs at least in partial areas synchronously to a décor image, which is already on or in the base layer (3) or which has been added subsequently to the base layer (3) or a workpiece comprising the base layer (3).
15. Method according to claim 1, wherein the masking at least partially remains on the base layer (3).
16. Workpiece comprising a base layer (3), which has been in particular manufactured according to a method according to claim 1, wherein the base layer (3) comprises at least one depression, at which the internal angle β is more than 60 degrees, preferably more than 70 degrees, more preferably more than 80 degrees, and/or wherein the average thickness of the base layer (3) in the edge region of each depression, in particular in a range of 0 to 3 mm from the edge of each depression, differs by less than 20%, preferably less than 10%, from the average thickness of the entire base layer (3), and/or wherein the workpiece comprises a further layer, in particular a coating layer, and/or a, in particular plate-like or web-like, carrier element, wherein the layer and/or the carrier element is/are connected to the surface of the base layer (3), wherein the base layer (3) comprises at least one depression, at the bottom of which the further layer and/or the carrier element is/are at least partially exposed, and/or wherein the base layer (3) comprises a depression, whose bottom let an underlying layer of the workpiece shine through or wherein the bottom of the depression is the underlying layer, whereby the degree of gloss of the underlying layer in the depression is recognizable, wherein said degree of gloss preferably differs from the degree of gloss of the base layer (3) or the top layer of the panel by at least 10 gloss points, preferably at least 5 gloss points, and/or wherein depressions in the base layer (3) form a structure, which is at least in part arranged synchronously to a decor image printed before or subsequently on the base layer (3) or the workpiece.
17. Device for performing the method according to claim 1, comprising: a control device, in particular with electronic control means, which are by means of respective coding configured to perform the method according to claim 1, by the device; preferably a processing station configured to apply the masking, wherein said processing station preferably comprises digital printing technology, preferably at least a processing station configured to irradiate the base layer (3) and/or the masking, wherein said processing station comprises preferably UV and/or IR radiation sources.
Description
[0108] In the following, the invention is explained in more detail with reference to the accompanying figures. In detail:
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[0119] This Figure shows the workpiece comprising a plurality of layers. A workpiece core is provided undermost, on which a first base coat 1 and a second base coat 2 are provided. A base layer 3 is applied thereover, on the surface of which a masking in form of droplets 4 is provided. However, there are also applications that do not require a first base coat 1 and/or a second base coat 2.
[0120] These liquid droplets 4 are illustrated with different droplet volumes. Furthermore, the edge angle α is shown as the angle between the surface of the base layer 3 and a tangent to the outer edge of the droplet 4 at the position, at which the edge of the droplet 4 abuts the surface of the base layer 3.
[0121] For example, the edge angle α in the cross-section or side view of the base layer 3 and masking is understood to be that acute angle between the surface of the base layer 3 and a tangent to the outer edge of the masking at the point where the edge of the masking, in this case the edge of the droplets 4, abuts the surface of the base layer. If the base layer 3 is not flat, a tangent to the base layer 3 is also applied at this position, with the edge angle α then being formed as an acute angle between the two tangents.
[0122] However, the following definition from above may also be used here, according to which the edge angle α is the acute angle between a tangent to the outer edge of the masking at the position where the edge of the masking, in this case the edge of the droplets 4, abuts the surface of the base layer 3, and a plane perpendicular to the emission direction of the radiation. In this way, an edge angle α is defined, which, the larger it is, is a measure of how good the separation between masked and unmasked areas is. There is then a separation as sharp as possible of the radiation input to the base layer 3 between masked and unmasked areas.
[0123] Thus, a flat droplet has a small edge angle α, while a very high standing droplet has a larger edge angle α.
[0124] For clarification, this is shown in
[0125] This Figure shows a surface of α, in particular liquid, base layer 3 having a masking in form of droplets 4, which show different edge angles a, applied thereon. In the upper illustration, the droplets 4 are shown dotted, without a representation of the edge angle, in the lower illustration, the same droplets are then not dotted, but are each shown with an edge angle α drawn in. For a better understanding, in each case a flat droplet (left) is shown with a correspondingly small edge angle α, and a higher uprising droplet 4 is shown with a larger edge angle α (right), so that α (left)<α (right) applies.
[0126] It is clearly evident that a masking, whose edge angle α.sub.1 is very small, provides a slowly increasing thickness from the edge of the masking towards its center. This in turn results in that a masking effect with respect to electromagnetic radiation for the underlying base layer at the edge of the masking is low, since there is little masking material above the base layer 3. In the center of the masking, on the other hand, the greatest thickness of the masking is present, so that the greatest masking effect also occurs here. Thus, the radiation input of electromagnetic radiation into the base layer 3 continues to decrease from the edge of the masking to the center of the masking, which results in an uneven Influence of the degree of hardness of the base layer 3 below the masking.
[0127] In this way, with a steep edge angle α.sub.2, it may be achieved that also at the edge of the masking already a large quantity of masking material is present, which ultimately leads to a homogenous masking effect, whereby the influence of the degree of hardness of the base layer 3 is carried out homogenously.
[0128]
[0129] The sequence of process steps in the method according to the invention is shown in the drawing. For clarification of the process steps, reference is also made to
[0130] It should be noted that the steps S10, S12, S14, S16, S20, S30, S60, S70 and S80 are to be considered as optional method steps, which are listed here exemplarily. However, an embodiment of the method is conceivable that merely comprises the steps S40 and S50. Furthermore, further embodiments of the method are conceivable that comprise at least a further one of the steps S10, S12, S14, S16, S20, S30, S60, S70 and S80 in addition to steps S40 and S50.
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[0132] An internal angle 7 of the structure on the surface of the workpiece achieved by the inventive method is shown in
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[0134] In this Figure, a depression 6 is shown in enlarged form, which has a depth d that extends from the surface of the base layer 3 to the underlying layer (second base coat 2). In particular,
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[0136] A workpiece according to the invention having a workpiece core 5, a first base coat 1 and a second base coat 2 and an overlying base layer 3 is shown in
[0137] In
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[0139] The structure formed by the depressions 6 may also be created according to a digital template in such a way that it is synchronous with the underlying decor layer 1b. The basis for the synchronous creation may be the digital template, on which the decor layer 1b is also based, as described above. It may also be a template derived from this digital template.
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[0147] The material of the masking is configured to let electromagnetic radiation with a wavelength of more than 380 nm pass and to absorb electromagnetic radiation with a wavelength of less than 380 nm. In general, the material of the masking is configured to let electromagnetic radiation with a wavelength being equal to or more than a specific threshold wavelength pass and to absorb electromagnetic radiation with a wavelength being less than the specific threshold wavelength. However, the material of the masking may also be configured to absorb electromagnetic radiation of a very broad wavelength spectrum, for example from 180 nm to 1500 nm.
[0148] The base layer 3 experiences therefore in the area underneath the masking a radiation input of radiation with a wavelength of more than 380 nm, while the areas to the left and the right therefrom receive a radiation input with the complete spectrum of the radiation source.
[0149] In this way, the degree of hardness of the base layer 3 underneath the masking is less influenced by the radiation than the exposed areas to the left and the right therefrom. To further reduce the effect of the radiation on the base layer, a filter may be used, as shown in
[0150] The filter is configured to let only electromagnetic radiation with a wavelength of less than 380 nm pass. This ensures that no radiation is incident on the masking, which could be transmitted by it. Thus, the area below the masking does not experience any radiation input. In general, the filter is tuned to the threshold wavelength of the masking.
[0151] The areas of the base layer 3 to the left and to the right therefrom, each receive a radiation input of the filtered spectrum with wavelengths of less than 380 nm.
[0152] In this way, an influence on the degree of hardness of the base layer may be carried out very precisely area by area, wherein the masked areas are entirely shielded from the influence of the electromagnetic radiation.
[0153] It is clear to the person skilled in the art that this example does not have a limiting effect on the invention. In particular, the wavelength of 380 nm referred to herein and thus the properties of the masking and the filter may be chosen differently in other embodiments without changing the principle described herein.
[0154] In the following, the invention is described with reference to preferred aspects relating to the production of depressions.
[0155] In an embodiment according to the invention, a workpiece is manufactured, in which the internal angle between the printed surface and the visible and tactile structure is very large. Due to this generated “sharpness” of the structure, the impression of a much greater depth results, despite the same measurable depth of, for example, 70 μm, as with flat structures. Any structures with an internal angle of more than 60 degrees, in particular more than 80 degrees, have been shown to be particularly suitable (cf.
[0156] A further aspect is the removal of the base layer up to the bottom or until the underlying layer of the workpiece shows up.
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[0158] In the following, the more specific term “droplet” is used for “masking”. According to an aspect of the invention, the following method is provided. With step S40, applying droplets 4 on the liquid base layer 3 is carried out, wherein said liquid base layer is pretreated by means of electromagnetic radiation (step S30) such that the droplets 4 do not or only very little, i.e. less by than 10% of the layer thickness of the base layer 3, preferably less than 1% of the layer thickness of the base layer, sink in therein and form an edge angle of more than 20 degrees, preferably more than 50 degrees, more preferably more than 70 degrees, with the base layer 3 at positions, at which they hit the surface of the base layer 3. In the tests carried out, it has proved to be particularly useful to perform the pretreatment (step S30) of the liquid base layer 3 under inert conditions (by introduction of nitrogen) and with a UV LED (manufacturer ITL—Integration Technology, Ltd.; power 2-4 W/cm2; feed 25 m/min; alternatively, Phoseon Fireedge FE 300 or 400; 2-4 W/cm2; also 25 m/min). By the use of a liquid for the droplets 4 according to the compositions given by way of example, an edge angle greater than 70 degrees has been established after the droplets 4 have been applied. The droplets comprise at least a component, which absorbs UV radiation in a wavelength spectrum to be selected, for example BASF Tinuvin 477 blocks wavelengths below 380 nm, such that, after the subsequent further irradiation of the liquid base layer together with the applied droplets 4 with UV radiation, the curing of the liquid base layer at positions, at which the droplets have been applied, is at least by a factor of 2 lower than at the other positions.
[0159] The tests have shown that thereby in a further step the base layer 3 at locations, at which the droplets 4 have been previously applied, may be again removed entirely up to the underlying layer of the base coat 2. The removal of the at least by a factor of 2 less cured areas of the base layer 3 may be carried out with mechanical auxiliary means or with fluid jets such as, for example, water, mixtures with solids or the like. In the performed tests, circular rotating brushes with metal bristles with a brush diameter of 350 mm and bristle diameter of 200 μm have been applied with good results. The measurements at the respectively produced panels have shown that the inventive pretreatment of the liquid layer with electromagnetic radiation (here: UV radiation in the above mentioned wavelength range under inert conditions in step S30), alone and/or in combination with the use of a composition of the liquid droplets 4 such that they have a higher surface tension than the base layer 3, have led to the fact that a large edge angle between the droplets 4 and the base layer 3 is established, and therefore a very sharp separation of areas with high curing of the base layer and the areas covered by the droplets 4 in the subsequent following further irradiation (step S50) takes place. The base layer 3 could therefore be removed completely up to the underlying layer of the base coat 2 in the following step S60 by mechanical processing of the surface at locations, at which the droplets 4 have been applied.
[0160] Furthermore, this procedure leads to the fact that the measured internal angles of the pores (cf.
[0161] The workpiece may be, for example, primed white before the application of the liquid base layer 3 and subsequently printed with a digital decor image. This layer of digital print ink 1b, specifically for creating the decor image, may than be covered with the base coat 2, which also serves for setting the degree of gloss of the pores 6 generated later, since the base layer 3 applied above the base coat 2 is subsequently completely removed again at locations of the pores 6 according to the method and thus the base coat 2 becomes again visible at said locations.
[0162] In particular, these three properties of the panel according to the invention, namely the low bulging of the edges, the large internal angles of the pores and the great depth of the pores to the underlying layer, clearly stand out from the prior art. They are all parts of the solution to the problem, namely that the pores produced by the method according to the invention should be very well perceived both visually and haptically, and should leave an impression of great depth on the observer.
[0163] Before describing specific embodiments, specific aspects of the invention are again highlighted below.
[0164] According to a first aspect, a method, in particular for manufacturing areas providing different degrees of hardness in a base layer 3, is provided comprising the following steps: [0165] step (S40): applying a masking on at least a partial area of the surface of the base layer 3, wherein the masking is configured to at least partially absorb electromagnetic radiation; [0166] step (S50): irradiating the base layer 3 and the applied masking with electromagnetic radiation, in particular with UV radiation and/or IR radiation, to set different degrees of hardness of the base layer 3.
[0167] According to a second aspect, a method according to the first aspect is provided, wherein the hardness degree gradient in x-direction between the highest degree of hardness 1 and the lowest degree of hardness 0 is set within a length of less than 0.1 mm, preferably less than 10 μm, more preferably less than 1 μm.
[0168] According to a third aspect, a method according to the first or second aspect is provided, wherein, when performing step S40, at least a portion of the base layer 3 or the entire base layer 3 is liquid or at least not already completely cured.
[0169] According to a fourth aspect, a method according to any one of the above three aspects is provided, wherein the base layer 3 and the masking are complementary to each other such that an edge angle α between the base layer 3 and the masking is achieved, which is preferably more than 20 degrees, more preferably more than 50 degrees, in particular more than 70 degrees; and/or wherein, in particular while performing step S50, the height of the masking at the edge of the masking is at least 50%, preferably at least 70%, more preferably at least 90%, of the height of the masking in the center of the masking.
[0170] According to a fifth aspect, a method according to any one of the above four aspects is provided, wherein a further step S20 is performed, in which the base layer 3 is applied on a, in particular plate-like or web-like, carrier element and/or on a further layer, in particular on a coating layer, and/or wherein a, in particular plate-like or web-like, carrier element and/or on a further layer, in particular on a coating layer, is applied on the base layer 3.
[0171] According to a sixth aspect, a method according to any one of the above five aspects is provided, wherein the masking on the surface of the base layer 3, in particular when performing step S50, is present in liquid form or has been at least partially, preferably completely, solidified, and/or wherein the material forming the masking is applied in liquid form and/or in gaseous form on the surface of the liquid base layer 3, wherein preferably, when applying the material in gaseous form, a condensation of the material to the masking on the surface of the base layer 3 takes place, and/or wherein the material forming the masking is applied on the base layer 3 in the form of at least one droplet 4, preferably with a volume of less than 1 nL, more preferably of less than 200 pL, in particular of less than 40 pL.
[0172] According to a seventh aspect, a method according to any one of the above six aspects is provided, wherein before and/or during step S40 a step S30 is performed, in which the base layer 3 is irradiated with electromagnetic radiation, in particular UV radiation and/or IR radiation, whereby the degree of hardness and/or the viscosity and/or the surface tension of the base layer 3 is set to a desired value, wherein preferably by irradiation of the liquid base layer 3 with electromagnetic radiation in step S30 a viscosity gradient or hardness gradient in the base layer 3, such that the side of the base layer 3 facing away from the radiation source of the electromagnetic radiation provides a viscosity or hardness less, preferably by a factor of at least 4, than the side of the base layer 3 facing towards the radiation source, or a changed surface tension is developed.
[0173] According to a eighth aspect, a method according to any one of the above seven aspects is provided, wherein the layer thickness of the liquid base layer 3 at positions, at which the masking, in particular in the form of droplets 4, is applied, is reduced, wherein the reduction is preferably less than 10 μm, more preferably less than 1 μm, wherein the reduction of the layer thickness is in particular carried out by sinking of the masking into the base layer 3 and/or by displacement of the base layer 3 by the masking.
[0174] According to a ninth aspect, a method according to any one of the above eight aspects is provided, wherein the surface tension of the material forming the masking is equal to or more than the surface tension of the base layer 3.
[0175] According to a tenth aspect, a method according to any one of the above nine aspects is provided, wherein a difference in the curing and/or polymerization of the base layer 3 between areas, on which the masking has been applied, and areas, on which the masking has not been applied, is present after step S50, wherein the difference in the curing preferably corresponds to at least a factor of 2, more preferably to at least a factor of 3.
[0176] According to a eleventh aspect, a method according to any one of the above ten aspects is provided, wherein after step S50 a step S60 is performed, in which the masking is removed or in which the masking and the base layer 3 are removed at positions, at which the masking was applied, wherein preferably at least 80% of the layer thickness of the base layer 3 is removed and the base layer 3 is more preferably completely removed to form depressions and/or through holes in the base layer 3 at said positions, wherein the removal of the masking oder the removal of the masking and the base layer 3 is preferably done physically and/or chemically, and/or wherein after step S50 a step
[0177] S70 is performed, in which a further layer comprising a base coat is applied, and/or wherein after step S50 a step S80 is performed, in which the entire layer structure is irradiated with electromagnetic radiation, in particular UV radiation.
[0178] According to a twelfth aspect, a method according to any one of the above eleven aspects is provided, wherein the masking is configured to absorb electromagnetic radiation, with which the base layer 3 and the applied masking in step S50 are irradiated, by at least 60%, preferably by at least 80%, more preferably entirely, and/or wherein the masking is configured to absorb electromagnetic radiation, which wavelength falls below a threshold wavelength, and/or wherein the irradiation in step S50 is carried out with electromagnetic radiation, which wavelength falls below the threshold wavelength, and/or wherein the masking is configured to at least let electromagnetic radiation providing a predetermined minimum wavelength pass, wherein the irradiation in step S50 with electromagnetic radiation is preferably carried out such that electromagnetic radiation is used which only provides radiation with wavelengths, which are below the minimum wavelength.
[0179] According to a thirteenth aspect, a method according to any one of the above twelve aspects is provided, wherein the masking is applied such that it runs at least in partial areas synchronously to a decor image, which is already on or in the base layer 3 or which has been added subsequently to the base layer 3 or a workpiece comprising the base layer 3.
[0180] According to a fourteenth aspect, a method according to any one of the above thirteen aspects is provided, wherein the masking at least partially remains on the base layer 3.
[0181] According to a fifteenth aspect, a workpiece comprising a base layer 3, which has been in particular manufactured according to a method according to any one of the above fourteen aspects, is provided, wherein [0182] the base layer 3 comprises at least one depression, at which the internal angle β is more than 60 degrees, preferably more than 70 degrees, more preferably more than 80 degrees, and/or wherein [0183] the average thickness of the base layer 3 in the edge region of each depression, in particular in a range of 0 to 3 mm from the edge of each depression, differs by less than 20%, preferably less than 10%, from the average thickness of the entire base layer 3, and/or wherein [0184] the workpiece comprises a further layer, in particular a coating layer, and/or a, in particular plate-like or web-like, carrier element, wherein the layer and/or the carrier element is/are connected to the surface of the base layer 3, wherein the base layer 3 comprises at least one depression, at the bottom of which the further layer and/or the carrier element is/are at least partially exposed, and/or wherein [0185] the base layer 3 comprises a depression, whose bottom let an underlying layer of the workpiece shine through or wherein the bottom of the depression is the underlying layer, whereby the degree of gloss of the underlying layer in the depression is recognizable, wherein said degree of gloss preferably differs from the degree of gloss of the base layer 3 or the top layer of the panel by at least 10 gloss points, preferably at least 5 gloss points.
[0186] The invention is described below with reference to specific exemplary embodiments.
Exemplary Embodiment 1
[0187] A mineral-filled PVC plate 5 with a thickness of 6 mm is fed to a first painting station. There, a base coat 1 in the form of a radiation-curing acrylate paint, which is colored white with TiO.sub.2, is applied with a layer thickness of 80 g/m.sup.2 using a roller application process. Said base coat 1 is subsequently cured by a Hg-UV lamp with a broad wavelength range of 300-440 nm, wherein the plate 5 in transported underneath the Hg lamp with a constant speed of 20 m/min. A previously digitally scanned piece of marble is then printed as a decor image onto said white primer in a continuous process using a single-pass digital printer and a digital printing ink 1b. An average of 4 g/m2 of digital printing ink is applied, which corresponds to a layer thickness of approx. 4 μm.
[0188] Subsequently, said digital printing ink is coated with a base coat 2, which is provided as radiation-curing acrylate mixture (matte coating) with a degree of gloss of 3 gloss points, wherein said acrylate mixture has been set to 5 gloss points (measured with device: Byk Micro-TRI-Gloss, angle 60 degrees) with respect to the degree of gloss. The panel coated in this way is fed to a further curing station and irradiated over the product width of 1250 mm in throughfeed at 20 m/min with a Hg-UV lamp having a power of 60 W/cm (corresponding to approx. 50% of the maximum lamp power). The surface is then coated with a further acrylate mixture, the liquid base layer 3, with a layer thickness of 80 μm by a roller application process. Said liquid base layer is flooded with nitrogen in a drying device to displace the oxygen contained in the air to achieve a good reactivity of the acrylate polymers on the surface. The surface is slightly initially cured in the drying device with nitrogen by a UV-LED having a radiation peak at 395 nm. The droplets 4 are applied on the surface by a single-pass digital printing device with an average droplet volume of 12 pL in the subsequent processing step. Thereby, droplets of a volume of 3 pL up to 100 pL are used. The droplets are applied on the surface such that they do not or up to maximum 10% of the layer thickness of 80 μm sink into the liquid base layer. This is achieved by the initial curing of the surface with the above mentioned LED inert curing. In the example of the above-mentioned marble decor, the droplets 4 are distributed according to a digital print template, which has been created with or without digital processing from the decor image for the marble, so that the pores 6 subsequently formed by the droplets are synchronous with the underlying decor image. In this example, about 3 g/m2 area of the panel of droplet mass is applied. The surface of the panel with the droplets is then fed to a further drying station, where the entire layer structure is cured with a Hg-UV lamp with a power of 100 W/cm. Subsequently, the panel is transported into a brushing device, in which circular rotating brushes with steel bristles with a diameter of 0.2 mm per bristle remove the base layer 3 again at locations, at which the droplets 4 have been applied. The surface developed in this way is finally cured in a final drying station with a Hg-UV lamp with a power of 240 W/cm as final step.
Exemplary Embodiment 2
[0189] A HDF plate with a thickness of 10 mm, which has been printed before with a decorative image by a digital printer or by another, also analogous, printing process, is fed to a painting station and coated with a SIS base coat on an acrylate basis comprising 0.5 mass percentage Byk 3505 with a layer thickness of 60 g/m.sup.2.
[0190] Said matte coat is subsequently cured on a Hg-UV lamp with, for example, 50% of the power of the exemplary embodiment 1, i.e. 50 W/cm. Following said UV lamp, the plate is again fed to a painting station where it receives an SIS base coat of, for example, 60 g/m.sup.2 as an application. This is followed by curing under inert conditions, e.g. in the absence of oxygen by nitrogen flooding with an UV LED, so that said layer is cured to 50-80%, preferably 60-70%. Directly afterwards, and still under inert conditions, a masking agent with a droplet size of 12 pL per droplet is applied to the surface from a digital print head, for example with a resolution of 300 dpi. The edge angle of the 12 pL droplets applied in this way on the surface that has been initially gelled by the UV-LED under inert conditions is >70°.
[0191] Subsequently, the plate coated with the masking agent in this way with the liquid coating and the described structure to a Hg-UV lamp, which cures the unmasked fraction of the second SIS base coat coating completely, wherein the portion under the masking cures to a maximum of 70%, preferably to less than 50%. Afterwards, the HDF plate with the layer structure described above is fed to a brushing station, where a brush with copper wire brushes out the masked surface portions and removes both the masking layer and the underlying SIS base coat layer, which has not yet fully cured. Then, to determine the degree of gloss of the surface, a top coat with a different degree of gloss than the matte coat described above is applied. This may, for example, achieve a degree of gloss of 12-16 gloss points.
[0192] The last step is then the feeding of the HDF plate thus painted with top coat to a final curing, wherein the entire layer structure is finally cured with a Hg-UV lamp with more than 100 W/cm, preferably more than 150 W/cm. The feed rate for the entire package is more than 15 m/min., preferably more than 20 m/min.
[0193] In this exemplary embodiment, the matting agent used may be either pure water or comprised of substantially water as the solvent as well as other UV-absorbing agents and binders. In an alternative embodiment, the masking agent is based on acrylate varnish and also contains the corresponding UV absorbing agents. Likewise, a PP plate made of pure polypropylene or polypropylene with appropriate admixtures, e.g. filled by mineral fractions, may be used in place of the HDF plate.
[0194] In an alternative method according to the invention, the method steps of
LIST OF REFERENCE SIGNS
[0195] 1—first base coat [0196] 1a—first base coat (priming portion) [0197] 1b—first base coat (decor image) [0198] 2—second base coat [0199] 3—coating (base layer) [0200] 4—droplet [0201] 5—workpiece-core [0202] 6—depression (pores) [0203] 7—internal angle β [0204] 8—edge angle α [0205] 9—base coat [0206] 10—workpiece surface [0207] 11—pore for wood reproduction (from above) [0208] 12—knothole for wood reproduction (from above) [0209] α—edge angle [0210] d.sub.1′—bulging height [0211] d.sub.2″—bulging height